CN106574998A - Method of manufacturing mold for curved diffraction grating, method of manufacturing curved diffraction grating, curved diffraction grating, and optical device - Google Patents
Method of manufacturing mold for curved diffraction grating, method of manufacturing curved diffraction grating, curved diffraction grating, and optical device Download PDFInfo
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- CN106574998A CN106574998A CN201580044297.4A CN201580044297A CN106574998A CN 106574998 A CN106574998 A CN 106574998A CN 201580044297 A CN201580044297 A CN 201580044297A CN 106574998 A CN106574998 A CN 106574998A
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- diffraction grating
- diffraction gratings
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 60
- 230000003287 optical effect Effects 0.000 title claims description 19
- 239000000758 substrate Substances 0.000 claims abstract description 166
- 239000000463 material Substances 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims abstract description 49
- 238000005530 etching Methods 0.000 claims abstract description 9
- 238000003754 machining Methods 0.000 claims abstract 3
- 239000002184 metal Substances 0.000 claims description 77
- 229910052751 metal Inorganic materials 0.000 claims description 77
- 239000011347 resin Substances 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 24
- 230000005496 eutectics Effects 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000001259 photo etching Methods 0.000 claims description 8
- 229910000679 solder Inorganic materials 0.000 abstract description 32
- 239000004065 semiconductor Substances 0.000 abstract description 8
- 238000000206 photolithography Methods 0.000 abstract 2
- 238000005516 engineering process Methods 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000007769 metal material Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
Abstract
To form a saw-like diffraction grating pattern on a curved surface substrate by machining, since a tool has a fixed angle, a shape in which the angles of the diffraction grating pattern at the central and outer circumferential sections of the curved surface are different from one another is formed. Also, to form, on a curved surface substrate, a diffraction grating pattern having a serrated shape through a semiconductor process such as photolithography and etching, the adjustment of the focal depth during the photolithography and the adjustment of the etching angle are required, thereby increasing costs. This method of manufacturing a mold for a curved diffraction grating includes: a step for forming a diffraction grating pattern 21 on a metallic planar diffraction grating substrate 20; a step for forming solder 22 on a surface opposite to the surface of the metallic planar diffraction grating substrate 20 on which the diffraction grating pattern is formed; a step for forming, on the curved surface substrate 23, a layer of a junction material 24 which is eutectically bonded to the solder 22,; and a step for sandwiching the metallic planar diffraction grating substrate 20 between the curved surface fixing substrate 23 and the curved surface fixing substrate 24 and applying a load.
Description
Technical field
The present invention relates to the manufacture method of the model of curved diffraction gratings, the manufacture method of curved diffraction gratings, curved surface spread out
Grating and Optical devices are penetrated, more particularly to light is carried out into light splitting, the curved diffraction gratings of optically focused and using the curved diffraction
The Optical devices of grating.
Background technology
As the background technology of the art, as the optical element being equipped on the Optical devices such as spectrophotometer
Curved diffraction gratings have the light splitting of light, two kinds of performances of optically focused, can reduce number of components such that it is able to simplify the structure of device
Into.
At present, curved diffraction gratings spread out by using the method manufacture that the machinery such as dividing machine is marked on curved substrate
The model of grating is penetrated, and the pattern that marking is obtained is transferred on resin, metal etc., so as to produce curved diffraction gratings.
As the manufacture method of curved diffraction gratings, in Japanese Patent Laid-Open 2014-134568 publication (patent documentation 1)
Following method is disclosed, i.e.,：The corrosion-resisting pattern of diffraction grating is formed on concave surface substrate by holographic exposure method, and from a point
Or a line irradiates reactive ion beam to be etched, so as to the concave surface for making the diffraction grating pattern with zigzag fashion dodges
Credit type diffraction grating.
In Japanese Patent Laid-Open No. Sho 61-72202 publication (patent documentation 2), in the soft material of resin, metallic film etc.
Diffraction grating pattern is formed on material, and is attached on the substrate in regulation curvature bending, so as to make model.Make the model with
The curved diffraction gratings material of the liquid before solidification, and solidify it, so as to manufacture curved diffraction gratings.
In Japanese Patent Laid-Open 8-29610 publication (patent documentation 3), it is laminated on flexible substrate and uses
The duplicating layer of reaction-curable resin (diffraction grating part), makes plane spread out using the cure shrinkage of reaction-curable resin
Penetrate grating profile.
In Japanese Patent Laid-Open 9-5509 publication (patent documentation 4), plane diffraction grating substrate is transferred to into silicon
On flexible material as resin, and it is fixed on curved substrate, so as to form the model of curved diffraction gratings.
