CN106498367B - A kind of compact type vacuum reaction unit for chemical vapor deposition diamond film - Google Patents
A kind of compact type vacuum reaction unit for chemical vapor deposition diamond film Download PDFInfo
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- CN106498367B CN106498367B CN201610920789.1A CN201610920789A CN106498367B CN 106498367 B CN106498367 B CN 106498367B CN 201610920789 A CN201610920789 A CN 201610920789A CN 106498367 B CN106498367 B CN 106498367B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
Abstract
A kind of compact type vacuum reaction unit for chemical vapor deposition diamond film.Belong to the chemical vapour deposition technique field of diamond thin.In order to solve deposition problems of the cvd diamond film on micro- cutter under vacuum condition.Shell upper and lower side connects and composes reative cell with upper cover and pedestal removable seal respectively, vacuum meter is fixed on lid, the test side of vacuum meter closely penetrates upper cover and is arranged in shell, the pipeline communicated with housing cavity is fixed on upper lid, needle-valve is fixed on the pipeline of upper cover, needle-valve is communicated with pipeline, it is fixed with observation window one at the peep hole one of upper cover, upper lid is equipped with multiple cold water annular grooves, there are one observation windows two for each fixation at two peep holes two on the side wall of shell, solenoid valve is fixed on the air inlet position of pedestal, gas-guide tube one end is connected to inlet box, the other end is communicated with reative cell, air guide valve is installed on gas-guide tube, objective table is arranged in reative cell and is fixed on the base.Present invention is mainly used for the micro- tool surface deposition of diamond thin films of deposition cell.
Description
Technical field
The present invention relates to a kind of vacuum reaction devices for chemical vapor deposition diamond film, belong to diamond thin
Chemical vapour deposition technique field.
Background technology
Chemical vapor deposition（CVD）Diamond thin is led to using the chemical reaction of methane and hydrogen under the high temperature conditions
Control reaction condition is crossed, grows the deposition process of one layer of fine and close diamond thin on substrate.It during the reaction, can be with
The series of parameters such as hot-wire temperature, the ratio of air source and concentration are adjusted come the quality of improved diamond thin.Due to this
There is no the participation of catalyst in vapor deposition processes, so its thermal stability of diamond generated is closer to natural diamond.
Cvd diamond film also has the advantages such as strong, the good, good economy performance of wearability of impact resistance.Currently, cvd diamond film is sunk
Product is to tool surface can form low friction coefficient, wear-resistant, shock resistance, complex-shaped, chip are not easy the cutter coat being bonded.
With the continuous development of modern science and technology, the application of microminaturization technology has more and more wide foreground.Traditional micro- knife
Tool using high-speed steel or cemented carbide material etc., since working speed of micro- cutter in milling is very high, can generally reach
It is tens of thousands of or even ten tens of thousands of rpms, thus traditional micro- cutter typically exhibit wear no resistance, cutter life is short, processing quality
The defects of poor.It is to solve the problems, such as this important channel to apply coating rubbing-layer in micro- tool surface.
CVD film micro cutter of diamond technology is the hot spot of current micro processing field research.It is micro- in cvd diamond film
In the preparation process of cutter, the chemical gas-phase deposition system of the micro- cutter of diamond coatings is needed to dash forward there are many key technology
Broken, there are no the appearances of the commercialization shaped article of independent intellectual property right at home at present, so as to cause the micro- knife of cvd diamond film
The cost of tool is high.The vacuum reaction chamber of chemical vapor deposition diamond film is the core apparatus of the system.Currently, state
The chemical vapor deposition vacuum reaction chamber that can be found in inside and outside document there is installation spaces huge, waste of material degree
The defects of vacuum degree is difficult to ensure in high, reative cell, processing technology is complicated, cooling effect is poor, and in this way for similar micro- cutter
Milli machine part can not achieve the deposition of diamond thin films of its complex surface.Meanwhile vacuum reaction chamber requires it to have knot again
Structure is compact, complete function, is easily installed the basic characteristics such as debugging, good reliability.Thus, develop the side using chemical vapor deposition
Method realizes the vacuum reaction chamber of micro- tool surface deposition of diamond thin films device, has urgent and necessity.
Invention content
The purpose of the present invention is to solve deposition problems of the cvd diamond film on micro- cutter under vacuum condition, into
And provide a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film.
Provided by the present invention for the compact type vacuum reaction unit of chemical vapor deposition diamond film, there is vacuum degree
The advantages of good, compact-sized, good cooling results.In chemical vapor deposition processes, reaction room pressure is can be controlled in the present invention
Near 1Pa, water inlet flow velocity is 0.3 m/s, and the gas vent flow velocity of gas-guide tube is 0.06 m/s.
