CN106906510A - A kind of modified preparation facilities of workpiece local surfaces - Google Patents

A kind of modified preparation facilities of workpiece local surfaces Download PDF

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Publication number
CN106906510A
CN106906510A CN201710277889.1A CN201710277889A CN106906510A CN 106906510 A CN106906510 A CN 106906510A CN 201710277889 A CN201710277889 A CN 201710277889A CN 106906510 A CN106906510 A CN 106906510A
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Prior art keywords
workpiece
modified
preparation facilities
electrophoresis
local surfaces
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CN201710277889.1A
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CN106906510B (en
Inventor
何俊峰
郭钟宁
刘莉
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Guangdong University of Technology
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Guangdong University of Technology
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Priority to CN201710277889.1A priority Critical patent/CN106906510B/en
Publication of CN106906510A publication Critical patent/CN106906510A/en
Priority to PCT/CN2017/111271 priority patent/WO2018196347A1/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00Electrophoretic coating characterised by the process
    • C25D13/22Servicing or operating apparatus or multistep processes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00Electrophoretic coating characterised by the process
    • C25D13/02Electrophoretic coating characterised by the process with inorganic material
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrostatic Separation (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Micromachines (AREA)

Abstract

The invention discloses the preparation facilities that a kind of workpiece local surfaces are modified, including:Particle solution feedway for providing from nanoparticles solution to workpiece;Electrophoresis system, electrophoresis system deposits to workpiece surface for providing electrophoretic action with the particle in aided nano particle solution;For the part on coating workpieces surface to realize the movable mask that minor insulation is processed, the movable mask is insulating part;Attemperating unit, attemperating unit is used to change the surface temperature of workpiece.The present invention proposes a kind of modified preparation facilities of workpiece local surfaces, using insulation movable mask plane with preferable effect of fitting can be obtained on curve surface work pieces, the use of movable mask can show stronger Surface Texture preparative capacibility and adaptability to plane and curve surface work pieces, the electric conductivity of workpiece surface can be controlled due to the movable mask for insulating, can realize that locality efficient, high, the high-quality close and distant water surface in the metal surface of regional area or given shape that carries out are modified.

