CN106757034A - A kind of preparation method of alkalinous metal polishing fluid - Google Patents
A kind of preparation method of alkalinous metal polishing fluid Download PDFInfo
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- CN106757034A CN106757034A CN201611064833.XA CN201611064833A CN106757034A CN 106757034 A CN106757034 A CN 106757034A CN 201611064833 A CN201611064833 A CN 201611064833A CN 106757034 A CN106757034 A CN 106757034A
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- Prior art keywords
- preparation
- polishing fluid
- protecting
- metal polishing
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
Abstract
Acid polishing slurry can produce a large amount of harmful exhaust waste water and dregs, pollution environment in the process due to excellent polishability and stability, being widely used in the industry, and because its corrosivity is not suitable for by force very much the fields such as microelectronics.Therefore, a kind of bright alkalescence polishing liquid of this hair, using NaOH with low cost, glossiness is higher than conventional alkaline polishing after not only solving pollution problem, and polishing.
Description
Technical field：
The present invention relates to chemical polishing field, and in particular to a kind of preparation method of alkalinous metal polishing fluid.
Background introduction：
With the development of science and technology, to material finish and the requirement more and more higher of flatness, this is to surface light
Adjusting technique proposes new challenge, while also for the development and application of the technology provide opportunity.Chemical polishing technology is in gold
The aspects such as category finishing, metal sample preparation, control metal surface quality and raising metal surface obtain extremely wide
General application.Chemical polishing is an important procedure in Treatment of Metal Surface, by chemical polishing can obtain it is highly polished,
The good surface of planarization, makes luminous reflectanc, decay resistance and the heat reflection of metal be strengthened, while the metal
The decorative effect of product is improved.
With the development of microelectronic industry, the acid polishing slurry of current large-scale use exposes serious problem, with
The raising of integrated level, acid polishing slurry can not meet the demand of huge size integrated circuit (GLSI) multilayer wiring CMP.This hair
Bright alkalescence polishing liquid has low mechanism, degree of planarization high and the advantage such as asepsis environment-protecting.
The content of the invention：
It is an object of the invention to provide the preparation method of asepsis environment-protecting alkalinous metal polishing fluid.
Concrete scheme of the present invention is as follows：
The sodium hydroxide solution of 40-60% is first prepared at room temperature, adds bright auxiliary agent 1-2wt%, surfactant
0.1-0.5wt%, thickener 2-5wt%, oxidant 5-10wt%, chelating agent 1-2wt%, stirring 20min is obtained at 60 DEG C
Environment-friendly metal polishing fluids of the pH in 9-11；
Acid polishing slurry due to excellent polishability and stability, being widely used in the industry, but in the process
A large amount of harmful exhaust waste water and dregs, pollution environment can be produced, and because its corrosivity is not suitable for by force very much the fields such as microelectronics.Cause
This, a kind of bright alkalescence polishing liquid of this hair, using NaOH with low cost, after not only solving pollution problem, and polishing
Glossiness polishes high than conventional alkaline；
Bright auxiliary agent is using one or more in copper sulphate, PEG-60 rilanit specials and aminomethyl propanol；
Surfactant uses lauryl sodium sulfate, neopelex, sldium lauryl sulfate, glycerol stearate
One or more in monoesters；
Thickener uses saccharin, polyethylene glycol, polysiloxanes, Nipasol and Nano-meter SiO_22In one or more；
Using one or more in hydrogen peroxide, sodium peroxydisulfate, the introducing of oxidant can greatly improve polishing to oxidant
Efficiency, makes metal surface form the oxide-film of densification, and metal surface is protected to a certain extent；
Chelating agent is using one or more in trehalose, Phenoxyethanol and ring five dimethyl silicone polymer.
Specific embodiment：
Embodiment 1
The preparation method of alkalinous metal polishing fluid：PEG-60 rilanit special 20g are added in the 50%NaOH of 500g, is mixed
Glycerol stearate monoesters 0.5g, polyethylene glycol 5g, sodium peroxydisulfate 10g, trehalose 0.5g are added after closing fully, is stirred at 60 DEG C
20min obtains environment-friendly metal polishing fluids of the pH in 9-11.
Embodiment 2
The preparation method of alkalinous metal polishing fluid：Aminomethyl propanol 20g is added in the 50%NaOH of 400g, mixing is abundant
Neopelex 0.5g, Nano-meter SiO_2 are added afterwards25g, sodium peroxydisulfate 10g, ring five dimethyl silicone polymer 0.5g,
20min is stirred at 60 DEG C and obtains environment-friendly metal polishing fluids of the pH in 9-11.
Claims (6)
1. it is an object of the invention to provide the preparation method of asepsis environment-protecting alkalinous metal polishing fluid.
