CN107068532A - A kind of electron impact ionization source - Google Patents
A kind of electron impact ionization source Download PDFInfo
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- CN107068532A CN107068532A CN201710196165.4A CN201710196165A CN107068532A CN 107068532 A CN107068532 A CN 107068532A CN 201710196165 A CN201710196165 A CN 201710196165A CN 107068532 A CN107068532 A CN 107068532A
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- filament
- electron impact
- impact ionization
- ionization source
- ionisation chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Tubes For Measurement (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
The invention provides a kind of electron impact ionization source, including:Feedthrough flange assembly and electron impact ionization source component;Feedthrough flange assembly includes:Include several screwed holes for being used to fix electron impact ionization source component on one standard flange and multiple feed through pole, standard flange;Feed through pole is cylindrical metallic rod, and feed through pole passes axially through standard flange;Feed through pole layout and the lead electrode outlet layout of electron impact ionization source component on feedthrough flange assembly are corresponded, and the lead electrode outlet of the feed through pole on feedthrough flange assembly and electron impact ionization source component passes through directly to realizing electrical communication by way of inserting;Electron impact ionization source component includes:Ion gun pedestal, ionisation chamber, two filament parts, repeller electrode, lens group, heater, temperature sensor, temperature controller and a pair of magnet.The electron impact ionization volume source that the present invention is provided is smaller, and function is more complete, easily can be integrated into portable mass spectrometer.
Description
Technical field
The present invention relates to mass spectrometry art field, and in particular to a kind of electron impact ionization source.
Background technology
Mass spectrograph be research material constitute substantially, one of architectural feature, physics and the most basic instrument of chemical property, be raw
The requisite instrumentation in the fields such as life science, material science, food security, environmental protection, is the core of Modern Analytical Instrument.Its essence
It is by a kind of spectral method detected after their mass-to-charge ratio separation using electric field and/or magnetic field by the ion of motion.It is logical
Cross measurement ion exact mass can determine that the compound group of ion into.It is mainly used in the Structural Identification of compound, its energy
The structural informations such as the molecular weight, element composition and functional group of compound are provided.Its analyst coverage is extensive, it is adaptable to gas, liquid
Body and solid;Its analyze speed is fast, sensitivity is high, amount of samples is small;It can directly qualitative analysis;By various separation hands
Section, can also carry out accurate quantitative analysis to complex compound.Because these mass spectrometric features, it, which is widely used in, organises
The fields such as, biology, geochemistry, nuclear industry, material science, environmental science, medical hygiene, Food Chemistry, petrochemical industry
And the special analysis field such as space technology and public security work.Mass spectrograph is divided into magnetic substance spectrum according to the difference of mass analyzer
Instrument, time of-flight mass spectrometer, QMS (including quadrupole mass spectrometer and ion trap mass spectrometer), Fourier cyclotron resonance matter
Spectrometer, orbit ion trap mass spectrograph, and various hybridization mass spectrographs etc..
Most of mass spectrographs belong to Large-Scale Precision Instrument and Equipment, are typically mounted in laboratory and are operated and used.And
The Site Detection such as military operation, industrial production, accident rescue field proposes the thriving demand of miniaturization to mass spectrograph, portable
Mass spectrometric research and development turn into study hotspot.QMS is because small volume, simple in construction, technology relative maturity, with low cost
And as a kind of one of most widely used mass spectrograph, this also becomes the first choice of portable mass spectrometer development.
One QMS is generally by sampling system, ion gun, quadrupole rod mass analyzer, detector, vacuum system
With the system such as data processing composition.As depicted in figs. 1 and 2.Ion gun is to make neutral atom or molecular ionization, and therefrom draw from
The device of beamlet stream, it is an essential part of mass spectrograph.Wherein, the ion gun for QMS, common
There are electron impact ionization (EI) source, chemical ionization source, ultraviolet light ionization ion source, glow discharge source, electric spray ion source, air
Press chemical ionization source etc..Although the application of various atmospheric pressure ionizationions is more and more, using most extensively, be also most basic
Be still electron impact ionization source, commercial standard spectrogram is exactly the electron bombardment electricity using standard ionization condition, i.e. 70eV
Obtained from source ionization.
