CN107012421A - Metal mask material and metal mask - Google Patents
Metal mask material and metal mask Download PDFInfo
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- CN107012421A CN107012421A CN201610960658.6A CN201610960658A CN107012421A CN 107012421 A CN107012421 A CN 107012421A CN 201610960658 A CN201610960658 A CN 201610960658A CN 107012421 A CN107012421 A CN 107012421A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Metal Rolling (AREA)
- Heat Treatment Of Sheet Steel (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The problem of the present invention be to provide not only improve etching and processing precision and also can precision detect the metal mask material and metal mask of the defect of itself well.The metal mask material of the present invention is formed by the rolling paper tinsel of Fe Ni systems alloy, the rolling paper tinsel of the Fe Ni systems alloy contains total 30~45 mass % Ni and Co, the Co wherein containing 0~6 mass %, and surplus is made up of Fe and unavoidable impurity, thickness t is 0.02~0.08mm, the arithmetic average roughness Ra measured along rolling parallel direction and rolling vertical direction according to JIS B0601 is 0.01~0.20 μm, also, it is 200~600 according to the JIS Z8741 60 degree of glossiness G60 measured along rolling parallel direction and rolling vertical direction.
Description
Technical field
The present invention relates to the metal mask material used in manufacture of organic el display etc. and metal mask.
Background technology
In flat-panel monitor, compared with the liquid crystal display of present main flow, organic el display has following characteristics：By
In simple in construction, thus it may be such that product is thinner；The display for changing quick image is smooth；And visual field angular width；Etc..It is above-mentioned
The organic el display mass production in the mini-plants such as portable terminal device, as the strong candidate of display of future generation, large-scale
Practical in display is in progress.
It is used as the EL for making organic el display（It is luminous）The method of layer, generally comprises vapour deposition method and print process.Vapour deposition method
Be heated, made in a vacuum evaporation EL materials be attached to thin layer substrate surface method.In addition, print process is logical
Cross the method printed EL layers on a surface of a substrate and made.Vapour deposition method further comprises sending RGB（RGB）Three colors
Light type and make the EL layer type for sending white light.
In vapour deposition method, in order to make EL layers in the defined position of substrate with defined pattern, it is included in vapor deposition source and base
The multicolour pattern of metal mask is set to be formed between plate（color patterning）Process.Metal mask by with EL layers
The metal plate or paper tinsel of the corresponding opening portion of pattern are formed.Evaporated from vapor deposition source and the EL materials in being disengaged to vacuum arrive at gold
Belong to mask, the EL materials for having passed through the opening portion of metal mask are attached to substrate, form the EL layers with defined pattern.
In addition, in multicolour pattern formation process, due to the radiant heat sent from vapor deposition source and on metal mask surface
The high organic material of upper attachment temperature, thus, the temperature of metal mask rises to 100 DEG C or so sometimes, in order to keep on substrate
Shaping position precision, metal mask need to use with substrate be equal extent below thermal expansion material.Especially
It is, it is necessary to the pattern of the EL layers formed one by one in the type for the light for sending the colors of RGB tri- for RGB three colors, thus to suppress because of gold
The deviation of shaping position is important caused by the expansion of category mask.
For the thickness of metal mask, in the type of light of the colors of RGB tri- is sent, it mainly can be used 0.02~
0.08mm paper tinsel, in the type for making the EL layers of light for sending white, mainly can be used 0.08~0.25mm plate.
As the other problemses in the multicolour pattern formation process in the type for the light for sending the colors of RGB tri-, sometimes in substrate
The position of the organic material of upper shaping is deviateed, a problem that occurring the irregular colour of image.In the process, from 1 point
Vapor deposition source makes organic material be attached on substrate by the aperture portion of metal mask.Therefore, in the case where metal mask is thick,
In the position away from vapor deposition source, the incidence angle of organic material becomes hour, and aperture portion wall turns into shade, the pattern form of organic material
The shapes different from aperture portion are molded to, keep form accuracy to become difficult.This is referred to as shadow effect, can be by making metal
Mask is thinning and improves.
On the other hand, when making metal mask thinning in order to avoid above mentioned problem, fractureed sometimes in operation, or
Due to organic material is piled up in metal mask and so that weight increase is so as to causing metal mask to deform upon.In order to avoid so
Unfavorable condition, it is necessary to keep the intensity of metal mask, make thinner and there is limit.
