CN106681107A - System and method for controlling concentration of photoresist - Google Patents
System and method for controlling concentration of photoresist Download PDFInfo
- Publication number
- CN106681107A CN106681107A CN201710099107.XA CN201710099107A CN106681107A CN 106681107 A CN106681107 A CN 106681107A CN 201710099107 A CN201710099107 A CN 201710099107A CN 106681107 A CN106681107 A CN 106681107A
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- time
- drug slot
- real
- control signal
- photoresistance concentration
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention provides a system and method for controlling the concentration of a photoresist. The system comprises a medicine tank and a controller, wherein the medicine tank is provided with an automatic valve; the automatic valve is used for being opened or closed according to a control signal; and the controller is used for generating and outputting the control signal according to real-time concentration of the photoresist of a liquid medicine in the medicine tank. According to the system and the method, the usage amount of the stripped liquid medicine can be reduced and the concentration of the photoresist of the liquid medicine in the medicine tank is kept stable.
Description
Technical field
The invention belongs to display floater manufacture technology field, specifically, more particularly to a kind of photoresistance concentration control system
And method.
Background technology
In LTPS (Low Temperature Poly-silicon, low temperature polycrystalline silicon) or TFT (Thin Film
Transistor, thin film transistor (TFT)) in LCD (Liquid Crystal Display, liquid crystal display) production process, generally make
Photoresistance is peeled off with peel-off device.Because of process requirement (such as cleaning ability, photoresistance clearance etc. to require), need to be to peel-off device medicine
Photoresistance concentration in liquid is controlled.To control the photoresistance concentration in medicinal liquid, generally adopt forced drainage or change drug slot Chinese medicine
The modes such as liquid, photoresistance concentration therein is controlled at one than relatively low level.
Forced drainage mode is usually temporally or production piece number is carrying out, i.e., (such as 5min) or often give birth at set intervals
1 is produced, drug slot is drained the medicinal liquid of certain volume, then supplements the new medicinal liquid of certain volume, so as to maintain the light of drug slot herb liquid
Resistance concentration.
But, either by the way of the time is still controlled using photoresistance concentration in producing piece number come to medicinal liquid,
It is just as using the amount of new medicinal liquid and old medicinal liquid forced drainage.So new medicinal liquid stage (when i.e. photoresistance concentration is very low),
Forced drainage has waste to medicinal liquid, and old medicinal liquid stage (when photoresistance concentration is of a relatively high), photoresistance concentration has the risk of super rule
It is very big.
The content of the invention
To solve problem above, the invention provides a kind of photoresistance concentration control system and method, peel off medicine for saving
Liquid usage amount, and ensure that the photoresistance concentration of drug slot herb liquid keeps stable.
According to an aspect of the invention, there is provided a kind of photoresistance concentration control system, including：
Drug slot, which is provided with automatic valve, and the automatic valve is for opening or closing according to control signal；
Controller, produces and exports the control signal for the real-time photoresistance concentration according to the drug slot herb liquid.
According to one embodiment of present invention, also including photoresistance concentration analyzer, for measuring the drug slot herb liquid
Real-time photoresistance concentration, and the real-time photoresistance concentration that measurement is obtained is sent to into the controller.
According to one embodiment of present invention, the controller is further included：
Receiver module, for obtaining the real-time photoresistance concentration of the photoresistance concentration analyzer output；
Drain time computing module, for according to the real-time photoresistance concentration, based on real-time photoresistance concentration and drug slot discharge opeing
Time history form calculates the drug slot drain time under the real-time photoresistance concentration of correspondence；
Signal generator module, for being produced according to the drug slot drain time and exporting the control signal.
According to one embodiment of present invention, the control signal includes the first control signal and the second control signal, its
In,
First control signal is used to controlling the automatic valve and opens so that the drug slot carries out discharge opeing, and described second
Control signal is used to controlling the automatic valve and closes so that the drug slot stops discharge opeing, first control signal and described the
Time interval between two control signals is the drug slot drain time.
According to one embodiment of present invention, the real-time photoresistance concentration is expressed as with drug slot drain time relational expression：
Y=K (X-X0)+T0
Wherein, Y represents drug slot drain time, and X represents real-time photoresistance concentration, and K represents the first parameter, X0Represent target photoresistance
Concentration, T0Represent the second parameter.
According to another aspect of the present invention, a kind of photoresistance concentration control method is additionally provided, including：
Obtain the real-time photoresistance concentration of drug slot herb liquid；
Produced and output control signal according to the real-time photoresistance concentration, to control to open or close the automatic of the drug slot
Valve is carrying out discharge opeing；
The supplement new medicinal liquid equal with discharge opeing volume in the drug slot.
