CN106896583A - Display base plate and preparation method thereof, display panel and display device - Google Patents
Display base plate and preparation method thereof, display panel and display device Download PDFInfo
- Publication number
- CN106896583A CN106896583A CN201710311470.3A CN201710311470A CN106896583A CN 106896583 A CN106896583 A CN 106896583A CN 201710311470 A CN201710311470 A CN 201710311470A CN 106896583 A CN106896583 A CN 106896583A
- Authority
- CN
- China
- Prior art keywords
- layer
- printing opacity
- insulation patterns
- electrode
- ducting layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133615—Edge-illuminating devices, i.e. illuminating from the side
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
Abstract
The invention provides a kind of display base plate and preparation method thereof, display panel and display device, belong to display technology field.Display base plate includes：Ducting layer；Printing opacity insulation patterns on the ducting layer, refractive index of the refractive index of the printing opacity insulation patterns less than the ducting layer, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, the Part I is identical with the bearing of trend of the Part II and is arranged alternately, the thickness of the Part I is more than the thickness of the Part II, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；Electrode on the Part I of the printing opacity insulation patterns.Technical scheme enables to the light extraction efficiency of display device than more uniform, improves the display effect of display device.
Description
Technical field
The present invention relates to display technology field, particularly relate to a kind of display base plate and preparation method thereof, display panel and show
Showing device.
Background technology
Prior art proposes a kind of display device, including up and down to the substrate and the liquid crystal between substrate of box setting
Layer, ducting layer, the refractive index of the refractive index more than infrabasal plate of ducting layer, waveguide are provided with infrabasal plate near the side of liquid crystal layer
Layer is provided with multiple spaced printing opacity insulation patterns near the side of liquid crystal layer, and electricity is provided with printing opacity insulation patterns
Pole, display device also includes side entering type collimated backlight, and the collimated ray that side entering type collimated backlight sends can be with certain angle
In degree (being more than Brewster's angle) incident ducting layer.When electric signal is not applied to electrode, the refractive index of liquid crystal layer is less than waveguide
The refractive index of layer, after the collimated ray that side entering type collimated backlight sends enters ducting layer, light beam is dredged in optically denser medium and light and is situated between
There is full transmitting and propagated along the direction that ducting layer extends in the interface of matter, display device is rendered as dark-state；Apply to electrode
After electric signal, the electric field driven liquid crystal deflection between electrode, the refractive index of liquid crystal layer becomes big, when the liquid crystal with ducting layer intersection
When the refractive index of layer is more than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, and display device is rendered as on state of.
The collimated ray that side entering type collimated backlight sends is transmitted to ducting layer near the side of backlight from ducting layer
Away from the side of backlight, electric signal is being applied to electrode, after light enters liquid crystal layer from ducting layer, transmit to waveguide side away from
The light of backlight side will be reduced so that occur the situation that light extraction efficiency is gradually reduced in the transmission direction of light,
Side of the ducting layer away from backlight, in some instances it may even be possible to the situation close to dark-state occurs, cause the display effect of display device compared with
Difference.
The content of the invention
The technical problem to be solved in the present invention is to provide a kind of display base plate and preparation method thereof, display panel and display dress
Put, enable to the light extraction efficiency of display device than more uniform, improve the display effect of display device.
In order to solve the above technical problems, embodiments of the invention offer technical scheme is as follows：
On the one hand, there is provided a kind of display base plate, including：
Ducting layer；
Printing opacity insulation patterns on the ducting layer, the refractive index of the printing opacity insulation patterns is less than the ducting layer
Refractive index, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, described first
Divide identical with the bearing of trend of the Part II and be arranged alternately, the thickness of the Part I is more than the Part II
Thickness, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode on the Part I of the printing opacity insulation patterns.
Further, orthographic projection of the electrode on the ducting layer with the Part I on the ducting layer
Orthographic projection is completely superposed.
Further, the Part I in the width on bearing of trend and the Part II perpendicular to prolonging
The width stretched on direction is equal.
