CN106571428A - Preparation method for preparing RGBW four-color OLED display elements - Google Patents
Preparation method for preparing RGBW four-color OLED display elements Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H—ELECTRICITY
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Abstract
The invention relates to a preparation method for preparing RGBW four-color OLED display elements. The method comprises the steps of 11, for the elements of a to-be-evaporated sub-pixel light-emitting layer, evaporating a first color light-emitting material onto a first color sub-pixel region through a first precision metal mask plate, and then evaporating the material onto a white sub-pixel region through the displacement of the first precision metal mask plate; 12, evaporating a second color light-emitting material onto a second color sub-pixel region through a second precision metal mask plate, and then evaporating the material onto the white sub-pixel region through the displacement of the second precision metal mask plate; 13, evaporating a third color light-emitting material onto a third color sub-pixel region through a third precision metal mask plate, and then evaporating the material onto the white sub-pixel region through the displacement of the third precision metal mask plate. The first color light-emitting material, the second color light-emitting material and the third color light-emitting material are different and are respectively correspond to one of a blue light-emitting material, a red light-emitting material and a green light-emitting material. Based on the above method, the number of precision metal mask plates and the number of vacuum evaporation cavities are not increased at all.
Description
Technical field
The present invention relates to field of liquid crystal, more particularly to a kind of preparation method of the color OLED display elements of RGBW tetra-.
Background technology
Full-color organic light emitting diode (Organic Light-emitting Diodes, OLED) device is that this area is public
Know, usual Full color OLED devices are made up of red (R), green (G) and blue (B) three sub-pixels, are become rgb pixel and are set
Meter.With pursuit of the people to Display Technique, the OLED with red, green, blue and white (W) four sub-pixels shows unit
Part is developed, i.e. the sub-pixel OLED display elements of RGBW tetra-.Compared with the OLED display elements of RGB, the OLED of RGBW shows
Show that element is improved in energy consuming components.White light OLED element (WOLED) in the sub-pixel OLED of RGBW tetra- generally passes through
Three sub-pixel stackings of red, green, blue or blue, yellow (Y) two sub-pixel stackings are realized.OLED sandwich constructions can include anode
(Anode), hole injection layer (HIL), hole transmission layer (HTL), electronic barrier layer (EBL), luminescent layer (EML), electric transmission
Layer (ETL), hole blocking layer (HBL), electron injecting layer (EIL), negative electrode (Cathode) and cathodic protection layer (CPL) etc..
In United States Patent (USP) US that Eastman Kodak Company Michael Siwinski et al. were announced in 2002
In US20020186214A1, by constituting the colour organic luminous diodes of RGBW tetra- by red, green, blue and white light emitting element, realize
The method of display energy-conservation, wherein white-light luminescent component luminescent layer are white luminescent materials.
Eastman Kodak Company Dustin Winters announce United States Patent (USP) US7030553 in, by by it is red,
Green, blue and white four colors light-emitting component constitutes the colour organic luminous diodes of RGBW tetra-, and wherein W is realized by B+Y.
Also from Eastman Kodak Companies John E.Ludwicki in United States Patent (USP) US7510454, pass through
White light OLED and colored filter (Color Filter, CF) method realize the color OLED display elements of RGBW tetra-；Dustin
L.Winters realizes the color OLED display elements of RGBW tetra- in United States Patent (USP) US7524226 again by white light OLED+CF, and
Different designs have been carried out to pel array；Michael L.Boroson are in United States Patent (USP) US7564182 by white light of connecting
OLED+RGB three color scheme color media, realize the color OLED display elements of RGBW tetra-.
The color OLED display elements of RGB tri- are made in prior art, typically luminous organic material is passed through into the sub-pixels of RGB tri-
Each self-corresponding precision metallic mask plate (Fine Metal Mask, FMM) is deposited with substrate substrate, is prepared into OLED element,
It is deposited with operation to be deposited with red light emitting layer, green light emitting layer and blue light-emitting layer respectively using three high-precision metal mask plates,
So as to corresponding position forms red sub-pixel, green sub-pixels and blue subpixels on substrate.Specifically, high-precision metal
Mask plate is provided with blocked area and multiple openings, and when the luminescent layer of one of which color is deposited with, blocked area correspondence shelters from base
The position of other two kinds of color sub-pixels of correspondence on plate, opening correspondence is exposed on substrate to should color sub-pixels to be deposited
Position.
