CN106969844B - Slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation - Google Patents
Slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation Download PDFInfo
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J2009/0249—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods with modulation
Abstract
The present invention provides a kind of slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation, detailed process are as follows: wave-front division element is set in the plane where light wave wavefront to be measured, light passing circular hole A, B, C and D there are four being set in each sub-aperture on the wave-front division element, wherein the center of circle of light passing circular hole A is located on the center of sub-aperture, and 120 ° of the center of circle interval of light passing circular hole B, C and D are evenly arranged on the concentric circles of light passing circular hole A；Photoelectric sensor acquires the interference pattern of light wave formed light field after wave-front division element, and is stored in memory；According to the interference pattern in i-th of sub-aperture, arithmetic unit calculates light wave wavefront to be measured in described i-th of sub-aperture of wave-front division element with slope, curvature and the corrugated phase mehtod for mixing curvature value characterization on the direction x and y of corrugated.It can be obtained using this method with the corrugated phase information that slope, curvature and mixing curvature value characterize on the direction x and y of corrugated in each sub-aperture, to realize the precise measurement of higher order aberratons.
Description
Technical field
The present invention relates to a kind of slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation, belongs to optics
Field of measuring technique.
Background technique
Light wavefront sensing obtains corrugated phase information usually using the method for optical measurement.Common method includes that light is dry
It relates to, mode-type wavefront sensing, domain type wavefront sensing etc..The interference of light usually utilizes two light beams or multiple-beam interference, to light to be measured
Corrugated position is mutually modulated, and the fringe intensity information acquired using detector (such as CCD) is calculated light wave anteposition and believed
Breath.Common interference of light method includes newton interference, luxuriant and rich with fragrance assistant interference, Twyman-Green interference, point-diffraction interference, shear interference, method
Fabry-Perot interference etc..Mode-type wavefront sensing usually utilizes different on the direction of propagation of detector acquisition one or more light
Position distribution of light intensity is distributed, and corrugated to be measured is mathematically decomposed into a series of combination of orthogonal polynomials, strong using light field
Degree distribution calculates corrugated phase information.Common mode-type wavefront sensing technique includes curvature sensing, phase change etc..Region
Entire wavefront division to be measured is multiple sub-apertures, by measuring each height usually using the method for wave-front division by type wavefront sensing
The first derivative (wavefront slope) on corrugated in aperture calculates corrugated position phase.Common domain type wavefront sensing technique includes breathing out
Te Man, Shack-Hartmann, knife-edge method, prism of corner cube method etc..
Shack-Hartmann is presently the most common wavefront sensing technique, it is divided wavefront to be measured using microlens array
Multiple sub-apertures are segmented into, detect the cross relatively of hot spot in each sub-aperture using photodetector in the focal plane of microlens array
To offset, to calculate the wavefront slope in each sub-aperture, corrugated to be measured is obtained finally by wavefront reconstruction algorithm
Phase.But the corrugated in single sub-aperture is considered as plane wave in principle by Shack-Hartmann sensor, therefore it is only sharp
With wavefront slope information, in the case that on corrugated, sampled point (sub-aperture) quantity is certain, it is difficult to the higher height of spatial frequency
Rank aberration carries out accurate measurement.In wavefront sensing technique, corrugated sampled point quantity is limited to the spatial discrimination of photodetector
Rate and pixel dimension.Therefore, in the case that sampled point quantity is difficult to further increase on corrugated, single sampled point is improved as far as possible
The corrugated information for being included, while the slope and curvature of wavefront in single sub-aperture are detected, it will be expected to improve corrugated higher order aberratons
Detection accuracy.
In recent years, researcher proposes a series of wavefront sensing technique of slopes and curvature mixed type.Due to the sensing
Technology measures obtain the slope and curvature value of wavefront simultaneously, can obtain more relative to single slope type wavefront sensing technique
Wavefront information so as to realize the accurate measurement of higher order aberratons be a developing direction of high-precision wavefront sensing technique.
