CN106842563B - Optical field modulation structure design method based on birefringent material - Google Patents
Optical field modulation structure design method based on birefringent material Download PDFInfo
- Publication number
- CN106842563B CN106842563B CN201710227825.0A CN201710227825A CN106842563B CN 106842563 B CN106842563 B CN 106842563B CN 201710227825 A CN201710227825 A CN 201710227825A CN 106842563 B CN106842563 B CN 106842563B
- Authority
- CN
- China
- Prior art keywords
- light
- birefringent material
- phase
- value
- pixel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 230000003287 optical effect Effects 0.000 title claims abstract description 22
- 239000000463 material Substances 0.000 title claims abstract description 20
- 238000009826 distribution Methods 0.000 claims description 22
- 238000012938 design process Methods 0.000 claims description 4
- 230000010287 polarization Effects 0.000 abstract description 11
- 230000033228 biological regulation Effects 0.000 abstract description 3
- 238000004364 calculation method Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1833—Diffraction gratings comprising birefringent materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a method for designing an optical field modulation structure based on a birefringent material. The method mainly adopts the birefringent material to design the structure, and can simultaneously obtain two phase modulation quantities for incident light by utilizing the characteristic that the birefringent material has different refractive indexes for o light and e light. The height of the structure on the birefringent material is obtained by adopting an iterative calculation method, the initial height is set for each pixel point, then the phase modulation amounts of o light and e light corresponding to the pixel points are calculated respectively, the absolute difference value is obtained by comparing the phase modulation amounts with the target phase modulation amount, the root mean square value is taken as a measurement standard, and the height value of the point is determined when the minimum value of the root mean square value is reached. And calculating each pixel point by point to obtain the height values of all the pixel points. The method realizes the regulation and control of the polarization state and the amplitude of the target light field, does not need a complex light path, can realize different-phase modulation of incident light by using a structure, and has high diffraction efficiency.
Description
Technical field
The present invention relates to the technical fields of light field regulation, and in particular to a kind of light field modulated structure based on birefringent material
Design method.
Background technique
Diffraction optical element is a kind of phase modulator, it mainly realizes phase by adjusting the height of wherein structure
Position modulation.And step height therein is to be designed to obtain according to target light field computation by computer, then passes through photoetching
Technology is prepared.Diffraction optical element can be used to realize holographic imaging, the functions such as focusing and light beam segmentation.It has very much
Function not available for traditional optical elements, such as minimize, it is integrated etc..
In traditional design of diffractive optical element, it may be implemented for the light of Single wavelength to be imaged at different positions, or
The light of the multiple wavelength of person is imaged at the same position.But when incident wavelength be it is fixed, then obtained phase-modulation
It is single, that is to say, that can only be in fixed position at individual picture.This imaging mode and phase modulation method are excessively
Simply, it is difficult to meet the requirement of some special applications.In light of this situation, researchers have done a series of work and have spread out to optimize
The design of optical element is penetrated, so that a variety of amount of phase modulation can be obtained when single wavelength.Therefore Polarization Modulation quilt
It is introduced into the design of diffraction optical element.In nineteen ninety-five, Xu et al. devises a kind of structure, realizes two different phases
Modulation voltage and both horizontally and vertically upper different picture is obtained simultaneously, but its diffraction efficiency is very low.1997,
Nieuborg et al. has reported a kind of diffraction element obtained using index matching material design, improves its diffraction efficiency,
But include a variety of micro-structures in system, structure is extremely complex, and corrects error and be difficult to solve.
2002, Yu et al. was designed and is prepared for a kind of compound diffraction element of phase polarization, wherein containing a peacekeeping
Two-dimensional sub-wavelength period structure, but be wherein the structure of two steps, efficiency is lower.In 2004, Mark et al. was reported
A kind of two-dimensional phase selection type diffraction element, wherein contain any number of phase step numbers.This method greatly improves
Diffraction efficiency.It however, its structure is extremely complex, and include periodic fold in each unit in structure, therefore
It is very difficult to guarantee the precision of its etching depth, strong influence is caused to its imaging arrangement.With the development of structural material,
In 2006, Wen et al. adjusted the polarization state of light with chiral material, and wavelength single in this way can obtain not at same position
Picture.But the size of pixel only has several hundred nanometers, this structure can only be prepared with direct electronic beam writing technology, cost of manufacture
Height, low efficiency.
Therefore, it is simple how to design a kind of structure, preparation is convenient, and the high structure of diffraction efficiency becomes anxious to be resolved
Problem.
