CN107068532B - A kind of electron impact ionization source - Google Patents

A kind of electron impact ionization source Download PDF

Info

Publication number
CN107068532B
CN107068532B CN201710196165.4A CN201710196165A CN107068532B CN 107068532 B CN107068532 B CN 107068532B CN 201710196165 A CN201710196165 A CN 201710196165A CN 107068532 B CN107068532 B CN 107068532B
Authority
CN
China
Prior art keywords
filament
electron impact
impact ionization
ionization source
ionisation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710196165.4A
Other languages
Chinese (zh)
Other versions
CN107068532A (en
Inventor
黄泽建
方向
江游
熊行创
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Metrology
Original Assignee
National Institute of Metrology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Metrology filed Critical National Institute of Metrology
Priority to CN201710196165.4A priority Critical patent/CN107068532B/en
Publication of CN107068532A publication Critical patent/CN107068532A/en
Application granted granted Critical
Publication of CN107068532B publication Critical patent/CN107068532B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/14Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/022Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes

Abstract

The present invention provides a kind of electron impact ionization sources, comprising: feedthrough flange assembly and electron impact ionization source component;Feedthrough flange assembly includes: a standard flange and multiple feed through pole, includes the threaded hole that several are used to fix electron impact ionization source component on standard flange;Feed through pole is cylindrical metallic rod, and feed through pole passes axially through standard flange;The lead electrode outlet of feed through pole layout and electron impact ionization source component on feedthrough flange assembly, which is laid out, to be corresponded, and the lead electrode outlet of the feed through pole on feedthrough flange assembly and electron impact ionization source component is by directly realizing electrical communication to slotting mode;Electron impact ionization source component includes: ion source pedestal, ionisation chamber, two filament components, repeller electrode, lens group, heater, temperature sensor, temperature controller and a pair of magnet.Electron impact ionization volume source provided by the invention is smaller, and function is more complete, can easily be integrated into portable mass spectrometer.

