CN106892572A - A kind of AG glass polishing solutions and AG process of glass - Google Patents
A kind of AG glass polishing solutions and AG process of glass Download PDFInfo
- Publication number
- CN106892572A CN106892572A CN201710178707.5A CN201710178707A CN106892572A CN 106892572 A CN106892572 A CN 106892572A CN 201710178707 A CN201710178707 A CN 201710178707A CN 106892572 A CN106892572 A CN 106892572A
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- glass
- mass ratio
- acid
- working face
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
Abstract
The present invention provides a kind of AG glass polishing solutions, including CeO2, La2O3, 40% hydrofluoric acid；40% sulfuric acid；75% nitric acid.The technique that AG glass is produced using AG glass polishing solutions, step is by glass polishing, cleaning；Non-working surface to glass does printing protection with antiacid ink, and the treatment of the 5min frostings of prewashing 1 makes glass working face form the similar nontransparent microscopic pockets pattern of size shape；20 30min are processed by shot blasting to glass working face, the nontransparent microscopic pockets pattern on glass working face is processed bright, reach diffusing reflection effect so as to form AG anti-glazing effects, you can complete the production of AG glass.The present invention improves AG glass surface microscopic particles degree by increasing by one Dedicated Physical polishing process, improves uniformity, and particle pit diameter extreme difference brings up to extreme difference within 10 μm by original 40 ~ 60 μm.
Description
Technical field
The present invention relates to a kind of glass polishing powder, and the polishing powder is applied to the production of AG glass.
Background technology
Currently a popular etching method AG processing technologys, float-glass substrate is all that the air surface of glass is directly etched
AG techniques increase weak acid pretreatment before AG techniques are etched；The AG glass of the method processing meets common customer requirements, but
For high-end field, AG faces low-light particle uniformity does not reach ideal effect.The present invention is on the basis of the AG production technologies, to increase
Plus Dedicated Physical polishing process, a physics polishing is carried out before the etch to glass AG faces, make glass AG faces microscopic particles
Pattern is uniform, so as to reach more uniform AG effects after AG operations.
Current AG glass popular on the market, prevailing technology is to produce AG glass using etch processing procedure；In glass air
Frosting polishing process is done in face after being directly over Chemical Pretreatment, this technique prepare AG glass surfaces particle granules degree uniformity compared with
Difference：Particle pit diameter extreme difference scope is 40 ~ 60um.One group of data of actual test, such as in 370mm*470mm size glass surfaces
On, make the AG glass that glossiness is 75%, 9 test particle pit diameters of justifying glass surface（RSM) data are as follows：78um；
89um；125um；90um；98um；126um；89um；96um；129um；9 extreme difference scopes are in 51um.
Currently a popular etching method AG processing technologys, float-glass substrate is all that the air surface of glass is directly etched
AG techniques increase weak acid pretreatment before AG techniques are etched；The AG glass of the method processing meets common customer requirements, but
For high-end field, AG faces low-light particle uniformity does not reach ideal effect.
The content of the invention
A kind of AG glass polishing solutions, including the raw material of following weight portion is constituted：CeO2Mass ratio is accounted for for 20-30%, La2O3Account for
Mass ratio is 15-35%, and mass concentration is that 40% hydrofluoric acid mass ratio is 20-30%；Mass concentration accounts for mass ratio for 40% sulfuric acid
It is 10-20%；Mass concentration accounts for mass ratio for 5-10% for 75% nitric acid.
More preferably the raw material including following weight portion is constituted：CeO2Mass ratio is accounted for for 25%, La2O3Accounting for mass ratio is
20%, mass concentration be 40% hydrofluoric acid mass ratio be 25%；Mass concentration is 17% for 40% sulfuric acid accounts for mass ratio；Mass concentration
It is 8% for 75% nitric acid accounts for mass ratio.
Described AG glass polishing solutions produce the technique of AG glass, comprise the following steps：
Step one：The disk on polissoir is adsorbed into for 30-90 ° in tin face by glass according to sign angle；
Step 2：Start polissoir, be polished, polishing time is 3 ~ 6 minutes；
Step 3：Unloading piece, cleaning scrubbing unit cleaning；
Step 4：Non-working surface to glass does printing protection with antiacid ink, makes it ensure not receive any shadow in rear operation
Ring；
Step 5：Working face to glass carries out prewashing 1-5min with liquid；Liquid main component is the hydrofluoric acid and sulphur of dilution
The concentration of acid, wherein hydrofluoric acid is 2%；The concentration of sulfuric acid is 1%；The mass ratio 2 of hydrofluoric acid and sulfuric acid:1；
Step 6：To glass working face in frosting equipment, frosting treatment 50-100s is carried out with frosting liquid, glass is worked
Face forms the similar nontransparent microscopic pockets pattern of size shape；
Step 7：To glass working face on chemical polishing appts, 20-30min is processed by shot blasting with AG glass polishing solutions, made
Nontransparent microscopic pockets pattern treatment on glass working face is bright, reaches diffusing reflection effect so as to form AG anti-glazing effects, i.e.,
The production of AG glass can be completed.
Described frosting medicine liquid ingredient and mass fraction accounting is respectively：Ammonium acid fluoride 50% ~ 55%；Ammonium fluosilicate 3.5% ~
4%；Starch 6% ~ 7%；Citric acid 13% ~ 15%；Calcirm-fluoride 1.5%；Water 20%.Base plate glass air surface is polished by specific physical
Afterwards, then by doing frosting polishing process after pretreatment, AG glass surface particle granules degree uniformities improve a lot, actual test
One group of data, such as on 370*470 size glass surfaces, makes the AG glass that glossiness is 75%, the 9 points of tests of justifying glass surface
Particle pit diameter（RSM) data are as follows：88um；95um；92um；89um；94um；92um；94um；95um；92um；9 point poles
Difference is in 7um；Greatly enhance particle pit Direct Uniform.
The present invention is that on the basis of existing AG production technologies, glass substrate air surface is carried out before weak acid pretreatment special
Physics is polished, and polishing powder diameter average is about the grounds travel of 1.0 ~ 1.6um（Main component is CeO2, La2O3Rare earth material）.
By finishing polish technique, realize that glass surface microcosmic particle pattern is uniform, so as to reach particle morphology more in AG operations below
Uniformly, AG process rates are further improved.
Compared with prior art, the present invention improves microcosmic of AG glass surfaces by increasing by one physics polishing process
Granularity, improves uniformity, and particle pit diameter extreme difference brings up to extreme difference within 10 by 40 original ~ 60um.Meanwhile, because
Particle pit uniformity is improved, and the blackening and dim spot in AG processing procedures etch bad reduction, and fraction defective is by more than 10% original decline
To less than 3%.
Brief description of the drawings
Fig. 1 is the Electron microscope figure of glass surface after being polished with polishing powder, wherein figure A is 100 times of enlarged drawings；Figure B is 150
Times enlarged drawing.
Specific embodiment
AG glass polishing solutions produce the technique of AG glass, comprise the following steps：
Step one：The disk on polissoir is adsorbed into for 30 ° in tin face by glass according to sign angle；
Step 2：Start polissoir, be polished, polishing time is 3 ~ 6 minutes；
Step 3：Unloading piece, cleaning scrubbing unit cleaning；
Step 4：Non-working surface to glass does printing protection with antiacid ink, makes it ensure not receive any shadow in rear operation
Ring；
Step 5：To the working face of glass with liquid carry out prewashing 1-5min；Liquid main component be dilution hydrofluoric acid and
The concentration of sulfuric acid, wherein hydrofluoric acid is 2%；The concentration of sulfuric acid is 1%；The mass ratio 2 of hydrofluoric acid and sulfuric acid:1；
Step 6：To glass working face in frosting equipment, frosting treatment 50-100s is carried out with frosting liquid, glass is worked
Face forms the similar nontransparent microscopic pockets pattern of size shape；
Step 7：To glass working face on chemical polishing appts, 20-30min is processed by shot blasting with AG glass polishing solutions, made
Nontransparent microscopic pockets pattern treatment on glass working face is bright, reaches diffusing reflection effect so as to form AG anti-glazing effects, i.e.,
The production of AG glass can be completed.
Described frosting medicine liquid ingredient and mass fraction accounting is respectively：Ammonium acid fluoride 50% ~ 55%；Ammonium fluosilicate 3.5% ~
4%；Starch 6% ~ 7%；Citric acid 13% ~ 15%；Calcirm-fluoride 1.5%；Water 20%.
Described polishing fluid includes that the raw material of following weight portion is constituted：CeO2Mass ratio is accounted for for 25%, La2O3Accounting for mass ratio is
20%, mass concentration be 40% hydrofluoric acid mass ratio be 25%；Mass concentration is 17% for 40% sulfuric acid accounts for mass ratio；Mass concentration
It is 8% for 75% nitric acid accounts for mass ratio.
Key point of the present invention increases physics polishing process before being mainly AG manufacturing process；By increasing physics buffer
Sequence, evenly, it is dark that the etching inequality in reduction AG operations is caused glass surface low-light granularity after making AG operations processing procedure below
Point defect and dark spot defect.
Claims (4)
1. a kind of AG glass polishing solutions, it is characterised in that the raw material composition including following weight portion：CeO2Mass ratio is accounted for for 20-
30%, La2O3Mass ratio is accounted for for 15-35%, mass concentration is that 40% hydrofluoric acid mass ratio is 20-30%；Mass concentration is 40% sulphur
Acid accounts for mass ratio for 10-20%；Mass concentration accounts for mass ratio for 5-10% for 75% nitric acid.
2. a kind of AG glass polishing solutions, it is characterised in that the raw material composition including following weight portion：CeO2It is 25% to account for mass ratio,
La2O3Mass ratio is accounted for for 20%, mass concentration is that 40% hydrofluoric acid mass ratio is 25%；Mass concentration accounts for mass ratio for 40% sulfuric acid
It is 17%；Mass concentration is 8% for 75% nitric acid accounts for mass ratio.
3. the technique for AG glass being produced using the AG glass polishing solutions described in claim 1, it is characterised in that including following step
Suddenly：
Step one：The disk on polissoir is adsorbed into for 30-90 ° in tin face by glass according to sign angle；
Step 2：Start polissoir, be polished, polishing time is 3 ~ 6 minutes；
Step 3：Unloading piece, cleaning scrubbing unit cleaning；
Step 4：Non-working surface to glass does printing protection with antiacid ink, makes it ensure not receive any shadow in rear operation
Ring；
Step 5：Working face to glass carries out prewashing 1-5min with liquid；Liquid main component is the hydrofluoric acid and sulphur of dilution
The concentration of acid, wherein hydrofluoric acid is 2%；The concentration of sulfuric acid is 1%；The mass ratio 2 of hydrofluoric acid and sulfuric acid:1；
Step 6：To glass working face in frosting equipment, frosting treatment 50-100s is carried out with frosting liquid, glass is worked
Face forms the similar nontransparent microscopic pockets pattern of size shape；
Step 7：To glass working face on chemical polishing appts, 20-30min is processed by shot blasting with AG glass polishing solutions, made
Nontransparent microscopic pockets pattern treatment on glass working face is bright, reaches diffusing reflection effect so as to form AG anti-glazing effects, i.e.,
The production of AG glass can be completed.