Electron impact ionization (EI) source generally by ionisation chamber, filament, receiving pole, repeller electrode, pull out lens, condenser lens,
Evict lens composition from, as shown in Figure 3.Filament heating power produces electronics, and electronics forms (high energy) electricity at a high speed under electric field action
Beamlet, electron beam is received through ionisation chamber and by receiving pole, during electronics passes through ionisation chamber, electron beam bombardment ionisation chamber
In sample, so as to produce electronics and molecular ion M+, M+ continues to be caused fracture or the molecule of chemical bond by electron bombardment
Reset, moment produces different kinds of ions.Ion in repeller electrode, pull out lens, condenser lens and evict from the presence of lens by from electricity
Pull out, focus on and evict from from room, so as to be analyzed for next step.
But the current general volume in electron impact ionization (EI) source is larger, is poorly suitable for small portable mass spectrograph.
The content of the invention
For defect of the prior art, the present invention provides a kind of electron impact ionization source, and the electronics that the present invention is provided bangs
Ionization source small volume is hit, function is more complete, easily can be integrated into portable mass spectrometer.
To solve the above problems, the invention provides following technical scheme:
A kind of electron impact ionization source, including:Feedthrough flange assembly and electron impact ionization source component;
The feedthrough flange assembly includes:Include on one standard flange and multiple feed through pole, the standard flange
Several are used for the screwed hole for fixing the electron impact ionization source component;The feed through pole is the metallic rod of cylinder, institute
State feed through pole and pass axially through the standard flange, and the electric insulation between standard flange;On the feedthrough flange assembly
Feed through pole layout corresponded with the lead electrode outlet of electron impact ionization source component layout, and the feedthrough method
The lead electrode outlet of feed through pole and the electron impact ionization source component on blue component is real by way of directly to inserting
Existing electrical communication;
The electron impact ionization source component includes:Ion gun pedestal, ionisation chamber, two filament parts, repeller electrode, lens
Group, heater, temperature sensor, temperature controller and a pair of magnet;
Wherein, the ion gun pedestal is used to carry the electron impact ionization source component;
The ionisation chamber is the cavity structure of open at one end, and described two filament parts are oppositely arranged on the ionisation chamber
Outside side wall, for producing the electronics with preset energy, the electronics of generation passes through the electricity that is arranged on the wall of the ionisation chamber side
Sub- entrance aperture enters inside the ionisation chamber, enters the ionization to the sample introduction aperture by being arranged on the wall of the ionisation chamber side
The sample of chamber interior is bombarded, and sample is transformed into electrically charged ion, and the ion of generation is in the repeller electrode and described
Evict from the one end opened wide in the presence of microscope group from the ionisation chamber;Wherein, the repeller electrode is arranged on the ionisation chamber and not opened wide
One end, the lens group is arranged on the unlimited one end of the ionisation chamber, and the repeller electrode is oppositely arranged with the lens group, and
It is vertical with the direction that described two filament parts are oppositely arranged;Wherein, the electron impact hole and the sample introduction aperture are in 90 degree
Position relation;
The heater, is arranged on one end that the ionisation chamber is not opened wide, for being heated to the ionisation chamber;
The temperature sensor, is arranged on the side-wall outer side of the ionisation chamber, the temperature for measuring the ionisation chamber;
The temperature controller, trip temperature control is entered for the temperature according to the temperature sensor measurement to the heater
System;
The pair of magnet, is oppositely arranged on the side-wall outer side of the ionisation chamber, for being produced inside the ionisation chamber
Magnetic field.