Summary of the invention
The invention solves technical problems are as follows: overcomes the deficiencies of the prior art and provide a kind of light based on birefringent material
Field modulated structure design method, the structure of design is simple, and preparation is convenient, and diffraction efficiency is high.
The technical solution adopted by the present invention are as follows: a kind of light field modulated structure design method based on birefringent material, the party
The design process of method includes following steps:
Step (1) obtains target optical field distribution；
Target optical field distribution is carried out respectively two phase distribution Φ 1 and Φ 2 by step (2)；
Step (3) selects a kind of birefringent material, and the refractive index to o light and e light is respectively neAnd no；
Entire design section is divided into (N, N) a pixel by step (4)；
Step (5) selects (m, n) a pixel, wherein 1≤m≤N, 1≤n≤N, obtain the picture in two phase distributions
The phase value Φ 1 (m, n) and Φ 2 (m, n) of vegetarian refreshments；
Step (6) calculates the elemental height value h1 (m, n) for obtaining the point according to the phase value Φ 1 (m, n) of the point；
Step (7) applies a high modulation amount Δ h (m, n) on h1 (m, n), and the height obtained at this time is h1'(m,
n)；
Step (8) utilizes h1'(m, n), the amount of phase modulation of its corresponding o light and e light is calculated, two phases are obtained
Modulation voltage is Φ1' (m, n) and Φ2'(m,n)；
Step (9) is by Φ1' (m, n) and Φ2' (m, n) respectively with target phase modulation voltage Φ1(m, n) and Φ2(m, n) phase
Compare and take absolute difference, obtains equivalent phase modulation voltage difference ΔΦ1' (m, n) and ΔΦ2'(m,n)；
Step (10) calculates ΔΦ1' (m, n) and ΔΦ2' (m, n) root-mean-square value RMS (m, n)；
Step (11) changes high modulation amount Δ h (m, n), repeats (7)-(10) step, until obtain the smallest RMS (m,
n)；
Step (12) selection h1'(m, n at this time) it is height value at the pixel；
Step (13) selects next pixel, repeats (5)-(12) step, obtains corresponding at all pixels point (N, N)
Height value；
Step (14) design is completed.
Wherein, in step (4), the size of each pixel is determined by the minimum feature size that can actually process, and is led to
It often can be several microns.
Wherein, in step (7) and step (11), the size of selected high modulation amount Δ h1 (m, n) need to be in reality
It is selected in machinable processing range.
Wherein, in step (9), so-called equivalent phase difference refers to the value carried out phase difference after 2 π foldings；
The beneficial effects of the present invention are: the regulation of target light field polarization state and amplitude is realized using this method, is not needed
Complicated optical path, and the out of phase modulation to incident light can be realized with a chip architecture to realize the target polarization of light field
State and distribution of amplitudes, while diffraction efficiency is high.Phase plate production in this method is simple, can be made by traditional processing technology
It obtains.This method there is sensibility can generate different light fields when incident light polarization state difference incident light polarization state.
Detailed description of the invention
Fig. 1 is specific design process flow chart in the embodiment of the present invention；
Fig. 2 is target optical field distribution schematic diagram in the embodiment of the present invention；
When Fig. 3 is that incident light direction and x-axis angle are 0 ° in the embodiment of the present invention, it should the optical field distribution of acquisition；
When Fig. 4 is that incident light direction and x-axis angle are 90 ° in the embodiment of the present invention, it should the optical field distribution of acquisition；
Fig. 5 is that target light field is divided phase distribution 1 obtained described in step 2 in the embodiment of the present invention；
Fig. 6 is that target light field is divided phase distribution 2 obtained described in step 2 in the embodiment of the present invention；
Fig. 7 is the distribution of height described in step 13 in the embodiment of the present invention.
Specific embodiment
With reference to the accompanying drawing and the present invention is discussed in detail in specific embodiment.But embodiment below is only limitted to explain this hair
Bright, protection scope of the present invention should include the full content of claim, and pass through following embodiment, those skilled in the art
The full content of the claims in the present invention can be thus achieved.
