CN107046068A - P-type PERC double-sided solar batteries and preparation method thereof, component and system - Google Patents
P-type PERC double-sided solar batteries and preparation method thereof, component and system Download PDFInfo
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- CN107046068A CN107046068A CN201710123775.1A CN201710123775A CN107046068A CN 107046068 A CN107046068 A CN 107046068A CN 201710123775 A CN201710123775 A CN 201710123775A CN 107046068 A CN107046068 A CN 107046068A
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- alum gate
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- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 title claims abstract description 77
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 title claims abstract description 77
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 title claims abstract description 77
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 229940037003 alum Drugs 0.000 claims abstract description 105
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 86
- 239000010703 silicon Substances 0.000 claims abstract description 86
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 54
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 54
- 239000004411 aluminium Substances 0.000 claims abstract description 45
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 37
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 37
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000004332 silver Substances 0.000 claims abstract description 33
- 229910052709 silver Inorganic materials 0.000 claims abstract description 33
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 84
- 239000011521 glass Substances 0.000 claims description 11
- 238000009792 diffusion process Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 230000011218 segmentation Effects 0.000 claims description 7
- 238000000137 annealing Methods 0.000 claims description 3
- 239000002003 electrode paste Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 230000009466 transformation Effects 0.000 abstract description 14
- 238000010521 absorption reaction Methods 0.000 abstract description 7
- 230000005684 electric field Effects 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 7
- 230000006872 improvement Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000006798 recombination Effects 0.000 description 4
- 238000005215 recombination Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 239000005336 safety glass Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019213 POCl3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 229910020776 SixNy Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl chloride Substances ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0684—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells double emitter cells, e.g. bifacial solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1868—Passivation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
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Abstract
The invention discloses a kind of p-type PERC double-sided solar batteries, including the silver-colored main grid of the back of the body, alum gate line, grid line spine, alum gate housing, back side silicon nitride, backside oxide aluminium film, P-type silicon, N-type emitter stage, front side silicon nitride film and positive silver electrode;The back side silicon nitride, backside oxide aluminium film, P-type silicon, N-type emitter stage, front side silicon nitride film and positive silver electrode stack gradually connection from bottom to up;The back side silicon nitride and backside oxide aluminium film form at least 1 group lbg unit of setting in 30 500 lbg be arrangeding in parallel areas, each lbg area after lbg, and the alum gate line is connected by lbg area with P-type silicon;Main grid is vertical is connected with back of the body silver for the alum gate line, and the grid line spine is connected with alum gate line.The invention also discloses a kind of preparation method, component and the system of p-type PERC double-sided solar batteries., can two-sided absorption sunshine, the application and raising photoelectric transformation efficiency of expansion solar cell using the present invention.
Description
Technical field
The present invention relates to area of solar cell, more particularly to a kind of p-type PERC double-sided solar batteries;The present invention is also related to
And a kind of preparation method, component and the system of p-type PERC double-sided solar batteries.
Background technology
Crystal silicon solar batteries are a kind of effectively absorption solar radiant energies, and electricity is converted optical energy into using photovoltaic effect
The device of energy, when solar irradiation is in semiconductor P-N junction, forms new hole-electron pair, empty in the presence of P-N junction electric field
Cave flows to P areas by N areas, and electronics flows to N areas by P areas, connects and electric current is just formed after circuit.
Conventional crystalline silicon solar cell substantially only with front passivating technique, is sunk in front side of silicon wafer with PECVD mode
One layer of silicon nitride film of product, the few son of reduction in the recombination rate on preceding surface, can significantly be lifted crystal silicon battery open-circuit voltage and
Short circuit current flow, so as to lift the photoelectric transformation efficiency of crystal silicon solar battery.
With the requirement more and more higher of the photoelectric transformation efficiency to crystal silicon battery, people begin one's study PERC the back of the body passivation sun
Battery technology.The focus of current industry main flow producer concentrates on the volume production of one side PERC solar cells, and p-type PERC is two-sided too
Positive energy battery, because photoelectric transformation efficiency is high, while two-sided absorption sunshine, generated energy is higher, in actual applications with more
Big use value.But, current p-type PERC double-sided solar batteries are also only grinding of being done in laboratory of some research institutions
Study carefully, how the structure of p-type PERC double-sided solar batteries is optimized so as to adapt to produce in enormous quantities, need art technology
Personnel further inquire into and studied.
