CN107044620B - 光斑压缩结构和光源装置 - Google Patents
光斑压缩结构和光源装置 Download PDFInfo
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- CN107044620B CN107044620B CN201610082016.0A CN201610082016A CN107044620B CN 107044620 B CN107044620 B CN 107044620B CN 201610082016 A CN201610082016 A CN 201610082016A CN 107044620 B CN107044620 B CN 107044620B
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- rotating shaft
- reflection
- adjusting
- strip
- compression structure
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V14/00—Controlling the distribution of the light emitted by adjustment of elements
- F21V14/04—Controlling the distribution of the light emitted by adjustment of elements by movement of reflectors
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Facsimile Scanning Arrangements (AREA)
- Securing Globes, Refractors, Reflectors Or The Like (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Abstract
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Claims (7)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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CN201610082016.0A CN107044620B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
CN202110086265.8A CN113154336B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
Applications Claiming Priority (1)
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CN201610082016.0A CN107044620B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
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CN202110086265.8A Division CN113154336B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
Publications (2)
Publication Number | Publication Date |
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CN107044620A CN107044620A (zh) | 2017-08-15 |
CN107044620B true CN107044620B (zh) | 2021-02-26 |
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CN201610082016.0A Active CN107044620B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
CN202110086265.8A Active CN113154336B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
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CN202110086265.8A Active CN113154336B (zh) | 2016-02-05 | 2016-02-05 | 光斑压缩结构和光源装置 |
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CN (2) | CN107044620B (zh) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2716861Y (zh) * | 2004-04-16 | 2005-08-10 | 昂纳信息技术(深圳)有限公司 | 多激光光束复合器 |
CN1651972A (zh) * | 2005-02-07 | 2005-08-10 | 中国科学院光电技术研究所 | 离轴型全内反射棱镜阵列实现半导体激光器光束整形方法 |
EP1588461A2 (de) * | 2003-01-28 | 2005-10-26 | High Q Laser Production GmbH | Faltvorrichtung zur strahlführung in einem laser |
CN101144895A (zh) * | 2007-10-11 | 2008-03-19 | 中国科学院长春光学精密机械与物理研究所 | 反射镜三维调整机构 |
DE102009016385A1 (de) * | 2008-05-29 | 2009-08-27 | Lpkf Laser & Electronics Ag | Vorrichtung zur Bearbeitung eines Werkstücks mittels Laserstrahlen |
CN101614876A (zh) * | 2009-07-29 | 2009-12-30 | 中国人民解放军国防科学技术大学 | 一种光束任意整形新方法及装置 |
WO2011146351A1 (en) * | 2010-05-21 | 2011-11-24 | Corning Incorporated | Systems and methods for reducing speckle using diffusing surfaces |
CN204143041U (zh) * | 2014-09-29 | 2015-02-04 | 深圳市绎立锐光科技开发有限公司 | 一种反射镜调节装置 |
CN105022210A (zh) * | 2014-04-17 | 2015-11-04 | 深圳市绎立锐光科技开发有限公司 | 光学系统、发光装置及投影系统 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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US5647661A (en) * | 1992-01-14 | 1997-07-15 | Musco Corporation | High efficiency, highly controllable lighting apparatus and method |
US6414750B2 (en) * | 2000-01-10 | 2002-07-02 | Lj Laboratories, L.L.C. | Spectrometric apparatus and method for measuring optical characteristics of an object |