Description

A kind of electron impact ionization source
Technical field
The present invention relates to mass spectrometry art fields, and in particular to a kind of electron impact ionization source.
Background technique
Mass spectrograph be research substance form substantially, one of the instrument that structure feature, physics and chemical property are most basic, be raw The requisite instrumentation in the fields such as the science of life, material science, food safety, environmental protection, is the core of Modern Analytical Instrument.Its essence It is a kind of spectral method detected after being separated the ion of movement by their mass-to-charge ratio using electric field and/or magnetic field.It is logical The exact mass for crossing measurement ion can determine the compound composition of ion.It is mainly used for the Structural Identification of compound, its energy The structural informations such as the molecular weight, element composition and functional group of compound are provided.Its analyst coverage is extensive, is suitable for gas, liquid Body and solid;It is small that it analyzes fast speed, high sensitivity, amount of samples;It can direct qualitative analysis;By various separation hands Section can also carry out accurate quantitative analysis to complex compound.Because these mass spectrometric features, it, which is widely used in, organises The fields such as, biology, geochemistry, nuclear industry, material science, environmental science, medical hygiene, Food Chemistry, petrochemical industry And the special analysis such as space technology and public security work field.Mass spectrograph is divided into magnetic substance spectrum according to the difference of mass analyzer Instrument, time of-flight mass spectrometer, quadrupole mass spectrometer (including quadrupole mass spectrometer and ion trap mass spectrometer), Fourier cyclotron resonance matter Spectrometer, orbit ion trap mass spectrograph and various hybridization mass spectrographs etc..
Most of mass spectrographs belong to Large-Scale Precision Instrument and Equipment, are typically mounted in laboratory and are operated and used.And The on-site tests such as military operation, industrial production, accident rescue field proposes the thriving demand of miniaturization to mass spectrograph, portable Mass spectrometric research and development become research hotspot.Quadrupole mass spectrometer is because small in size, structure is simple, technology relative maturity, low in cost One of and become a kind of most widely used mass spectrograph, this also becomes the first choice of portable mass spectrometer development.
One quadrupole mass spectrometer is usually by sampling system, ion source, quadrupole rod mass analyzer, detector, vacuum system It is formed with systems such as data processings.As depicted in figs. 1 and 2.Ion source be make neutral atom or molecular ionization, and therefrom draw from The device of beamlet stream, it is the essential component of mass spectrograph.Wherein, common for the ion source of quadrupole mass spectrometer There are the source electron impact ionization (EI), chemical ionization source, ultraviolet light ionization ion source, glow discharge source, electric spray ion source, atmosphere Press chemical ionization source etc..Although various atmospheric pressure ionizationions using more and more, using most extensively, be also most basic Be still electron impact ionization source, commercial standard spectrogram is exactly to use standard ionization condition, i.e. the electron bombardment of 70eV electricity It ionizes to obtain from source.
The source electron impact ionization (EI) usually by ionisation chamber, filament, receiving pole, repeller electrode, pull out lens, condenser lens, Evict lens composition from, as shown in Figure 3.Filament heating power generates electronics, and electronics forms high speed (high energy) electricity under electric field action Beamlet, electron beam passes through ionisation chamber and is received pole reception, during electronics passes through ionisation chamber, electron beam bombardment ionisation chamber In sample, to generate electronics and molecular ion M+, M+ continue the fracture or the molecule that by electron bombardment and cause chemical bond It resets, moment generates different kinds of ions.Ion in repeller electrode, pull out lens, condenser lens and under the action of evict lens from by from electricity It pulls out, focus and evicts from from room, to be analyzed for next step.
But the current general volume in the source electron impact ionization (EI) is larger, is poorly suitable for small portable mass spectrograph.
Summary of the invention
For the defects in the prior art, the present invention provides a kind of electron impact ionization source, and electronics provided by the invention bangs Ionization source small volume is hit, function is more complete, can easily be integrated into portable mass spectrometer.
To solve the above problems, the present invention provides following technical schemes:
A kind of electron impact ionization source, comprising: feedthrough flange assembly and electron impact ionization source component;
The feedthrough flange assembly includes: a standard flange and multiple feed through pole, includes on the standard flange Several are used to fix the threaded hole of the electron impact ionization source component;The feed through pole is cylindrical metallic rod, institute It states feed through pole and passes axially through the standard flange, and the electric insulation between standard flange;On the feedthrough flange assembly Feed through pole layout be laid out and correspond with the lead electrode outlet of the electron impact ionization source component, and the feedthrough method The lead electrode outlet of feed through pole and the electron impact ionization source component on blue component passes through directly to slotting mode reality Existing electrical communication;