Further, the ducting layer is underlay substrate；Or
The ducting layer is the silicon nitride layer being formed on underlay substrate.
The embodiment of the present invention additionally provides a kind of preparation method of display base plate, including：
Form ducting layer；
Printing opacity insulation patterns are formed on the ducting layer, the refractive index of the printing opacity insulation patterns is less than the ducting layer
Refractive index, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, described first
Divide identical with the bearing of trend of the Part II and be arranged alternately, the thickness of the Part I is more than the Part II
Thickness, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode is formed on the Part I of the printing opacity insulation patterns.
Further, forming the printing opacity insulation patterns and the electrode includes：
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching, etch away the institute not covered by the electrode
A part for light-transmitting insulating layer is stated, the printing opacity insulation patterns are formed.
Further, the conductive layer is to use Mo, and the conductive layer is performed etching, and forms the figure of the electrode
Include：
Dry etching is carried out to the conductive layer, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching including：
Dry etching is carried out to the light-transmitting insulating layer, the printing opacity insulation patterns are formed.
Further, the formation ducting layer includes：
One underlay substrate is provided, one layer of silicon nitride material is deposited on the underlay substrate and is formed the ducting layer.
The embodiment of the present invention additionally provides a kind of display panel, including display base plate as described above, also including with it is described
The opposite substrate that display base plate is set to box, and the liquid crystal layer between the display base plate and the opposite substrate, institute
State the normal refraction rate n of the refractive index between the liquid crystal layer of ducting layeroWith abnormal refraction rate neBetween.
Further, the liquid crystal layer is blue phase liquid crystal layer.
The embodiment of the present invention additionally provides a kind of display device, including display panel as described above.
Further, also including being arranged at least one collimated backlight of the side of the ducting layer, the collimation back of the body
The incidence angle of the incident ducting layer of collimated ray that light source sends is more than Brewster's angle.
Embodiments of the invention have the advantages that：
In such scheme, printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, first
More than the thickness of Part II, after applying signal on electrode, the refractive index of liquid crystal layer becomes big to partial thickness, when liquid crystal layer
When refractive index is more than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due between ducting layer and liquid crystal layer
Also there is the less printing opacity insulation patterns of thickness (i.e. Part II), and the refractive index of printing opacity insulation patterns is less than the folding of ducting layer
Rate is penetrated, therefore, have intersection of some light between printing opacity insulation patterns and ducting layer and be totally reflected, rather than whole
Into liquid crystal layer such that it is able to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer away from backlight one
The light of side, it is to avoid occur the situation that light extraction efficiency is gradually reduced in the transmission direction of light so that the light extraction of display device
Effect improves the display effect of display device than more uniform；In addition, if interval insulate in the absence of printing opacity between Part I
Figure, then generally require that the light-transmitting insulating layer of interval was carried out to carve to remove interval when to being performed etching through insulating barrier
Whole light-transmitting insulating layers at place, cause the key size deviation between printing opacity insulation patterns and electrode larger, and in the present embodiment
Part II is also remained between Part I, it is so saturating in the part using interval between etching technics removal Part I
During light insulating barrier, it is not necessary to carve to remove the whole light-transmitting insulating layers between Part I such that it is able to reduce printing opacity
Key size deviation between insulation patterns and electrode.
Brief description of the drawings
Fig. 1 is the structural representation of existing display panel；
Fig. 2-Fig. 4 is the schematic diagram that the embodiment of the present invention makes optical grating construction and electrode；
Fig. 5 is the structural representation of specific embodiment display panel of the invention；
Fig. 6 is the structural representation of another specific embodiment display panel of the present invention.
Reference
The liquid crystal layer of 1 underlay substrate, 2 sealant 3
4 underlay substrates 5, the electrode of 6 protective layer, 7 printing opacity insulation patterns 8
9 collimated backlights
Specific embodiment
For the technical problem, technical scheme and the advantage that to be solved embodiments of the invention are clearer, below in conjunction with
Drawings and the specific embodiments are described in detail.