A kind of light field modulated structure design method based on birefringent material in specific embodiment, as shown in Figure 1.This method
Specific step is as follows:
Step (1) the design process flow chart as shown in Figure 1, firstly, obtain target optical field distribution, wavelength 632nm, at
Image distance is from for 0.7m.In the optical field distribution, when incident light polarization direction and x-axis angle are 45 °, optical output field is one uniformly point
The circle of cloth, as shown in Fig. 2, when incident light polarization direction and x-axis angle are 0 °, it should the optical field distribution of acquisition such as Fig. 3 institute
Show, when incident light polarization direction and x-axis angle are 90 °, it should the optical field distribution of acquisition such as Fig. 4；
Above-mentioned target light field is split by step (2), obtains two corresponding phase distributions, as shown in Figure 5 and Figure 6；
Step (3) selects birefringent material Yttrium Orthovanadate, and refractive index no and ne to o light and e light are respectively 1.9929 Hes
2.2154；
Entire design section is divided into (1024,1024) a pixel by step (4)；Each pixel size is 8 μm；
Step (5) selects first pixel, and corresponding amount of phase modulation is Φ in phase distribution one at this time1=1.0824
π, corresponding amount of phase modulation is Φ 2=1.7176 π in phase distribution two；
Step (6) first against o light for, using its refractive index 1.9929, can be calculated corresponding optical height h1For
345.5nm；
Step (7) is h1In addition amount of phase modulation Δ h, Δ h=0.02 × n, wherein n is selection number, but needs to guarantee
Δ h range is selected between (0~5) μm at interval of 0.02 μm, and h is obtained1'；
Step (8) is to each h1', calculate separately amount of phase modulation Φ 1'=1.0624 π and the Φ 2' of corresponding o light and e light
=1.7487；
Step (9), which calculates, obtains Φ1' and Φ2' and notional phase modulation voltage Φ1And Φ2Difference, and carry out 2 π foldings,
Obtain equivalent phase difference ΔΦ1' and ΔΦ2'；
Step (10) calculates ΔΦ1' and ΔΦ2' root-mean-square value RMS；
Step (11) repeats step (7)-(10), and obtaining the smallest RMS value is 0.0368, using Δ h value at this time as most
Final value, Δ h value at this time are 630.5nm；
Step (12) the selection h1' at this time height value at pixel thus, its height is 976nm at this time；
Step (13) selects second pixel point, repeats step (4)-(8), finishes, obtains until (N, N) a pixel calculates
The height value of all pixels point is obtained, the height in entire design section is distributed as shown in fig. 7, height peak therein is at this time
2.657μm；
Step (14) design is completed.
Claims (4)
1. a kind of light field modulated structure design method based on birefringent material, it is characterised in that: the design process packet of this method
Containing following steps:
Step (1) obtains target optical field distribution；
Target optical field distribution is carried out respectively two phase distribution Φ 1 and Φ 2 by step (2)；
Step (3) selects a kind of birefringent material, and the refractive index to o light and e light is respectively neAnd no；
Entire design section is divided into (N, N) a pixel by step (4)；
Step (5) selects (m, n) a pixel, wherein 1≤m≤N, 1≤n≤N, obtain the pixel in two phase distributions
Phase value Φ 1 (m, n) and Φ 2 (m, n)；
Step (6) calculates the elemental height value h1 (m, n) for obtaining the point according to the phase value Φ 1 (m, n) of the point；
Step (7) applies a high modulation amount Δ h (m, n) on h1 (m, n), and the height obtained at this time is h1'(m, n)；
Step (8) utilizes h1'(m, n), the amount of phase modulation of its corresponding o light and e light is calculated, two phase-modulations are obtained
Amount is Φ1' (m, n) and Φ2'(m,n)；
Step (9) is by Φ1' (m, n) and Φ2' (m, n) respectively with target phase modulation voltage Φ1(m, n) and Φ2(m, n), which compares, to be taken
Absolute difference obtains equivalent phase modulation voltage difference ΔΦ1' (m, n) and ΔΦ2'(m,n)；
Step (10) calculates ΔΦ1' (m, n) and ΔΦ2' (m, n) root-mean-square value RMS (m, n)；
Step (11) changes high modulation amount Δ h (m, n), repeats step (7)-(10), until obtaining the smallest RMS (m, n)；
Step (12) selection h1'(m, n at this time) it is height value at the pixel；
Step (13) selects next pixel, repeats (5)-(12) step, obtains corresponding height at all pixels point (N, N)
Value；
Step (14) design is completed.
2. a kind of light field modulated structure design method based on birefringent material according to claim 1, it is characterised in that:
In step (4), the size of each pixel is determined by the minimum feature size that can actually process.
3. a kind of light field modulated structure design method based on birefringent material according to claim 1, it is characterised in that:
In step (7) and step (11), the size of selected high modulation amount Δ h (m, n) need to be in practical machinable technique model
Enclose interior select.