A kind of X for possessing X ray reflection body is disclosed in Japanese Patent Laid-Open 2010-25723 publication (patent documentation 5)
Ray reflection device, the X ray reflection body by the way that silicon substrate to be carried out under an atmosphere of hydrogen high-temperature heating so that silicon substrate plasticity
The shape of regulation is deformed into, and is laminated multiple and is made.
Prior art literature
Patent documentation
Patent documentation 1：Japanese Patent Laid-Open 2014-134568 publication
Patent documentation 2：Japanese Patent Laid-Open No. Sho 61-72202 publication
Patent documentation 3：Japanese Patent Laid-Open 8-29610 publication
Patent documentation 4：Japanese Patent Laid-Open 9-5509 publication
Patent documentation 5：Japanese Patent Laid-Open 2010-25723 publication
The content of the invention
Invent technical problem to be solved
In the manufacture method of above-mentioned diffraction grating, marked on curved substrate by using the machinery such as dividing machine
Method come in the case of the model for manufacturing diffraction grating, because the angle for marking instrument is fixed, therefore, in curved substrate
Center portion, end, produce compared with shallow portion, deeper portion in the diffraction grating pattern of zigzag fashion.
In the manufacture method of the curved diffraction gratings of the use semiconductor technology disclosed in patent documentation 1, relative to appoint
The curved substrate of meaning, is difficult the diffraction grating pattern for making resist exactly using photoetching, so as to the ion on curved surface loses
In quarter, the shape of diffraction grating pattern easily produces deviation.In the model of the curved diffraction gratings disclosed in patent documentation 2～4
Manufacturing technology in, due to form diffraction grating pattern on the curved surface stage in using having a flexible part, thus
Pattern accuracy is reduced when transferring to curved diffraction gratings.Especially in patent documentation 4, although be to be transferred to silicon resinoid so
Flexible material on, and be fixed on curved substrate, so as to form the model of curved diffraction gratings, and transfer, make
Curved diffraction gratings, but, due to using flexible material, therefore, can be because reduction, the curved diffraction gratings of pattern accuracy
Transfer, the stretching of model when peeling off and cause the pattern of model damaged, so as to cause the lost of life.In addition, patent documentation 5
In disclose the method for making silicon substrate plastic deformation, but, under high temperature, atmosphere of hydrogen, the pattern of the diffraction grating of silicon
Being smoothed.When making silicon plane diffraction grating curving, because elastic deformation can cause silicon plane diffraction grating damaged,
So that using plastic deformation, so as to dislocation line can be produced, producing in the fixation procedure to the fixed substrate of curved surface in addition
Cavity etc., so as to cause face precision to reduce.
The technical scheme of solve problem
In view of above-mentioned problem, the present invention is with following feature.That is, the manufacture of the model of curved diffraction gratings of the invention
Method includes：
The operation of diffraction grating pattern is formed on planar substrates；
The operation of the 1st grafting material is formed on the face of faces that the are planar substrates and being formed with diffraction grating pattern opposition side；
By the operation with the 2nd grafting material film forming of the 1st grafting material eutectic on curved substrate；And
The planar substrates are clamped using the curved substrate and concave surface substrate and apply the operation of load.
In addition, the curved diffraction gratings of the present invention are by shape on the pattern transfer of curved diffraction gratings to metal or resin
Into, wherein, the model of the curved diffraction gratings is to make to be formed with the planar diffraction light of diffraction grating pattern on planar substrates
Gate substrate is deformed into curved and is formed.
In addition, the Optical devices of the present invention possess curved diffraction gratings, light source, slit, collective optics and detector, its
In, the curved diffraction gratings are will to be formed on the pattern transfer of curved diffraction gratings to metal or resin, the curved diffraction
The model of grating is to make to be formed with planar substrates the plane diffraction grating substrate deformation of diffraction grating pattern for curved
Formed.
Invention effect
According to the present invention, diffraction grating pattern is made on planar substrates by mechanical imprint, semiconductor technology is then passed through,
Therefore, the form variations of the diffraction grating pattern of the zigzag fashion with special angle can be suppressed during fabrication.By making this
Plane diffraction grating is deformed into curved surface, and fixes on substrate installed in curved surface, can manufacture in the whole surface of curved substrate
The curved diffraction gratings of the diffraction grating pattern with the zigzag fashion in special angle.By the way that this is possessed in special angle
The curved diffraction gratings of the diffraction grating pattern of zigzag fashion are mounted on Optical devices, and can manufacture can improve diffraction efficiency,
And can reduce veiling glare (noise), and optical element number of components is few and Optical devices of low cost.
Description of the drawings
Fig. 1 is the schematic diagram of the Optical devices of the curved diffraction gratings using the present invention.
Fig. 2 is the axonometric chart of the model of the curved diffraction gratings (sphere diffraction grating) for representing the present invention.
Fig. 3 is the axonometric chart of the model of the curved diffraction gratings (annular diffractive grating) for representing the present invention.
