CN106654814A - Dual-purpose excimer laser system useful for crystallization and stripping - Google Patents
Dual-purpose excimer laser system useful for crystallization and stripping Download PDFInfo
- Publication number
- CN106654814A CN106654814A CN201710137706.6A CN201710137706A CN106654814A CN 106654814 A CN106654814 A CN 106654814A CN 201710137706 A CN201710137706 A CN 201710137706A CN 106654814 A CN106654814 A CN 106654814A
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- module
- excimer laser
- light
- hot spot
- light beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0007—Applications not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
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- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
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- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
Abstract
The invention discloses a dual-purpose excimer laser system useful for crystallization and stripping. The dual-purpose excimer laser system comprises an excimer laser device, an attenuation module, a spot conversion module, a light guiding arm, a field lens, a projection lens and a control module. The dual-purpose excimer laser system is useful for crystallization and stripping, the two functions of crystallization and stripping can be realized on one suit of equipment, the system can be applied to display research and production industry, particularly the display industry of flexible organic light-emitting diodes, and the production expenses of crystallization and stripping can be greatly reduced.
Description
Technical field
It is specifically a kind of to can be used for the dual-purpose of crystallization and stripping the present invention relates to laser system field use in crystal film processing
Excimer laser system.
Background technology
Active matrix liquid crystal Display Technique and active organic electroluminescent Display Technique are currently advanced FPD skills
Art, used as the core component of active matrix driving, its performance determines the amount of transmitted information and information transmission of display to thin film transistor (TFT)
Efficiency.Compared with amorphous silicon film transistor, electron mobility has a raising of hundreds times to polycrystalline SiTFT, thus base
Development potentiality is had more in the flat-panel monitor of polycrystalline SiTFT.Preparing the method for polysilicon membrane mainly has chemical gas
Phase sedimentation, solid phase crystallization method, rapid thermal anneal methods, metal-induced lateral crystallization method, excimer-Laser crystallization method etc..Quasi-molecule
Laser is in ultraviolet band, and fuel factor is little, and pulse width, and the time of amorphous silicon membrane fusing recrystallization is short, drops to the full extent
Low damage of the crystallization process to substrate so that cheap glass, plastics even some flexible materials are likely to become substrate
Selection, production cost can be substantially reduced.In recent years, flexible display because it is lightweight, firm in structure, can be bent very
To crimping, it is considered as in following great development potentiality, presents the chance of new ideas design and new product development.Flexible display
Mainly include machine light emitting diode, Electronic Paper and liquid crystal, need display function layer during manufacture flexible display and
Peel off between rigid substrates.Such as production flexibility organic LED display, generally require in interim rigid carrier substrate
Upper formation flexible substrate substrate, prepares LED display elements on flexible substrate substrate, afterwards again using laser irradiation scan method
Flexible substrate substrate and interim rigid carrier substrate are peeled off.The ultraviolet light of flexible substrate base plate alignment molecular laser transmitting has
Fabulous absorption, using PRK through interim rigid carrier substrate irradiation scanning, flexible substrate substrate can well with
Rigid substrates are separated.
The content of the invention
It is an object of the invention to provide a kind of dual-purpose excimer laser system that can be used for crystallization and peel off, to realize crystallization
With two kinds of functions of stripping.
In order to achieve the above object, the technical solution adopted in the present invention is：
Can be used for crystallization and the dual-purpose excimer laser system peeled off, it is characterised in that：Including：
Excimer laser, the light beam of its output is rectangle, the hot spot short axle of light beam parallel to horizontal plane, major axis perpendicular to
Horizontal plane；
Attenuation module, the light beam of the excimer laser output is incident to attenuation module, and attenuation module swashs to quasi-molecule
The beam energy of light device output is adjusted；
Hot spot modular converter, the light beam Jing after attenuation module is adjusted is incident to hot spot modular converter, and hot spot modular converter will
Light beam regulation for light beam hot spot longer axis parallel in horizontal plane, short axle perpendicular to horizontal plane；
Light-conducting arm, it is made up of beam-expanding collimation module, the even optical module of major axis, the even optical module of short axle, reflecting module, Jing hot spots
Light beam after modular converter is adjusted sequentially passes through the hot spot major axis of beam-expanding collimation module beam-expanding collimation, the even optical module of major axis to light beam
After the even optical module of even light, short axle is to the even light of short axle of light beam, then the reflection of reflected module changes outgoing behind the direction of propagation；
Field lens and projection lens, the light beam of light-conducting arm outgoing is incident to field lens, is formed Jing after field lens filters off edge-light and is homogenized
Hot spot, homogenizes hot spot and is projected on surface of the work by projection lens；
Control module, it is connected with excimer laser control, to control excimer laser work.