As shown in figure 1, existing display device include up and down to box set underlay substrate 1,4 and positioned at underlay substrate 1,
Liquid crystal layer 3 between 4, ducting layer can be provided with underlay substrate 1 near the side of liquid crystal layer 3, and the refractive index of ducting layer is big
In the refractive index of underlay substrate 1, or as shown in figure 1, directly using underlay substrate 1 as ducting layer, underlay substrate 1 is near liquid crystal
The side of layer 3 is provided with multiple spaced printing opacity insulation patterns 7, and electrode 8 is provided with printing opacity insulation patterns 7, shows
Device also includes side entering type collimated backlight 9, and the collimated ray that side entering type collimated backlight 9 sends can be (big at a certain angle
In Brewster's angle) in incident underlay substrate 1.When electric signal is not applied to electrode 8, the refractive index of liquid crystal layer 3 is less than substrate
The refractive index of substrate 1, after the collimated ray that collimated backlight 9 sends enters underlay substrate 1, light beam is dredged in optically denser medium and light and is situated between
There is full transmitting and propagated along the direction that underlay substrate 1 extends in the interface of matter, display device is rendered as dark-state；To electrode 8
After applying electric signal, the electric field driven liquid crystal deflection between electrode 8, the refractive index of liquid crystal layer 3 becomes big, is handed over when with underlay substrate 1
When the refractive index of the liquid crystal layer 3 at boundary is more than 1 refractive index of underlay substrate, light will enter liquid crystal layer 3, display from underlay substrate 1
Device is rendered as on state of.
As shown in figure 1, the collimated ray that collimated backlight 9 sends is the side near collimated backlight 9 from underlay substrate 1
Transmit to underlay substrate 1 away from the side of collimated backlight 9, electric signal is being applied to electrode 8, light enters from underlay substrate 1
After liquid crystal layer 3, transmitting the light to underlay substrate 1 away from the side of collimated backlight 9 will be reduced so that in the transmission side of light
There is the situation that light extraction efficiency is gradually reduced upwards, underlay substrate 1 away from collimated backlight 9 side, in some instances it may even be possible to can go out
Now close to the situation of dark-state, cause the display effect of display device poor.
In order to solve the above problems, embodiments of the invention provide a kind of display base plate and preparation method thereof, display panel
And display device, enable to the light extraction efficiency of display device than more uniform, improve the display effect of display device.
The present embodiment provides a kind of display base plate, including：
Ducting layer；
Printing opacity insulation patterns on the ducting layer, the refractive index of the printing opacity insulation patterns is less than the ducting layer
Refractive index, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, described first
Divide identical with the bearing of trend of the Part II and be arranged alternately, the thickness of the Part I is more than the Part II
Thickness, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode on the Part I of the printing opacity insulation patterns.
In the present embodiment, printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, first
More than the thickness of Part II, after applying signal on electrode, the refractive index of liquid crystal layer becomes big to partial thickness, when liquid crystal layer
When refractive index is more than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due between ducting layer and liquid crystal layer
Also there is the less printing opacity insulation patterns of thickness (i.e. Part II), and the refractive index of printing opacity insulation patterns is less than the folding of ducting layer
Rate is penetrated, therefore, have intersection of some light between printing opacity insulation patterns and ducting layer and be totally reflected, rather than whole
Into liquid crystal layer such that it is able to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer away from backlight one
The light of side, it is to avoid occur the situation that light extraction efficiency is gradually reduced in the transmission direction of light so that the light extraction of display device
Effect improves the display effect of display device than more uniform；In addition, if interval insulate in the absence of printing opacity between Part I
Figure, then generally require that the light-transmitting insulating layer of interval was carried out to carve to remove interval when to being performed etching through insulating barrier
Whole light-transmitting insulating layers at place, cause the key size deviation between printing opacity insulation patterns and electrode larger, and in the present embodiment
Part II is also remained between Part I, it is so saturating in the part using interval between etching technics removal Part I
During light insulating barrier, it is not necessary to carve to remove the whole light-transmitting insulating layers between Part I such that it is able to reduce printing opacity
Key size deviation between insulation patterns and electrode.