Realize above-mentioned purpose, the technical solution adopted by the present invention is as follows：
A kind of compact type vacuum reaction unit for chemical vapor deposition diamond film, composition include vacuum meter,
Needle-valve, upper cover, shell, pedestal, solenoid valve, infrared radiation thermometer, gas-guide tube, air guide valve, objective table and three observation windows；It is described
Three observation windows be observation window one and two observation windows two respectively；
The shell top and bottom are connect with upper cover and pedestal removable seal respectively, by shell, upper cover and pedestal
Combination constitutes reative cell, and the vacuum meter is fixed on cap upper surface, and the test side of the vacuum meter closely penetrates upper cover
On through-hole be arranged in shell, the pipeline communicated with housing cavity is fixed on the upper lid, the needle-valve is fixed on
On the pipeline of upper cover, needle-valve is communicated with pipeline, and peep hole one is provided on upper lid, observation window is provided at the peep hole one
One, the observation window one is fixed on cap upper surface, and upper lid is equipped with multiple cold water annular grooves, and upper lid is equipped with gas port one；
The shell is made of welded case and cold water slot shell, and the welded case and cold water slot shell are circle
Barrel shape, the cold water slot shell is closely sleeved on the outside of welded case and the two is welded, the cold water slot shell it is interior
It is machined with multiple coaxial circular ring shape cold rinse banks on wall, inlet opening and apopore are provided on the side wall of cold water slot shell, it is described
Inlet opening be arranged in multiple circular ring shape cold rinse banks positioned at bottommost circular ring shape cold rinse bank groove bottom on, the water outlet
Hole is arranged in multiple circular ring shape cold rinse banks in the groove bottom of the circular ring shape cold rinse bank of top, each adjacent two circular ring shape
Processing is there are one gap two on the shared side wall of cold rinse bank, is vertically arranged that there are one sink partition walls on the inner wall of cold water slot shell
Two, the sink partition wall two passes through all gap two to be arranged, and forms one between sink partition wall two and each gap two
Two sink outlets of sink outlet, each adjacent two circular ring shape cold rinse bank shift to install；
Setting is there are two peep hole two on the side wall of shell, is respectively provided with that there are one observation windows at each peep hole two
Two, described two observation windows two are fixed on the lateral wall of shell, and the infrared radiation thermometer is close to one of observation window
Two settings, pedestal are equipped with gas port two, and the solenoid valve is fixed at the gas port two of pedestal, and solenoid valve one end passes through bottom
Gas port two on seat is communicated with reative cell, and the solenoid valve other end is connected with vacuum pump；
Described gas-guide tube one end is connected to inlet box, and the gas-guide tube other end closely penetrates the gas port one that lid is equipped with
Lead into reative cell, air guide valve is installed on gas-guide tube, the air guide valve is arranged in the outside of reative cell, the loading
Platform is arranged in reative cell and is fixed on the base.
The advantageous effect of the present invention compared with the existing technology is：
The reative cell of the vacuum reaction device of the present invention has the characteristics that compact-sized, air-tightness is good；Upper cover and shell it
Between and shell and pedestal between be all made of bulge loop and the matched structure of annular spacing groove, ensure that each section in reative cell
Proper alignment is easily installed；Multiple coaxial circular ring shape cold rinse banks, each adjacent two circular ring shape are machined in cold rinse bank inner walls
Processing is there are one gap two on the shared side wall of cold rinse bank, is vertically arranged that there are one sink partition walls on the inner wall of cold water slot shell
Two, sink partition wall two passes through all gap two to be arranged, and forms a sink between sink partition wall two and each gap two and go out
Two sink outlets at the mouth of a river, each adjacent two circular ring shape cold rinse bank shift to install, and pass through emulation to kinds of schemes and reality
Test analysis, shell of the invention have the advantages that good cooling results, endless form rationally, shorten furnace body cooling time；It uses
Air-flow is then gently led to the reaction zone of reative cell by gas-guide tube, improves reaction efficiency, shortens the reaction time, and overlay film rate is reachable
To 95%, cvd diamond film surface quality ensure that.The present invention is suitable for the diamond surface CVD platings of micro- cutter or micro structures
Membrane process.
Description of the drawings
Fig. 1 is the overall structure of the compact type vacuum reaction unit for chemical vapor deposition diamond film of the present invention
Axonometric drawing；
Fig. 2 is shell, gas-guide tube, air guide valve, the micro- cutter of deposition cell and the axonometric drawing of objective table assembly；
Fig. 3 is the main sectional view that shell is assembled with upper cover and pedestal；
Fig. 4 is partial enlarged view at the B of Fig. 3；
Fig. 5 is the axonometric drawing of cold water slot shell；
Fig. 6 is the expanded view of cold water slot shell；
Fig. 7 is the axonometric drawing of cold water groove upper cap；
Fig. 8 is partial enlarged view at the A of Fig. 1.