4. a kind of light field modulated structure design method based on birefringent material according to claim 1, it is characterised in that:
In step (9), so-called equivalent phase modulation voltage difference refers to the value carried out phase difference after 2 π foldings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710227825.0A CN106842563B (en) | 2017-04-10 | 2017-04-10 | Optical field modulation structure design method based on birefringent material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710227825.0A CN106842563B (en) | 2017-04-10 | 2017-04-10 | Optical field modulation structure design method based on birefringent material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106842563A CN106842563A (en) | 2017-06-13 |
| CN106842563B true CN106842563B (en) | 2019-03-05 |
Family
ID=59146526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710227825.0A Active CN106842563B (en) | 2017-04-10 | 2017-04-10 | Optical field modulation structure design method based on birefringent material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106842563B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111007664A (en) * | 2019-12-18 | 2020-04-14 | 中国科学院光电技术研究所 | Design method of diffractive optical element with high diffraction efficiency and low speckle noise |
| CN111240009B (en) * | 2019-12-31 | 2020-12-29 | 嘉兴驭光光电科技有限公司 | Diffractive optical element capable of projecting oblique lines, projection device and design method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101211090A (en) * | 2007-12-21 | 2008-07-02 | 清华大学 | Phase modulation -type analog to digital converter |
| CN102147539A (en) * | 2011-03-30 | 2011-08-10 | 中山大学 | Method for generating one-dimensional periodic structure light field based on pure-phase type liquid crystal spatial light modulator |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010050815A1 (en) * | 2000-04-28 | 2001-12-13 | Jun Ishihara | Light separation device, blazed grating device, diffraction grating device, and illumination optical system |
| US7764415B2 (en) * | 2008-04-18 | 2010-07-27 | Buican Tudor N | High retardation-amplitude photoelastic modulator |
-
2017
- 2017-04-10 CN CN201710227825.0A patent/CN106842563B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101211090A (en) * | 2007-12-21 | 2008-07-02 | 清华大学 | Phase modulation -type analog to digital converter |
| CN102147539A (en) * | 2011-03-30 | 2011-08-10 | 中山大学 | Method for generating one-dimensional periodic structure light field based on pure-phase type liquid crystal spatial light modulator |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106842563A (en) | 2017-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107014312B (en) | A kind of integral calibrating method of mirror-vibrating line laser structured light three-dimension measuring system | |
| CN106842563B (en) | Optical field modulation structure design method based on birefringent material | |
| Cross et al. | The VISTA science archive | |
| CN104457614B (en) | Streak reflex method for three-dimensional measurement based on binary system striped defocus | |
| CN107270810B (en) | The projector calibrating method and device of multi-faceted projection | |
| CN105451012B (en) | 3-D imaging system and three-D imaging method | |
| CN105067011A (en) | Overall measurement system calibration method based on vision calibration and coordinate transformation | |
| CN106644105B (en) | Wavefront sensor, detection method and system based on double helix point spread function | |
| McNeil et al. | Counter-dispersed slitless-spectroscopy technique: planetary nebula velocities in the halo of NGC 1399 | |
| CN110411981A (en) | A kind of phase imaging method based on TIE, device and readable storage medium storing program for executing | |
| CN109341720A (en) | A kind of remote sensing camera geometric calibration method based on fixed star track | |
| CN103544710A (en) | Image registration method | |
| CN109003312A (en) | A kind of camera calibration method based on nonlinear optimization | |
| Sun et al. | Deep coupling of star tracker and MEMS-gyro data under highly dynamic and long exposure conditions | |
| CN102853851B (en) | The imaging system of computer simulation star sensor stellar field and formation method | |
| CN109900355A (en) | Imaging method and device | |
| WO2018102147A1 (en) | System and method for estimating and compensating for sample drift during data acquisition in fluorescence microscopy | |
| CN107192337A (en) | The method for measuring micro-displacement using CCD based on Slit Diffraction | |
| CN111366149B (en) | Method for extracting sun vector direction based on lunar phase | |
| Liu et al. | Compact chromatic confocal sensor for displacement and thickness measurements | |
| CN105763332B (en) | A method of the wavefront feedback control based on multipoint function simulation | |
| Xiaofei et al. | Three-dimensional reconstruction based on tri-frequency heterodyne principle | |
| CN107300419B (en) | A kind of Method of Adjustment and assembling ＆ adjusting system of spectrometer | |
| CN105469085B (en) | Board card image acquisition method and system | |
| Lim et al. | Low-resolution lidar upsampling using weighted median filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |