CN106932844A - The preparation method of fused quartz nick cylindrical lens array - Google Patents
The preparation method of fused quartz nick cylindrical lens array Download PDFInfo
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- CN106932844A CN106932844A CN201710354588.4A CN201710354588A CN106932844A CN 106932844 A CN106932844 A CN 106932844A CN 201710354588 A CN201710354588 A CN 201710354588A CN 106932844 A CN106932844 A CN 106932844A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
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Abstract
The invention discloses a kind of preparation method of fused quartz nick cylindrical lens array, including：The carbon dioxide laser of continuous-stable is obtained from carbon dioxide laser；Carbon dioxide laser is focused；Fused quartz print after cleaning is placed on the focal position of the carbon dioxide laser of focusing；Carbon dioxide laser irradiation fused quartz print surface using galvanometer system after scanning focused；Being then placed in hydrofluoric acid solution carries out wet etching；The fused quartz nick cylindrical lens array that wet etching is formed is sprayed and is cleaned by ultrasonic, fused quartz nick cylindrical lens array is obtained.The present invention is scanned irradiation using the continuous CO 2 laser of power invariability；Succinctly efficiently directly realize one-dimensional cylindrical lens array on fused quartz surface, the manufacture of such as parallel nick cylindrical lens array, orthogonal nick cylindrical lens array and spiral nick cylindrical lens array, and the nick cylindrical lens array for manufacturing is without real focus, it is particularly suited for the application such as high power-beam shaping.
Description
Technical field
The invention belongs to optical element technology field, and in particular to a kind of preparation side of fused quartz nick cylindrical lens array
Method.
Background technology
Micro-cylindrical lens array is widely used in high-power laser beams shaping.Fused quartz with its excellent chemical stability and
Good optical property, the preparation of the extremely suitable micro-cylindrical lens array for being used under intense light conditions.At present, glass is made micro-
The method of lens array has ion-exchange, photosensitive glass method for hot forming, ion beam etching pattern transfer method, laser straight literary style
Deng.However, the preparation method of current glass material microlens array has significant limitation, some methods are only applicable to some
Special glass, and generally existing process is complicated, time-consuming, inefficiency and it is with high costs the characteristics of.For current
Glass micro-column lens array processes problems faced, works out a kind of microtrabeculae lens novel preparation method as the task of top priority.
In the prior art, patent of invention CN106125166A discloses a kind of controlled material micro-structural in situ and prepares fused quartz
The method of microlens array, it uses pulsed carbon dioxide laser, is irradiated by the pointwise of pulsed carbon dioxide laser and spliced
Mode the surface of fused quartz sample is irradiated, obtain the circular aperture of square stacked arrangement and hexagon stacked arrangement
Microlens array, paper document " Fabrication of concave microlens arrays by local fictive
Temperature modification of fused silica ", (Vol.42, No.6；March 15 2017；Optics
Letters), also disclose one kind and use pulsed carbon dioxide laser, irradiated by the pointwise of pulsed carbon dioxide laser
The mode of splicing is irradiated to the surface of fused quartz sample, obtains the circular port of orthogonal stacked arrangement and hexagon stacked arrangement
Footpath microlens array, Fig. 8 shows that the method prepares the optical microscopy map of the microlens array of hexagon (a) stacked arrangement
As (a) and the optical microscopic image (c) and imaging effect figure of the microlens array of imaging effect figure (b) and orthogonal stacked arrangement
D (), what is obtained in the prior art is the microlens array in the abnormity such as circular aperture or hexagon, square aperture, and for one
The cylindrical lens array of dimension, can also prepare without related technology in the prior art.
The content of the invention
It is an object of the invention to solve at least the above and/or defect, and provide at least will be described later excellent
Point.
In order to realize these purposes of the invention and further advantage, there is provided a kind of fused quartz nick cylindrical lens array
Preparation method, comprise the following steps：
Step one, fused quartz optics print is cleaned by ultrasonic；
Step 2, the carbon dioxide laser that continuous-stable is obtained from carbon dioxide laser；And it is saturating using field mirror f- θ
Mirror is focused to carbon dioxide laser；
Step 3, the fused quartz print after ultrasonic cleaning is loaded into fixture, and be placed on the carbon dioxide of f- θ lens focus
The focal position of laser；Simultaneously carbon dioxide laser is set to continuously to go out optical mode；
Step 4, the carbon dioxide laser irradiation fused quartz print surface using galvanometer system after scanning focused；
Fused quartz print after step 5, carbon dioxide laser irradiation is put into hydrofluoric acid solution carries out wet etching；
Step 6, the fused quartz nick cylindrical lens array to wet etching formation are sprayed and are cleaned by ultrasonic, and are melted
Quartzy nick cylindrical lens array.
