CN106882802B - A kind of modified graphene oxide and preparation method and purposes - Google Patents

A kind of modified graphene oxide and preparation method and purposes Download PDF

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CN106882802B
CN106882802B CN201710116786.7A CN201710116786A CN106882802B CN 106882802 B CN106882802 B CN 106882802B CN 201710116786 A CN201710116786 A CN 201710116786A CN 106882802 B CN106882802 B CN 106882802B
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graphene oxide
modified graphene
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film
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CN106882802A (en
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孙铁囤
姚伟忠
汤平
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Changzhou EGing Photovoltaic Technology Co Ltd
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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Abstract

The invention belongs to material modification fields, and in particular to a kind of surface modified graphene oxide and preparation method and its be used to prepare too can battery method.Select carboxylic graphene oxide as the material being modified, excessive bisphenol-A is as modified material, using inorganic salts as catalyst, esterification occurs, obtains modified graphene oxide.Modified graphene oxide is used to prepare solar cell, forms bilayer modified graphene oxide film solar cell, optical energy utilization efficiency is promoted apparent.

Description

A kind of modified graphene oxide and preparation method and purposes
Technical field
The invention belongs to solar cell manufacturing fields, and in particular to it is a kind of be used to prepare too can battery it is modified oxidized Graphene and preparation method thereof.
Background technology
Graphene oxide (graphene oxide) is the oxide of graphene, has single atomic layer, can be at any time Expand to some tens of pm on lateral dimension, the construct trans typical size of general chemistry and material science.Powdered graphite It is obtained after chemical oxidation and stripping, oxygen-containing functional group increases and keeps property more active compared with graphene thereon, can be via various Improve nature with reacting for oxygen-containing functional group.Graphene oxide can be considered a kind of flexible material of non-traditional kenel, be A kind of new carbon haveing excellent performance, with the functional group that higher specific surface area and surface are abundant.Graphene oxide is compound Material includes polymerization species composite material and inorganic species composite material is even more the field that has a wide range of applications, therefore aoxidizes stone The surface of black alkene, which is modified, becomes a research emphasis.
With the development that science and technology is with rapid changepl. never-ending changes and improvements, photovoltaic power generation technology is at home and abroad widely used, and is applied Form is varied, and application places are widely distributed, is mainly used for the room of large-scale ground photovoltaic plant, house and commercial buildings Top, building Photovoltaic Building Integration, optical road lamp etc..For solar cell mainly based on semi-conducting material, work is former Reason is that opto-electronic conversion reaction occurs after absorbing luminous energy using photoelectric material, and generated power of solar cell is related with illuminating area, light Showing up, product is bigger, and generated energy is more, and typical photovoltaic material only reacts to the light of specific frequency and color, particularly with red Outside line, most of solar cells do not absorb infrared ray, can not effectively be utilized its energy, therefore for solar energy Utilization ratio is relatively low.
Graphene and graphene oxide are applied to area of solar cell at present and are still in the exploratory stage, there is patent document It reports and is used graphene as electricity generation material in solar cell, the infrared ray in sunlight is absorbed, as power generation The energy source of material, but common graphite alkene itself stores that energy is low, can not accumulate more energy, therefore Solar use is imitated Rate promotes unobvious.
Invention content
The purpose of the present invention:For presently, there are the problem of, a kind of modified graphene oxide is provided, use it for prepare too Positive energy battery, improves the utilization ratio of solar energy.
Technical scheme of the present invention:Select carboxylic graphene oxide as the material being modified, excessive bisphenol-A is made Esterification occurs, bisphenol-A is introduced on graphene oxide, bis-phenol is obtained using inorganic salts as catalyst for modified material A and the spaced modified graphene oxide of graphene oxide, preparation method include:
(1) bisphenol-A, inorganic salts and DMAC solvents is chosen to be added in three-necked flask and be sufficiently stirred 0.5h;
(2) carboxylic graphene oxide is added into the three-necked flask of step 1, is reacted in 100-150 DEG C of condensing reflux 6-8h reacts layering after generating water and forms water layer and organic layer, organic layer is rotated under 220-240 DEG C of vacuum condition and is isolated Bisphenol-A and ethyl alcohol, obtain modified graphene oxide.
