CN106896583B - Display base plate and preparation method thereof, display panel and display device - Google Patents
Display base plate and preparation method thereof, display panel and display device Download PDFInfo
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- CN106896583B CN106896583B CN201710311470.3A CN201710311470A CN106896583B CN 106896583 B CN106896583 B CN 106896583B CN 201710311470 A CN201710311470 A CN 201710311470A CN 106896583 B CN106896583 B CN 106896583B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133615—Edge-illuminating devices, i.e. illuminating from the side
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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Abstract
The present invention provides a kind of display base plate and preparation method thereof, display panel and display devices, belong to field of display technology.Display base plate includes: ducting layer；Light transmission insulation patterns on the ducting layer, the refractive index of the light transmission insulation patterns is less than the refractive index of the ducting layer, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, the first part is identical with the extending direction of the second part and is arranged alternately, the thickness of the first part is greater than the thickness of the second part, and the thickness of the second part is no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；Electrode in the first part of the light transmission insulation patterns.Technical solution of the present invention enables to the light extraction efficiency of display device relatively uniform, improves the display effect of display device.
Description
Technical field
The present invention relates to field of display technology, a kind of display base plate and preparation method thereof, display panel and aobvious are particularly related to
Showing device.
Background technique
The prior art proposes a kind of display device, including the substrate up and down to box setting and the liquid crystal between substrate
Layer is provided with ducting layer close to the side of liquid crystal layer in lower substrate, and the refractive index of ducting layer is greater than the refractive index of lower substrate, waveguide
Layer is provided with multiple spaced light transmission insulation patterns close to the side of liquid crystal layer, is provided with electricity on light transmission insulation patterns
Pole, display device further include side entering type collimated backlight, and the collimated ray that side entering type collimated backlight issues can be with certain angle
In degree (being greater than Brewster's angle) incident ducting layer.When not applying electric signal to electrode, the refractive index of liquid crystal layer is less than waveguide
The refractive index of layer, after the collimated ray that side entering type collimated backlight issues enters ducting layer, light beam is dredged in optically denser medium and light to be situated between
The interface of matter occurs full transmitting and propagates along the direction that ducting layer extends, and display device is rendered as dark-state；Apply to electrode
After electric signal, electric field driven liquid crystal deflection between electrode, the refractive index of liquid crystal layer becomes larger, when the liquid crystal with ducting layer intersection
When the refractive index of layer is greater than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, and display device is rendered as illuminated state.
The collimated ray that side entering type collimated backlight issues is to be transmitted to ducting layer from ducting layer close to the side of backlight
It is separate to be transmitted to waveguide side applying electric signal after light enters liquid crystal layer from ducting layer to electrode for side far from backlight
The light of backlight side will be reduced, so that there is the case where light extraction efficiency gradually decreases in the transmission direction of light,
Side of the ducting layer far from backlight, in some instances it may even be possible to the case where will appear close to dark-state, cause the display effect of display device compared with
Difference.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of display base plate and preparation method thereof, display panel and display dresses
It sets, enables to the light extraction efficiency of display device relatively uniform, improve the display effect of display device.
In order to solve the above technical problems, the embodiment of the present invention offer technical solution is as follows:
On the one hand, a kind of display base plate is provided, comprising:
Ducting layer；
The refractive index of light transmission insulation patterns on the ducting layer, the light transmission insulation patterns is less than the ducting layer
Refractive index, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, described first
Divide identical with the extending direction of the second part and be arranged alternately, the thickness of the first part is greater than the second part
Thickness, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode in the first part of the light transmission insulation patterns.
Further, the electrode on the ducting layer orthographic projection and the first part on the ducting layer
Orthographic projection is completely coincident.
Further, the first part perpendicular to width and the second part on extending direction perpendicular to prolonging
The width stretched on direction is equal.
Further, the ducting layer is underlay substrate；Or
The ducting layer is the silicon nitride layer being formed on underlay substrate.