According to one embodiment of present invention, the real-time photoresistance concentration of the drug slot herb liquid passes through photoresistance concentration analyzer
Measurement is obtained.
According to one embodiment of present invention, produced according to the real-time photoresistance concentration and output control signal is further wrapped
Include following steps：
According to the real-time photoresistance concentration, based on real-time photoresistance concentration and the drug slot drain time relational expression corresponding photoresistance of calculating
Drug slot drain time under concentration；
Produced according to the drug slot drain time and export the control signal.
According to one embodiment of present invention, the control signal includes the first control signal and the second control signal, its
In,
First control signal is used to controlling the automatic valve and opens so that the drug slot carries out discharge opeing, and described second
Control signal is used to controlling the automatic valve and closes so that the drug slot stops discharge opeing, first control signal and described the
Time interval between two control signals is the drug slot drain time.
According to one embodiment of present invention, the real-time photoresistance concentration is expressed as with drug slot drain time relational expression：
Y=K (X-X0)+T0
Wherein, Y represents drug slot drain time, and X represents real-time photoresistance concentration, and K represents the first parameter, X0Represent target photoresistance
Concentration, T0Represent the second parameter.
Beneficial effects of the present invention：
The invention provides a kind of photoresistance concentration control system and method, by real-time monitoring and the drug slot herb liquid that obtains
Photoresistance concentration, with reference to the target photoresistance concentration in drug slot set in advance, using photoresistance concentration in drug slot set in advance with
The relational expression of drug slot solution discharge time, is calculated drug slot drain time to carry out discharge opeing, peels off medicinal liquid use so as to save
In measuring and ensureing drug slot solution, photoresistance concentration keeps stable.
Other features and advantages of the present invention will be illustrated in the following description, also, partly be become from description
Obtain it is clear that or being understood by implementing the present invention.The purpose of the present invention and other advantages can be by description, rights
In claim and accompanying drawing, specifically noted structure is realizing and obtain.
Description of the drawings
For the technical scheme being illustrated more clearly that in the embodiment of the present invention, embodiment will be described below needed for want
Accompanying drawing does simple introduction：
Fig. 1 is a kind of photoresistance concentration control system structure chart according to an embodiment of the invention；
Fig. 2 is method flow diagram according to an embodiment of the invention；
Fig. 3 is that the present invention according to an embodiment of the invention is contrasted with the photoresistance concentration curve trend of prior art
Figure；
Fig. 4 is the photoresistance concentration measurement and control schematic diagram of the present invention according to an embodiment of the invention and prior art.
Specific embodiment
Describe embodiments of the present invention below with reference to drawings and Examples in detail, whereby how the present invention is applied
Technological means solving technical problem, and reach technique effect realize that process can fully understand and implement according to this.Need explanation
As long as not constituting conflict, each embodiment and each feature in each embodiment in the present invention can be combined with each other,
The technical scheme for being formed is within protection scope of the present invention.
The invention provides a kind of photoresistance concentration control system, the photoresistance by real-time monitoring and in the drug slot that obtains is dense
Degree, with reference to the target photoresistance concentration in drug slot set in advance, using photoresistance concentration in drug slot set in advance and drug slot solution
The relational expression of drain time, is calculated drug slot drain time to carry out discharge opeing, peels off medicinal liquid usage amount so as to save, and ensures
In drug slot solution, photoresistance concentration keeps stable.
Photoresistance concentration control system structure chart according to an embodiment of the invention is illustrated in figure 1, below with reference to Fig. 1
It is next that the present invention is described in detail.
As shown in figure 1, the photoresistance concentration control system includes drug slot 11 and controller 12.Wherein, drug slot 11 is provided with certainly
Movable valve 111, automatic valve 111 are automatically opened up according to control signal or are automatically switched off；Controller 12 is for according in drug slot 11
Photoresistance concentration produce and output control signal.
In the present invention, the real-time photoresistance concentration of 11 herb liquid of drug slot is obtained by monitoring.In real-time photoresistance concentration and mesh
When mark photoresistance concentration occurs to deviate, controller 12 sends control signal.The control signal is used for opening or closing in drug slot 11
Automatic valve 111.When automatic valve 111 is opened, drug slot 11 carries out discharge opeing；When automatic valve 111 is closed, drug slot 11 stops
Discharge opeing.By the opening time for controlling automatic valve 111, the lifting rate of drug slot 11 can be controlled.