Preferably, orthographic projection of orthographic projection of the electrode on the ducting layer with the Part I on the ducting layer
It is completely superposed, so light-transmitting insulating layer can be performed etching as mask to form printing opacity insulation patterns with electrode, it is not necessary to is extra
Mask plate make printing opacity insulation patterns, can simplify manufacture craft, improve production efficiency.
Preferably, the Part I in the width on bearing of trend with the Part II perpendicular to extension
Width on direction is equal, so enables to the light extraction efficiency of display device than more uniform, improves the display effect of display device
Really.
Wherein, ducting layer can be the special film layer for making on underlay substrate, such as one layer is formed on underlay substrate
Silicon nitride layer, ducting layer is directly served as using silicon nitride layer as ducting layer, or by underlay substrate.
In one specific embodiment, as shown in figure 5, ducting layer can be directly served as by underlay substrate 1, as shown in figure 5, aobvious
Show that substrate includes：Serve as the underlay substrate 1 of ducting layer；It is formed in the printing opacity insulation patterns 7 on underlay substrate 1, printing opacity insulation figure
Shape 7 can be made using organic resin；Electrode 8 on the Part I of printing opacity insulation patterns 7；Printing opacity insulation patterns 7
Refractive index of the refractive index less than underlay substrate 1, printing opacity insulation patterns 7 include the different multiple Part I of thickness and multiple the
The bearing of trend of two parts, Part I and Part II is identical and is arranged alternately, and the thickness of Part I is more than Part II
Thickness, the thickness of Part II no more than visible ray wavelength/(refractive indexes of 2* printing opacity insulation patterns), if Part II
Thickness it is too thick, such as the thickness with Part I is more or less the same, then light may be caused to enter liquid crystal from underlay substrate 1
Layer 3.
When electric signal is not applied to electrode 8, the refractive index of the refractive index less than underlay substrate 1 of liquid crystal layer 3, side entering type is accurate
After the collimated ray that straight backlight sends enters underlay substrate 1, light beam occurs complete in the interface of optically denser medium and optically thinner medium
Launch and propagated along the direction that underlay substrate 1 extends, display device is rendered as dark-state；After electric signal is applied to electrode 8, liquid crystal
The refractive index of layer 3 becomes larger, and when the refractive index of liquid crystal layer 3 is more than the refractive index of underlay substrate 1, light originally will be from substrate
Substrate 1 enters liquid crystal layer 3, but as shown in figure 5, in the display panel of the present embodiment, due to still being deposited between adjacent Part I
There is a Part II of thinner thickness, and the refractive index of Part II is less than the refractive index of underlay substrate 1, therefore, have part
Intersection of the light between Part II and underlay substrate 1 is totally reflected, rather than all entering liquid crystal through Part II
Layer 3 such that it is able to reduce the light for entering liquid crystal layer 3 from underlay substrate 1, increase is transmitted to the light away from backlight side,
Avoid occurring the situation that light extraction efficiency is gradually reduced in the transmission direction of light so that the light-out effect of display device is more equal
It is even, improve the display effect of display device.And due to Part II thickness no more than visible ray wavelength/(2* printing opacities are exhausted
The refractive index of edge figure), can so ensure that light will not all be all-trans in Part II with the intersection of underlay substrate 1
Penetrate, still have some light through in the incoming liquid crystal layer 3 of Part II.
A kind of preparation method of display base plate is present embodiments provided, including：
Form ducting layer；
Printing opacity insulation patterns are formed on the ducting layer, the refractive index of the printing opacity insulation patterns is less than the ducting layer
Refractive index, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, described first
Divide identical with the bearing of trend of the Part II and be arranged alternately, the thickness of the Part I is more than the Part II
Thickness, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode is formed on the Part I of the printing opacity insulation patterns.