The embodiment of the invention also provides a kind of production methods of display base plate, comprising:
Form ducting layer；
Light transmission insulation patterns are formed on the ducting layer, the refractive index of the light transmission insulation patterns is less than the ducting layer
Refractive index, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, described first
Divide identical with the extending direction of the second part and be arranged alternately, the thickness of the first part is greater than the second part
Thickness, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode is formed in the first part of the light transmission insulation patterns.
Further, the light transmission insulation patterns are formed and the electrode includes:
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching, etches away the institute not covered by the electrode
The a part for stating light-transmitting insulating layer forms the light transmission insulation patterns.
Further, the conductive layer is to be performed etching to the conductive layer using Mo, formed the figure of the electrode
It includes:
Dry etching is carried out to the conductive layer, forms the figure of the electrode；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching includes:
Dry etching is carried out to the light-transmitting insulating layer, forms the light transmission insulation patterns.
Further, the formation ducting layer includes:
One underlay substrate is provided, one layer of silicon nitride material is deposited on the underlay substrate and forms the ducting layer.
The embodiment of the invention also provides a kind of display panel, including display base plate as described above, further include with it is described
The opposite substrate that box is arranged in display base plate, and the liquid crystal layer between the display base plate and the opposite substrate, institute
State normal refractive index n of the refractive index between the liquid crystal layer of ducting layeroWith abnormal refraction rate neBetween.
Further, the liquid crystal layer is blue phase liquid crystal layer.
The embodiment of the invention also provides a kind of display devices, including display panel as described above.
It further, further include at least one collimated backlight that the side of the ducting layer is set, the collimation back
The incidence angle of the incident ducting layer of the collimated ray that light source issues is greater than Brewster's angle.
The embodiment of the present invention has the advantages that
In above scheme, light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, and first
Partial thickness is greater than the thickness of second part, and after applying signal on the electrode, the refractive index of liquid crystal layer becomes larger, when liquid crystal layer
When refractive index is greater than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due between ducting layer and liquid crystal layer
There is also the lesser light transmission insulation patterns (i.e. second part) of thickness, and the refractive index of light transmission insulation patterns is less than the folding of ducting layer
Rate is penetrated, therefore, intersection of some light between light transmission insulation patterns and ducting layer is had and is totally reflected, rather than all
Into liquid crystal layer, so as to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer far from backlight one
The light of side avoids the case where light extraction efficiency gradually decreases occur in the transmission direction of light, so that display device goes out light
Effect is relatively uniform, improves the display effect of display device；In addition, if there is no light transmission insulation for interval between first part
Figure then generally requires to carry out carving to the light-transmitting insulating layer of interval to remove interval when to performing etching through insulating layer
Whole light-transmitting insulating layers at place, cause the key size deviation between light transmission insulation patterns and electrode larger, and in the present embodiment
Second part is also remained between first part, it is saturating in the part using interval between etching technics removal first part in this way
When light insulating layer, do not need carve to remove whole light-transmitting insulating layers between first part, so as to reduce light transmission
Key size deviation between insulation patterns and electrode.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of existing display panel；
Fig. 2-Fig. 4 is the schematic diagram that the embodiment of the present invention makes optical grating construction and electrode；
Fig. 5 is the structural schematic diagram of a specific embodiment display panel of the invention；
Fig. 6 is the structural schematic diagram of another specific embodiment display panel of the present invention.
Appended drawing reference
1 underlay substrate, 2 sealant, 3 liquid crystal layer
4 underlay substrates 5,6 protective layer, 7 light transmission insulation patterns, 8 electrode
9 collimated backlights
Specific embodiment
To keep the embodiment of the present invention technical problems to be solved, technical solution and advantage clearer, below in conjunction with
Drawings and the specific embodiments are described in detail.