The electron impact ionization source component includes: ion source pedestal, ionisation chamber, two filament components, repeller electrode, lens Group, heater, temperature sensor, temperature controller and a pair of magnet;
Wherein, the ion source pedestal is for carrying the electron impact ionization source component;
The ionisation chamber is the cavity structure of open at one end, and described two filament components are oppositely arranged on the ionisation chamber Outside side wall, for generating the electronics with preset energy, the electronics of generation passes through the electricity being arranged on the ionisation chamber side wall Sub- entrance aperture enters inside the ionisation chamber, enters the ionization to the sample introduction aperture by being arranged on the ionisation chamber side wall The sample of chamber interior is bombarded, and sample is transformed into electrically charged ion, and the ion of generation is in the repeller electrode and described It is evicted under the action of microscope group from the open one end of the ionisation chamber;Wherein, the repeller electrode setting is not opened wide in the ionisation chamber One end, the lens group is arranged in the open one end of the ionisation chamber, and the repeller electrode is oppositely arranged with the lens group, and It is vertical with the direction that described two filament components are oppositely arranged;Wherein, the electron impact hole and the sample introduction aperture are in 90 degree Position relation;
The heater is arranged in the not open one end of the ionisation chamber, for heating to the ionisation chamber;
The side-wall outer side of the ionisation chamber is arranged in the temperature sensor, for measuring the temperature of the ionisation chamber;
The temperature controller, for carrying out temperature control to the heater according to the temperature of the temperature sensor measurement System;
The pair of magnet is oppositely arranged on the side-wall outer side of the ionisation chamber, for generating inside the ionisation chamber Magnetic field.
Further, the filament component includes: that filament pedestal, filament, two filament electrodes, filament baffle and ceramics are small Pipe;
Wherein, two filament electrodes are fixed on the filament pedestal by the technique of sealing-in, and with the filament pedestal Keep insulation;
The both ends of the filament are put respectively to be welded on two filament electrodes, and the filament baffle is placed in the back side of filament, and One end welding is wherein on a filament electrode;Wherein, another filament electrode is wrapped with ceramic tubule, for preventing the lamp Silk electrode is contacted with the filament baffle.
Further, it is 1mm that the shape of the filament, which is diameter, and spiral spacing is the spiral-shaped of 0.5mm.
Further, electric insulation is realized by repeller electrode felt pad between the repeller electrode and the ionisation chamber.
Further, the lens group includes three pieces ion lens, respectively pull-out electrode lens, focusing electrode lens and Evict electrode lens from, the centre of this three pieces electrode lens is drum-shaped structure, and keeps concentric, passes through ceramics each other Existing concentric locating and insulation are padded, the lens group is fixed by screws on the ion source pedestal.
Further, the pair of magnet is a pair of of cylinder NS magnet, and a filament component is arranged in the first magnet The outside of another filament component is arranged in outside, the second magnet, and the pole N of the first magnet is oppositely arranged with the pole S of the second magnet.
Further, the heater is ceramic heating flake;The ceramic heating flake is tied using the square of intermediate aperture Structure, intermediate aperture segment are used for so that the lead electrode of the repeller electrode partially passes through.
Further, the temperature sensor is the ceramic mould platinum resistance of laminated structure, solid using nut and spring shim Due on the side wall of the ionisation chamber.
Further, the quantity of the threaded hole on the standard flange for fixing the electron impact ionization source component is 2~4.
Further, be additionally provided with the conical opening for sample introduction on the outside of the ionisation chamber, the conical opening and it is described into Sample aperture communicates, and realizes the sample introduction of sample.
As shown from the above technical solution, electron impact ionization source provided by the invention is expanded using standard flange as carrier The use scope in electron impact ionization source.Further, since containing magnet device, heating element in electron impact ionization source component And temperature element, therefore have simultaneously and increase ionizing efficiency and guarantee that ion source is clean and improve the advantage of contamination resistance, And the arrangement of magnet device, heating element and temperature element is simple and reliable, while more saving volume.Further, exist In electron impact ionization source provided by the invention, the feed through pole of feedthrough flange assembly and the electron impact ionization source component Lead electrode outlet directly realizes electrical communication to slotting mode by contact pin, so that it has been reduced as far as the use of cable, The welding or thread connecting mode between cable are also avoided, has not only been facilitated but also reliable, while also saving volume.By being analyzed above It is found that electron impact ionization source provided by the invention, small volume, function is more complete, can be used as an ion source separate standards Part has compatibility well, can very easily be integrated into portable mass spectrometer system.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is the present invention Some embodiments for those of ordinary skill in the art without creative efforts, can also basis These attached drawings obtain other attached drawings.