2000, Paterson and Dainty (Opt Lett, 2000,25 (23): 1687-1689) proposed to utilize dispersion saturating
Lens array replaces the slope and curvature mixed type wavefront sensing technique of ordinary lens array in Shack-Hartmann sensor.The biography
Sense technology can measure to obtain slope value and La Pula on each sub-aperture corrugated direction x and y that dispersing lens is divided
This curvature value.2009, Barwick (Opt Lett, 2009,34 (11): 1690-1692) was to the biography of Paterson and Dainty
Sense technology is further improved, manually neural network algorithm obtain slope on each sub-aperture corrugated direction x and y,
Curvature and mixing curvature value (mixed partial derivative of wavefront in the x and y direction), to obtain whole single orders and two of wavefront
Rank information.2008, Zou and Rolland (J Opt Soc Am A, 2008,25 (9): 2331-2337) were proposed based on the summer
Gram-the differential curvature sensor of Hartmann sensor, it can equally measure each sub-aperture corrugated in the x and y direction oblique
Rate, curvature and mixing curvature value.2006, Barbero et al. (Opt Lett, 2006,31 (12): 1845-1847) was proposed
Another slope and curvature mixed type wavefront sensing technique based on Shack-Hartmann, can measure and obtain in each sub-aperture
Slope value and Laplce's curvature value.
But traditional domain type wavefront sensing technique in principle will such as Hartmann or Shack-Hartmann sensor
Corrugated in single sub-aperture is considered as plane wave, therefore it is merely with wavefront slope information.In wavefront sensing technique, corrugated
Sampled point (sub-aperture) limited amount is in the spatial resolution and pixel dimension of photodetector.In the certain feelings of sub-aperture quantity
Under condition, it is difficult to accurately be measured the higher higher order aberratons of spatial frequency.
Summary of the invention
The purpose of the invention is to realize the measurement of light wave corrugated phase information, propose a kind of based on the vibration of sub-aperture wavefront
The slope and curvature signal extracting method of width modulation.This method belongs to domain type wavefront sensing in itself, but this method is melted
Closed the interference of light and mode-type wavefront sensing, can obtain in each sub-aperture with slope on the direction x and y of corrugated, curvature and
The corrugated phase information for mixing curvature value (i.e. the whole single orders and second order information of wavefront) characterization, to realize the essence of higher order aberratons
Really measurement.
Realize that technical scheme is as follows:
A kind of slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation, detailed process are as follows:
Step 1: wave-front division element is set in the plane where light wave wavefront to be measured, it is each on the wave-front division element
Light passing circular hole A, B, C and D there are four setting in sub-aperture, wherein the center of circle of light passing circular hole A is located on the center of sub-aperture, light passing circle
120 ° of the center of circle interval of hole B, C and D are evenly arranged on the concentric circles of light passing circular hole A；
Step 2: the interference pattern of photoelectric sensor acquisition light wave formed light field after wave-front division element, and deposited
It is stored in memory；
Step 3: arithmetic unit calculates light wave wavefront to be measured in the wave-front division according to the interference pattern in i-th of sub-aperture
With slope in corrugated X and Y-direction, the corrugated phase mehtod of curvature and mixing curvature value characterization in i-th of sub-aperture of element,
Middle i=1,2 ... N, N indicate the quantity of sub-aperture on wave-front division element.
Further, the sub-aperture on wave-front division element of the present invention be square, round or regular polygon, and each son
The size of the external square in aperture is 2Ra×2Ra。
Further, the diameter d of light passing circular hole A, B, C and D of the present invention are equal.