The content of the invention
The technical problems to be solved by the invention are, there is provided a kind of p-type PERC double-sided solar batteries, two-sided to absorb
Sunshine, expands the application of solar cell and improves photoelectric transformation efficiency.
The technical problems to be solved by the invention be there is provided a kind of preparation method of p-type PERC double-sided solar batteries,
Component and system, can two-sided absorption sunshine, the application and raising photoelectric transformation efficiency of expansion solar cell.
In order to solve the above-mentioned technical problem, the invention provides a kind of p-type PERC double-sided solar batteries, including back of the body silver is main
Grid, alum gate line, grid line spine, alum gate housing, back side silicon nitride, backside oxide aluminium film, P-type silicon, N-type emitter stage, front nitrogen
SiClx film and positive silver electrode;The back side silicon nitride, backside oxide aluminium film, P-type silicon, N-type emitter stage, front side silicon nitride film and
Positive silver electrode stacks gradually connection from bottom to up;
The back side silicon nitride and backside oxide aluminium film form the 30-500 laser be arrangeding in parallel after lbg and opened
At least 1 group lbg unit is set in groove area, each lbg area, and the alum gate line passes through lbg area and P-type silicon
It is connected;Main grid is vertical is connected with back of the body silver for the alum gate line, and the grid line spine is connected with alum gate line;
The alum gate housing is cubic frame, and alum gate housing is connected with alum gate line and the silver-colored main grid of the back of the body respectively.
As the improvement of above-mentioned technical proposal, when setting 2 groups or more than 2 groups lbg units in each lbg area
When, each group lbg unit be arranged in parallel, and the spacing between two adjacent groups lbg unit is 5-480 μm.
As the improvement of above-mentioned technical proposal, overleaf silicon nitride film alum gate housing corresponding with backside oxide aluminium film, grid line
The position of spine is additionally provided with aluminium frame slotted zones, spine slotted zones, and the alum gate housing is connected by aluminium frame slotted zones with P-type silicon;
The grid line spine is connected by spine slotted zones with P-type silicon.
As the improvement of above-mentioned technical proposal, every group of lbg unit includes at least one lbg unit, and laser is opened
The pattern of groove unit is circle, ellipse, triangle, quadrangle, pentagon, hexagon, cross or star.
As the improvement of above-mentioned technical proposal, it is the rectangular laser of strip that every group of lbg unit, which includes a pattern,
Slotted unit.
As the improvement of above-mentioned technical proposal, same lbg unit of organizing is along alum gate line bearing of trend interval type configuration, phase
The spacing distance of adjacent two lbg units is 0.01-50mm.
As the improvement of above-mentioned technical proposal, the width in the lbg area is 10-500 μm;The width of alum gate line is
30-550μm;The width of the silver-colored main grid of the back of the body is 0.5-5mm;When the grid line spine is made of aluminium paste, width is 30-550 μm;Institute
When stating grid line spine and being made of silver paste, width is 30-60 μm;The width of each edge frame of the alum gate housing is 30-1000 μ
m。
The radical of the alum gate line is 30-500 bars;The radical of the silver-colored main grid of the back of the body is 2-8 bars.
As the improvement of above-mentioned technical proposal, the silver-colored main grid of the back of the body is continuous straight grid;Or the silver-colored main grid of the back of the body is in interval point
Section is set;Or the silver-colored main grid of the back of the body is set in space segmentation, is connected between each adjacent sectional by connected region.
Correspondingly, the present invention also provides a kind of preparation method of p-type PERC double-sided solar batteries, comprises the following steps:
(1)Matte is formed in front side of silicon wafer and the back side, the silicon chip is P-type silicon;
(2)It is diffused in front side of silicon wafer, forms N-type emitter stage;
(3)The phosphorosilicate glass and periphery P N knots of diffusion process formation are removed, and silicon chip back side is polished;
(4)In silicon chip back side deposited oxide aluminium film and silicon nitride film;
(5)In front side of silicon wafer silicon nitride film;
(6)To carrying out lbg on the silicon nitride film and pellumina of silicon chip back side;
(7)The silver-colored main grid paste of the silver-colored main grid correspondence position printing back of the body, drying are carried on the back in silicon chip back side;
(8)In silicon chip back side alum gate line and alum gate housing correspondence position printing aluminium paste, drying;
(9)Silver paste or aluminium paste, drying are printed in silicon chip back side grid line spine correspondence position;
(10)Positive silver electrode paste is printed in front side of silicon wafer;
(11)High temperature sintering is carried out to silicon chip, the silver-colored main grid of the back of the body, alum gate line, grid line spine and positive silver electrode is formed;
(12)Anti- LID annealing is carried out to silicon chip, p-type PERC double-sided solar batteries are made.