Fig. 1 is the structure composition block diagram of quadrupole mass spectrometer in the prior art;
Fig. 2 is the structural schematic diagram of quadrupole mass spectrometer in the prior art;
Fig. 3 is the structural schematic diagram in electron impact ionization source in the prior art;
Fig. 4 is the structural schematic diagram in the electron impact ionization source that one embodiment of the invention provides;
Fig. 5 a and Fig. 5 b are the structural schematic diagrams for the feedthrough flange assembly 401 that one embodiment of the invention provides;Wherein, Fig. 5 b It is the side view of Fig. 5 a;
Fig. 6 a and Fig. 6 b are the structural schematic diagrams for the son bombardment ionization source component 402 that one embodiment of the invention provides;Wherein, Fig. 6 a is the side view of Fig. 6 b;
Fig. 7 is the structural schematic diagram for the lens group 605 that one embodiment of the invention provides;
Fig. 8 is the structural schematic diagram for the filament component 603 that one embodiment of the invention provides;
Fig. 9 is feed through pole and electron impact ionization source on the feedthrough flange assembly 401 that one embodiment of the invention provides The lead electrode outlet of component 402 is carried out directly by vehicle needle 901 to the slotting structural schematic diagram for realizing electrical communication.
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention In attached drawing, the technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art Every other embodiment obtained without creative efforts, shall fall within the protection scope of the present invention.
One embodiment of the invention provides a kind of electron impact ionization source, referring to fig. 4, electronics provided in an embodiment of the present invention Bombard ionization source, comprising: feedthrough flange assembly 401 and electron impact ionization source component 402;
Referring to Fig. 5 a and Fig. 5 b, the feedthrough flange assembly 401 includes: a standard flange 501 and multiple feed through pole 502, it include the threaded hole that several are used to fix the electron impact ionization source component 402 on the standard flange 501 503;The feed through pole 502 is cylindrical metallic rod, and the feed through pole 502 passes axially through the standard flange 501, And the electric insulation between standard flange 501;Feed through pole layout and the electron bombardment on the feedthrough flange assembly 401 The lead electrode outlet for ionizing source component 402, which is laid out, to be corresponded, and the feedthrough referring to Fig. 9, on the feedthrough flange assembly 401 The lead electrode outlet of electrode and the electron impact ionization source component 402 directly realizes electricity to slotting mode by vehicle needle 901 Gas connection, has been reduced as far as the use of cable in this way, has also avoided welding or thread connecting mode between cable, i.e., just Just again reliable, while also saving volume.Preferably, the vehicle needle 901 is 2 logical to plug in vehicle needle.
In the present embodiment, the installation that feedthrough flange assembly 401 both can be used as electron impact ionization source component 402 is fixed With flange, meanwhile, and can be used as the feedthrough connector of 402 power on signal of electron impact ionization source component, so that shown in Fig. 4 Electron impact ionization source can be used as an ion source separate standards part.Wherein, it 501 is made of standard flange, increasing should The scope of application of ion source.It both can use rubber seal, metal sealing form also can be used, as KF40, DN63ISO-K, DN40CF etc..Feed through pole 502 is the electrode for realizing ion source power on signal feedthrough, it passes through mark Quasi- flange 501, is fixed on standard flange 501 in the form of vacuum seal, it is electric insulation between standard flange 501, Pressure-resistant 1KV or more, while guaranteeing vacuum sealing again, leak rate should be lower than 1.0 × 10-10Pa·m3/s.Feed through pole 502 is circle Cylindrical electrode, quantity is depending on the requirement of ion source power on signal, in the present embodiment, quantity 12, this 12 electrodes according to Certain centre for being regularly distributed on standard flange 501.The diameter of feed through pole 502 usually takes 1-3mm, depending on the electricity flowed through above Depending on the size of stream and the size of standard flange 501 and required number, diameter is 1mm in this example.Its material is gold Belong to, can be copper, 304 magnetism-free stainless steels, 316 magnetism-free stainless steels, kovar alloy etc..Have on standard flange 501 for fixing The threaded hole 503 of electron impact ionization source component 402, quantity 2-4, be 2 M3 threaded holes in this example.
Referring to Fig. 6 a and Fig. 6 b, the electron impact ionization source component 402 include: ion source pedestal 601, ionisation chamber 602, Two filament components 603, repeller electrode 604, lens group 605, heater 606, temperature sensor 607, temperature controller are (in figure not Show) and a pair of magnet 608;
Wherein, the ion source pedestal 601 is for carrying the electron impact ionization source component 402;