In figure, vacuum meter 1, needle-valve 2, upper cover 3, welding upper cover 3-1, cold water groove upper cap 3-2, cold water annular groove 3-3, bulge loop one
3-4, one 3-5 of sink partition wall, intake-outlet 3-6, one 3-7 of annular spacing groove, shell 4, welded case 4-1, cold water slot shell 4-
2, circular ring shape cold rinse bank 4-3, inlet opening 4-4, apopore 4-5, two 4-6 of sink partition wall, sink outlet 4-7, outer 4-8, convex
Two 4-9 of ring, observation window 5, one 5-1 of observation window, two 5-2 of observation window, pedestal 6, solenoid valve 7, infrared radiation thermometer 8, objective table 9, gather
The micro- cutter 13 of tetrafluoroethene sealing ring 10, gas-guide tube 11, air guide valve 12, deposition cell, vacuum pump 14.
Specific implementation mode
Technical scheme of the present invention is further described below in conjunction with the accompanying drawings, however, it is not limited to this, every to this
Inventive technique scheme is modified or replaced equivalently, and without departing from the spirit of the technical scheme of the invention and range, should all be covered
In protection scope of the present invention.
Specific implementation mode one：As shown in Fig. 1 ~ Fig. 7, a kind of compact for chemical vapor deposition diamond film
Vacuum reaction device, composition include vacuum meter 1, needle-valve 2, upper cover 3, shell 4, pedestal 6, solenoid valve 7, infrared radiation thermometer 8, lead
Tracheae 11, air guide valve 12, objective table 9 and three observation windows 5；Three observation windows 5 are observation window one 5-1 and two respectively
Two 5-2 of a observation window；
4 top and bottom of shell are connect with upper cover 3 and 6 removable seal of pedestal respectively, by shell 4,3 and of upper cover
The combination of pedestal 6 constitutes reative cell, the vacuum meter 1（Pass through bolt）It is fixed on 3 upper surface of upper cover, the vacuum meter 1
Test side closely penetrates the through-hole in upper cover 3 and is arranged in shell 4（Vacuum meter 1 is used for observing the vacuum in entire reaction compartment
Degree）, the pipeline communicated with 4 inner cavity of shell, the needle-valve 2 are fixed in the upper cover 3（As control reative cell inner cavity with
The component of ambient atmos exchange rate）（Pass through bolt）It is fixed on the pipeline of upper cover 3, needle-valve 2 is communicated with pipeline（Needle-valve 2 is made
The component of reative cell and ambient atmos exchange rate in order to control can carry out flow and adjust in real time）, peep hole is provided in upper cover 3
One, one 5-1 of observation window is provided at the peep hole one（Process for observing entire chemical vapour deposition reaction）, described
One 5-1 of observation window（Pass through CF flanges one and multiple bolts）It is fixed on 3 upper surface of upper cover, upper cover 3 is equipped with multiple cold water rings
Slot 3-3（Lead to cooling water cooling in cold water annular groove 3-3）, upper cover 3 is equipped with gas port one；
Setting is there are two peep hole two on the side wall of shell 4, is respectively provided with that there are one observations at each peep hole two
Window two 5-2, described two two 5-2 of observation window（Pass through CF flanges two and multiple bolts respectively）It is fixed on the lateral wall of shell 4
On, the infrared radiation thermometer 8 is arranged close to two 5-2 of one of observation window（Infrared radiation thermometer 8 is indoor for measuring reaction
Temperature, two 5-2 of another observation window is for observing real-time reactiveness）, pedestal 6 is equipped with gas port two, the electromagnetism
Valve 7（Pass through bolt）It is fixed at the gas port two of pedestal 6,7 one end of solenoid valve passes through the gas port two and reative cell on pedestal 6
It communicates, 7 other end of solenoid valve is connected with vacuum pump 14（Solenoid valve 7 vacuumizes before being responsible for reaction.If reative cell during the reaction
Interior pressure is more than 3kPa, and solenoid valve 7 then takes reaction indoor gas away, ensures safety）.
Described 11 one end of gas-guide tube is connected to inlet box, and what 11 other end of gas-guide tube closely penetrated that upper cover 3 is equipped with leads
Stomata leads into reative cell（Mixed gas is passed through from gas-guide tube 11, is flowed into above the micro- cutter of deposition cell 13 along gas-guide tube 11）,
Air guide valve 12 is installed, the air guide valve 12 is arranged in the outside of reative cell on gas-guide tube 11（It is indoor into reacting
Mixed gas flow controls flow by air guide valve 12）, the objective table 9 is arranged in reative cell and is fixed on pedestal 6
On.