Further, the present invention calculates light wave wavefront to be measured corrugated position phase in described i-th of sub-aperture of wave-front division element
The process of distribution are as follows:
It includes 0 grade of speck, six 1 grade of specks and six 2 grades of specks that each sub-aperture, which forms interference pattern,；
S1 calculates the coordinate value of 0 grade of speck center of mass point P using 0 grade of speck in interference pattern spatial distribution I (x, y)
(x1,y1),
Wherein, region A is 0 grade of speck pixel region in I (x, y)；
S2, finds out in interference pattern that coordinate is respectively around P point using bilinear interpolation 6 points of intensity value Ij(j=1,2,3,4,5,6), whereinF is wave-front division element and light
The spacing of electric transducer, λ are optical wavelength to be measured, and S is light passing circular hole B, C, D at a distance from light passing circular hole A；
S3 utilizes P1~P66 points of intensity value calculates this 6 points of mass center Q (x1c,y1c)；
Wherein, xj、yjFor point PjCoordinate at (j=1,2,3,4,5,6), IjFor point PjThe intensity value at place；
S4 calculates position offset size r of the point Q relative to point P using point P and point Q coordinate2
According to stored r1With r2The look-up table r of corresponding relationship1=T1(r2), it searches and the r2Corresponding r1；
S5, computational chart show incident light wave in x and y direction corrugated position phase slope zernike coefficient a1And a2；
S6 utilizes a1、a2Value, constructed in rectangular coordinate system where the light distribution I (x, y)Wherein J1For first kind first-order bessel function, whIt is
J1Carrier frequency, meetAnd
S7 utilizes B (x-d1,y-d2), according to I (x, y)=AB (x-d1,y-d2)·C(x-d1,y-d2), calculate C (x-
d1,y-d2) distribution
WhereinRhFor the radius of light passing circular hole；
S8 utilizes C (x-d1,y-d2) central bright spot, calculate its center of mass point M coordinate (x2c,y2c),
Wherein, region A' is C (x-d1,y-d2) central bright spot pixel region；
S9 utilizes point M coordinate (x2c,y2c), computational chart shows the zernike coefficient a of incident light wave 0 degree of astigmatism and 45 degree of astigmatisms4
And a5；
S10 calculates its corresponding signal using the spatial distribution of six 1 grade of specks on interference patternAccording to having deposited
StorageWith a3The look-up table of corresponding relationshipSearch with it is describedCorresponding a3；
S11, by a1、a2、a3、a4And a5Substitute into the corrugated phase mehtod formula W (x', y') in the single sub-aperture of wave-front division element
=a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5In (2x'y'), corrugated position phase point in i-th of aperture is obtained
Cloth；
The look-up table r1=T1(r2) establishment process are as follows:
S01, initialisation structures parameter establish rectangular coordinate system in photoelectric sensor on the plane xy, and enable functionCentral point is overlapped with coordinate origin；
S02 appoints take a point P'(r in a coordinate system1cosθ,r1Sin θ), according toPoint
Ji Suan coordinate not be respectively around P' point 6 points of B (x, y) value Bj(j=1,2,3,4,5,6), wherein J1For first kind single order shellfish
Sai Er function, w are J1Carrier frequency, meet
S03 utilizes P'1~P'66 points B (x, y) value calculates this 6 points of mass center Q'(x'1c,y'1c)；
S04 calculates position offset size r of the point Q' relative to point P' using point P' and point Q' coordinate2,
S05, fixed θ value repeatedly update r within the set range with a fixed step size1, it is calculated according to the step of S02-S04
Corresponding r2, establish r1With r2The look-up table r of corresponding relationship1=T1(r2)；
The look-up tableEstablishment process are as follows:
S01 establishes the corrugated phase mehtod formula in the single sub-aperture of wave-front division element,
W (x', y')=a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5(2x'y')
Wherein, a1And a2The respectively Ze Nike of incident light wave corrugated position phase slope in X and Y-direction on wave-front division element
Coefficient, a3、a4And a5Respectively incident light wave on wave-front division element the defocus of corrugated position phase, 0 degree of astigmatism and 45 degree of astigmatisms pool
Buddhist nun gram coefficient；
S02 enables coefficient a1、a2、a4And a5All zero, a3Different numerical value are taken, method of exhaustion simulation calculation interference image is utilized
Corresponding signal at upper six 1 grade of specksIt establishesWith a3The look-up table of corresponding relationship
Beneficial effect
The present invention proposes a kind of slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation.This method exists
Four light holes are set in each sub-aperture on light wave corrugated to be measured, so that four beam coherent lights are generated in each sub-aperture,
It is distributed using the distribution of light intensity of four beam interference patterns, the corrugated phase mehtod in each sub-aperture is obtained, to realize high-order
The precise measurement of aberration.
For the present invention under the premise of sub-aperture quantity is certain, breaching traditional technology, to be only capable of measuring single sub-aperture wavefront oblique
The limitation of rate realizes (the i.e. wavefront whole single order information, by a of slope of wave surface in each sub-aperture1And a2Characterization), curvature and
Mix curvature value (curvature and the mixing whole second order information of curvature, that is, wavefront, by a3、a4And a5Characterization) measurement, to reach
The purpose of higher order aberratons in precise measurement corrugated to be measured.
Detailed description of the invention
Fig. 1 is the flow chart of phase measurement method in corrugated of the present invention.
Fig. 2 is the structural schematic diagram of Wavefront sensor in present embodiment.
Fig. 3 is the structural schematic diagram of wave-front division element in present embodiment.
Fig. 4 is the schematic diagram of four beam interference patterns in single sub-aperture in present embodiment.
Fig. 5 illustrates for the label of specks at different levels in four beam interference patterns in single sub-aperture in present embodiment
Figure.