The ionisation chamber 602 is the cavity structure of open at one end, and described two filament components 603 are oppositely arranged on the electricity Outside side wall from room, for generating the electronics with preset energy, the electronics of generation is by being arranged in 602 side of ionisation chamber Electron impact hole 611 on wall enters inside the ionisation chamber 602, for by being arranged in 602 side wall of ionisation chamber Sample introduction aperture 610 enter the ionisation chamber 602 inside sample bombarded, sample is transformed into electrically charged ion, production Raw ion is evicted under the action of the repeller electrode 604 and the lens group 605 from the open one end of the ionisation chamber 602; Wherein, in the not open one end of the ionisation chamber 602, the lens group 605 is arranged in the ionization for the setting of repeller electrode 604 The open one end in room 602, the repeller electrode 604 are oppositely arranged with the lens group 605, and with described two filament components 603 The direction being oppositely arranged is vertical;Wherein, the electron impact hole 611 and the sample introduction aperture 610 are in 90 degree of position relation;
The heater 606, setting is in the not open one end of the ionisation chamber 602, for carrying out to the ionisation chamber 602 Heating;
The side-wall outer side of the ionisation chamber 602 is arranged in the temperature sensor 607, for measuring the ionisation chamber 602 Temperature;
The temperature controller, the temperature for being measured according to the temperature sensor 607 carry out the heater 606 Temperature control;
The pair of magnet 608 is oppositely arranged on the side-wall outer side of the ionisation chamber 602, in the ionisation chamber 602 Inside generates magnetic field.
By the scheme recorded above it is found that electron impact ionization source provided in an embodiment of the present invention, is to carry with standard flange Body expands the use scope in electron impact ionization source.Further, since containing magnet member in electron impact ionization source component Part, heating element and temperature element, therefore have simultaneously and increase ionizing efficiency and guarantee that ion source is clean and improve antipollution The advantage of ability, and the arrangement of magnet device, heating element and temperature element is simple and reliable, while more saving volume. Further, in electron impact ionization source provided in an embodiment of the present invention, the feed through pole of feedthrough flange assembly and the electricity The lead electrode outlet of son bombardment ionization source component directly realizes electrical communication to slotting mode by contact pin, thus as much as possible The use for reducing cable also avoids welding or thread connecting mode between cable, i.e., convenient and reliable, while also saving Volume.It, can be with by being analyzed above it is found that electron impact ionization source provided in an embodiment of the present invention, small volume, function is more complete As an ion source separate standards part, there is compatibility well, can very easily be integrated into portable mass spectrometer system.
In a kind of optional embodiment, referring to Fig. 8, the filament component 603 include: filament pedestal 801, filament 802, Two filament electrodes 803 and 804, filament baffle 805 and ceramic tubule 806;
Wherein, two filament electrodes 803 and 804 are fixed on the filament pedestal 801 by the technique of sealing-in, and with institute It states filament pedestal 801 and keeps insulation;
For example, the metal materials systems such as 304 stainless steels, 316L stainless steel or kovar alloy can be used in filament pedestal 801 At can also be made of ceramic materials.Filament electrode 803 and 804 is fixed on filament pedestal 801 by the technique of sealing-in, such as Fruit filament pedestal 801 is to be made of metal material, then must be sealed using glass between filament electrode 803 and 804 and filament pedestal 801 It connects or crunch seal form, palpus guarantees electric insulation between 803 and 804 and 801.If filament pedestal 801 is by ceramic material Material is made, then any form of sealing-in is used between filament electrode 803 and 804 need and filament pedestal 801, but must guarantee It is electric insulation between 803 and 804.
Referring to Fig. 8, further, the both ends of the filament 802 are put respectively to be welded on two filament electrodes 803 and 804, institute The back side that filament baffle 805 is placed in filament 802 is stated, and one end is welded on a filament electrode (such as filament electrode 803) wherein; Wherein, another filament electrode (such as filament electrode 804) is wrapped with ceramic tubule 806, for prevent the filament electrode 804 with The filament baffle 805 contacts.
Here, the material of filament 802 generally selects tungsten wire, rhenium silk, iridium wire or rhenium tengsten lamp material and is made, and shape can To be filiform, it is also possible to sheet, can be also possible to spirally to be linear.Filiform is selected in the present embodiment, and In order to increase the yield of electronics, by filament winding at diameter 1mm, spiral spacing 0.5mm's is spiral-shaped.Wherein, filament 802 It puts and is welded on filament electrode 803 and 804 respectively in both ends.Filament baffle 805 is placed in the rear portion of filament 802, and end point is welded in On filament electrode 803.Filament baffle 805 is contacted with another filament electrode 804 in order to prevent, is covered on another filament electrode 804 Upper one ceramic tubule 806.It is understood that filament component 603 when installation, must guarantee that filament 802 is just placed in The center in electron impact hole 611, and maintained a certain distance with the outer wall in electron impact hole 611, it is generally spaced on the left side 1-2mm It is right.In the present embodiment, due to using double filamentray structures, it has been opened on the cylindrical wall of ionisation chamber 602 two small Hole between hole diameter 1-3mm, can be circular hole, can be elliptical aperture, be also possible to rectangular opening, depending on the structure of filament.
In a kind of optional embodiment, referring to Fig. 6 a, by pushing away between the repeller electrode 604 and the ionisation chamber 602 Pole felt pad 609 is denounceed to realize electric insulation.
