CN106843623A - A kind of resistive touch screen - Google Patents
A kind of resistive touch screen Download PDFInfo
- Publication number
- CN106843623A CN106843623A CN201611195840.3A CN201611195840A CN106843623A CN 106843623 A CN106843623 A CN 106843623A CN 201611195840 A CN201611195840 A CN 201611195840A CN 106843623 A CN106843623 A CN 106843623A
- Authority
- CN
- China
- Prior art keywords
- transparency conducting
- layer
- conducting layer
- touch screen
- resistive touch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims abstract description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 20
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 12
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 238000009413 insulation Methods 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 239000002131 composite material Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000008246 gaseous mixture Substances 0.000 description 2
- -1 indium tin metal oxide Chemical class 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 210000001138 tear Anatomy 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/045—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
Abstract
The invention discloses a kind of resistive touch screen, including basic unit and superficial layer, the upper surface of basic unit is provided with the first transparency conducting layer, the lower surface of superficial layer is provided with the second transparency conducting layer, because the upper surface of the first transparency conducting layer and the lower surface of the second transparency conducting layer are all rough surface, it has been equipped with transparent protuberant particles, when pressure is applied on screen, the transparent protuberant particles meeting preferential contact of two-layer layer at transparent layer, so as to improve the touch sensitivity of electric resistance touch screen, the loss of transparency conducting layer can be reduced again, extend the life-span of electric resistance touch screen.
Description
Technical field
The present invention relates to touch-screen field, more particularly to a kind of resistive touch screen.
Background technology
The screen body portion of electric resistance touch screen is one piece is attached to the multi-layer compound film of display screen surface, and substantially film adds
ITO (nano indium tin metal oxide) coating, ITO coatings are scribbled in the structure of upper glass, film and the adjacent one side of glass
With good electric conductivity and the transparency.There are many tiny transparent insulation isolation particles between two-layer ITO coatings so that two
It is in when without applying pressure between layer ITO coatings and is dielectrically separated from state.When touch operation, the ITO of film lower floor can connect
The ITO of glass superstrate is contacted, corresponding electric signal is spread out of via inductor, processor is sent to by change-over circuit, by computing
X, Y value on screen are converted into, and complete the action for clicking, and be presented on screen.
Due to electric resistance touch screen in use, the ITO of film lower floor constantly contacts the ITO of glass superstrate, when long
Between after, surface ITO constantly weares and teares, and causes sensitivity decrease, subregion short circuit, service life reduction.It is electric in the market
Appearance formula touch-screen can overcome all the problems above, also therefore turn into main flow, but market segment field because of cost reason still
Resistive touch screen is continued to use, therefore is strengthened the sensitivity of resistive touch screen and is extended its service life, captured as needs
Problem.
The content of the invention
For the drawbacks described above that the electric resistance touch screen for solving prior art is present, a kind of resistance is the embodiment of the invention provides
Touch-screen, the electric resistance touch screen improves touch sensitivity and service life.The technical scheme is as follows：
A kind of resistive touch screen, including basic unit and superficial layer, the first transparency conducting layer is provided with the upper surface of basic unit,
The lower surface of superficial layer is provided with the second transparency conducting layer, is set between the first transparency conducting layer and the second transparency conducting layer
There is transparent insulation to isolate particle, it is characterised in that：Under the upper surface and the second transparency conducting layer of first transparency conducting layer
The roughness on surface is 1nm-6nm.
Preferably, the roughness of the lower surface of the upper surface of first transparency conducting layer and the second transparency conducting layer is
1.5nm-3.5nm。
Further, the material of the first transparency conducting layer and the second transparency conducting layer is In2O3:TiO2、In2O3:SnO2、
In2O3:ZnO2One kind therein.
Preferably, the material of first transparency conducting layer and the second transparency conducting layer is In2O3:TiO2, TiO2Weight
Percentage is 1%-5%In2O3:TiO2。
Further, the thickness of first transparency conducting layer and the second transparency conducting layer is 15nm-25nm.
Further, the basic unit is glassy layer, and the superficial layer is film layer.