Correspondingly, the present invention also provides a kind of PERC double-sided solar batteries component, including PERC solar cells and envelope
Package material, the PERC solar cells are p-type PERC double-sided solar batteries of the present invention.
Correspondingly, the present invention also provides a kind of PERC solar energy systems, including PERC solar cells, the PERC sun
Energy battery is p-type PERC double-sided solar batteries of the present invention.
Implement the embodiment of the present invention, have the advantages that:
P-type PERC double-sided solar batteries of the present invention are provided with a plurality of alum gate line be arrangeding in parallel in cell backside, not only replace
For full aluminum back electric field in existing one side solar cell, the function of back side extinction is realized, the secondary grid knot in back of the body silver electrode is also served as
Structure is used to conduct electronics.The present invention is additionally provided with grid line spine and alum gate housing in silicon chip back side, solves alum gate line and breaks what grid were caused
The problem of disconnected grid of EL tests and low photoelectric transformation efficiency.P-type PERC double-sided solar batteries of the present invention are made, silver can be saved
The consumption of slurry and aluminium paste, reduces production cost, and realizes two-sided absorption luminous energy, is significantly expanded the application of solar cell
With raising photoelectric transformation efficiency.
Preparation method, component and the system used according to the p-type PERC double-sided solar batteries equally has above-mentioned
Advantage.
Brief description of the drawings
Fig. 1 is a kind of structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 2 is a kind of another structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 3 is a kind of another structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 4 is a kind of another structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 5 is a kind of lbg area first embodiment structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 6 is a kind of lbg area second embodiment structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 7 is a kind of lbg area 3rd embodiment structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 8 is a kind of lbg area fourth embodiment structural representation of p-type PERC double-sided solar batteries of the invention;
Fig. 9 is a kind of example structure schematic diagram of lbg area the 5th of p-type PERC double-sided solar batteries of the invention;
Figure 10 is a kind of lbg area sixth embodiment structural representation of p-type PERC double-sided solar batteries of the invention;
Figure 11 is a kind of example structure schematic diagram of lbg area the 7th of p-type PERC double-sided solar batteries of the invention;
Figure 12 is a kind of another structural representation of p-type PERC double-sided solar batteries of the invention.
Embodiment
To make the object, technical solutions and advantages of the present invention clearer, the present invention is made into one below in conjunction with accompanying drawing
It is described in detail on step ground.
Existing one side solar cell is covered in the whole back side of silicon chip provided with full aluminum back electric field at the back side of battery, entirely
The effect of aluminum back electric field is to improve open-circuit voltage Voc and short circuit current flow Jsc, forces minority carrier away from surface, Shao Shuozai
Sub- recombination rate reduction is flowed, so as to improve battery efficiency on the whole.However, because full aluminum back electric field is light tight, therefore, with full aluminium
The rear surface of solar cell of back of the body electric field can not absorb luminous energy, can only front absorption luminous energy, the synthesis photoelectric transformation efficiency hardly possible of battery
To be greatly improved.
For above-mentioned technical problem, as shown in figure 1, the present invention provides a kind of p-type PERC double-sided solar batteries, including the back of the body
Silver-colored main grid 1, alum gate line 2, grid line spine 10, the back side silicon nitride 3 of alum gate housing 11, backside oxide aluminium film 4, P-type silicon 5, N-type hair
Emitter-base bandgap grading 6, front side silicon nitride film 7 and positive silver electrode 8;The back side silicon nitride 3, backside oxide aluminium film 4, P-type silicon 5, N-type transmitting
Pole 6, front side silicon nitride film 7 and positive silver electrode 8 stack gradually connection from bottom to up;
The back side silicon nitride 3 and backside oxide aluminium film 4 form the laser that 30-500 groups be arranged in parallel after lbg
At least 1 group lbg unit 9 is set in slotted zones, each lbg area, and the alum gate line 2 passes through lbg area and P
Type silicon 5 is connected;Main grid 1 is vertical is connected with back of the body silver for the alum gate line 2, and the grid line spine 10 is connected with alum gate line 2;The alum gate
Housing is cubic frame, and alum gate housing is connected with alum gate line and the silver-colored main grid of the back of the body respectively.