As shown in Figure 1, existing display device include up and down to box setting underlay substrate 1,4 and be located at underlay substrate 1,
Ducting layer has can be set close to the side of liquid crystal layer 3 in underlay substrate 1 in liquid crystal layer 3 between 4, and the refractive index of ducting layer is big
In the refractive index of underlay substrate 1, or as shown in Figure 1, directly it regard underlay substrate 1 as ducting layer, underlay substrate 1 is close to liquid crystal
The side of layer 3 is provided with multiple spaced light transmission insulation patterns 7, and electrode 8 is provided on light transmission insulation patterns 7, shows
Device further includes side entering type collimated backlight 9, and the collimated ray that side entering type collimated backlight 9 issues can be (big at a certain angle
In Brewster's angle) in incident underlay substrate 1.When not applying electric signal to electrode 8, the refractive index of liquid crystal layer 3 is less than substrate
The refractive index of substrate 1, after the collimated ray that collimated backlight 9 issues enters underlay substrate 1, light beam is dredged in optically denser medium and light to be situated between
The interface of matter occurs full transmitting and propagates along the direction that underlay substrate 1 extends, and display device is rendered as dark-state；To electrode 8
After applying electric signal, the electric field driven liquid crystal deflection between electrode 8, the refractive index of liquid crystal layer 3 becomes larger, and hands over when with underlay substrate 1
When the refractive index of liquid crystal layer 3 at boundary is greater than 1 refractive index of underlay substrate, light will enter liquid crystal layer 3, display from underlay substrate 1
Device is rendered as illuminated state.
As shown in Figure 1, the collimated ray that collimated backlight 9 issues is from underlay substrate 1 close to the side of collimated backlight 9
It is transmitted to side of the underlay substrate 1 far from collimated backlight 9, electric signal is being applied to electrode 8, light enters from underlay substrate 1
After liquid crystal layer 3, being transmitted to underlay substrate 1 will be reduced far from the light of 9 side of collimated backlight, so that in the transmission side of light
There is the case where light extraction efficiency gradually decreases upwards, in side of the underlay substrate 1 far from collimated backlight 9, in some instances it may even be possible to can go out
Now close to dark-state the case where, cause the display effect of display device poor.
To solve the above-mentioned problems, the embodiment of the present invention provides a kind of display base plate and preparation method thereof, display panel
And display device, it enables to the light extraction efficiency of display device relatively uniform, improves the display effect of display device.
The present embodiment provides a kind of display base plates, comprising:
Ducting layer；
The refractive index of light transmission insulation patterns on the ducting layer, the light transmission insulation patterns is less than the ducting layer
Refractive index, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, described first
Divide identical with the extending direction of the second part and be arranged alternately, the thickness of the first part is greater than the second part
Thickness, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode in the first part of the light transmission insulation patterns.
In the present embodiment, light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, and first
Partial thickness is greater than the thickness of second part, and after applying signal on the electrode, the refractive index of liquid crystal layer becomes larger, when liquid crystal layer
When refractive index is greater than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due between ducting layer and liquid crystal layer
There is also the lesser light transmission insulation patterns (i.e. second part) of thickness, and the refractive index of light transmission insulation patterns is less than the folding of ducting layer
Rate is penetrated, therefore, intersection of some light between light transmission insulation patterns and ducting layer is had and is totally reflected, rather than all
Into liquid crystal layer, so as to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer far from backlight one
The light of side avoids the case where light extraction efficiency gradually decreases occur in the transmission direction of light, so that display device goes out light
Effect is relatively uniform, improves the display effect of display device；In addition, if there is no light transmission insulation for interval between first part
Figure then generally requires to carry out carving to the light-transmitting insulating layer of interval to remove interval when to performing etching through insulating layer
Whole light-transmitting insulating layers at place, cause the key size deviation between light transmission insulation patterns and electrode larger, and in the present embodiment
Second part is also remained between first part, it is saturating in the part using interval between etching technics removal first part in this way
When light insulating layer, do not need carve to remove whole light-transmitting insulating layers between first part, so as to reduce light transmission
Key size deviation between insulation patterns and electrode.