Further, a kind of method that use magnetron sputtering prepares the resistive touch screen described in claim 1, its feature
It is：Flow including setting argon gas is 150sccm-200sccm, and the flow of oxygen is 0.5sccm-1sccm；Working power is
Alternating current or direct current.
The beneficial effects of the invention are as follows：Electric resistance touch screen provided in an embodiment of the present invention, due to the first transparency conducting layer
The lower surface of upper surface and the second transparency conducting layer is all rough surface, transparent protuberant particles has been equipped with, when on screen
When applying pressure, the transparent protuberant particles meeting preferential contact of two-layer layer at transparent layer, so as to improve electric resistance touch screen
Touch sensitivity, can reduce the loss of transparency conducting layer again, extend the life-span of electric resistance touch screen.
Brief description of the drawings
Fig. 1 is the structural representation of resistive touch screen of the invention；
Fig. 2 be comparative example prepare resistive touch screen conductive layer surface microscopic topographic figure (SEM,
SEM)；
Fig. 3 is the surface microscopic topographic figure (scanning electron microscopy of resistive touch screen conductive layer prepared by embodiment 1
Mirror, SEM)；
Fig. 4 be embodiment 1 prepare resistive touch screen conductive layer surface microscopic topographic figure (AFM,
AFM)；
Fig. 5 be embodiment 2 prepare resistive touch screen conductive layer surface microscopic topographic figure (AFM,
AFM)；
Fig. 6 be embodiment 3 prepare resistive touch screen conductive layer surface microscopic topographic figure (AFM,
AFM)；
Specific embodiment
It should be noted that in the case where not conflicting, the feature in embodiment and embodiment in the application can phase
Mutually combination.Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Ground description, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based on this
Embodiment in invention, all other reality that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example is applied, the scope of protection of the invention is belonged to.
As described in background technology, the electric resistance touch screen of prior art in use, upper and lower two-layer electrically conducting transparent
Is there is abrasion after constantly contacting for a long time in ITO layer, causes electric resistance touch screen sensitivity decrease, and subregion is short-circuit,
Service life reduction.In order to solve the technical problem, a kind of electric resistance touch screen is the embodiment of the invention provides.
As shown in figure 1, Fig. 1 shows the multi-layer compound structure in the electric resistance touch screen of present invention offer, the resistive touch
Touching screen includes basic unit 1 and superficial layer 2, the upper surface of basic unit 1 is provided with the first transparency conducting layer 3, in the lower surface of superficial layer 2
Be provided with the second transparency conducting layer 4, be provided between the first transparency conducting layer 3 and the second transparency conducting layer 4 transparent insulation every
From particle 5；The upper surface of first transparency conducting layer and the lower surface of the second transparency conducting layer are equipped with integrally formed
Bright protuberant particles, and its roughness is 1nm-6nm, so that the two-layer transparency conducting layer in electric resistance touch screen is more prone to connect
Touch, so as to improve the touch sensitivity of electric resistance touch screen.
In order to further improve the service life of above-mentioned electric resistance touch screen, the upper surface of the first transparency conducting layer and second saturating
The roughness of the lower surface of bright conductive layer is preferably 1.5nm-3.5nm.
In order to obtain the material of good electric conductivity and the transparency, above-mentioned first transparency conducting layer and the second transparency conducting layer
Material is mainly selected from In2O3And TiO2Composite oxides, In2O3And SnO2Composite oxides, In2O3And ZnO2Composite oxides
One kind therein.
In a kind of preferred embodiment of the application, the material of above-mentioned first transparency conducting layer and the second transparency conducting layer is
In2O3And TiO2Composite oxides, and TiO2Percentage by weight account for total composite oxides 1%-5% so that it is final
To the surface roughness of transparency conducting layer be relatively easy to control.
The thickness of above-mentioned transparency conducting layer is particularly in the scope of 15nm-25nm more preferably more preferably greater than 10nm.It is transparent to lead
When the thickness of electric layer is less than 10nm, resistance is higher, causes the touch sensitivity of touch-screen relatively low.