Preferably, the inorganic salts described in step (1) are sulfate or nitrate.
Preferably, bisphenol-A, carboxylic graphene oxide, inorganic salt catalyst described in step (1) and (2) and The molar ratio of DMAC solvents is 10:5-9:1:20.
A kind of solar cell prepared with modified graphene oxide, preparation method include:
(1) preparing polysilicon film is under vacuum, heavy using physics when the temperature of silicon substrate is 650-900 DEG C Drop method prepares the polysilicon membrane that thickness is 100 μm on silicon substrate;
(2) it anneals, anneals and carried out in the vacuum resistance furnace of logical hydrogen, by silicon substrate of the step 1 containing polysilicon membrane Insulation annealing is respectively carried out at 1500 DEG C, 1200 DEG C, 900 DEG C, 600 DEG C and 300 DEG C successively 30 minutes, is finally cooled to room temperature;
(3) modified graphene film is grown, modified graphene film is prepared using PECVD device, controlled at 300- 400 DEG C, air pressure 3-5MPa, power 3500W, one layer of modified graphene film, interval are first deposited on polysilicon membrane Continue to deposit second layer modified graphene film after 15min, the thickness of double-layer films deposition is 100-200nm, forms solar energy Cell piece;
(4) laser opening, solar cell back face laser opening after annealing, repetitive rate 24%, average energy Amount is 8W, and single-point energy is 32 μ J;
(5) preparation of PN junction, antireflective film and electrode, using the crystal silicon solar energy battery PN junction of conventional commercial, anti-reflection The preparation method of film and electrode, obtains solar cell.
Preferably, the antireflective film described in step (5) is Al2O3、TiO2Or SiO2
The technique effect of the present invention:
1. the carboxyl of bisphenol-A and graphene oxide is acted in inorganic salt catalyst occurs esterification, formed bisphenol A modified Graphene oxide.Although common graphite alkene has responding ability to infrared ray, it stores less energy and has then reached full With can not play the role of the big energy of storage.And modified graphene oxide prepared by the present invention has the structure of graphene, simultaneously Contain big polar bisphenol-A again, graphene-structured therein can constantly respond extraneous infrared ray, while big polar The energy storage that structure of bisphenol A can obtain response wherein, forms a kind of " energy storage pool ", continuously for solar cell Energy is conveyed, the utilization ratio of luminous energy has been significantly increased.
2. the solar cell of the present invention contains bilayer modified graphene film, is formed two layers " energy storage pool ", avoid single layer Modified graphene film is blocked up, and the energy of accumulation is larger and punctures " energy storage pool ", the present invention by design double-layer films to Solves this problem.
Specific implementation mode
Embodiment 1
Prepare modified graphene oxide:
(1) 5mol bisphenol-As, 0.5mol sodium sulphate and 5mol DMAC solvents is chosen to be added in three-necked flask and be sufficiently stirred 0.5h;
(2) the carboxylic graphene oxides of 2.5mol are added into the three-necked flask of step 1, are condensed back at 120-130 DEG C Stream reaction 7h reacts layering after generating water and forms water layer and organic layer, organic layer is rotated under 230 DEG C of vacuum conditions and is isolated Bisphenol-A obtains modified graphene oxide.
Prepare solar cell:
(1) preparing polysilicon film, under vacuum, when the temperature of silicon substrate is 800 DEG C, using physics sedimentation The polysilicon membrane that thickness is 100 μm is prepared on silicon substrate;
(2) it anneals, anneals and carried out in the vacuum resistance furnace of logical hydrogen, by the substrate silicon of step (1) containing polysilicon membrane Piece respectively carries out insulation annealing 30 minutes at 1500 DEG C, 1200 DEG C, 900 DEG C, 600 DEG C and 300 DEG C successively, is finally cooled to often Temperature;
(3) modified graphene film is grown, modified graphene film is prepared using PECVD device, controlled at 350- 360 DEG C, air pressure 4MPa, power 3500W, one layer of modified graphene film is first deposited on polysilicon membrane, is spaced 15min After continue deposit second layer modified graphene film, double-layer films deposition thickness be 150nm, formed solar battery sheet;
(4) laser opening, solar cell back face laser opening after annealing, repetitive rate 24%, average energy Amount is 8W, and single-point energy is 32 μ J;
(5) preparation of PN junction, antireflective film and electrode, using the crystal silicon solar energy battery PN junction of conventional commercial, anti-reflection The preparation method of film and electrode, obtains solar cell.
Embodiment 2
Prepare modified graphene oxide:
(1) 5mol bisphenol-As, 0.5mol sodium sulphate and 7.5mol DMAC solvents is chosen to be added in three-necked flask and fully stir Mix 0.5h;
(2) the carboxylic graphene oxides of 3.75mol are added into the three-necked flask of step 1, are condensed back at 120-130 DEG C Stream reaction 6h reacts layering after generating water and forms water layer and organic layer, organic layer is rotated under 230 DEG C of vacuum conditions and is isolated Bisphenol-A obtains modified graphene oxide.