In a kind of optional embodiment, referring to Fig. 7, the lens group 605 includes three pieces ion lens, is respectively pulled out Electrode lens 701, focusing electrode lens 702 and evict electrode lens 703 from, the centre of this three pieces electrode lens is drum-shaped knot Structure, and keep concentric, realize that concentric locating and insulation, the lens group 605 pass through screw by ceramic blanket 704 each other 705 are fixed on the ion source pedestal 601.
In a kind of optional embodiment, in order to increase the motion path of electronics, so that ionizing efficiency is improved, in ionisation chamber Side-wall outer side, more specifically, in close proximity to the outside of filament component 603, referring to Fig. 6 a, in the outside of filament component 603) It placed 1 cylinder-shaped magnet 608 respectively.The opposite side of the two magnet is respectively different polarity, i.e. N is extremely to the pole S.
In a kind of optional embodiment, the heater 606 uses ceramic heating flake, that is, passes through ceramic heating flake 606 Ionisation chamber 602 is heated, ceramic heating flake can use the square structure of intermediate aperture.Intermediate aperture segment just may be used To allow the lead electrode of repeller electrode 604 to partially pass through, heating and the repeller electrode to ionisation chamber 602 can be played in this way Electric insulation effect between 604 and ionisation chamber 602.
In a kind of optional embodiment, ceramic mould platinum resistance of the temperature sensor 607 using laminated structure, sheet The resistance of structure is easily installed on the outside of ionisation chamber, and nut can be used for example and spring shim is locked.
In a kind of optional embodiment, the conical opening 612 for sample introduction is additionally provided on the outside of the ionisation chamber, it is described Conical opening 612 is communicated with the sample introduction aperture 610, realizes the sample introduction of sample.
Referring to Fig. 5 a, Fig. 5 b, Fig. 6 a and Fig. 6 b, in the present embodiment, one shares 12 tunnel electric signals, is 3 roads electricity respectively Sub-lens, 2 groups of totally 4 street lamp silks, the heating of 2 tunnels, 2 channel Temperature Measurings, 1 road ion repulsion.This 12 tunnel electric signal passes through cable and feedthrough Feed through pole 502 on flange assembly 401 is connected.Since entire ion source works in high vacuum environment, Ying Jinliang avoids cable Bring, which is deflated etc., is unfavorable for the factor of vacuum, and therefore, cable used should select the material of low deflation rate to form, and prevent tin The techniques such as weldering.In the present embodiment, it is preferred to use the mode of vehicle needle.Meanwhile in order to reduce the use of cable as far as possible, from In the lead and feedthrough flange assembly 401 of component in the layout of feed through pole 502, using directly to by the way of slotting, to avoid The use of cable, and directly adopt vehicle needle and disposably realize electrical communication.As shown in figure 9, vehicle needle 901 leads to for 2 to plug in vehicle needle, Avoid all welding and threaded connection, i.e., it is convenient and reliable, while saving volume.
Specifically, electron impact ion source at work, connects the electric current of 1-3A on filament 802, and filament is powered After generate heat, generate electronics.The electric field and two magnet that electronics is formed between filament baffle 805 and ion source ionisation chamber 602 608 are formed by under magnetic fields and are threadingly advanced.Electronics enters after ionisation chamber 602, with by conical opening 612 and sample introduction it is small Hole 610 is collided between the gas molecule of ionisation chamber, so that gas molecule be ionized.The ion being dissociated ionisation chamber 602, Repeller electrode 604, lens group 605 common electric field action under.It is drawn out, focuses and evicts from.In order to guarantee the clean of ion source and Contamination resistance is improved, ionisation chamber 602 is heated in the energization of ceramic heat on piece, at the same time, passes through temperature sensor 607 pairs of ion source temperatures are monitored, and realize the control to ceramic heating flake by external temperature controller, to realize To the thermometric and temperature control of ion source temperature.
In the description of the present invention, it should be noted that herein, relational terms such as first and second and the like It is only used to distinguish one entity or operation from another entity or operation, without necessarily requiring or implying these There are any actual relationship or orders between entity or operation.Moreover, the terms "include", "comprise" or its is any Other variants are intended to non-exclusive inclusion, so that including the process, method, article or equipment of a series of elements Include not only those elements, but also including other elements that are not explicitly listed, or further includes for this process, side Method, article or the intrinsic element of equipment.In the absence of more restrictions, limited by sentence "including a ..." Element, it is not excluded that there is also other identical elements in the process, method, article or apparatus that includes the element.
The above examples are only used to illustrate the technical scheme of the present invention, rather than its limitations;Although with reference to the foregoing embodiments Invention is explained in detail, those skilled in the art should understand that: it still can be to aforementioned each implementation Technical solution documented by example is modified or equivalent replacement of some of the technical features;And these are modified or replace It changes, the spirit and scope for technical solution of various embodiments of the present invention that it does not separate the essence of the corresponding technical solution.

