CN106526735A - Wire grating polarizer, manufacturing method and liquid crystal display panel - Google Patents
Wire grating polarizer, manufacturing method and liquid crystal display panel Download PDFInfo
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- CN106526735A CN106526735A CN201710008157.2A CN201710008157A CN106526735A CN 106526735 A CN106526735 A CN 106526735A CN 201710008157 A CN201710008157 A CN 201710008157A CN 106526735 A CN106526735 A CN 106526735A
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- wiregrating
- wire
- unit
- underlay substrate
- grid polarizer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
Abstract
The invention provides a wire grating polarizer, a manufacturing method and a liquid crystal display (LCD) panel. A large-sized wire grating polarizer which does not leak light is realized, and a large-sized LCD including the wire grating polarizer is thus realized. The wire grating polarizer comprises a substrate and at least two wire grating unit layers arranged on the substrate, each wire grating unit layer comprises at least one wire grating unit, the wire grating units in any wire grating unit layer are independent and spaced from each other, and the positive projections of all the wire grating units on the substrate form a wire grating structure.
Description
Technical field
The application is related to display technology field, more particularly to a kind of wire-grid polarizer and preparation method, LCD
Plate.
Background technology
Wire-grid polarizer (Wire Grid Polarizer, WGP) is made up of diffraction grating, and which has the light for making transmission
Become the function of polarized light, for example, abreast configured as grid stroke using the spacing that is shorter than the wavelength of light on the glass substrate
Multiple metal wires so that wire-grid polarizer is carried out to the light that the electric field projected from light source is vibrated on the direction parallel with grid stroke
Reflection, while the light vibrated on the direction vertical with grid stroke for electric field is transmitted, so as to the light for projecting light source turns
It is changed to polarized light.
At present, traditional polaroid (POL) is replaced using wire-grid polarizer in some liquid crystal displays (LCD), and also
Wire-grid polarizer is built in display floater, to realize the ultrathin of product.Referring to Fig. 1, current wire-grid polarizer includes
Underlay substrate 1 and the wire grid construction 2 being arranged on underlay substrate, generally make line using nanometer embossing in the prior art
Grid structure, referring to Fig. 2, the manufacture method of wire grid construction comprises the steps：
Metallic film 02 is formed on underlay substrate 01；
Nano-imprinting materials thin film 03 is formed on metallic film 02；
Using nano-imprint stamp 04, Nano-imprinting materials thin film 03 is imprinted, form coining pattern.
For large-sized LCD, large-sized wire-grid polarizer is needed, and the size of existing nano-imprint stamp is usual
Less than the size of the wire grid construction of large-sized wire-grid polarizer, the wire grid construction to be formed, at least need to be imprinted twice,
One wiregrating unit of correspondence is imprinted each time, and correspondingly, wire grid construction can be divided at least two wiregrating units.However, multiple
It is in moulding process, according to the mode that Nano-imprinting materials thin film is formed on whole face underlay substrate, after first time imprints, whole
Nano-imprinting materials thin film on the underlay substrate of face is all cured, it is impossible to carries out impressing next time again, therefore cannot produce institute
The wire grid construction for needing；According to the mode that Nano-imprinting materials thin film is formed on local substrate substrate, imprinting area periphery
Nano-imprinting materials thin film can also solidify so that there is gap between adjacent coining pattern, that is, adjacent in the wire grid construction for being formed
Can there is gap between wiregrating unit, the gap typically in millimeter magnitude, therefore, natural light can from gap transmissive, i.e.,
There is the situation of light leak in the wire-grid polarizer of formation, if the wire-grid polarizer of the light leak is applied in LCD, will be unable to meet
The prescription of LCD.
To sum up, which kind of mode no matter is taken, in prior art, cannot all realizes lighttight large-sized wire-grid polarizer,
So as to the large-sized LCD comprising wire-grid polarizer cannot be realized.
