CN106684020B - A kind of solar silicon wafers surface cleaning processing method - Google Patents
A kind of solar silicon wafers surface cleaning processing method Download PDFInfo
- Publication number
- CN106684020B CN106684020B CN201611164504.2A CN201611164504A CN106684020B CN 106684020 B CN106684020 B CN 106684020B CN 201611164504 A CN201611164504 A CN 201611164504A CN 106684020 B CN106684020 B CN 106684020B
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- CN
- China
- Prior art keywords
- cleaning
- box body
- cleaning groove
- silicon wafers
- solar silicon
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- 238000004140 cleaning Methods 0.000 title claims abstract description 115
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 46
- 239000010703 silicon Substances 0.000 title claims abstract description 46
- 235000012431 wafers Nutrition 0.000 title claims abstract description 45
- 238000003672 processing method Methods 0.000 title claims abstract description 8
- 230000007246 mechanism Effects 0.000 claims abstract description 71
- 238000001035 drying Methods 0.000 claims abstract description 42
- 238000009434 installation Methods 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 238000002955 isolation Methods 0.000 claims abstract description 4
- 239000002253 acid Substances 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 238000010981 drying operation Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000009991 scouring Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The present invention relates to a kind of solar silicon wafers surface cleaning processing method, used system includes installation support frame；Support frame is installed and is equipped with cleaning groove mechanism, first, second is dried case, four mechanical shifting mechanisms and three pairs of cleaning groove mechanism tool hand components；The cleaning groove mechanism further includes having multiple solar silicon wafers carrying gailys decorated basket, and the solar silicon wafers carrying gaily decorated basket is equipped with several for the isolation board of solar silicon wafers to be isolated；The drying process case includes dry box body, circulating fan and heating unit；The front and back side of dry box body is equipped with the chamber door moved up and down, and wherein side constitutes the entrance of dry box body, and the other side constitutes the outlet of dry box body；Left and right sides in dry box body is respectively provided with the gaily decorated basket case inner support mobile mechanism that a front and back is moved towards.The cleaning operation that the present invention is suitable for solar battery uses, has higher automatically working performance.Cleaning procedure of the present invention, solar battery can obtain good cleaning effect.
Description
Technical field
The present invention relates to a kind of solar silicon wafers surface cleaning processing methods, belong to solar battery working process technology neck
Domain.
Background technique
It is very high to silicon chip surface cleaning requirement during solar battery sheet is manufactured, it avoids during cleaning
Impurity is introduced, so that its using effect is influenced, therefore, it is necessary to improve at solar silicon wafers surface cleaning using suitable mode
Effect is managed, preferably to improve solar silicon wafers surface cleaning treatment effect.General solar silicon wafers surface cleaning uses
Cleaning solution carries out, and energy consumption is high for this cleaning way, and high to environmental requirement, suitable for mass production, but in actual production, the sun
The surface cleaning of energy silicon wafer is also required to be improved using other modes.
Summary of the invention
The purpose of the present invention is to provide a kind of solar silicon wafers surface cleaning processing methods, preferably to improve the sun
It can Battery disposal effect.
To achieve the goals above, technical scheme is as follows.
