CN106629980B - A kind of method of atmos plasma activation water process algae - Google Patents
A kind of method of atmos plasma activation water process algae Download PDFInfo
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- CN106629980B CN106629980B CN201611095724.4A CN201611095724A CN106629980B CN 106629980 B CN106629980 B CN 106629980B CN 201611095724 A CN201611095724 A CN 201611095724A CN 106629980 B CN106629980 B CN 106629980B
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 238000000034 method Methods 0.000 title claims abstract description 33
- 241000195493 Cryptophyta Species 0.000 title claims abstract description 31
- 238000000678 plasma activation Methods 0.000 title claims abstract description 19
- 230000005611 electricity Effects 0.000 claims abstract description 12
- 239000007864 aqueous solution Substances 0.000 claims abstract description 6
- 238000012545 processing Methods 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 43
- 210000000476 body water Anatomy 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000002955 isolation Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 239000008399 tap water Substances 0.000 claims description 3
- 235000020679 tap water Nutrition 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000003570 air Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000001994 activation Methods 0.000 claims 1
- 230000004913 activation Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 3
- 241000195649 Chlorella <Chlorellales> Species 0.000 description 5
- 239000000243 solution Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 241000192710 Microcystis aeruginosa Species 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- 230000005791 algae growth Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000012851 eutrophication Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002779 inactivation Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
Landscapes
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
A kind of method of atmos plasma activation water process algae, device includes gas tank, water tank, discharge assembly and ground electrode column, the high-voltage electricity pole and high voltage power supply of atmos low-temperature plasma activated water apparatus are connected, aqueous solution is injected in water tank, it is passed through working gas in gas chamber, adjusts air-flow, high voltage power supply is opened after steady air current, high-field electrode electric discharge, obtains plasma water；The advantages that by plasma water and algae water sample mixed processing, the present invention has the algae that can be effectively treated in water body compared with prior art, and it is good to manage effect, high-efficient.
Description
The present invention relates to a kind of processing methods of algae for technical field.
Background technique China is sea transport big country, water-borne with ballast for cruising as sea transport industry continues to develop
Toxic algae is also on the rise.With the industrialized development in China, sewage discharge etc. causes water pollution serious, water eutrophication
Cause water bloom to cause wawter bloom phenomenon, environmental pollution is not only caused to also create a large amount of economic loss.
With the development of plasma technology, the application of plasma technique is also more and more.Plasma water wait from
It is found in daughter water development process, and gradually warms up.The research of atmos low-temperature plasma activated water in recent years at
For the hot spot of plasma field, related low-temperature plasma activation water using more and more.Atmos low-temperature plasma
Activated water is a kind of low pH value handled by aqueous solution through atmos low-temperature plasma device, high redox potential
Activated water.Its preparation process is simple, at low cost, production method is simple.A series of reaction occurs during the preparation process for activated water,
Contain hydrogen peroxide, superoxide anion, hydroxyl free radical isoreactivity particle in water after reaction.It can be used for going out for algae in water
It is living, change water environment locating for algae, destroy its structure, inhibits algae growth, inactivation algae etc..
The purpose of the present invention is to provide a kind of sides using atmos plasma activation water process algae for summary of the invention
Method to inhibit and inactivate algae, and then changes Water quality.
The specific technical solution of the present invention is as follows:
(1) atmos low-temperature plasma activated water apparatus: the present apparatus includes gas tank, water tank, discharge assembly and ground
Electrode column, wherein gas tank and water tank are made of isolation material, and one is fixed on hollow gas tank by its perforative water tank, have into
Water end (W.E.) and the water tank of water outlet will be divided into two closed gas chambers inside gas tank, inlet end be all had on each gas chamber, and every
Discharge assembly is equipped in a gas chamber, the discharge assembly includes pcb board, dielectric-slab, discharge tube, high-field electrode and high pressure
Electrode column, wherein dielectric-slab and discharge tube are made of isolation material, and the pcb board is oppositely arranged with dielectric-slab, pcb board and medium
There are several discharge tubes, discharge tube is fixed on dielectric-slab, and one end of the discharge tube passes through dielectric-slab and extends to water between plate
In case, the other end end of the discharge tube is inserted with high-field electrode, high-field electrode one inside pcb board, the every discharge tube
Discharge tube is stretched out at end and the end is electrically connected with pcb board, also has the high-voltage electricity pole being connected electrically, high-voltage electricity on pcb board
Gas chamber is stretched out in one end of pole；The water tank is equipped with the ground electrode column with its interior thereof.
