CN106773337A - A kind of smooth orientation equipment and light alignment method - Google Patents
A kind of smooth orientation equipment and light alignment method Download PDFInfo
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- CN106773337A CN106773337A CN201710017740.XA CN201710017740A CN106773337A CN 106773337 A CN106773337 A CN 106773337A CN 201710017740 A CN201710017740 A CN 201710017740A CN 106773337 A CN106773337 A CN 106773337A
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- orientation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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Abstract
The present invention relates to display technology field, a kind of smooth orientation equipment and light alignment method are disclosed.The substrate includes multiple orientation regions, to each orientation region independence orientation, is sequentially completed the orientation in all orientation regions.The width of one side in the orientation region is not more than the length of polarizer, and because the size in each orientation region is smaller, the light source of small size being capable of completion orientation in orientation region described in uniform irradiation.And when orientation is carried out to an orientation region, stop that light irradiates other orientation regions in addition to the orientation region by shutter, other orientation regions are made not irradiated by uneven light, avoid the occurrence of uneven irradiation and cause the uneven problem of orientation region orientation, so as to ensure that the orientation of all orientation regions is uniform.When technical scheme is applied in the manufacturing process of display device, display quality is ensure that.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of smooth orientation equipment and light alignment method.
Background technology
Liquid crystal display (TFT-LCD) technology by nearest decades development, technology and technique reach its maturity.Take
For cold cloudy diode (CCFL) display, the main product as display field.In the production process of LCD, in order that liquid crystal point
Son can normally orientation, it is necessary to array base palte and color membrane substrates surface apply last layer alignment films, realize to liquid crystal molecule
Orientation.
The technology of current light orientation is ripe to be applied on the substrate manufacture of small generation line, due to the base of small generation line
Board size is smaller, and the current of corresponding linear light sorurce can be uniform that orientation is orientated with the alignment films on whole substrate of uniform irradiation
Film line.
But, because the substrate size of advanced lines line is larger, it is necessary to larger sized light source.But current linear light sorurce
Designing technique, once the size of light source increases larger, the uniformity of its irradiation will be greatly lowered, and irradiate uniformity is light orientation
It is uniform crucial, once the uneven serious problems that will bring display of orientation.This is also that current advanced lines line is not introduced into always
The main cause of light orientation.
The content of the invention
The present invention provides a kind of smooth orientation equipment and light alignment method, and the alignment films for being used to solve advanced lines line cannot be realized
The problem of light orientation.
In order to solve the above technical problems, a kind of smooth orientation equipment is provided in the embodiment of the present invention, for the light on substrate
Alignment film carries out orientation, and the smooth orientation equipment includes workbench and light source assembly, and the substrate is positioned over the work and puts down
On the surface of the direction light source assembly of platform；The light source assembly includes light source and is arranged on the inclined of the light emission side of the light source
Shake piece, and the light that the light source sends includes by forming equally distributed linearly polarized photon, the substrate after the polarizer
At least two orientation regions, the width of a side in the orientation region is not more than the length of the irradiation area of the linearly polarized photon
Degree；
The smooth orientation equipment also includes：
Adjustment mechanism, for changing the position relationship between the substrate and light source assembly, matches somebody with somebody all of the substrate
Position to region successively with the light source assembly is corresponding, so that the light alignment film in all orientation regions is linearly polarized light successively
Irradiation completes orientation；
Shutter, for when the light source assembly and an orientation region position to it is corresponding when stop light irradiation except described
Other orientation regions outside one orientation region.
A kind of utilization light orientation equipment as described above is also provided in the embodiment of the present invention to enter the light alignment film on substrate
The method of row light orientation, including：
A light source assembly is provided, the light of the light source assembly outgoing is linearly polarized photon；
The substrate is positioned on the surface of workbench；
Using light alignment film described in the linear polarization light irradiation, orientation, the substrate are carried out with to the smooth alignment film
Including at least two orientation regions, the width of a side in the orientation region is not more than the length of the polarizer；
Using light alignment film described in the linear polarization light irradiation, bag the step of to carry out orientation to the smooth alignment film
Include：
It is step S1, an orientation region of the substrate is corresponding with the position of the light source assembly, and using shutter resistance
Be in the light other orientation regions of irradiation in addition to the orientation region, and then the light alignment film to the orientation region enters
Row orientation；
Position relationship between step S2, the change substrate and light source assembly, makes another orientation region of the substrate
Position with the light source assembly is corresponding, and mobile shutter, stops that light irradiation removes another orientation area using shutter
Other orientation regions outside domain, then the light alignment film to another orientation region carry out orientation；
Step S3, repeat step S2, complete the orientation to the light alignment film in all orientation regions.