Fig. 4 is the figure of the manufacture method of the model of the curved diffraction gratings of the first embodiment for representing the present invention.
Fig. 5 is the figure of the manufacture method of the model of the curved diffraction gratings of the second embodiment for representing the present invention.
Fig. 6 is the figure of the manufacture method of the model of the curved diffraction gratings of the third embodiment for representing the present invention.
Fig. 7 is the figure of the manufacture method of the model of the curved diffraction gratings of the fourth embodiment for representing the present invention.
Fig. 8 is the figure of the manufacture method of the curved diffraction gratings for representing the present invention.
Specific embodiment
Hereinafter, embodiments of the present invention are illustrated using accompanying drawing.
The Optical devices of the present invention are illustrated using Fig. 1.Optical devices 1 are by thing in chemical substance, biological substance etc.
The light of wavelength optionally absorbs specific to the chemical bond of matter, for measuring concentration, differentiating material.As shown in figure 1, optics dress
Put 1 and possess light source 11, slit (slit) 12,14, diffraction grating 13, collective optics 15 and detector 17.Irradiate from light source 11
The light for going out is exposed on diffraction grating 13 via slit 12, and is split in diffraction grating 13.Light after light splitting is via slit
14th, collective optics 15 incides sample 16, and the absorption (decay) of wavelength is measured using detector 17.Here, by making diffraction
Grating 13 is rotated, so that the illumination of specific wavelength is incident upon sample 16.By the way that diffraction grating 13 is curving, can simplify
The optical elements such as reflecting mirror, the collective optics of Optical devices 1 such that it is able to reduce number of components.
There is sphere diffraction grating, annular diffractive grating in curved diffraction gratings, with regard to specific shape, using Fig. 2, Fig. 3
Illustrate.In addition, Fig. 2, Fig. 3 are the figures illustrated to the model of sphere diffraction grating and annular diffractive grating, by inciting somebody to action
The pattern transfer to metal or resin, so as to manufacture the diffraction grating that light is carried out light splitting, the concave of optically focused.
The model of the sphere diffraction grating of the present invention is illustrated using Fig. 2.Sphere diffraction grating is with curvature phase
The diffraction grating of same sphere.The model 2 of curved diffraction gratings is by the metal curved diffraction for being formed with diffraction grating pattern 21
Grating 26, curved surface is fixed substrate 23 and is constituted.Metal curved diffraction gratings 26 and curved surface are fixed substrate 23 and are connect by metal eutectic
Conjunction, resin-bonded etc. are fixed.By the way that the model 2 of the curved diffraction gratings is transferred on resin, metallic film, so as to make
Make the curved diffraction gratings of matrix.
Different from sphere diffraction grating, annular diffractive grating is that have in the different ring surface of x, y-axis side's upward curvature
Diffraction grating.As shown in figure 3, the model 2 of curved diffraction gratings is by the metal curved diffraction for being formed with diffraction grating pattern 21
Grating 26, curved surface is fixed substrate 23 and is constituted.It is due to being to make metal plane diffraction grating be deformed into curved surface and solid installed in curved surface
Determine on substrate 23, so as to be formed as metal curved diffraction gratings 26, the annular different therefore, it is possible to be installed to axle upward curvature
On face.Metal curved diffraction gratings 26 and curved surface are fixed substrate 23 and are fixed by metal eutectic engagement, resin-bonded etc..
By the way that the model 2 of the curved diffraction gratings is transferred on resin, metallic film, so as to manufacture the curved diffraction gratings of matrix.
Then, for the manufacture method of above-mentioned curved diffraction gratings is illustrated.Following various manufacture methods can be used
Make with above-mentioned sphere diffraction grating, the manufacture method of curved diffraction gratings of the annular diffractive grating as representative.
Embodiment 1
Said using the manufacture method of the model 2 of the curved diffraction gratings in the 1st embodiments of the Fig. 4 to the present invention
It is bright.Diffraction grating pattern 21 with zigzag fashion is formed on the metal basal board of plane by mechanical imprint, so as to form gold
Category plane diffraction grating substrate 20 ((a) in Fig. 4) processed.In the formation diffraction grating figure of metal plane diffraction grating substrate 20
On the opposing face in the face of case 21, by being deposited with or printing as the film forming of the solder 22 ((b) in Fig. 4) of grafting material.
Curved surface is fixed on the face for installing metal diffraction grating substrate 20 of substrate 23, will be with the eutectic of solder 22 by sputtering or being deposited with
The film forming of grafting material 24 ((c) in Fig. 4).The formation of metal plane diffraction grating substrate 20 there is into diffraction grating pattern 21
Face be arranged on the side of concave surface substrate 25, by the face for being formed with solder 22 be arranged on curved surface fix the side of substrate 23 ((d) in Fig. 4).
