CN106702353B - Reaction chamber - Google Patents
Reaction chamber Download PDFInfo
- Publication number
- CN106702353B CN106702353B CN201510777620.0A CN201510777620A CN106702353B CN 106702353 B CN106702353 B CN 106702353B CN 201510777620 A CN201510777620 A CN 201510777620A CN 106702353 B CN106702353 B CN 106702353B
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- CN
- China
- Prior art keywords
- reaction chamber
- contact
- pallet
- probe
- pedestal
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
Abstract
The present invention provides a kind of reaction chamber, including pedestal and Workpiece detecting device, wherein pedestal includes the loading end for carrying pallet, and the pallet is for carrying at least one workpiece to be machined.Workpiece detecting device is issued for whether being placed with pallet in detection pedestal in relation to being or no digital signal.Reaction chamber provided by the invention, it can be by directly reading the digital signal it may determine that whether being placed with pallet on pedestal out, even if situations such as to software systems catastrophic failure or exception, still it can accurately and in time judge whether there is pallet in reaction chamber, and then the reliability of equipment can be improved.
Description
Technical field
The present invention relates to field of semiconductor manufacture, and in particular, to a kind of reaction chamber.
Background technique
In semiconductor fabrication process, it usually needs the pallet of substrate will be carried using manipulator and loading chamber and anti-
It answers and is transmitted between chamber, which is related to largely interlocking, and main purpose is the protection person and equipment safety.It is incited somebody to action in manipulator
Whether pallet is passed to before reaction chamber, not only need to judge manipulator to take on piece success and manipulator and whether have pallet, also
Need to judge whether have pallet in reaction chamber, current semiconductor processing equipment mainly relies on the record of software systems to sentence
Whether there is pallet in disconnected reaction chamber.
Fig. 1 is the biography piece flow chart of existing semiconductor processing equipment.As seen from Figure 1, pallet is passed in manipulator
Before entering reaction chamber, judges whether there is pallet in reaction chamber first with software systems, put if so, manipulator does not execute
Piece movement, while software is alarmed；If it is not, then whether having pallet on inspecting manipuator, if it is not, then software is alarmed, if so, opening
The gate valve of reaction chamber, manipulator execute film releasing movement.
Since above-mentioned semiconductor processing equipment can only judge whether there is support in reaction chamber by the record of software systems
Disk, if can not accurately and in time judge whether there is support in reaction chamber situations such as software systems catastrophic failure or exception
Disk.Although may also rely on operator in Normal practice and artificially judged by observation window, due to being frequently present of
Artificial erroneous judgement, this brings bigger uncertainty to the operation of whole system, thus it is easy to appear piece failure is passed, to equipment
Safety damages.
Summary of the invention
The present invention is directed at least solve one of the technical problems existing in the prior art, a kind of reaction chamber is proposed,
Can be to avoid because of software systems catastrophic failure or exception situations such as, it can not accurately and in time judge whether there is support in reaction chamber
The case where disk, so as to improve the reliability of equipment.
A kind of reaction chamber, including pedestal are provided to achieve the purpose of the present invention, and the pedestal includes for carrying support
The loading end of disk, the pallet further include Workpiece detecting device for carrying at least one workpiece to be machined, the workpiece sensing
Device is issued in relation to being or no digital signal for detecting whether be placed with the pallet on the pedestal.
Preferably, the Workpiece detecting device includes probe, compressed spring and detection switch, wherein the detection switch
Including stationary contact and movable contact, the two issues the digital signal in relation to being when being in contact, and issues when mutually separating related no
Digital signal；The first through hole through its thickness is provided on the loading end of the pedestal, the probe is located at described first
In through-hole, and it is connect with the movable contact；The compressed spring is for carrying the probe；When there is no the support on the pedestal
When disk, in a state of nature, the upper end of the probe is higher than the loading end to the compressed spring, and the movable contact is located at and institute
It states at the position that stationary contact mutually separates；When having the pallet on the pedestal, the pallet using self gravity downwardly against
The probe, the probe drive the movable contact to be displaced downwardly at the position being in contact with the stationary contact, while the compression
Spring is compressed.