4. the technique of the production AG glass described in claim 3, it is characterised in that described frosting medicine liquid ingredient and mass fraction
Accounting is respectively：Ammonium acid fluoride 50% ~ 55%；Ammonium fluosilicate 3.5% ~ 4%；Starch 6% ~ 7%；Citric acid 13% ~ 15%；Calcirm-fluoride
1.5%；Water 20%.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710178707.5A CN106892572A (en) | 2017-03-23 | 2017-03-23 | A kind of AG glass polishing solutions and AG process of glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710178707.5A CN106892572A (en) | 2017-03-23 | 2017-03-23 | A kind of AG glass polishing solutions and AG process of glass |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107365560A (en) * | 2017-08-04 | 2017-11-21 | 安徽宽居电器有限公司 | A kind of efficient polishing fluid of glass processing |
| CN108262646A (en) * | 2017-12-30 | 2018-07-10 | 文山科泰丰电子有限公司 | A kind of production method of mobile phone A G glass cover-plates |
| CN108637800A (en) * | 2018-06-15 | 2018-10-12 | 安徽今上显示玻璃有限公司 | A kind of display glass pre-polish(ing) thinning technique |
| CN108947273A (en) * | 2018-08-02 | 2018-12-07 | 朱盛菁 | A kind of novel anti reflection glass and its manufacturing method |
| CN110304834A (en) * | 2019-07-19 | 2019-10-08 | 江苏金旭新材料科技有限公司 | A kind of etching solution and the technique using the obtained ground glass cell phone rear cover of the etching solution |
| CN110510886A (en) * | 2019-09-18 | 2019-11-29 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN110776261A (en) * | 2019-05-13 | 2020-02-11 | 云南宏华光电有限公司 | Full-automatic AG glass production and manufacturing equipment and process flow thereof |
| CN110790513A (en) * | 2019-05-13 | 2020-02-14 | 云南宏华光电有限公司 | Homogeneous AG glass product and method for producing the same |
| CN111348838A (en) * | 2020-04-23 | 2020-06-30 | 东莞华清光学科技有限公司 | Forming process for glass substrate with dazzling and flashing sand etching effect |
| CN113213770A (en) * | 2021-05-30 | 2021-08-06 | 宜昌南玻显示器件有限公司 | Local AG glass processing method |
| CN114751652A (en) * | 2022-05-27 | 2022-07-15 | 东莞市顺玺电子科技有限公司 | Processing technology of 2.5D AG glass panel |
| CN116282903A (en) * | 2023-02-15 | 2023-06-23 | 清远南玻节能新材料有限公司 | Anti-dazzle glass, preparation method thereof and display device |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107365560A (en) * | 2017-08-04 | 2017-11-21 | 安徽宽居电器有限公司 | A kind of efficient polishing fluid of glass processing |
| CN108262646A (en) * | 2017-12-30 | 2018-07-10 | 文山科泰丰电子有限公司 | A kind of production method of mobile phone A G glass cover-plates |
| CN108637800A (en) * | 2018-06-15 | 2018-10-12 | 安徽今上显示玻璃有限公司 | A kind of display glass pre-polish(ing) thinning technique |
| CN108947273A (en) * | 2018-08-02 | 2018-12-07 | 朱盛菁 | A kind of novel anti reflection glass and its manufacturing method |
| CN108947273B (en) * | 2018-08-02 | 2021-11-23 | 朱盛菁 | Novel antireflection glass and manufacturing method thereof |
| CN110776261A (en) * | 2019-05-13 | 2020-02-11 | 云南宏华光电有限公司 | Full-automatic AG glass production and manufacturing equipment and process flow thereof |
| CN110790513A (en) * | 2019-05-13 | 2020-02-14 | 云南宏华光电有限公司 | Homogeneous AG glass product and method for producing the same |
| CN110304834A (en) * | 2019-07-19 | 2019-10-08 | 江苏金旭新材料科技有限公司 | A kind of etching solution and the technique using the obtained ground glass cell phone rear cover of the etching solution |
| CN110510886A (en) * | 2019-09-18 | 2019-11-29 | 沈阳汉科半导体材料有限公司 | Chemical granulation processing method for quartz surface |
| CN111348838A (en) * | 2020-04-23 | 2020-06-30 | 东莞华清光学科技有限公司 | Forming process for glass substrate with dazzling and flashing sand etching effect |
| CN113213770A (en) * | 2021-05-30 | 2021-08-06 | 宜昌南玻显示器件有限公司 | Local AG glass processing method |
| CN114751652A (en) * | 2022-05-27 | 2022-07-15 | 东莞市顺玺电子科技有限公司 | Processing technology of 2.5D AG glass panel |
| CN116282903A (en) * | 2023-02-15 | 2023-06-23 | 清远南玻节能新材料有限公司 | Anti-dazzle glass, preparation method thereof and display device |
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Application publication date: 20170627 |