Under vacuum conditions, apply temperature and the load more than eutectic point of grafting material, make metal plane diffraction grating substrate 20
The face of formation diffraction grating pattern 21 follow concave surface substrate 25, while making solder 22 and curved surface fix the grafting material of substrate 24
24 carry out eutectic reaction, so as to be installed ((e) in Fig. 4).Cooled down in the state of load is applied with, made solder 22
After the immobilization of grafting material 24, remove concave surface substrate 25, so as to by metal curved diffraction gratings substrate 26 via solder
22 and grafting material 24 be arranged on curved surface fix substrate 23 on ((f) in Fig. 4).By removing metal curved diffraction gratings base
The peripheral part of plate 26, so as to form the model 2 ((g) in Fig. 4) of curved diffraction gratings.By making metal plane diffraction grating
Substrate 20 follows concave surface substrate 25 and is deformed into curved surface, so that forming the face of diffraction grating pattern 21 becomes concave surface substrate 25
Face precision.Further, since solder 22 and grafting material 24 more than the eutectic point at a temperature of be in liquid phase state, therefore, it is possible to inhale
Receive the impact that the thickness deviation of metal plane diffraction grating 20, curved surface fix the face precision of substrate 23.
Will by mechanical imprint or semiconductor technology (photoetching, etching) on metal flat substrate formed diffraction grating figure
The metal plane diffraction grating of case or the planar diffraction of diffraction grating pattern is formed by mechanical imprint or semiconductor technology
Grating is transferred on metal flat substrate, so as to manufacture metal plane diffraction grating.Using sputtering, evaporation, electroplate plane
The diffraction grating pattern of diffraction grating is transferred on metal flat substrate.It is deformed into by making above-mentioned metal plane diffraction grating
Curved surface, and fix on substrate, so as to make the model of curved diffraction gratings installed in curved surface.By by the curved diffraction gratings
Pattern transfer to metal film, resin, so as to make curved diffraction gratings.
Angle in the case where diffraction grating pattern is made on planar substrates by mechanical imprint, due to marking instrument
Immobilize, it is thus possible to the diffraction grating figure of the zigzag fashion with special angle is formed in the entire surface of flat panel substrate
Case, and form variations can be suppressed.In addition, when diffraction grating pattern is made on planar substrates by semiconductor technology, with
Photoetching, etching on curved surface is compared, and easily forms the diffraction grating pattern of the zigzag fashion with special angle, and can be suppressed
Form variations.Due to being to make to be fixed for curved surface and installed in curved surface by plane diffraction grating substrate deformation made by said method
On substrate, there is the curved surface of the diffraction grating pattern of the zigzag fashion in special angle therefore, it is possible to the manufacture on whole curved surface
The model of diffraction grating.
When metal plane diffraction grating is deformed into curved surface, is installed on curved surface fixation substrate, using face high precision
Concave surface substrate fixes substrate and clamps metal plane diffraction grating with the curved surface of convex surface, and applies load, temperature, so as to manufacture gold
Category curved diffraction gratings processed.Concave surface base is followed by the face for making the formation of metal plane diffraction grating and having diffraction grating pattern
Plate, it is possible to increase the face precision of curved diffraction gratings, without the substrate thickness deviation by metal plane diffraction grating, admittedly
Deposit belongs to curved diffraction gratings processed and fixes thickness deviation, face precision of curved surface fixation substrate of grafting material of substrate etc. with curved surface
Impact.Substrate is fixed in the curved surface using concave surface substrate and convex surface to clamp metal plane diffraction grating and apply load and make
When it is deformed into curved surface, it is possible to cause diffraction grating pattern deformation, damage etc., but, put on diffraction light from concave surface substrate
Load on gate pattern disperses towards the crest line direction of diffraction grating pattern, therefore, it is possible to manufacture the model of curved diffraction gratings
Without deforming, damaging.In addition, making metal plane diffraction grating be deformed into curved surface, fixing substrate installed in curved surface
When upper, due to being metal material, it is thus possible to suppress generation the crystalline material such as silicon, quartz is produced when being plastic deformation to curved surface
Dislocation line.In addition, by using metal material, when pattern is transferred to curved diffraction gratings, the thermal deformation of model is little, can
Improve precision, and relative to peel off when stretching also will not deform, can peel off from model, thus the life-span of model prolong
It is long.