Preferably, the stationary contact is connect with DC power supply, when the stationary contact and movable contact are in contact, where the two
Power on circuitry；When the stationary contact is mutually separated with movable contact, down circuitry where the two.
Preferably, the bottom of the reaction chamber is arranged in the Workpiece detecting device, and in the reaction chamber bottom
Chamber wall on be provided with the second through-hole, protruded into the reaction chamber with for the probe.
It preferably, further include central axis, upper flange, lower flange and bellows, wherein the central axis is vertically arranged, and
It is connect respectively with the lower end of the probe and the lower flange；The upper flange is set in around the central axis, and with it is described
The sealed bottom of reaction chamber connects；The lower flange is carried by the compressed spring, and is connect with the movable contact；The wave
Line pipe sleeve is located at around the central axis, and between the upper flange and lower flange, and is tightly connected respectively with the two.
Preferably, the lower flange is used with the movable contact and is detachably connected.
Preferably, the bottom of the lower flange is provided with sphere-contact portion, and accordingly vertical on the movable contact
It is provided with contact bar, the upper surface of the contact bar is plane；The sphere-contact portion connects with the upper surface of the contact bar
Touching.
Preferably, the probe is made of insulating materials.
Preferably, the upper surface of the probe has circular arc chamfering, to realize and the pallet smooth engagement.
It preferably, further include control unit, for reading the digital signal issued by the Workpiece detecting device, and
Judge the pallet whether is placed on the pedestal according to the digital signal.
The invention has the following advantages:
Whether reaction chamber provided by the invention, is provided with Workpiece detecting device, can detecte and be placed on pedestal
Pallet, and issuing in relation to being or no digital signal, thus by directly reading the digital signal it may determine that pedestal out
On whether be placed with pallet, and then even if software systems catastrophic failure or it is abnormal situations such as, still can accurately and in time sentence
Whether there is pallet in disconnected reaction chamber, so as to improve the reliability of equipment.
Detailed description of the invention
Fig. 1 is the biography piece flow chart of existing semiconductor processing equipment；
Fig. 2 is partial sectional view of the reaction chamber provided in an embodiment of the present invention in no piece；
Fig. 3 is partial sectional view of the reaction chamber provided in an embodiment of the present invention when there is piece；
Fig. 4 is the biography piece flow diagram of reaction chamber provided in an embodiment of the present invention.
Specific embodiment
To make those skilled in the art more fully understand technical solution of the present invention, come with reference to the accompanying drawing to the present invention
The reaction chamber of offer is described in detail.
Reaction chamber provided by the invention includes pedestal and Workpiece detecting device, wherein reaction chamber is arranged in pedestal
Inside, and including the loading end for carrying pallet, for pallet for carrying at least one workpiece to be machined, the workpiece to be machined is all
The for example chip of Sapphire Substrate, silicon substrate etc..The diameter of the chip is typically no less than 2 cun, such as 2 cun, 4 cun or 8 cun etc..
Workpiece detecting device issues for whether being placed with pallet in detection pedestal and related is or no digital signal is (that is, DI letter
Number).So-called digital signal refers to the independent variable integer representation of signal, and dependent variable is with a number in limited number come table
The signal shown.In digital circuit, digital signal is to indicate two kinds of physical states using such as number 0 and 1, and can direct quilt
The microcomputer reads such as computer.Therefore, by directly read by Workpiece detecting device send come digital signal, so that it may
Judge whether be placed with pallet on pedestal, though so as to software systems catastrophic failure or it is abnormal situations such as, still can be quasi-
Judge really and in time whether there is pallet in reaction chamber, and then the reliability of equipment can be improved.
The specific embodiment of Workpiece detecting device is described in detail below.Specifically, Fig. 2 is the embodiment of the present invention
Partial sectional view of the reaction chamber of offer in no piece.Fig. 3 is reaction chamber provided in an embodiment of the present invention when there is piece
Partial sectional view.Referring to Figure 2 together and Fig. 3, pedestal 2 is provided in reaction chamber, for carrying pallet 1, and at this
The bottom of reaction chamber is provided with Workpiece detecting device, central axis 6, upper flange 5, lower flange 8 and bellows 7.Wherein, workpiece is examined
Surveying device includes probe 3, compressed spring 10 and detection switch, wherein detection switch includes stationary contact 14 and movable contact 13, the two
The digital signal in relation to being is issued when being in contact, i.e. physical state corresponding to the digital signal indicates to be placed with support on pedestal
Disk；The two is issued when mutually separating in relation to no digital signal, i.e., physical state corresponding to the digital signal indicates on pedestal
It is not placed with pallet.Preferably, stationary contact 14 is connect with DC power supply 15, when movable contact 13 and stationary contact 14 are in contact, two
Power on circuitry where person；When movable contact 13 is mutually separated with stationary contact 14, down circuitry where the two, so as to by stationary contact
14 are used as digital signal with the presence or absence of both physical states of voltage, it may be assumed that if there are voltages for stationary contact 14, then it represents that put on pedestal
It is equipped with pallet；If voltage is not present in stationary contact 14, then it represents that be not placed with pallet on pedestal.Additionally, it is preferred that, reaction chamber is also
Including control unit, for reading the digital signal issued by Workpiece detecting device, and judged on pedestal according to the digital signal
Whether pallet is placed with.Certainly, in practical applications, it can also manually read and judge whether be placed with pallet on pedestal.
It is provided with the second through-hole on the chamber wall 16 of reaction chamber bottom, is protruded into reaction chamber with for probe 3.And
And the first through hole through its thickness is provided on the loading end of pedestal 2, probe 3 is located in the first through hole, and its lower end
It is connect with the upper end for the central axis 6 being vertically arranged, the lower end of central axis 6 is connect with lower flange 8；Lower flange 8 is by compressed spring 10
Carrying, and connect with movable contact 13.Specifically, the setting of compressed spring 10 (can be the outer of detection switch in fixed bracket 11
Shell) on, lower flange 8 and the central axis 6 being attached thereto and probe are carried by compressed spring 10.When there is no pallet 1 on pedestal 2
When, in a state of nature, the upper end of probe 3 is higher than the loading end of pedestal 1 to compressed spring 10, and movable contact 13 is located at and stationary contact at this time
At the position of point 14 phases separation, as shown in Figure 2.When pallet 1 is placed on the loading end of pedestal 2, pallet 1 utilizes itself weight
Power is downwardly against probe 3, and probe 3 drives movable contact 13 to be displaced downwardly at the position being in contact with stationary contact 14, while compressed spring
10 are compressed, as shown in Figure 3.When pallet 1 is taken out from pedestal 2, compressed spring 10 pushes up laxative remedy using own resilient
Orchid 8 and the central axis 6 and probe that are attached thereto synchronize move up, thus make probe 3 again on move to the upper end and be higher than holding for pedestal 1
At the position of section, while movable contact 13 is located at again at the position separated with 14 phase of stationary contact.
Upper flange 5 is set in around central axis 6, and is tightly connected with the chamber wall of reaction chamber bottom 16, specifically,
It between upper flange 5 and chamber wall 16, and is looped around around the second through-hole and is provided with sealing ring 4, to gap between the two
It is sealed.Bellows 7 is around being set in around central axis 6, and between upper flange 5 and lower flange 8, and respectively with two
Person is tightly connected.In this way, vacuum state is in inside the inside of reaction chamber and bellows 7, and detection switch and laxative remedy
The position of 5 connection of orchid has switched to atmospheric condition, thereby may be ensured that the cable of acquisition signal can smoothly be connect with detection switch.
Preferably, lower flange 8 is used with movable contact 13 and is detachably connected, to avoid rigid connection to component
Bring impact.It is further preferred that being provided with sphere-contact portion 9 in the bottom of lower flange 8, and corresponding on movable contact 13
It is vertically arranged with contact bar 12, the upper surface of contact bar 12 is plane.When pallet 1 is placed on the loading end of pedestal 2, ball
Surface contact part 9 is in contact with the upper surface of contact bar 12, since the upper surface of sphere-contact 9 and contact bar 12 is sphere-contact,
This can still make sphere-contact portion 9 connect with the contact holding of bar 12 under the premise of allowing lower flange 8 to tilt certain angle
Touching, and can to avoid probe 3, central axis 6 and contact bar 12 generate bending stress, so as to improve equipment stability and can
By property.
Preferably, probe 3 is using the production of the insulating materials of ceramics or quartz etc., the probe 3 of insulating materials with support
It when disk 1 is in contact, will not be conducted with pallet 1, to will not be had an impact to the field distribution inside reaction chamber.
Preferably, the upper surface of probe 3 has circular arc chamfering, with realization and pallet smooth engagement, thus will not be to pallet
It causes to scratch.In addition, the material of pallet may include aluminium or silicon carbide etc., and the gravity of pallet should meet: by pallet
When placing on the base, probe can be pushed using self gravity, so that movable contact moves down, and be in contact with stationary contact.
Fig. 4 is the biography piece flow diagram of reaction chamber provided in an embodiment of the present invention.As shown in Figure 4, it will be held in the palm in manipulator
Disk is passed to before reaction chamber, and software systems (i.e. control unit) (can be counted by directly reading the DI value of Workpiece detecting device
Word signal value) judge whether to have in reaction chamber piece, and after manipulator completes film releasing movement, software systems are led to again
The DI value for reading Workpiece detecting device is crossed, state, which is updated in reaction chamber, piece state.Due to Workpiece detecting device
So as to accurately and judge whether there is pallet in reaction chamber in time, and then equipment can be improved in DI value true and accurate
Reliability.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (9)
1. a kind of reaction chamber, including pedestal, the pedestal includes the loading end for carrying pallet, and the pallet is for carrying
At least one workpiece to be machined, which is characterized in that further include Workpiece detecting device, the Workpiece detecting device is described for detecting
Whether it is placed with the pallet on pedestal, and issues in relation to being or no digital signal；
The Workpiece detecting device includes probe, compressed spring and detection switch, wherein
The detection switch includes stationary contact and movable contact, and the two issues the digital signal in relation to being when being in contact, in phase point
From when issue in relation to no digital signal；
The first through hole through its thickness is provided on the loading end of the pedestal, the probe is located at the first through hole
It is interior, and connect with the movable contact；
The compressed spring is for carrying the probe；
When not having the pallet on the pedestal, in a state of nature, the upper end of the probe is higher than institute to the compressed spring
Loading end is stated, the movable contact is located at the position mutually separated with the stationary contact；
When having the pallet on the pedestal, the pallet is using self gravity downwardly against the probe, the probe band
It moves the movable contact to be displaced downwardly at the position being in contact with the stationary contact, while the compressed spring is compressed.
2. reaction chamber according to claim 1, which is characterized in that the stationary contact is connect with DC power supply, when described
When stationary contact and movable contact are in contact, power on circuitry where the two；When the stationary contact is mutually separated with movable contact, where the two
Down circuitry.
3. reaction chamber according to claim 1, which is characterized in that the Workpiece detecting device is arranged in the reaction chamber
The bottom of room, and it is provided with the second through-hole on the chamber wall of the reaction chamber bottom, described in being protruded into for the probe
In reaction chamber.
4. reaction chamber according to claim 3, which is characterized in that further include central axis, upper flange, lower flange and ripple
Pipe, wherein
The central axis is vertically arranged, and is connect respectively with the lower end of the probe and the lower flange；
The upper flange is set in around the central axis, and is connect with the sealed bottom of the reaction chamber；
The lower flange is carried by the compressed spring, and is connect with the movable contact；
The bellows-sheathed is located at around the central axis, and between the upper flange and lower flange, and respectively with two
Person is tightly connected.
5. reaction chamber according to claim 4, which is characterized in that the lower flange and the movable contact are using separable
Mode connect.
6. reaction chamber according to claim 5, which is characterized in that the bottom of the lower flange is provided with sphere-contact
Portion, and contact bar is accordingly vertically arranged on the movable contact, the upper surface of the contact bar is plane；
The sphere-contact portion is in contact with the upper surface of the contact bar.
7. reaction chamber according to claim 1, which is characterized in that the probe is made of insulating materials.
8. reaction chamber according to claim 1, which is characterized in that the upper surface of the probe has circular arc chamfering, with
It realizes and the pallet smooth engagement.
9. reaction chamber according to any one of claims 1 to 8, which is characterized in that further include control unit, for reading
The digital signal issued by the Workpiece detecting device is taken, and judges whether place on the pedestal according to the digital signal
There is the pallet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510777620.0A CN106702353B (en) | 2015-11-13 | 2015-11-13 | Reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510777620.0A CN106702353B (en) | 2015-11-13 | 2015-11-13 | Reaction chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106702353A CN106702353A (en) | 2017-05-24 |
| CN106702353B true CN106702353B (en) | 2019-03-12 |
Family
ID=58930344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510777620.0A Active CN106702353B (en) | 2015-11-13 | 2015-11-13 | Reaction chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106702353B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022051581A1 (en) * | 2020-09-03 | 2022-03-10 | Applied Materials, Inc. | Pedestal support design for precise chamber matching and process control |
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| JP2003234330A (en) * | 2002-02-12 | 2003-08-22 | Tokyo Electron Ltd | Treated body temperature detecting apparatus for vacuum treatment apparatus and vacuum treatment apparatus having the treated body temperature detecting apparatus |
| CN2600102Y (en) * | 2002-12-26 | 2004-01-21 | 钮宏文 | Alarm device for infusion |
| CN2854505Y (en) * | 2005-12-05 | 2007-01-03 | 邵文远 | Three-D contact measuring probe |
| CN101322035A (en) * | 2005-12-05 | 2008-12-10 | 日本发条株式会社 | Probe card |
| JP2013190270A (en) * | 2012-03-13 | 2013-09-26 | Nidec-Read Corp | Probe and connection jig |
| CN103465266A (en) * | 2013-09-10 | 2013-12-25 | 光垒光电科技（上海）有限公司 | Semiconductor processing system, substrate tray and mechanical hand |
| CN203983237U (en) * | 2014-07-11 | 2014-12-03 | 精技电子（南通）有限公司 | A kind of arranging machine bin checkout gear automatically |
-
2015
- 2015-11-13 CN CN201510777620.0A patent/CN106702353B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003234330A (en) * | 2002-02-12 | 2003-08-22 | Tokyo Electron Ltd | Treated body temperature detecting apparatus for vacuum treatment apparatus and vacuum treatment apparatus having the treated body temperature detecting apparatus |
| CN2600102Y (en) * | 2002-12-26 | 2004-01-21 | 钮宏文 | Alarm device for infusion |
| CN2854505Y (en) * | 2005-12-05 | 2007-01-03 | 邵文远 | Three-D contact measuring probe |
| CN101322035A (en) * | 2005-12-05 | 2008-12-10 | 日本发条株式会社 | Probe card |
| JP2013190270A (en) * | 2012-03-13 | 2013-09-26 | Nidec-Read Corp | Probe and connection jig |
| CN103465266A (en) * | 2013-09-10 | 2013-12-25 | 光垒光电科技（上海）有限公司 | Semiconductor processing system, substrate tray and mechanical hand |
| CN203983237U (en) * | 2014-07-11 | 2014-12-03 | 精技电子（南通）有限公司 | A kind of arranging machine bin checkout gear automatically |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022051581A1 (en) * | 2020-09-03 | 2022-03-10 | Applied Materials, Inc. | Pedestal support design for precise chamber matching and process control |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106702353A (en) | 2017-05-24 |
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| CB02 | Change of applicant information |
Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone Applicant after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Applicant before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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