Preferably, in the step 4, galvanometer system scans fused quartz print surface in the way of parallel progressive scan
Carry out, prepare parallel nick cylindrical lens array；The sweep span of the parallel progressive scan is 0.1mm~1mm.
Preferably, in the step 4, galvanometer system scanning fused quartz print surface, first with parallel progressive scan
Mode is carried out, and is progressively scanned followed by with perpendicular to previous scanning direction, prepares orthogonal nick cylindrical lens array；It is described
The sweep span of parallel progressive scan is 0.1mm~1mm.
Preferably, in the step 4, galvanometer system scanning fused quartz print surface is entered in the way of spiral sweep
OK, spiral nick cylindrical lens array is prepared；The sweep span of the spiral sweep is 0.1mm~1mm.
Preferably, the speed of the galvanometer system scanning is 1mm/s~3m/s；The carbon dioxide laser is radio frequency
Excitation carbon dioxide laser, wavelength is 10.6 μm, and spot diameter size range is 100 μm~2mm.
Preferably, in the step one, the mode of ultrasonic cleaning is：Fused quartz optics print is added into alkaline solution
In, and using being processed under the supersonic frequency of 60KHz, 80KHz, 120KHz, 160KHz, 180KHz, 200KHz successively, each is frequently
Rate process time is 3~5min, then by fused quartz optics print addition high purity water, under the frequency of 100~150KHz, is surpassed
5~10min of sound, drying.
Preferably, the preparation method of the alkaline solution is：By weight, 5~10 parts of NaOH, potassium hydroxide are taken
3~5 parts, during 1~3 part of urea, 1~3 part of tetra- sodium of EDTA, 1~3 part of APG add 150~200 parts 60~70 DEG C of water,
Stir, after being cooled to room temperature, 200~300 parts of water of addition, 0.5~1.5 part of Sodium Polyacrylate, NTA 0.1~
0.3 part, 0.1~0.3 part of octadecyl dihydroxy ethyl amine oxide, 0.1~0.5 part of sodium gluconate, 2,4- dihydroxydiphenylsulisomers
0.1~0.3 part, 0.1~0.3 part of 1- ethyl-3-methylimidazoles lactic acid stir, obtain mixed solution, i.e. alkaline solution.
Preferably, the mixed solution also includes following processing procedure：Mixed solution is placed in thermostat, from spy
Hair style pulse ultrasonic wave instrument carries out ultrasonically treated, the probe insertion mixing of the sonde-type pulse ultrasonic wave instrument to mixed liquor
5~10cm under liquid, the liquid level of mixed liquor keeps 12~15cm, and the burst length is 15~20s, and dutycycle is 60%~
85%, it is 25 DEG C that temperature is controlled in thermostat, and the sound intensity is 100~500W/cm2, 25~45KHz of supersonic frequency, process time is
60~120 minutes；A diameter of 20mm of the probe.
Preferably, in the step one, in ultrasonication, ammonia is passed through to cleaning in liquor；The ammonia
The Ventilation Rate of gas is 50-100mL/min；In the step 6, it is cleaned by ultrasonic using the addition of fused quartz optics print is high-purity
In water, under the frequency of 100~150KHz, 5~10min of ultrasound, and in ultrasonic cleaning process, to being passed through N in pure and fresh liquid2
Gas；The N2The Ventilation Rate of gas is 100-150mL/min.
Preferably, in the step 5, the process of wet etching is：Fused quartz print after radiation treatment is put into hydrogen
In fluorspar acid solution, and use is carved under million sound field frequencies of 0.8MHz, 1MHz, 1.2MHz, 1.3MHz, 1.5MHz successively
Erosion, each million sound field frequency etch period are 5~10min；The mass fraction of the hydrofluoric acid solution is 1~3%.
It is saturating that the present invention improves fused quartz local wet-etch rate acquisition nick post using continuous CO 2 laser irradiation
Lens array.Using above scheme, directly parallel nick cylindrical lens array, orthogonal nick post lens array are realized on fused quartz surface
The manufacture of row and spiral nick cylindrical lens array, the nick cylindrical lens array of manufacture is particularly suited for high power light without real focus
Beam shaping etc. is applied.
The present invention at least includes following beneficial effect：
(1) preparation method of the fused quartz nick cylindrical lens array provided using the present invention, using the continuous of power invariability
Carbon dioxide laser；One-dimensional cylindrical lens array directly efficiently succinctly is realized on fused quartz surface, such as parallel nick post
The manufacture of lens array, orthogonal nick cylindrical lens array and spiral nick cylindrical lens array, and the one-dimensional nick post for manufacturing
Lens array is particularly suited for the application such as high power-beam shaping without real focus.
(2) coordinate the cleaning way of ultrasound using alkaline solution, fused quartz optics print is cleaned, greatly improve
The surface cleanliness of fused quartz element, is conducive to later stage radiation treatment process.
Further advantage of the invention, target and feature embody part by following explanation, and part will also be by this
The research and practice of invention and be understood by the person skilled in the art.
Brief description of the drawings：
Fig. 1 is the optical microscopy map of nick cylindrical lens array obtained in embodiment 1；
Fig. 2 is embodiment 1 perpendicular to nick cylindrical lens array direction surface profile map；
Fig. 3 is optical microscope nick cylindrical lens array imaging effect figure in embodiment 1；
Fig. 4 is the optical microscopy map of orthogonal nick cylindrical lens array obtained in embodiment 2；
Fig. 5 is the orthogonal nick cylindrical lens array imaging effect figure of the optical microscope of embodiment 2；
Fig. 6 is the spiral nick cylindrical lens array optical microscopy map obtained in embodiment 3；
Fig. 7 is the optical microscope spiral nick cylindrical lens array imaging effect figure of embodiment 3；
Fig. 8 be the microlens array of hexagon (a) stacked arrangement for obtaining in the prior art optical microscopic image (a) and
The optical microscopic image (c) and imaging effect figure (d) of the microlens array of imaging effect figure (b) and orthogonal stacked arrangement.
Specific embodiment：
The present invention is described in further detail below in conjunction with the accompanying drawings, to make those skilled in the art with reference to specification text
Word can be implemented according to this.
It should be appreciated that it is used herein such as " have ", "comprising" and " including " term do not allot one or many
The presence or addition of individual other elements or its combination.
Embodiment 1：
A kind of preparation method of fused quartz nick cylindrical lens array, comprises the following steps：
Step one, fused quartz optics print is cleaned by ultrasonic；
Step 2, the titanium dioxide that continuous-stable is obtained from 100W RF exciteds carbon dioxide laser (dutycycle 100%)
Carbon laser；And carbon dioxide laser is focused using field mirror f- θ lens；
Step 3, the fused quartz print after ultrasonic cleaning is loaded into fixture, and be placed on the carbon dioxide of f- θ lens focus
The focal position of laser；Simultaneously carbon dioxide laser is set to continuously to go out optical mode；
Step 4, use galvanometer system scanning focused after carbon dioxide laser irradiated in the way of parallel progressive scan it is molten
Quartzy print surface；Galvanometer system sweep speed is 3m/s, sweep span 0.1mm；
Fused quartz print after step 5, carbon dioxide laser irradiation is put into hydrofluoric acid solution carries out 40 points of wet etching
Clock；
Step 6, the fused quartz nick cylindrical lens array to wet etching formation are sprayed and are cleaned by ultrasonic, and are put down
Row nick cylindrical lens array；As shown in figure 1, optical microscopic image shows the nick cylindrical lens array smooth even for preparing；Step
The profile that instrument is gathered perpendicular to post lens direction is as shown in Fig. 2 contour curve points out that each post concave lens surface profile for preparing is high
Degree is consistent；Observation by light microscope nick cylindrical lens array to the imaging effect of bottom illuminating light source as shown in figure 3, it was observed that one
The dimension virtual image is uniformly apparent, illustrates that the nick cylindrical lens array for preparing has excellent optical property.
Embodiment 2：
A kind of preparation method of fused quartz nick cylindrical lens array, comprises the following steps：
Step one, fused quartz optics print is cleaned by ultrasonic；
Step 2, the carbon dioxide that continuous-stable is obtained from 60W RF exciteds carbon dioxide laser (dutycycle 100%)
Laser；And carbon dioxide laser is focused using field mirror f- θ lens；
Step 3, the fused quartz print after ultrasonic cleaning is loaded into fixture, and be placed on the carbon dioxide of f- θ lens focus
The focal position of laser；Simultaneously carbon dioxide laser is set to continuously to go out optical mode；
The quartzy print surface of the parallel progressive scan of step 4, the carbon dioxide laser using galvanometer system after scanning focused
Afterwards, then by scanning direction change 90 degree in the way of the first parallel progressive scan in pre irradiation area；Galvanometer system sweep speed is 3m/s,
Sweep span 0.08mm；
Fused quartz print after step 5, carbon dioxide laser irradiation is put into hydrofluoric acid solution carries out 40 points of wet etching
Clock；
Step 6, the fused quartz nick cylindrical lens array to wet etching formation are sprayed and are cleaned by ultrasonic, and are obtained just
Hand over nick cylindrical lens array；As shown in figure 4, optical microscopic image shows that the orthohormbic structure for preparing is uniform；Observation by light microscope
Orthogonal nick cylindrical lens array is as shown in Figure 5 to the imaging effect of bottom illuminating light source.
Embodiment 3：
A kind of preparation method of fused quartz nick cylindrical lens array, comprises the following steps：
Step one, fused quartz optics print is cleaned by ultrasonic；
Step 2, the titanium dioxide that continuous-stable is obtained from 100W RF exciteds carbon dioxide laser (dutycycle 100%)
Carbon laser；And carbon dioxide laser is focused using field mirror f- θ lens；
Step 3, the fused quartz print after ultrasonic cleaning is loaded into fixture, and be placed on the carbon dioxide of f- θ lens focus
The focal position of laser；Simultaneously carbon dioxide laser is set to continuously to go out optical mode；
Step 4, use galvanometer system scanning focused after carbon dioxide laser with spiral fashion irradiate fused quartz print
Surface；Galvanometer system sweep speed is 3m/s, sweep span 0.1mm；
Fused quartz print after step 5, carbon dioxide laser irradiation is put into hydrofluoric acid solution carries out 40 points of wet etching
Clock；
Step 6, the fused quartz nick cylindrical lens array to wet etching formation are sprayed and are cleaned by ultrasonic, and obtain spiral shell
Rotation nick cylindrical lens array；As shown in fig. 6, optical microscopic image shows that the helical structure for preparing is uniform；Observation by light microscope
Spiral nick cylindrical lens array is as shown in Figure 7 to the imaging effect of bottom illuminating light source.
Embodiment 4：
In the step one, the mode of ultrasonic cleaning is：By fused quartz optics print add alkaline solution in, and using according to
It is secondary to be processed under the supersonic frequency of 60KHz, 80KHz, 120KHz, 160KHz, 180KHz, 200KHz, each frequency processing time
It is 3min, then by fused quartz optics print addition high purity water, under the frequency of 100KHz, 5~10min of ultrasound is dried；Adopt
Cleaned with multi-frequency ultrasonic, frequency is stepped up, large particulate matter can be cleaned under low-frequency ultrasonic waves effect, in high frequency ultrasound
Finely ground particle substance can be cleaned under ripple effect, the comprehensive cleaning to fused quartz element is realized；
It is identical with technological parameter and in process and embodiment 1, prepares parallel nick cylindrical lens array.
Embodiment 5：
The preparation method of the alkaline solution is：By weight, take 8 parts of NaOH, 4 parts of potassium hydroxide, 2 parts of urea,
2 parts of tetra- sodium of EDTA, 2 parts of APG are added in 200 parts 65 DEG C of water, are stirred, after being cooled to room temperature, 250 parts of water of addition,
1 part of Sodium Polyacrylate, 0.2 part of NTA, 0.2 part of octadecyl dihydroxy ethyl amine oxide, 0.3 part of sodium gluconate,
2,4- 0.2 part of dihydroxydiphenylsulisomers, 0.2 part of 1- ethyl-3-methylimidazoles lactic acid stir, and obtain mixed solution, will mix
Solution is placed in thermostat, mixed liquor is carried out from sonde-type pulse ultrasonic wave instrument ultrasonically treated, obtains alkaline solution；Institute
8m under the probe insertion mixed liquor of sonde-type pulse ultrasonic wave instrument is stated, the liquid level of mixed liquor keeps 14cm, burst length
It is 20s, dutycycle is 70%, controls temperature for 25 DEG C in thermostat, the sound intensity is 300W/cm2, supersonic frequency 35KHz, during treatment
Between be 90 minutes；A diameter of 20mm of the probe；Alkaline solution is pre-processed using sonde-type pulse ultrasonic wave instrument,
The mixing of each composition of alkaline solution can be made more uniform, and the foam for preparing and being produced during alkaline solution can be eliminated,
Make alkaline solution to the cleaning performance of fused quartz optical component more preferably, and after cleaning alkaline solution residual quantity it is less, favorably
In later stage radiation treatment；
Remaining parameter and technical process with it is identical in embodiment 4, prepare parallel nick cylindrical lens array.
Embodiment 6：
In the step one, the mode of ultrasonic cleaning is：By fused quartz optics print add alkaline solution in, and using according to
It is secondary to be processed under the supersonic frequency of 60KHz, 80KHz, 120KHz, 160KHz, 180KHz, 200KHz, each frequency processing time
It is 5min, then by fused quartz optics print addition high purity water, under the frequency of 120KHz, ultrasonic 10min is dried；Super
During sonication, ammonia is passed through to cleaning in liquor；The Ventilation Rate of the ammonia is 80mL/min；
In the step 6, ultrasonic cleaning use adds fused quartz optics print in high purity water, in the frequency of 120KHz
Under, ultrasonic 8min, and in ultrasonic cleaning process, to being passed through N in pure and fresh liquid2Gas；The N2The Ventilation Rate of gas is
120mL/min；Nitrogen is passed through the removal dynamics that can strengthen to impurity, and the bubble for producing can take away impurity particle
Thing, makes cleaning performance more preferably；
Remaining parameter and technical process with it is identical in embodiment 2, prepare orthogonal nick cylindrical lens array.
Embodiment 7：
The preparation method of the alkaline solution is：By weight, take 10 parts of NaOH, 3 parts of potassium hydroxide, 1 part of urea,
2 parts of tetra- sodium of EDTA, 2 parts of APG are added in 200 parts 65 DEG C of water, are stirred, after being cooled to room temperature, 250 parts of water of addition,
1 part of Sodium Polyacrylate, 0.2 part of NTA, 0.1 part of octadecyl dihydroxy ethyl amine oxide, 0.3 part of sodium gluconate,
2,4- 0.2 part of dihydroxydiphenylsulisomers, 0.2 part of 1- ethyl-3-methylimidazoles lactic acid stir, and obtain mixed solution, will mix
Solution is placed in thermostat, mixed liquor is carried out from sonde-type pulse ultrasonic wave instrument ultrasonically treated, obtains alkaline solution；Institute
5m under the probe insertion mixed liquor of sonde-type pulse ultrasonic wave instrument is stated, the liquid level of mixed liquor keeps 15cm, burst length
It is 20s, dutycycle 60% controls temperature for 25 DEG C in thermostat, the sound intensity is 300W/cm2, supersonic frequency 35KHz, process time
It is 90 minutes；A diameter of 20mm of the probe.
Remaining parameter and technical process with it is identical in embodiment 6, prepare orthogonal nick cylindrical lens array.
Embodiment 8：
In the step 5, the process of wet etching is：Fused quartz print after radiation treatment is put into hydrofluoric acid solution
In, and using being performed etching under million sound field frequencies of 0.8MHz, 1MHz, 1.2MHz, 1.3MHz, 1.5MHz successively, each million
Sound field frequency etch period is 8min；The mass fraction of the hydrofluoric acid solution is 2%；Etched using multifrequency, frequency is progressively carried
Rise, bulky grain pollutant can be eliminated under low frequency contribution, small particles of pollution thing can be eliminated under high frequency effect, effectively removal
The pollutant introduced during fused quartz element scan radiation treatment, greatly improves the cleanliness factor of fused quartz element；
Remaining parameter and technical process with it is identical in embodiment 3, prepare spiral nick cylindrical lens array.
Embodiment 9：
In the step 5, the process of wet etching is：Fused quartz print after radiation treatment is put into hydrofluoric acid solution
In, and using being performed etching under million sound field frequencies of 0.8MHz, 1MHz, 1.2MHz, 1.3MHz, 1.5MHz successively, each million
Sound field frequency etch period is 8min；The mass fraction of the hydrofluoric acid solution is 2.5%；
Remaining parameter and technical process with it is identical in embodiment 6, prepare orthogonal nick cylindrical lens array.
Embodiment 10：
In the step 5, the process of wet etching is：Fused quartz print after radiation treatment is put into hydrofluoric acid solution
In, and using being performed etching under million sound field frequencies of 0.8MHz, 1MHz, 1.2MHz, 1.3MHz, 1.5MHz successively, each million
Sound field frequency etch period is 8min；The mass fraction of the hydrofluoric acid solution is 2.5%；
Remaining parameter and technical process with it is identical in embodiment 7, prepare orthogonal nick cylindrical lens array.
Although embodiment of the present invention is disclosed as above, it is not restricted to listed in specification and implementation method
With, it can be applied to various suitable the field of the invention completely, for those skilled in the art, can be easily
Other modification is realized, therefore under the universal limited without departing substantially from claim and equivalency range, the present invention is not limited
In specific details and shown here as the legend with description.
Claims (10)
1. a kind of preparation method of fused quartz nick cylindrical lens array, it is characterised in that comprise the following steps：
Step one, fused quartz optics print is cleaned by ultrasonic；
Step 2, the carbon dioxide laser that continuous-stable is obtained from carbon dioxide laser；And use field mirror f- θ lens pair
Carbon dioxide laser is focused；
Step 3, the fused quartz print after ultrasonic cleaning is loaded into fixture, and be placed on the carbon dioxide laser of f- θ lens focus
Focal position；Simultaneously carbon dioxide laser is set to continuously to go out optical mode；
Step 4, the carbon dioxide laser irradiation fused quartz print surface using galvanometer system after scanning focused；
Fused quartz print after step 5, carbon dioxide laser irradiation is put into hydrofluoric acid solution carries out wet etching；
Step 6, the fused quartz nick cylindrical lens array to wet etching formation are sprayed and are cleaned by ultrasonic, and obtain fused quartz
Nick cylindrical lens array.
2. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the step 4
In, galvanometer system scanning fused quartz print surface is carried out in the way of parallel progressive scan, prepares parallel micro- concave cylindrical lenses
Array；The sweep span of the parallel progressive scan is 0.1mm~1mm.
3. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the step 4
In, galvanometer system scanning fused quartz print surface is carried out, followed by with perpendicular to previous in the way of parallel progressive scan first
Scanning direction progressive scan, prepare orthogonal nick cylindrical lens array；The sweep span of the parallel progressive scan is
0.1mm~1mm.
4. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the step 4
In, galvanometer system scanning fused quartz print surface is carried out in the way of spiral sweep, prepares spiral nick post lens array
Row；The sweep span of the spiral sweep is 0.1mm~1mm.
5. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the galvanometer system
The speed of scanning is 1mm/s~3m/s；The carbon dioxide laser is RF excited carbon dioxide laser, and wavelength is 10.6
μm, spot diameter size range is 100 μm~2mm.
6. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the step one
In, the mode of ultrasonic cleaning is：By fused quartz optics print add alkaline solution in, and using successively 60KHz, 80KHz,
Processed under the supersonic frequency of 120KHz, 160KHz, 180KHz, 200KHz, each frequency processing time is 3~5min, then will
Fused quartz optics print is added in high purity water, under the frequency of 100~150KHz, 5~10min of ultrasound, drying.
7. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 6, it is characterised in that the alkaline solution
Preparation method be：By weight, take 5~10 parts of NaOH, 3~5 parts of potassium hydroxide, 1~3 part of urea, the sodium 1 of EDTA tetra-~
3 parts, during 1~3 part of APG adds 150~200 parts 60~70 DEG C of water, stir, after being cooled to room temperature, add water
200~300 parts, 0.5~1.5 part of Sodium Polyacrylate, 0.1~0.3 part of NTA, octadecyl dihydroxy ethyl amine oxide
0.1~0.3 part, 0.1~0.5 part of sodium gluconate, 0.1~0.3 part of 2,4- dihydroxydiphenylsulisomers, 1- ethyl-3-methylimidazoles
0.1~0.3 part of lactic acid stirs, and obtains mixed solution, i.e. alkaline solution.
8. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 7, it is characterised in that the mixed solution
Also include following processing procedure：Mixed solution is placed in thermostat, mixed liquor is entered from sonde-type pulse ultrasonic wave instrument
Row is ultrasonically treated, 5~10cm, the liquid level of mixed liquor under the probe insertion mixed liquor of the sonde-type pulse ultrasonic wave instrument
12~15cm is kept, the burst length is 15~20s, and dutycycle is 60%~85%, it is 25 DEG C, the sound intensity that temperature is controlled in thermostat
It is 100~500W/cm2, 25~45KHz of supersonic frequency, process time is 60~120 minutes；A diameter of 20mm of the probe.
9. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 6, it is characterised in that the step one
In, in ultrasonication, ammonia is passed through to cleaning in liquor；The Ventilation Rate of the ammonia is 50-100mL/min；
In the step 6, ultrasonic cleaning use adds fused quartz optics print in high purity water, under the frequency of 100~150KHz,
5~10min of ultrasound, and in ultrasonic cleaning process, to being passed through N in pure and fresh liquid2Gas；The N2The Ventilation Rate of gas is
100-150mL/min。
10. the preparation method of fused quartz nick cylindrical lens array as claimed in claim 1, it is characterised in that the step 5
In, the process of wet etching is：Fused quartz print after radiation treatment is put into hydrofluoric acid solution, and use exists successively
Performed etching under million sound field frequencies of 0.8MHz, 1MHz, 1.2MHz, 1.3MHz, 1.5MHz, each million sound field frequency etch period
It is 5~10min；The mass fraction of the hydrofluoric acid solution is 1~3%.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113189780A (en) * | 2021-04-21 | 2021-07-30 | 吉林省长光瑞思激光技术有限公司 | Light path shaping system capable of realizing laser round and square spot change |
| CN113296178A (en) * | 2021-06-09 | 2021-08-24 | 中国工程物理研究院激光聚变研究中心 | CO (carbon monoxide)2Method for directly preparing sinusoidal phase grating on fused quartz surface by laser |
| CN116374947A (en) * | 2023-06-02 | 2023-07-04 | 中国工程物理研究院电子工程研究所 | Fused quartz cantilever beam-mass block structure and processing method thereof |
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| US20150247954A1 (en) * | 2014-03-03 | 2015-09-03 | Korea Advanced Institute Of Science And Technology | Batch fabrication method of three-dimensional photonic microstructures |
| CN105301678A (en) * | 2014-07-16 | 2016-02-03 | Nlt科技股份有限公司 | Lenticular lens sheet, display apparatus and electronic equipment |
| CN106125166A (en) * | 2016-07-22 | 2016-11-16 | 中国工程物理研究院激光聚变研究中心 | The method that controlled material micro structure prepares fused quartz microlens array in situ |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113189780A (en) * | 2021-04-21 | 2021-07-30 | 吉林省长光瑞思激光技术有限公司 | Light path shaping system capable of realizing laser round and square spot change |
| CN113189780B (en) * | 2021-04-21 | 2023-03-24 | 吉林省长光瑞思激光技术有限公司 | Light path shaping system capable of realizing laser round and square spot change |
| CN113296178A (en) * | 2021-06-09 | 2021-08-24 | 中国工程物理研究院激光聚变研究中心 | CO (carbon monoxide)2Method for directly preparing sinusoidal phase grating on fused quartz surface by laser |
| CN116374947A (en) * | 2023-06-02 | 2023-07-04 | 中国工程物理研究院电子工程研究所 | Fused quartz cantilever beam-mass block structure and processing method thereof |
| CN116374947B (en) * | 2023-06-02 | 2023-08-25 | 中国工程物理研究院电子工程研究所 | Fused quartz cantilever beam-mass block structure and processing method thereof |
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