CN106746719A - A kind of composite construction film layer and plating method for extending the magnetometer relaxation time - Google Patents
A kind of composite construction film layer and plating method for extending the magnetometer relaxation time Download PDFInfo
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- CN106746719A CN106746719A CN201611046151.6A CN201611046151A CN106746719A CN 106746719 A CN106746719 A CN 106746719A CN 201611046151 A CN201611046151 A CN 201611046151A CN 106746719 A CN106746719 A CN 106746719A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/31—Pre-treatment
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
It is significant for improving atom magnetometer sensitivity the invention belongs to field of measuring technique, and in particular to a kind of composite film and plating method for extending the alkali metal atom magnetometer Central Plains subpool relaxation time.The composite construction film layer is sputtered at atom pond inwall, is made up of internal layer OTS films and outer layer alkene film two parts.A kind of composite construction film layer is proposed to extend the alkali metal atom relaxation time, improve film layer resistance to elevated temperatures：The resistance to elevated temperatures of relaxation film is improved by OTS films, while playing a certain degree of inhibitory action to alkali metal atom surface relaxation；By the physical absorption of alkene film in OTS films surface, the anti-relaxation effect of film layer is significantly improved further with the advantage of alkene film, extend the alkali metal atom relaxation time, it is final to improve atom magnetometer sensitivity.
Description
Technical field
The invention belongs to field of measuring technique, and in particular to one kind is relaxed for extending alkali metal atom magnetometer Central Plains subpool
The composite film and plating method of Henan time, it is significant for improving atom magnetometer sensitivity.
Background technology
Magnetic field is the important attribute of magnetisable material, and the measurement to magnetic field is significant, before more than 2000 years, department
The appearance in south, becomes earliest magnetic-field measurement instrument.Laser technology, quantum techniques etc. are developed rapidly, greatly
The progress of accurate magnetic field measurement technology is promoted.Accurate magnetic field measurement technology is in mineral resources detection, geologic structure
The fields such as investigation, clinical medicine diagnosis and earthquake prediction have important application.The appearance of semiconductor laser and relaxation long
The preparation in Henan time atom pond has promoted the development of atom magnetometer, and current atom magnetometer has been substituted Superconducting Quantum device
(SuperconductingQuantumInterference Devices, SQUID) turns into most sensitive magnetic field measuring device.Alkali
Metallic atom magnetometer realizes magnetic-field measurement by observing Spin precession of the alkali metal atom under magnetic fields to be measured.Magnetic field is surveyed
Used as the most important performance indications of atom magnetometer, its limiting snesibility is represented by for amount sensitivity：
The sensitivity of atom magnetometer is improved, mainly by extending atom pond relaxation time T, increasing alkali metal atom density in atom pond
Two methods of N are realized.
There are various Relaxation Mechanisms in atom pond, mainly include：The table that alkali metal atom causes with the collision of atom pond inwall
Between spin exohange collision relaxation, alkali metal atom between face relaxation, alkali metal atom and alkali metal atom with buffering gas
Spin destruction collision relaxation between body atom (molecule) etc., the surface that wherein alkali metal atom causes with the collision of atom pond inwall
Relaxation is the most notable.To reduce the surface relaxation that atom causes with the collision of atom pond inwall, extend the alkali metal atom relaxation time,
The method for generally using at present has two kinds：One is to be filled with buffer gas in atom pond to extend alkali metal atom in atom pond
The diffusion time of wall；Two is to be coated with anti-relaxation film in atom pond inwall, generally selects polarizability and the relatively low film layer material of energy of adsorption
Material, so as to efficiently avoid the direct effect of alkali metal atom and atom pond glass inner wall, reduces alkali metal atom in film layer
The adsorption time on surface.Compared with buffer gas is filled with atom pond, alkali metal atom surface is suppressed using anti-relaxation film and is relaxed
Henan has following significant advantages：(1) due to not existing buffer gas in atom pond, it is to avoid because of alkali metal atom and buffer gas
Compacting broadening caused by atom (molecule) collision, magnetometer signal line width narrows；(2) in the case of plated film, alkali metal atom is in original
Quickly moved in subpool, whole sample space can be sampled, reduce wanting to pump light and detection light beam sizes etc.