Description

A kind of modified preparation facilities of workpiece local surfaces
Technical field
The present invention relates to materials application technical field, more specifically to the preparation that a kind of workpiece local surfaces are modified Device.
Background technology
The high speed development of modern science and technology, the increasingly raising to metal material surface characteristics requirement, to process for treating surface and Technique has new development and expansion, surface of workpiece is carried out the biomimetic features such as hydrophobe surface it is modified be more popular Sufacing.
With the discovery of hydrophobic surface " lotus leaf effect ", super hydrophobic material be widely used in automatically cleaning, antifreeze, antifog, anti-corrosion, Deter, micro-fluid chip, lossless liquid conveying etc. aspect, illustrate the wide utilization prospect of super hydrophobic material.
There are thermal sintering method, nickel salt thermal decomposition method etc. to relatively conventional in the method for material surface modifying in the prior art, However, there may be following technical problem in these methods:Need to carry out high-temperature process, it is relatively costly, and impregnating Modified material attachment may be uneven in journey, is easily caused treatment carbon material surface hydrophobe property uneven.Nickel salt thermal decomposition method It is not suitable for the relatively low matrix material of fusing point, is only applicable to the coctostable substances such as ceramics, glass, carbonic acid silicon.In addition, conventional plane and Partial modification processing in non-planar metal surface is typically more difficult, and Surface Texture and selective is efficiently produced on on-plane surface workpiece Efficiently prepare Surface Texture also have certain difficulty.
In sum, the preparation facilities that a kind of convenience is surface-treated to various workpieces how is provided, is current sheet Art personnel's problem demanding prompt solution.
The content of the invention
In view of this, it is an object of the invention to provide the preparation facilities that a kind of workpiece local surfaces are modified, the preparation facilities Can facilitate carries out surface modification treatment to workpiece.
To achieve these goals, the present invention provides following technical scheme:
A kind of modified preparation facilities of workpiece local surfaces, including:
Particle solution feedway for providing from nanoparticles solution to workpiece;
Electrophoresis system, the electrophoresis system is used to provide electrophoretic action to aid in the particle in the nanoparticles solution to sink Product arrives the workpiece surface;
For the part on coating workpieces surface to realize the movable mask that minor insulation is processed, the movable mask is insulation Part;
Attemperating unit, the attemperating unit is used to change the surface temperature of the workpiece.
Preferably, the electrophoresis system includes:
Electrophoresis auxiliary cathode fixture for connecting the electrophoresis auxiliary cathode, the electrophoresis auxiliary cathode fixture is provided with Electrophoresis auxiliary cathode;
Electrophoresis accessory system, the output end of the electrophoresis accessory system connects the electrophoresis auxiliary cathode and the work respectively Part.
Preferably, the movable mask connection control device, the control device is used to control the insulation activity mask Covering position is simultaneously pressed in the part of workpiece surface.
Preferably, the nanoparticles solution includes several metallic particles, and/or several non-metallic particle, described Particle solution feedway is the particle solution mixture circulatory system for the nanoparticles solution to be mixed.
Preferably, the particle solution mixture circulatory system includes that vibrating device, magnetic stirring apparatus, suspension attract dress Put, one or more in solution circulating device.
Preferably, the electrophoresis auxiliary cathode is connected to machine tool chief axis, and the machine tool chief axis are used to control the electrophoresis auxiliary Help the distance of negative electrode and the workpiece.
Preferably, also including micro- three-dimensional movement platform of accurate three-dimensional motion, micro- three-dimensional movement platform can be realized Processing groove is provided with, the work piece holder for fixing the workpiece is arranged in the processing groove.
Preferably, micro- three-dimensional movement platform is connected with the machine tool chief axis with integrated switch board.
Preferably, the attemperating unit includes vacuum control module or auxiliary Gas Control Module.
Preferably, also including for being detected to the distribution of particles situation under workpiece surface deposition conditions and molten condition CCD video detection systems.