(2) preparation of plasma water: the high-voltage electricity pole and height of above-mentioned atmos low-temperature plasma activated water apparatus
Voltage source is connected, and aqueous solution is injected in water tank, working gas is passed through in gas chamber, air-flow is adjusted, high pressure is opened after steady air current
Power supply, high-field electrode electric discharge, obtains plasma water；
(3) by plasma water and algae water sample mixed processing.
Preferably, the high-field electrode of the atmos low-temperature plasma activated water apparatus uses the metal material of well conducting
Material, such as tungsten wire, platinum filament, spun gold.
Preferably, the ground electrode column of the atmos low-temperature plasma activated water apparatus uses the metal material of well conducting
Material, such as copper rod, tungsten bar.
Preferably, the gas tank of the atmos low-temperature plasma activated water apparatus, water tank, dielectric-slab and discharge tube are equal
It is made of quartz or ceramics or polytetrafluoroethylene (PTFE).
Preferably, working gas when prepared by the plasma water is air or oxygen or nitrogen, preferably air.
Preferably, aqueous solution when prepared by the plasma water can be tap water or directly containing the water of algae
Sample.
Preferably, the flow of working gas when prepared by the plasma water is 1L/min.
Preferably, the plasma water prepare when high-field electrode discharge voltage be 7-12kV, discharge frequency 8kHz,
Discharge time 30min or more.
Preferably, the plasma water and algae water sample mixed proportion are generally 1:3-3:1.
The invention has the following advantages over the prior art:
1, the algae in water body can be effectively treated, and it is good to manage effect, it is high-efficient；
2, without secondary pollution after water body processing, it has no toxic side effect, ensure that safety；
3, plasma device consumption is lower, and installation, maintenance is convenient, and it is convenient to operate.
Detailed description of the invention Fig. 1 is the device main view diagrammatic cross-section of the embodiment of the present invention 1.
Fig. 2 is the experimental data curve figure of the embodiment of the present invention 2.
Next specific embodiment just in conjunction with the accompanying drawings and embodiments elaborates to the present invention
Embodiment 1
A kind of method of atmos plasma activation water process algae, steps are as follows:
(1) atmos low-temperature plasma activated water apparatus, as shown in Figure 1, gas tank 1 is hollow housing, the middle part of gas tank
Equipped with one by its perforative water tank 2, water tank is still hollow housing, and gas tank is divided into two independent closed air chambers by water tank, i.e.,
Upper chamber 101 and lower chamber 102；The top of the gas tank sets the annular upper ear plate 301 being linked together with it, and the middle part of gas tank is leaned on
Nearly water tank location sets the external support board A302 being linked together with gas tank, and screw rod A401, screw rod are set between upper ear plate and external support board A
A connects with water tank；The lower part of the gas tank sets the annular lower ear plate 303 being linked together with it, and the middle part of gas tank is close to water tank position
The external support board B304 being linked together with gas tank is installed, screw rod B402, screw rod B and water tank are set between lower ear plate and external support board B
Connect；The screw rod A and screw rod B realizes the fixation of water tank；The inside of the upper chamber is equipped with horizontal pcb board A501, pcb board
A connects with the inner wall of the upper chamber, and the lower part of the pcb board A sets horizontal dielectric-slab A601, and the dielectric-slab A is mounted on
On one circular inner support plate A305 being linked together with upper chamber inner wall, annular is set between the dielectric-slab A and inner support plate A
Sealing ring A701, the inner support plate A connects with above-mentioned tank outer wall, and sets ring packing between inner support plate A and water tank
Enclose B702；The inside of the upper chamber has several vertical discharge tube A801, and discharge tube A is fixed on dielectric-slab A, described
The lower end of discharge tube A passes through dielectric-slab A and extends in water tank, and the upper end of the discharge tube A is every described close to the pcb board A
High-field electrode A901 is inserted with inside discharge tube A, the upper end of high-field electrode A is electrically connected with pcb board A, and the gas tank is equipped with and PCB
The high-voltage electricity pole A111 of plate A electrical connection；The inside of the lower chamber be equipped with horizontal pcb board B502, pcb board B with it is described
The inner wall of lower chamber connects, and the top of the pcb board B sets horizontal dielectric-slab B602, the dielectric-slab B and is mounted on one under