When making tetra- color OLED display elements of RGBW, such as realized using the method for existing white light OLED and colored filter
The color OLED display elements of RGBW tetra- can cause energy efficiency utilization rate low, if each corresponded to using tri- sub-pixels of similar RGB
Precision metallic mask plate method, tetra- sub-pixels of RGBW will need four precision metallic mask plates, while also needing to extra
A white light sub-pixel vacuum evaporation cavity.Therefore a kind of preparation method of the new color OLED display elements of RGBW tetra- is needed badly.
The content of the invention
Therefore, it is an object of the invention to provide a kind of preparation method of the color OLED display elements of RGBW tetra-, does not increase essence
Close metal mask plate number and vacuum evaporation number of cavities.
For achieving the above object, the invention provides a kind of preparation method of the color OLED display elements of RGBW tetra-, including：
Step 11, for the element of sub-pixel for emitting light layer to be deposited, by the first colour light emitting material by the first accurate gold
Category mask plate is deposited with to the first color sub-pixels region, then by the displacement evaporation of the first precision metallic mask plate to white sub- picture
Plain region；
Step 12, by the second colour light emitting material by the second precision metallic mask plate be deposited with to the second color sub-pixels area
Domain, then by the displacement evaporation of the second precision metallic mask plate to white sub-pixels region；
Step 13, by the 3rd colour light emitting material by the 3rd precision metallic mask plate be deposited with to the 3rd color sub-pixels area
Domain, then by the displacement evaporation of the 3rd precision metallic mask plate to white sub-pixels region；
Wherein the first colour light emitting material, the second colour light emitting material and the 3rd colour light emitting material are different and distinguish
One of correspondence blue emitting material, red illuminating material and green luminescent material.
Wherein, also include：
Step 10, on the pixel substrates of RGBW tetra- for completing TFT processing procedures, anode, hole injection layer, hole are carried out successively
Transport layer, the film forming of electronic barrier layer, obtain the element of sub-pixel for emitting light layer to be deposited.
Wherein, also include：
Step 14, for complete be deposited with sub-pixel for emitting light layer element, carry out successively hole blocking layer, electron transfer layer,
The film forming of electron injecting layer, negative electrode.
Wherein, also include：
Step 15, the film forming for carrying out on the negative electrode cathodic protection layer, finally carry out again cover plate encapsulation or thin-film package,
Complete the preparation of the color OLED display elements of RGBW tetra-.
Wherein, the blue emitting material is blue-fluorescence luminescent material or blue phosphorescent luminescent material, the emitting red light
Material is red fluorescence luminescent material or red phosphorescent luminescent material, the green luminescent material be green fluorescence luminescent material or
Person's green phosphorescent luminescent material.
Wherein, for white sub-pixels region, blue-fluorescence luminescent material is deposited with first, red phosphorescent is then deposited with successively
Luminescent material, green phosphorescent luminescent material.
Wherein, for white sub-pixels region, blue phosphorescent luminescent material is deposited with first, be then first deposited with red phosphorescent and send out
Luminescent material, rear evaporation green phosphorescent luminescent material, or first it is deposited with green phosphorescent luminescent material, the luminous material of rear evaporation red phosphorescent
Material.
Wherein, for white sub-pixels region, blue-fluorescence luminescent material is deposited with first, green fluorescence is then deposited with successively
Luminescent material, red fluorescence luminescent material.
Wherein, the red sub-pixel of the color OLED display elements of RGBW tetra-, green sub-pixels, blue subpixels and white
Pixel is arranged in Tian-shaped, and the right side of blue subpixels is white sub-pixels, and the lower section of blue subpixels is green sub-pixels, in vain
The lower section of sub-pixels is red sub-pixel.
Present invention also offers a kind of preparation method of the color OLED display elements of RGBW tetra-, including：
Step 21, for the element of sub-pixel for emitting light layer to be deposited, the first face is deposited with by the first precision metallic mask plate
Color luminescent material is to the first color sub-pixels region and white sub-pixels region, the perforate correspondence of the first precision metallic mask plate
The first color sub-pixels region and white sub-pixels region；
Step 22, by the second precision metallic mask plate be deposited with the second colour light emitting material to the second color sub-pixels region
With white sub-pixels region, the perforate of the second precision metallic mask plate is to should the second color sub-pixels region and white sub- picture
Plain region；
Step 23, by the 3rd precision metallic mask plate be deposited with the 3rd colour light emitting material to the 3rd color sub-pixels region
With white sub-pixels region, the perforate of the 3rd precision metallic mask plate is to should the 3rd color sub-pixels region and white sub- picture
Plain region；
Wherein the first colour light emitting material, the second colour light emitting material and the 3rd colour light emitting material are different and distinguish
One of correspondence blue emitting material, red illuminating material and green luminescent material.