The present invention existing one side PERC solar cells are improved, no longer provided with full aluminum back electric field, but by its
Become many alum gate lines 2, opened using laser is opened up in lbg technology overleaf silicon nitride film 3 and backside oxide aluminium film 4
Groove area, and alum gate line 2 is printed in the lbg area that these be arranged in parallel, it is close so as to form localized contact with P-type silicon 5
The alum gate line 2 of collection parallel arrangement can not only play raising open-circuit voltage Voc and short circuit current flow Jsc, reduce minority carrier recombination
Rate, improves the effect of cell photoelectric conversion efficiency, the full aluminum back electric field of alternative existing one side battery structure, and alum gate line 2
The back side of silicon chip is not covered comprehensively, sunshine can be projected in silicon chip between alum gate line 2, so as to realize that silicon chip back side absorbs
Luminous energy, greatly improves the photoelectric transformation efficiency of battery.
Preferably, the radical of the alum gate line 2 is corresponding with the number in lbg area, is all 30-500 bars, more preferably, institute
The radical for stating alum gate line 2 is 80-220 bars.The alum gate line 2 can be straight line or shaped form, arc, waveform, folding
Linear etc., lbg area shape is corresponding with alum gate line 2, and embodiments thereof is not limited to illustrated embodiment of the present invention.
Silicon chip back side, alum gate line 2 and the perpendicular connection of the silver-colored main grid 1 of the back of the body are illustrated in figure 2, wherein the silver-colored main grid 1 of the back of the body is continuous
Straight grid, because back side silicon nitride 3 and backside oxide aluminium film 4 are provided with lbg area, during printing aluminium paste formation alum gate line 2, aluminium
Slurry is filled to lbg area so that alum gate line 2 and the formation localized contact of P-type silicon 5, can be by electric transmission to alum gate line 2, with aluminium
The silver-colored main grid 1 of the intersecting back of the body of grid line 2 then collects the electronics on alum gate line 2, it follows that alum gate line 2 of the present invention plays raising
Open-circuit voltage Voc and short circuit current flow Jsc, reduces minority carrier recombination rate, and transmit the effect of electronics, alternative existing list
Full aluminum back electric field in the solar cell of face, not only reduces the consumption of silver paste and aluminium paste, reduces production cost, and realize two-sided suction
Luminous energy is received, the application of solar cell is significantly expanded and improves photoelectric transformation efficiency.
It should be noted that in printing process, because the viscosity of aluminium paste is larger, the line width of half tone is again narrow, can be even
There is alum gate line 2 and broken the situations of grid in you.Alum gate line 2 break grid can cause EL test image occur black break grid, meanwhile, alum gate line
2 disconnected grid can also influence the photoelectric transformation efficiency of battery, be unfavorable for lifting battery quality and performance.
Therefore, backplate of the present invention is additionally provided with grid line spine 10 and alum gate housing 11, grid line spine 10 and the phase of alum gate line 2
Hand over, optimal scheme is that grid line spine 10 intersects vertically with alum gate line 2.Grid line spine 10 can be continuous linear or
Subsection setup.During subsection setup, the length of every section of grid line spine can be different.Figure 12 is one way in which.
Alum gate housing 11 is shaped as cubic frame due to it, can be connected with the alum gate line 2 in horizontal direction, also can be with erecting
The silver-colored main grid 1 of the back of the body of Nogata upwards is connected.When the disconnected grid of the appearance of alum gate line 2 can not be by electric transmission to when carrying on the back silver-colored main grid 1, electronics can lead to
Cross grid line spine 10 or alum gate housing 11 is transferred to other alum gate lines 2, then it is by other alum gate lines 2 that electric transmission is main to silver is carried on the back
On grid 1;Or electronics can be directly transferred to carry on the back on silver-colored main grid 1 by alum gate housing 11, so that solving alum gate line 2 breaks what grid were caused
The problem of disconnected grid of EL tests and low photoelectric transformation efficiency.