Ask, while being conducive to promoting application of the optical fiber in atom magnetometer；(3) in the case of plated film, alkali metal atom is in atom pond
Quick motion can effectively suppress the relaxation that remnant field gradient causes in atom pond.
Numerous studies have been carried out to anti-relaxation film material in atom pond both at home and abroad.Paraffin is applied to earliest in atom pond
Anti- relaxation film material, U.S. Califormia universities Berkeley branch school D.Budker (【Graf M T,Kimball D
F,Rochester S M,et al.Relaxation of atomic polarization in paraffin-coated
cesium vapor cells[J].Physical Review A,2005,72(2):023401.】), and Russia
Petersburg universities M.V.Balabs etc. has carried out numerous studies to the situation that Parafilm is coated with alkali metal atom pond inwall
(【Balabas M V,Budker D,Kitching J,et al.Magnetometry with millimeter-scale
antirelaxation-coated alkali-metal vapor cells[J].JOSA B,2006,23(6):1001-
1006.】).In the case of plating Parafilm, alkali metal atom may be up to 10 with the effective collision number of times of atom pool surface4, it was confirmed that stone
The anti-relaxation effect of cere.However, melting point of paraffin wax is relatively low, generally at 60 DEG C~80 DEG C, the atom pond work temperature of Parafilm is plated
Degree is general not above 80 DEG C, so as to limit Parafilm in miniaturization atom magnetometer and without spin-exchange (Self-
Exchange Relaxation-Free, SERF) field such as magnetometer application.
With SERF atom magnetometers, the development of miniaturization atom magnetometer, the high-temperature stable of relaxation film material is resisted
Property proposes requirements at the higher level.Princeton universities S.J.Seltzer, M.V.Romalis etc. are to resistant to elevated temperatures OTS
(Octadecyltrichlorosilane, octadecyl trichlorosilane alkane) film carried out numerous studies (【Seltzer S J,
Romalis M V.High-temperature alkali vapor cells with antirelaxation surface
coatings[J].Journal of Applied Physics,2009,106(11):114905.】), domestic Fudan University Zhao
Kai Feng etc. has also carried out the series of studies of OTS films, and it is (dry to form different OTS film layers by the control to atmospheric water content
Under dry environment, self-organizing individual layer OTS films are formed；Under wet environment, multilayer OTS films are formed, different OTS molecular links form cross and hand over
Fork configuration), experimental study moisture to the anti-Relaxivity of OTS films influence (【Zhang G,Wei L,Wang M,et
al.Effects of water concentration in the coating solution on the wall
relaxation rate of octadecyltrichlorosilane coated rubidium vapor cells[J]
.Journal of Applied Physics,2015,117(4):043106.】).Ring of the multilayer OTS films at not higher than 170 DEG C
With preferable anti-relaxivity, and even up to 400 DEG C of individual layer self-organizing OTS films maximum operating temperature under border.OTS films than
Parafilm has a preferable high-temperature stability, but its anti-relaxation effect is not so good as paraffin, the relaxation time typically in ms magnitudes, at present
Highest collision frequency through realizing is 2100, typically hundreds of or so.
Be applied to alkene film containing unsaturation C=C keys in Rb atoms pond by M.V.Balabas et al., it was confirmed that alkene
Film has preferable anti-Relaxivity, and its T2 reaches 10 up to 77s, collision frequency6(【Balabas M V,
Karaulanov T,Ledbetter M P,et al.Polarized alkali-metal vapor with minute-
long transverse spin-relaxation time[J].Physical review letters,2010,105(7):
070801.】), improve two magnitudes than Parafilm.But the fusing point of alkene film is lower, it is desirable to which operating temperature is usually no more than
33℃.To ensure the high sensitivity of alkali metal atom magnetometer, there is preferably anti-relaxation to imitate simultaneously in the urgent need to design is a kind of
Fruit and resistant to elevated temperatures film material.
The present invention proposes a kind of composite construction film layer design for extending the alkali metal atom pond relaxation time,
Atom pond inwall is coated with one layer of OTS film first, and one layer of alkene film (such as C18-C24) is coated with OTS films, can simultaneously play anti-
Relaxation and resistant to elevated temperatures effect, it is significant for improving alkali metal atom magnetometer sensitivity.
The content of the invention
The technical problem to be solved in the present invention is：Magnetometer spirit is improved for by extending the alkali metal atom relaxation time
Sensitivity problem, existing two kinds of common schemes (fill buffer gas, atom pond inwall and plate anti-relaxation film) exist certain not enough：
The diffusion time that buffer gas can delay alkali metal atom to atom pond inwall is filled with atom pond, but simultaneously because alkali metal is former
Son and the collision of buffer gas, cause resonance line width broadening；The anti-relaxation film such as conventional paraffin, OTS, it is impossible to reach and be provided simultaneously with
Efficient anti-relaxation effect and resistant to elevated temperatures target.For above-mentioned deficiency, the present invention proposes a kind of for extending magnetometer relaxation
The composite construction film layer and plating method of Henan time, can simultaneously meet high temperature and the requirement of anti-relaxation.
The technical solution adopted by the present invention is：A kind of composite construction film layer for extending the magnetometer relaxation time, it is special
Levy and be：The composite construction film layer is sputtered at atom pond inwall, is made up of internal layer OTS films and outer layer alkene film two parts.
The present invention also provides a kind of plating method of composite construction film layer as described above, and the method is comprised the following steps：
S1 is coated with OTS films：
S1.1 cleaning atoms pond：(connect Teflon capillary with syringe makes solution by atmospheric pressure to utilize " degassing method "
Pour in down a chimney in atom pond) by " Piranha " solution (by hydrogen peroxide and the concentrated sulfuric acid according to 3:7 volume ratio configuration is formed, and is configured
Hydrogen peroxide is slowly added into the concentrated sulfuric acid using glue head dropper in journey, and is constantly stirred) it is injected into atom pond, purpose
It is to remove the organic impurities on the inwall of atom pond, it is to avoid it reacts with OTS, and exposes real glass surface
Come；
S1.2 places atom pond about 1 hour, and extract molten in atom pond out after " Piranha " solution is full of in atom pond
Liquid；
S1.3 cleans atom pond three times using distilled water and methanol solution；
S1.4 carries out vacuum bakeout, about 100 DEG C of baking temperature to the atom pond after cleaning；
S1.5 is coated with OTS films：The concentration that " degassing method " will be prepared is utilized to be injected in atom pond for the OTS solution of 0.8ml/L,
Stand five minutes, OTS molecules and glass surface occur chemical bond and, formation OTS films；
S1.6 is cleaned three times with chloroform to atom pond；
S2 is coated with alkene film：
S2.1 forms outer layer alkene film on the basis of OTS film layers by evaporation-deposition, and specific method is as follows：First to alkene
Carrying out heating evaporates it, then alkene is covered in OTS film surfaces using condensing mode；
S2.2 is heated " aging " treatment to atom pond；
S2.3 is filled with 50torr N in atom pond2As gas is quenched；
S2.4 finally carries out cooling treatment to atom pond, be should ensure that in cooling treatment and existed between atom tank main body and branch stem
Certain temperature difference, makes branch stem temperature less than body temperature, to avoid alkali metal atom from being condensed in atom pond inner surface.
The present invention is based on following principle：Be coated with one layer of OTS film in atom pond inwall first with hydrolysis, OTS films with
Glass inner wall is combined together in the way of chemical bond sum, with preferable high-temperature stability.After OTS films are formed, using steaming
Hair, the mode of condensation are coated with one layer of alkene film again in OTS film layers, alkene film can uniform fold in inner wall surface, while having
Relatively low energy of adsorption, it is possible to decrease alkali metal atom extends the alkali metal atom relaxation time in the adsorption time on surface so as to reach
Purpose.Therefore, using composite film structure, can simultaneously realize high temperature resistant and suppress the target of surface relaxation.The program passes through will
The Dominant Facies of the anti-relaxation membrane material of two types are combined, and realize anti-relaxation and resistant to elevated temperatures double requirements.On the one hand, using OTS
The high-temperature stability of film, by chemical reaction make OTS films and atom pond inwall glass material occur chemical bond and, by OTS
The control of moisture in solution, is capable of achieving the regulation of OTS thicknesses of layers.Atom pond inwall is coated with OTS films, in can meeting SERF magnetometers
Requirement to high-temperature stability, is provided simultaneously with certain anti-relaxation effect, can extend the alkali metal atom relaxation time.The opposing party
Face, using the splendid anti-relaxation behavior of alkene film, on the basis of existing OTS film layers, alkene is made using modes such as heating evaporation, condensations
The physical absorption of hydrocarbon film is capable of achieving the regulation of alkene thicknesses of layers by the control to temperature in OTS film surfaces.By such
Composite film structure design, can extend the relaxation time of alkali metal atom, while resisting relaxation film in meeting SERF magnetometers
The requirement of high-temperature stability, improves the sensitivity of atom magnetometer.
Compared with prior art, advantage of the invention is that：Based on existing coating technique, it is proposed that a kind of composite construction film
Layer with extend the alkali metal atom relaxation time, improve film layer resistance to elevated temperatures：The heat-resisting quantity of relaxation film is improved by OTS films
Can, while playing a certain degree of inhibitory action to alkali metal atom surface relaxation；By the physical absorption of alkene film in OTS film tables
Face, the anti-relaxation effect of film layer is significantly improved further with the advantage of alkene film, extends the alkali metal atom relaxation time, is finally carried
Atom magnetometer sensitivity high.
Brief description of the drawings
Fig. 1 is spherical alkali metal atom pool structure schematic diagram；
Fig. 2 is the anti-relaxation film layer schematic diagram of composite construction；
Fig. 3 is OTS Molecular Adsorptions in atom pond inner wall surface procedure chart；
Fig. 4 is adsorbed in OTS molecular surface schematic diagrames for olefin hydrocarbon molecules；
In Fig. 1,1. atom tank main body；2. a stem
In Fig. 2, a. atoms pond glass inner wall；B.OTS film layers；C. alkene film layer
Specific embodiment
The present invention is further illustrated below in conjunction with the accompanying drawings.But should not therefore limit the scope of the invention.
Process is coated with to film layer of the invention to be briefly described, be broadly divided into two steps below：
S1 is coated with OTS films：
S1.1 cleaning atoms pond.(connect Teflon capillary with syringe makes solution by atmospheric pressure to utilize " degassing method "
Pour in down a chimney in atom pond) by " Piranha " solution (by hydrogen peroxide and the concentrated sulfuric acid according to 3:7 volume ratio configuration is formed, and is configured
Hydrogen peroxide is slowly added into the concentrated sulfuric acid using glue head dropper in journey, and is constantly stirred) it is injected into atom pond, purpose
It is to remove the organic impurities on the inwall of atom pond, it is to avoid it reacts with OTS, and exposes real glass surface
Come；
S1.2 places atom pond about 1 hour, and extract molten in atom pond out after " Piranha " solution is full of in atom pond
Liquid；
S1.3 cleans atom pond three times using distilled water and methanol solution；
S1.4 carries out vacuum bakeout, about 100 DEG C of temperature to the atom pond after cleaning；
S1.5 is coated with OTS films.The concentration that " degassing method " will be prepared is utilized to be injected in atom pond for the OTS solution of 0.8ml/L,
Stand five minutes, OTS molecules and glass surface occur chemical bond and, formation OTS films, as shown in Figure 3；
S1.6 is cleaned three times with chloroform to atom pond；
S2 is coated with alkene film：
S2.1 by evaporation-deposition as shown in figure 4, on OTS film layer basis of formation, form outer layer alkene film, specifically side
Method is as follows：Carrying out heating to alkene evaporates it, then alkene is covered in OTS film surfaces using condensing mode；
S2.2 is heated " aging " treatment to atom pond；
S2.3 is filled with 50torr N in atom pond2As gas is quenched；
S2.4 finally carries out cooling treatment to atom pond, be should ensure that in cooling treatment and is deposited between atom tank main body 1 and branch stem 2
In certain temperature difference, make branch stem temperature less than body temperature, to avoid alkali metal atom from being condensed in atom pond inner surface.