Embodiment 2
Said using the manufacture method of the model 3 of the curved diffraction gratings in the 2nd embodiments of the Fig. 5 to the present invention
It is bright.Diffraction grating pattern 31 with zigzag fashion is formed on planar substrates by mechanical imprint, so as to form planar diffraction
Light gate substrate 30 ((a) in Fig. 5).After being formed with formation on the face of diffraction grating pattern 31 and planting film (seed film), lead to
Cross electrolysis plating and carry out laminated metal material ((b) in Fig. 5).Kind of a film is removed from plane diffraction grating substrate 30 by etching,
And stripping metal material, so as to form metal plane diffraction grating 37 ((c) in Fig. 5).Here, by using will be using machine
Plane diffraction grating substrate 30 made by tool marking is transferred on metal material and the metal plane diffraction grating 37 after stripping,
Can Reusability utilize plane diffraction grating substrate 30 made by mechanical imprint, so as to make metal plane diffraction grating
37.Have on the opposing face in face of diffraction grating pattern 31 in the formation of metal plane diffraction grating substrate 37, by evaporation or
Person is printed as the film forming of the solder 32 ((d) in Fig. 5) of grafting material.The installation metal diffraction of substrate 33 is fixed in curved surface
On the face of light gate substrate 37, by sputtering or being deposited with the film forming of the grafting material 34 ((e) in Fig. 5) with the eutectic of solder 32.
The face that the formation of metal plane diffraction grating substrate 37 has diffraction grating pattern 31 is arranged on into the side of concave surface substrate 35, will be formed
The face for having solder 32 is arranged on curved surface and fixes the side of substrate 33 ((f) in Fig. 5).Under vacuum conditions, being total to for grafting material is applied
Temperature and load more than fisheye, make the diffraction grating pattern 31 of metal plane diffraction grating substrate 37 formation face follow it is recessed
Face substrate 35, while make the grafting material 34 that solder 32 fixes substrate 34 with curved surface carry out eutectic reaction, so as to be installed (figure
(g) in 5).Cooled down in the state of load is applied, after making solder 32 and the immobilization of grafting material 34, removed concave surface
Substrate 35, so as to metal curved diffraction gratings substrate 36 is arranged on into curved surface via solder 32 and grafting material 34 substrate is fixed
On 33 ((h) in Fig. 5).By the peripheral part for removing metal curved diffraction gratings substrate 36, so as to form curved diffraction light
The model 3 ((i) in Fig. 5) of grid.Song is deformed into by making metal plane diffraction grating substrate 37 follow concave surface substrate 35
Face, so that the face for being formed with diffraction grating pattern 31 becomes the face precision of concave surface substrate 35.Further, since solder 32 and engagement
Material 34 more than the eutectic point at a temperature of be in liquid phase state, therefore, it is possible to absorb the thickness of metal plane diffraction grating 37
Deviation, curved surface fix the impact of the face precision of substrate 33.
Embodiment 3
Said using the manufacture method of the model 4 of the curved diffraction gratings in the 3rd embodiments of the Fig. 6 to the present invention
It is bright.Diffraction grating pattern with zigzag fashion is formed on the metal basal board of plane by semiconductor technology (photoetching, etching)
41, so as to form metal plane diffraction grating substrate 40 ((a) in Fig. 6).Here, by using semiconductor technology (photoetching,
Etching), compared with metal plane diffraction grating 40 is manufactured by mechanical imprint, can be manufactured at short notice.
The formation of metal plane diffraction grating substrate 40 has on the opposing face in face of diffraction grating pattern 41, by being deposited with or printing
Using as the film forming of the solder 42 ((b) in Fig. 6) of grafting material.The installation metal diffraction light grid base of substrate 43 is fixed in curved surface
On the face of plate 40, by sputtering or being deposited with the film forming of the grafting material 44 ((c) in Fig. 6) with the eutectic of solder 42.By metal
The face that the formation of plane diffraction grating substrate 40 processed has diffraction grating pattern 41 is arranged on the side of concave surface substrate 45, will be formed with solder
42 face is arranged on curved surface and fixes the side of substrate 43 ((d) in Fig. 6).Under vacuum conditions, apply grafting material eutectic point with
On temperature and load, the formation face for making the diffraction grating pattern 41 of metal plane diffraction grating substrate 40 follows concave surface substrate
45, while make the grafting material 44 that solder 42 fixes substrate 43 with curved surface carry out eutectic reaction, so as to be installed (in Fig. 6
(e)).Cooled down in the state of load is applied, after making solder 42 and the immobilization of grafting material 44, removed concave surface substrate
45, fix on substrate 43 so as to metal curved diffraction gratings substrate 46 is arranged on into curved surface via solder 42 and grafting material 44
((f) in Fig. 6).By the peripheral part for removing metal curved diffraction gratings substrate 46, so as to form curved diffraction gratings
Model 4 ((g) in Fig. 6).Curved surface is deformed into by making metal plane diffraction grating substrate 40 follow concave surface substrate 45, from
And make the face for being formed with diffraction grating pattern 21 become the face precision of concave surface substrate 45.Further, since solder 42 and grafting material
44 more than the eutectic point at a temperature of be in liquid phase state, therefore, it is possible to absorb metal plane diffraction grating 40 thickness deviation,
Curved surface fixes the impact of the face precision of substrate 43.