The described dual-purpose excimer laser system that can be used for crystallization and peel off, it is characterised in that：The PRK
Device is 308nm xenon chloride excimer lasers.
The described dual-purpose excimer laser system that can be used for crystallization and peel off, it is characterised in that：Attenuation module is by polylith
Constitute along the ultraviolet attenuator that light path is arranged in order, each ultraviolet attenuator is each single-ended respectively to be driven by electric rotating machine, rotation
Motor is connected with control module, and by control module control electric rotating machine ultraviolet attenuator rotation is driven, to adjust laser output energy
Amount.
The described dual-purpose excimer laser system that can be used for crystallization and peel off, it is characterised in that：The hot spot modulus of conversion
Block is made up of two panels speculum, and the light beam after attenuation module regulation Jing after the reflection of two panels speculum, is converted to hot spot major axis successively
Parallel to horizontal plane, short axle perpendicular to horizontal plane light beam.
The described dual-purpose excimer laser system that can be used for crystallization and peel off, it is characterised in that：Also include energy measuring
Module, energy detection module is connected with control module, and energy detection module obtains the laser energy in light-conducting arm at reflecting module
And control module is fed back to, control module controls excimer laser output beam according to the signal that energy detection module is fed back
The energy density of hot spot.
It is an advantage of the invention that：
What the present invention was provided can be used for crystallization and the dual-purpose excimer laser system peeled off, and crystalline substance can be realized on a set of equipment
Change and peel off two kinds of functions.Optical system exports Gao Heng using undersized optical element and succinct Line beam shaping light path
It is vertical than and the uniform PRK linear light spot of Energy distribution, holistic cost substantially reduces.Can be real using the method for splicing scanning
Existing large area crystallization and stripping.Present invention can apply to research and production industry are shown, particularly flexible Organic Light Emitting Diode
Industry is shown, and crystallization and the producing cost peeled off can be substantially reduced.
Description of the drawings
Fig. 1 crystallization and the dual-purpose excimer laser system schematic diagram peeled off.
Fig. 2 attenuation module structural representations.
Fig. 3 light-conducting arm structural representations.
Fig. 4 cylindrical lens arrays
Fig. 5 projection lens is illustrated
Fig. 6 output line hot spot schematic diagrames.
Fig. 7 sample surfaces laser beam overlap ratio schematic diagrames.
Fig. 8 large area samples hot spot splicing scanning schematic diagram.
Specific embodiment
As shown in figure 1, system mainly includes excimer laser, attenuation module, hot spot modular converter, beam-expanding collimation mould
Block, major axis Mean optical module, the even optical module of short axle, reflecting module, field lens, projection lens.
Excimer laser selects 308nm xenon chloride excimer lasers, and output beam is rectangle, hot spot short axle parallel to
Horizontal plane, major axis is perpendicular to horizontal plane.Excimer laser output beam enters attenuation module, and attenuation module can be to light beam energy
Amount is adjusted.Attenuation module structure is as shown in Fig. 2 it is made up of the ultraviolet attenuator of polylith, and ultraviolet attenuator is single-ended by rotating
It rotates motor control, can control ultraviolet attenuator rotation by control module and adjust laser output energy.
The general major axis angle of divergence of excimer laser is big, and the short axle angle of divergence is little, and the major axis angle of divergence is about the several times of short axle, therefore
Short axle is more easy to be compressed.Therefore hot spot modular converter is set after attenuation module, and hot spot modular converter is by two panels speculum group into two
After secondary reflection, parallel to horizontal plane, short axle is perpendicular to horizontal plane for beam long axis.
After light beam is by hot spot module processing, beam and focus section transverse and longitudinal is inverted；Light beam is Jing after beam-expanding collimation module
Into the even optical module of major axis, the even optical module of short axle is entered back into, the light beam after homogenizing changes the direction of propagation by reflecting module, then leads to
Cross field lens and filter off its edge-light, to guarantee the sharpening of light spot edge, the hot spot Jing projection lens that homogenizes at last field lens is projected on
Surface of the work.
Pending workpiece is positioned in work stage, and work stage is three-dimensional precise mobile platform, and its motion is by control module control
System.Shielding gas is passed through work stage, and the workpiece of process is shielded, and shielding gas typically selects nitrogen or argon gas etc..Energy
The laser energy that amount detection module passes through outgoing at acquisition reflecting module, the energy of real-time monitoring laser beam feeds back to control mould
Block, consequently facilitating the energy density of real-time control system output facula.
