CN105824148B - A kind of preparation method of color membrane substrates, color membrane substrates and relevant apparatus - Google Patents
A kind of preparation method of color membrane substrates, color membrane substrates and relevant apparatus Download PDFInfo
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- CN105824148B CN105824148B CN201610371241.6A CN201610371241A CN105824148B CN 105824148 B CN105824148 B CN 105824148B CN 201610371241 A CN201610371241 A CN 201610371241A CN 105824148 B CN105824148 B CN 105824148B
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- light resistance
- predeterminable area
- resistance layer
- color light
- spacer material
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
The invention discloses a kind of preparation method of color membrane substrates, color membrane substrates and relevant apparatus, due in predeterminable area at least two layers of color light resistance layer, when the figure to each color light resistance layer, which carries out heat, dries processing, the color light resistance layer in predeterminable area may be constructed spacer material；And the overlapping area of adjacent two layers color light resistance layer is positively correlated the height of spacer material due to constituting after hot baking processing in predeterminable area with before hot baking is handled, therefore pass through the overlapping area between the adjacent two layers color light resistance layer in control predeterminable area, can in the case where not influencing the thickness of color light resistance layer intense adjustment spacer material height, to not influence the coloration of liquid crystal display panel and reduce technique controlling difficulty.
Description
Technical field
The present invention relates to field of display technology, in particular to a kind of preparation method of color membrane substrates, color membrane substrates, liquid crystal
Show panel and display device.
Background technique
Liquid crystal display panel (LCD, Liquid Crystal Display), generally by color membrane substrates and array substrate to box
Form, and layer of liquid crystal molecule is clipped between color membrane substrates and array substrate, in order to guarantee layer of liquid crystal molecule thickness homogeneity,
It is generally necessary to which the spacer material of support is arranged.
Existing color membrane substrates, generally comprise: red photoresist layer, green photoresist layer and blue light resistance layer, positioned at not sharing the same light
Black matrix between resistance layer and the main spacer material in black matrix and time spacer material；Wherein the height of main spacer material is greater than secondary
The height of spacer material.Currently, generally in the technique for making different photoresist layers, although a kind of photoresist layer and main spacer material can be made
It is formed simultaneously with secondary spacer material, but the light transmission rate in the region due to being correspondingly formed photoresist layer in different mask plates is identical, and
And light transmission rate and the light transmission rate that is correspondingly formed main dottle pin object area in the region of photoresist layer and right are correspondingly formed in mask plate
The relationship that should be formed between the light transmission rate in time spacer material region is fixed.Therefore, when adjusting main dottle pin according to actual needs
When the height of object and time spacer material, the thickness that will cause the photoresist layer changes, so as to cause the coloration of liquid crystal display panel
Variation, and technique controlling difficulty is caused to increase.
Summary of the invention
The embodiment of the present invention provides preparation method, color membrane substrates, liquid crystal display panel and the display dress of a kind of color membrane substrates
Set, to solve in the prior art when adjusting the height of main spacer material and time spacer material according to actual needs, caused by colour
The problem of coloration variation of display panel caused by the thickness of photoresist layer changes and technique controlling difficulty increase.
Therefore, the embodiment of the invention provides a kind of preparation methods of color membrane substrates, comprising:
The figure of at least three kinds color light resistance layers is sequentially formed on underlay substrate；Wherein, in predeterminable area at least two
Layer color light resistance layer, in the predeterminable area close to the color light resistance layer of the underlay substrate for the first photoresist layer, described the
One photoresist layer is higher than first photoresist layer in other areas in addition to the predeterminable area in the thickness in the predeterminable area
The thickness in domain；
After the figure for forming each color light resistance layer, further includes: carry out hot baking to the figure of each color light resistance layer
It handles, the color light resistance layer in the predeterminable area constitutes spacer material；And the spacer material constituted after the hot baking processing
Height and dry the overlapping area of adjacent two layers color light resistance layer in processing foregoing description predeterminable area in the heat and be positively correlated.