Embodiment 4
Said using the manufacture method of the model 5 of the curved diffraction gratings in the 4th embodiments of the Fig. 7 to the present invention
It is bright.On planar substrates, the diffraction grating pattern 58 with zigzag fashion is formed by photoetching and using resist (resin), from
And form plane diffraction grating substrate 50 ((a) in Fig. 7).Be formed with the face of diffraction grating pattern 58 formed kind of film it
Afterwards, by being electrolysed plating come laminated metal material ((b) in Fig. 7).By from stripping metal on plane diffraction grating substrate 50
Material, so as to form the metal plane diffraction grating 57 ((c) in Fig. 7) of the diffraction grating pattern 51 with zigzag fashion.
Here, when by photolithographic fabrication plane diffraction grating substrate 50, compared with mechanical imprint, can be made at short notice
Make, also, when from stripping metal plane diffraction grating 57 on plane diffraction grating 50, by making resist (resin) molten
Solution such that it is able to easily peeled off.There is diffraction grating pattern 51 in the formation of metal plane diffraction grating substrate 57
On the opposing face in face, by being deposited with or printing as the film forming of the solder 52 ((d) in Fig. 7) of grafting material.It is solid in curved surface
Determine on the face for installing metal diffraction grating substrate 50 of substrate 53, by sputtering or being deposited with the engagement with the eutectic of solder 52
The film forming of material 54 ((e) in Fig. 7).The face that the formation of metal plane diffraction grating substrate 57 has diffraction grating pattern 51 is set
Put in the side of concave surface substrate 55, the face for being formed with solder 52 is arranged on into curved surface and fixes the side of substrate 53 ((f) in Fig. 7).In vacuum
Under environment, apply temperature and the load more than eutectic point of grafting material, make the diffraction of metal plane diffraction grating substrate 57
The formation face of grating pattern 51 follows concave surface substrate 55, while carrying out the grafting material 54 that solder 52 fixes substrate 53 with curved surface
Eutectic reaction, so as to be installed ((g) in Fig. 7).Cooled down in the state of load is applied, make solder 52 and engage material
After expecting 54 immobilizations, concave surface substrate 25 is removed, so as to by metal curved diffraction gratings substrate 56 is via solder 52 and engages
Material 54 is arranged on curved surface and fixes on substrate 53 ((h) in Fig. 7).By removing the outer of metal curved diffraction gratings substrate 56
All portions, so as to form the model 5 ((i) in Fig. 7) of curved diffraction gratings.By make metal plane diffraction grating substrate 57 with
Curved surface is deformed into concave surface substrate 55, so that the face for being formed with diffraction grating pattern 51 becomes the face essence of concave surface substrate 55
Degree.Further, since solder 52 and grafting material 54 are in liquid phase state under eutectic point, spread out therefore, it is possible to absorb metal plane
Penetrate the impact that the thickness deviation of grating 57, curved surface fix the face precision of substrate 23.
Embodiment 5
Method with regard to manufacturing curved diffraction gratings 6 using the model of the curved diffraction gratings described in embodiment 1～4,
Illustrate using Fig. 8 and by taking the model 2 of the curved diffraction gratings described in embodiment 1 as an example.In addition, with regard to the institute of embodiment 2～4
The model 3,4,5 of the curved diffraction gratings stated, also makes curved diffraction gratings 6 using same manufacture method.
The metal curved diffraction gratings substrate 26 by the diffraction grating pattern 21 with zigzag fashion via solder 22,
The diffraction of the model 2 ((a) in Fig. 8) of curved diffraction gratings made by curved surface fixation substrate 23 of grafting material 24
On the surface of the side of grating pattern 21, peel ply, reflectance coating 61 ((b) in Fig. 8) are formed.Consolidating for liquid is set on reflectance coating 61
Change resin 62, fixed substrate 63 ((c) in Fig. 8).After the resin is cured, reflection is peeled off from the model 2 of curved diffraction gratings
Face 61, resin 62, fixed substrate 63, so as to manufacture curved diffraction gratings 6 ((d) in Fig. 8).Alternatively, it is also possible to replace resin
And use and there is flexible metal film.Alternatively, it is also possible in the model 2 using curved diffraction gratings, and by nano impression etc.
After technology is transferred to diffraction grating pattern 21 on resin 62, reflectance coating 61 is formed in its surface.
By the way that the curved diffraction gratings 6 are mounted on Optical devices 1, it is possible to increase using curved diffraction gratings 6 (13)
Light to irradiating from light source 11 carries out the spectroscopic behaviour (diffraction efficiency) of light splitting, and can reduce veiling glare (noise), therefore,
Can realize can be to the illumination wavelength component of sample 16 close to the Optical devices 1 of the light splitting light of fixed value.Thereby, it is possible to tight
The absorption spectrum of ground measurement sample 16.