Superficial layer of the present invention or basic unit, as long as disclosure satisfy that the material of the transparency, are not particularly limited,
The various applicable glass plate or fexible film sheet material that can be known to the skilled person, for example, glass plate can preferentially from boron
Silica glass, soda-lime glass etc.；The material of fexible film sheet material is preferably PET (PET), polycarbonate resin
(PC), polymethacrylates (PMMA), poly-naphthalene dicarboxylic acid glycol ester (PEN) etc..In a kind of preferred embodiment of the application
In, above-mentioned basic unit is set to glassy layer, and superficial layer is set to film layer.
As the film build method of transparency conducting layer of the invention, have vacuum vapour deposition, sputtering method, CVD, ion plating method,
Metallikon etc., suitably can select the above method with required thickness.The preferred magnetron sputtering method of the present invention is led as transparent
The film build method of electric layer, wherein, used as reactant gas, oxygen-containing gas can be the gaseous mixture of oxygen and inert gas, also may be used
Think air, the preferably gaseous mixture of oxygen and inert gas.Inert gas can for nitrogen, helium, neon, argon gas, Krypton,
At least one in xenon and radon gas.Further, do not damaging in the range of the purpose of the present invention, it is also possible to which straight is applied to base material
Stream, exchange, high frequency etc. are biased.In a kind of preferred embodiment of the application, the flow for being preferably provided with argon gas is 150sccm-
200sccm, the flow of oxygen is 0.5sccm-1sccm.
Below with reference to embodiment and comparative example, the beneficial effect of the application is further illustrated.
Embodiment 1~5
At ambient temperature, formed on basic unit (glassy layer), superficial layer (film layer) using the method for magnetron sputtering
In2O3:TiO2Film, wherein, TiO2Weight be In2O3And TiO2Composite oxides weight summation 1%-5%, main work
Skill parameter refers to table 1.
Embodiment 6
It is to form In on basic unit (glassy layer), superficial layer (film layer) with the difference of embodiment 12O3:ZnO2
Film, wherein, ZnO2Weight be In2O3And ZnO2Composite oxides weight summation 3%.
Comparative example
It is to form In on basic unit (glassy layer), superficial layer (film layer) with the difference of embodiment 12O3:SnO2
Film, wherein, SnO2Weight be In2O3And SnO2Composite oxides weight summation 4%.
In addition, table 1 also show it is transparent used by the resistive touch screen that embodiment 1~6 and comparative example are prepared
The surface roughness of conductive layer, resistive touch screen get the performance test results such as test ready, and Fig. 2~Fig. 6 respectively show
The surface microscopic topographic figure of conductive layer prepared by embodiment 1~3 and comparative example, such that it is able to learn, prepared by embodiment 1~3
The surface relief structure of conductive layer is obvious compared with conductive layer prepared by comparative example, so that the touch sensitivity of resistive touch screen is obtained
To raising；The number of times of getting ready of resistive touch screen prepared by embodiment 1~6 is substantially wanted than resistive touch screen prepared by comparative example
Many, i.e., embodiment 1~6 prepares the life-span that conductive layer extends resistive touch screen.
Table 1
The above, specific embodiment only of the invention, but protection scope of the present invention is not limited thereto, and it is any
Those familiar with the art the invention discloses technical scope in, the change or replacement that can be readily occurred in, all should
It is included within the scope of the present invention.Therefore, protection scope of the present invention should described be with scope of the claims
It is accurate.
Claims (7)
1. a kind of resistive touch screen, including basic unit and superficial layer, the first transparency conducting layer is provided with the upper surface of basic unit,
The lower surface of superficial layer is provided with the second transparency conducting layer, is provided between the first transparency conducting layer and the second transparency conducting layer
Transparent insulation isolates particle, it is characterised in that：The upper surface of first transparency conducting layer and the following table of the second transparency conducting layer
The roughness in face is 1nm-6nm.
2. resistive touch screen according to claim 1, it is characterised in that：The upper surface of first transparency conducting layer and
The roughness of the lower surface of the second transparency conducting layer is 1.5nm-3.5nm.