Preferably, the predeterminable area includes the first preset areas in above-mentioned preparation method provided in an embodiment of the present invention
Domain and the second predeterminable area, the height of the spacer material of first predeterminable area are greater than the spacer material of second predeterminable area
Highly.
Preferably, in above-mentioned preparation method provided in an embodiment of the present invention, chromatic photoresist in first predeterminable area
The number of plies of layer is greater than the number of plies of color light resistance layer in second predeterminable area.
Preferably, in above-mentioned preparation method provided in an embodiment of the present invention, chromatic photoresist in first predeterminable area
The number of plies of layer is equal to the number of plies of color light resistance layer in second predeterminable area, and each colour in first predeterminable area
Photoresist layer the sum of thickness before carrying out hot baking processing be greater than in second predeterminable area each color light resistance layer into
The sum of thickness before the hot baking processing of row.
Preferably, the figure of each color light resistance layer is distinguished in above-mentioned preparation method provided in an embodiment of the present invention
It is formed by a patterning processes.
Correspondingly, the embodiment of the invention also provides a kind of color membrane substrates, including underlay substrate, cover the underlay substrate
At least three kinds color light resistance layers figure, further includes: the spacer material in predeterminable area, and the spacer material is by least two
The layer color light resistance layer is formed after overheat baking processing；
With the color light resistance layer of the underlay substrate close in the predeterminable area for the first photoresist layer, first photoresist
Layer is higher than first photoresist layer in the thickness in other regions in addition to the predeterminable area in the thickness in the predeterminable area
Degree；And the height of the spacer material dries adjacent two layers color light resistance layer in processing foregoing description predeterminable area in the heat
Overlapping area is positively correlated.
Preferably, the predeterminable area includes the first preset areas in above-mentioned color membrane substrates provided in an embodiment of the present invention
Domain and the second predeterminable area, the height of the spacer material of first predeterminable area are greater than the spacer material of second predeterminable area
Highly.
Preferably, in above-mentioned color membrane substrates provided in an embodiment of the present invention, chromatic photoresist in first predeterminable area
The number of plies of layer is greater than the number of plies of color light resistance layer in second predeterminable area.
Preferably, in above-mentioned color membrane substrates provided in an embodiment of the present invention, chromatic photoresist in first predeterminable area
The number of plies of layer is equal to the number of plies of color light resistance layer in second predeterminable area, and each colour in first predeterminable area
Photoresist layer the sum of thickness before carrying out hot baking processing be greater than in second predeterminable area each color light resistance layer into
The sum of thickness before the hot baking processing of row.
Correspondingly, the embodiment of the invention also provides a kind of liquid crystal display panel, including it is provided in an embodiment of the present invention on
State any color membrane substrates.
Correspondingly, the embodiment of the invention also provides a kind of display devices, including above-mentioned provided in an embodiment of the present invention
A kind of liquid crystal display panel.
Preparation method, color membrane substrates, liquid crystal display panel and the display of above-mentioned color membrane substrates provided in an embodiment of the present invention
Device, due in predeterminable area at least two layers of color light resistance layer, when the figure to each color light resistance layer, which carries out heat, dries processing,
Color light resistance layer in predeterminable area may be constructed spacer material；And the height of the spacer material due to being constituted after hot baking processing
With the overlapping area of adjacent two layers color light resistance layer is positively correlated in predeterminable area before hot baking processing, therefore it is pre- by control
If the overlapping area between adjacent two layers color light resistance layer in region, can be the case where not influencing the thickness of color light resistance layer
The height of lower intense adjustment spacer material, to not influence the coloration of liquid crystal display panel and reduce technique controlling difficulty.
Detailed description of the invention
Fig. 1 is the flow chart of the preparation method of color membrane substrates provided in an embodiment of the present invention；
Fig. 2 a is one of the schematic diagram of the section structure of color membrane substrates provided in an embodiment of the present invention；
Fig. 2 b is the two of the schematic diagram of the section structure of color membrane substrates provided in an embodiment of the present invention；
Fig. 3 a to Fig. 3 e is respectively that embodiment one executes the schematic diagram of the section structure after each step；
Fig. 4 a and Fig. 4 b are respectively that embodiment two executes the schematic diagram of the section structure after each step.