After 11 discharge opeing of drug slot, the photoresistance concentration in its internal residue medicinal liquid does not change, still for 11 discharge opeing of drug slot before
Concentration.Photoresistance concentration meeting as photoresistance concentration can gradually increase with the carrying out of production process in medicinal liquid, during 11 discharge opeing of drug slot
More than new medicinal liquid, (for convenience of understanding, without photoresistance in the new medicinal liquid of setting, its photoresistance concentration is photoresistance concentration zero).So, in medicine
After 11 discharge opeing of groove the new medicinal liquid of supplement, it is possible to reduce the photoresistance concentration of 11 herb liquid of drug slot.The new medicinal liquid of certain volume is supplemented,
Ensure that the photoresistance concentration of 11 herb liquid of drug slot reaches target photoresistance concentration set in advance.When new medicinal liquid is supplemented, can
To adopt manual type, it would however also be possible to employ automaton is automatically replenished new medicinal liquid according to discharge opeing volume, the invention is not restricted to this.
According to one embodiment of present invention, the system also includes photoresistance concentration analyzer 13, for measuring in drug slot 11
The real-time photoresistance concentration of medicinal liquid, and the real-time photoresistance concentration that measurement is obtained is sent to into controller 12.Specifically, as shown in figure 1,
Photoresistance concentration analyzer 13 is connected with drug slot 11 and controller 12 respectively, the sensor monitor in real time in photoresistance concentration analyzer 13
The real-time photoresistance concentration that measurement is obtained simultaneously is sent to controller 12 by the photoresistance concentration of drug slot herb liquid.Monitoring obtain it is real-time
When photoresistance concentration exceeds target photoresistance concentration certain limit, controller 12 is dense according to the real-time photoresistance concentration and target photoresistance
Degree, is calculated the drain time of drug slot 11 with reference to the intrinsic algorithm of its storage inside, and according to the drain time output control
Signal is controlling to open or close the automatic valve 111 in drug slot 11.
According to one embodiment of present invention, the controller 12 further includes receiver module, drain time computing module
And signal generator module.Wherein, receiver module is connected with photoresistance concentration analyzer 13, defeated for obtaining photoresistance concentration analyzer 13
The real-time photoresistance concentration for going out；Drain time computing module is connected with receiver module, for according to real-time photoresistance concentration, based on photoresistance
Drug slot drain time under concentration photoresistance concentration corresponding with the calculating of drug slot drain time relational expression；When signal generator module and discharge opeing
Between computing module connection, for according to drug slot drain time produce and output control signal.By the structure of the above controller
Understand, the controller 12 can calculate the drain time for obtaining drug slot 12 according to real-time photoresistance densitometer.
According to one embodiment of present invention, the control signal includes the first control signal and the second control signal.Wherein,
First control signal is used to controlling automatic valve 111 and opens so that drug slot 11 carries out discharge opeing, the second control signal be used to controlling from
Movable valve 111 is closed so that the stopping discharge opeing of drug slot 11, the time interval between the first control signal and the second control signal is medicine
The drain time of groove 11.That is, in 12 output control signal of controller, first exporting the first control signal makes drug slot 11
Automatic valve 111 is opened.After automatic valve 111 remains on certain hour, controller 12 exports the second control signal,
Second control signal closes the automatic valve 111 of drug slot 11 so that drug slot 11 stops discharge opeing.Certain hour correspondence herein
12 calculated drug slot drain time of controller.
According to one embodiment of present invention, the real-time photoresistance concentration is expressed as with drug slot drain time relational expression：
Y=K (X-X0)+T0 (1)
Wherein, Y represents drug slot drain time, and X represents real-time photoresistance concentration, and K represents the first parameter, X0Represent target photoresistance
Concentration, T0Represent the second parameter.
In formula (1), parameter K and T0, and target photoresistance concentration X0Known quantity is, real-time photoresistance concentration X is being known
Afterwards, drug slot drain time Y can be calculated by formula (1).Parameter X0Can preset, K and T0And Y-X relations can be with
Obtained using a large amount of statistical datas and related algorithm.When Y-X relational expressions are obtained, both sides relation form can be first set, is one
Sublinear relation, or secondary relation or other relations.This is illustrated as a example by sentencing once linear relationship, but the present invention is not limited
In this.When Y-X relational expressions being set up using once linear relationship, first set up once linear model, then give target photoresistance dense
Degree X0, parameter K and T0Statistical experiment data can be utilized, is obtained using regression algorithm.