Above-mentioned technical proposal of the invention has the beneficial effect that：
In above-mentioned technical proposal, multiple orientation regions are divided into by by substrate, to each orientation region independence orientation, successively
Complete the orientation in all orientation regions.Because the size in each orientation region is smaller, the light source of small size being capable of uniform irradiation institute
State orientation region and complete orientation.And when orientation is carried out to an orientation region, stop that light irradiates by shutter and remove described one
Other orientation regions outside orientation region, make other orientation regions not irradiated by uneven light, it is to avoid to occur uneven
Irradiation causes the uneven problem of orientation region orientation, so as to ensure that the orientation of all orientation regions is uniform.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
The accompanying drawing to be used needed for having technology description is briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
Other accompanying drawings are obtained with according to these accompanying drawings.
Fig. 1 represents the structural representation one of orientation equipment in the embodiment of the present invention；
Fig. 2 represents the top view one of workbench in Fig. 1；
Fig. 3 represents the front view of Fig. 1；
Fig. 4 represents the top view two of the workbench in the embodiment of the present invention；
Fig. 5 represents the structural representation two of orientation equipment in the embodiment of the present invention；
Fig. 6 represents the top view three of workbench in Fig. 5；
Fig. 7 represents the front view of Fig. 5；
Fig. 8 represents the top view four of the workbench in the embodiment of the present invention.
Specific embodiment
In technical field of liquid crystal display, orientation, alignment film pair are carried out to liquid crystal by forming orientation groove on alignment film
The quality of LCD alignment plays key effect to display quality.In the prior art, can be by means such as mechanical friction, light orientations
Orientation groove is formed on the surface of alignment film.Light orientation is easier control liquid crystal point because that will not produce electrostatic and particle contamination
The orientation of son and orientation area, are increasingly widely applied.
Light alignment technique is radiated on light alignment film using linear light sorurce so that light alignment film has orientation ability, its
In, light alignment film is obtained by the high molecular polymer with emulsion.General light alignment film can be divided into three major types：The first kind is
After light alignment film is irradiated by linear light sorurce, the molecule parallel with polarization of light direction can be bonded the molecule of growth key, match somebody with somebody light
There is anisotropic distribution to film, liquid crystal molecule is just arranged along key molecular orientation long；Equations of The Second Kind is light alignment film by linear light
After the irradiation of source, the long key molecule parallel with linear light sorurce polarization direction can be destroyed by ultraviolet light, produce light alignment film non-etc.
To distribution, liquid crystal molecule will be along not destroyed key molecular orientation long arrangement.3rd class is using containing azo molecules
Light alignment film, after being irradiated by linear light sorurce, there is photo-isomerisable in the molecule parallel with polarization of light direction, make light alignment film
Anisotropic distribution is produced, orientation is carried out to liquid crystal molecule.
In light process of alignment, only light alignment film is linearly polarized light uniform irradiation, can ensure the uniform of orientation
Property.By linear light sorurce, technology is limited in itself, and the size of linear light sorurce is smaller, it is impossible to suitable for the aobvious of large-sized advanced lines line
Show the manufacture of substrate.
In order to solve the above-mentioned technical problem, the present invention provides a kind of smooth orientation equipment and light alignment method, by advanced lines line
Substrate be divided at least two orientation regions, each orientation region can be linearly polarized light uniform irradiation, and using it is linear partially
The light that shakes carries out orientation at least two orientations region successively, and when orientation is carried out to one of orientation region,
Stop that light irradiates other orientation regions using shutter, it is ensured that each orientation region is illuminated uniformly, and makes each orientation region
Orientation it is uniform, it is ensured that display quality.
Below in conjunction with drawings and Examples, specific embodiment of the invention is described in further detail.Following reality
Example is applied for illustrating the present invention, but is not limited to the scope of the present invention.