To fairly set out the action principle of this programme, the mechanism of action to two kinds of film layers is analyzed below.
When being coated with OTS films, there is hydrolysis in the functional group in OTS molecules, such as with the-OH in the interior surfaces of glass of atom pond
Shown in Fig. 3 (b), OTS molecules and glass surface are being chemically bound together.In coating process, by moisture in air
Control can form different OTS film layers and (under dry environment, form self-organizing individual layer OTS films；Under wet environment, multilayer is formed
OTS films, different OTS molecular links form right-angled intersection configuration).Understood using AFM observations, in the case of plating OTS films, alkali metal atom
A small amount of atom only is adsorbed in crystal boundary edge, so as to reduce the collision of alkali metal atom and atom pond inner wall surface.Research table
Bright, OTS films can make alkali metal atom still keep polarized state hundreds of times even thousands of times with inwall collision.On the other hand, OTS points
Son is combined with interior surfaces of glass with chemical bond form, compared with the physical absorption of paraffin film layer is in atom pond inner wall surface, with more
Good high-temperature stability.
Plate one layer of alkene film (such as C18-C24) again on the basis of OTS film layers, olefin hydrocarbon molecules are covered in physical adsorption way
OTS film surfaces, olefin hydrocarbon molecules energy of adsorption is relatively low, can effectively reduce adsorption time of the alkali metal atom in atom pool surface,
So as to reach the purpose in extension relaxation time.There are some researches prove some alkene films can make alkali metal atom T2
Reach 1min, it is ensured that alkali metal atom and atom pond inwall collision 106It is secondary still to keep polarized state.
In sum, by the anti-relaxation film of composite construction for combining to form OTS film layers and alkene film layer, both can reach compared with
Good anti-relaxation effect, extends the alkali metal atom relaxation time, improves atom magnetometer sensitivity；Meanwhile, but also with higher
High-temperature stability, disclosure satisfy that SERF magnetometers and miniaturization magnetometer Anodic key and technology in film layer high-temperature stability
Requirement.
Claims (2)
1. a kind of composite construction film layer for extending the magnetometer relaxation time, it is characterised in that：The composite construction film layer plating
Atom pond inwall is formed on, is made up of internal layer OTS films and outer layer alkene film two parts.