Using lbg technology overleaf silicon nitride film alum gate housing 11 corresponding with backside oxide aluminium film, grid line spine 10
Position be provided with aluminium frame slotted zones, spine slotted zones, the alum gate housing 11 is connected by aluminium frame slotted zones with P-type silicon 5;It is described
Grid line spine 10 is connected by spine slotted zones with P-type silicon 5.
The width of each edge frame of the alum gate housing 11 is 30-1000 μm.
Aluminium paste may be selected in grid line spine 10 or silver paste is made, and the width of aluminum grid line spine 10 is 30-550 μm;Silver grid
The width of line spine 10 is 30-60 μm.
The silver-colored main grid 1 of the back of the body of the present invention can also be set in addition to being illustrated in figure 2 the setting of continuous straight grid in space segmentation
Put, as shown in Figure 3.It can also set, and be connected between each adjacent sectional by connected region in space segmentation, as shown in Figure 4.Even
Logical region can be the combination of several figures of triangle, quadrangle, pentagon, circle, arc or more, connected region at least 1
Individual, the width of connected region is 0.01-4.5mm.The width of the silver-colored main grid 1 of the back of the body is 0.5-5mm;The root of the silver-colored main grid 1 of the back of the body
Number is 2-8 bars.
It should be noted that when setting 2 groups or more than 2 groups lbg units 9 in each lbg area, each group swashs
Light slotted unit 9 be arranged in parallel, and the spacing between two adjacent groups lbg unit 9 is 5-480 μm.
Every group of lbg unit 9 includes at least one lbg unit 9, the pattern of lbg unit 9 for it is circular,
Ellipse, triangle, quadrangle, pentagon, hexagon, cross or star.
Further illustrated below by instantiation:
1. the pattern identical situation of the lbg unit 9 in each lbg area:
1.1 is identical with the group pattern of lbg unit 9
1.1.1 such as Fig. 5, each lbg area is provided with 1 group of lbg unit 9, and lbg unit 9 is that continuous strip is long
Square, the length of lbg unit 9 is identical with alum gate line length;Or the length of lbg unit 9 is shorter than alum gate line length
0.01-5mm;Or the length of lbg unit 9 0.01-5mm longer than alum gate line length.
1.1.2 such as Fig. 6, each lbg area is provided with 2 groups or more than 2 groups lbg units 9(Example is 3 in figure
Group), each group lbg unit be arranged in parallel, and the spacing between two adjacent groups lbg unit is 5-480 μm.Lbg
Unit 9 is continuous strip rectangle, and the length of lbg unit 9 is identical with alum gate line length;Or lbg unit 9
Length 0.01-5mm shorter than alum gate line length;Or the length of lbg unit 9 0.01-5mm longer than alum gate line length.
1.1.3 such as Fig. 7, each lbg area prolongs provided with 1 group of lbg unit 9, lbg unit 9 along alum gate line
Direction compartment arrangement is stretched, can be circle, ellipse, triangle, quadrangle, pentagon, six with the pattern of group lbg unit 9
Example is rectangle in side shape, cross or star, figure.
1.1.4 such as Fig. 8, each lbg area is provided with 2 groups or more than 2 groups lbg units 9(Example is 3 in figure
Group), each group lbg unit be arranged in parallel, and the spacing between two adjacent groups lbg unit is 5-480 μm.Lbg
Unit 9 is arranged by compartment, and the pattern of lbg unit 9 can be circle, ellipse, triangle, quadrangle, pentagon, six sides
Example is rectangle in shape, cross or star, figure.
1.2 differ with the pattern of group lbg unit 9
1.2.1 such as Fig. 9, each lbg area is arranged provided with 1 group of lbg unit 9, lbg unit 9 by compartment,
The pattern of lbg unit 9 can be circle, ellipse, triangle, quadrangle, pentagon, hexagon, cross or star, swash
The pattern of light slotted unit 9 is incomplete same.
1.2.2 such as Figure 10, each lbg area is provided with 2 groups or more than 2 groups lbg units 9, lbg unit 9
Arranged along alum gate line bearing of trend compartment, the pattern of lbg unit 9 can be continuous long line segment, circle, ellipse, triangle
Lbg unit 9 in shape, quadrangle, pentagon, hexagon, cross or star, difference group lbg unit 9 is arranged
Partly different or all different, example is the whole different situations of different groups of lbg units 9 in figure.