Embodiment one
With reference to shown in Fig. 1-Fig. 3, the present embodiment provides a kind of smooth orientation equipment, for the light alignment film on substrate 100
Carry out orientation.The smooth orientation equipment includes workbench 1 and light source assembly 2, and substrate 100 is positioned over the direction of workbench 1
On the surface of light source assembly 2.Light source assembly 2 includes light source 3 and is arranged on the polarizer 4 of the light emission side of light source 3, and light source 3 sends
Light by forming equally distributed linearly polarized photon after polarizer 4, the linearly polarized photon is used for irradiation light alignment film, with
Orientation is carried out to light alignment film.Wherein, light source 3 can be area source, uniform in light emission.And polarizer 4 is being arranged on light source 3 just
Lower section, because the light distribution of the underface of light source 3 is most uniform, using the teaching of the invention it is possible to provide uniform linearly polarized photon, to light alignment film
Orientation is uniform, it is ensured that orientation quality.
Substrate 100 includes at least two orientation regions 200, and each orientation region includes that at least one is used to form display base
The graphics field 300 of plate, the orientation quality of the alignment film in graphics field 300, determines matching somebody with somebody for corresponding display base plate
To quality.That is, as long as ensureing that the orientation of the alignment film in graphics field 300 is uniform, you can ensure display quality.
Wherein, the width of a side in orientation region 200 is not more than the length of the irradiation area of linearly polarized photon, due to every
The size in one orientation region 200 enables linearly polarized photon uniform irradiation orientation region 200 less than the size of polarizer 4, it is ensured that
Light alignment film orientation positioned at each orientation region 200 is uniform.It should be noted that the irradiation area of the linearly polarized photon
Uniform light is distributed, and can ensure orientation uniformity.
In order to complete the orientation of the light alignment film to all orientation regions 200, setting the smooth orientation equipment also includes：
Adjustment mechanism, for changing the position relationship between substrate 100 and light source assembly 2, makes all orientations of substrate 100
Position of the region 200 successively with light source assembly 2 is corresponding, so that the light alignment film in all orientation regions 200 is linearly polarized successively
Light uniform irradiation completes orientation；
Shutter 5, for when light source assembly 2 and an orientation region 200 position to it is corresponding when stop light irradiation except described
Other orientation regions 200 outside one orientation region 200, make other orientation regions not irradiated by light, it is to avoid because uneven
The orientation problem of non-uniform that irradiation is caused.And the orientation region 200 corresponding with the position of light source assembly 2 can be by linear inclined
Shake light uniform irradiation.
Above-mentioned technical proposal is divided into multiple orientation regions by by substrate, complete successively to each orientation region independence orientation
Into the orientation in all orientation regions.Because the size in each orientation region is smaller, the light source of small size can be described in uniform irradiation
Orientation region completes orientation.And when orientation is carried out to an orientation region, stop that light is irradiated except described one matches somebody with somebody by shutter
To other orientation regions outside region, other orientation regions are made not irradiated by uneven light, it is to avoid uneven photograph occur
The problem for causing the orientation of orientation region uneven is penetrated, so as to ensure that the orientation of all orientation regions is uniform.
It should be noted that the orientation in the present embodiment to orientation region refers to that the light alignment film for being pointed to orientation region enters
Row orientation.
The adjustment mechanism can be realized by mechanical structures such as mechanical arm, rotatable parts, slide units, do not done herein
Limit, as long as above-mentioned functions can be realized.
Because mobile light source assembly 2 easily influences being uniformly distributed for linearly polarized photon, therefore, light source assembly in the present embodiment
2 are fixedly installed, and the adjustment mechanism is connected with workbench 1, and substrate 100 and light are changed for driving workbench 1 to move
Position relationship between source component 2.Specifically, complete an orientation region 200 with backward, the adjustment mechanism driving work
Platform 1 is moved, and makes another orientation region 200 corresponding with the position of light source assembly 2, another described in linearly polarized photon uniform irradiation to match somebody with somebody
Orientation is carried out to region 200, and stops that other of light irradiation in addition to another orientation region 200 are matched somebody with somebody using shutter 5
To region.Repeat the above steps, complete the orientation in all orientation regions 200.