To sum up, the preparation method of the color OLED display elements of RGBW tetra- of the invention do not increase precision metallic mask plate number and
Vacuum evaporation number of cavities.
Description of the drawings
Below in conjunction with the accompanying drawings, described in detail by the specific embodiment to the present invention, technical scheme will be made
And other beneficial effects are apparent.
In accompanying drawing,
Fig. 1 is the process schematic of the preferred embodiment of preparation method first of the color OLED display elements of RGBW of the present invention tetra-；
Fig. 2 be the color OLED display elements of RGBW of the present invention tetra- the preferred embodiment of preparation method first in precision metallic mask
The displacement diagram of plate；
Fig. 3 A are the component structure by three sub-pixels of red, green, blue in the sub-pixel OLED of RGBW obtained in the present invention tetra-
Schematic diagram；
Fig. 3 B are the component structure schematic diagram by white sub-pixels in the sub-pixel OLED of RGBW obtained in the present invention tetra-；
Fig. 4 is the process schematic of the preferred embodiment of preparation method second of the color OLED display elements of RGBW of the present invention tetra-；
Fig. 5 be the color OLED display elements of RGBW of the present invention tetra- the preferred embodiment of preparation method second in precision metallic mask
Plate position of opening schematic diagram；
Fig. 6 is the flow chart of the preparation method of the color OLED display elements of RGBW of the present invention tetra-.
Specific embodiment
Referring to Fig. 6, it is the flow chart of the preparation method of the color OLED display elements of RGBW of the present invention tetra-, is mainly included：
Step 11, for the element of sub-pixel for emitting light layer to be deposited, by the first colour light emitting material by the first accurate gold
Category mask plate is deposited with to the first color sub-pixels region, then by the displacement evaporation of the first precision metallic mask plate to white sub- picture
Plain region；
Step 12, by the second colour light emitting material by the second precision metallic mask plate be deposited with to the second color sub-pixels area
Domain, then by the displacement evaporation of the second precision metallic mask plate to white sub-pixels region；
Step 13, by the 3rd colour light emitting material by the 3rd precision metallic mask plate be deposited with to the 3rd color sub-pixels area
Domain, then by the displacement evaporation of the 3rd precision metallic mask plate to white sub-pixels region；
Wherein the first colour light emitting material, the second colour light emitting material and the 3rd colour light emitting material are different and distinguish
One of correspondence blue emitting material, red illuminating material and green luminescent material.
Can also further include：
Step 10, on the pixel substrates of RGBW tetra- for completing TFT processing procedures, anode, hole injection layer, hole are carried out successively
Transport layer, the film forming of electronic barrier layer, obtain the element of sub-pixel for emitting light layer to be deposited；
Step 14, for complete be deposited with sub-pixel for emitting light layer element, carry out successively hole blocking layer, electron transfer layer,
The film forming of electron injecting layer, negative electrode；
Step 15, the film forming for carrying out on the negative electrode cathodic protection layer, finally carry out again cover plate encapsulation or thin-film package,
Complete the preparation of the color OLED display elements of RGBW tetra-.
Referring to the process schematic that Fig. 1 and Fig. 2, Fig. 1 are the first preferred embodiment of the invention, Fig. 2 is the first preferably enforcement
The displacement diagram of precision metallic mask plate in example.
1) as shown in figure 1, shown in the sub-pixel ranking methods of RGBW tetra- such as Fig. 1 (f).The color OLED display elements of RGBW tetra-
Red sub-pixel, green sub-pixels, blue subpixels and white sub-pixels are arranged in Tian-shaped, and the right side of blue subpixels is white
Sub-pixels, the lower section of blue subpixels is green sub-pixels, and the lower section of white sub-pixels is red sub-pixel.
2) on the pixel substrates of RGBW tetra- (rigid substrates or flexible base board) for completing TFT processing procedures, by general gold
Category mask plate (Common Metal Mask) carries out successively anode (if anode has been present, has directly carried out hole injection layer steaming
Plating), hole injection layer, hole transmission layer, the film forming of electronic barrier layer, obtain sub-pixel for emitting light layer to be deposited shown in Fig. 1 (a)
Element.