Symbol description
1 Optical devices
11 light sources
12nd, 14 slit
13 curved diffraction gratings
15 collecting lenses
16 samples
17 detectors
2nd, the model of 3,4,5 curved diffraction gratings
20th, 40 metal plane diffraction grating substrate
30th, 50 plane diffraction grating substrate
21st, 31,41,51 diffraction grating pattern
22nd, 32,42,52 solder
23rd, 33,43,53 curved surfaces fix substrate
24th, 34,44,54 grafting material
25th, 35,45,55 concave surface substrate
26th, 36,46,56 metal curved diffraction gratings substrate
37th, 57 metal plane diffraction grating substrate
6 curved diffraction gratings
61 reflectance coatings
62 resins
63 fix substrate
Claims (15)
1. a kind of manufacture method of the model of curved diffraction gratings, it is characterised in that include：
The operation of diffraction grating pattern is formed on planar substrates；
The work of the 1st grafting material is formed on the face of faces that the are planar substrates and being formed with diffraction grating pattern opposition side
Sequence；
By the operation with the 2nd grafting material film forming of the 1st grafting material eutectic on curved substrate；And
The planar substrates are clamped using the curved substrate and concave surface substrate and apply the operation of load.
2. the manufacture method of the model of curved diffraction gratings as claimed in claim 1, it is characterised in that
The operation that diffraction grating pattern is formed on the planar substrates is performed by machining.
3. the manufacture method of the model of curved diffraction gratings as claimed in claim 1, it is characterised in that
The operation that diffraction grating pattern is formed on the planar substrates is performed by photoetching and etching.
4. the manufacture method of the model of curved diffraction gratings as claimed in claim 1, it is characterised in that
The diffraction grating pattern indention shape.
5. the manufacture method of the model of curved diffraction gratings as claimed in claim 1, it is characterised in that
The planar substrates are metal.
6. the manufacture method of the model of curved diffraction gratings as claimed in claim 1, it is characterised in that
By forming diffraction grating pattern on another planar substrates, there is diffraction grating figure in the formation of another planar substrates
Multilayer board material on the face of case, and the baseplate material is peeled off, diffraction grating pattern is transferred on the baseplate material, from
And manufacture the planar substrates for being formed with diffraction grating pattern.
7. the manufacture method of the model of curved diffraction gratings as claimed in claim 6, it is characterised in that
The operation that diffraction grating pattern is formed on another planar substrates is performed by machining.
8. the manufacture method of the model of curved diffraction gratings as claimed in claim 6, it is characterised in that
The operation that diffraction grating pattern is formed on another planar substrates is performed by photoetching and etching.
9. the manufacture method of the model of curved diffraction gratings as claimed in claim 6, it is characterised in that
The diffraction grating pattern indention shape.
10. the manufacture method of the model of curved diffraction gratings as claimed in claim 6, it is characterised in that
The baseplate material is metal.
A kind of 11. manufacture methods of curved diffraction gratings, it use by the method any one of claim 1 to 10
The model of the curved diffraction gratings of manufacture,
The manufacture method of the curved diffraction gratings is characterised by, including：
The operation of peel ply and reflectance coating is formed on the surface of the diffraction grating pattern side of the model of curved diffraction gratings；With
The operation of fixed substrate is set on the reflectance coating via solidified resin.
A kind of 12. manufacture methods of curved diffraction gratings, it use by the method any one of claim 1 to 10
The model of the curved diffraction gratings of manufacture,
The manufacture method of the curved diffraction gratings is characterised by, including：
The operation of peel ply and reflectance coating is formed on the surface of the diffraction grating pattern side of the model of curved diffraction gratings；With
The operation of fixed substrate is set on the reflectance coating via metal film.
A kind of 13. manufacture methods of curved diffraction gratings, it use by the method any one of claim 1 to 10
The model of the curved diffraction gratings of manufacture,
The manufacture method of the curved diffraction gratings is characterised by, including：
Using the model of curved diffraction gratings, the operation diffraction grating pattern being transferred on resin；With
By the operation of reflectance coating film forming on the surface of resin.
A kind of 14. curved diffraction gratings, it is characterised in that
By will be formed on the pattern transfer of curved diffraction gratings to metal or resin, wherein, the curved diffraction gratings
Model is the plane diffraction grating substrate deformation that diffraction grating pattern is formed with planar substrates is formed for curved.
15. a kind of Optical devices, it is characterised in that possess curved diffraction gratings, light source, slit, collective optics and detector,
Wherein, the curved diffraction gratings on the pattern transfer of curved diffraction gratings to metal or resin by will form, the song
It is song that the model of face diffraction grating is the plane diffraction grating substrate deformation for making to be formed with diffraction grating pattern on planar substrates
Planar and formed.