Further, the filament part includes:Filament base, filament, two filament electrodes, filament catch and ceramics are small
Pipe;
Wherein, two filament electrodes are fixed on the filament base by the technique of sealing-in, and with the filament base
Keep insulation;
The two ends of the filament are put respectively to be welded on two filament electrodes, and the filament catch is placed in the dorsal part of filament, and
One end welding is wherein on a filament electrode;Wherein, another filament electrode is wrapped with ceramic tubule, for preventing the lamp
Silk electrode is contacted with the filament catch.
Further, the filament is shaped as a diameter of 1mm, and spiral spacing is spiral-shaped for 0.5mm's.
Further, electric insulation is realized by repeller electrode felt pad between the repeller electrode and the ionisation chamber.
Further, the lens group includes three ion lens, respectively pull out electrode lens, focusing electrode lens and
Evict electrode lens from, the centre of this three plate electrodes lens is drum-shaped structure, and keep concentric, pass through ceramics each other
Existing concentric locating and insulation are padded, the lens group is fixed by screws on the ion gun pedestal.
Further, the pair of magnet is a pair of cylinder NS magnet, and the first magnet is arranged on filament part
Outside, the second magnet is arranged on the outside of another filament part, and the N poles of the first magnet are oppositely arranged with the S poles of the second magnet.
Further, the heater is ceramic heating flake;The ceramic heating flake is tied using the square of central aperture
Structure, central aperture part is used to the lead electrode of the repeller electrode is partially passed through.
Further, the temperature sensor is the ceramic mould RTD of laminated structure, solid using nut and spring shim
Due on the side wall of the ionisation chamber.
Further, the quantity of the screwed hole on the standard flange for fixing the electron impact ionization source component is
2~4.
Further, be additionally provided with the conical opening for sample introduction on the outside of the ionisation chamber, the conical opening with it is described enter
Sample aperture is communicated, and realizes the sample introduction of sample.
As shown from the above technical solution, the electron impact ionization source that the present invention is provided, using standard flange as carrier, is expanded
The use scope in electron impact ionization source.Further, since containing magnet device, heating element heater in electron impact ionization source component
And temperature element, therefore there is increase ionizing efficiency simultaneously and ensure that ion gun is clean and improve the advantage of contamination resistance,
And the arrangement of magnet device, heating element heater and temperature element is simple and reliable, while more saving volume.Further, exist
In the electron impact ionization source that the present invention is provided, the feed through pole of feedthrough flange assembly and the electron impact ionization source component
The outlet of lead electrode is direct to realizing electrical communication by way of inserting contact pin, so that the use of cable has been reduced as far as,
The welding between cable or thread connecting mode are it also avoid, has not only been facilitated but also reliable, while also saving volume.By being analyzed above
Understand, the electron impact ionization source that the present invention is provided, small volume, function is more complete, can be used as an ion gun separate standards
Part, with good compatibility, can very easily be integrated into portable mass spectrometer system.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the accompanying drawing used required in technology description to be briefly described, it should be apparent that, drawings in the following description are the present invention
Some embodiments, for those of ordinary skill in the art, on the premise of not paying creative work, can also basis
These accompanying drawings obtain other accompanying drawings.
Fig. 1 is the structure composition block diagram of QMS in the prior art;
Fig. 2 is the structural representation of QMS in the prior art;
Fig. 3 is the structural representation in electron impact ionization source in the prior art;
Fig. 4 is the structural representation in the electron impact ionization source that one embodiment of the invention is provided;
Fig. 5 a and Fig. 5 b are the structural representations for the feedthrough flange assembly 401 that one embodiment of the invention is provided;Wherein, Fig. 5 b
It is Fig. 5 a side view;
Fig. 6 a and Fig. 6 b are the structural representations for the son bombardment ionization source component 402 that one embodiment of the invention is provided;Wherein,
Fig. 6 a are Fig. 6 b side views;
Fig. 7 is the structural representation for the lens group 605 that one embodiment of the invention is provided;
Fig. 8 is the structural representation for the filament part 603 that one embodiment of the invention is provided;
Fig. 9 is feed through pole and electron impact ionization source on the feedthrough flange assembly 401 that one embodiment of the invention is provided
The lead electrode outlet of component 402 by car pin 901 directly realize the structural representation of electrical communication to inserting.
Embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below in conjunction with the embodiment of the present invention
In accompanying drawing, clear, complete description is carried out to the technical scheme in the embodiment of the present invention, it is clear that described embodiment is
A part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art
The every other embodiment obtained under the premise of creative work is not made, belongs to the scope of protection of the invention.
One embodiment of the invention provides a kind of electron impact ionization source, referring to Fig. 4, electronics provided in an embodiment of the present invention
Ionization source is bombarded, including:Feedthrough flange assembly 401 and electron impact ionization source component 402;
Referring to Fig. 5 a and Fig. 5 b, the feedthrough flange assembly 401 includes:One standard flange 501 and multiple feed through pole
502, several screwed holes for being used to fix the electron impact ionization source component 402 are included on the standard flange 501
503;The feed through pole 502 is cylindrical metallic rod, and the feed through pole 502 passes axially through the standard flange 501,
And between standard flange 501 electric insulation;Feed through pole layout and the electron bombardment on the feedthrough flange assembly 401
The lead electrode outlet layout for ionizing source component 402 is corresponded, and referring to Fig. 9, the feedthrough on the feedthrough flange assembly 401
The lead electrode outlet of electrode and the electron impact ionization source component 402 is direct to realizing electricity by way of inserting car pin 901
Gas is connected, and has so been reduced as far as the use of cable, it also avoid the welding between cable or thread connecting mode, i.e. side
Just it is again reliable, while also saving volume.Preferably, the car pin 901 is 2 logical to plugging in car pin.
In the present embodiment, feedthrough flange assembly 401 can both be fixed as the installation of electron impact ionization source component 402
With flange, meanwhile, again can as the power on signal of electron impact ionization source component 402 feedthrough joint so that shown in Fig. 4
Electron impact ionization source can be used as an ion gun separate standards part.Wherein, 501 made using standard flange, increase should
The scope of application of ion gun.It can both use rubber seal, can also use metal sealing form, such as KF40,
DN63ISO-K, DN40CF etc..Feed through pole 502 is the electrode for realizing ion gun power on signal feedthrough, and it passes through mark
Quasi- flange 501, to be fixed in the form of vacuum seal on standard flange 501, it is electric insulation between standard flange 501,
Pressure-resistant more than 1KV, while ensureing vacuum sealing again, its leak rate should be less than 1.0 × 10-10Pa·m3/s.Feed through pole 502 is circle
Cylindrical electrode, quantity is depending on the requirement of ion gun power on signal, in the present embodiment, and quantity is 12, this 12 electrodes according to
Certain centre for being regularly distributed on standard flange 501.The diameter of feed through pole 502 generally takes 1-3mm, depending on the electricity flowed through above
Depending on the size of stream, and the size and required number of standard flange 501, a diameter of 1mm in this example.Its material is gold
Category, can be copper, 304 magnetism-free stainless steels, 316 magnetism-free stainless steels, kovar alloy etc..Have on standard flange 501 for fixing
The screwed hole 503 of electron impact ionization source component 402, quantity 2-4 is 2 M3 screwed holes in this example.