Preferably, electrode is in the orthographic projection and orthographic projection of the first part on the ducting layer on the ducting layer
It is completely coincident, light-transmitting insulating layer can be performed etching to form light transmission insulation patterns by mask of electrode in this way, do not need additional
Mask plate make light transmission insulation patterns, manufacture craft can be simplified, improve production efficiency.
Preferably, the first part perpendicular on extending direction width and the second part perpendicular to extension
Width on direction is equal, enables to the light extraction efficiency of display device relatively uniform in this way, improves the display effect of display device
Fruit.
Wherein, ducting layer can be the film layer specially made on underlay substrate, for example one layer is formed on underlay substrate
Silicon nitride layer is also possible to directly serve as ducting layer by underlay substrate using silicon nitride layer as ducting layer.
In one specific embodiment, as shown in figure 5, ducting layer can be directly served as by underlay substrate 1, as shown in figure 5, aobvious
Show that substrate includes: the underlay substrate 1 for serving as ducting layer；The light transmission insulation patterns 7 being formed on underlay substrate 1, light transmission insulation figure
Shape 7 can be made of organic resin；Electrode 8 in the first part of light transmission insulation patterns 7；Light transmission insulation patterns 7
Refractive index be less than the refractive index of underlay substrate 1, light transmission insulation patterns 7 include the different multiple first parts of thickness and multiple the
The extending direction of two parts, first part and second part is identical and is arranged alternately, and the thickness of first part is greater than second part
Thickness, the thickness of second part is no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light, if second part
Thickness it is too thick, for example be not much different with the thickness of first part, then may cause light can not enter liquid crystal from underlay substrate 1
Layer 3.
When not applying electric signal to electrode 8, the refractive index of liquid crystal layer 3 is less than the refractive index of underlay substrate 1, and side entering type is quasi-
After the collimated ray that straight backlight issues enters underlay substrate 1, light beam occurs complete in the interface of optically denser medium and optically thinner medium
Transmitting is propagated along the direction that underlay substrate 1 extends, and display device is rendered as dark-state；After applying electric signal to electrode 8, liquid crystal
The refractive index of layer 3 becomes larger, and when the refractive index of liquid crystal layer 3 is greater than the refractive index of underlay substrate 1, light originally will be from substrate
Substrate 1 enters liquid crystal layer 3, but as shown in figure 5, in the display panel of the present embodiment, due to still depositing between adjacent first part
In the second part for having thinner thickness, and therefore the refractive index that the refractive index of second part is less than underlay substrate 1 has part
Intersection of the light between second part and underlay substrate 1 is totally reflected, rather than all enters liquid crystal through second part
Layer 3 increases so as to reduce the light for entering liquid crystal layer 3 from underlay substrate 1 and is transmitted to the light far from backlight side,
Avoid the case where light extraction efficiency gradually decreases occur in the transmission direction of light, so that the light-out effect of display device is more equal
It is even, improve the display effect of display device.And due to the thickness of second part be no more than visible light wavelength/(2* light transmission is exhausted
The refractive index of edge figure), it can guarantee that light will not all be all-trans in the intersection of second part and underlay substrate 1 in this way
It penetrates, still has some light and be passed in liquid crystal layer 3 through second part.
The production method for present embodiments providing a kind of display base plate, comprising:
Form ducting layer；
Light transmission insulation patterns are formed on the ducting layer, the refractive index of the light transmission insulation patterns is less than the ducting layer
Refractive index, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, described first
Divide identical with the extending direction of the second part and be arranged alternately, the thickness of the first part is greater than the second part
Thickness, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode is formed in the first part of the light transmission insulation patterns.