Specific embodiment
In order to make the purpose of the present invention, the technical scheme and advantages are more clear, with reference to the accompanying drawing, to the embodiment of the present invention
The preparation methods of the color membrane substrates of offer, color membrane substrates, liquid crystal display panel and display device specific embodiment carry out it is detailed
Carefully illustrate.
Each layer film thickness and shape do not reflect the actual proportions of color membrane substrates in attached drawing, and purpose is schematically illustrate hair
Bright content.
The embodiment of the invention provides a kind of preparation methods of color membrane substrates, as shown in Figure 1, comprising the following steps:
S101, the figure that at least three kinds color light resistance layers are sequentially formed on underlay substrate；Wherein, predeterminable area at least
There is two layers of color light resistance layer, with the color light resistance layer of underlay substrate close in predeterminable area for the first photoresist layer, the first photoresist layer
Thickness in predeterminable area is higher than the first photoresist layer in the thickness in other regions in addition to predeterminable area；
S102, after the figure for forming each color light resistance layer, further includes: hot baking is carried out to the figure of each color light resistance layer
It handles, the color light resistance layer in predeterminable area constitutes spacer material；And the height of spacer material constituted after hot baking processing with
The overlapping area of adjacent two layers color light resistance layer is positively correlated in predeterminable area before hot baking processing.
The preparation method of above-mentioned color membrane substrates provided in an embodiment of the present invention, comprising: sequentially formed on underlay substrate to
The figure of few three kinds of color light resistance layers；Wherein, in predeterminable area at least two layers of color light resistance layer, with lining close in predeterminable area
The color light resistance layer of substrate is the first photoresist layer, and thickness of first photoresist layer in predeterminable area is higher than the first photoresist layer and is removing
The thickness in other regions except predeterminable area；After the figure for forming each color light resistance layer, further includes: to each chromatic photoresist
The figure of layer carries out hot baking processing, and the color light resistance layer in predeterminable area constitutes spacer material；And it is constituted after hot baking processing
Spacer material height with the overlapping area of adjacent two layers color light resistance layer is positively correlated in predeterminable area before hot baking processing.
Above-mentioned preparation method can not influenced by the overlapping area between the adjacent two layers color light resistance layer in control predeterminable area
The height of intense adjustment spacer material in the case where the thickness of color light resistance layer, to not influence the coloration and drop of liquid crystal display panel
Low technique controlling difficulty.
In the specific implementation, for there is two layers of color light resistance layer 200_m (m=1,2) in predeterminable area Q, pass through this
The color membrane substrates that the above-mentioned preparation method that inventive embodiments provide is prepared, as shown in Figure 2 a and 2 b, close to underlay substrate
100 color light resistance layer 200_1 is the first photoresist layer.As shown in Figure 2 a, colored in predeterminable area Q before hot baking processing
The overlapping area of photoresist layer 200_1 and color light resistance layer 200_2 is S1.After hot baking processing, chromatic photoresist in predeterminable area Q
The height for the spacer material that layer 200_1 and color light resistance layer 200_2 is formed is h1.As shown in Figure 2 b, before hot baking processing, pre-
If the overlapping area of color light resistance layer 200_1 and color light resistance layer 200_2 is S2 in the Q of region, and overlapping area S2 is less than friendship
Folded area S1.After hot baking processing, the dottle pin of color light resistance layer 200_1 and color light resistance layer 200_2 formation in predeterminable area Q
The height of object is h2, and height h2 is less than height h1.Therefore, in predeterminable area Q, before hot baking processing, adjacent two layers are color
The overlapping area of coloured light resistance layer 200_1 and color light resistance layer 200_2 are bigger, after hot baking processing, the height of obtained spacer material
It spends higher.