A kind of solar silicon wafers surface cleaning processing method, used system include installation support frame；It installs on support frame
Case, four mechanical shifting mechanisms and three pairs of cleaning groove mechanism tool hand components are dried equipped with cleaning groove mechanism, first, second；
The cleaning groove mechanism further includes having multiple solar silicon wafers carrying gailys decorated basket, and the solar silicon wafers carrying gaily decorated basket is equipped with several be used for
The isolation board of solar silicon wafers is isolated；The drying process case includes dry box body, circulating fan and heating unit；It is dry
The left and right sidewall of box body is fixed on installation support frame；The front and back side of dry box body is equipped with the chamber door moved up and down, wherein
Side constitutes the entrance of dry box body, and the other side constitutes the outlet of dry box body；Left and right sides in dry box body is respectively set
The gaily decorated basket case inner support mobile mechanism for thering is a front and back to move towards；Circulating fan is installed in the top or bottom of dry box body, heat
Energy device is then located between circulating fan and dry box body；First be dried case drying box body entrance chamber door except and
One is respectively provided on the installation support frame of the left and right sides except the outlet chamber door of the drying box body of second drying process case
The gaily decorated basket interval support mobile mechanism of front and back trend；First is dried the outlet chamber door of the drying box body of case and the second drying
Going out the drying box body that the solar silicon wafers carrying gaily decorated basket is dried case from first is equipped between the entrance chamber door for the treatment of box
The solar silicon wafers carrying gaily decorated basket transfer device of the inlet tank of the second drying process case outdoors is transferred to outside mouth chamber door；Clean scouring machine
Structure tool hand component includes cleaning groove mechanism tool hand main body；Three pairs of cleaning groove mechanism tool hand components are sequentially located at cleaning groove mechanism
Top；Cleaning groove mechanism tool hand main body slides up and down cooperation close to one end of corresponding dry box body and installation support frame, clearly
Washing trough mechanism tool hand main body is equipped with gaily decorated basket cleaning support notch, gaily decorated basket cleaning support far from one end of corresponding dry box body
Notch is located at the top of corresponding cleaning groove body.
The lye for cleaning solar silicon wafers, the second rinse bath are placed in the cleaning groove body of first cleaning groove mechanism
The acid solution for cleaning solar silicon wafers is placed in the cleaning groove body of mechanism；Third is cleaned in the cleaning groove body of groove mechanism
It is placed with the deionized water for clean solar silicon wafers.When cleaning operation, solar battery is inserted in solar silicon wafers and holds
It carries in the gaily decorated basket.The solar battery being inserted in the solar silicon wafers carrying gaily decorated basket is sent by gaily decorated basket interval support mobile mechanism first
Onto the cleaning groove mechanism tool hand main body of the first cleaning groove mechanism tool hand component, subsequently into the clean tank of the first cleaning groove mechanism
First time cleaning is carried out in main body, is sent into the first drying box body for being dried case using mechanical shifting mechanism after the completion of cleaning
It is inside dried, the clean tank for being sent into the second cleaning groove mechanism is taken out in the drying box body for being then dried case from first again
Second of cleaning operation is carried out in main body, is then retransferred in the cleaning groove body for being sent into third cleaning groove mechanism and is carried out third time
Then cleaning enters back into the drying box body of the second drying process case and carries out second of drying.Solar battery is by three times
Cleaning operation is completed after cleaning and twice drying operation.
Invention has the beneficial effects that: the present invention be suitable for solar battery cleaning operation use, have it is higher from
Dynamicization working performance.Cleaning procedure of the present invention, solar battery can obtain good cleaning effect.
Specific embodiment
A specific embodiment of the invention is described below with reference to embodiment, to better understand the present invention.
Embodiment
Solar silicon wafers surface cleaning processing method in the embodiment of the present invention, used system include installation support frame；
Support frame is installed and is equipped with cleaning groove mechanism, first, second is dried case, four mechanical shifting mechanisms and three pairs of cleaning scouring machines
Structure tool hand component；The cleaning groove mechanism further includes having multiple solar silicon wafers carrying gailys decorated basket, and solar silicon wafers carry on the gaily decorated basket
Equipped with several for the isolation board of solar silicon wafers to be isolated；The drying process case includes dry box body, circulating fan
And heating unit；The left and right sidewall of dry box body is fixed on installation support frame；The front and back side of dry box body, which is equipped with, above to be moved down
Dynamic chamber door, wherein side constitutes the entrance of dry box body, and the other side constitutes the outlet of dry box body；In dry box body
Left and right sides be respectively provided with one front and back move towards gaily decorated basket case inner support mobile mechanism；Circulating fan is installed in the top of dry box body
Portion or bottom, heating unit are then located between circulating fan and dry box body；The drying box body of first drying process case enters
On the installation support frame of the left and right sides except mouth chamber door and except the outlet chamber door of the drying box body of the second drying process case
It is respectively provided with the gaily decorated basket interval support mobile mechanism moved towards a front and back；First is dried the EXPORT CARTON of the drying box body of case
It is equipped between door and the entrance chamber door of the second drying process case and solar silicon wafers is carried the gaily decorated basket from the dry of the first drying process case
The EXPORT CARTON of dry box body is transferred to the solar silicon wafers carrying gaily decorated basket transfer of the inlet tank of the second drying process case outdoors outdoors
Mechanism；Cleaning groove mechanism tool hand component includes cleaning groove mechanism tool hand main body；Three pairs of cleaning groove mechanism tool hand components are sequentially set
In the top of cleaning groove mechanism；Groove mechanism tool hand main body is cleaned on one end and installation support frame of corresponding dry box body
Lower slider cooperation, cleaning groove mechanism tool hand main body are equipped with gaily decorated basket cleaning support notch far from one end of corresponding dry box body,
Gaily decorated basket cleaning support notch is located at the top of corresponding cleaning groove body.
The lye for cleaning solar silicon wafers, the second rinse bath are placed in the cleaning groove body of first cleaning groove mechanism
The acid solution for cleaning solar silicon wafers is placed in the cleaning groove body of mechanism；Third is cleaned in the cleaning groove body of groove mechanism
It is placed with the deionized water for clean solar silicon wafers.When cleaning operation, solar battery is inserted in solar silicon wafers and holds
It carries in the gaily decorated basket.The solar battery being inserted in the solar silicon wafers carrying gaily decorated basket is sent by gaily decorated basket interval support mobile mechanism first
Onto the cleaning groove mechanism tool hand main body of the first cleaning groove mechanism tool hand component, subsequently into the clean tank of the first cleaning groove mechanism
First time cleaning is carried out in main body, is sent into the first drying box body for being dried case using mechanical shifting mechanism after the completion of cleaning
It is inside dried, the clean tank for being sent into the second cleaning groove mechanism is taken out in the drying box body for being then dried case from first again
Second of cleaning operation is carried out in main body, is then retransferred in the cleaning groove body for being sent into third cleaning groove mechanism and is carried out third time
Then cleaning enters back into the drying box body of the second drying process case and carries out second of drying.Solar battery is by three times
Cleaning operation is completed after cleaning and twice drying operation.
The above is a preferred embodiment of the present invention, it is noted that for those skilled in the art
For, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (1)
1. a kind of solar silicon wafers surface cleaning processing method, it is characterised in that: used system includes installation support frame；Installation
Support frame is equipped with cleaning groove mechanism, and first, second is dried case, four mechanical shifting mechanisms and three pairs of cleaning groove mechanism tools
Hand component；The cleaning groove mechanism further includes having multiple solar silicon wafers carrying gailys decorated basket, and the solar silicon wafers carrying gaily decorated basket is equipped with
Several isolation boards for being used to be isolated solar silicon wafers；The drying process case includes dry box body, circulating fan and heat
It can device；The left and right sidewall of dry box body is fixed on installation support frame；The front and back side of dry box body, which is equipped with, to be moved up and down
Chamber door, wherein side constitutes the entrance of dry box body, and the other side constitutes the outlet of dry box body；A left side in dry box body
Right side is respectively provided with the gaily decorated basket case inner support mobile mechanism that a front and back is moved towards；Circulating fan be installed in dry box body top or
Bottom, heating unit are then located between circulating fan and dry box body；First is dried the inlet tank of the drying box body of case
It is each on the installation support frame of the left and right sides except door and except the outlet chamber door of the drying box body of the second drying process case
The gaily decorated basket interval support mobile mechanism moved towards equipped with a front and back；Described first is dried the EXPORT CARTON of the drying box body of case
It is equipped between door and the entrance chamber door of the second drying process case and solar silicon wafers is carried the gaily decorated basket from the dry of the first drying process case
The EXPORT CARTON of dry box body is transferred to the solar silicon wafers carrying gaily decorated basket transfer of the inlet tank of the second drying process case outdoors outdoors
Mechanism；The cleaning groove mechanism tool hand component includes cleaning groove mechanism tool hand main body；Three pairs of cleaning groove mechanism tool hand components are suitable
The secondary top for being located at cleaning groove mechanism；The one end and installation of the cleaning groove mechanism tool hand main body close to corresponding dry box body