In Fig. 1, light-conducting arm mainly includes beam-expanding collimation module, the even optical module of major axis, the even optical module of short axle and reflecting module,
Its concrete structure is as shown in Figure 3.To obtain preferable transverse and longitudinal ratio, shaping need to be respectively carried out to beam long axis, short axle, thus it is guide-lighting
Optical component adopts one-dimensional cylindrical structure in arm.The optical texture and frame for movement of light-conducting arm is as shown in figure 4, PRK
Enter from right-hand member, expand module including a piece of plano-concave cylindrical mirror and a piece of plano-convex cylindrical lens, be combined into galilean telescope system shape
Formula, while further have compressed the short axle angle of divergence, makes light beam aperture match with subsequent module.Expand aperture to be represented by：
D in formula1With D2Short axle light beam aperture before and after respectively expanding, f'1With f'2Respectively negative lens and positive lens
Effective focal length.
Major axis homogenizer module includes a piece of cylindrical lens array and a piece of cylinder condenser lens, short axle homogenizer module
Including two panels cylindrical lens array and a piece of condenser.Cylindrical lens array is as shown in Figure 4.Effective focal length is after double array combinations：
F' in formulaarrayFor the combined focal length of double arrays, farray1、f'array2The respectively effective focal length of two chip arrays, Δ is
The optical interval of double arrays.According to cylindrical lens array effective focal length computing formula, with reference to process-cycle, difficulty of processing, cost etc.
Factor, rationally arranges the parameter of array and condenser.Laser beam Jing after homogenizer module shaping changes direction by speculum
After be sent to field lens.
Projection lens is formed using three cylindrical lens combinations, effectively to eliminate aberration, as shown in Figure 5.At field lens
Uniform light spots are irradiated to the Line beam hot spot of sample surfaces as shown in fig. 6, being about 100mm by projection lens, wide about 0.3mm,
Edge clear, long side direction and short side direction Energy distribution are uniform, light spot energy density the largest of about 500mJ/cm2.Operate in crystalline substance
During change pattern, control module adjusts attenuation module by calculating, and so as to be set to the laser energy density up to sample surfaces, and leads to
The translational speed of control work stage and the tranmitting frequency of laser instrument are crossed, to control Duplication of the laser facula in sample surfaces.Example
Such as, amorphous crystallization of silicon is being formed in polysilicon process, laser beam overlap ratio needs the Duplication for reaching about 90%.Operate in stripping
During pattern, laser light glass or jewel substrate, high-energy-density linear light spot focuses on flexible material and substrate junction, same logical
Calculating control attenuation module is crossed, so as to control laser energy density, and by controlling the translational speed and laser instrument of work stage
Tranmitting frequency, to control Duplication of the laser facula in sample surfaces.Separation mode is operated in, flexible material is combined with substrate
The energy density of place's hot spot is relatively low, and Duplication is almost 0.The high Duplication of hot spot and low Duplication situation are as shown in Figure 7.
When crystallization or the Sample Width of stripping are less than or equal to Line beam spot length, only need to be along sample length direction
Scanning can complete the process to whole sample；If Sample Width is more than Line beam spot length, can be along sample length direction
Repeatedly round scanning is spliced, as shown in Figure 8.At this time, it may be necessary to pass through the translation that control module accurately controls sample stage, make to sweep
Retouch face preferably to splice.By the enforcement of the method, it is possible to achieve the process of large area sample.
Claims (5)
1. crystallization and the dual-purpose excimer laser system peeled off can be used for, it is characterised in that：Including：
Excimer laser, the light beam of its output is rectangle, and the hot spot short axle of light beam is parallel to horizontal plane, major axis perpendicular to level
Face；
Attenuation module, the light beam of the excimer laser output is incident to attenuation module, and attenuation module is to excimer laser
The beam energy of output is adjusted；
Hot spot modular converter, the light beam Jing after attenuation module is adjusted is incident to hot spot modular converter, and hot spot modular converter is by light beam
The hot spot longer axis parallel of light beam is adjusted in horizontal plane, short axle perpendicular to horizontal plane；
Light-conducting arm, it is made up of beam-expanding collimation module, the even optical module of major axis, the even optical module of short axle, reflecting module, the conversion of Jing hot spots
It is even to the hot spot major axis of light beam that light beam after module regulation sequentially passes through beam-expanding collimation module beam-expanding collimation, the even optical module of major axis
After the even optical module of light, short axle is to the even light of short axle of light beam, then the reflection of reflected module changes outgoing behind the direction of propagation；
Field lens and projection lens, the light beam of light-conducting arm outgoing is incident to field lens, is formed Jing after field lens filters off edge-light and homogenizes hot spot,
Homogenize hot spot and surface of the work is projected on by projection lens；
Control module, it is connected with excimer laser control, to control excimer laser work.