Specifically, in the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, each color light resistance layer
Figure passes through a patterning processes respectively and is formed.Preset areas can be formed simultaneously by grayscale mask plate or semi-transparent mask plate in this way
Thickness in domain is higher than the first photoresist layer of the thickness in other regions in addition to predeterminable area.Wherein, corresponding with predeterminable area
Grayscale mask plate or semi-transparent mask plate light transmission rate be greater than gray scale corresponding with other regions in addition to predeterminable area cover
The light transmission rate of diaphragm plate or semi-transparent mask plate.
It should be noted that patterning processes can only include photoetching in above-mentioned production method provided in an embodiment of the present invention
Technique, or, may include photoetching process and etch step, while can also include printing, ink-jet etc. other be used to form it is pre-
The technique for determining figure；Photoetching process, which refers to, utilizes photoresist, mask including technical process such as film forming, exposure, development, heat bakings
The technique of the formation figure such as plate, exposure machine.In the specific implementation, can according to the present invention formed in the corresponding structure of structure choice
Figure technique.
In the specific implementation, due to having hot baking processing in the technique for preparing each color light resistance layer, the present invention is real
In the preparation method that example offer is provided, hot baking is carried out in the figure to each color light resistance layer and handles the chromatic photoresist made in predeterminable area
Layer constitutes spacer material, the processing steps that different can additionally increase heat and dry processing, so as to save preparation cost.
In the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, the material of each color light resistance layer is
With the photoresist photoresist of each color light resistance layer corresponding color.Different colours directly can be made by photoetching process in this way
Color light resistance layer, so as to simplify technique preparation process.
Specifically, in the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, predeterminable area includes the
One predeterminable area and the second predeterminable area, the height of the spacer material of the first predeterminable area are greater than the spacer material of the second predeterminable area
Highly.The spacer material that can determine the first predeterminable area in this way is main spacer material, and the spacer material in the second predeterminable area is septum secundum
Underbed.
Specifically, the basis that can control the spacer material to be formed by the number of plies of color light resistance layer in control predeterminable area is high
Degree, in the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, color light resistance layer in the first predeterminable area
The number of plies is greater than the number of plies of color light resistance layer in the second predeterminable area.
It specifically, can be using colored in semi-transparent mask plate or grayscale mask plate the control predeterminable area of different light transmission rates
The thickness of photoresist layer is mentioned in the embodiment of the present invention in the specific implementation with the height of foundation for controlling main spacer material and time spacer material
In the above-mentioned preparation method supplied, the number of plies of color light resistance layer is equal to color light resistance layer in the second predeterminable area in the first predeterminable area
The number of plies, and the sum of the thickness of each color light resistance layer before carrying out hot baking processing is greater than the second preset areas in the first predeterminable area
Thickness the sum of of each color light resistance layer before carrying out hot baking processing in domain.
Specifically, in the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, underlay substrate can be
Glass substrate is not limited thereto alternatively, underlay substrate may be the array substrate with multiple pixel regions.
Specifically, in the specific implementation, in above-mentioned preparation method provided in an embodiment of the present invention, when underlay substrate is battle array
When column substrate, before the figure that at least three kinds color light resistance layers are sequentially formed on underlay substrate, further includes: in underlay substrate
The figure of at least one thin film transistor (TFT) is formed in each pixel region.
Further, it in above-mentioned preparation method provided in an embodiment of the present invention, is generally additionally provided on underlay substrate
Such as the other structures such as black matrix and film layer are not made herein since the setting of these structures and film layer is the same as those in the prior art
It repeats.
Below to include three kinds of color light resistance layers, i.e. the first color light resistance layer, second of chromatic photoresist on underlay substrate
Preparation method provided by the invention is illustrated for layer and the third color light resistance layer, but does not limit the present invention.
Embodiment one,
When the number of plies of color light resistance layer in the first predeterminable area is equal to the number of plies of color light resistance layer in the second predeterminable area,
It is illustrated so that the first predeterminable area and the second predeterminable area respectively include two layers of color light resistance layer as an example.
The manufacturing process of the color membrane substrates, can specifically include following steps:
(1) figure of the first color light resistance layer 110_1 is formed on underlay substrate 100 by a patterning processes, such as
Shown in Fig. 3 a.