The content of the invention
The embodiment of the present application provides a kind of wire-grid polarizer and preparation method, display panels, to realize not leaking
Large-sized wire-grid polarizer of light, so as to realize the large-sized LCD comprising wire-grid polarizer.
A kind of wire-grid polarizer that the embodiment of the present application is provided, including：Underlay substrate and it is arranged on the underlay substrate
At least two wiregrating elementary layers, each described wiregrating elementary layer includes at least one wiregrating unit, any one of line
Separate and spaced setting between each wiregrating unit in grid elementary layer, whole wiregrating units are on the underlay substrate
Orthographic projection constitute wire grid construction.
The wire-grid polarizer that the embodiment of the present application is provided, including：Underlay substrate and it is arranged on the underlay substrate extremely
Few two wiregrating elementary layers, each described wiregrating elementary layer include at least one wiregrating unit, any one of wiregrating list
Separate and spaced setting between each wiregrating unit in first layer, whole wiregrating units on the underlay substrate just
Projection constitutes wire grid construction, as the adjacent wiregrating cell distribution of the orthographic projection on underlay substrate is in different wiregrating elementary layers,
Therefore the making of each wiregrating unit is not affected by the adjacent wiregrating unit of the orthographic projection with which on underlay substrate, therefore,
Lighttight large-sized wire-grid polarizer can be produced, such that it is able to realize the large-sized LCD comprising wire-grid polarizer.
It is preferred that there is overlapping region between the adjacent wiregrating unit of orthographic projection on the underlay substrate.
Due to there is overlapping region between the adjacent wiregrating unit of the orthographic projection on underlay substrate, such that it is able to further
Avoid there is gap between the adjacent wiregrating unit of the orthographic projection on underlay substrate, therefore, it can produce and preferably do not leak
Large-sized wire-grid polarizer of light, such that it is able to realize the preferably large-sized LCD comprising wire-grid polarizer.
It is preferred that there are two wiregrating units of overlapping region in the orthographic projection on the underlay substrate, described
Orthographic projection of each grid line in overlapping region on the underlay substrate overlaps.
Because there are two wiregrating units of overlapping region, each grid in overlapping region in the orthographic projection on underlay substrate
Orthographic projection of the line on underlay substrate overlaps, and does not thus interfere with the transmitance of wire-grid polarizer.
It is preferred that the width of the overlapping region is less than 1 micron.
As the width of overlapping region is less than 1 micron, the characteristic of wire-grid polarizer is not thus interfered with.
It is preferred that being provided with flatness layer between the adjacent wiregrating elementary layer.
Due to being provided with flatness layer between adjacent wiregrating elementary layer, so it is easy to during wire-grid polarizer is made
Make wiregrating elementary layer.
It is preferred that depth of the thickness of the flatness layer not less than grid line in the wiregrating unit.
As the thickness of flatness layer is not less than the depth of grid line in wiregrating unit, such flatness layer can cover previously making
Wiregrating unit, in order to make wiregrating unit on flatness layer again.
The embodiment of the present application additionally provides a kind of display panels, including：Array base palte, opposite substrate and it is located at
Liquid crystal layer between the array base palte and the opposite substrate, also including being arranged at the array base palte side and/or described right
To the wire-grid polarizer that the application any embodiment of substrate-side is provided.
As the display panels of the embodiment of the present application offer are in array base palte side and/or opposite substrate side, employ
Above-mentioned wire-grid polarizer, and above-mentioned wire-grid polarizer includes：Underlay substrate and it is arranged on the underlay substrate at least
Two wiregrating elementary layers, each described wiregrating elementary layer include at least one wiregrating unit, any one of wiregrating unit
Separate and spaced setting, just throwing of whole wiregrating units on the underlay substrate between each wiregrating unit in layer
Shadow constitutes wire grid construction, as the adjacent wiregrating cell distribution of the orthographic projection on underlay substrate is in different wiregrating elementary layers, therefore
The making of each wiregrating unit is not affected by the adjacent wiregrating unit of the orthographic projection with which on underlay substrate, therefore, can
To produce lighttight large-sized wire-grid polarizer, such that it is able to realize the large-sized LCD comprising wire-grid polarizer.
It is preferred that between level in the wire-grid polarizer between the adjacent wiregrating unit of the orthographic projection on underlay substrate
The position that gap or overlapping region are located, it is corresponding with the interstitial site between the pixel cell in the display panels.
It is preferred that between level in the wire-grid polarizer between the adjacent wiregrating unit of the orthographic projection on underlay substrate
Gap or the size of overlapping region, the size in the gap between no more than corresponding pixel cell.
Due to by the horizontal clearance in wire-grid polarizer between the adjacent wiregrating unit of the orthographic projection on underlay substrate or
Overlapping region is arranged on the corresponding position in gap between pixel cell, therefore, it is possible to not affect the display effect of LCD.
The embodiment of the present application additionally provides a kind of preparation method of wire-grid polarizer, and the method includes：Using nano impression
Technology forms at least two wiregrating elementary layers for including at least one wiregrating unit on underlay substrate；Wherein, any one institute
State that each wiregrating unit in wiregrating elementary layer is separate and spaced setting, whole wiregrating units are on the underlay substrate
Orthographic projection constitute wire grid construction, in the nanometer embossing of employing once impressing correspondence one wiregrating unit.
Wire-grid polarizer is prepared using the method, due to once impressing one line of correspondence in the nanometer embossing of employing
Grid unit, and the adjacent wiregrating unit of the orthographic projection on underlay substrate is formed in different wiregrating elementary layers, therefore each wiregrating list
The making of unit is not affected by the adjacent wiregrating unit of the orthographic projection with which on underlay substrate, therefore, it can produce not
Large-sized wire-grid polarizer of light leak, such that it is able to realize the large-sized LCD comprising wire-grid polarizer.
It is preferred that being formed described in any two between wiregrating elementary layer, the method also includes：In two wiregratings
Flatness layer is formed between elementary layer.
Due to being also formed with flatness layer between adjacent wiregrating elementary layer, so during wire-grid polarizer is made just
In making wiregrating elementary layer.
It is preferred that one wiregrating elementary layer of the formation, including：
One is formed on the position of each wiregrating unit for being formed on the underlay substrate or the flatness layer
Metallic film region；
Nano-imprinting materials thin film is formed on whole metallic film regions；
Using nano-imprint stamp, the Nano-imprinting materials thin film on metallic film region each described is carried out
Once imprint, form coining pattern；
Using the coining pattern as etch mask plate, whole metallic film regions are performed etching, form a wiregrating
Elementary layer.
It is preferred that the size in the metallic film region is not more than the size of the nano-imprint stamp.
As the size in metallic film region is not more than the size of nano-imprint stamp, so once imprints and can just make
Make a wiregrating unit, the display effect of LCD will not be impacted due to having more metallic film.
Description of the drawings
Fig. 1 is the structural representation of wire-grid polarizer in prior art；
Fig. 2 is the method schematic diagram in prior art using nanometer embossing formation wire-grid polarizer；
A kind of structural representation of wire-grid polarizer that Fig. 3 is provided for the embodiment of the present application；
The first distribution schematic diagram of wiregrating unit in the wire-grid polarizer that Fig. 4 is provided for the embodiment of the present application；
Second distribution schematic diagram of wiregrating unit in the wire-grid polarizer that Fig. 5 is provided for the embodiment of the present application；
The third distribution schematic diagram of wiregrating unit in the wire-grid polarizer that Fig. 6 is provided for the embodiment of the present application；
The preparation technology schematic flow sheet of the wire-grid polarizer that Fig. 7 (a)～Fig. 7 (j) is provided for the embodiment of the present application；
A kind of structural representation of display panels that Fig. 8 is provided for the embodiment of the present application.
Specific embodiment
The embodiment of the present application provides a kind of wire-grid polarizer and preparation method, display panels, to realize not leaking
Large-sized wire-grid polarizer of light, so as to realize the large-sized LCD comprising wire-grid polarizer.
Below in conjunction with the accompanying drawing in the embodiment of the present application, the technical scheme in the embodiment of the present application is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only some embodiments of the present application, rather than the embodiment of whole.It is based on
Embodiment in the application, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of the application protection.
It should be noted that the thickness and shape of each layer do not reflect actual proportions in illustrations, purpose is simply illustrated
Illustrate teachings herein.
Referring to Fig. 3, a kind of wire-grid polarizer that the embodiment of the present application is provided, including：Underlay substrate 11 and it is arranged at substrate
At least two wiregrating elementary layers 12 on substrate 11, each wiregrating elementary layer 12 include at least one wiregrating unit 121 (as schemed
In 3 shown in dotted line frame), it is separate between each wiregrating unit 121 in any one wiregrating elementary layer 12 and spaced set
Put, orthographic projection of whole wiregrating units 121 on underlay substrate 11 constitutes wire grid construction.
As the adjacent wiregrating unit 121 of the orthographic projection on underlay substrate 11 is distributed in different wiregrating elementary layers 12, therefore
The making of each wiregrating unit 121 is not affected by the wiregrating unit 121 adjacent with its orthographic projection on underlay substrate 11,
Therefore, it can produce lighttight large-sized wire-grid polarizer, such that it is able to realize the large scale comprising wire-grid polarizer
LCD.
Wherein, the size of each wiregrating unit 121 can be consistent, it is also possible to inconsistent, as long as on underlay substrate 11
The adjacent wiregrating unit 121 of orthographic projection is not located at same wiregrating elementary layer 12, and the embodiment of the present application is not limited to which
It is fixed.
It should be noted that the wire grid construction of above-mentioned wire-grid polarizer can be distributed one by a wiregrating elementary layer 12
The mode of wiregrating unit 121 is realized, if the wire grid construction includes multiple wiregrating units 121, the wiregrating using this structure is inclined
Shaking device can be thicker, for example：As shown in figure 4, the wire grid construction of wire-grid polarizer is divided into 9 wiregrating units 121, this 9 wiregratings
Unit 121 is distributed in 9 wiregrating elementary layers, for which wiregrating elementary layer concrete which wiregrating unit 121 is distributed in, this Shen
Please embodiment do not limit；The wire grid construction of above-mentioned wire-grid polarizer can also be by the distribution of at least one wiregrating elementary layer 12 two
The mode of individual above wiregrating unit 121 realizes, can reduce the number of plies of making using this structure, inclined such that it is able to thinning wiregrating
Shake device, and then can be with thinning LCD, such as：The wire grid construction of wire-grid polarizer is divided into 9 wiregrating units, in this 9 wiregrating units
Can be that the non-conterminous wiregrating unit of four orthographic projections on underlay substrate 1211 is distributed in first wire grid elementary layer, two
The non-conterminous wiregrating unit of orthographic projection on underlay substrate 1212 is distributed in the second wiregrating elementary layer, and two in underlay substrate
On the non-conterminous wiregrating unit of orthographic projection 1213 be distributed in the 3rd wiregrating elementary layer, a wiregrating unit 1214 is distributed in
In four wiregrating elementary layers, as shown in Figure 5；Three orthographic projections on underlay substrate not phase is can also be in this 9 wiregrating units
Adjacent wiregrating unit 1215 is distributed in first wire grid elementary layer, the non-conterminous wiregrating list of three orthographic projections on underlay substrate
Unit 1216 is distributed in the second wiregrating elementary layer, and the non-conterminous wiregrating unit of two orthographic projections on underlay substrate 1217 is distributed
In the 3rd wiregrating elementary layer, a wiregrating unit 1218 is distributed in the 4th wiregrating elementary layer, as shown in Figure 6；The application reality
Example is applied to the position of first wire grid elementary layer, the second wiregrating elementary layer, the 3rd wiregrating elementary layer and the 4th wiregrating elementary layer not
It is defined.
In a better embodiment, as shown in figure 3, in order to further avoid the orthographic projection on underlay substrate adjacent
There is gap between wiregrating unit, can be arranged to deposit between the adjacent wiregrating unit 121 of the orthographic projection on underlay substrate 11
In overlapping region.
Certainly, can not also there is overlapping region between the adjacent wiregrating unit 121 of the orthographic projection on underlay substrate 11, only
Will the adjacent wiregrating unit 121 of the orthographic projection on underlay substrate 11 be distributed in different wiregrating elementary layers 12 can, the application reality
Apply example and be not limited thereof.
In a better embodiment, as shown in figure 3, the transmitance in order to not affect wire-grid polarizer, in underlay substrate
There are two wiregrating units 121 of overlapping region in the orthographic projection on 11, each grid line 13 in the overlapping region is in underlay substrate
Orthographic projection on 11 can be arranged to overlap.
Certainly, there are two wiregrating units 121 of overlapping region in the orthographic projection on underlay substrate 11, in the overlapping region
In orthographic projection of each grid line 13 on underlay substrate 11 can not also overlap, for example：Each grid line in overlapping region
13 orthographic projections on underlay substrate 11 partially overlap, and simply this set can affect the transmitance of wire-grid polarizer, the application
Embodiment is simultaneously not limited thereof.
In a better embodiment, as shown in figure 3, the characteristic in order to not affect wire-grid polarizer, the width of overlapping region
Degree L can be set smaller than 1 micron.
In a better embodiment, as shown in figure 3, in order to be easy to make wiregrating during wire-grid polarizer is made
Unit, can be provided with flatness layer 14 between adjacent wiregrating elementary layer 12.
In a better embodiment, as shown in figure 3, in order that flatness layer can cover the wiregrating unit of previous making,
In order to make wiregrating unit on the flatness layer again, the thickness of flatness layer 14 can be arranged to not less than in wiregrating unit 121
The depth of grid line 13.
In a better embodiment, as shown in figure 3, it is flat on the wiregrating elementary layer 12 of the superiors to be also provided with one
Smooth layer 14, to protect the wiregrating unit 121 in the wiregrating elementary layer 12.
Based on same inventive concept, the embodiment of the present application additionally provides a kind of preparation method of wire-grid polarizer, the method
Comprise the steps：At least two lines for including at least one wiregrating unit are formed on underlay substrate using nanometer embossing
Grid elementary layer；Wherein, each wiregrating unit in any one of wiregrating elementary layer is separate and spaced setting, all
Orthographic projection of the wiregrating unit on the underlay substrate constitutes wire grid construction, and the once impressing in the nanometer embossing of employing is right
Answer a wiregrating unit.
Due to the once impressing one wiregrating unit of correspondence in the nanometer embossing of employing, and on underlay substrate just
The adjacent wiregrating unit of projection is formed in different wiregrating elementary layers, thus the making of each wiregrating unit not by with which in substrate base
The impact of the adjacent wiregrating unit of orthographic projection on plate, therefore, it can produce lighttight large-sized wire-grid polarizer, from
And the large-sized LCD comprising wire-grid polarizer can be realized.
In a better embodiment, in order to be easy to make wiregrating elementary layer during wire-grid polarizer is made,
Formed described in any two between wiregrating elementary layer, the method can also include：The shape between this two wiregrating elementary layers
Into flatness layer.
Wherein, flatness layer can for example pass through cvd silicon oxide (SiO2) or silicon nitride (SiNx) form.
In a better embodiment, one wiregrating elementary layer of above-mentioned formation can include：
One is formed on the position of each wiregrating unit for being formed on the underlay substrate or the flatness layer
Metallic film region；
Nano-imprinting materials thin film is formed on whole metallic film regions；
Using nano-imprint stamp, the Nano-imprinting materials thin film on metallic film region each described is carried out
Once imprint, form coining pattern；
Using the coining pattern as etch mask plate, whole metallic film regions are performed etching, form a wiregrating
Elementary layer.
Wherein, metallic film can for example be aluminium film, Ag films, chromium thin film, Copper thin film or aluminum, silver, chromium, copper
The alloy firm that alloy is formed.
In the embodiment of the present application, the nanometer embossing of employing can be that hot padding, or ultra-violet curing are imprinted, or
Person is other impressing modes, and the embodiment of the present application is simultaneously not limited thereof.
It is pointed out that in the embodiment of the present application, the wiregrating knot for being smaller in size than wire-grid polarizer of nano-imprint stamp
The size of structure, it is therefore desirable to imprinted at least twice to form the wire grid construction, and impressing one wiregrating of correspondence each time
Unit.
In a better embodiment, in order that once imprint, will not be due to
Have more metallic film and affect the display effect of LCD, metallic film region can be sized to no more than nano impression mould
The size of plate.
In a better embodiment, a flatness layer can be also formed on the wiregrating elementary layer of the superiors, to protect
Wiregrating unit in the wiregrating elementary layer.
Two wiregrating elementary layers are included with wire-grid polarizer below, a wiregrating elementary layer includes two wiregrating units, separately
As a example by one wiregrating elementary layer includes a wiregrating unit, the embodiment of the present application is illustrated with reference to accompanying drawing 7 (a)～7 (j) and carried
For wire-grid polarizer preparation technology flow process.
Step one, referring to Fig. 7 (a), on underlay substrate 101 be used for form first wire grid unit 102 and the second wiregrating list
A first aluminium film region 104 is formed on the position of unit 103 respectively；
Step 2, referring to Fig. 7 (b), the first Nano-imprinting materials thin film 105 is formed on the first aluminium film region 104；
Wherein, the first Nano-imprinting materials thin film 105 is the impressing that can be solidified by ultraviolet (UV) illumination at room temperature
Glue.
Step 3, referring to Fig. 7 (c), using nano-imprint stamp 106, on the first aluminium film of above-mentioned two region 104
First Nano-imprinting materials thin film 105 is respectively once imprinted and UV solidifications, forms the first coining pattern 107；
Step 4, referring to Fig. 7 (d), it is using the first coining pattern 107 as etch mask plate, thin to the first aluminum of above-mentioned two
Diaphragm area 104 is performed etching, and forms first wire grid unit 102 and the second wiregrating unit 103 (as shown in dotted line frame in Fig. 7 (d))；
Step 5, referring to Fig. 7 (e), form the first flatness layer on first wire grid unit 102 and the second wiregrating unit 103
108；
Step 6, referring to Fig. 7 (f), for forming shape on the position of the 3rd wiregrating unit 109 on the first flatness layer 108
Into a second aluminium film region 201；
Step 7, referring to Fig. 7 (g), the second Nano-imprinting materials thin film 202 is formed on the second aluminium film region 201；
Wherein, the second Nano-imprinting materials thin film 202 is the impressing that can be solidified by ultraviolet (UV) illumination at room temperature
Glue.
Step 8, referring to Fig. 7 (h), using nano-imprint stamp 106, to second nanometer on the second aluminium film region 201
Impression materials thin film 202 is once imprinted and UV solidifications, forms the second coining pattern 203；
Step 9, referring to Fig. 7 (i), using the second coining pattern 203 as etch mask plate, to the second aluminium film region 201
Perform etching, form the 3rd wiregrating unit 109 (as shown in dotted line frame in Fig. 7 (i))；
Step 10, referring to Fig. 7 (j), the second flatness layer 204 is formed on the 3rd wiregrating unit 109.
Based on same inventive concept, the embodiment of the present application additionally provides a kind of display panels, referring to Fig. 8, including：Battle array
Row substrate 81, opposite substrate 82, and the liquid crystal layer 83 between array base palte 81 and opposite substrate 82, also including being arranged at
The wire-grid polarizer 84 that the application any embodiment of 81 side of array base palte is provided.Wherein, wire-grid polarizer 84 is built in liquid crystal
In display floater, the ultrathin of product can be so realized.
Certainly, wire-grid polarizer 84 may be alternatively located at 82 side of opposite substrate, or 82 side of 81 side of array base palte and opposite substrate
Wire-grid polarizer 84 is both provided with, the embodiment of the present application is simultaneously not limited thereof.
Due to the adjacent wiregrating unit of the orthographic projection in the wire-grid polarizer 84 in display panels on underlay substrate
Different wiregrating elementary layers are distributed in, therefore the making of each wiregrating unit is not adjacent by the orthographic projection with which on underlay substrate
The impact of wiregrating unit, therefore, it can produce lighttight large-sized wire-grid polarizer 84, such that it is able to realize comprising line
Large-sized LCD of grid polarizer 84.
In a better embodiment, as shown in figure 8, the orthographic projection phase in wire-grid polarizer 84 on underlay substrate 841
The position that horizontal clearance or overlapping region between adjacent wiregrating unit 842 (as shown in dotted line frame in Fig. 8) is located, with liquid crystal
Show that the interstitial site between the pixel cell in panel is corresponding.
In a better embodiment, as shown in figure 8, the display effect in order to not affect LCD, in wire-grid polarizer 84
The size of horizontal clearance or overlapping region between the adjacent wiregrating unit 842 of orthographic projection on underlay substrate 841, can be arranged
Into the size in the gap between no more than corresponding pixel cell.
In sum, in the technical scheme that the embodiment of the present application is provided, wire-grid polarizer includes：Underlay substrate and it is arranged at
At least two wiregrating elementary layers on the underlay substrate, each described wiregrating elementary layer include at least one wiregrating unit,
Separate and spaced setting between each wiregrating unit in any one of wiregrating elementary layer, whole wiregrating units exist
Orthographic projection on the underlay substrate constitutes wire grid construction, due to the adjacent wiregrating cell distribution of the orthographic projection on underlay substrate
In different wiregrating elementary layers, therefore the making of each wiregrating unit is not by the wiregrating that the orthographic projection with which on underlay substrate is adjacent
The impact of unit, therefore, it can produce lighttight large-sized wire-grid polarizer, such that it is able to realize comprising wire grid polarization
Large-sized LCD of device.
Obviously, those skilled in the art can carry out the essence of various changes and modification without deviating from the application to the application
God and scope.So, if these modifications of the application and modification belong to the scope of the application claim and its equivalent technologies
Within, then the application is also intended to comprising these changes and modification.
Claims (13)
1. a kind of wire-grid polarizer, it is characterised in that include：Underlay substrate and at least two be arranged on the underlay substrate
Wiregrating elementary layer, each described wiregrating elementary layer include at least one wiregrating unit, in any one of wiregrating elementary layer
Each wiregrating unit between separate and spaced setting, orthographic projection structure of whole wiregrating units on the underlay substrate
Into wire grid construction.
2. wire-grid polarizer according to claim 1, it is characterised in that the orthographic projection on the underlay substrate is adjacent
There is overlapping region between the wiregrating unit.
3. wire-grid polarizer according to claim 2, it is characterised in that the orthographic projection on the underlay substrate has weight
Two wiregrating units in folded region, orthographic projection of each grid line in the overlapping region on the underlay substrate are mutual
Overlap.
4. the wire-grid polarizer according to Claims 2 or 3, it is characterised in that the width of the overlapping region is micro- less than 1
Rice.
5. the wire-grid polarizer according to any one of claims 1 to 3, it is characterised in that the adjacent wiregrating elementary layer
Between be provided with flatness layer.
6. wire-grid polarizer according to claim 5, it is characterised in that the thickness of the flatness layer is not less than the wiregrating
The depth of grid line in unit.
7. a kind of display panels, including：Array base palte, opposite substrate and be located at the array base palte and it is described to
Liquid crystal layer between substrate, it is characterised in that also including be arranged at the array base palte side and/or the opposite substrate side as
Wire-grid polarizer described in any one of claim 1～6.
8. display panels according to claim 7, it is characterised in that in the wire-grid polarizer on underlay substrate
The adjacent wiregrating unit of orthographic projection between horizontal clearance or the position that is located of overlapping region, in the display panels
Pixel cell between interstitial site it is corresponding.
9. display panels according to claim 8, it is characterised in that in the wire-grid polarizer on underlay substrate
The adjacent wiregrating unit of orthographic projection between horizontal clearance or overlapping region size, no more than corresponding pixel cell
Between gap size.
10. a kind of preparation method of wire-grid polarizer, it is characterised in that the method includes：
At least two wiregrating elementary layers for including at least one wiregrating unit are formed on underlay substrate using nanometer embossing；
Wherein, each wiregrating unit in any one of wiregrating elementary layer is separate and spaced setting, whole wiregrating units
Orthographic projection on the underlay substrate constitutes wire grid construction, one institute of once impressing correspondence in the nanometer embossing of employing
State wiregrating unit.
11. methods according to claim 10, it is characterised in that being formed described in any two between wiregrating elementary layer,
The method also includes：Flatness layer is formed between this two wiregrating elementary layers.
12. methods according to claim 11, it is characterised in that one wiregrating elementary layer of the formation, including：
A metal is formed on the position of each wiregrating unit for being formed on the underlay substrate or the flatness layer
Thin membrane regions；
Nano-imprinting materials thin film is formed on whole metallic film regions；
Using nano-imprint stamp, the Nano-imprinting materials thin film on metallic film region each described is carried out once
Impressing, forms coining pattern；
Using the coining pattern as etch mask plate, whole metallic film regions are performed etching, form a wiregrating unit
Layer.
13. methods according to claim 12, it is characterised in that the size in the metallic film region is not more than described receiving
The size of rice impression block.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710008157.2A CN106526735A (en) | 2017-01-05 | 2017-01-05 | Wire grating polarizer, manufacturing method and liquid crystal display panel |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710008157.2A CN106526735A (en) | 2017-01-05 | 2017-01-05 | Wire grating polarizer, manufacturing method and liquid crystal display panel |
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| CN106526735A true CN106526735A (en) | 2017-03-22 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710008157.2A Pending CN106526735A (en) | 2017-01-05 | 2017-01-05 | Wire grating polarizer, manufacturing method and liquid crystal display panel |
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| CN108508521A (en) * | 2018-03-30 | 2018-09-07 | 武汉华星光电技术有限公司 | Polarization grating with light shield layer and preparation method thereof, array substrate, display panel, display module and terminal |
| CN110579903A (en) * | 2019-10-17 | 2019-12-17 | 京东方科技集团股份有限公司 | array substrate, manufacturing method thereof, liquid crystal display panel and display device |
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| CN108508521A (en) * | 2018-03-30 | 2018-09-07 | 武汉华星光电技术有限公司 | Polarization grating with light shield layer and preparation method thereof, array substrate, display panel, display module and terminal |
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| US20210116744A1 (en) * | 2019-10-17 | 2021-04-22 | Boe Technology Group Co., Ltd. | Array substrate, fabrication method thereof, liquid crystal display panel and display device |
| CN110579903B (en) * | 2019-10-17 | 2023-04-14 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method thereof, liquid crystal display panel and display device |
| US11822178B2 (en) * | 2019-10-17 | 2023-11-21 | Boe Technology Group Co., Ltd. | Array substrate, fabrication method thereof, liquid crystal display panel and display device |
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