Claims (10)

1. a kind of electron impact ionization source characterized by comprising feedthrough flange assembly and electron impact ionization source component;
The feedthrough flange assembly includes: a standard flange and multiple feed through pole, includes several on the standard flange A threaded hole for being used to fix the electron impact ionization source component;The feed through pole is cylindrical metallic rod, the feedback Energization pole passes axially through the standard flange, and the electric insulation between standard flange;Feedback on the feedthrough flange assembly The lead electrode outlet of logical electrode lay-out and the electron impact ionization source component, which is laid out, to be corresponded, and the feedthrough flange group The lead electrode outlet of feed through pole and the electron impact ionization source component on part is by directly realizing electricity to slotting mode Gas connection;
The electron impact ionization source component include: ion source pedestal, ionisation chamber, two filament components, repeller electrode, lens group, Heater, temperature sensor, temperature controller and a pair of magnet;
Wherein, the ion source pedestal is for carrying the electron impact ionization source component;
The ionisation chamber is the cavity structure of open at one end, and described two filament components are oppositely arranged on the outside of the ionisation chamber Side wall, for generating the electronics with preset energy, the electronics of generation passes through the electronics being arranged on the ionisation chamber side wall and enters Perforation enters inside the ionisation chamber, enters in the ionisation chamber to by the way that the sample introduction aperture on the ionisation chamber side wall is arranged in The sample in portion is bombarded, and sample is transformed into electrically charged ion, the ion of generation is in the repeller electrode and the lens group Under the action of evicted from from the open one end of the ionisation chamber;Wherein, the repeller electrode is arranged in the ionisation chamber not open one End, the lens group are arranged in the open one end of the ionisation chamber, and the repeller electrode is oppositely arranged with the lens group, and with institute It is vertical to state the direction that two filament components are oppositely arranged;Wherein, the electron impact hole and the sample introduction aperture are in 90 degree of side Position relationship;
The heater is arranged in the not open one end of the ionisation chamber, for heating to the ionisation chamber;
The side-wall outer side of the ionisation chamber is arranged in the temperature sensor, for measuring the temperature of the ionisation chamber;
The temperature controller, for carrying out temperature control to the heater according to the temperature of the temperature sensor measurement;
The pair of magnet is oppositely arranged on the side-wall outer side of the ionisation chamber, for generating magnetic field inside the ionisation chamber.
2. electron impact ionization source according to claim 1, which is characterized in that the filament component include: filament pedestal, Filament, two filament electrodes, filament baffle and ceramic tubule;
Wherein, two filament electrodes are fixed on the filament pedestal by the technique of sealing-in, and are kept with the filament pedestal Insulation;
The both ends of the filament are put respectively to be welded on two filament electrodes, and the filament baffle is placed in the back side of filament, and one end Welding is wherein on a filament electrode;Wherein, another filament electrode is wrapped with ceramic tubule, for preventing the filament electric Pole is contacted with the filament baffle.
3. electron impact ionization source according to claim 2, which is characterized in that the shape of the filament is that diameter is 1mm, Spiral spacing is the spiral-shaped of 0.5mm.
4. electron impact ionization source according to claim 1, which is characterized in that between the repeller electrode and the ionisation chamber Electric insulation is realized by repeller electrode felt pad.
5. electron impact ionization source according to claim 1, which is characterized in that the lens group includes that three pieces ion is saturating Mirror respectively pulls out electrode lens, focusing electrode lens and evicts electrode lens from, and the centre of this three pieces electrode lens is drum Shape structure, and keep concentric, concentric locating and insulation are realized by ceramic blanket each other, the lens group is solid by screw It is scheduled on the ion source pedestal.
6. electron impact ionization source according to claim 1, which is characterized in that the pair of magnet is a pair of of cylinder NS Magnet, the first magnet are arranged in the outside of a filament component, and the second magnet is arranged in the outside of another filament component, and first The pole N of magnet is oppositely arranged with the pole S of the second magnet.
7. electron impact ionization source according to claim 1, which is characterized in that the heater is ceramic heating flake;Institute The square structure that ceramic heating flake uses intermediate aperture is stated, intermediate aperture segment is used for the lead electrode so that the repeller electrode It partially passes through.
8. electron impact ionization source according to claim 1, which is characterized in that the temperature sensor is laminated structure Ceramic mould platinum resistance is fixed on the side wall of the ionisation chamber using nut and spring shim.
9. electron impact ionization source according to claim 1, which is characterized in that described in being used to fix on the standard flange The quantity of the threaded hole of electron impact ionization source component is 2~4.
10. electron impact ionization source according to claim 1, which is characterized in that be additionally provided on the outside of the ionisation chamber For the conical opening of sample introduction, the conical opening is communicated with the sample introduction aperture, realizes the sample introduction of sample.
CN201710196165.4A 2017-03-29 2017-03-29 A kind of electron impact ionization source Active CN107068532B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710196165.4A CN107068532B (en) 2017-03-29 2017-03-29 A kind of electron impact ionization source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710196165.4A CN107068532B (en) 2017-03-29 2017-03-29 A kind of electron impact ionization source