Specifically, the first chromatic photosensitivity resinous photosensitive glue is coated on underlay substrate 100 using spin-coating method, it is then sharp
It is exposed with grayscale mask plate or semi-transparent mask plate, after development and hot baking processing, is formed as the first photoresist layer
The figure of the first color light resistance layer 110_1, as shown in Figure 3a.
(2) second of colored sense is formed on the underlay substrate 100 of figure for being formed with the first color light resistance layer 110_1
Photosensitiveness resinous photosensitive glue carries out patterned process to second of chromatic photosensitivity resinous photosensitive glue, respectively on underlay substrate 100
The figure of second of color light resistance layer 110_2 is formed, and the first color light resistance layer 110_ in the first predeterminable area Q_1
The figure of one layer of second of color light resistance layer 110_2 is formed on 1；Wherein, in the first predeterminable area Q_1, the first colourama
Resistance layer 110_1 and second of color light resistance layer 110_2 have overlapping area S_1；As shown in Figure 3b.
Specifically, second is coated on the underlay substrate 100 for being formed with the first color light resistance layer 110_1 using spin-coating method
Kind of chromatic photosensitivity resinous photosensitive glue, is then exposed using grayscale mask plate or semi-transparent mask plate, then after being developed,
The figure of second of color light resistance layer 110_2 is formed on underlay substrate 100, and is formed and be located in the first predeterminable area Q_1
The figure of one layer of second of color light resistance layer 110_2 on the first color light resistance layer 110_1；As shown in Figure 3b, pre- first
If in the Q_1 of region, there is overlapping area S_1 between the first color light resistance layer 110_1 and second of color light resistance layer 110_2.
(3) hot baking processing is carried out to the underlay substrate for being formed with second of color light resistance layer, made in the first predeterminable area
Color light resistance layer constitutes spacer material.
Specifically, after carrying out hot baking processing to the underlay substrate for being formed with second of color light resistance layer, the first predeterminable area
Spacer material 120_1 in Q_1 includes: the first color light resistance layer 110_1 and second of color light resistance layer 110_2, and has height
H_1 is spent, as shown in Figure 3c.
(4) the third colour sense is formed on the underlay substrate 100 for being formed with the figure of second of color light resistance layer 110_2
Photosensitiveness resinous photosensitive glue carries out patterned process to the third chromatic photosensitivity resinous photosensitive glue, respectively on underlay substrate 100
The figure of the third color light resistance layer 110_3 is formed, and second of color light resistance layer 110_ in the second predeterminable area Q_2
The figure of one layer of the third color light resistance layer 110_3 is formed on 2；Wherein, in the second predeterminable area Q_2, second of colourama
Resistance layer 110_2 and the third color light resistance layer 110_3 has overlapping area S_2；As shown in Figure 3d.
Specifically, third is coated on the underlay substrate 100 for being formed with second of color light resistance layer 110_2 using spin-coating method
Kind of chromatic photosensitivity resinous photosensitive glue, is then exposed using grayscale mask plate or semi-transparent mask plate, then after being developed,
The figure of the third color light resistance layer 110_3 is formed on underlay substrate 100, and is formed and be located in the second predeterminable area Q_2
The figure of one layer of the third color light resistance layer 110_3 on second of color light resistance layer 110_2；As shown in Figure 3d, pre- second
If there is between second of color light resistance layer 110_2 and the third color light resistance layer 110_3 overlapping area S_2 in the S_2 of region, and
And overlapping area S_1 is greater than overlapping area S_2.
(5) hot baking processing is carried out to the underlay substrate for being formed with the third color light resistance layer, made in the second predeterminable area
Color light resistance layer constitutes spacer material.
Specifically, hot baking processing, the second predeterminable area Q_2 are carried out to the underlay substrate for being formed with the third color light resistance layer
In spacer material 120_2 include: second of color light resistance layer 110_2 and the third color light resistance layer 11,0_3 two layers totally photoresist layer
And there is height h_2, wherein height h_2 is greater than height h_3, as shown in Figure 3 e.
In the specific implementation, the sequence of step (2) (3) and step (4) (5) can be according to actual needs by manufacture craft stream
Journey is interchangeable.It can be initially formed the spacer material of lower height in this way, re-form the spacer material of high height.
Embodiment two,
When the number of plies of color light resistance layer in the first predeterminable area is greater than the number of plies of color light resistance layer in the second predeterminable area,
It include three layers of color light resistance layer with the first predeterminable area, the second predeterminable area for two layers of color light resistance layer including being illustrated.
The making step of the color membrane substrates further includes following step in addition to including the steps that in embodiment one (1) to step (3)
It is rapid:
(4) the third colour sense is formed on the underlay substrate 100 for being formed with the figure of second of color light resistance layer 110_2
Photosensitiveness resinous photosensitive glue carries out patterned process to the third chromatic photosensitivity resinous photosensitive glue, respectively on underlay substrate 100
The figure of the third color light resistance layer 110_3 is formed, and is formed and is located on spacer material 120_1 in the first predeterminable area Q_1
One layer of the third color light resistance layer 110_3 figure, and in the second predeterminable area Q_2 formed be located at second of colourama
The figure of one layer of the third color light resistance layer 110_3 on resistance layer 110_2；In the first predeterminable area S_1, second of colourama
There is overlapping area S_1, second in the second predeterminable area S_2 between resistance layer 110_2 and the third color light resistance layer 110_3
There is overlapping area S_2, and overlapping area S_1 is greater than between color light resistance layer 110_2 and the third color light resistance layer 110_3
Overlapping area S_2；As shown in fig. 4 a.
Specifically, third is coated on the underlay substrate 100 for being formed with second of color light resistance layer 110_2 using spin-coating method
Kind of chromatic photosensitivity resinous photosensitive glue, is then exposed using grayscale mask plate or semi-transparent mask plate, then after being developed,
The figure of the third color light resistance layer 110_3 is formed on underlay substrate 100, and is formed in the first predeterminable area Q_1 respectively
The figure of one layer of the third color light resistance layer 110_3 on spacer material 120_1, and the shape in the second predeterminable area Q_2
At the figure for one layer of the third color light resistance layer 110_3 being located on second of color light resistance layer 110_2；As shown in fig. 4 a, exist
There is overlapping face in first predeterminable area S_1, between second of color light resistance layer 110_2 and the third color light resistance layer 110_3
Product S_1, has between second of color light resistance layer 110_2 and the third color light resistance layer 110_3 in the second predeterminable area S_2
Overlapping area S_2, and overlapping area S_1 is greater than overlapping area S_2.
(5) hot baking processing is carried out to the underlay substrate for being formed with the third color light resistance layer, makes the first predeterminable area respectively
Spacer material is constituted with the color light resistance layer in the second predeterminable area.
Specifically, hot baking processing, the first predeterminable area S_1 are carried out to the underlay substrate for being formed with the third color light resistance layer
In spacer material 120_1 include: the first color light resistance layer 110_1, second of color light resistance layer 110_2 and the third colourama
Resistance layer 110_3, and include: second of chromatic photoresist with the spacer material 120_2 in height h_2 and the second predeterminable area Q_2
Layer 110_2 and the third color light resistance layer 110_3, and there is height h_3, wherein height h_2 is greater than height h_3, such as Fig. 4 b institute
Show.
Based on the same inventive concept, the embodiment of the invention also provides a kind of color membrane substrates, as shown in Fig. 3 e and Fig. 4 b, packet
Underlay substrate 100 is included, the figure of at least three kinds color light resistance layer 110_n (n=1,2,3) of underlay substrate 100 is covered, also wraps
Include: be located at predeterminable area Q_p (p=1,2) in spacer material 120_p, and spacer material by least two layers of color light resistance layer through overheating
It is formed after baking processing；
With the color light resistance layer 110_n of underlay substrate 100 close in predeterminable area Q_p for the first photoresist layer, the first photoresist
Layer is higher than the first photoresist layer in the thickness in other regions in addition to predeterminable area Q_p in the thickness in predeterminable area Q_p；And
The height of spacer material 120_p with before hot baking processing in predeterminable area Q_p adjacent two layers color light resistance layer overlapping area S_p
It is positively correlated.
Specifically, in the specific implementation, in above-mentioned color membrane substrates provided in an embodiment of the present invention, such as Fig. 3 e and Fig. 4 b institute
Show, predeterminable area Q_p includes the first predeterminable area Q_1 and the second predeterminable area Q_2, the spacer material of the first predeterminable area Q_1
The height of spacer material 120_2 of the height of 120_1 greater than the second predeterminable area Q_1.
Specifically, in the specific implementation, in above-mentioned color membrane substrates provided in an embodiment of the present invention, as shown in Figure 4 b, the
The number of plies of color light resistance layer is greater than the number of plies of color light resistance layer in the second predeterminable area Q_2 in one predeterminable area Q_1.
Specifically, in the specific implementation, in above-mentioned color membrane substrates provided in an embodiment of the present invention, as shown in Figure 3 e, the
The number of plies of color light resistance layer is equal to the number of plies of color light resistance layer in the second predeterminable area Q_1 in one predeterminable area Q_1, and first is pre-
If each color light resistance layer is greater than each chromatic photoresist in the second predeterminable area in the sum of the thickness before carrying out hot baking processing in region
Thickness the sum of of the layer before carrying out hot baking processing.
Based on the same inventive concept, the embodiment of the invention also provides a kind of liquid crystal display panels, including the present invention to implement
Any of the above-described kind of color membrane substrates that example provides.The principle that the liquid crystal display panel solves the problems, such as is similar to above-mentioned color membrane substrates, because
The implementation of this liquid crystal display panel may refer to the implementation of aforementioned color membrane substrates, and repeating place, details are not described herein.
Based on the same inventive concept, the embodiment of the invention also provides a kind of display devices, including the embodiment of the present invention to mention
The above-mentioned liquid crystal display panel supplied.The display device can be with are as follows: mobile phone, tablet computer, television set, display, laptop,
Any products or components having a display function such as Digital Frame, navigator.For the other essential of the display device
Component part is it will be apparent to an ordinarily skilled person in the art that having, and this will not be repeated here, also be should not be used as to this hair
Bright limitation.The implementation of the display device may refer to the embodiment of above-mentioned color membrane substrates, and overlaps will not be repeated.
Preparation method, color membrane substrates, liquid crystal display panel and the display of above-mentioned color membrane substrates provided in an embodiment of the present invention
Device, due in predeterminable area at least two layers of color light resistance layer, when the figure to each color light resistance layer, which carries out heat, dries processing,
Color light resistance layer in predeterminable area may be constructed spacer material；And the height of the spacer material due to being constituted after hot baking processing
With the overlapping area of adjacent two layers color light resistance layer is positively correlated in predeterminable area before hot baking processing, therefore it is pre- by control
If the overlapping area between adjacent two layers color light resistance layer in region, can be the case where not influencing the thickness of color light resistance layer
The height of lower intense adjustment spacer material, to not influence the coloration of liquid crystal display panel and reduce technique controlling difficulty.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.
Claims (9)
1. a kind of preparation method of color membrane substrates characterized by comprising
The figure of at least three kinds color light resistance layers is sequentially formed on underlay substrate；Wherein, color at least two layers of predeterminable area
Coloured light resistance layer, with the color light resistance layer of the underlay substrate close in the predeterminable area for the first photoresist layer, first light
Resistance layer is higher than first photoresist layer in other regions in addition to the predeterminable area in the thickness in the predeterminable area
Thickness；The predeterminable area includes the first predeterminable area and the second predeterminable area；
After the figure for forming each color light resistance layer, further includes: hot baking processing is carried out to the figure of each color light resistance layer,
Color light resistance layer in the predeterminable area constitutes spacer material；And the height of the spacer material constituted after the hot baking processing
It is positively correlated with the overlapping area for drying adjacent two layers color light resistance layer in processing foregoing description predeterminable area in the heat；Described
The height of the spacer material of one predeterminable area is greater than the height of the spacer material of second predeterminable area.
2. preparation method as described in claim 1, which is characterized in that the number of plies of color light resistance layer in first predeterminable area
Greater than the number of plies of color light resistance layer in second predeterminable area.
3. preparation method as described in claim 1, which is characterized in that the number of plies of color light resistance layer in first predeterminable area
Equal to the number of plies of color light resistance layer in second predeterminable area, and in first predeterminable area, each color light resistance layer exists
The sum of thickness before carrying out hot baking processing, which is greater than each color light resistance layer in second predeterminable area, to carry out at hot baking
The sum of thickness before reason.
4. preparation method as described in any one of claims 1-3, which is characterized in that the figure of each color light resistance layer is distinguished
It is formed by a patterning processes.
5. a kind of color membrane substrates, including underlay substrate cover the figure of at least three kinds color light resistance layers of the underlay substrate,
It is characterized in that, further includes: the spacer material in predeterminable area, and the spacer material is passed through by least two layers color light resistance layer
It is formed after overheat baking processing；The predeterminable area includes the first predeterminable area and the second predeterminable area, first predeterminable area
Spacer material height be greater than second predeterminable area spacer material height；
With the color light resistance layer of the underlay substrate close in the predeterminable area for the first photoresist layer, first photoresist layer exists
Thickness in the predeterminable area is higher than first photoresist layer in the thickness in other regions in addition to the predeterminable area；And
And the height of the spacer material dries the overlapping of adjacent two layers color light resistance layer in processing foregoing description predeterminable area in the heat
Area is positively correlated.
6. color membrane substrates as claimed in claim 5, which is characterized in that the number of plies of color light resistance layer in first predeterminable area
Greater than the number of plies of color light resistance layer in second predeterminable area.
7. color membrane substrates as claimed in claim 5, which is characterized in that the number of plies of color light resistance layer in first predeterminable area
Equal to the number of plies of color light resistance layer in second predeterminable area, and in first predeterminable area, each color light resistance layer exists
The sum of thickness before carrying out hot baking processing, which is greater than each color light resistance layer in second predeterminable area, to carry out at hot baking
The sum of thickness before reason.
8. a kind of liquid crystal display panel, which is characterized in that including such as described in any item color membrane substrates of claim 5-7.
9. a kind of display device, which is characterized in that including liquid crystal display panel as claimed in claim 8.
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| CN105807503B (en) * | 2016-05-27 | 2019-09-03 | 京东方科技集团股份有限公司 | Spacer material and production method, display device |
| CN112242098B (en) * | 2020-10-14 | 2022-08-05 | Tcl华星光电技术有限公司 | Substrate, preparation method thereof and display panel |
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| JP2008158138A (en) * | 2006-12-22 | 2008-07-10 | Dainippon Printing Co Ltd | Color filter substrate and liquid crystal display device |
| JP2009210918A (en) * | 2008-03-05 | 2009-09-17 | Dainippon Printing Co Ltd | Color filter for in-plane switching liquid crystal driving method, and method for manufacturing the same |
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| CN202494843U (en) * | 2012-03-21 | 2012-10-17 | 京东方科技集团股份有限公司 | Color film substrate, liquid crystal panel comprising color membrane substrate, and display device |
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| JP2008158138A (en) * | 2006-12-22 | 2008-07-10 | Dainippon Printing Co Ltd | Color filter substrate and liquid crystal display device |
| CN101675377A (en) * | 2007-06-11 | 2010-03-17 | 夏普株式会社 | Method of manufacturing color filter substrate, method of manufacturing liquid crystal display device, color filter substrate, and liquid crystal display device |
| JP2009210918A (en) * | 2008-03-05 | 2009-09-17 | Dainippon Printing Co Ltd | Color filter for in-plane switching liquid crystal driving method, and method for manufacturing the same |
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