Therefore, as the method for realizing the intensity of metal mask and the form accuracy of aperture portion simultaneously, disclose partly
The technology reinforced metal wire and prevent the metal mask of thickness of thin from bending is set（Patent document 1）, make perforate forming layer thinning simultaneously
It is engaged and made with other support layer the technology of piece of metal mask（Patent document 2,3）.In addition, disclosing control table
Surface roughness, the technology for improving etching and processing precision（Patent document 4）.
Prior art literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 10-50478 publications
Patent document 2：No. 4126648 publications of Japanese Patent No.
Patent document 3：Japanese Unexamined Patent Publication 2004-039628 publications
Patent document 4：Japanese Unexamined Patent Publication 2010-214447 publications.
The content of the invention
Invent problem to be solved
However, in the case of technology disclosed in patent document 1, because organic material is not attached to as reinforcing metal wire
The part of shade, thus the phenomenon similar with shadow effect is produced, the form accuracy of the organic material formed on substrate is deteriorated.
In addition, in the case of technology disclosed in patent document 2,3,2 metal foils are needed in order to manufacture 1 metal mask, and
Precision is needed well to engage these metal foils, thus the molding procedure of metal mask becomes complicated, causes in manufacturing cost
Rise.
Therefore, as the countermeasure solved the above problems, it is known to following methods：Use the thickness with the degree for keeping intensity
The material of degree, makes aperture portion periphery thinning, is then molded aperture portion using half-etching.Thus, using 1 metal foil, you can
Suppress shadow effect, and ensure the intensity of material, suppress because of the generation of deformation caused by the attachment of organic material.In addition,
Aperture portion is made by using etching method, with directly making the mask with defined aperture portion using plating method（Paper tinsel, plate）'s
Situation is compared, it is possible to decrease manufacturing cost.
On the other hand, in the process for making metal mask by metal mask material using methods such as etchings, naked eyes are utilized
Or there is zero defect on the surface of the monitoring metal mask material such as CCD camera, and defective metal mask material is picked from process
Remove.
In addition, though not arriving on substrate and shielded evaporation material is piled up in the portion beyond the opening portion of metal mask
Position, but can be reused by washing as metal mask.Surface on the metal mask of Reusability as described above has
Zero defect, is also monitored using naked eyes or CCD camera etc., defective metal mask is rejected from process.
As the defect of metal mask, it is bad to enumerate the foreign matter adhered on the surface, local discoloration and gloss, passes through
Image obtained from carrying out image bust shot to surface using CCD camera etc., checking can not be by the small of naked eyes confirmation
Drawbacks described above.The foreign matters and local discolouration different from metal mask material tone in defect are readily detectable.In addition, right
For tone and metal mask material identical foreign matter, such as sheet metal, compared with the different foreign matter of tone, local discolouration,
Detection becomes difficult.In addition, for local gloss is bad, because profile is unintelligible, and tone and metal mask material
Material is identical, therefore, and being identified on CCD camera image further becomes difficult.
Therefore, when the concavo-convex and decorative pattern on the surface of metal mask material is obvious, it is difficult to detection using visual inspection above-mentioned
The slight and faint defect of the local bad grade of gloss, even and CCD camera image, can not also may detect, on
This point, in the technology that patent document 4 is recorded, by making surface roughness moderately increase, although improve etching and processing precision, but
Due to the bumps on surface, thus for using the CCD camera precision of images detect well above-mentioned local gloss it is bad and
Speech is insufficient.
Therefore, problem of the invention be provide not only improve etching and processing precision and also can precision detect well from
The metal mask material and metal mask of the defect of body.
Means for solving the problems
Further investigation has been repeated in the present inventor etc., as a result finds, by the way that 60 degree of glossiness G60 are controlled in defined model
Enclose, so as to can not only improve etching and processing precision and also can precision detect the appropriate table of the defect of itself well
Face is concavo-convex.