2. the incomplete same situation of the pattern of the lbg unit 9 in different lbg areas:
Single lbg area is taken to be combined in above-mentioned Fig. 5-Figure 10, such as Figure 11, or except lbg unit 9 is continuous
Outside long line segment situation, different lbg areas are entered with one of which situation in 1.1.1-1.1.4 and 1.2.1-1.2.2 situations
The different arrangement of row.
It should be noted that the spacing distance under different situations between lbg area can be with identical above, also can be different.
Spacing distance with the two neighboring lbg unit 9 of group lbg unit 9 is 0.01-50mm, with group lbg list
Spacing distance between member 9 can be with identical, also can be different.
The width in lbg area of the present invention is 10-500 μm;The width of alum gate line 2 below lbg area
Degree is more than the width in lbg area, and the width of alum gate line 2 is 30-550 μm.Bigger numerical is selected in the above-mentioned width of alum gate line 2
Such as 500 μm, and multigroup lbg area can be located at same alum gate side by side by the selection of lbg sector width compared with such as 40 μm of fractional value
On line 2, it is ensured that alum gate line 2 has enough contacts area with P-type silicon 5.
To sum up, p-type PERC double-sided solar batteries of the present invention, which change, is provided with a plurality of alum gate line 2 be arrangeding in parallel, no
Only substitute full aluminum back electric field in existing one side solar cell and realize back side extinction, be additionally operable to carry on the back the secondary grid structure in silver electrode and use
Make conduction electronics.P-type PERC double-sided solar batteries of the present invention are made, the consumption of silver paste and aluminium paste, reduction life can be saved
Cost is produced, and realizes two-sided absorption luminous energy, the application of solar cell is significantly expanded and improves photoelectric transformation efficiency.
Correspondingly, the present invention also provides the preparation method of p-type PERC double-sided solar batteries, comprises the following steps:
(1)Matte is formed in front side of silicon wafer and the back side, the silicon chip is P-type silicon.
From wet method or dry etching technology, by etching device in silicon chip surface formation matte.
(2)It is diffused in front side of silicon wafer, forms N-type emitter stage.
The diffusion technique that preparation method of the present invention is used is that silicon chip is placed in thermal diffusion furnace to be diffused, in p-type
The top of silicon forms N-type emitter stage, should control temperature in the range of 800 DEG C -900 DEG C during diffusion, target block resistance is
90-150 Europe/.
In diffusion process can silicon chip front and back formation phosphorosilicate glass layer, phosphorosilicate glass layer is formed as
In diffusion process, POCl3With O2Reaction generation P2O5It is deposited on silicon chip surface.P2O5Reacted with Si and generate SiO again2And phosphorus atoms,
Thus in one layer of SiO containing P elements of silicon chip surface formation2, referred to as phosphorosilicate glass.The phosphorosilicate glass layer can be
The impurity in silicon chip is collected during diffusion, the impurity content of solar cell can be further reduced.
(3)The phosphorosilicate glass and periphery P N knots of diffusion process formation are removed, and silicon chip back side is polished.
It is 1 that silicon chip after diffusion is placed in volume ratio by the present invention:5 HF(Mass fraction 40%-50%)And HNO3(Quality
Fraction 60%-70%)15s is soaked in mixed solution acid tank and removes phosphorosilicate glass and periphery P N knots.The presence of phosphorosilicate glass layer is easy
Cause PECVD aberration and SixNyCome off, and in the phosphorosilicate glass layer containing substantial amounts of phosphorus and from silicon chip migrate
Impurity, it is therefore desirable to remove phosphorosilicate glass layer.
It should be noted that the step of being polished to silicon chip back side considers whether to carry out depending on actual conditions.
(4)In silicon chip back side deposited oxide aluminium film and silicon nitride film.
(5)In front side of silicon wafer silicon nitride film.
Above-mentioned pellumina and silicon nitride film deposition step can be set using conventional PECVD device, ALD equipment or APCVD
The standby silicon nitride film on silicon chip back side and front successively.It should be noted that step(4)And step(5)Order can be overturned
Exchange.