Concrete scheme of the present invention is as follows：
The sodium hydroxide solution of 40-60% is first prepared at room temperature, adds bright auxiliary agent 1-2wt%, surfactant 0.1-
0.5wt%, thickener 2-5wt%, oxidant 5-10wt%, chelating agent 1-2wt%, stirring obtains pH in 20 minutes and exists at 60 DEG C
The environment-friendly metal polishing fluid of 9-11；
Acid polishing slurry can be produced in the process due to excellent polishability and stability, being widely used in the industry
The a large amount of harmful exhaust waste water and dregs of life, pollution environment, and because its corrosivity is not suitable for by force very much the fields such as microelectronics.Therefore, originally
Send out bright alkalescence polishing liquid a kind of, using NaOH with low cost, not only solve glossiness after pollution problem, and polishing
Polished than conventional alkaline high.
2. a kind of preparation of asepsis environment-protecting alkalinous metal polishing fluid as claimed in claim 1, it is characterised in that：Preferably, institute
The bright auxiliary agent stated is using one or more in copper sulphate, PEG-60 rilanit specials and aminomethyl propanol.
3. a kind of preparation of asepsis environment-protecting alkalinous metal polishing fluid as claimed in claim 2, it is characterised in that：Preferably, institute
The surfactant stated uses lauryl sodium sulfate, neopelex, sldium lauryl sulfate, glycerol stearate monoesters
In one or more.
4. a kind of preparation of asepsis environment-protecting alkalinous metal polishing fluid as claimed in claim 3, it is characterised in that：Preferably, institute
The thickener stated uses saccharin, polyethylene glycol, polysiloxanes, Nipasol and Nano-meter SiO_22In one or more.
5. a kind of preparation of asepsis environment-protecting alkalinous metal polishing fluid as claimed in claim 4, it is characterised in that：Preferably, institute
Using one or more in hydrogen peroxide, sodium peroxydisulfate, the introducing of oxidant can greatly improve polishing efficiency to the oxidant stated,
Metal surface is formed the oxide-film of densification, metal surface is protected to a certain extent.
6. a kind of preparation of asepsis environment-protecting alkalinous metal polishing fluid as claimed in claim 5, it is characterised in that：Preferably, institute
The chelating agent stated is using one or more in trehalose, Phenoxyethanol and ring five dimethyl silicone polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611064833.XA CN106757034A (en) | 2016-11-28 | 2016-11-28 | A kind of preparation method of alkalinous metal polishing fluid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611064833.XA CN106757034A (en) | 2016-11-28 | 2016-11-28 | A kind of preparation method of alkalinous metal polishing fluid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106757034A true CN106757034A (en) | 2017-05-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611064833.XA Pending CN106757034A (en) | 2016-11-28 | 2016-11-28 | A kind of preparation method of alkalinous metal polishing fluid |
Country Status (1)
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| CN (1) | CN106757034A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101974296A (en) * | 2010-11-12 | 2011-02-16 | 大连三达奥克化学股份有限公司 | Core/shell type composite nano abrasive silicon slice polishing liquid |
| CN102925900A (en) * | 2012-10-19 | 2013-02-13 | 贵州航天林泉电机有限公司 | Alkaline chemical polishing solution and alkaline chemical polishing method |
| CN103334107A (en) * | 2013-05-21 | 2013-10-02 | 内蒙古包钢钢联股份有限公司 | Magnesium-aluminum alloy polishing solution and its preparation method and polishing method |
| CN104694931A (en) * | 2015-03-30 | 2015-06-10 | 江苏理工学院 | Alkaline chemical polishing method and adopted alkaline chemical polishing solution thereof |
| CN105331979A (en) * | 2015-10-21 | 2016-02-17 | 上海瑞特良化工有限公司 | Aluminum chemical polishing solution and polishing method with same |
-
2016
- 2016-11-28 CN CN201611064833.XA patent/CN106757034A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101974296A (en) * | 2010-11-12 | 2011-02-16 | 大连三达奥克化学股份有限公司 | Core/shell type composite nano abrasive silicon slice polishing liquid |
| CN102925900A (en) * | 2012-10-19 | 2013-02-13 | 贵州航天林泉电机有限公司 | Alkaline chemical polishing solution and alkaline chemical polishing method |
| CN103334107A (en) * | 2013-05-21 | 2013-10-02 | 内蒙古包钢钢联股份有限公司 | Magnesium-aluminum alloy polishing solution and its preparation method and polishing method |
| CN104694931A (en) * | 2015-03-30 | 2015-06-10 | 江苏理工学院 | Alkaline chemical polishing method and adopted alkaline chemical polishing solution thereof |
| CN105331979A (en) * | 2015-10-21 | 2016-02-17 | 上海瑞特良化工有限公司 | Aluminum chemical polishing solution and polishing method with same |
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Application publication date: 20170531 |
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| WD01 | Invention patent application deemed withdrawn after publication |