In the present embodiment, printing opacity insulation patterns are formed as into the different multiple Part I of thickness and multiple Part II,
More than the thickness of Part II, after applying signal on electrode, the refractive index of liquid crystal layer becomes big to the thickness of Part I, works as liquid crystal
When the refractive index of layer is more than ducting layer refractive index, light will enter liquid crystal layer from ducting layer, but due to ducting layer and liquid crystal layer
Between also there is the less printing opacity insulation patterns of thickness (i.e. Part II), and the refractive index of printing opacity insulation patterns is less than ducting layer
Refractive index, therefore, have intersection of some light between printing opacity insulation patterns and ducting layer and be totally reflected, rather than
Fully enter liquid crystal layer such that it is able to reduce the light for entering liquid crystal layer from ducting layer, increase is transmitted to ducting layer away from backlight
The light of source side, it is to avoid occur the situation that light extraction efficiency is gradually reduced in the transmission direction of light so that display device
Light-out effect improves the display effect of display device than more uniform；In addition, if interval does not exist printing opacity between Part I
Insulation patterns, then generally require that the light-transmitting insulating layer of interval was carried out to carve to remove when to being performed etching through insulating barrier
Whole light-transmitting insulating layers of interval, cause the key size deviation between printing opacity insulation patterns and electrode larger, and this implementation
Part II is also remained with example between Part I, so in the portion using interval between etching technics removal Part I
When dividing light-transmitting insulating layer, it is not necessary to carve to remove the whole light-transmitting insulating layers between Part I such that it is able to reduce
Key size deviation between printing opacity insulation patterns and electrode.
Further, forming the printing opacity insulation patterns and the electrode includes：
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching, etch away the institute not covered by the electrode
A part for light-transmitting insulating layer is stated, the printing opacity insulation patterns are formed.
Further, the conductive layer is to use Mo, so can form electrode by dry carving technology, and dry carving technology
The high precision of ratio of precision wet etching, can form the figure of the electrode higher to required precision, can be with electrode afterwards
Mask forms printing opacity insulation patterns by dry carving technology.The conductive layer is performed etching, the figure for forming the electrode includes：
Dry etching is carried out to the conductive layer, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching including：
Dry etching is carried out to the light-transmitting insulating layer, the printing opacity insulation patterns are formed.
Specifically, as shown in figs 2-4, the preparation method of the display base plate of the present embodiment is comprised the following steps：
Step 1, as shown in Figure 2, there is provided a underlay substrate 1, on the underlay substrate 1 deposit one layer of organic resin layer；
Wherein it is possible to one layer of silicon nitride material is deposited on underlay substrate 1 is used as ducting layer, it is also possible to directly by substrate
Substrate 1 serves as ducting layer, in the present embodiment, underlay substrate 1 directly is served as into ducting layer.The refractive index of organic resin layer needs small
In the refractive index of underlay substrate 1.
Step 2, as shown in figure 3, on organic resin layer formed electrode 8 figure；
One layer of conductive layer can be first deposited, the figure of electrode 8 is then formed by dry etching or wet-etching technique, it is preferable that
Electrode 8 is formed using Mo, so can be by dry carving technology formation electrode, and the essence of the ratio of precision wet etching of dry carving technology
Degree is high, can form the figure of the electrode 8 higher to required precision.
Step 3, as shown in figure 4, with electrode 8 as mask, dry etching is carried out to organic resin layer, etch away and do not covered by electrode 8
A part for the organic resin layer of lid, forms printing opacity insulation patterns 7.
Wherein, the thickness of the part that printing opacity insulation patterns 7 are located under electrode 8 is not covered more than printing opacity insulation patterns 7 by electrode 8
The thickness of the part of lid.
The display base plate for obtaining the present embodiment can be made by above-mentioned steps 1-3.Electrode is being removed using dry carving technology
Between part organic resin layer when, it is not necessary to carried out carve to remove the whole organic resin layers between electrode such that it is able to
Reduce the key size deviation between printing opacity insulation patterns 7 and electrode 8.