That is, metal mask material of the invention formed by the rolling paper tinsel of Fe-Ni systems alloy, and Fe-Ni systems alloy rolls
Foliation contains total 30~45 mass % Ni and Co, the Co wherein containing 0~6 mass %, and surplus is by Fe and unavoidable
Impurity is constituted, and thickness t is 0.02~0.08mm, is measured along rolling parallel direction and rolling vertical direction according to JIS-B0601
Arithmetic average roughness Ra is 0.01~0.20 μm, also, along rolling parallel direction and rolling vertical direction according to JIS-Z8741
The 60 degree of glossiness G60 measured are 200~600.
In addition, the metal mask of the present invention is formed using aforementioned metal mask material.
The effect of invention
Pass through the present invention, it is possible to provide not only improve etching and processing precision and also can precision detect the gold of the defect of itself well
Belong to mask material and metal mask.
Brief description of the drawings
[Fig. 1] is figure of the expression based on the optical microscope image of decorative pattern formed by the crystal grain disjunction after finish rolling.
Embodiment
Hereinafter, the metal mask material being related to embodiments of the present invention is illustrated.As long as it should be noted that not having
There is special instruction, " % " expression " quality % ".
（Alloying component）
Organic EL substrate is used glass as, it is necessary to adjust alloying component so that the heat of the metal mask set on substrate
The coefficient of expansion turns into the thermal coefficient of expansion 10 × 10 of glass-6/ DEG C below.Thermal coefficient of expansion can be by adding normal concentration in Fe
Ni and/or Co and be adjusted, formed Ni and Co add up to 30~45% and Co be 0~6% Fe-Ni systems alloy.Ni and
When Co total concentration and Co concentration are fallen outside the above range, the thermal coefficient of expansion of metal mask goes above the heat of glass
The coefficient of expansion, thus it is improper.It is preferred that making Ni and Co add up to 34~38%, and Co is set to be 0~6%.
（Thickness）
The thickness of the metal mask material of the present invention is 0.02~0.08mm, preferably 0.02~0.04mm.Metal mask material
Thickness less than 0.02mm when, not only operability it is poor, and due to organic material accumulation and easily on metal mask generation
Deformation or deformation, therefore the positional precision of the organic material formed sometimes on substrate is poor.The thickness of metal mask material exceedes
During 0.08mm, shadow effect significantly occurs sometimes.
（Arithmetic average roughness Ra）
Surveyed for the surface of the metal mask material of the present invention along rolling parallel direction and rolling vertical direction according to JIS-B0601
The arithmetic average roughness Ra obtained is 0.01~0.20 μm, preferably 0.01~0.08 μm.Ra is set excessively to be dropped less than 0.01 μm
During low surface roughness, because surface is smooth, therefore, easily the line etched by metal mask material manufacture metal mask is being utilized
The material guide roll of type（Logical paper tinsel roller, finishing roll）It is upper to slide, produce damage.In addition, making Ra excessively increase more than 0.20 μm
During large surface roughness, contour identification is unintelligible on CCD camera image and tone and metal mask material identical office
The gloss in portion is bad to become difficult.
In addition, for the present invention metal mask material surface along rolling parallel direction and rolling vertical direction according to
The maximum height Ry that JIS-B0601 is measured is preferably 0.1~2.0 μm.
（60 degree of glossiness G60）
The edge rolling parallel direction and rolling vertical direction on the surface of the metal mask material of the present invention are measured according to JIS-Z8741
60 degree of glossiness G60 be 200~600, preferably 400~600.When the G60 of metal mask material is less than 200, surface it is recessed
Convex and decorative pattern is substantially, unintelligible and tone and metal mask material identical are local using CCD camera image detection profile
Gloss bad become difficult.When the G60 of metal mask material is more than 600, surface becomes excessively smooth, due to granule surface contral because
Son（The shape of such as Rolling roller, surface roughness, the viscosity of ROLLING OIL, rolling roller surface and metal mask material surface it
Between metal mask material before the thickness of oil film that is formed and rolling surface roughness）Deviation influence, the big amplitude variations of G60
Change, it is difficult to ensure the uniformity on surface, easily produce apparent quality bad（Such as striped, inequality）.
（The manufacture method of metal mask material）
The metal mask material of the present invention can for example be manufactured in the following manner, but be not intended to and limited by method as follows
System.