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| JP2014-211310 | 2014-10-16 | ||
| JP2014211310 | 2014-10-16 | ||
| PCT/JP2015/076211 WO2016059928A1 (en) | 2014-10-16 | 2015-09-16 | Method of manufacturing mold for curved diffraction grating, method of manufacturing curved diffraction grating, curved diffraction grating, and optical device |
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| CN106574998A true CN106574998A (en) | 2017-04-19 |
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| Country | Link |
|---|---|
| JP (1) | JP6510548B2 (en) |
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| WO (1) | WO2016059928A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111095043A (en) * | 2017-12-27 | 2020-05-01 | 株式会社日立高新技术 | Method for manufacturing concave diffraction grating, and analyzer using same |
| CN112313548A (en) * | 2018-08-29 | 2021-02-02 | 株式会社日立高新技术 | Concave diffraction grating, method for manufacturing same, and optical device |
| CN113759451A (en) * | 2021-08-11 | 2021-12-07 | 广州先进技术研究所 | Processing device and preparation method of curved surface grating |
| CN114174872A (en) * | 2019-08-29 | 2022-03-11 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
| CN115004065A (en) * | 2020-02-20 | 2022-09-02 | 株式会社日立高新技术 | Concave diffraction grating and optical device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3828603A4 (en) * | 2018-07-23 | 2022-04-20 | Hitachi High-Tech Corporation | Method and device for manufacturing concave diffraction grating, and concave diffraction grating |
| JP7301201B2 (en) * | 2018-08-29 | 2023-06-30 | 株式会社日立ハイテク | Manufacturing method of concave diffraction grating |
| US11674661B2 (en) * | 2019-03-07 | 2023-06-13 | Omron Corporation | Method for manufacturing light guiding plate, light guiding plate, and lighting tool for vehicle |
| JP2021196536A (en) * | 2020-06-16 | 2021-12-27 | 株式会社日立ハイテク | Manufacturing method of concave diffraction grating and optical device |
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| WO2013183601A1 (en) * | 2012-06-08 | 2013-12-12 | 株式会社日立ハイテクノロジーズ | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same |
| WO2014148118A1 (en) * | 2013-03-19 | 2014-09-25 | 株式会社日立ハイテクノロジーズ | Curved diffraction grating, production method therefor, and optical device |
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| EP0007108B1 (en) * | 1978-07-18 | 1983-04-13 | Nippon Telegraph and Telephone Public Corporation | A method of manufacturing a diffraction grating structure |
| JPH08211214A (en) * | 1995-02-07 | 1996-08-20 | Olympus Optical Co Ltd | Production of curved face grating |
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2015
- 2015-09-16 CN CN201580044297.4A patent/CN106574998A/en active Pending
- 2015-09-16 WO PCT/JP2015/076211 patent/WO2016059928A1/en active Application Filing
- 2015-09-16 JP JP2016554020A patent/JP6510548B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013183601A1 (en) * | 2012-06-08 | 2013-12-12 | 株式会社日立ハイテクノロジーズ | Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same |
| WO2014148118A1 (en) * | 2013-03-19 | 2014-09-25 | 株式会社日立ハイテクノロジーズ | Curved diffraction grating, production method therefor, and optical device |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111095043A (en) * | 2017-12-27 | 2020-05-01 | 株式会社日立高新技术 | Method for manufacturing concave diffraction grating, and analyzer using same |
| US11391871B2 (en) | 2017-12-27 | 2022-07-19 | Hitachi High-Tech Corporation | Manufacturing method of concave diffraction grating, concave diffraction grating, and analyzer using the same |
| CN112313548A (en) * | 2018-08-29 | 2021-02-02 | 株式会社日立高新技术 | Concave diffraction grating, method for manufacturing same, and optical device |
| US11366255B2 (en) | 2018-08-29 | 2022-06-21 | Hitachi High-Tech Corporation | Concave diffraction grating, method for producing the same, and optical device |
| CN114174872A (en) * | 2019-08-29 | 2022-03-11 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
| CN114174872B (en) * | 2019-08-29 | 2023-10-17 | 株式会社日立高新技术 | Diffraction grating, method for manufacturing diffraction grating, and photomask |
| CN115004065A (en) * | 2020-02-20 | 2022-09-02 | 株式会社日立高新技术 | Concave diffraction grating and optical device |
| CN113759451A (en) * | 2021-08-11 | 2021-12-07 | 广州先进技术研究所 | Processing device and preparation method of curved surface grating |
| CN113759451B (en) * | 2021-08-11 | 2023-11-03 | 广州先进技术研究所 | Curved surface grating processing device and preparation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2016059928A1 (en) | 2017-06-15 |
| WO2016059928A1 (en) | 2016-04-21 |
| JP6510548B2 (en) | 2019-05-08 |
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Application publication date: 20170419 |