The present embodiment additionally provides a kind of display panel, as shown in figure 5, including display base plate as described above, also including
The opposite substrate 4 set to box with the display base plate, and the liquid between the display base plate and the opposite substrate 4
Crystal layer 3, the normal refraction rate n of the refractive index of the ducting layer between the liquid crystal layer 3oWith abnormal refraction rate neBetween.Wherein,
Underlay substrate 1 directly can be served as into ducting layer, it is also possible to form silicon nitride layer on underlay substrate 1, silicon nitride layer is served as
Ducting layer.
Wherein, protective layer 5 is also provided with the side of the dorsad underlay substrate 1 of opposite substrate 4, is carried on the back in underlay substrate 1
Protective layer 6 is also provided with to the side of opposite substrate 4, underlay substrate 1 and opposite substrate 4 are encapsulated in one by sealant 2
Rise.
Further, the liquid crystal layer 3 is blue phase liquid crystal layer, due in the present embodiment light be from underlay substrate 1 and
Entered into printing opacity insulation patterns 7 in liquid crystal layer 3, therefore, if in underlay substrate 1 and printing opacity insulation patterns 7 and liquid crystal layer 3
Between oriented layer is set, it will influence light transmission, so liquid crystal layer preferably using do not need oriented layer blue phase liquid crystal layer,
And the Making programme of display panel can also be greatly simplified using blue phase liquid crystal layer.
The present embodiment additionally provides a kind of display device, as shown in figure 5, including display panel as described above, also including
It is arranged on the collimated backlight 9 of display panel incident side.
Preferably, as shown in fig. 6, multiple collimated backlights 9 can be set in the side of ducting layer, so one side can be with
The brightness of display device is improved, on the other hand can cause that display device is more equal in the light extraction efficiency of exiting surface regional
It is even.
The display device can be：Any tool such as LCD TV, liquid crystal display, DPF, mobile phone, panel computer
There are the product or part of display function, wherein, the display device also includes flexible PCB, printed circuit board (PCB) and backboard.
Unless otherwise defined, the technical term or scientific terminology that the disclosure is used should be tool in art of the present invention
The ordinary meaning that the personage for having general technical ability is understood." first ", " second " that is used in the disclosure and similar word are simultaneously
Any order, quantity or importance are not indicated that, and is used only to distinguish different parts." including " or "comprising" etc.
Similar word means that the element or object that occur before the word cover the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or machinery connection, and can be including electrical connection, either directly still indirectly." on ", D score,
"left", "right" etc. is only used for representing relative position relation that after the absolute position for being described object changes, then the relative position is closed
System is likely to correspondingly change.
It is appreciated that ought such as layer, film, region or substrate etc element be referred to as being located at another element " on " or D score
When, the element can with it is " direct " be located at another element " on " or D score, or there may be intermediary element.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, on the premise of principle of the present invention is not departed from, some improvements and modifications can also be made, these improvements and modifications
Should be regarded as protection scope of the present invention.
Claims (12)
1. a kind of display base plate, it is characterised in that including：
Ducting layer；
Printing opacity insulation patterns on the ducting layer, the folding of the refractive index less than the ducting layer of the printing opacity insulation patterns
Penetrate rate, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, the Part I and
The bearing of trend of the Part II is identical and is arranged alternately, the thickness of the thickness more than the Part II of the Part I
Degree, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode on the Part I of the printing opacity insulation patterns.
2. display base plate according to claim 1, it is characterised in that orthographic projection of the electrode on the ducting layer with
Orthographic projection of the Part I on the ducting layer is completely superposed.
3. display base plate according to claim 1, it is characterised in that the Part I is on bearing of trend
Width is equal in the width on bearing of trend with the Part II.
4. display base plate according to claim 1, it is characterised in that the ducting layer is underlay substrate；Or
The ducting layer is the silicon nitride layer being formed on underlay substrate.
5. a kind of preparation method of display base plate, it is characterised in that including：
Form ducting layer；
Printing opacity insulation patterns, the folding of the refractive index less than the ducting layer of the printing opacity insulation patterns are formed on the ducting layer
Penetrate rate, the printing opacity insulation patterns include the different multiple Part I of thickness and multiple Part II, the Part I and
The bearing of trend of the Part II is identical and is arranged alternately, the thickness of the thickness more than the Part II of the Part I
Degree, wavelength/(refractive indexes of 2* printing opacity insulation patterns) of the thickness no more than visible ray of the Part II；
Electrode is formed on the Part I of the printing opacity insulation patterns.
6. the preparation method of display base plate according to claim 5, it is characterised in that formed the printing opacity insulation patterns and
The electrode includes：
Light-transmitting insulating layer and conductive layer are formed on ducting layer；
The conductive layer is performed etching, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching, etch away not by the electrode cover it is described
A part for light insulating barrier, forms the printing opacity insulation patterns.
7. the preparation method of display base plate according to claim 6, it is characterised in that the conductive layer is to use Mo, right
The conductive layer is performed etching, and the figure for forming the electrode includes：
Dry etching is carried out to the conductive layer, the figure of the electrode is formed；
With the electrode as mask, the light-transmitting insulating layer is performed etching including：
Dry etching is carried out to the light-transmitting insulating layer, the printing opacity insulation patterns are formed.
8. the preparation method of display base plate according to claim 5, it is characterised in that the formation ducting layer includes：
One underlay substrate is provided, one layer of silicon nitride material is deposited on the underlay substrate and is formed the ducting layer.
9. a kind of display panel, it is characterised in that including the display base plate as any one of claim 1-4, also include
The opposite substrate set to box with the display base plate, and the liquid crystal between the display base plate and the opposite substrate
Layer, the normal refraction rate n of the refractive index of the ducting layer between the liquid crystal layeroWith abnormal refraction rate neBetween.
10. display panel according to claim 9, it is characterised in that the liquid crystal layer is blue phase liquid crystal layer.
11. a kind of display devices, it is characterised in that including the display panel as described in claim 9 or 10.
12. display devices according to claim 11, it is characterised in that also including being arranged on the side of the ducting layer
At least one collimated backlight, the incidence angle of the incident ducting layer of collimated ray that the collimated backlight sends is more than cloth scholar
This special angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710311470.3A CN106896583B (en) | 2017-05-05 | 2017-05-05 | Display base plate and preparation method thereof, display panel and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710311470.3A CN106896583B (en) | 2017-05-05 | 2017-05-05 | Display base plate and preparation method thereof, display panel and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106896583A true CN106896583A (en) | 2017-06-27 |
| CN106896583B CN106896583B (en) | 2019-10-25 |
Family
ID=59196754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710311470.3A Expired - Fee Related CN106896583B (en) | 2017-05-05 | 2017-05-05 | Display base plate and preparation method thereof, display panel and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106896583B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107450234A (en) * | 2017-10-10 | 2017-12-08 | 京东方科技集团股份有限公司 | Display base plate, display panel and display device |
| CN107577093A (en) * | 2017-09-20 | 2018-01-12 | 京东方科技集团股份有限公司 | A kind of display module and fiber waveguide display device |
| CN109856854A (en) * | 2019-04-17 | 2019-06-07 | 京东方科技集团股份有限公司 | A kind of display device and its display methods |
| CN111007961A (en) * | 2019-12-19 | 2020-04-14 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method thereof and display device |
| CN115020389A (en) * | 2021-11-01 | 2022-09-06 | 荣耀终端有限公司 | Optical packaging structure, display screen and electronic equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004027466A1 (en) * | 2002-09-18 | 2004-04-01 | Koninklijke Philips Electronics N.V. | Light generating device having polarized light emitting waveguide plate |
| CN102272973A (en) * | 2008-12-17 | 2011-12-07 | 3M创新有限公司 | Light extraction film with nanoparticle coatings |
| CN105972474A (en) * | 2015-03-13 | 2016-09-28 | 松下知识产权经营株式会社 | Light-emitting device, light-emitting unit and detector |
| CN106291943A (en) * | 2016-10-24 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of display floater and display device |
| CN106324898A (en) * | 2016-10-28 | 2017-01-11 | 京东方科技集团股份有限公司 | Display panel and display device |
-
2017
- 2017-05-05 CN CN201710311470.3A patent/CN106896583B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004027466A1 (en) * | 2002-09-18 | 2004-04-01 | Koninklijke Philips Electronics N.V. | Light generating device having polarized light emitting waveguide plate |
| CN102272973A (en) * | 2008-12-17 | 2011-12-07 | 3M创新有限公司 | Light extraction film with nanoparticle coatings |
| CN105972474A (en) * | 2015-03-13 | 2016-09-28 | 松下知识产权经营株式会社 | Light-emitting device, light-emitting unit and detector |
| CN106291943A (en) * | 2016-10-24 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of display floater and display device |
| CN106324898A (en) * | 2016-10-28 | 2017-01-11 | 京东方科技集团股份有限公司 | Display panel and display device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107577093A (en) * | 2017-09-20 | 2018-01-12 | 京东方科技集团股份有限公司 | A kind of display module and fiber waveguide display device |
| CN107450234A (en) * | 2017-10-10 | 2017-12-08 | 京东方科技集团股份有限公司 | Display base plate, display panel and display device |
| CN109856854A (en) * | 2019-04-17 | 2019-06-07 | 京东方科技集团股份有限公司 | A kind of display device and its display methods |
| CN111007961A (en) * | 2019-12-19 | 2020-04-14 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method thereof and display device |
| CN111007961B (en) * | 2019-12-19 | 2024-03-29 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method thereof and display device |
| CN115020389A (en) * | 2021-11-01 | 2022-09-06 | 荣耀终端有限公司 | Optical packaging structure, display screen and electronic equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106896583B (en) | 2019-10-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106896583A (en) | Display base plate and preparation method thereof, display panel and display device | |
| CN104330915B (en) | A kind of array base palte, liquid crystal display panel and display device | |
| KR100246688B1 (en) | Active matrix substrate and liquid crystal display device, and its manufacturing method | |
| CN110082977B (en) | TFT array substrate and display panel | |
| CN103278963A (en) | Color filtering array substrate, manufacturing method thereof and display device thereof | |
| EP2985643B1 (en) | Light guide plate and manufacturing method therefor, and display device comprising same | |
| CN107170904A (en) | Oled display substrate and preparation method thereof, display device | |
| CN106057909B (en) | A kind of thin film transistor (TFT), array substrate and display device | |
| JP2015528920A (en) | Bidirectional viewing angle display panel and manufacturing method thereof | |
| KR100483358B1 (en) | method for fabricating a Transflective liquid crystal display device and the same | |
| CN107065358A (en) | TFT substrate and liquid crystal display panel | |
| CN205317974U (en) | Inclined to one side vibration -damping sheet of wiregrating and liquid crystal display panel | |
| CN104849925B (en) | A kind of display panel and its manufacture method, display device | |
| CN104882450B (en) | A kind of array substrate and preparation method thereof, display device | |
| CN101008692A (en) | Micro-heating device used in planar optical waveguide thermo-optic devices and manufacture method therefor | |
| WO2016098268A1 (en) | Electrode-equipped color filter substrate, display device including that substrate and method for manufacturing that substrate | |
| CN105652510A (en) | Display panel and manufacture method thereof as well as display device | |
| CN107450234A (en) | Display base plate, display panel and display device | |
| CN206505399U (en) | Substrate and touch control display apparatus for display device | |
| CN102707832A (en) | Method for manufacturing touch screen display, touch screen display and terminal | |
| KR101485585B1 (en) | Display apparatus and method of manufacturing the same | |
| US6765641B1 (en) | Display device | |
| KR101274685B1 (en) | liquid crystal display device | |
| CN100465718C (en) | Liquid crystal display device having a thin film transistor substrate with a multi-cell gap structure and method of manufacturing same | |
| CN109634469A (en) | Display module and preparation method thereof, touch control display apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20191025 Termination date: 20210505 |