First, raw materials melt is obtained into the molten metal of above-mentioned Fe-Ni systems alloy composition in melting furnace.Now, melt
When the oxygen concentration of metal is high, oxide etc. it is brilliant go out thing growing amount increase, sometimes as etching bad the reason for, therefore, utilize
Conventional method of deoxidation, such as addition carbon and using vacuum induction melting the purity of molten metal is improved, be then cast as
Ingot bar.Then, after hot rolling, grinding remove oxide layer, cold rolling and annealing is repeated and defined thickness is finish-machined to.For
For cold rolling and annealing, for example, can sequentially carry out intermediate recrystallization annealing, middle cold rolling, final recrystallization annealing, pinch pass,
The process of stress relief annealing.
（Intermediate recrystallization is annealed）
It is preferred that carrying out grain size number numbering GSNO.（Specified in JISG 0551 " the micrographic test method of steel-grain size number "
Numbering）As 9.0~11.0 recrystallization annealing., can in final recrystallization annealing by increasing grain size number numbering GSNO.
Obtain（200）The metal structure of orientation.For in final recrystallization annealing（200）For the metal structure of orientation, in cold sperm
The disjunction decorative pattern of crystal grain is not likely to produce in rolling, 60 degree of glossiness G60 is turned into more than 200.Grain size number is numbered
GSNO. hour, i.e., when crystal grain is big, it can not obtain in final recrystallization annealing sometimes（200）The metal structure being fully orientated,
Therefore the lower limit for making grain size number numbering GSNO. is 9.0.On the other hand, when grain size number numbering GSNO. is excessive, i.e. crystal grain
It is uneven as being produced in final recrystallization annealing when too small, it will disperse generation non-recrystallization portion in recrystallized structure
Recrystallized structure the reason for, therefore make grain size number numbering GSNO. the upper limit be 11.0.
Herein, when improving temperature or the extension time of intermediate recrystallization annealing, GSNO. diminishes, when reduction temperature or shortening
Between when, GSNO. becomes big.
（It is middle cold rolling）
It is preferred that carry out the degree of finish that is defined using following formula for more than 85% it is cold rolling.
Degree of finish=（The thickness of slab after thickness of slab-rolling before rolling）/（Thickness of slab before rolling）}×100（%）.
By improving degree of finish, so as to can obtain in final recrystallization annealing（200）The metal structure of orientation, as above institute
State, 60 degree of glossiness G60 are uprised.Degree of finish hour, can not be obtained sometimes in final recrystallization annealing（200）Fully it is orientated
Metal structure, therefore, the lower limit for making degree of finish are 85%.On the other hand, even if degree of finish is too high, also will not further it increase most
In whole recrystallization annealing（200）The degree of orientation, and excessive high hardness, productivity ratio reduction, therefore make the upper limit of degree of finish be
90%。
（Final recrystallization annealing）
In final recrystallization annealing, when carrying out grain size number numbering GSNO. as 9.0~11.0 recrystallization annealing, it is based on
The reasons why same with the situation that intermediate recrystallization is annealed, it is more than 200 that can reliably make 60 degree of glossiness G60.
（Pinch pass）
The surface texture of metal mask material（Arithmetic average roughness Ra and 60 degree of glossiness G60）Generated according in pinch pass
Concave-convex surface difference and change.In pinch pass, rolling slivering is transferred to material, causes to produce concave-convex surface.Separately
Outside, in pinch pass, ROLLING OIL is flowed between Rolling roller and material, produces oil pit（oil pit）, this also causes to produce surface
It is concavo-convex.That is, there is oil film between Rolling roller and material, in oil film partly thick part, contact of the Rolling roller with material becomes
Obtain insufficient, do not transfer the bumps for rolling slivering and hole shape being presented, this turns into oil pit.It is used as ROLLING OIL partly thickening original
Cause, can enumerate the deviation of the bumps of rolling roller surface and the processability of material.Especially, when surface is smoothened, the shadow of deviation
Loud sensitiveness is improved, and easily produces the deviation of the thickness of oil film.
In addition, pinch pass effect under, crystal grain disjunction and produce decorative pattern, have a significant impact to 60 degree of glossiness G60.