Prepare solar cell:
(1) preparing polysilicon film, under vacuum, when the temperature of silicon substrate is 800 DEG C, using physics sedimentation The polysilicon membrane that thickness is 100 μm is prepared on silicon substrate;
(2) it anneals, anneals and carried out in the vacuum resistance furnace of logical hydrogen, by the substrate silicon of step (1) containing polysilicon membrane Piece respectively carries out insulation annealing 30 minutes at 1500 DEG C, 1200 DEG C, 900 DEG C, 600 DEG C and 300 DEG C successively, is finally cooled to often Temperature;
(3) modified graphene film is grown, modified graphene film is prepared using PECVD device, controlled at 350- 360 DEG C, air pressure 4MPa, power 3500W, one layer of modified graphene film is first deposited on polysilicon membrane, is spaced 15min After continue deposit second layer modified graphene film, double-layer films deposition thickness be 150nm, formed solar battery sheet;
(4) laser opening, solar cell back face laser opening after annealing, repetitive rate 24%, average energy Amount is 8W, and single-point energy is 32 μ J;
(5) preparation of PN junction, antireflective film and electrode, using the crystal silicon solar energy battery PN junction of conventional commercial, anti-reflection The preparation method of film and electrode, obtains solar cell.
Embodiment 3
Prepare modified graphene oxide:
(1) 5mol bisphenol-As, 0.5mol sodium sulphate and 10mol DMAC solvents is chosen to be added in three-necked flask and be sufficiently stirred 0.5h;
(2) the carboxylic graphene oxides of 4.5mol are added into the three-necked flask of step 1, are condensed back at 120-130 DEG C Stream reaction 6h reacts layering after generating water and forms water layer and organic layer, organic layer is rotated under 230 DEG C of vacuum conditions and is isolated Bisphenol-A obtains modified graphene oxide.
Prepare solar cell:
(1) preparing polysilicon film, under vacuum, when the temperature of silicon substrate is 800 DEG C, using physics sedimentation The polysilicon membrane that thickness is 100 μm is prepared on silicon substrate;
(2) it anneals, anneals and carried out in the vacuum resistance furnace of logical hydrogen, by the substrate silicon of step (1) containing polysilicon membrane Piece respectively carries out insulation annealing 30 minutes at 1500 DEG C, 1200 DEG C, 900 DEG C, 600 DEG C and 300 DEG C successively, is finally cooled to often Temperature;
(3) modified graphene film is grown, modified graphene film is prepared using PECVD device, controlled at 350- 360 DEG C, air pressure 4MPa, power 3500W, one layer of modified graphene film is first deposited on polysilicon membrane, is spaced 15min After continue deposit second layer modified graphene film, double-layer films deposition thickness be 150nm, formed solar battery sheet;
(4) laser opening, solar cell back face laser opening after annealing, repetitive rate 24%, average energy Amount is 8W, and single-point energy is 32 μ J;
(5) preparation of PN junction, antireflective film and electrode, using the crystal silicon solar energy battery PN junction of conventional commercial, anti-reflection The preparation method of film and electrode, obtains solar cell.
Comparative example 1
Modified graphene oxide is not prepared, the carboxylic graphene oxide used in 1 step of embodiment (2) is directly used In preparing solar cell, remaining operation obtains solar cell with embodiment 1.
Comparative example 2
The bisphenol-A that embodiment 1 uses is not added, and the operation for preparing modified graphene oxide processing step (1) is:It chooses 0.5mol sodium sulphate and 5mol DMAC solvents are added in three-necked flask and are sufficiently stirred 0.5h.Remaining operation is obtained with embodiment 1 To solar cell.
Comparative example 3
It prepared by embodiment 1 only deposits one layer of modified graphene oxide film, thickness and reality in solar cell step (3) It is identical to apply the sum of 1 double-layer films thickness of example, remaining operation obtains solar cell with embodiment 1.
Embodiment 1-3 and comparative example the 1-3 solar cell prepared are put into actual use, crucial ginseng is detected Number, as shown in table 1, statistics indicate that:1. embodiment 1-3 and comparative example 1 statistics indicate that, modified graphene oxide is more not Modified graphene containing carboxylic-oxidized improves 0.50%-0.86%;2. embodiment 1-3 and comparative example 1 statistics indicate that, it is double Phenol A plays the role of key in graphene oxide modifying process;3. embodiment 1-3 and comparative example 3 statistics indicate that, it is double-deck The more monolayer-modified graphene oxide film solar cell of modified graphene oxide thin-film solar cells improves 0.28%- 0.64%.
Solar cell prepared by 1 embodiment 1-3 of table and comparative example 1-2 uses parameter list
Uoc(mV) Isc(A) FF (%) Rs(mΩ) Rsh(Ω) EFF (%)
Embodiment 1 658.1 10.012 82.3 1.97 591.3 20.85
Embodiment 2 653.7 9.598 80.3 2.13 542.1 20.49
Embodiment 3 656.2 9.747 81.5 2.05 567.3 20.62
Comparative example 1 552.3 8.387 67.6 4.21 306.9 19.99
Comparative example 2 533.0 8.166 68.6 4.17 311.7 20.04
Comparative example 3 591.2 8.987 72.6 3.01 483.2 20.21