Referring to Fig. 6 a and Fig. 6 b, the electron impact ionization source component 402 includes:Ion gun pedestal 601, ionisation chamber 602,
Two filament parts 603, repeller electrode 604, lens group 605, heater 606, the temperature sensor 607, (figures of temperature controller 613
Not shown in) and a pair of magnet 608;
Wherein, the ion gun pedestal 601 is used to carry the electron impact ionization source component 402;
The ionisation chamber 602 is the cavity structure of open at one end, and described two filament parts 603 are oppositely arranged on the electricity
From the outside side wall of room, for producing the electronics with preset energy, the electronics of generation is by being arranged on the side of ionisation chamber 602
Electron impact hole 611 on wall enters inside the ionisation chamber 602, for by being arranged on the side wall of ionisation chamber 602
Sample introduction aperture 610 enter the ionisation chamber 602 inside sample bombarded, sample is transformed into electrically charged ion, production
Evict from one end that raw ion is opened wide in the presence of the repeller electrode 604 and the lens group 605 from the ionisation chamber 602;
Wherein, the repeller electrode 604 is arranged on one end that the ionisation chamber 602 is not opened wide, and the lens group 605 is arranged on the ionization
The unlimited one end in room 602, the repeller electrode 604 is oppositely arranged with the lens group 605, and with described two filament parts 603
The direction being oppositely arranged is vertical;Wherein, the electron impact hole 611 and the sample introduction aperture 610 are in 90 degree of position relation;
The heater 606, is arranged on one end that the ionisation chamber 602 is not opened wide, for being carried out to the ionisation chamber 602
Heating;
The temperature sensor 607, is arranged on the side-wall outer side of the ionisation chamber 602, for measuring the ionisation chamber 602
Temperature;
The temperature controller 613, for the temperature that is measured according to the temperature sensor 607 to the heater 606
Carry out temperature control;
The pair of magnet 608, is oppositely arranged on the side-wall outer side of the ionisation chamber 602, in the ionisation chamber 602
Inside produces magnetic field.
From the scheme recorded above, electron impact ionization source provided in an embodiment of the present invention, using standard flange as load
Body, expands the use scope in electron impact ionization source.Further, since containing magnet member in electron impact ionization source component
Part, heating element heater and temperature element, therefore there is increase ionizing efficiency simultaneously and ensure that ion gun is clean and improve antipollution
The advantage of ability, and the arrangement of magnet device, heating element heater and temperature element is simple and reliable, while more saving volume.
Further, in electron impact ionization source provided in an embodiment of the present invention, the feed through pole of feedthrough flange assembly and the electricity
The lead electrode outlet of son bombardment ionization source component is direct to realizing electrical communication by way of inserting contact pin, so that as much as possible
The use of cable is reduced, the welding between cable or thread connecting mode is it also avoid, that is, facilitated and reliable, while also saving
Volume.From being analyzed above, electron impact ionization source provided in an embodiment of the present invention, small volume, function is more complete, can be with
As an ion gun separate standards part, with good compatibility, can very easily it be integrated into portable mass spectrometer system.
In a kind of optional embodiment, referring to Fig. 8, the filament part 603 includes:Filament base 801, filament 802,
Two filament electrodes 803 and 804, filament catch 805 and ceramic tubule 806;
Wherein, two filament electrodes 803 and 804 are fixed on the filament base 801 by the technique of sealing-in, and with institute
State filament base 801 and keep insulation;
For example, filament base 801 can use the metal material systems such as 304 stainless steels, 316L stainless steels or kovar alloy
Into can also be made of ceramic materials.Filament electrode 803 and 804 is fixed on filament base 801 by the technique of sealing-in, such as
Fruit filament base 801 is made up of metal material, then must be using glass envelope between filament electrode 803 and 804 and filament base 801
Connect or crunch seal form, electric insulation between 803 and 804 and 801 must be ensured.If filament base 801 is by ceramic material
Material is made, then any form of sealing-in is used between filament electrode 803 and 804 need and filament base 801, but must ensure
It is electric insulation between 803 and 804.
Referring to Fig. 8, further, the two ends of the filament 802 are put respectively to be welded on two filament electrodes 803 and 804, institute
The dorsal part that filament catch 805 is placed in filament 802 is stated, and one end is welded on a filament electrode (such as filament electrode 803) wherein;
Wherein, another filament electrode (such as filament electrode 804) is wrapped with ceramic tubule 806, for prevent the filament electrode 804 with
The filament catch 805 is contacted.
Here, the material of filament 802 generally selects tungsten filament, rhenium silk, iridium wire or rhenium tengsten lamp material and is made, and its profile can
To be thread or sheet, its can for it is linear can also be spiral.Select thread in the present embodiment, and
In order to increase the yield of electronics, by filament winding into diameter 1mm, spiral spacing 0.5mm's is spiral-shaped.Wherein, filament 802
Two ends are put respectively to be welded on filament electrode 803 and 804.Filament catch 805 is placed in the rear portion of filament 802, and end point is welded in
On filament electrode 803.In order to prevent filament catch 805 from being contacted with another filament electrode 804, covered on another filament electrode 804
Upper one ceramic tubule 806.It is understood that filament part 603 is when installing, it must ensure that filament 802 is just placed in
The center in electron impact hole 611, and maintained a certain distance with the outer wall in electron impact hole 611, it is generally spaced left in 1-2mm
It is right.In the present embodiment, as a result of double filamentray structures, therefore, opened two small on the cylindrical wall of ionisation chamber 602
Between hole, hole diameter 1-3mm, it can be circular hole, can be elliptical aperture or rectangular opening, depending on the structure of filament.
In a kind of optional embodiment, referring to Fig. 6 a, by pushing away between the repeller electrode 604 and the ionisation chamber 602
Pole felt pad 609 is denounceed to realize electric insulation.
In a kind of optional embodiment, referring to Fig. 7, the lens group 605 includes three ion lens, respectively pulls out
Electrode lens 701, focusing electrode lens 702 and evict electrode lens 703 from, the centre of this three plate electrodes lens is drum-shaped knot
Structure, and keep concentric, concentric locating and insulation are realized by ceramic blanket 704 each other, the lens group 605 passes through screw
705 are fixed on the ion gun pedestal 601.
In a kind of optional embodiment, in order to increase the motion path of electronics, so that ionizing efficiency is improved, in ionisation chamber
Side-wall outer side, more specifically, in close proximity to the outside of filament part 603, referring to Fig. 6 a, in the outside of filament part 603)
1 cylinder-shaped magnet 608 is placed respectively.The relative side of the two magnet is respectively different polarity, i.e. N extremely to S poles.
In a kind of optional embodiment, the heater 606 uses ceramic heating flake, that is, passes through ceramic heating flake 606
Ionisation chamber 602 is heated, ceramic heating flake can use the square structure of central aperture.Just may be used central aperture part
To allow the lead electrode of repeller electrode 604 to partially pass through, the heating to ionisation chamber 602 can be so played, repeller electrode can be realized again
Electric insulation effect between 604 and ionisation chamber 602.
In a kind of optional embodiment, the temperature sensor 607 is using the ceramic mould RTD of laminated structure, sheet
The resistance of structure is easily installed on the outside of ionisation chamber, for example, nut and spring shim can be used to be locked.
In a kind of optional embodiment, the conical opening 612 for sample introduction is additionally provided with the outside of the ionisation chamber, it is described
Conical opening 612 is communicated with the sample introduction aperture 610, realizes the sample introduction of sample.
Referring to Fig. 5 a, Fig. 5 b, Fig. 6 a and Fig. 6 b, in the present embodiment, one has 12 tunnel electric signals, is 3 roads electricity respectively
Sub-lens, 2 groups of totally 4 street lamps silk, the heating of 2 tunnels, 2 channel Temperature Measurings, 1 road ion repulsions.This 12 tunnel electric signal passes through cable and feedthrough
Feed through pole 502 on flange assembly 401 is connected.Because whole ion gun is operated in high vacuum environment, it should try one's best and avoid cable
Deflation brought etc. is unfavorable for the factor of vacuum, therefore, and cable used should be constituted from the material of low deflation rate, prevent tin
The techniques such as weldering.In the present embodiment, it is preferred to use the mode of car pin.Meanwhile, in order to reduce the use of cable as far as possible, from
In the lead and feedthrough flange assembly 401 of component in the layout of feed through pole 502, by the way of directly to inserting, so as to avoid
The use of cable, and electrical communication is disposably directly realized using car pin.As shown in figure 9, car pin 901 is 2 logical to plugging in car pin,
All welding and threaded connection are avoided, that is, are facilitated and reliable, while saving volume.
Specifically, electron impact ion source connects 1-3A electric current when work on filament 802, and filament is powered
After generate heat, produce electronics.The electric field that electronics is formed between filament catch 805 and ion gun ionisation chamber 602, and two magnet
It is threadingly advanced under 608 magnetic fields formed.Electronics enters after ionisation chamber 602, and small by conical opening 612 and sample introduction
Hole 610 is collided between entering the gas molecule of ionisation chamber, so that gas molecule be ionized.The ion being dissociated ionisation chamber 602,
Under repeller electrode 604, the common electric field action of lens group 605.It is drawn out, focus on and evicts from.In order to ensure the clean of ion gun and
Contamination resistance is improved, is powered on ceramic heating flake and ionisation chamber 602 is heated, at the same time, pass through temperature sensor
607 pairs of ion source temperatures are monitored, and realize the control to ceramic heating flake by external temperature controller 613, so that
Realize the thermometric and temperature control to ion source temperature.
In the description of the invention, it is necessary to illustrate, herein, such as first and second or the like relational terms
It is used merely to make a distinction an entity or operation with another entity or operation, and not necessarily requires or imply these
There is any this actual relation or order between entity or operation.Moreover, term " comprising ", "comprising" or its is any
Other variants are intended to including for nonexcludability, so that process, method, article or equipment including a series of key elements
Not only include those key elements, but also other key elements including being not expressly set out, or also include being this process, side
Method, article or the intrinsic key element of equipment.In the absence of more restrictions, limited by sentence "including a ..."
Key element, it is not excluded that also there is other identical element in the process including the key element, method, article or equipment.
Above example is merely to illustrate technical scheme, rather than its limitations;Although with reference to the foregoing embodiments
The present invention is described in detail, it will be understood by those within the art that:It still can be to foregoing each implementation
Technical scheme described in example is modified, or carries out equivalent substitution to which part technical characteristic;And these are changed or replaced
Change, the essence of appropriate technical solution is departed from the spirit and scope of various embodiments of the present invention technical scheme.
Claims (10)
1. a kind of electron impact ionization source, it is characterised in that including:Feedthrough flange assembly and electron impact ionization source component;
The feedthrough flange assembly includes:Include some on one standard flange and multiple feed through pole, the standard flange
The individual screwed hole for being used to fix the electron impact ionization source component;The feed through pole is the metallic rod of cylinder, the feedback
Energization pole passes axially through the standard flange, and the electric insulation between standard flange;Feedback on the feedthrough flange assembly
The lead electrode outlet layout of logical electrode lay-out and the electron impact ionization source component is corresponded, and the feedthrough flange group
The lead electrode outlet of feed through pole and the electron impact ionization source component on part passes through directly to realizing electricity by way of inserting
Gas is connected;
The electron impact ionization source component includes:Ion gun pedestal, ionisation chamber, two filament parts, repeller electrode, lens group,
Heater, temperature sensor, temperature controller and a pair of magnet;
Wherein, the ion gun pedestal is used to carry the electron impact ionization source component;
The ionisation chamber is the cavity structure of open at one end, and described two filament parts are oppositely arranged on the outside of the ionisation chamber
Side wall, for producing the electronics with preset energy, the electronics of generation is entered by the electronics being arranged on the wall of the ionisation chamber side
Perforation enters inside the ionisation chamber, and the sample introduction aperture by being arranged on the wall of the ionisation chamber side is entered in the ionisation chamber
The sample in portion is bombarded, and sample is transformed into electrically charged ion, the ion of generation is in the repeller electrode and the lens group
In the presence of from the ionisation chamber open wide one end evict from;Wherein, the repeller electrode is arranged on not unlimited one of the ionisation chamber
End, the lens group is arranged on the unlimited one end of the ionisation chamber, and the repeller electrode is oppositely arranged with the lens group, and with institute
State the direction that two filament parts are oppositely arranged vertical;Wherein, the electron impact hole and the sample introduction aperture are in 90 degree of side
Position relation;
The heater, is arranged on one end that the ionisation chamber is not opened wide, for being heated to the ionisation chamber;
The temperature sensor, is arranged on the side-wall outer side of the ionisation chamber, the temperature for measuring the ionisation chamber;
The temperature controller, temperature control is carried out for the temperature according to the temperature sensor measurement to the heater;
The pair of magnet, is oppositely arranged on the side-wall outer side of the ionisation chamber, for producing magnetic field inside the ionisation chamber.
2. electron impact ionization source according to claim 1, it is characterised in that the filament part includes:Filament base,
Filament, two filament electrodes, filament catch and ceramic tubule;
Wherein, two filament electrodes are fixed on the filament base by the technique of sealing-in, and are kept with the filament base
Insulation;
The two ends of the filament are put respectively to be welded on two filament electrodes, and the filament catch is placed in the dorsal part of filament, and one end
Welding is wherein on a filament electrode;Wherein, another filament electrode is wrapped with ceramic tubule, for preventing filament electricity
Pole is contacted with the filament catch.
3. electron impact ionization source according to claim 2, it is characterised in that the filament is shaped as a diameter of 1mm,
Spiral spacing is spiral-shaped for 0.5mm's.
4. electron impact ionization source according to claim 1, it is characterised in that between the repeller electrode and the ionisation chamber
Electric insulation is realized by repeller electrode felt pad.
5. electron impact ionization source according to claim 1, it is characterised in that it is saturating that the lens group includes three ions
Mirror, respectively pulls out electrode lens, focusing electrode lens and evicts electrode lens from, the centre of this three plate electrodes lens is drum
Shape structure, and keep concentric, concentric locating and insulation are realized by ceramic blanket each other, the lens group is solid by screw
It is scheduled on the ion gun pedestal.
6. electron impact ionization source according to claim 1, it is characterised in that the pair of magnet is a pair of cylinder NS
Magnet, the first magnet is arranged on the outside of a filament part, and the second magnet is arranged on the outside of another filament part, first
The N poles of magnet are oppositely arranged with the S poles of the second magnet.
7. electron impact ionization source according to claim 1, it is characterised in that the heater is ceramic heating flake;Institute
The square structure that ceramic heating flake uses central aperture is stated, central aperture part is used for the lead electrode for causing the repeller electrode
Partially pass through.
8. electron impact ionization source according to claim 1, it is characterised in that the temperature sensor is laminated structure
Ceramic mould RTD, is fixed on the side wall of the ionisation chamber using nut and spring shim.
9. electron impact ionization source according to claim 1, it is characterised in that be used on the standard flange fixed described
The quantity of the screwed hole of electron impact ionization source component is 2~4.
10. electron impact ionization source according to claim 1, it is characterised in that be additionally provided with the outside of the ionisation chamber
For the conical opening of sample introduction, the conical opening is communicated with the sample introduction aperture, realizes the sample introduction of sample.
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CN108231529A (en) * | 2018-03-09 | 2018-06-29 | 威海蓝膜光热科技有限公司 | Low pressure magnetic control cathode ion source |
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CN108760074A (en) * | 2018-07-16 | 2018-11-06 | 深圳大学 | A kind of temperature collecting device of neutron detector |
CN110137071A (en) * | 2019-05-24 | 2019-08-16 | 中国计量科学研究院 | Split type process mass spectrograph |
CN111053978A (en) * | 2019-12-26 | 2020-04-24 | 上海联影医疗科技有限公司 | Ionization chamber and method for controlling temperature of ionization chamber |
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