Fig. 1 represent after pinch pass because of the optical microscope image of decorative pattern caused by crystal grain disjunction.Because of crystal grain point
Decorative pattern is discontinuously scattered in a row along rolling direction RD caused by disconnected, and as indicated by Fig. 1 arrow, each decorative pattern is edge
The striated of the direction extension intersected with rolling direction RD.It should be noted that in Fig. 1, it is clear along the row of rolling direction RD generations 2
Decorative pattern.
Herein, Fig. 1 symbol G represents elliptoid 1 crystal grain extended by cold rolling along rolling direction RD.Understand
Disjunction decorative pattern is produced in crystal grain G inside.
It should be noted that in Fig. 1, because the focus for making optical microscope image is focused in crystal grain disjunction decorative pattern, because
And there is the concave-convex surfaces such as the oil pit of relatively big difference, the transfer of rolling slivering with crystal grain disjunction decorative pattern not in figure in focal position
Presented in 1.
From the viewpoint of productivity ratio, the cold rolling of paper tinsel is carried out with high degree of finish, therefore, crystal grain is extended longer, will
Can easily it be broken.As shown in figure 1, the crystal grain after the disjunction forms decorative pattern on the surface, cause 60 degree of glossiness G60's
Reduction.
Herein, difficulty occurs for the disjunction of crystal grain is influenceed by the orientation of crystal grain, according to the difference of the orientation of crystal grain,
Disjunction difficulty is different.Because, the deformability of crystallization is according to the different and different of crystalline orientation.Moreover, the present invention
Main diffraction maximum in the alloy system of metal mask material is（200）Face,（220）Face,（311）Face and（111）Face, but
（200）The crystal grain in face is most difficult to disjunction.Therefore, by as described above using intermediate recrystallization annealing and final recrystallization annealing
Edge（200）Planar orientation, so as to be difficult the disjunction that crystal grain occurs after pinch pass is carried out, may be such that 60 degree of glossiness G60 is 200
More than.
It is preferred that making the degree of finish of pinch pass turns into more than 70%.When degree of finish is high, due to the effect of compression process, pass through essence
Cold rolling and the crystal grain of generation disjunction decorative pattern diminishes, and 60 degree of glossiness G60 are uprised.On the other hand, even if degree of finish is too high, base
In compression process disjunction decorative pattern faintization for making crystal grain effect also can saturation, and hardness uprises, productivity ratio reduction, because
This, the upper limit of degree of finish is 90%.
Herein, it is cold rolling by using the Rolling roller progress of thin footpath as far as possible, so that being involved in for ROLLING OIL tails off, rolling stock
Surface it is smoothened.When i.e., using the Rolling roller of thin footpath, the generation of oil pit can be suppressed, and then the disjunction of crystal grain can be reduced
Decorative pattern.In addition, it is same with rolling roll neck, by making mill speed be low speed, so that being involved in for ROLLING OIL tails off, rolling stock
Surface is smoothened.That is, when making mill speed for low speed, the generation of oil pit can be suppressed, and then crystal grain disjunction decorative pattern can be reduced.
It should be noted that changing the diameter of cold rolling Rolling roller according to the thickness of the metal mask material of manufacture, width
And mill speed, the diameter and mill speed of suitable control Rolling roller, preferably make to roll in the range of controllable Ra and G60
Speed processed is 60m/ minutes following.
It should be noted that oil pit and crystal grain disjunction decorative pattern are due to the respectively different factor and produced, it is therefore, excellent
Choosing is while confirm the production of oil pit and crystal grain disjunction decorative pattern, while setting can suppress both manufacturing conditions.
（Stress relief annealing）
In addition, it is preferred most to carry out stress relief annealing after 200~400 DEG C.The time of stress relief annealing can for example set
It is set to 1~24 hour.
Embodiment
Hereinafter, embodiments of the invention are shown, but these embodiments are to provide for a better understanding of the present invention, and unexpectedly
In the limitation present invention.