2. it is according to claim 1 can be used for crystallization and peel off dual-purpose excimer laser system, it is characterised in that：It is described
Excimer laser is 308nm xenon chloride excimer lasers.
3. it is according to claim 1 can be used for crystallization and peel off dual-purpose excimer laser system, it is characterised in that：Decay
Module is made up of polylith along the ultraviolet attenuator that light path is arranged in order, and each ultraviolet attenuator is each single-ended by electric rotating machine respectively
Drive, electric rotating machine is connected with control module, ultraviolet attenuator rotation is driven by control module control electric rotating machine, it is sharp to adjust
Light output energy.
4. it is according to claim 1 can be used for crystallization and peel off dual-purpose excimer laser system, it is characterised in that：It is described
Hot spot modular converter is made up of two panels speculum, and the light beam after attenuation module regulation Jing after the reflection of two panels speculum, is changed successively
For hot spot longer axis parallel in horizontal plane, short axle perpendicular to horizontal plane light beam.
5. it is according to claim 1 can be used for crystallization and peel off dual-purpose excimer laser system, it is characterised in that：Also wrap
Energy detection module is included, energy detection module is connected with control module, in energy detection module acquisition light-conducting arm at reflecting module
Laser energy and feed back to control module, the signal that control module is fed back according to energy detection module controls excimer laser
The energy density of the hot spot of output beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710137706.6A CN106654814A (en) | 2017-03-09 | 2017-03-09 | Dual-purpose excimer laser system useful for crystallization and stripping |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710137706.6A CN106654814A (en) | 2017-03-09 | 2017-03-09 | Dual-purpose excimer laser system useful for crystallization and stripping |
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ID=58847157
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| CN201710137706.6A Pending CN106654814A (en) | 2017-03-09 | 2017-03-09 | Dual-purpose excimer laser system useful for crystallization and stripping |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121830A (en) * | 2017-06-21 | 2017-09-01 | 山西大学 | A kind of use white light realizes the device and method of colored display |
| CN108067756A (en) * | 2016-11-07 | 2018-05-25 | 三星显示有限公司 | The control method of Laser crystallization equipment and crystallization laser beam |
| CN108335994A (en) * | 2017-12-28 | 2018-07-27 | 大族激光科技产业集团股份有限公司 | Wafer connection structure, chip connection method, chip stripping means and device |
| CN108346597A (en) * | 2017-12-28 | 2018-07-31 | 大族激光科技产业集团股份有限公司 | A kind of vacuum heating system, chip stripping off device and method |
| CN109378284A (en) * | 2018-10-24 | 2019-02-22 | 京东方科技集团股份有限公司 | Laser equipment and its working method |
| CN110385530A (en) * | 2019-07-15 | 2019-10-29 | 中国科学院合肥物质科学研究院 | A kind of method that quasi-molecule laser etching calcium fluoride crystal forms periodic stripe |
| CN110600367A (en) * | 2019-09-19 | 2019-12-20 | 京东方科技集团股份有限公司 | Laser annealing device and laser annealing equipment |
| CN111451629A (en) * | 2020-04-20 | 2020-07-28 | 中国科学院合肥物质科学研究院 | Excimer laser rear-end optical path system |
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| CN110385530A (en) * | 2019-07-15 | 2019-10-29 | 中国科学院合肥物质科学研究院 | A kind of method that quasi-molecule laser etching calcium fluoride crystal forms periodic stripe |
| CN110600367A (en) * | 2019-09-19 | 2019-12-20 | 京东方科技集团股份有限公司 | Laser annealing device and laser annealing equipment |
| CN111451629A (en) * | 2020-04-20 | 2020-07-28 | 中国科学院合肥物质科学研究院 | Excimer laser rear-end optical path system |
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Effective date of registration: 20190409 Address after: 244000 Building D of China Science and Technology University Pioneer Park, Tongling City, Anhui Province Applicant after: Anhui branch of AIKE CIMA Photoelectric Technology Co. Ltd. Address before: 230031 Shushan Lake Road, Hefei, Anhui 350 Applicant before: Hefei Inst. of Matter Sciences, Chinese Academy of Sciences |
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Application publication date: 20170510 |