According to another aspect of the present invention, a kind of photoresistance concentration control method is additionally provided, as shown in Fig. 2 the method
Including following step.First in step s 110, obtain the real-time photoresistance concentration of 12 herb liquid of drug slot；Then in step
In S120, produced according to real-time photoresistance concentration and output control signal, entered with controlling to open or close the automatic valve of drug slot
Row discharge opeing；In step s 130, the supplement new medicinal liquid equal with discharge opeing volume in drug slot, so that the photoresistance in drug slot finally
Concentration is maintained at target photoresistance concentration.
According to one embodiment of present invention, the real-time photoresistance concentration of drug slot herb liquid is measured by photoresistance concentration analyzer
Obtain.
According to one embodiment of present invention, according to real-time photoresistance concentration produce and output control signal further include with
Lower step.The real-time photoresistance concentration in drug slot is obtained first；Then according to real-time photoresistance concentration, based on real-time photoresistance concentration and medicine
Groove drain time relational expression calculates the drug slot drain time under correspondence photoresistance concentration；Produce finally according to drug slot drain time and defeated
Go out the control signal.
According to one embodiment of present invention, the control signal includes the first control signal and the second control signal, wherein,
First control signal is used to controlling automatic valve and opens so that drug slot carries out discharge opeing, and the second control signal is used to control automatic valve
Close so that drug slot stopping discharge opeing, the time interval between the first control signal and the second control signal is drug slot drain time.
According to one embodiment of present invention, real-time photoresistance concentration and drug slot drain time relational expression are expression formula (1).
Checking explanation is carried out to the present invention below by way of a specific example.Time and life are passed through using prior art
Produce piece number to determine that, during drug slot lifting rate, setup parameter is：2 discharge opeing 40s+4min discharge opeings two conditions of 40s, draining flow is
3L/min.Calculating the average lifting rate per piece is：40s/2 pieces * 3L/60s+100s/60s* (40s/4) * (3L/60s)=
1.83L/ piece.
And system and method for the present invention are adopted, it is 1.5L/ pieces to obtain lifting rate by experiment, so using the present invention
Medicinal liquid usage amount can be saved.Photoresistance concentration curve trend comparison diagram according to an embodiment of the invention is illustrated in figure 3,
Substantially remained near target photoresistance concentration using photoresistance concentration in the medicinal liquid that the present invention is obtained, and prior art adopt pass through
The real-time photoresistance concentration that piece number/time mode is obtained is larger with target photoresistance concentration deviation.Fig. 4 two kinds of sides shown in correspondence Fig. 3
The photoresistance concentration measurement and control schematic diagram that method is obtained, from the Fig. 4, the present invention enables to the photoresistance concentration of drug slot herb liquid always
It is maintained near target photoresistance concentration.Calculated with peeling off medicinal liquid 16 yuan/L, the moon production capacity 45000, year benefit be 45000*
(1.83-1.5) ten thousand yuan of * 16*12=259.2.
While it is disclosed that embodiment as above, but described content only to facilitate understand the present invention and adopt
Embodiment, is not limited to the present invention.Technical staff in any the technical field of the invention, without departing from this
On the premise of the disclosed spirit and scope of invention, any modification and change can be made in the formal and details implemented,
But the scope of patent protection of the present invention, still must be defined by the scope of which is defined in the appended claims.
Claims (10)
1. a kind of photoresistance concentration control system, including：
Drug slot, which is provided with automatic valve, and the automatic valve is for opening or closing according to control signal；
Controller, produces and exports the control signal for the real-time photoresistance concentration according to the drug slot herb liquid.
2. system according to claim 1, it is characterised in that also including photoresistance concentration analyzer, for measuring the medicine
The real-time photoresistance concentration of groove herb liquid, and the real-time photoresistance concentration that measurement is obtained is sent to into the controller.
3. system according to claim 2, it is characterised in that the controller is further included：
Receiver module, for obtaining the real-time photoresistance concentration of the photoresistance concentration analyzer output；
Drain time computing module, for according to the real-time photoresistance concentration, based on real-time photoresistance concentration and drug slot drain time
Relational expression calculates the drug slot drain time under the real-time photoresistance concentration of correspondence；
Signal generator module, for being produced according to the drug slot drain time and exporting the control signal.
4. system according to claim 3, it is characterised in that the control signal includes the first control signal and the second control
Signal processed, wherein,
First control signal is used to control the automatic valve opening so that the drug slot carries out discharge opeing, second control
Signal is used to control the automatic valve closing so that the drug slot stops discharge opeing, first control signal and second control
Time interval between signal processed is the drug slot drain time.
5. the system according to claim 3 or 4, it is characterised in that the real-time photoresistance concentration is closed with drug slot drain time
It is that formula is expressed as：
Y=K (X-X0)+T0
Wherein, Y represents drug slot drain time, and X represents real-time photoresistance concentration, and K represents the first parameter, X0Target photoresistance concentration is represented,
T0Represent the second parameter.
6. a kind of photoresistance concentration control method, including：
Obtain the real-time photoresistance concentration of drug slot herb liquid；
Produced and output control signal according to the real-time photoresistance concentration, to control to open or close the automatic valve of the drug slot
To carry out discharge opeing；
The supplement new medicinal liquid equal with discharge opeing volume in the drug slot.
7. method according to claim 6, it is characterised in that the real-time photoresistance concentration of the drug slot herb liquid passes through photoresistance
Concentration analyzer is measured and is obtained.
8. the method according to claim 6 or 7, it is characterised in that produce and export control according to the real-time photoresistance concentration
Signal processed is further comprising the steps：
According to the real-time photoresistance concentration, based on real-time photoresistance concentration photoresistance concentration corresponding with the calculating of drug slot drain time relational expression
Under drug slot drain time；
Produced according to the drug slot drain time and export the control signal.
9. method according to claim 8, it is characterised in that the control signal includes the first control signal and the second control
Signal processed, wherein,
First control signal is used to control the automatic valve opening so that the drug slot carries out discharge opeing, second control
Signal is used to control the automatic valve closing so that the drug slot stops discharge opeing, first control signal and second control
Time interval between signal processed is the drug slot drain time.
10. method according to claim 8, it is characterised in that the real-time photoresistance concentration and drug slot drain time relation
Formula is expressed as：
Y=K (X-X0)+T0
Wherein, Y represents drug slot drain time, and X represents real-time photoresistance concentration, and K represents the first parameter, X0Target photoresistance concentration is represented,
T0Represent the second parameter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710099107.XA CN106681107A (en) | 2017-02-23 | 2017-02-23 | System and method for controlling concentration of photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710099107.XA CN106681107A (en) | 2017-02-23 | 2017-02-23 | System and method for controlling concentration of photoresist |
Publications (1)
| Publication Number | Publication Date |
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| CN106681107A true CN106681107A (en) | 2017-05-17 |
Family
ID=58861133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201710099107.XA Pending CN106681107A (en) | 2017-02-23 | 2017-02-23 | System and method for controlling concentration of photoresist |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107328729A (en) * | 2017-08-28 | 2017-11-07 | 深圳市华星光电技术有限公司 | One kind peels off medicine liquid ingredient method for measurement and system |
| CN107526193A (en) * | 2017-07-26 | 2017-12-29 | 武汉华星光电技术有限公司 | The control device and control method of photoresistance concentration |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1174343A (en) * | 1996-07-02 | 1998-02-25 | 株式会社平间理化研究所 | Management device of photoetching film stripping liquid |
| CN101634816A (en) * | 2008-07-24 | 2010-01-27 | 北京京东方光电科技有限公司 | Developer control system |
| CN204093404U (en) * | 2014-10-09 | 2015-01-14 | 李春红 | Medicine system |
| CN204613594U (en) * | 2015-05-14 | 2015-09-02 | 合肥鑫晟光电科技有限公司 | Stripper changes system |
-
2017
- 2017-02-23 CN CN201710099107.XA patent/CN106681107A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1174343A (en) * | 1996-07-02 | 1998-02-25 | 株式会社平间理化研究所 | Management device of photoetching film stripping liquid |
| CN101634816A (en) * | 2008-07-24 | 2010-01-27 | 北京京东方光电科技有限公司 | Developer control system |
| CN204093404U (en) * | 2014-10-09 | 2015-01-14 | 李春红 | Medicine system |
| CN204613594U (en) * | 2015-05-14 | 2015-09-02 | 合肥鑫晟光电科技有限公司 | Stripper changes system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107526193A (en) * | 2017-07-26 | 2017-12-29 | 武汉华星光电技术有限公司 | The control device and control method of photoresistance concentration |
| CN107328729A (en) * | 2017-08-28 | 2017-11-07 | 深圳市华星光电技术有限公司 | One kind peels off medicine liquid ingredient method for measurement and system |
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Application publication date: 20170517 |