（1）The manufacture of metal mask material
Using vacuum induction melting, 36 mass % Ni raw materials melt will be added in Fe, cast thickness is 50mm casting
Block.8mm is hot rolled to, grinding is removed after the oxide-film on surface, cold rolling and annealing is repeated, cold rolling material is made, then,
Intermediate recrystallization annealing, middle cold rolling, final recrystallization annealing, the process of pinch pass are sequentially carried out under the conditions shown in Table 1,
It is finish-machined to embodiment 1~8, the metal mask material of the products thickness of comparative example 1~4 of table 1.In addition, being disappeared in 300 DEG C
De-stress is annealed 12 hours.In addition, as embodiment 9, manufacture adds 31 mass % Ni and 5 mass % Co's in Fe
The raw material of composition.The manufacturing process of embodiment 9 is same with other embodiment.
It should be noted that making the grain size number numbering GSNO. in intermediate recrystallization annealing be 10.0.In addition, real one by one
Adjust the surface roughness of Rolling roller with applying example so that the arithmetic average roughness Ra of product surface turns into 0.07~0.08
（0.065~0.084）.
For each embodiment and the metal mask material of comparative example after stress relief annealing, following evaluation is carried out.
（1）Arithmetic average roughness Ra
It is measured as described above.In measure, contact surface roughness meter is used（Small slope studies made SE-3400）, obtain
Average value obtained from being measured with n >=3.
（2）60 degree of glossiness G60
It is measured as described above.In measure, using the handheld Grossmeters PG-1 of electricity Se Industrial Co., Ltd of Japan system, ask
Go out average value obtained from being measured with n >=3.
（3）The error measurement of surface defect whether there is
For each embodiment and the metal mask material of comparative example, 5 grades of surface defect is deliberately made one by one, CCD camera is used
Determine surface defect.
Specifically, on the surface of each metal mask material fit 50mm × 50mm acidproof adhesive tape, set at its center
10mm × 10mm opening portion is put, exposes surface portion.On the exposed division, the etching solution of 5 kinds of following concentration, shape are coated with
Into concave-convex surface, surface defect is made.The exposed division can visually confirm fuzzy state compared with surrounding, therefore, be regarded as
Reference surface defect.
The ferric chloride in aqueous solution of etching solution including 47 Baume degrees be diluted to respectively in itself, with water by it 2 times, 4 times, 8 times, 16
Solution again is total 5 kinds, and the absorbent cotton for being impregnated with etching solution is clamped with tweezers, is lost with absorbent cotton friction exposed division 15 seconds
Carve.After etching, etching solution is wiped away with the cloth for being impregnated with water, acidproof adhesive tape is peeled off, operation is completed.It should be noted that using
In the case that the ferric chloride in aqueous solution not being diluted is etched, the metallic luster of exposed division completely loses, and white is presented,
With the raising of dilution rate, the fuzzy of exposed division dies down.In addition, in the case where dilution rate is 32 times, it is impossible to by naked eyes really
Recognize the fuzzy of exposed division, therefore, be considered as and do not form surface defect, use the above-mentioned etching solution that dilution rate is less than 16 times.Therefore,
When being etched using 5 kinds of above-mentioned etching solutions, the certifiable surface defect of naked eyes can be formed, if not by metal mask
The influence of the concave-convex surface of material, then should be detected as surface defect by CCD originally.
Next, for above-mentioned 5 kinds of surface defects, using CCD camera, shooting 256 grades（±128）Pixel data.
Herein, the state of reflected light will be blocked as most dark reflection, be -128 by its brightness settings, by from metal mask material
Constant portion in surface（Position around exposed division）Reflection be set as ± 0.Moreover, the reflection by brightness in the range of ± 20
The normal reflection in constant portion is defined as, brightness is defined as the abnormal anti-of surface defect beyond the reflection of ± 20 scope
Penetrate, confirmed to the abnormal reflection can be detected in exposed division.
For each embodiment and the metal mask material of comparative example, 5 kinds of above-mentioned surface defects are all detected
Situation is judged as " error measurement that surface defect is not present ", and the situation for failing to detect more than a kind of surface defect in 5 kinds is sentenced
Break as " error measurement that there is surface defect ".
[table 1]
Show that in the case of each embodiment that Ra is 0.01~0.20 μm, G60 is 200~600, surface does not occur by table 1
The error measurement of defect.
On the other hand, in comparative example 1 of the degree of finish less than 70% of pinch pass and the mill speed of pinch pass more than 60m/
In the case of the comparative example 2 of minute, G60 becomes to there occurs the error measurement of surface defect less than 200.