3) on the basis of element (a) shown in Fig. 1, the steaming of Day-Glo blue sub-pixel is carried out by precision metallic mask plate
Plating, blue subpixels can first be deposited with d1 in blue subpixel areas, then the displacement Fig. 2 for passing through precision metallic mask plate away from
From evaporation to white sub-pixels region obtains element (b) shown in Fig. 1；
4) on the basis of element (b) shown in Fig. 1, the evaporation of red sub-pixel is carried out by precision metallic mask plate, first
By red phosphorescent sub-pixel evaporation to red subpixel areas, element (c) shown in Fig. 1 is obtained, then red phosphorescent sub-pixel is led to
The distance for crossing d3 in displacement Fig. 2 of precision metallic mask plate is deposited with to white that blue luminescence layer film forming has been carried out
Pixel region obtains element (d) shown in Fig. 1；
5) on the basis of element (d) shown in Fig. 1, the steaming of green phosphorescent sub-pixel is carried out by precision metallic mask plate
Plating, first by green phosphorescent sub-pixel evaporation to green subpixel areas, obtains element (e) shown in Fig. 1, then by the sub- picture of green phosphorescent
D2 distances evaporation is covered to white sub-pixels region finally by common metal in displacement Fig. 2 that element passes through precision metallic mask plate
Template (Common Metal Mask) carries out successively hole blocking layer, electron transfer layer, electron injecting layer, negative electrode, cathodic protection
The film forming of layer (Capping Layer), obtains element (f) shown in Fig. 1；
6) cover plate encapsulation (for rigid substrates) or thin-film package are finally carried out again (for rigid substrates or flexible base
Plate), complete the preparation of the sub-pixel OLED display elements of RGBW tetra-.
Referring to Fig. 3 A and Fig. 3 B, Fig. 3 A are by three sons of red, green, blue in the sub-pixel OLED of RGBW obtained in the present invention tetra-
The component structure schematic diagram of pixel, Fig. 3 B are the element by white sub-pixels in the sub-pixel OLED of RGBW obtained in the present invention tetra-
Structural representation.
In the sub-pixel OLED of RGBW tetra- component structure of three sub-pixels of red, green, blue as shown in Figure 3A, wherein hole transport
The number of layer (include electronic barrier layer) and electron transfer layer (comprising hole blocking layer) can according to the performance of element with
And correlative factor is adjusted.
In the sub-pixel OLED of RGBW tetra- component structure of white sub-pixels as shown in Figure 3 B, if blue subpixels be fluorescence
Luminescent layer, then stack gradually red phosphorescent luminescent layer, green phosphorescent luminescent layer；If blue subpixels are phosphorescence luminescent layer,
The stacking order of red phosphorescent luminescent layer and green phosphorescent luminescent layer is not limited；If blue subpixels are fluorescent light-emitting layer,
Then stack gradually green fluorescence luminescent layer, red fluorescence luminescent layer.That is, for white sub-pixels region, can be first
Evaporation blue-fluorescence luminescent material, is then deposited with successively red phosphorescent luminescent material, green phosphorescent luminescent material.For white son
Pixel region, it is also possible to be deposited with blue phosphorescent luminescent material first, is then first deposited with red phosphorescent luminescent material, rear evaporation green
Phosphorescent light-emitting materials, or first it is deposited with green phosphorescent luminescent material, rear evaporation red phosphorescent luminescent material.For white sub-pixels area
Domain, can also first be deposited with blue-fluorescence luminescent material, and the luminous material of green fluorescence luminescent material, red fluorescence is then deposited with successively
Material.
Referring to the preferred embodiment of preparation method second that Fig. 4 and Fig. 5, Fig. 4 are the color OLED display elements of RGBW of the present invention tetra-
Process schematic, Fig. 5 be the second preferred embodiment in precision metallic mask plate position of opening schematic diagram.
1) as shown in figure 4, shown in the sub-pixel ranking methods of RGBW tetra- such as Fig. 4 (d).
2) on the pixel substrates of RGBW tetra- (rigid substrates or flexible base board) for completing TFT processing procedures, by general gold
Category mask plate (Common Metal Mask) carries out successively anode (if anode has been present, has directly carried out hole injection layer steaming
Plating), hole injection layer, hole transmission layer, the film forming of electronic barrier layer, obtain sub-pixel for emitting light layer to be deposited shown in Fig. 4 (a)
Element.
3) on the basis of element (a) shown in Fig. 4, the steaming of Day-Glo blue sub-pixel is carried out by precision metallic mask plate
Plating, blue subpixels are by (a) precision metallic shown in Fig. 5 mask plate position of opening A1 evaporations to blue subpixel areas and white
Subpixel area；Pass sequentially through (b) shown in Fig. 5, (c) precision metallic mask plate position of opening A2 and A3 carry out red phosphorescent light
Layer and green phosphorescent luminescent layer are to respective pixel region and the film forming in white pixel region；
4) carry out hole blocking layer, electronics successively finally by common metal mask plate (Common Metal Mask) to pass
Defeated layer, electron injecting layer, negative electrode, the film forming of cathodic protection layer (Capping Layer), obtain element (d) shown in Fig. 4；
5) cover plate encapsulation (for rigid substrates) or thin-film package are finally carried out again (for rigid substrates or flexible base
Plate), complete the preparation of the sub-pixel OLED display elements of RGBW tetra-.
6) in the sub-pixel OLED of RGBW tetra- component structure of three sub-pixels of red, green, blue as depicted in fig. 3, white sub- picture
Plain structure and each luminescent layer stacking order are as described by Fig. 3 B.
Summary embodiment, precision metallic mask plate technique of the present invention based on the sub-pixel OLED of existing RGB tri-, not
It is extra to increase precision metallic mask plate number, and in the case of vacuum coating cavity numbers, using adjustment precision metallic mask plate
The displacement (Mask-Shift) of (Fine Metal Mask) or the position of opening of precision metallic mask plate are realizing the colors of RGBW tetra-
OLED display elements.Compared to the sub-pixels OLED display elements of traditional RGB tri-, with the advantage for more preferably showing GTG, aobvious
Energy consumption is reduced when showing white picture；Compared to the method that white light OLED adds colored filter, energy utilization efficiency of the present invention is high,
Show same frame when, the present invention display element it is low in energy consumption.In order to reach the effect above, there are following steps：
1) on the pixel substrates of RGBW tetra- (rigid substrates or flexible base board) for completing TFT processing procedures, by general gold
Category mask plate carries out successively anode (if anode Already in carries out hole injection layer evaporation on substrate, directly), hole note
Enter the film forming of layer, hole transmission layer, electronic barrier layer；
2) in step 1) on the basis of, the evaporation of blue subpixels, blue subpixels are carried out by precision metallic mask plate
Blue subpixel areas and white sub-pixels region can be once deposited with, it is also possible to which first evaporation arrives blue subpixel areas, then
By the displacement evaporation of precision metallic mask plate to white sub-pixels region；Wherein blue subpixels luminescent material can be blueness
Fluorescence luminescent material or blue emitting phosphor luminescent material；
3) in step 2) on the basis of, if step 2) adopt blue-fluorescence luminescent material, by precision metallic mask
Plate carries out the evaporation of phosphorescent red sub-pixel, and red sub-pixel can be once deposited with to red subpixel areas and white sub-pixels
Region, it is also possible to which first evaporation is arrived first by red subpixel areas, then by precision metallic mask plate displacement evaporation to white sub- picture
Plain region；Thereafter through same method by green phosphorescent luminescent material once or mask plate displacement plated film is to respective pixel area
Domain；
4) in step 2) on the basis of, if step 2) using blue phosphorescent luminescent material, red phosphorescent luminescent material
Red plated film can be first carried out according to actual needs carrying out green plated film with green phosphorescent luminescent material, or is held in turn
OK；The same step 3) of execution method；
5) in step 4) on the basis of, hole blocking layer, electron transfer layer, electricity are carried out successively by common metal mask plate
The film forming of sub- implanted layer, negative electrode；
In step 5) on the basis of, the film forming of cathodic protection layer (Capping Layer) is carried out, cover plate envelope is finally carried out again
Dress (being directed to rigid substrates) or thin-film package (for rigid substrates or flexible base board), complete the sub-pixel OLED of RGBW tetra- and show
The preparation of element.
Known and potential technology/product applications of the invention and its application mode are as follows：
1) wearable device such as Intelligent bracelet, intelligent watch, VR (Virtual Reality, i.e. virtual reality), electronics skin
The equipment such as skin；
2) mobile phone；
3) e-book and electronic newspaper；
4) television set；
5) personal portable computer；
6) the OLED Display Techniques such as rigid, foldable and rollable OLED；
7) new OLED shows.
In sum, the preparation method of the color OLED display elements of RGBW tetra- of the invention does not increase precision metallic mask plate number
Mesh and vacuum evaporation number of cavities.
The above, for the person of ordinary skill of the art, can be with technology according to the present invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to appended right of the invention
The protection domain of requirement.
Claims (10)
1. the preparation method of the color OLED display elements of a kind of RGBW tetra-, it is characterised in that include：
Step 11, for the element of sub-pixel for emitting light layer to be deposited, the first colour light emitting material is covered by the first precision metallic
Template is deposited with to the first color sub-pixels region, then by the displacement evaporation of the first precision metallic mask plate to white sub-pixels area
Domain；
Step 12, by the second colour light emitting material by the second precision metallic mask plate be deposited with to the second color sub-pixels region,
Again by the displacement evaporation of the second precision metallic mask plate to white sub-pixels region；
Step 13, by the 3rd colour light emitting material by the 3rd precision metallic mask plate be deposited with to the 3rd color sub-pixels region,
Again by the displacement evaporation of the 3rd precision metallic mask plate to white sub-pixels region；
Wherein the first colour light emitting material, the second colour light emitting material and the 3rd colour light emitting material are different and correspond to respectively
One of blue emitting material, red illuminating material and green luminescent material.
2. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that also include：
Step 10, on the pixel substrates of RGBW tetra- for completing TFT processing procedures, anode, hole injection layer, hole transport are carried out successively
Layer, the film forming of electronic barrier layer, obtain the element of sub-pixel for emitting light layer to be deposited.
3. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that also include：
Step 14, for complete be deposited with sub-pixel for emitting light layer element, hole blocking layer, electron transfer layer, electronics are carried out successively
The film forming of implanted layer, negative electrode.
4. the preparation method of the color OLED display elements of RGBW as claimed in claim 3 tetra-, it is characterised in that also include：
Step 15, the film forming for carrying out on the negative electrode cathodic protection layer, finally carry out again cover plate encapsulation or thin-film package, complete
The preparation of the color OLED display elements of RGBW tetra-.
5. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that the blue-light-emitting material
Expect for blue-fluorescence luminescent material or blue phosphorescent luminescent material, the red illuminating material be red fluorescence luminescent material or
Red phosphorescent luminescent material, the green luminescent material is green fluorescence luminescent material or green phosphorescent luminescent material.
6. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that for white sub- picture
Plain region, is deposited with first blue-fluorescence luminescent material, and the luminous material of red phosphorescent luminescent material, green phosphorescent is then deposited with successively
Material.
7. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that for white sub- picture
Plain region, is deposited with first blue phosphorescent luminescent material, is then first deposited with red phosphorescent luminescent material, rear evaporation green phosphorescent and lights
Material, or first it is deposited with green phosphorescent luminescent material, rear evaporation red phosphorescent luminescent material.
8. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that for white sub- picture
Plain region, is deposited with first blue-fluorescence luminescent material, and the luminous material of green fluorescence luminescent material, red fluorescence is then deposited with successively
Material.
9. the preparation method of the color OLED display elements of RGBW as claimed in claim 1 tetra-, it is characterised in that the colors of RGBW tetra-
The red sub-pixel of OLED display elements, green sub-pixels, blue subpixels and white sub-pixels are arranged in Tian-shaped, blue son
The right side of pixel is white sub-pixels, and the lower section of blue subpixels is green sub-pixels, and the lower section of white sub-pixels is red son
Pixel.
10. the preparation method of the color OLED display elements of a kind of RGBW tetra-, it is characterised in that include：
Step 21, for the element of sub-pixel for emitting light layer to be deposited, the first color is deposited with by the first precision metallic mask plate and is sent out
Finish expects the first color sub-pixels region and white sub-pixels region, and the perforate of the first precision metallic mask plate is to should
One color sub-pixels region and white sub-pixels region；
Step 22, the second colour light emitting material to the second color sub-pixels region and white is deposited with by the second precision metallic mask plate
Sub-pixels region, the perforate of the second precision metallic mask plate is to should the second color sub-pixels region and white sub-pixels area
Domain；
Step 23, the 3rd colour light emitting material to the 3rd color sub-pixels region and white is deposited with by the 3rd precision metallic mask plate
Sub-pixels region, the perforate of the 3rd precision metallic mask plate is to should the 3rd color sub-pixels region and white sub-pixels area
Domain；
Wherein the first colour light emitting material, the second colour light emitting material and the 3rd colour light emitting material are different and correspond to respectively
One of blue emitting material, red illuminating material and green luminescent material.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107591429A (en) * | 2017-09-14 | 2018-01-16 | 武汉华星光电半导体显示技术有限公司 | A kind of pixel arrangement structure and preparation method thereof |
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