In the present embodiment, light transmission insulation patterns are formed as into the different multiple first parts of thickness and multiple second parts,
The thickness of first part is greater than the thickness of second part, and after applying signal on the electrode, the refractive index of liquid crystal layer becomes larger, and works as liquid crystal
When the refractive index of layer is greater than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due to ducting layer and liquid crystal layer
Between there is also the lesser light transmission insulation patterns (i.e. second part) of thickness, and the refractive index of light transmission insulation patterns is less than ducting layer
Refractive index therefore have intersection of some light between light transmission insulation patterns and ducting layer and be totally reflected, rather than
Liquid crystal layer is fully entered, so as to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer far from backlight
The light of source side avoids the case where light extraction efficiency gradually decreases occur in the transmission direction of light, so that display device
Light-out effect is relatively uniform, improves the display effect of display device；In addition, if light transmission is not present in interval between first part
Insulation patterns then generally require to carry out carving to the light-transmitting insulating layer of interval to remove when to performing etching through insulating layer
Whole light-transmitting insulating layers of interval, cause the key size deviation between light transmission insulation patterns and electrode larger, and this implementation
Second part is also remained between Li Zhong first part, in this way in the portion using interval between etching technics removal first part
When dividing light-transmitting insulating layer, do not need carve to remove whole light-transmitting insulating layers between first part, so as to reduce
Key size deviation between light transmission insulation patterns and electrode.
Further, the light transmission insulation patterns are formed and the electrode includes:
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching, etches away the institute not covered by the electrode
The a part for stating light-transmitting insulating layer forms the light transmission insulation patterns.
Further, the conductive layer is that can form electrode by dry carving technology in this way using Mo, and dry carving technology
The precision of ratio of precision wet etching is high, is capable of forming the figure of the electrode relatively high to required precision, can be with electrode later
Mask forms light transmission insulation patterns by dry carving technology.The conductive layer is performed etching, the figure for forming the electrode includes:
Dry etching is carried out to the conductive layer, forms the figure of the electrode；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching includes:
Dry etching is carried out to the light-transmitting insulating layer, forms the light transmission insulation patterns.
Specifically, as shown in figs 2-4, the display base plate of the present embodiment production method the following steps are included:
Step 1, as shown in Fig. 2, provide a underlay substrate 1, on the underlay substrate 1 deposit one layer of organic resin layer；
Wherein it is possible to which one layer of silicon nitride material of deposition, can also be directly by substrate as ducting layer on underlay substrate 1
Substrate 1 serves as ducting layer, and in the present embodiment, underlay substrate 1 is directly served as ducting layer.The refractive index of organic resin layer needs small
In the refractive index of underlay substrate 1.
Step 2, as shown in figure 3, on organic resin layer formed electrode 8 figure；
One layer of conductive layer can be first deposited, then forms the figure of electrode 8 by dry etching or wet-etching technique, it is preferable that
Electrode 8 is formed using Mo, electrode, and the essence of the ratio of precision wet etching of dry carving technology can be formed by dry carving technology in this way
Degree is high, is capable of forming the figure of the electrode 8 relatively high to required precision.
Step 3, as shown in figure 4, be exposure mask with electrode 8, dry etching is carried out to organic resin layer, etches away and is not covered by electrode 8
A part of the organic resin layer of lid forms light transmission insulation patterns 7.
Wherein, the thickness that light transmission insulation patterns 7 are located at the part under electrode 8 is greater than light transmission insulation patterns 7 and is not covered by electrode 8
The thickness of the part of lid.
It can make to obtain the display base plate of the present embodiment by above-mentioned steps 1-3.Electrode is being removed using dry carving technology
Between part organic resin layer when, do not need to carry out to carve to remove whole organic resin layers between electrode, so as to
Reduce the key size deviation between light transmission insulation patterns 7 and electrode 8.
The present embodiment additionally provides a kind of display panel, as shown in figure 5, including display base plate as described above, further includes
The opposite substrate 4 that box is arranged with the display base plate, and the liquid between the display base plate and the opposite substrate 4
Crystal layer 3, the normal refractive index n of the refractive index of the ducting layer between the liquid crystal layer 3oWith abnormal refraction rate neBetween.Wherein,
Underlay substrate 1 directly can be served as into ducting layer, silicon nitride layer can also be formed on underlay substrate 1, silicon nitride layer is served as
Ducting layer.