3. resistive touch screen according to claim 1 and 2, it is characterised in that：First transparency conducting layer and second
The material of transparency conducting layer is In2O3:TiO2、In2O3:SnO2、In2O3:ZnO2One kind therein.
4. resistive touch screen according to claim 1 and 2, it is characterised in that：First transparency conducting layer and second
The material of transparency conducting layer is In2O3:TiO2, TiO2Percentage by weight be 1%-5%In2O3:TiO2。
5. resistive touch screen according to claim 1, it is characterised in that：First transparency conducting layer and second transparent
The thickness of conductive layer is 15nm-25nm.
6. resistive touch screen according to claim 1, it is characterised in that：The basic unit is glassy layer, the superficial layer
It is film layer.
7. a kind of method that use magnetron sputtering prepares the resistive touch screen described in claim 1, it is characterised in that：Including setting
The flow of argon gas is put for 150sccm-200sccm, the flow of oxygen is 0.5sccm-1sccm；Working power is alternating current or straight
Stream electricity.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611195840.3A CN106843623A (en) | 2016-12-22 | 2016-12-22 | A kind of resistive touch screen |
| TW106114534A TWI644246B (en) | 2016-12-22 | 2017-05-02 | Resistive touch panel and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611195840.3A CN106843623A (en) | 2016-12-22 | 2016-12-22 | A kind of resistive touch screen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106843623A true CN106843623A (en) | 2017-06-13 |
Family
ID=59136971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611195840.3A Pending CN106843623A (en) | 2016-12-22 | 2016-12-22 | A kind of resistive touch screen |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN106843623A (en) |
| TW (1) | TWI644246B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201022460A (en) * | 2008-12-02 | 2010-06-16 | Applied Materials Inc | A transparent conductive film with high transmittance formed by a reactive sputter deposition |
| CN101943980A (en) * | 2010-08-05 | 2011-01-12 | 华为终端有限公司 | Resistor touch screen, screen protection film and terminal equipment |
| CN102024507A (en) * | 2009-09-15 | 2011-04-20 | 迎辉科技股份有限公司 | Transparent conducting film with crystallinity |
| CN102109917A (en) * | 2009-12-28 | 2011-06-29 | 北京富纳特创新科技有限公司 | Touch screen and preparation method thereof |
| CN206363289U (en) * | 2016-12-22 | 2017-07-28 | 张家港康得新光电材料有限公司 | Resistive touch screen |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101564803B1 (en) * | 2009-03-31 | 2015-10-30 | 데이진 가부시키가이샤 | Transparent conductive laminate and transparent touch panel |
| US20150010749A1 (en) * | 2012-01-31 | 2015-01-08 | Toray Industries, Inc. | Transparent conductive laminate, method for production of same, electronic paper using same and touch panel using same |
| CN105659198B (en) * | 2014-04-30 | 2019-06-18 | 日东电工株式会社 | Transparent conducting film |
-
2016
- 2016-12-22 CN CN201611195840.3A patent/CN106843623A/en active Pending
-
2017
- 2017-05-02 TW TW106114534A patent/TWI644246B/en active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201022460A (en) * | 2008-12-02 | 2010-06-16 | Applied Materials Inc | A transparent conductive film with high transmittance formed by a reactive sputter deposition |
| CN102024507A (en) * | 2009-09-15 | 2011-04-20 | 迎辉科技股份有限公司 | Transparent conducting film with crystallinity |
| CN102109917A (en) * | 2009-12-28 | 2011-06-29 | 北京富纳特创新科技有限公司 | Touch screen and preparation method thereof |
| CN101943980A (en) * | 2010-08-05 | 2011-01-12 | 华为终端有限公司 | Resistor touch screen, screen protection film and terminal equipment |
| CN206363289U (en) * | 2016-12-22 | 2017-07-28 | 张家港康得新光电材料有限公司 | Resistive touch screen |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI644246B (en) | 2018-12-11 |
| TW201823963A (en) | 2018-07-01 |
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