Publications (2)

Publication Number Publication Date
CN107068532A CN107068532A (en) 2017-08-18
CN107068532B true CN107068532B (en) 2019-03-05

Family

ID=59620522

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710196165.4A Active CN107068532B (en) 2017-03-29 2017-03-29 A kind of electron impact ionization source

Country Status (1)

Country Link
CN (1) CN107068532B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108231529B (en) * 2018-03-09 2024-04-05 晓睿真空设备(嘉兴)有限公司 Low-voltage magnetic control cathode ion source
CN108493091B (en) * 2018-03-09 2020-03-24 中国计量科学研究院 High-electron-utilization-rate low-energy ionization device, mass spectrum system and method
CN108760074A (en) * 2018-07-16 2018-11-06 深圳大学 A kind of temperature collecting device of neutron detector
CN110137071B (en) * 2019-05-24 2021-02-23 中国计量科学研究院 Split process mass spectrometer
CN111053978A (en) * 2019-12-26 2020-04-24 上海联影医疗科技有限公司 Ionization chamber and method for controlling temperature of ionization chamber

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5155357A (en) * 1990-07-23 1992-10-13 Massachusetts Institute Of Technology Portable mass spectrometer
CN103608894A (en) * 2011-02-14 2014-02-26 麻省理工学院 Methods, apparatus, and system for mass spectrometry
CN104599931A (en) * 2013-10-31 2015-05-06 中国科学院大连化学物理研究所 Compact charged particle detector

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157721B1 (en) * 2003-12-22 2007-01-02 Transducer Technology, Inc. Coupled ionization apparatus and methods
WO2015040383A1 (en) * 2013-09-20 2015-03-26 Micromass Uk Limited Interface for ion source and vacuum housing

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5155357A (en) * 1990-07-23 1992-10-13 Massachusetts Institute Of Technology Portable mass spectrometer
CN103608894A (en) * 2011-02-14 2014-02-26 麻省理工学院 Methods, apparatus, and system for mass spectrometry
CN104599931A (en) * 2013-10-31 2015-05-06 中国科学院大连化学物理研究所 Compact charged particle detector

Also Published As

Publication number Publication date
CN107068532A (en) 2017-08-18

Similar Documents

Publication Publication Date Title
CN107068532B (en) A kind of electron impact ionization source
US7326926B2 (en) Corona discharge ionization sources for mass spectrometric and ion mobility spectrometric analysis of gas-phase chemical species
US7078679B2 (en) Inductive detection for mass spectrometry
JP5315248B2 (en) Method and apparatus for generating positively and / or negatively ionized gas analytes for gas analysis
Liu et al. Advances in discharge-based microplasmas for the analysis of trace species by atomic spectrometry
EP3474311A1 (en) Ion molecule reactor
US20060022132A1 (en) Ion drift-chemical ionization mass spectrometry
USH414H (en) Surface ionization source
JP5833801B1 (en) Photoionization detector for gas chromatography with two ionization sources operating separately.
CN104716008A (en) Radio-frequency discharge VUV composite ionization source used for mass spectrometry
Robb et al. Factors affecting primary ionization in dopant-assisted atmospheric pressure photoionization (DA-APPI) for LC/MS
CN111916334A (en) Vacuum ultraviolet ionization source for mass spectrum analyzer
JPH0218854A (en) Liquid chromathograph/mass spectrometer
Huang et al. Development of a portable single photon ionization-photoelectron ionization time-of-flight mass spectrometer
Sekimoto et al. Improvement in ionization efficiency of direct analysis in real time-mass spectrometry (DART-MS) by corona discharge
CN209843660U (en) Composite ion source and mass spectrometer
CN111430215A (en) Soft focusing ionizer and soft focusing method for shielding net electrode
CN108088891A (en) A kind of ion mobility spectrometry and operating method for being disposed vertically VUV radio-frequency lamps
JP5669324B2 (en) Quadrupole mass spectrometer
Pape et al. Dielectric barrier discharge in mass spectrometry–An overview over plasma investigations and ion sources applications
AU719247B2 (en) A method for element-selective detection, a micro plasma mass spectrometer for use in the method and a micro plasma ion source, together with applications thereof
US8835838B2 (en) Method and apparatus for analysis and ion source
Aida et al. Development of an ionization method using hydrogenated plasma for mass analysis of surface adhesive compounds
JPH06501775A (en) High voltage spark excitation and ionization detection system
Fandino et al. Plasma regime transition in a needle-FAPA desorption/ionization source

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant