CN107065449A - Exposure sources and exposure method - Google Patents
Exposure sources and exposure method Download PDFInfo
- Publication number
- CN107065449A CN107065449A CN201710253382.2A CN201710253382A CN107065449A CN 107065449 A CN107065449 A CN 107065449A CN 201710253382 A CN201710253382 A CN 201710253382A CN 107065449 A CN107065449 A CN 107065449A
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- light
- light path
- reflector element
- semi
- path
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
Abstract
The invention discloses a kind of exposure sources and exposure method.Exposure sources include light source cell, light processing unit, the first reflector element and the second reflector element.The light source cell is used for the light of outgoing first in the first direction and forms the first light path.First reflector element, which is arranged in the first light path, to be used to receive the first light and reflexes to the second light transmitted in a second direction, and second light is used to be exposed for the first element, and the second direction is different from first direction.Second reflector element is arranged in first light path with the distance of the first reflector element interval first, the first light is exported in the first direction for being received from first reflector element, and second direction the 3rd light of formation is reflexed to, the 3rd light is used to be exposed for the second element.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, more particularly to a kind of expose for touch-control or substrate for display
Proximity printing equipment.
Background technology
Display device has been widely used in each field, and the display panel employed in existing display device exists
It is required to be exposed processing to the Rotating fields being arranged on substrate using exposure sources during making.The exposure sources used lead to
It is often proximity printing equipment.Specifically, exposed using proximity printing equipment on substrate and form predetermined pattern.
With the raising of the resolution ratio and size of display panel, cause the quantity of pixel cell in display panel larger, from
And cause the Production Time extension of display panel, however, existing proximity printing equipment every time only can be for a substrate
It is exposed, causes exposure efficiency smaller, so that display panel production requirement can not be met.
The content of the invention
To solve foregoing problems, the present invention provides a kind of exposure efficiency higher exposure sources.
Further there is provided a kind of higher exposure method of exposure efficiency.
A kind of exposure sources, including light source cell, the first reflector element and the second reflector element.The light source cell is used
In the light of outgoing first in the first direction and the first light path of formation.First reflector element is arranged in the first light path, is used for
First light simultaneously reflexes to the second light transmitted in a second direction, and second light is used to carry out for the first element
Exposure, the second direction is different from the first direction.Second reflector element and the first reflector element interval the
One distance is arranged in first light path, for receiving export in the first direction described first from first reflector element
Light, and the 3rd light of the second direction formation is reflexed to, the 3rd light is used to be exposed for the second element.
A kind of exposure method, including step：
The light of outgoing first, and form the first light path in the first direction；
First light is reflected to second direction, and forms the first light, and second light is used to be directed to first
Element is exposed, and the second direction is different from first direction；
The distance of interval first reflects first light to the second direction in a first direction, is formed along the second party
To the 3rd light of transmission, the 3rd light is used to be exposed for the second element.
Compared to prior art, exposure sources can be exposed processing for two elements to be exposed simultaneously, effectively
Improve exposure efficiency.
Further, due to having two mutual exposure light paths in exposure sources, therefore phase is set in two exposure light paths
The mask of same or different pattern, so as to expose the element of different pattern simultaneously.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the accompanying drawing used required in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the structural representation of exposure sources in one embodiment of the invention.
Fig. 2 changes the structural representation of the first reflector element in embodiment for the present invention one.
Fig. 3 is the exposure method flow chart of exposure sources as shown in Figure 1.
Embodiment
Below in conjunction with the accompanying drawings, the substrate bearing device of the present invention is elaborated.
Referring to Fig. 1, it is the structural representation of exposure sources in one embodiment of the invention.As shown in figure 1, exposure sources
10 include light source cell 11, light processing unit 12, the first reflector element 13, the second reflector element 14, the first translucent element 15
And second translucent element 16.
The light of the X outgoing exposure along a first direction of light source cell 11, and the first light path L1 is formed in a first direction.Its
In, light processing unit 12, the first reflector element 13 and the second reflector element 14 are set in turn in first spaced a predetermined distance
On light path L1.Wherein, light processing unit 12 is arranged on the first light path L1, is entered for the light for the outgoing of light source cell 11
Row Homogenization Treatments, the first reflector element 13 and the second reflector element 14 are spaced the first distance.
First reflector element 13 is used to receive the first light after the Homogenization Treatments of light processing unit 12, and its is anti-
The second light of Y transmission in a second direction is incident upon, and constitutes the second light path L2.Wherein, second light is used for for the
One element P1 is exposed, and the second direction X is different from first direction Y.It is preferred that first direction X and second direction Y are mutual
Vertically.
Second reflector element 14 is used for from first the reflector element 13 along a first direction homogenization of X outgoing
The first light after reason, and the 3rd light of Y transmission in a second direction is reflexed to, and constitute the 3rd light path L3.Institute
Stating the 3rd light is used to be exposed for the second element P2.
In the present embodiment, the first element P1 and the second element P2 are the display panel of semi-finished product, and the first element P1 with
Second element P2 is respectively positioned on plummer (not indicating), and the plummer corresponds respectively to the second light path L2 and the 3rd light
Road L3.
First transmissive element 15 and the first reflector element 13 is spaced apart is arranged on the second light path L2, for controlling
From the second light of the outgoing of the first reflector element 13 along precalculated position outgoing.Accordingly, the second transmissive element 16 and the second reflection
Unit 14 is spaced apart to be arranged on the 3rd light path L3, for controlling the second light edge from the outgoing of the second transmitter unit 14
Precalculated position outgoing.
In the present embodiment, light source cell 11 includes light emitting source 110, the level crossing of concave reflection condenser 111 and first
112.Wherein, light emitting source 110 is used in the light of outgoing exposure, the present embodiment, and the light emitting source 110 is high-pressure mercury-vapor lamp,
The light of the exposure is ultraviolet.Certainly, in this anti-other embodiment, the light of exposure can also be deep UV
Deng being not limited thereto.
The concave surface transmitting level crossing 112 of condenser 111 and first is arranged at the opposite sides of light emitting source 110, and concave surface is launched
Condenser 111 is set adjacent to light emitting source 110, for being converged the light of the outgoing of light emitting source 110 and reflexing to the first plane
Mirror 112, to improve the utilization rate of light.First level crossing 112 is used to be received from the light emitting source 110 and concave surface transmitting
The light of condenser 111 simultaneously reflexes to first direction, so as to form the first light and constitute the first light path L1., wherein it is desired to say
Bright, the direction of the emergent ray of light emitting source 110 is basically perpendicular to first direction.
Light processing unit 12 is used to carry out Homogenization Treatments for the first light, and the first light is processed as entirely
Portion X along a first direction light is exported.In the present embodiment, light processing unit 12 is directional light convex lens array (Fly
eyes)。
First reflector element 13 is partly penetrates half radiated element, for by after the Homogenization Treatments of light processing unit 12
A first light part reflexes to first direction the second light of formation, and another part is uniform through light processing unit 12
The first light after change processing continues on first direction X and transmitted to the second reflector element 14.In the present embodiment, the first reflection is single
Member 13 is partly to penetrate half transmitting eyeglass.
A first light part after the Homogenization Treatments of light processing unit 12 is reflexed into first direction formation second
Light, and first light of the another part after the Homogenization Treatments of light processing unit 12 is continued on into first direction biography
Transport to the second reflector element 14.In the present embodiment, the first reflector element 13 is partly to penetrate half transmitting eyeglass.
First translucent element 15 and the first reflector element 13 is spaced apart is arranged on the second light path L2, to cause
Two light are carried out in precalculated position in outgoing, the present embodiment, and the first translucent element 15 is with opening on the second light path L2
The lens element of mouth or through hole, the first translucent element 15 causes position of second light only from the opening or through hole to wear
Cross, by controlling the area of the opening or through hole to be easy to preferably control the second light path L2 luminous flux.
Second reflector element 14 is the second level crossing, for by from the first reflector element 13 in the first direction X outputs the
One light reflexes to second direction Y shape into the 3rd light, constitutes the 3rd light path L3.
Second translucent element 16 and the first reflector element 14 is spaced apart is arranged on the 3rd light path L3, to cause
Three light are carried out in precalculated position in outgoing, the present embodiment, and the second translucent element 16 is with opening on the 3rd light path L3
The lens element of mouth or through hole, the second translucent element 16 causes position of second light only from the opening or through hole to wear
Cross, by controlling the area of the opening or through hole to be easy to preferably control the 3rd light path L3 luminous flux.
It is preferred that the exposure sources also include the first mask plummer 17 and the second mask plummer 18, the first mask
Plummer 17 is used to carry the first mask 31, and the first mask 31 has the first pattern；The second mask plummer 18 is used to hold
The second mask 32 is carried, the second mask 32 has the second pattern.Wherein, corresponding first pattern of the first mask 31 and the second mask 32
Corresponding second pattern can be with identical, can also be different.
First mask plummer 17 is correspondingly arranged on the second light path L2, and is received from first light transmitting cells 15 certainly
The second light that precalculated position is transmitted.Second mask plummer 18 is arranged on the 3rd light path L3, and is received from described
The 3rd light that two 16 yuan of printing opacity lists are transmitted from precalculated position.First mask 31 and second of the first mask plummer 17 carrying
The second mask 32 that mask plummer 18 is carried is exposed for the first element P1 and the second element P2 respectively.In addition,
When exposure sources 10 are exposed for the first element P1 and the second element P2, by the first element P1 according to the first mask 17
It is spaced apart to be arranged on the second light path L2；Meanwhile, by the second element P2 according to spaced apart with the second mask 18
It is arranged on the 3rd light path L3.Then starting light source cell 11 makes it according to predetermined light path emergent ray, so as to first yuan
Part P1 and the second element P2 carries out the exposure-processed of corresponding pattern.
Compared to prior art, exposure sources 10 can be exposed processing for two elements to be exposed simultaneously, have
Effect improves exposure efficiency.Further, due to having two mutual exposure light path L2, L3 in exposure sources 10, therefore two
Individual exposure light path L2, L3 set the mask of identical or different pattern, so as to expose the element of different pattern simultaneously.
Referring to Fig. 2, it changes the structural representation of the first reflector element in embodiment for the present invention one.
As shown in Fig. 2 the first reflector element 13 includes semi-penetration semi-reflective element 131, reflecting element 132 and transmission member
Part 133.Wherein, it is located at second light when semi-penetration semi-reflective element 131, reflecting element 132 and different transmissive element 133
On the L2 of road.It that is to say, when semi-penetration semi-reflective element 131 is located at the second light path L2, reflecting element 132 and transmissive element
133 and it is not located on the second light path L2；When reflecting element 132 be located at the second light path L2 when, semi-penetration semi-reflective element 131 and
Transmissive element 133 is simultaneously not located on the second light path L2；When transmissive element 133 is located at the second light path L2, semi-penetration semi-reflective member
Part 131 and reflecting element 132 are simultaneously not located on the second light path L2.It is appreciated that by by semi-penetration semi-reflective element 131,
Reflecting element 132 and transmissive element 133 are arranged in the way of 120 degree of angle symmetricals in a tumbler (not shown),
Tumbler by rotating foregoing three elements, every time rotate 120 degree when, you can by the semi-penetration semi-reflective element 131 of needs,
Reflecting element 132 and transmissive element 133 are arranged on the second light path L2.
When semi-penetration semi-reflective element 131 is located at the first light path L1, at the homogenization of light processing unit 12
The first light part after reason reflexes to second direction Y shape into the second light via semi-penetration semi-reflective element 131, and in addition one
Part penetrates the semi-penetration semi-reflective element 131 and transmitted to second reflector element 14 along a first direction.Accordingly, expose
Light device 10 can be exposed for two elements simultaneously, namely can be entered simultaneously for the first element P1 and the second element P2
Row exposure.
When reflecting element 132 is located at the first light path L1, via the after the Homogenization Treatments of light processing unit 12
One light all reflexes to second direction Y shape into second light via the reflecting element 132.Accordingly, exposure sources
10 can be exposed only for the first element P1.
When transmissive element 133 is located at the first light path L2, via the after the Homogenization Treatments of light processing unit 12
One light is then anti-via second all via being transmitted along a first direction after transmissive element 133 to second reflector element 14
The 3rd light path L2 that unit 14 reflexes to second direction is penetrated, the 3rd light is formed.Accordingly, exposure sources 10 can be only for second
Element P2 is exposed.
Ground is changed, transmissive element 133 can also be omitted, only using air as the propagation medium of the first light, that is to say
First reflector element 13 includes semi-penetration semi-reflective element 131 and reflecting element 132, and is not provided with transmissive element 133, and it is still
It can reach when semi-penetration semi-reflective element 131 is not located on the first light path L1 with reflecting element 132 so that via light
The first light after the Homogenization Treatments of processing unit 12 is all directly transferred to the second reflector element 14 so that exposure sources 10 are only
It is exposed for the second element P2.
Referring to Fig. 3, it is the exposure method flow chart of exposure sources as shown in Figure 1.As shown in figure 3, the exposure side
Method includes step：
Step 301：The light of X outgoing first, and form the first light path L1 in the first direction.
Specifically, driving light emitting source 110 launches light to the first level crossing 112 positioned at the first light path L1, meanwhile, concave surface
Mirror condenser 111, which is converged the light of the outgoing of light emitting source 110, also further reflexes to the first level crossing 112.First is anti-
Penetrate mirror 112 and the light that the light and concave reflection condenser 111 of the outgoing of light emitting source 110 of reception converge reflection is reflexed to
One direction, so as to form the first light path L1.
Step 302：First light described in Homogenization Treatments.
Specifically, the certain distance of the first speculum of distance 112 and be arranged at the first light path L1 light processing unit 12 will
First speculum 112 carries out Homogenization Treatments, and those light are transmitted each along first direction.
Step 303：The first light reflected after the Homogenization Treatments forms the second light path L2 to second direction Y,
Second light is used to be exposed for the first element P1 (Fig. 1), and the second direction Y is different from first direction Y.This reality
Apply the vertical first direction X of second direction Y in example.
Specifically, first reflector element 13 is set apart from the certain distance of light processing unit 12 in the first light path L1,
First reflector element 13 receives the first light after the Homogenization Treatments and reflexes to the second light transmitted in a second direction,
So as to constitute the second light path.
In the present embodiment, first reflector element 13 is semi-penetration semi-reflective element, the after the Homogenization Treatments
One light portion reflexes to second direction the second light of formation via the semi-penetration semi-reflective unit components, in addition a rim portion
The semi-penetration semi-reflective element transmission is penetrated along a first direction to second reflector element 14.
It is preferred that setting the first light transmitting cells in the certain distance of the first reflector element 13 described in the second light path L2 intervals
15, to control second light along precalculated position with predetermined luminous flux outgoing.
Accordingly, the first mask 31 with the first pattern is set on the second light path L2, to be received from described the
The second light that one light transmitting cells 15 are transmitted from precalculated position, to be carried out according to first pattern to the first element P1
Exposure.
Step 304：X intervals first are apart from the first light reflected after the Homogenization Treatments to described the in a first direction
Two directions, form the 3rd light transmitted along the second direction Y to constitute the 3rd light path L3, the 3rd light is used to be directed to
Second element P2 is exposed.
Specifically, second reflector element 14 is set apart from the distance of the first reflector element 13 first in the first light path L1,
The light received from first direction X is all reflexed into second direction Y shape into the 3rd light.Wherein, the second reflector element 14 is
Level crossing.
It is preferred that setting the second light transmitting cells in the certain distance of the second reflector element 14 described in the 3rd light path L3 intervals
16, to control the 3rd light along precalculated position outgoing.
Correspondence step 304, changes ground, and the first reflector element 13 includes semi-penetration semi-reflective element 131, reflecting element
132 and transmissive element 133, wherein, control semi-penetration semi-reflective element 131, reflecting element 132 and transmissive element 133 3
It is located at L1 in first light path when person is different.
The first light for controlling semi-penetration semi-reflective element 131 to be located at after the first light path L1, the Homogenization Treatments
Part reflexes to second direction Y shape into the second light via the semi-penetration semi-reflective element 131, constitutes the second light path L2, separately
X1 is transmitted to second reflector element 14 an outer part through semi-penetration semi-reflective element 131 along a first direction.
Control reflecting element 132 to be located at the first light path L1, the first light after the Homogenization Treatments all via
Reflecting element 132 reflexes to second direction and forms second light, constitutes the second light path L2.
The first light that transmissive element 133 is located at after the first light path L1, the Homogenization Treatments is controlled all via transmission
X is transmitted to the second reflector element 14 and is reflexed to second direction Y shape into the 3rd light element 133 along a first direction, is constituted
3rd light path L3.
Certainly, effect of transmissive element 133 is all to transmit the first light after the Homogenization Treatments to second
Reflector element 14, therefore, transmissive element 133 can be transmission optical component, can also be air dielectric, in other words be the
One reflector element 13 only sets semi-penetration semi-reflective element 131 and the solid element of reflecting element 132.
Embodiments described above, does not constitute the restriction to the technical scheme protection domain.It is any in above-mentioned implementation
Modifications, equivalent substitutions and improvements made within the spirit and principle of mode etc., should be included in the protection model of the technical scheme
Within enclosing.
Claims (10)
1. a kind of exposure sources, it is characterised in that including
Light source cell, for the light of outgoing first in the first direction, and forms the first light path；
First reflector element, is arranged in the first light path, is transmitted in a second direction for receiving first light and reflexing to
The second light, second light is used to be exposed for the first element, and the second direction is different from the first party
To；
Second reflector element, is arranged in first light path with the distance of the first reflector element interval first, for from institute
State the first reflector element and receive first light exported in the first direction, and reflex to the second direction formation the 3rd
Light, the 3rd light is used to be exposed for the second element.
2. exposure sources according to claim 1, it is characterised in that the exposure sources also include being arranged at the first light path
On light processing unit, the light processing unit be used for receive first light and to first light carry out light
Homogenization Treatments, and first light after Homogenization Treatments transmitted to first reflector element, the second direction
Perpendicular to institute's first direction, first reflector element reflects second light and constitutes the second light path in a second direction；It is described
Second reflector element reflects the 3rd light path of the 3rd light formation, second light path and second light path in a second direction
It is spaced first distance.
3. exposure sources according to claim 2, it is characterised in that the exposure sources also include the first light transmitting cells with
Second light transmitting cells, first light transmitting cells are arranged at second light path, for controlling second light along pre-determined bit
Put outgoing；Second light transmitting cells are arranged at the 3rd light path, for controlling the 3rd light along precalculated position outgoing.
4. exposure sources according to claim 3, it is characterised in that first reflector element is semi-penetration semi-reflective member
The first light portion after part, the Homogenization Treatments reflexes to second direction the second light of formation via first reflector element
Line, part penetrates first reflector element and transmitted to second reflector element along a first direction, and the second reflector element is
Level crossing, for the light received from first direction all to be reflexed into second direction the 3rd light of formation.
5. exposure sources according to claim 3, it is characterised in that first reflector element includes semi-penetration semi-reflective
Element and reflecting element, are located in first light path when semi-penetration semi-reflective element is different from the reflecting element, when
When the semi-penetration semi-reflective element is located at first light path, the first light part after the Homogenization Treatments is via institute
State semi-penetration semi-reflective element and reflex to second direction the second light of formation, another part penetrates described half along a first direction
Penetrating and half-reflecting element transmission is to second reflector element；It is described equal when the reflecting element is located at first light path
The first light after processing is homogenized all to reflex to second direction via the reflecting element and form second light；When described
When semi-penetration semi-reflective element is not located at first light path with the reflecting element, the first light after the Homogenization Treatments
Line all reflexes to second direction via second reflector element and forms the 3rd light.
6. exposure sources according to claim 5, it is characterised in that first reflector element includes also including transmission member
Part, is located in second light path when semi-penetration semi-reflective element, the reflecting element and the transmissive element are different,
When the transmissive element is located at first light path, the first light after the Homogenization Treatments is all via the transmission member
Transmitted along a first direction after part to second reflector element.
7. a kind of exposure method, it is characterised in that：
The light of outgoing first, and form the first light path in the first direction；
The first light is reflected to second direction the first light of formation, and second light is used to be exposed for the first element,
The second direction is different from first direction；
First light is reflected to the second direction, shape in the position for being spaced the distance of the second light first in a first direction
Into the 3rd light transmitted along the second direction, the 3rd light is used to be exposed for the second element.
8. exposure method according to claim 7, it is characterised in that first light reflects again after Homogenization Treatments
Form second light path and the 3rd light path；Wherein, the second direction is perpendicular to institute's first direction, along two sides described in
To the second light path of the second light formation described in outgoing, the 3rd light the 3rd light path of formation of outgoing in a second direction is described
Second light path and the first distance described in the second light path interval；The first light transmitting cells are set in second light path, to control
The second light for reflecting to form is made along precalculated position outgoing；The second light transmitting cells are set in the 3rd light path, it is anti-to control
The 3rd light to be formed is penetrated along precalculated position outgoing.
9. exposure method according to claim 8, it is characterised in that：
The first reflector element is set in first light path, wherein, first reflector element is semi-penetration semi-reflective element；
The first light portion after the Homogenization Treatments reflexes to second direction formation second via first reflector element
Light, in addition a rim portion penetrate first reflector element along a first direction and transmit to second reflector element；
The second reflector element is set in first light path, wherein second reflector element is level crossing, for will be from the
The light that one direction is received all reflexes to second direction the 3rd light of formation.
10. exposure method according to claim 9, it is characterised in that：First reflector element includes partly penetrating half instead
Element and reflecting element are penetrated, wherein, positioned at described the when controlling the semi-penetration semi-reflective element different from the reflecting element
In one light path：
Control the first light portion warp that the semi-penetration semi-reflective element is located at after first light path, the Homogenization Treatments
Second direction is reflexed to by first reflector element and forms the second light, another part penetrates described along a first direction
One reflector element is transmitted to second reflector element；
The first light that the reflecting element is located at after first light path, the Homogenization Treatments is controlled all via described anti-
Penetrate element and reflex to second direction and form second light；
When controlling the semi-penetration semi-reflective element and the reflecting element to be not located at first light path, at the homogenization
The first light after reason all reflexes to second direction via second reflector element and forms the 3rd light.
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|---|---|---|---|
| CN201710253382.2A CN107065449A (en) | 2017-04-18 | 2017-04-18 | Exposure sources and exposure method |
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| US4653903A (en) * | 1984-01-24 | 1987-03-31 | Canon Kabushiki Kaisha | Exposure apparatus |
| US5290992A (en) * | 1992-10-07 | 1994-03-01 | International Business Machines Corporation | Apparatus for maximizing light beam utilization |
| CN1437071A (en) * | 2001-12-28 | 2003-08-20 | Asml荷兰有限公司 | Method for producing offset printing apparatus and device |
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Application publication date: 20170818 |