Wherein, it is also provided with protective layer 5 backwards to the side of underlay substrate 1 in opposite substrate 4, is carried on the back in underlay substrate 1
Protective layer 6, underlay substrate 1 and opposite substrate 4, which are also provided with, to the side of opposite substrate 4 is encapsulated in one by sealant 2
It rises.
Further, the liquid crystal layer 3 is blue phase liquid crystal layer, by light in this present embodiment be from underlay substrate 1 and
It is entered in light transmission insulation patterns 7 in liquid crystal layer 3, therefore, if in underlay substrate 1 and light transmission insulation patterns 7 and liquid crystal layer 3
Between oriented layer is set, it will influence the transmission of light, so liquid crystal layer is not preferably using needing the blue phase liquid crystal layer of oriented layer,
And the production process of display panel can also be greatly simplified using blue phase liquid crystal layer.
The present embodiment additionally provides a kind of display device, as shown in figure 5, including display panel as described above, further includes
The collimated backlight 9 of display panel incident side is set.
Preferably, as shown in fig. 6, multiple collimated backlights 9 can be arranged in the side of ducting layer, one side in this way can be with
The brightness for improving display device, on the other hand can make display device more equal in the light extraction efficiency of light-emitting surface each region
It is even.
The display device can be with are as follows: any tool such as LCD TV, liquid crystal display, Digital Frame, mobile phone, tablet computer
There are the products or components of display function, wherein the display device further includes flexible circuit board, printed circuit board and backboard.
Unless otherwise defined, the technical term or scientific term that the disclosure uses should be tool in fields of the present invention
The ordinary meaning for thering is the personage of general technical ability to be understood." first ", " second " used in the disclosure and similar word are simultaneously
Any sequence, quantity or importance are not indicated, and are used only to distinguish different component parts." comprising " or "comprising" etc.
Similar word means that the element or object before the word occur covers the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or mechanical connection, but may include electrical connection, it is either direct or indirectly."upper", "lower",
"left", "right" etc. is only used for indicating relative positional relationship, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
It is appreciated that ought such as layer, film, region or substrate etc element be referred to as be located at another element "above" or "below"
When, which " direct " can be located at "above" or "below" another element, or may exist intermediary element.
The above is a preferred embodiment of the present invention, it is noted that for those skilled in the art
For, without departing from the principles of the present invention, it can also make several improvements and retouch, these improvements and modifications
It should be regarded as protection scope of the present invention.
Claims (12)
1. a kind of display base plate characterized by comprising
Ducting layer, light are injected by the side of the ducting layer；
Light transmission insulation patterns on the ducting layer, the refractive index of the light transmission insulation patterns are less than the folding of the ducting layer
Penetrate rate, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, the first part and
The extending direction of the second part is identical and is arranged alternately, and the thickness of the first part is greater than the thickness of the second part
Degree, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode in the first part of the light transmission insulation patterns.
2. display base plate according to claim 1, which is characterized in that orthographic projection of the electrode on the ducting layer with
Orthographic projection of the first part on the ducting layer is completely coincident.
3. display base plate according to claim 1, which is characterized in that the first part is on perpendicular to extending direction
Width is with the second part equal perpendicular to the width on extending direction.
4. display base plate according to claim 1, which is characterized in that the ducting layer is underlay substrate；Or
The ducting layer is the silicon nitride layer being formed on underlay substrate.
5. a kind of production method of display base plate characterized by comprising
Ducting layer is formed, light is injected by the side of the ducting layer；
Light transmission insulation patterns are formed on the ducting layer, the refractive index of the light transmission insulation patterns is less than the folding of the ducting layer
Penetrate rate, the light transmission insulation patterns include the different multiple first parts of thickness and multiple second parts, the first part and
The extending direction of the second part is identical and is arranged alternately, and the thickness of the first part is greater than the thickness of the second part
Degree, the thickness of the second part are no more than wavelength/(refractive index of 2* light transmission insulation patterns) of visible light；
Electrode is formed in the first part of the light transmission insulation patterns.