Further, so that light source 3 is as strip source as an example, the process of alignment to each orientation region 200 is specially：
The position of shutter 5 is adjusted first, is used to stop its in addition to the orientation region 200 for treating orientation of light irradiation
Its orientation region, controls a side in the orientation region 200 corresponding with the position of light source assembly 2 afterwards, then controls work
Make platform 1 to be moved (as shown in the straight line with arrow in Fig. 1) along the direction perpendicular to the side, linearly polarized photon is passed through line
Property scanning the mode orientation that completes to whole orientation region 200, polarization direction and the strip source 3 of the linearly polarized photon
Bearing of trend is consistent.
Then, the smooth orientation equipment also includes：
Scan driving mechanism；
Control unit, is connected with the adjustment mechanism and scan driving mechanism, for controlling the adjustment mechanism to drive work
Make platform 1 to move, make a side in an orientation region 200 corresponding with the position of light source assembly 2, then control the turntable driving
Mechanism drives workbench 1 to be moved along the direction perpendicular to the side, makes linearly polarized photon complete by way of linear scan
The orientation in whole orientation region 200 in pairs, the polarization direction of the linearly polarized photon is consistent with the bearing of trend of strip source 3.
In one orientation region 200 of completion with backward, controlling the adjustment mechanism to drive workbench 1 to move, make another
Treat that the orientation region 200 of orientation is corresponding with the position of light source assembly 2.In order to drive workbench 1 to move in the adjustment mechanism
During, uneven light irradiation orientation region 200 is prevented, the adjustment mechanism is set and is additionally operable to whole workbench 1
It is moved to the region beyond the irradiation area of linearly polarized photon.Specially：It is described in one orientation region 200 of completion with backward
Whole workbench 1 is moved to the region beyond the irradiation area of linearly polarized photon by adjustment mechanism first；Then work is driven
Platform 1 is moved, and changes the position relationship become between substrate 100 and light source assembly 2；Workbench 1 is moved back to linearly again finally
The irradiation area of polarised light, makes another orientation region 200 corresponding with the position of light source assembly 2, linearly polarized photon uniform irradiation institute
Stating another orientation region 200 carries out orientation, and stops light irradiation in addition to another orientation region 200 using shutter 5
Other orientation regions.Repeat the above steps, complete the orientation in all orientation regions 200.
Specifically, the adjustment mechanism can be also used for moving back to workbench 1 irradiation area of linearly polarized photon, and
Positioned light source component 2 and workbench 1, make the orientation region for treating orientation corresponding with the position of light source assembly 2.Can certainly set
Independent detent mechanism is put to realize above-mentioned functions, can realize the detent mechanism of above-mentioned functions structure type have a lot,
This will not enumerate.
After the orientation for completing an orientation region 200, it is necessary to adjust before orientation is carried out to another orientation region 200
The position of whole shutter 5, is used to stop other the orientation regions of light irradiation in addition to another orientation region 200.In order to
Above-mentioned purpose is realized, shutter 5 can be arranged in parallel with workbench 1 for placing the surface of substrate 100, with reference to Fig. 1-figure
Shown in 4, it is also possible to be vertically arranged for placing the surface of substrate 100 with workbench 1, with reference to shown in Fig. 5-Fig. 7, or and work
Make platform for placing the setting in a certain angle of the surface of substrate, as long as can stop that light irradiates other orientation regions i.e.
Can.
There are many kinds as the mode of the position of adjustment shutter 5, by slide rail and the combination knot of sliding block in the present embodiment
Structure adjusts the position of shutter 5, and referring to shown in Fig. 2, Fig. 4, Fig. 6 and Fig. 8, concrete structure is：
Slide rail 6 is set on workbench 1；
The sliding block 7 on slide rail 6 is slidably arranged in, sliding block 7 can be slided along slide rail 6, and shutter 5 is fixed on sliding block 7, sliding block
7 slip on slide rail 6 drives shutter 5 to move, so as to adjust the position of shutter 5.