In the crystallization particle diameter in final recrystallization annealing（GSNo.）Final recrystallization annealing is carried out under conditions of less than 9.0
Comparative example 3 and in the case of making middle cold rolling comparative example 4 of the degree of finish less than 85%, G60 becomes, less than 200, to there occurs
The error measurement of surface defect.
Claims (2)
1. metal mask material, it is formed by the rolling paper tinsel of Fe-Ni systems alloy, and the rolling paper tinsel of Fe-Ni systems alloy contains conjunction
30~45 mass % Ni and Co, the Co wherein containing 0~6 mass % is counted, and surplus is made up of Fe and unavoidable impurity,
Thickness t is 0.02~0.08mm,
The arithmetic average roughness Ra measured according to JIS-B0601 along rolling parallel direction and rolling vertical direction for 0.01~
0.20 μm,
Also, the 60 degree glossiness G60 measured along rolling parallel direction and rolling vertical direction according to JIS-Z8741 are 200~
600。
2. metal mask, it uses the metal mask material described in claim 1.
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| Application Number | Priority Date | Filing Date | Title |
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| JP2015216848A JP6177298B2 (en) | 2015-11-04 | 2015-11-04 | Metal mask material and metal mask |
| JP2015-216848 | 2015-11-04 |
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| JP (1) | JP6177298B2 (en) |
| KR (1) | KR101830004B1 (en) |
| CN (1) | CN107012421B (en) |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778113A (en) * | 2017-11-14 | 2019-05-21 | 大日本印刷株式会社 | The metal plate and its manufacturing method, deposition mask and its manufacturing method of manufacture deposition mask and the deposition mask device for having it |
| CN112322993A (en) * | 2020-11-19 | 2021-02-05 | 苏州钿汇金属材料有限公司 | Ultrathin iron-nickel alloy material and manufacturing method thereof |
| CN114107988A (en) * | 2021-06-16 | 2022-03-01 | 达运精密工业股份有限公司 | Preparation method of metal mask base material |
| US12024780B2 (en) | 2021-06-16 | 2024-07-02 | Darwin Precisions Corporation | Method of preparing metal mask substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114752891B (en) * | 2017-09-07 | 2023-11-14 | Lg伊诺特有限公司 | Deposition mask |
| JP6704540B1 (en) * | 2018-09-27 | 2020-06-03 | 日鉄ケミカル＆マテリアル株式会社 | Metal mask material, manufacturing method thereof, and metal mask |
| EP3653747A1 (en) * | 2018-11-13 | 2020-05-20 | Dainippon Printing Co., Ltd. | Metal plate for producing vapor deposition masks, production method for metal plates, vapor deposition mask, production method for vapor deposition mask, and vapor deposition mask device comprising vapor deposition mask |
| JP2020138115A (en) * | 2019-02-27 | 2020-09-03 | 信越ポリマー株式会社 | Adhesive surface regeneration method of part holding jig |
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| CN109778113A (en) * | 2017-11-14 | 2019-05-21 | 大日本印刷株式会社 | The metal plate and its manufacturing method, deposition mask and its manufacturing method of manufacture deposition mask and the deposition mask device for having it |
| CN109778113B (en) * | 2017-11-14 | 2021-02-12 | 大日本印刷株式会社 | Metal plate for manufacturing vapor deposition mask, method for manufacturing same, and vapor deposition mask device provided with same |
| CN112322993A (en) * | 2020-11-19 | 2021-02-05 | 苏州钿汇金属材料有限公司 | Ultrathin iron-nickel alloy material and manufacturing method thereof |
| CN114107988A (en) * | 2021-06-16 | 2022-03-01 | 达运精密工业股份有限公司 | Preparation method of metal mask base material |
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| US12024780B2 (en) | 2021-06-16 | 2024-07-02 | Darwin Precisions Corporation | Method of preparing metal mask substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101830004B1 (en) | 2018-02-19 |
| JP2017088914A (en) | 2017-05-25 |
| JP6177298B2 (en) | 2017-08-09 |
| TW201723204A (en) | 2017-07-01 |
| KR20170052468A (en) | 2017-05-12 |
| TWI612160B (en) | 2018-01-21 |
| CN107012421B (en) | 2019-08-02 |
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