2. described in a kind of claim 1 be used for extend the magnetometer relaxation time composite construction film layer plating method, the method
Comprise the following steps：
S1 is coated with OTS films：
S1.1 cleaning atoms pond：Utilize " degassing method " that " Piranha " solution is injected into atom pond, it is therefore intended that removal atom
Organic impurities on the inwall of pond, it is to avoid it reacts with OTS, and real glass surface is exposed, " the exhaust
Method " is exactly to connect Teflon capillary with syringe to make solution pour in down a chimney in atom pond by atmospheric pressure, and " Piranha " is molten
Liquid is by hydrogen peroxide and the concentrated sulfuric acid according to 3:7 volume ratio configuration is formed, using glue head dropper that hydrogen peroxide is slow in configuration process
It is added in the concentrated sulfuric acid, and is constantly stirred；
S1.2 places atom pond about 1 hour, and extract solution in atom pond out after " Piranha " solution is full of in atom pond；
S1.3 cleans atom pond three times using distilled water and methanol solution；
S1.4 carries out vacuum bakeout, about 100 DEG C of baking temperature to the atom pond after cleaning；
S1.5 is coated with OTS films：The concentration that " degassing method " will be prepared is utilized in the OTS solution injection atom pond of 0.8ml/L, to stand
Five minutes, OTS molecules and glass surface occur chemical bond and, formation OTS films；
S1.6 is cleaned three times with chloroform to atom pond；
S2 is coated with alkene film：
S2.1 forms outer layer alkene film on the basis of OTS film layers by evaporation-deposition, and specific method is as follows：First alkene is carried out
Heating evaporates it, then alkene is covered in OTS film surfaces using condensing mode；
S2.2 is heated " aging " treatment to atom pond；
S2.3 is filled with 50torrN in atom pond2As gas is quenched；
S2.4 finally carries out cooling treatment to atom pond, be should ensure that in cooling treatment between atom tank main body and branch stem and existed necessarily
Temperature difference, make branch stem temperature less than body temperature, to avoid alkali metal atom from being condensed in atom pond inner surface.
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| CN201611046151.6A CN106746719A (en) | 2016-11-22 | 2016-11-22 | A kind of composite construction film layer and plating method for extending the magnetometer relaxation time |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110357451A (en) * | 2019-05-31 | 2019-10-22 | 北京航空航天大学 | A kind of anti-relaxation coating and alkali metal gas chamber and method |
| CN111537922A (en) * | 2020-05-13 | 2020-08-14 | 西安交通大学 | Method for selecting alkali metal atom source of MEMS (micro-electromechanical system) air chamber of atomic magnetometer |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120112749A1 (en) * | 2010-11-01 | 2012-05-10 | The Regents Of The University Of California | Apparatus and method for increasing spin relaxation times for alkali atoms in alkali vapor cells |
| CN105256286A (en) * | 2015-10-26 | 2016-01-20 | 北京航天控制仪器研究所 | Atom gas chamber inner wall coating method for slowing down atomic spin relaxation |
| CN105369219A (en) * | 2015-10-30 | 2016-03-02 | 北京自动化控制设备研究所 | Relaxation resistance coating method for magnetic resonance air chamber |
| CN105986248A (en) * | 2015-03-03 | 2016-10-05 | 北京自动化控制设备研究所 | Relaxation-resisting coating method for atom gas chamber |
-
2016
- 2016-11-22 CN CN201611046151.6A patent/CN106746719A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120112749A1 (en) * | 2010-11-01 | 2012-05-10 | The Regents Of The University Of California | Apparatus and method for increasing spin relaxation times for alkali atoms in alkali vapor cells |
| CN105986248A (en) * | 2015-03-03 | 2016-10-05 | 北京自动化控制设备研究所 | Relaxation-resisting coating method for atom gas chamber |
| CN105256286A (en) * | 2015-10-26 | 2016-01-20 | 北京航天控制仪器研究所 | Atom gas chamber inner wall coating method for slowing down atomic spin relaxation |
| CN105369219A (en) * | 2015-10-30 | 2016-03-02 | 北京自动化控制设备研究所 | Relaxation resistance coating method for magnetic resonance air chamber |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110357451A (en) * | 2019-05-31 | 2019-10-22 | 北京航空航天大学 | A kind of anti-relaxation coating and alkali metal gas chamber and method |
| CN111537922A (en) * | 2020-05-13 | 2020-08-14 | 西安交通大学 | Method for selecting alkali metal atom source of MEMS (micro-electromechanical system) air chamber of atomic magnetometer |
| CN111537922B (en) * | 2020-05-13 | 2021-05-28 | 西安交通大学 | Method for selecting alkali metal atom source of MEMS (micro-electromechanical system) air chamber of atomic magnetometer |
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Application publication date: 20170531 |