Support frame slides up and down cooperation；The one end of the cleaning groove mechanism tool hand main body far from corresponding dry box body is clear equipped with the gaily decorated basket
Clean support notch, gaily decorated basket cleaning support notch are located at the top of corresponding cleaning groove body；The cleaning of first cleaning groove mechanism
It is placed with the lye for cleaning solar silicon wafers in groove body, is placed with and is used in the cleaning groove body of the second cleaning groove mechanism
The acid solution of cleaning solar silicon wafers；It is placed in the cleaning groove body of third cleaning groove mechanism for clean solar silicon wafers
Deionized water；When cleaning operation, solar battery is inserted in the solar silicon wafers carrying gaily decorated basket；It is inserted in solar silicon wafers carrying
Solar battery in the gaily decorated basket is sent to the clear of the first cleaning groove mechanism tool hand component by gaily decorated basket interval support mobile mechanism first
In washing trough mechanism tool hand main body, subsequently into first time cleaning is carried out in the cleaning groove body of the first cleaning groove mechanism, clean
It is dried at rear be sent into the drying box body of the first drying process case using mechanical shifting mechanism, it is then dry from first again
It is taken out in the drying box body for the treatment of box in the cleaning groove body for being sent into the second cleaning groove mechanism and carries out second of cleaning operation, so
It is retransferred in the cleaning groove body for being sent into third cleaning groove mechanism afterwards and carries out third time cleaning, then enter back into the second drying process
Second of drying is carried out in the drying box body of case；Solar battery is cleaned by cleaning and completing after drying operation three times twice
Operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611164504.2A CN106684020B (en) | 2016-12-15 | 2016-12-15 | A kind of solar silicon wafers surface cleaning processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611164504.2A CN106684020B (en) | 2016-12-15 | 2016-12-15 | A kind of solar silicon wafers surface cleaning processing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106684020A CN106684020A (en) | 2017-05-17 |
| CN106684020B true CN106684020B (en) | 2019-10-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611164504.2A Active CN106684020B (en) | 2016-12-15 | 2016-12-15 | A kind of solar silicon wafers surface cleaning processing method |
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| CN (1) | CN106684020B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108336004B (en) * | 2018-04-18 | 2023-09-08 | 冠礼控制科技（上海）有限公司 | Full-automatic wet processing equipment with single batch of four-flower basket synchronous operation |
| CN111085497A (en) * | 2019-12-18 | 2020-05-01 | 武汉百臻半导体科技有限公司 | Polycrystalline silicon wafer cleaning system and cleaning method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202180065U (en) * | 2011-07-26 | 2012-04-04 | 韩华新能源（启东）有限公司 | Automatic cleaning equipment for solar silicon wafer before diffusion |
| CN204074616U (en) * | 2014-09-23 | 2015-01-07 | 浙江昊能光电有限公司 | A kind of ultrasonic wave solar silicon wafers cleaning machine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4085356B2 (en) * | 2001-09-28 | 2008-05-14 | 株式会社Ｓｕｍｃｏ | Cleaning and drying method for semiconductor wafer |
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2016
- 2016-12-15 CN CN201611164504.2A patent/CN106684020B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202180065U (en) * | 2011-07-26 | 2012-04-04 | 韩华新能源（启东）有限公司 | Automatic cleaning equipment for solar silicon wafer before diffusion |
| CN204074616U (en) * | 2014-09-23 | 2015-01-07 | 浙江昊能光电有限公司 | A kind of ultrasonic wave solar silicon wafers cleaning machine |
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| Publication number | Publication date |
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| CN106684020A (en) | 2017-05-17 |
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