Wherein, 000- incident light wave, 100- Wavefront sensor, 101- wave-front division element, 102- photoelectric sensor, 103- are deposited
Reservoir, 104- arithmetic unit.
Specific embodiment
Present invention will be further explained below with reference to the attached drawings and specific embodiments.
The design principle of apparatus of the present invention is: in traditional domain type wavefront sensing skill such as Shack-Hartmann or Hartmann
On the basis of art, four light holes are set in each sub-aperture on light wave corrugated to be measured, to generate in each sub-aperture
Four beam coherent lights are distributed using the distribution of light intensity of four beam interference patterns, light wave corrugated to be measured are calculated in each sub-aperture
Interior wavefront slope and curvature information.
As shown in Figure 1, slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation in the present embodiment, tool
Body process are as follows:
Step 1: wave-front division element is set in the plane where light wave wavefront to be measured, it is every on the wave-front division element
The size of a external square of sub-aperture is 2Ra×2Ra, and set in each sub-aperture there are four light passing circular hole A, B, C and D,
The center of circle of middle light passing circular hole A is located on the center of each sub-aperture, and 120 ° of the center of circle interval of light passing circular hole B, C and D are evenly arranged on logical
It on the concentric circles of light circular hole A, and is S at a distance from light passing circular hole A, as shown in Figure 2；
Step 2: the interference pattern of photoelectric sensor acquisition light wave formed light field after wave-front division element, and deposited
It is stored in memory；
Step 3: arithmetic unit calculates light wave wavefront to be measured in the wave-front division according to the interference pattern in i-th of sub-aperture
With slope in corrugated X and Y-direction, the corrugated phase mehtod of curvature and mixing curvature value characterization in i-th of sub-aperture of element,
Middle i=1,2 ... N, N indicate the quantity of sub-aperture on wave-front division element.
The component used in this method is described in detail below:
(1) the wave-front division element 101 of plane X'Y', which is provided with the circle of periodic arrangement where being located at light wave wavefront to be measured
Light wave wavefront to be measured is divided into multiple sub-apertures by hole array, and is set in each sub-aperture there are four light passing circular hole, for every
Four beam coherent lights are generated in a sub-aperture；Effective light passing region of wave-front division element 101 is not less than incident light wave 000 in plane X'
The clear aperture of Y'；Wherein, the micro-structure of wave-front division element 101 can be prepared on chrome mask plate by micro-nano technology technology.
(2) it is located at the photoelectric sensor 102 of wave-front division member downstream on 000 direction of propagation of incident light wave, photoelectric sensor
Plane XY where 102 is parallel with the plane X'Y' where wave-front division element 101, and two interplanar spacings are f；Photoelectric sensor 102
For acquiring interference pattern of the incident light wave corrugated 000 through the formed light field of wave-front division element 101；Photoelectric sensor 102 has
Imitate effective light passing region that pixel region is not less than wave-front division element 101；Wherein, above-mentioned photoelectric sensor 102 can be used as
CCD。
(3) memory 103 is connected with photoelectric sensor 102 and arithmetic unit 104 respectively, and connection type can use data
The wireless modes such as Infrared Transmission, bluetooth can also be used in the wired modes such as line, cable；Memory 103 is for saving photoelectric sensing
The interference pattern collected of device 102, the incident light wave 000 that preservation arithmetic unit 104 is calculated is at 101 place of wave-front division element
Corrugated phase mehtod on plane X'Y' in each sub-aperture saves required interference pattern in 104 calculating process of arithmetic unit
The look-up table being related in strength signal and corrugated position phase calculating process.
(4) arithmetic unit 104 is connected with memory 103, for strong according to the characterization interference pattern saved in memory 103
The digital picture for spending information calculates incident light wave 000 on the plane X'Y' where wave-front division element 101 in each sub-aperture
Corrugated phase mehtod.
As shown in figure 3, wave-front division element 101 is equipped with the array of circular apertures that the period is p, light wave wavefront to be measured is divided into N number of
Sub-aperture, i=1,2,3 ... N are the sub-aperture number that wave-front division element 101 divides, and N is the sub-aperture that wave-front division element 101 divides
Diameter quantity, p are the distance at two adjacent sub-aperture centers.The sub-aperture shape of wave-front division element 101 can be rectangular, positive six side
Shape or circle, the size of the external square of each sub-aperture are 2Ra×2Ra.Set in each sub-aperture there are four light passing circular hole A,
B, C and D, for generating four beam coherent lights in each sub-aperture.The diameter d of light hole A, B, C and D are equal, and radius is Rh；
The center of circle of light passing circular hole A is located at the center of sub-aperture；120 degree of the center of circle interval of light passing circular hole B, C and D are evenly arranged on light passing circular hole A
Concentric circles on, the radius of concentric circles is S.