6. the production method of display base plate according to claim 5, which is characterized in that formed the light transmission insulation patterns and
The electrode includes:
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching, etch away do not covered by the electrode it is described
A part of light insulating layer forms the light transmission insulation patterns.
7. the production method of display base plate according to claim 6, which is characterized in that the conductive layer be using Mo, it is right
The conductive layer performs etching, and the figure for forming the electrode includes:
Dry etching is carried out to the conductive layer, forms the figure of the electrode；
Using the electrode as exposure mask, the light-transmitting insulating layer is performed etching includes:
Dry etching is carried out to the light-transmitting insulating layer, forms the light transmission insulation patterns.
8. the production method of display base plate according to claim 5, which is characterized in that the formation ducting layer includes:
One underlay substrate is provided, one layer of silicon nitride material is deposited on the underlay substrate and forms the ducting layer.
9. a kind of display panel, which is characterized in that including display base plate such as of any of claims 1-4, further include
The opposite substrate that box is arranged with the display base plate, and the liquid crystal between the display base plate and the opposite substrate
Layer, the normal refractive index n of the refractive index of the ducting layer between the liquid crystal layeroWith abnormal refraction rate neBetween.
10. display panel according to claim 9, which is characterized in that the liquid crystal layer is blue phase liquid crystal layer.
11. a kind of display device, which is characterized in that including the display panel as described in claim 9 or 10, light is by described aobvious
Show that the side of the ducting layer of panel is injected.
12. display device according to claim 11, which is characterized in that further include the side that the ducting layer is arranged in
The incidence angle of at least one collimated backlight, the incident ducting layer of the collimated ray that the collimated backlight issues is greater than cloth scholar
This special angle.
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| CN107577093B (en) * | 2017-09-20 | 2020-12-01 | 京东方科技集团股份有限公司 | Display module and optical waveguide display device |
| CN107450234A (en) * | 2017-10-10 | 2017-12-08 | 京东方科技集团股份有限公司 | Display base plate, display panel and display device |
| CN109856854A (en) * | 2019-04-17 | 2019-06-07 | 京东方科技集团股份有限公司 | A kind of display device and its display methods |
| CN111007961B (en) * | 2019-12-19 | 2024-03-29 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method thereof and display device |
| CN115020389B (en) * | 2021-11-01 | 2023-06-20 | 荣耀终端有限公司 | Optical packaging structure, display screen and electronic equipment |
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| WO2004027466A1 (en) * | 2002-09-18 | 2004-04-01 | Koninklijke Philips Electronics N.V. | Light generating device having polarized light emitting waveguide plate |
| CN102272973A (en) * | 2008-12-17 | 2011-12-07 | 3M创新有限公司 | Light extraction film with nanoparticle coatings |
| CN106324898A (en) * | 2016-10-28 | 2017-01-11 | 京东方科技集团股份有限公司 | Display panel and display device |
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| JP2016171228A (en) * | 2015-03-13 | 2016-09-23 | パナソニックＩｐマネジメント株式会社 | Light emission element, light emission device and detection device |
| CN106291943B (en) * | 2016-10-24 | 2017-10-27 | 京东方科技集团股份有限公司 | A kind of display panel and display device |
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| WO2004027466A1 (en) * | 2002-09-18 | 2004-04-01 | Koninklijke Philips Electronics N.V. | Light generating device having polarized light emitting waveguide plate |
| CN102272973A (en) * | 2008-12-17 | 2011-12-07 | 3M创新有限公司 | Light extraction film with nanoparticle coatings |
| CN106324898A (en) * | 2016-10-28 | 2017-01-11 | 京东方科技集团股份有限公司 | Display panel and display device |
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