On the circular inner support plate B306 that gas chamber inner wall is linked together, ring type seal is set between the dielectric-slab B and inner support plate B
C703, the inner support plate B connects with above-mentioned tank outer wall, and ring type seal D704 is set between inner support plate B and water tank；
There is several vertical discharge tube B802, discharge tube B to be fixed on dielectric-slab B for the inside of the lower chamber, the discharge tube B
Upper end pass through dielectric-slab B extend in water tank, the lower end of the discharge tube B is close to the pcb board B, the every discharge tube B
Inside is inserted with high-field electrode B902, and the lower end of high-field electrode B is electrically connected with pcb board B, and the gas tank is equipped with and is electrically connected with pcb board B
The high-voltage electricity pole B222 connect；The water tank is equipped with the ground electrode column 333 with its interior thereof；The top of the gas tank is set
The air inlet pipe 103 communicated with upper chamber, the lower part of gas tank set the air inlet pipe 104 communicated with lower chamber；It is set respectively on the water tank
The water inlet pipe 201 and outlet pipe 202 communicated with inside it.
(2) preparation of plasma water: the high-voltage electricity pole and high voltage power supply of step (1) are connected, and are injected originally in water tank
Water is passed through air in gas chamber, and the flow of working gas is 1L/min, high voltage power supply is opened after steady air current, high-field electrode is put
Electricity, discharge voltage 7kV, discharge frequency 8kHz, discharge time 30min close high voltage power supply, obtain plasma water.
(3) obtained plasma water is taken out stand-by.
Embodiment 2 (ball algae processing experiment)
The plasma water that embodiment 1 obtains is mixed with four groups of culture solutions (tap water), first group of mixed liquor it is medium from
The content of daughter water is 40ml；The content of second group of mixed liquor plasma water is 30ml；Plasma in third group mixed liquor
The content of body water is 20ml；The content of first group of mixed liquor plasma water is 10ml；5th group is culture solution original sample, then
The chlorella stoste of equivalent is diluted to respectively in each group mixed liquor and culture solution original sample, observation culture is carried out, respectively for 24 hours,
48h, 72h, 96h, 120h record the content of chlorella, as shown in Fig. 2, as shown in Figure 2, plasma water content is higher, the time
Longer, the chlorella content of mixed liquor is lower, it is seen that plasma water energy is enough effectively to be inhibited, inactivates chlorella, plasma water
Content is higher, is more obvious to the inhibiting effect of chlorella.
Claims (10)
1. a kind of method of atmos plasma activation water process algae, it is characterized in that:
(1) atmos low-temperature plasma activated water apparatus: the present apparatus includes gas tank, water tank, discharge assembly and ground electrode
Column, wherein gas tank and water tank are made of isolation material, and one is fixed on hollow gas tank by its perforative water tank, has water inlet end
Two closed gas chambers will be divided into inside gas tank with the water tank of water outlet, inlet end, and each gas are all had on each gas chamber
Interior is equipped with discharge assembly, and the discharge assembly includes pcb board, dielectric-slab, discharge tube, high-field electrode and high-field electrode
Column, wherein dielectric-slab and discharge tube are made of isolation material, and the pcb board is oppositely arranged with dielectric-slab, pcb board and dielectric-slab it
Between there are several discharge tubes, discharge tube is fixed on dielectric-slab, and one end of the discharge tube passes through dielectric-slab and extends in water tank,
The other end end of the discharge tube is inserted with high-field electrode inside pcb board, the discharge tube, and electric discharge is stretched out in high-field electrode one end
It manages and the end is electrically connected with pcb board, also there is the high-voltage electricity pole being connected electrically, one end of high-voltage electricity pole on pcb board
Stretch out gas chamber；The water tank is equipped with the ground electrode column with its interior thereof；
(2) preparation of plasma water: the high-voltage electricity pole and high-voltage electricity of above-mentioned atmos low-temperature plasma activated water apparatus
Source is connected, and aqueous solution is injected in water tank, working gas is passed through in gas chamber, air-flow is adjusted, high voltage power supply is opened after steady air current,
High-field electrode electric discharge, obtains plasma water；
(3) by plasma water and algae water sample mixed processing.
2. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the atmospheric pressure
In the discharge assembly of low-temperature plasma activation water installations, dielectric-slab is mounted on what a corresponding gas chamber inner wall was linked together
On circular inner support plate, ring type seal, the inner support plate and tank outer wall phase are set between the dielectric-slab and inner support plate
It connects, and still sets ring type seal between inner support plate and water tank.
3. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the atmospheric pressure
The high-field electrode of low-temperature plasma activation water installations is using tungsten wire or platinum filament or spun gold.
4. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the atmospheric pressure
The ground electrode column of low-temperature plasma activation water installations uses copper rod or tungsten bar.
5. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the atmospheric pressure
Gas tank, water tank, dielectric-slab and the discharge tube of low-temperature plasma activation water installations are by quartz or ceramics or polytetrafluoroethylene (PTFE)
It is made.
6. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the plasma
Working gas when prepared by body water is air or oxygen or nitrogen.
7. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the plasma
Aqueous solution when prepared by body water is tap water or directly containing the water sample of algae.
8. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the plasma
The flow of working gas when prepared by body water is 1L/min.
9. the method for atmos plasma activation water process algae according to claim 1, it is characterized in that: the plasma
High-field electrode discharge voltage when prepared by body water is 7-12kV, discharge frequency 8kHz, discharge time 30min or more.
10. the method for atmos plasma according to claim 1 activation water process algae, it is characterized in that: it is described it is equal from
Daughter water and algae water sample mixed proportion are 1:10-3:1.
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| CN201611095724.4A CN106629980B (en) | 2016-12-02 | 2016-12-02 | A kind of method of atmos plasma activation water process algae |
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| CN106629980A CN106629980A (en) | 2017-05-10 |
| CN106629980B true CN106629980B (en) | 2019-05-24 |
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| JP6949775B2 (en) * | 2017-05-31 | 2021-10-13 | 株式会社Ｓｃｒｅｅｎホールディングス | Liquid plasma generator and liquid processing device |
| US11267729B2 (en) | 2017-05-31 | 2022-03-08 | SCREEN Holdings Co., Ltd. | In-liquid plasma generation device and liquid treatment apparatus |
| CN107750085A (en) * | 2017-08-30 | 2018-03-02 | 大连民族大学 | Atmos low-temperature microplasma activates water generating device |
| CN108408843B (en) * | 2018-03-14 | 2021-06-01 | 大连民族大学 | Plasma activated water generating device |
| CN110418485A (en) * | 2019-09-03 | 2019-11-05 | 武汉海思普莱生命科技有限公司 | A kind of large area underwater plasma generating device |
| CN110831312B (en) * | 2019-11-07 | 2021-01-15 | 大连理工大学 | Efficient plasma gas-liquid discharge system |
| EP3904492A1 (en) * | 2020-04-29 | 2021-11-03 | Nofima AS | Method and system of pre-treating biomass, in particular biomass that is resistant to cell disruption, for improving the accessibility of cellular compounds therefrom |
| CN117566848B (en) * | 2024-01-17 | 2024-03-29 | 离享未来(德州)等离子科技有限公司 | Low-temperature plasma underwater discharge nitrogen fixation device |
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