Claims (6)

1. a kind of modified graphene oxide, which is characterized in that select carboxylic graphene oxide as the material being modified, mistake The bisphenol-A of amount is as modified material, using inorganic salts as catalyst, esterification occurs, obtains modified graphene oxide.
2. a kind of preparation method of modified graphene oxide as described in claim 1, which is characterized in that the preparation method Including:
(1) bisphenol-A, inorganic salts and DMAC solvents is chosen to be added in three-necked flask and be sufficiently stirred 0.5h;
(2) carboxylic graphene oxide is added into the three-necked flask of step 1, reacts 6-8h in 100-150 DEG C of condensing reflux, Layering forms water layer and organic layer after reaction generates water, and organic layer is rotated under 220-240 DEG C of vacuum condition and isolates bisphenol-A And ethyl alcohol, obtain modified graphene oxide.
3. the preparation method of modified graphene oxide as claimed in claim 2, which is characterized in that inorganic described in step (1) Salt is sulfate or nitrate.
4. the preparation method of modified graphene oxide as claimed in claim 2, which is characterized in that described in step (1) and (2) Bisphenol-A, carboxylic graphene oxide, inorganic salts and DMAC solvents molar ratio be 10:5-9:1:20.
5. a kind of purposes of modified graphene oxide as described in claim 1, which is characterized in that the modified graphite oxide Alkene is used to prepare solar cell, and the preparation method of battery includes:
(1) preparing polysilicon film, under vacuum, when the temperature of silicon substrate is 650-900 DEG C, using physics sedimentation The polysilicon membrane that thickness is 100 μm is prepared on silicon substrate;
(2) it anneals, anneals and carried out in the vacuum resistance furnace of logical hydrogen, by step(1 )Silicon substrate containing polysilicon membrane according to It is secondary insulation annealing respectively to be carried out at 1500 DEG C, 1200 DEG C, 900 DEG C, 600 DEG C and 300 DEG C 30 minutes, it is finally cooled to room temperature;
(3) modified graphene film is grown, modified graphene film is prepared using PECVD device, controlled at 300-400 DEG C, air pressure 3-5MPa, power 3500W first deposit one layer of modified graphene film on polysilicon membrane, are spaced 15min After continue deposit second layer modified graphene film, double-layer films deposition thickness be 100-200nm, formed solar cell Piece;
(4) laser opening, solar cell back face laser opening after annealing, repetitive rate 24%, average energy are 8W, single-point energy are 32 μ J;
(5) preparation of PN junction, antireflective film and electrode, using the crystal silicon solar energy battery PN junction of conventional commercial, antireflective film and The preparation method of electrode, obtains solar cell.
6. the purposes of modified graphene oxide as claimed in claim 5, which is characterized in that the antireflective film described in step (5) is Al2O3、TiO2Or SiO2
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