The present invention proposes a kind of modified preparation facilities of workpiece local surfaces, for conventional plane and non-planar metal surface The more difficult problem of partial modification processing, and Surface Texture, selectively efficiently is efficiently produced on on-plane surface workpiece Prepare the problem of Surface Texture, using insulation movable mask plane with preferable effect of fitting can be obtained on curve surface work pieces Really, the use of movable mask can show stronger Surface Texture preparative capacibility and adaptability to plane and curve surface work pieces, by Can control the electric conductivity of workpiece surface in the movable mask of insulation, can locality efficient, high, high-quality carry out partial zones The close and distant water surface in metal surface of domain or given shape is modified.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing The accompanying drawing to be used needed for having technology description is briefly described, it should be apparent that, drawings in the following description are only this Inventive embodiment, for those of ordinary skill in the art, on the premise of not paying creative work, can also basis The accompanying drawing of offer obtains other accompanying drawings.
Fig. 1 is a kind of schematic diagram of the modified preparation facilities of workpiece local surfaces provided by the present invention.
1 is workbench, 2 is particle solution mixture circulatory system, 3 is CCD Online Videos detecting system, 4 is machine tool chief axis, 5 is electrophoresis auxiliary cathode fixture, 6 is workpiece, 7 is processing groove, 8 is work piece holder, 9 is activity mask and its control system, 10 For micro- three-dimensional movement platform, 11 are electrophoresis accessory system, 12 it is vacuum and temperature control system, 13 is integrated switch board.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made Embodiment, belongs to the scope of protection of the invention.
Core of the invention is to provide a kind of modified preparation facilities of workpiece local surfaces, and it is right that the preparation facilities can facilitate Workpiece carries out surface modification treatment.
Fig. 1 is refer to, Fig. 1 is a kind of schematic diagram of the modified preparation facilities of workpiece local surfaces provided by the present invention.
A kind of modified preparation facilities of workpiece local surfaces provided by the present invention, is mainly used in the table to metal processing piece Face is processed, and mainly includes in structure composition:Particle solution feedway, electrophoresis system, movable mask and temperature control Device.
Particle solution feedway is used to provide nanoparticles solution, hereinafter referred to as solution, nanoparticles solution to workpiece 6 The solution being as surface-treated to workpiece 6.Electrophoresis system is used to provide electrophoretic action with aided nano particle solution Particle deposits to the surface of workpiece 6.The part that the movable mask of insulation is used to be covered in workpiece surface is processed with realizing minor insulation, Movable mask can be arranged on the surface of workpiece 6 when using, it is to avoid the workpiece part above-mentioned solution of directly contact.Attemperating unit is used to change Become the surface temperature of workpiece 6.
It should be noted that above-mentioned nanoparticles solution receiving of may be referred in the prior art to be surface-treated workpiece Scale particles solution, solution is arranged in container, if the solution comprising at least two type of particle, can in a reservoir set use In the device of stirring, to make the degree of mixing of solution higher.Electrophoresis system preferably deposits solution particles with electrophoretic action To the surface of workpiece 6, workpiece and solution is set to form auxiliary electric field, so that the particle in assisted solution deposits to workpiece surface in order.
It should be noted that above-mentioned movable mask is covered in workpiece surface, because movable mask is by electro-insulating rubber or insulation Material is made, it is possible to making the covering part of workpiece avoid deposited particles, it is to avoid forms surface and is modified.The structure of movable mask It is various, can be soft or hard, shape and structure also can need to be adjusted according to workpiece.In process, activity Mask is mutually compressed with workpiece 6, to process workpiece regional area surface different shape, the surface modification effect of diverse location.
Above-mentioned attemperating unit is used for after workpiece completes particle deposition by changing the surface temperature of workpiece, controls workpiece table Face variable grain melting self assembly hydrophobe is modified.
The present invention proposes a kind of modified preparation dress in workpiece regional area surface of utilization electrophoresis system special operations mask Put, for conventional plane and the more difficult problem of non-planar metal surface partial modification processing, and height on on-plane surface workpiece Effect produces Surface Texture, selectively efficiently prepares the problem of Surface Texture, using the movable mask of insulation in plane and song Preferably laminating effect can be obtained on the workpiece of face, the use of movable mask can show stronger to plane and curve surface work pieces Surface Texture preparative capacibility and adaptability, the electric conductivity of workpiece surface can be controlled due to the movable mask for insulating, and can be realized Efficiently, locality high, the high-quality close and distant water surface in the metal surface of regional area or given shape that carries out are modified.
On the basis of above-described embodiment, electrophoresis system is specifically included:Electrophoresis auxiliary cathode and electrophoresis accessory system 11, There is the fixture for connecting the suction tube of particle solution feedway on main shaft, electrophoresis auxiliary cathode is provided with electrophoresis auxiliary cathode Fixture 5.The output end of electrophoresis accessory system 11 connects the electrophoresis auxiliary cathode and workpiece 6 respectively.
It should be noted that having electric field between electrophoresis auxiliary cathode and workpiece 6, it is easy to the deposition of nano-scale particle.This Electric field is provided using electrophoresis accessory system in embodiment, the electric field environment of safety and stabilization is ensure that.
Optionally, above-mentioned electrophoresis auxiliary cathode fixture 5 can be arranged on power set, main shaft of such as lathe etc., led to Crossing power set drives electrophoresis auxiliary cathode fixture 5 to move, and is mainly moved along the direction near and away from workpiece, so as to adjust work Speed of particle accumulation etc. on part.
Optionally, either AC or DC sources are passed to electrophoresis auxiliary cathode and workpiece 6 in processing, makes workpiece 6 with electricity Auxiliary electric field is formed between swimming negative electrode, auxiliary particle is deposited in order, and improves deposition efficiency.
On the basis of above-mentioned any one embodiment, movable mask connects control device, and control device is used to control Insulation activity mask covering position is simultaneously pressed in the part on the surface of workpiece 6.
Optionally, above-mentioned control device can be the movable mask control device being arranged in Fig. 1 on workpiece 6, Huo Zhewei Integrated switch board 13 in Fig. 1.
On the basis of above-mentioned any one embodiment, above-mentioned all devices and system can be arranged on workbench 1 On.
Above-mentioned any one embodiment basis on, if nanoparticles solution include several metallic particles, and/or Dry kind of non-metallic particle, particle solution feedway is the particle solution mixture circulatory system for nanoparticles solution to be mixed 2。
On the basis of above-mentioned any one embodiment, particle solution mixture circulatory system 2 includes vibrating device, magnetic force One or more in agitating device, suspension suction device, solution circulating device.
Particle solution mixture circulatory system 2 is placed on workbench 1, and ultrasound is provided with particle solution mixture circulatory system 2 Vibration module, magnetic agitation module, suspension attract one or more in module and solution loop module, such that it is able to realize Identical particle or variable grain are sufficiently mixed, and solution loop module has and the work(such as to be filtered, recycled to suspension Energy.
On the basis of above-mentioned any one embodiment, electrophoresis auxiliary cathode is connected to machine tool chief axis, and machine tool chief axis are used In control electrophoresis auxiliary cathode and the distance of workpiece.Particle solution mixture circulatory system 2 is connected with machine tool chief axis 4, machine tool chief axis 4 It is connected with pipe clamp is attracted, suction tube is used to for the nanoparticles solution in particle solution mixture circulatory system 2 to be attracted to workpiece Surface, machine tool chief axis 4 are used to control electrophoresis auxiliary cathode fixture and attract pipe clamp to be moved along the direction closer or far from workpiece, To adjust speed of particle accumulation etc. on workpiece.
Optionally, above-mentioned machine tool chief axis 4 can also make electrophoresis auxiliary cathode fixture 5 along parallel to the planar movement of workpiece 6.
Refer to Fig. 1, machine tool chief axis 4 can be combined easily with particle solution mixture circulatory system 2, by with main shaft 4 Attraction 5 solution for mixing of pipe clamp of connection are attracted to the surface of workpiece 6 from particle solution mixture circulatory system 2.Wherein, may be used So that once the surface of workpiece 6 repeatedly can also be placed in solution is mixed.Furthermore it is possible to including multiple electrophoresis auxiliary cathode fixtures 5, Machine tool chief axis combined with electrophoresis auxiliary cathode fixture 5 can be used, and can online switch different negative electrodes, be constituted with different workpieces Electrophoresis auxiliary electric field, realizes electrophoresis assistant depositing.
On the basis of above-mentioned any one embodiment, also including micro- three-dimensional motion of accurate three-dimensional motion can be realized Platform 10, micro- three-dimensional movement platform 10 is provided with processing groove 7, and the work piece holder 8 for fixing workpiece 6 is arranged in processing groove 7. Work piece holder 8 is installed in processing groove 7, workpiece to be processed 6 can be made to be arranged in processing groove, carry out the modified processing in surface.It is micro- The control of three-dimensional movement platform 10 processing groove 7 carries out the movement of the three-dimensional of small range, so that workpiece 6 and electrophoresis auxiliary cathode are pressed from both sides Tool 5 or the position alignment with feed pipe.That is, micro- three-dimensional movement platform 10 can make processing groove 7 carry out accurate orientation transporting It is dynamic, it is ensured that the relative position of processing groove 7 and main shaft 4, and suspension is accurately placed on workpiece 6 before making processing.
On the basis of above-mentioned any one embodiment, micro- three-dimensional movement platform 10 and machine tool chief axis 4 with integrated control Cabinet processed 13 is connected.
Optionally, an any of the above described device or system can be connected with integrated switch board 13, and collection is realized by connecting Into 13 pairs of controls of whole devices, module and system of switch board.