(6)To carrying out lbg on the silicon nitride film and pellumina of silicon chip back side.
Slotted using lbg technology on the silicon nitride film and pellumina of silicon chip back side, groove depth is until p-type
Silicon lower surface.Preferably, the width in the lbg area is 10-500 μm.
(7)The silver-colored main grid paste of the silver-colored main grid correspondence position printing back of the body, drying are carried on the back in silicon chip back side.
According to the silver-colored main grid paste of the pattern printing back of the body of the silver-colored main grid of the back of the body.The pattern of the silver-colored main grid of the back of the body is continuous straight grid;Or institute
The silver-colored main grid of the back of the body is stated to set in space segmentation;Or the silver-colored main grid of the back of the body is set in space segmentation, and connected region is passed through between each adjacent sectional
Domain is connected.
(8)In silicon chip back side alum gate line and alum gate housing correspondence position printing aluminium paste, drying.
Lbg area can be accurately positioned during printing alum gate line, method is simple, positioning precision is high.
(9)Silver paste or aluminium paste, drying are printed in silicon chip back side grid line spine correspondence position.
If it should be noted that grid line spine is printed using aluminium paste, can also merge in step(8)In print in the lump.
(10)Positive silver electrode paste is printed in front side of silicon wafer.
(11)High temperature sintering is carried out to silicon chip, the silver-colored main grid of the back of the body, alum gate line, grid line spine and positive silver electrode is formed.
Preferably, the width of alum gate line is 30-550 μm;The width of the silver-colored main grid of the back of the body is 0.5-5mm;The grid line spine is adopted
When being made of aluminium paste, width is 30-550 μm;When the grid line spine is made of silver paste, width is 30-60 μm, the grid line
Spine is vertical with alum gate line to be connected;The width of each edge frame of the alum gate housing is 30-1000 μm.
The radical of the alum gate line is 30-500 bars;The radical of the silver-colored main grid of the back of the body is 2-8 bars.
(12)Anti- LID annealing is carried out to silicon chip, p-type PERC double-sided solar batteries are made.
Using battery preparation method of the present invention, cell photoelectric conversion efficiency can be greatly improved, equipment investment cost is low,
Technique is simple, and good with current production line compatibility.
Accordingly, invention additionally discloses a kind of p-type PERC double-sided solar battery components, including the two-sided sun of p-type PERC
Energy battery and encapsulating material, the PERC solar cells are any of the above-described p-type PERC double-sided solar batteries.Specifically,
It is used as an embodiment of p-type PERC double-sided solar battery components, its height being from top to bottom sequentially connected saturating safety glass, second
Alkene-vinyl acetate copolymer eva, PERC solar cells, ethylene-vinyl acetate copolymer EVA and high safety glass composition thoroughly.
Accordingly, invention additionally discloses a kind of p-type PERC double-sided solar systems, including p-type PERC double-sided solars electricity
Pond, the PERC solar cells are any of the above-described p-type PERC double-sided solar batteries.It is used as the one of PERC solar energy systems
Preferred embodiment, including PERC solar cells, batteries, charging-discharging controller inverter, AC power distribution cabinet/AC distribution panel and the sun with
Track control system.Wherein, PERC solar energy systems can be provided with batteries, charging-discharging controller inverter, can not also set
Batteries, charging-discharging controller inverter, those skilled in the art can be configured according to actual needs.
It should be noted that in PERC solar cell modules, PERC solar energy systems, except the two-sided sun of p-type PERC
Part outside energy battery, with reference to prior art design.
Finally, it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention rather than the present invention is protected
The limitation of scope is protected, although being explained in detail with reference to preferred embodiment to the present invention, one of ordinary skill in the art should
Understand, technical scheme can be modified or equivalent substitution, without departing from the essence of technical solution of the present invention
And scope.
Claims (10)
1. a kind of p-type PERC double-sided solar batteries, it is characterised in that including the silver-colored main grid of the back of the body, alum gate line, grid line spine, alum gate
Housing, back side silicon nitride, backside oxide aluminium film, P-type silicon, N-type emitter stage, front side silicon nitride film and positive silver electrode;The back of the body
Face silicon nitride film, backside oxide aluminium film, P-type silicon, N-type emitter stage, front side silicon nitride film and positive silver electrode layer successively from bottom to up
Folded connection;
The back side silicon nitride and backside oxide aluminium film form the 30-500 laser be arrangeding in parallel after lbg and opened
At least 1 group lbg unit is set in groove area, each lbg area, and the alum gate line passes through lbg area and P-type silicon
It is connected;Main grid is vertical is connected with back of the body silver for the alum gate line, and the grid line spine is connected with alum gate line;
The alum gate housing is cubic frame, and alum gate housing is connected with alum gate line and the silver-colored main grid of the back of the body respectively.
2. p-type PERC double-sided solar batteries as claimed in claim 1, it is characterised in that overleaf silicon nitride film and back side oxygen
Change aluminium film correspondence alum gate housing, the position of grid line spine and be additionally provided with aluminium frame slotted zones, spine slotted zones, the alum gate housing passes through
Aluminium frame slotted zones are connected with P-type silicon;The grid line spine is connected by spine slotted zones with P-type silicon.
3. p-type PERC double-sided solar batteries as claimed in claim 1, it is characterised in that every group of lbg unit is included extremely
Few 1 lbg unit, the pattern of lbg unit is circle, ellipse, triangle, quadrangle, pentagon, six sides
Shape, cross or star.
4. p-type PERC double-sided solar batteries as claimed in claim 3, it is characterised in that every group of lbg unit includes one
Individual pattern is the rectangular lbg unit of strip.
5. p-type PERC double-sided solar batteries as claimed in claim 3, it is characterised in that same lbg unit of organizing is along alum gate
Line bearing of trend interval type configuration, the spacing distance of two neighboring lbg unit is 0.01-50mm.
6. p-type PERC double-sided solar batteries as claimed in claim 1, it is characterised in that the width in the lbg area is
10-500μm;The width of alum gate line is 30-550 μm;The width of the silver-colored main grid of the back of the body is 0.5-5mm;The grid line spine uses aluminium paste
When being made, width is 30-550 μm;When the grid line spine is made of silver paste, width be 30-60 μm, the grid line spine with
Alum gate line is vertically connected;The width of each edge frame of the alum gate housing is 30-1000 μm;
The radical of the alum gate line is 30-500 bars;The radical of the silver-colored main grid of the back of the body is 2-8 bars.
7. p-type PERC double-sided solar batteries as claimed in claim 1, it is characterised in that the silver-colored main grid of the back of the body is continuous straight grid;
Or the silver-colored main grid of the back of the body is set in space segmentation;Or the silver-colored main grid of the back of the body is set in space segmentation, by even between each adjacent sectional
Logical region connection.
8. a kind of preparation method of p-type PERC double-sided solar batteries as claimed in claim 1, it is characterised in that including following
Step:
(1)Matte is formed in front side of silicon wafer and the back side, the silicon chip is P-type silicon;
(2)It is diffused in front side of silicon wafer, forms N-type emitter stage;
(3)The phosphorosilicate glass and periphery P N knots of diffusion process formation are removed, and silicon chip back side is polished;
(4)In silicon chip back side deposited oxide aluminium film and silicon nitride film;
(5)In front side of silicon wafer silicon nitride film;
(6)To carrying out lbg on the silicon nitride film and pellumina of silicon chip back side;
(7)The silver-colored main grid paste of the silver-colored main grid correspondence position printing back of the body, drying are carried on the back in silicon chip back side;
(8)In silicon chip back side alum gate line and alum gate housing correspondence position printing aluminium paste, drying;
(9)Silver paste or aluminium paste, drying are printed in silicon chip back side grid line spine correspondence position;
(10)Positive silver electrode paste is printed in front side of silicon wafer;
(11)High temperature sintering is carried out to silicon chip, the silver-colored main grid of the back of the body, alum gate line, grid line spine and positive silver electrode is formed;
(12)Anti- LID annealing is carried out to silicon chip, p-type PERC double-sided solar batteries are made.
9. a kind of PERC solar cell modules, it is characterised in that including PERC solar cells and encapsulating material, its feature exists
In the PERC solar cells are the p-type PERC double-sided solar batteries described in claim any one of 1-7.
10. a kind of PERC solar energy systems, including PERC solar cells, it is characterised in that the PERC solar cells are
P-type PERC double-sided solar batteries described in claim any one of 1-7.
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