Said structure can set number and the position of slide rail 6 according to the distribution mode in orientation region 200, to realize
Shutter 5 stops that light irradiates orientation region 200 not corresponding with the position of light source assembly 2 successively.For example：Referring to Fig. 6 and Fig. 7 institutes
Show, gone together when at least two orientation region 200 of substrate 100 and set, when in same a line, can be set on workbench 1
Two slide rails 6 are put, two slide rails 6 are located at the opposite sides of substrate 100, i.e. wherein one slide rail 6 is located at the side of substrate 100,
Another slide rail 6 is located at relative opposite side, and the bearing of trend of slide rail 6 is parallel with line direction.Sliding block 7 is list structure, one end
It is slidably arranged on wherein one slide rail, the other end is slidably arranged on another slide rail.Shutter 5 is fixed on sliding block 7, sliding
Block 7 drives the synchronizing moving of shutter 5 on slide rail 6 along the slip on line direction, with stop light irradiation not with light source assembly 2
Put corresponding orientation region 200.
The number of shutter 5 is set according to the number and distribution mode in orientation region 200.Include two with substrate 100
Go together as a example by the orientation region 200 of distribution, a shutter 5 can be only set, it is possible to meet demand, with reference to Fig. 2 and Fig. 6 institutes
Show.And when substrate 100 includes the orientation region 200 of at least three colleague's distributions, it is necessary at least provided with two shutters 5, knot
Close shown in Fig. 4 and Fig. 8.
It is understood that introduce line direction and be for only for ease of description and understand, without other restriction effects.
When distribution is not gone together in the orientation region 200 of substrate 100, for example：In matrix distribution, can be in the base of said structure
On plinth, sliding block 7 is replaced with into slide rail, so that shutter 5 can also be moved up in the side perpendicular to line direction.
Slip of the shutter 5 on slide rail 6 can be specifically controlled by way of electrical control, so as to adjust shutter
5 position.
Certainly, realize that the structure of the position of adjustment shutter 5 is not limited to the combining structure form of slide rail and sliding block,
This will not enumerate.
In the present embodiment, the light source 3 of light source assembly 2 uses the form fit of strip source, polarizer 4 and strip source 3,
And size is consistent, is correspondingly arranged at the light emission side of strip source 3, the linearly polarized photon that irradiation area is bar shaped is formed, by line
Property scanning mode complete the orientation in an orientation region 200.Based on this, can be by 100 points of matching somebody with somebody for multiple colleague's settings of substrate
To region 200, wherein, length of each orientation region 200 length in the row direction less than no more than polarizer 4.Work as substrate
100 points be two orientation regions 200 when, a shutter 5 can be only set, with reference to shown in Fig. 2 and Fig. 6.When 100 points of substrate be to
During few three orientation regions, at least provided with two shutters 5, with reference to shown in Fig. 4 and Fig. 8.
In a specific embodiment, with reference to shown in Fig. 1-Fig. 3, the light source 3 of light source assembly 2 is strip source, partially
Shake piece 4 polarization direction it is consistent with the bearing of trend of strip source 3.Shutter 5 be arranged in parallel with substrate 100.100 points of substrate is
Two orientation regions 200, set two slide rails 6 on workbench 1, and two slide rails 6 are located at the opposite sides of substrate 100, i.e.
Wherein one slide rail 6 is located at the side of substrate 100, and another slide rail 6 is located at relative opposite side, the bearing of trend of slide rail 6 with
Line direction is parallel.The side of shutter 5 is slidably arranged on wherein one slide rail 6 by sliding block, and relative opposite side is by sliding
Block is slidably arranged on another slide rail 6.
The process of alignment of the alignment film on substrate 100 is：
Original state is：Whole substrate 100 is not positioned at the irradiation area of light source assembly 2.
First, shutter 5 is slided, makes it corresponding with the position in an orientation region 200, one of orientation region
200 substrate 100 orthographic projection in the plane fall completely within shutter 5 in substrate 100 in orthographic projection in the plane；
Afterwards, control the adjustment mechanism to drive workbench 1 to rotate 180 °, make a side in another orientation region 200
Position with light source assembly 2 is corresponding；
Then, control the scan driving mechanism to drive workbench 1 to be moved along the direction perpendicular to the side, make line
Property the polarised light orientation that is completed by way of linear scan to whole another orientation region 200.
Repeat the above steps, the orientation in the orientation region 200 is completed, so as to complete to matching somebody with somebody on whole substrate 100
To the uniform orientation of film.
