CN106707698B - 一种直写曝光设备的正交性实时监测及校正方法 - Google Patents
一种直写曝光设备的正交性实时监测及校正方法 Download PDFInfo
- Publication number
- CN106707698B CN106707698B CN201710052011.8A CN201710052011A CN106707698B CN 106707698 B CN106707698 B CN 106707698B CN 201710052011 A CN201710052011 A CN 201710052011A CN 106707698 B CN106707698 B CN 106707698B
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- China
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- exposure sources
- direct write
- orthogonality
- real
- time monitoring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710052011.8A CN106707698B (zh) | 2017-01-20 | 2017-01-20 | 一种直写曝光设备的正交性实时监测及校正方法 |
Applications Claiming Priority (1)
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CN201710052011.8A CN106707698B (zh) | 2017-01-20 | 2017-01-20 | 一种直写曝光设备的正交性实时监测及校正方法 |
Publications (2)
Publication Number | Publication Date |
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CN106707698A CN106707698A (zh) | 2017-05-24 |
CN106707698B true CN106707698B (zh) | 2019-04-30 |
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CN201710052011.8A Active CN106707698B (zh) | 2017-01-20 | 2017-01-20 | 一种直写曝光设备的正交性实时监测及校正方法 |
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CN (1) | CN106707698B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109856926B (zh) * | 2019-03-25 | 2024-04-09 | 合肥芯碁微电子装备股份有限公司 | 直写光刻曝光设备定位运动平台正交性调试装置及方法 |
CN112344882A (zh) * | 2020-10-29 | 2021-02-09 | 江苏迪盛智能科技有限公司 | 丝网曝光机的误差测量系统及方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102354086A (zh) * | 2011-09-29 | 2012-02-15 | 合肥芯硕半导体有限公司 | 一种精密移动平台的正交性实时标定方法 |
CN104199257A (zh) * | 2014-08-26 | 2014-12-10 | 合肥芯硕半导体有限公司 | 一种精密定位平台绝对定位精度的测量及补偿方法 |
CN105629678A (zh) * | 2016-01-25 | 2016-06-01 | 苏州苏大维格光电科技股份有限公司 | 一种直写系统运动平台的正交性测定方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6509953B1 (en) * | 1998-02-09 | 2003-01-21 | Nikon Corporation | Apparatus for exposing a pattern onto an object with controlled scanning |
JP2008205312A (ja) * | 2007-02-21 | 2008-09-04 | Denso Corp | 露光方法 |
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2017
- 2017-01-20 CN CN201710052011.8A patent/CN106707698B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102354086A (zh) * | 2011-09-29 | 2012-02-15 | 合肥芯硕半导体有限公司 | 一种精密移动平台的正交性实时标定方法 |
CN104199257A (zh) * | 2014-08-26 | 2014-12-10 | 合肥芯硕半导体有限公司 | 一种精密定位平台绝对定位精度的测量及补偿方法 |
CN105629678A (zh) * | 2016-01-25 | 2016-06-01 | 苏州苏大维格光电科技股份有限公司 | 一种直写系统运动平台的正交性测定方法 |
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Publication number | Publication date |
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CN106707698A (zh) | 2017-05-24 |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A real time orthogonality monitoring and correction method for direct writing exposure equipment Effective date of registration: 20210128 Granted publication date: 20190430 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY Co.,Ltd. Registration number: Y2021980000823 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230508 Granted publication date: 20190430 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY CO.,LTD. Registration number: Y2021980000823 |