US7992835B2 (en) * | 2009-05-21 | 2011-08-09 | Eastman Kodak Company | Kinematic mirror mount adjustable from two directions |
JP5895226B2 (ja) * | 2010-11-30 | 2016-03-30 | パナソニックIpマネジメント株式会社 | 光源装置および投写型表示装置 |
CN102692712B (zh) * | 2011-03-25 | 2016-02-10 | 青岛海信电器股份有限公司 | 激光光束整形装置、方法及激光显示设备 |
EP2564975B1 (en) * | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers and individually adjustable sets of deflection means |
CN202995141U (zh) * | 2012-12-13 | 2013-06-12 | 王宇 | 半导体激光器阵列光束整形结构 |
CN103969826A (zh) * | 2013-01-30 | 2014-08-06 | 鸿富锦精密工业(深圳)有限公司 | 扫描反射镜组件 |
TWI526771B (zh) * | 2014-07-04 | 2016-03-21 | 台達電子工業股份有限公司 | 光源系統 |
CN204575981U (zh) * | 2015-03-20 | 2015-08-19 | 深圳市绎立锐光科技开发有限公司 | 激光合光装置及投影设备 |
CN105093477A (zh) * | 2015-09-17 | 2015-11-25 | 天津港东科技发展股份有限公司 | 一种反射镜多维调整装置 |
-
2016
- 2016-02-05 CN CN201610082016.0A patent/CN107044620B/zh active Active
- 2016-02-05 CN CN202110086265.8A patent/CN113154336B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1588461A2 (de) * | 2003-01-28 | 2005-10-26 | High Q Laser Production GmbH | Faltvorrichtung zur strahlführung in einem laser |
CN2716861Y (zh) * | 2004-04-16 | 2005-08-10 | 昂纳信息技术(深圳)有限公司 | 多激光光束复合器 |
CN1651972A (zh) * | 2005-02-07 | 2005-08-10 | 中国科学院光电技术研究所 | 离轴型全内反射棱镜阵列实现半导体激光器光束整形方法 |
CN101144895A (zh) * | 2007-10-11 | 2008-03-19 | 中国科学院长春光学精密机械与物理研究所 | 反射镜三维调整机构 |
DE102009016385A1 (de) * | 2008-05-29 | 2009-08-27 | Lpkf Laser & Electronics Ag | Vorrichtung zur Bearbeitung eines Werkstücks mittels Laserstrahlen |
CN101614876A (zh) * | 2009-07-29 | 2009-12-30 | 中国人民解放军国防科学技术大学 | 一种光束任意整形新方法及装置 |
WO2011146351A1 (en) * | 2010-05-21 | 2011-11-24 | Corning Incorporated | Systems and methods for reducing speckle using diffusing surfaces |
CN105022210A (zh) * | 2014-04-17 | 2015-11-04 | 深圳市绎立锐光科技开发有限公司 | 光学系统、发光装置及投影系统 |
CN204143041U (zh) * | 2014-09-29 | 2015-02-04 | 深圳市绎立锐光科技开发有限公司 | 一种反射镜调节装置 |
Also Published As
Publication number | Publication date |
---|---|
CN113154336A (zh) | 2021-07-23 |
CN113154336B (zh) | 2022-11-11 |
CN107044620A (zh) | 2017-08-15 |
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Effective date of registration: 20171026 Address after: 518055 Guangdong city of Shenzhen province Nanshan District Xi Li Light Road No. 1089 Shenzhen integrated circuit design and application of Industrial Park Building 4 Applicant after: APPOTRONICS Corp.,Ltd. Address before: 518055 Guangdong city of Shenzhen province Nanshan District Xi Li Light Road No. 1089 Shenzhen integrated circuit design and application of Industrial Park Building 4 Applicant before: YLX Inc. |
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Address after: 518000 20-22, 20-22 headquarters building, 63 high tech Zone, Xuefu Road, Nanshan District, Guangdong Province, Guangdong. Applicant after: APPOTRONICS Corp.,Ltd. Address before: 518000 Nanshan District, Shenzhen, Guangdong, Guangdong Province, Guangdong Road, 63 Xuefu Road, high-tech zone, 21 headquarters building, 22 floor. Applicant before: SHENZHEN GUANGFENG TECHNOLOGY Co.,Ltd. Address after: 518000 Nanshan District, Shenzhen, Guangdong, Guangdong Province, Guangdong Road, 63 Xuefu Road, high-tech zone, 21 headquarters building, 22 floor. Applicant after: SHENZHEN GUANGFENG TECHNOLOGY Co.,Ltd. Address before: 518055 Shenzhen, Shenzhen, Guangdong 1089 Nanshan District road 1089, Shenzhen integrated circuit design application Industrial Park, 4 floor. Applicant before: APPOTRONICS Corp.,Ltd. |
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