In another particular embodiment of the invention, with reference to shown in Fig. 5-Fig. 7, and unlike above-mentioned specific embodiment,
Shutter 5 is vertically arranged with substrate 100, and sets the sliding block 7 of a strip, and one end of sliding block 7 is slidably arranged in wherein one cunning
On rail 6, the other end is slidably arranged on another slide rail 6, i.e., sliding block 7 is vertically arranged with slide rail 6.Shutter 5 is fixed on sliding block 7
On.Realize stopping the purpose of light by the way that shutter 5 is moved between two orientation regions.
In the implementation method, in one orientation region 200 of completion with backward, it is only necessary to rotation work platform 1, make another orientation
One side in region 200 is corresponding with the position of light source assembly 2, the position without adjusting shutter 5.
Mobile working platform 1 realizes two orientation regions by way of rotating in above-mentioned two specific embodiment
200 position successively with light source assembly 2 is corresponding.After area rotation workbench 1 beyond the irradiation area of light source assembly 2,
The adjustment mechanism is additionally operable to positioned light source component 2 and substrate 100, and orientation region 200 and the light source assembly 2 of orientation are treated in realization
Position correspondence.
In actual application, Reasonable adjustment can also be done to the structure of orientation equipment, for example：Conventional techniques
Replace, increase known technical characteristic, it belongs to protection scope of the present invention.
Embodiment two
Based on same inventive concept, the light orientation equipment in a kind of utilization embodiment one is provided in the present embodiment on substrate
The light alignment film method that carries out light orientation, including：
A light source assembly is provided, the light of the light source assembly outgoing is linearly polarized photon；
The substrate is positioned on the surface of workbench；
Using light alignment film described in the linear polarization light irradiation, orientation is carried out with to the smooth alignment film.
Wherein, the substrate includes at least two orientation regions, and the width of a side in the orientation region is not more than institute
State the length of polarizer；
Using light alignment film described in the linear polarization light irradiation, bag the step of to carry out orientation to the smooth alignment film
Include：
It is step S1, an orientation region of the substrate is corresponding with the position of the light source assembly, and using shutter resistance
Be in the light other orientation regions of irradiation in addition to the orientation region, and then the light alignment film to the orientation region enters
Row orientation；
Position relationship between step S2, the change substrate and light source assembly, makes another orientation region of the substrate
Position with the light source assembly is corresponding, and mobile shutter, stops that light irradiation removes another orientation area using shutter
Other orientation regions outside domain, then the light alignment film to another orientation region carry out orientation；
Step S3, repeat step S2, complete the orientation to the light alignment film in all orientation regions.
Can realize the uniform orientation to alignment film on whole substrate using above-mentioned alignment method, it is ensured that orientation it is uniform
Property, when being applied on display device, it is possible to increase display quality.
In above-mentioned steps S2, it is specifically as follows：
The whole workbench is moved to the region beyond the irradiation area of linearly polarized photon first, it is mobile afterwards to hide
Baffle plate, the shutter stops other orientation regions of light irradiation in addition to another orientation region, then drives described
Workbench is moved, and makes another orientation region corresponding with the position of the light source assembly.
Above-mentioned steps are changing the position relationship between the substrate and light source assembly, make another orientation area of the substrate
Before the step corresponding with the position of the light source assembly of domain, the whole workbench is moved to the irradiation of linearly polarized photon
Region beyond region, and mobile shutter changes occlusion area, prevents from subsequently changing between the substrate and light source assembly
Position relationship during, uneven light irradiation orientation region.
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, on the premise of the technology of the present invention principle is not departed from, some improvement and replacement can also be made, these improve and replace
Also should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of smooth orientation equipment, for carrying out orientation to the light alignment film on substrate, the smooth orientation equipment is flat including work
Platform and light source assembly, the substrate are positioned on the surface of the direction of the workbench light source assembly；The light source group
Part includes light source and is arranged on the polarizer of the light emission side of the light source, and the light that the light source sends is by after the polarizer
Form equally distributed linearly polarized photon, it is characterised in that the substrate includes at least two orientation regions, the orientation region
A side width be not more than linearly polarized photon irradiation area length；
The smooth orientation equipment also includes：
Adjustment mechanism, for changing the position relationship between the substrate and light source assembly, makes all orientation areas of the substrate
Position of the domain successively with the light source assembly is corresponding, so that the light alignment film in all orientation regions is linearly polarized light irradiation successively
Complete orientation；
Shutter, for when the light source assembly and an orientation region position to it is corresponding when stop light irradiation except described one matches somebody with somebody
To other orientation regions outside region.