On the basis of above-mentioned any one embodiment, attemperating unit includes vacuum control module or auxiliary gas control Module.Specifically, the above-mentioned system with vacuum control module, auxiliary Gas Control Module is also referred to as vacuum and temperature control system System 12, it is ensured that the temperature control in it, and operationally ensure inside vacuum or pass to other auxiliary gases protect Card will not occur oxidation effectiveness, it is ensured that the need for when surface of workpiece is modified.
On the basis of above-mentioned any one embodiment, also including for workpiece surface deposition conditions and molten condition Under the CCD video detection systems 3 that are detected of distribution of particles situation.CCD video detection systems 3 are integrated in the work of machining tool Make on platform 1, the distribution of particles situation under the surface deposition conditions of metal works 6 and molten condition can be detected in real time, with Just the monitoring effect of lifting system.
The preparation facilities that the workpiece local surfaces that above-mentioned each embodiment is provided are modified is first receiving for needing in processing Rice grain is placed in particle solution mixture circulatory system 2 and is sufficiently mixed, and metal works to be processed 6 are then placed in processing groove In 7, and clamped with work piece holder 8, by switch board 13, control micro- three-dimensional movement platform 10 and machine tool chief axis 4, solution is placed in On workpiece 6, auxiliary electric field is formed by electrophoresis accessory system 11, carry out the modified processing in surface.Meanwhile, can be by movable mask And control system 9, the relative position of control activity mask and workpiece 6, and ensure process, movable mask and the phase of workpiece 6 Mutually compress, to process workpiece regional area surface different shape, the surface modification effect of diverse location.Can lead in process Cross CCD on-line monitoring systems 3 to be observed it, workpiece 6 is then placed in vacuum and temperature control system 12, carry out at heating Reason, controls processing conditions, and the surface hydrophobe for being finally reached metal works 6 is modified.
The important improvement of preparation facilities provided by the present invention be by by nano level particulate in the solution with ultrasound Fully merged with magnetic agitation, by nano level different metal particle or different non-metallic particles or different metal and non-gold Metal particles are fully merged in the solution, then, by being applied under the electrophoretic action in machining area, particulate is adsorbed onto metal Workpiece surface.
With a kind of insulating cement body creative activity mask, for example, can be PDMS colloid masks in work end, certain activity is covered Film can be that dura mater can also be mantle.By covering and being pressed on workpiece, realization is locally carried out absolutely movable mask to workpiece Edge treatment, above-mentioned solution is placed on metal works to be processed, obtains orderly in surface of workpiece using electrophoresis auxiliary law Particle alignment;Then, then workpiece it is placed into attemperating unit, is heated to the relatively low sacrifice particle melt temperature of fusing point, due to The melt temperature of variable grain is different, and only particular kind of particle can be fused into molten condition at a certain temperature, melting Particle is wrapped up or adhered on another modified particles, so as to this kind of particle and workpiece is welded together, effectively improves combination Power.
Due to employing movable mask, nonconducting part of movable mask in the preparation facilities of above-mentioned each embodiment There will not be electric field force to act on particulate, so electrophoretic effect will not be had to particle deposition, only workpiece exposed part has particulate to sink Product, so only have local surfaces being modified, thus it is possible to vary shape of template, so as to change local hydrophobe region shape, leads to Cross the diverse location for changing mask plate, thus it is possible to vary the hydrophobe on different zones surface is structurally-modified.
Primary structure and portion except the modified preparation facilities of the workpiece local surfaces provided in above-mentioned each embodiment Part, the structure of other each several parts of the modified preparation facilities of the workpiece local surfaces refer to prior art, repeat no more herein.
Each embodiment is described by the way of progressive in this specification, and what each embodiment was stressed is and other The difference of embodiment, between each embodiment identical similar portion mutually referring to.
The preparation facilities that workpiece local surfaces provided by the present invention are modified is described in detail above.Herein should Principle of the invention and implementation method are set forth with specific case, the explanation of above example is only intended to help and manages The solution method of the present invention and its core concept.It should be pointed out that for those skilled in the art, not departing from On the premise of the principle of the invention, some improvement and modification can also be carried out to the present invention, these are improved and modification also falls into this hair In bright scope of the claims.

Claims (10)

1. the preparation facilities that a kind of workpiece local surfaces are modified, it is characterised in that including:
Particle solution feedway for providing from nanoparticles solution to workpiece (6);
Electrophoresis system, the electrophoresis system is used to provide electrophoretic action to aid in the particle in the nanoparticles solution to deposit to Workpiece (6) surface;
For the part on coating workpieces surface to realize the movable mask that minor insulation is processed, the movable mask is insulating part;
Attemperating unit, the attemperating unit is used to change the surface temperature of the workpiece (6).
2. the preparation facilities that workpiece local surfaces according to claim 1 are modified, it is characterised in that the electrophoresis system bag Include:
Electrophoresis auxiliary cathode fixture for connecting the electrophoresis auxiliary cathode, the electrophoresis auxiliary cathode fixture (5) is provided with Electrophoresis auxiliary cathode;
Electrophoresis accessory system (11), the output end of the electrophoresis accessory system (11) connects the electrophoresis auxiliary cathode and institute respectively State workpiece (6).
3. the preparation facilities that workpiece local surfaces according to claim 2 are modified, it is characterised in that the movable mask connects Control device is connect, the control device is used to control the insulation activity mask covering position and is pressed in workpiece (6) surface It is local.
4. the preparation facilities that workpiece local surfaces according to claim 3 are modified, it is characterised in that the nano particle is molten Liquid includes several metallic particles, and/or several non-metallic particle, and the particle solution feedway is for being received described The particle solution mixture circulatory system (2) of rice grain solution mixing.
5. the preparation facilities that workpiece local surfaces according to claim 4 are modified, it is characterised in that the particle solution is mixed The circulatory system (2) is closed including in vibrating device, magnetic stirring apparatus, suspension suction device, solution circulating device or It is multiple.
6. the preparation facilities that workpiece local surfaces according to claim 5 are modified, it is characterised in that the particle solution is mixed The suction tube for closing the circulatory system (2) is connected with the attraction pipe clamp on machine tool chief axis (4), the electrophoresis auxiliary cathode fixture connection In machine tool chief axis, the machine tool chief axis are used to control the distance of the electrophoresis auxiliary cathode and the workpiece, the attraction pipe clamp Have for the nanoparticles solution in the particle solution mixture circulatory system (2) to be attracted into the workpiece surface.
7. the preparation facilities that workpiece local surfaces according to claim 6 are modified, it is characterised in that also including that can realize Micro- three-dimensional movement platform (10) of accurate three-dimensional motion, micro- three-dimensional movement platform (10) is provided with processing groove (7), for solid The work piece holder (8) of the fixed workpiece (6) is arranged in the processing groove (7).
8. the preparation facilities that workpiece local surfaces according to claim 7 are modified, it is characterised in that micro- three-dimensional motion Platform (10) is connected with the machine tool chief axis (4) with integrated switch board (13).
9. the preparation facilities that workpiece local surfaces according to claim 8 are modified, it is characterised in that the attemperating unit bag Include vacuum control module or auxiliary Gas Control Module.
10. the preparation facilities that workpiece local surfaces according to claim 9 are modified, it is characterised in that also including for right The CCD video detection systems (3) that distribution of particles situation under workpiece surface deposition conditions and molten condition is detected.
CN201710277889.1A 2017-04-25 2017-04-25 A kind of preparation facilities that workpiece local surfaces are modified Expired - Fee Related CN106906510B (en)

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PCT/CN2017/111271 WO2018196347A1 (en) 2017-04-25 2017-11-16 Preparation device for use in partial surface modification of work piece

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WO2018196347A1 (en) * 2017-04-25 2018-11-01 广东工业大学 Preparation device for use in partial surface modification of work piece
WO2018196241A1 (en) * 2017-04-25 2018-11-01 广东工业大学 Electrophoresis-assisted micro-nano particle melting self-assembly surface modification equipment
CN110424041A (en) * 2019-06-20 2019-11-08 吴赞 A kind of modulated modified surface preparation method for being used to strengthen boiling

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