Calculating corrugated position in this method is mutually described in detail below:
Four beam coherent lights in each sub-aperture of wave-front division element 101 occur dry in 102 place plane XY of photoelectric sensor
It relates to form interference pattern, interference pattern is acquired by photoelectric sensor 102.As shown in figure 4, i-th of the sub-aperture of wave-front division element 101
Four beam coherent lights in diameter the interference pattern spatial distribution that photoelectric sensor 102 is formed on the plane xy be represented by I (x,
Y), wherein (x, y) for photoelectric sensor on the plane xy using sub-aperture center as the coordinate value of origin.Interference pattern space point
It include 0 grade of speck, six 1 grade of specks and six 2 grades of specks in cloth I (x, y).
As shown in figure 5, center (the x of 0 grade of speck 0000,y00) it is located at interference pattern center.Six 1 grade of specks 11,12,
13,14,15 and 16, center (x11,y11)、(x12,y12)、(x13,y13)、(x14,y14)、(x15,y15) and (x16,y16) interval 60
Degree is evenly arranged on (x00,y00) it is the center of circle, radius is on the circle of 2 λ f/3S.Six 2 grades of specks 21,22,23,24,25 and 26,
Center (x21,y21)、(x22,y22)、(x23,y23)、(x24,y24)、(x25,y25) and (x26,y26) interval 60 degree be evenly arranged on (x00,
y00) it is the center of circle, radius isCircle on.
Arithmetic unit 104 is calculated and is entered and left according to the digital picture of the characterization interference pattern strength information saved in memory 103
Penetrate corrugated phase mehtod of the light wave 000 on the plane X'Y' where wave-front division element 101 in each sub-aperture.According to wave-front division
The interference pattern spatial distribution I (x, y) that four beam coherent lights in i-th of the sub-aperture of element 101 are formed on the plane xy, can calculate
Corrugated phase mehtod W (x', y')=a of the incident light wave 000 in i-th of the sub-aperture of wave-front division element 101 out1x'+a2y'+a3
[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5(2x'y').Wherein a1And a2Respectively incident light wave 000 is in wave-front division element 101
In i-th of sub-aperture in X and Y-direction the slope of corrugated position phase zernike coefficient, characterize whole single orders letter of corrugated position phase
Breath；a3、a4And a5Respectively incident light wave 000 defocus of corrugated position phase, 0 degree of picture in i-th of the sub-aperture of wave-front division element 101
The zernike coefficient with 45 degree of astigmatisms is dissipated, whole second order information of corrugated position phase are characterized.Finally, calculating incident light wave 000
Corrugated phase mehtod in the N number of sub-aperture of whole on 101 place plane X'Y' of wave-front division element, and calculated result is saved
In memory 103.
The interference pattern formed on the plane xy according to four beam coherent lights in i-th of the sub-aperture of wave-front division element 101 is empty
Between be distributed I (x, y), use arithmetic unit 103 calculate incident light wave 000 on 101 place plane X'Y' of wave-front division element i-th son
The method of corrugated phase mehtod W (x', y') in aperture is as follows:
S1 calculates the coordinate value of 0 grade of speck center of mass point P using 0 grade of speck in interference pattern spatial distribution I (x, y)
(x1,y1),
Wherein, region A is 0 grade of speck pixel region in I (x, y)；
S2, finds out in interference pattern that coordinate is respectively around P point using bilinear interpolation 6 points of intensity value Ij(j=1,2,3,4,5,6), wherein
S3 utilizes P1~P66 points of intensity value calculates this 6 points of mass center Q (x1c,y1c)；
Wherein, xj、yjFor point PjCoordinate at (j=1,2,3,4,5,6), IjFor point PjThe intensity value at place；
S4 calculates position offset size r of the point Q relative to point P using point P and point Q coordinate2
According to stored r1With r2The look-up table r of corresponding relationship1=T1(r2), it searches and the r2Corresponding r1；
S5, computational chart show incident light wave in x and y direction corrugated position phase slope zernike coefficient a1And a2；
S6 utilizes a1、a2Value, constructed in rectangular coordinate system where the light distribution I (x, y)Wherein J1For first kind first-order bessel function, whIt is
J1Carrier frequency, meetThe diameter of d expression light passing circular hole；
S7 utilizes B (x-d1,y-d2), according to I (x, y)=AB (x-d1,y-d2)·C(x-d1,y-d2), wherein
RhIt indicates the radius of light passing circular hole, calculates C (x-d1,y-d2) distribution
S8 utilizes C (x-d1,y-d2) central bright spot, calculate its center of mass point M coordinate (x2c,y2c),
Wherein, region A' is C (x-d1,y-d2) central bright spot pixel region；
S9 utilizes point M coordinate (x2c,y2c), computational chart shows the zernike coefficient a of incident light wave 0 degree of astigmatism and 45 degree of astigmatisms4
And a5；
S10 calculates a using six 1 grade of specks in interference pattern spatial distribution I (x, y)3；a3With signalMeet look-up table
The corresponding relationship of defined, wherein D11、D12、D13、D14、D15And D16It is in I (x, y) respectively with (x11,y11)、(x12,y12)、
(x13,y13)、(x14,y14)、(x15,y15) and (x16,y16) it is the center of circle, the border circular areas of radius r/2, r meets r=λ f/3S.Benefit
With the spatial distribution of six 1 grade of specks on interference pattern, its corresponding signal is calculatedAccording to stored look-up tableSearch with it is describedCorresponding a3；
S11, by a1、a2、a3、a4And a5Substitute into the corrugated phase mehtod formula W (x', y') in the single sub-aperture of wave-front division element
=a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5In (2x'y'), corrugated position phase point in i-th of aperture is obtained
Cloth.
The look-up table r1=T1(r2) establishment process are as follows:
S01, initialisation structures parameter establish rectangular coordinate system in photoelectric sensor on the plane xy, and enable functionCentral point is overlapped with coordinate origin；
S02 appoints take a point P'(r in a coordinate system1cosθ,r1Sin θ), according toPoint
Ji Suan coordinate not be respectively around P' point 6 points of B (x, y) value Bj(j=1,2,3,4,5,6), wherein J1For first kind single order shellfish
Sai Er function, w are J1Carrier frequency, meet
S03 utilizes P'1~P'66 points B (x, y) value calculates this 6 points of mass center Q'(x'1c,y'1c)；
S04 calculates position offset size r of the point Q' relative to point P' using point P' and point Q' coordinate2,
S05, fixed θ value repeatedly update r within the set range with a fixed step size1, it is calculated according to the step of S02-S04
Corresponding r2, establish r1With r2The look-up table r of corresponding relationship1=T1(r2)；
The look-up tableEstablishment process are as follows:
S01 establishes the corrugated phase mehtod formula in the single sub-aperture of wave-front division element,
W (x', y')=a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5(2x'y')
Wherein, a1And a2The respectively Ze Nike of incident light wave corrugated position phase slope in X and Y-direction on wave-front division element
Coefficient, a3、a4And a5Respectively incident light wave on wave-front division element the defocus of corrugated position phase, 0 degree of astigmatism and 45 degree of astigmatisms pool
Buddhist nun gram coefficient；
S02, using the corrugated phase mehtod W (x', y') in the single sub-aperture of method of exhaustion simulation calculation wave-front division element 101=
a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5Only a in (2x'y')3When item changes, that is, work as a1、a2、a4And a5All
It is zero, a3When taking different numerical value, signal
Numerical value, establish look-up tableWherein, corrugated phase mehtod when W (x', y') is emulation, by a when emulation1、a2、a4
And a5It all is set to zero, by changing a3Numerical value, exhaustion goes out different corrugated phase mehtod W (x', y')；I (x, y) is corrugated
When phase mehtod is W (x', y'), the institute of the photoelectric sensor 102 interference pattern space on the plane xy obtained by emulation is divided
Cloth；It include 0 grade of speck 00, center (x in I (x, y)00,y00) it is located at interference pattern center；It include six 1 in I (x, y)
Grade speck 11,12,13,14,15 and 16, center (x11,y11)、(x12,y12)、(x13,y13)、(x14,y14)、(x15,y15) and
(x16,y16) interval 60 degree be evenly arranged on (x00,y00) it is the center of circle, radius is on the circle of 2 λ f/3S；D11、D12、D13、D14、D15And D16
It is in I (x, y) respectively with (x11,y11)、(x12,y12)、(x13,y13)、(x14,y14)、(x15,y15) and (x16,y16) it is the center of circle, partly
The border circular areas of diameter r/2, r meet r=λ f/3S；Exhaustive a3When taking different numerical value, calculate correspondingNumerical value obtains look-up tableIt is stored in memory 103
It should be noted that look-up table r1=T1(r2)、It only needs to emulate by the method for exhaustion and establish, later
It is stored in memory 103, it is reusable in measurement process；Incident light wave 000 is calculated in wave-front division element using arithmetic unit 104
When corrugated phase mehtod W (x', y') in 101 upper i-th of the sub-aperture of place plane X'Y', it is only necessary to execute step 1 to step
11.
Although being described in conjunction with the accompanying a specific embodiment of the invention, it will be apparent to those skilled in the art that
Without departing from the principles of the invention, various modifications and improvements can be made, these also should be regarded as belonging to guarantor of the invention
Protect range.
Claims (5)
1. a kind of slope and curvature signal extracting method based on sub-aperture wavefront amplitude modulation, detailed process are as follows:
Step 1: wave-front division element is set in the plane where light wave wavefront to be measured, each sub-aperture on the wave-front division element
Light passing circular hole A, B, C and D there are four setting in diameter, wherein the center of circle of light passing circular hole A is located on the center of sub-aperture, light passing circular hole B,
120 ° of the center of circle interval of C and D is evenly arranged on the concentric circles of light passing circular hole A；
Step 2: the interference pattern of photoelectric sensor acquisition light wave formed light field after wave-front division element, and be stored in
In memory；
Step 3: arithmetic unit calculates light wave wavefront to be measured in the wave-front division element according to the interference pattern in i-th of sub-aperture
With slope in corrugated X and Y-direction, the corrugated phase mehtod of curvature and mixing curvature value characterization in i-th sub-aperture, wherein i
=1,2 ... N, N indicate the quantity of sub-aperture on wave-front division element；
The process for calculating light wave wavefront corrugated phase mehtod in described i-th of sub-aperture of wave-front division element to be measured are as follows:
It includes 0 grade of speck, six 1 grade of specks and six 2 grades of specks that each sub-aperture, which forms interference pattern,；
S1 calculates the coordinate value (x of 0 grade of speck center of mass point P using 0 grade of speck in interference pattern spatial distribution I (x, y)1,
y1),
Wherein, region A is 0 grade of speck pixel region in I (x, y)；
S2, finds out in interference pattern that coordinate is respectively around P point using bilinear interpolation 6 points of intensity value Ij(j=1,2,3,4,5,6), whereinF is wave-front division element and light
The spacing of electric transducer, λ are optical wavelength to be measured, and S is light passing circular hole B, C, D at a distance from light passing circular hole A；
S3 utilizes P1~P66 points of intensity value calculates this 6 points of mass center Q (x1c,y1c)；
Wherein, xj、yjFor point PjCoordinate at (j=1,2,3,4,5,6), IjFor point PjThe intensity value at place；
S4 calculates position offset size r of the point Q relative to point P using point P and point Q coordinate2
According to stored r1With r2The look-up table r of corresponding relationship1=T1(r2), it searches and the r2Corresponding r1；
S5, computational chart show incident light wave in x and y direction corrugated position phase slope zernike coefficient a1And a2；
S6 utilizes a1、a2Value, constructed in rectangular coordinate system where the light distribution I (x, y)Wherein J1For first kind first-order bessel function, whIt is
J1Carrier frequency, meetAnd
S7 utilizes B (x-d1,y-d2), according to I (x, y)=AB (x-d1,y-d2)·C(x-d1,y-d2) calculate C (x-d1,y-
d2) distribution
WhereinRhFor the radius of light passing circular hole；
S8 utilizes C (x-d1,y-d2) central bright spot, calculate its center of mass point M coordinate (x2c,y2c),
Wherein, region A' is C (x-d1,y-d2) central bright spot pixel region；
S9 utilizes point M coordinate (x2c,y2c), computational chart shows the zernike coefficient a of incident light wave 0 degree of astigmatism and 45 degree of astigmatisms4With
a5；
S10 calculates its corresponding signal using the spatial distribution of six 1 grade of specks on interference patternAccording to storedWith a3The look-up table of corresponding relationshipSearch with it is describedCorresponding a3, wherein a3It is incident light wave in partial wave
The defocus of corrugated position phase on face element part,For corresponding signal at six 1 grade of specks；
S11, by a1、a2、a3、a4And a5Substitute into the single sub-aperture of wave-front division element in corrugated phase mehtod formula W (x', y')=
a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5In (2x'y'), corrugated phase mehtod in i-th of aperture is obtained.
2. slope and curvature signal extracting method according to claim 1 based on sub-aperture wavefront amplitude modulation, feature
It is, the sub-aperture on the wave-front division element is square, round or regular polygon, and the external square of each sub-aperture is big
Small is 2Ra×2Ra。
3. slope and curvature signal extracting method according to claim 2 based on sub-aperture wavefront amplitude modulation, feature
It is, the diameter d of described light passing circular hole A, B, C and D are equal.
4. slope and curvature signal extracting method according to claim 1 based on sub-aperture wavefront amplitude modulation, feature
It is, the look-up table r1=T1(r2) establishment process are as follows:
S01, initialisation structures parameter establish rectangular coordinate system in photoelectric sensor on the plane xy, and enable functionCentral point is overlapped with coordinate origin；
S02 appoints take a point P'(r in a coordinate system1cosθ,r1Sin θ), according toIt counts respectively
Calculating coordinate around P' point is respectively 6 points of B (x, y) value Bj(j=1,2,3,4,5,6), wherein J1For first kind single order shellfish
Sai Er function, w are J1Carrier frequency, meet
S03 utilizes P'1~P'66 points B (x, y) value calculates this 6 points of mass center Q'(x'1c,y'1c)；
S04 calculates position offset size r of the point Q' relative to point P' using point P' and point Q' coordinate2,
S05, fixed θ value repeatedly update r within the set range with a fixed step size1, its correspondence is calculated according to the step of S02-S04
R2, establish r1With r2The look-up table r of corresponding relationship1=T1(r2)。
5. slope and curvature signal extracting method according to claim 1 based on sub-aperture wavefront amplitude modulation, feature
It is, the look-up tableEstablishment process are as follows:
S01 establishes the corrugated phase mehtod formula in the single sub-aperture of wave-front division element,
W (x', y')=a1x'+a2y'+a3[-1+2(x'2+y'2)]+a4(x'2-y'2)+a5(2x'y')
Wherein, a1And a2The respectively zernike coefficient of incident light wave corrugated position phase slope in X and Y-direction on wave-front division element,
a3、a4And a5Respectively incident light wave on wave-front division element the defocus of corrugated position phase, 0 degree of astigmatism and 45 degree of astigmatisms Ze Nike
Coefficient；
S02 enables coefficient a1、a2、a4And a5All zero, a3Different numerical value are taken, utilize on method of exhaustion simulation calculation interference image six
Corresponding signal at a 1 grade of speckIt establishesWith a3The look-up table of corresponding relationship
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101055223A (en) * | 2007-04-26 | 2007-10-17 | 中国科学院光电技术研究所 | Hartman wavefront sensor mass center measurement precision optimization method |
| WO2010116288A2 (en) * | 2009-04-06 | 2010-10-14 | Koninklijke Philips Electronics N.V. | Method and device for detecting coherent radiation |
| CN104280137A (en) * | 2014-09-15 | 2015-01-14 | 北京理工大学 | Hybrid wave-front sensing device based on four-light-beam interference |
| CN104280138A (en) * | 2014-09-15 | 2015-01-14 | 北京理工大学 | Wave surface phase measuring method based on four-beam interference |
-
2017
- 2017-01-06 CN CN201710009052.9A patent/CN106969844B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101055223A (en) * | 2007-04-26 | 2007-10-17 | 中国科学院光电技术研究所 | Hartman wavefront sensor mass center measurement precision optimization method |
| WO2010116288A2 (en) * | 2009-04-06 | 2010-10-14 | Koninklijke Philips Electronics N.V. | Method and device for detecting coherent radiation |
| CN104280137A (en) * | 2014-09-15 | 2015-01-14 | 北京理工大学 | Hybrid wave-front sensing device based on four-light-beam interference |
| CN104280138A (en) * | 2014-09-15 | 2015-01-14 | 北京理工大学 | Wave surface phase measuring method based on four-beam interference |
Non-Patent Citations (1)
| Title |
|---|
| 《Interferometric Shack–Hartmann wavefront sensor with an array of four-hole apertures》;David Lopez等;《APPLIED OPTICS》;20100420;第49卷(第12期);全文 |
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