2. smooth orientation equipment according to claim 1, it is characterised in that the light source assembly is fixedly installed, the adjustment
Mechanism is connected with the workbench, for driving the workbench movement to change between the substrate and light source assembly
Position relationship.
3. smooth orientation equipment according to claim 2, it is characterised in that the adjustment mechanism is additionally operable to the whole work
As platform be moved to the irradiation area of linearly polarized photon beyond region.
4. smooth orientation equipment according to claim 1, it is characterised in that the smooth orientation equipment also includes：
It is arranged on the slide rail on the workbench；
The sliding block on the slide rail is slidably arranged in, the sliding block can be slided along the slide rail, the shutter is fixed on described
On sliding block, slip of the sliding block on the slide rail drives the shutter movement.
5. smooth orientation equipment according to claim 4, it is characterised in that the surface of the shutter and the workbench
It is arranged in parallel.
6. smooth orientation equipment according to claim 4, it is characterised in that the surface of the shutter and the workbench
It is vertically arranged.
7. smooth orientation equipment according to claim 4, it is characterised in that at least two orientation regions colleague of the substrate
Set；
The smooth orientation equipment includes two slide rails, and two slide rails are located at the opposite sides of the substrate, and the slide rail
Bearing of trend it is parallel with line direction；
The sliding block is list structure, and one end is slidably arranged on wherein one slide rail, and the other end is slidably arranged in another cunning
On rail.
8. the light orientation equipment according to claim any one of 2-7, it is characterised in that the light source is strip source, institute
Stating light orientation equipment also includes：
Scan driving mechanism；
Control unit, is connected with the adjustment mechanism and scan driving mechanism, for controlling the adjustment mechanism to drive the work
Make platform movement, make a side in an orientation region corresponding with the position of the light source assembly, then control the turntable driving
Mechanism drives the workbench to be moved along the direction perpendicular to the side, makes linearly polarized photon by way of linear scan
The orientation to whole orientation region is completed, the polarization direction of the linearly polarized photon is consistent with the bearing of trend of strip source.
9. a kind of light orientation equipment using described in claim any one of 1-8 carries out light orientation to the light alignment film on substrate
Method, including：
A light source assembly is provided, the light of the light source assembly outgoing is linearly polarized photon；
The substrate is positioned on the surface of workbench；
Using light alignment film described in the linear polarization light irradiation, orientation is carried out with to the smooth alignment film, it is characterised in that institute
Stating substrate includes at least two orientation regions, and the width of a side in the orientation region is not more than the length of the polarizer；
Include using light alignment film described in the linear polarization light irradiation, the step of to carry out orientation to the smooth alignment film：
It is step S1, an orientation region of the substrate is corresponding with the position of the light source assembly, and stop light using shutter
Line irradiates other orientation regions in addition to the orientation region, and then the light alignment film to the orientation region is matched somebody with somebody
To；
Position relationship between step S2, the change substrate and light source assembly, makes another orientation region of the substrate and institute
State the position correspondence of light source assembly, and mobile shutter, using shutter stop light irradiation except another orientation region it
Other outer orientation regions, then the light alignment film to another orientation region carry out orientation；
Step S3, repeat step S2, complete the orientation to the light alignment film in all orientation regions.
10. smooth alignment method according to claim 9, it is characterised in that in step S2, specially：
The whole workbench is moved to the region beyond the irradiation area of linearly polarized photon first, movement afterwards is blocked
Plate, the shutter stops other orientation regions of light irradiation in addition to another orientation region, then drives the work
Make platform movement, make another orientation region corresponding with the position of the light source assembly.
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| CN110888267A (en) * | 2019-11-26 | 2020-03-17 | Tcl华星光电技术有限公司 | Liquid crystal alignment device and operation method thereof |
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Application publication date: 20170531 |