The micro- cutter of deposition cell 13 is directly installed on objective table 9, in mixed gas（Hydrogen and methane）Under the action of realize
Chemical vapor deposition under vacuum condition（It finds, is compared with without gas-guide tube, designed gas-guide tube 11 by the emulation in flow field
The flow field near the micro- cutter of deposition cell 13 can be made more to be evenly distributed from top to bottom.It is not influenced in installation site simultaneously
The visual field of one 5-1 of observation window on lid 3）；
11 one end of gas-guide tube is connected to inlet box, and the other end is led to by the gas port on bell 3 into reative cell, mixed gas
（Hydrogen and methane）It is passed through from gas-guide tube 11, is flowed into above the micro- cutter of deposition cell 13 along gas-guide tube 11, passes through air guide valve
12 control flows.
Needle-valve 2, solenoid valve 7, infrared radiation thermometer 8 and air guide valve 12 used in present embodiment are market purchasing
Part.
Specific implementation mode two：As shown in Fig. 1, Fig. 3, Fig. 4 and Fig. 7, one kind described in specific implementation mode one is for changing
The compact type vacuum reaction unit of vapor diamond deposition film is learned, the upper cover 3 is by welding upper cover 3-1 and cold water groove upper cap
3-2 is formed, and the welding upper cover 3-1 and cold water groove upper cap 3-2 are disc-shape, and the outer diameter of welding upper cover 3-1 is less than cold
The outer diameter of sink upper cover 3-2, the upper surface of the cold water groove upper cap 3-2 are machined with multiple concentric with cold water groove upper cap 3-2
The cold water annular groove 3-3 is both provided with gap one, each adjacent two cold water annular groove on the inboard wall of each cold water annular groove 3-3
The gap one of 3-3 is separated by 180 ° of settings, and the upper surface of cold water groove upper cap 3-2 is provided with one 3-5 of sink partition wall, the sink every
One 3-5 of wall is arranged along the radial direction of cold water groove upper cap 3-2 and each cold water annular groove 3-3 is divided into two, and one 3-5 of sink partition wall is worn
It crosses one middle part of gap of multiple cold water ring slot 3-3 and each gap one is separated into two intake-outlet 3-6（Upper cover 3 pass through to
It is passed through cooling water cooling in cold water annular groove 3-3）.
Specific implementation mode three：As shown in Fig. 1, Fig. 3 and Fig. 4, one kind described in specific implementation mode two is used for chemical gas
The compact type vacuum reaction unit of phase depositing diamond film, the upper surfaces cold water groove upper cap 3-2 are set close to outer edge
It is equipped with one 3-7 of annular spacing groove, is provided with one 3-4 of bulge loop at the neighboring of the lower surfaces welding upper cover 3-1, in welding
One 3-4 of bulge loop of lid 3-1 is arranged in one 3-7 of annular spacing groove of cold water groove upper cap 3-2, and welds the bulge loop one of upper cover 3-1
3-4 medial surfaces are matched with groove face on the inside of one 3-7 of annular spacing groove of cold water groove upper cap 3-2（Realize welding upper cover 3-1 and cold water
Groove upper cap 3-2 is concentric）, bulge loop one 3-4 of the groove width more than welding upper cover 3-1 of one 3-7 of annular spacing groove of cold water groove upper cap 3-2
Thickness, the depth of one 3-7 of annular spacing groove of cold water groove upper cap 3-2 is more than the height of one 3-4 of bulge loop of welding upper cover 3-1
（Ensure that welding upper cover 3-1 is closely fastened on cold water groove upper cap 3-2）, cold water groove upper cap 3-2 and welding upper cover 3-1 are welded；Weldering
It connects and offers the coaxial peep hole one on lid 3-1 and cold water groove upper cap 3-2, the observation window one 5-1 settings exist
It welds the upper surfaces upper cover 3-1 and is located at peep hole one, one 5-1 of observation window（Pass through CF flanges one and multiple bolts）It is fixed on weldering
Connect the upper surfaces lid 3-1；The coaxial through-hole and described is offered on welding upper cover 3-1 and cold water groove upper cap 3-2 respectively
Gas port one.
Specific implementation mode four：As shown in Fig. 1 ~ Fig. 3, Fig. 5 and Fig. 6, one kind described in specific implementation mode one is for changing
The compact type vacuum reaction unit of vapor diamond deposition film is learned, the shell 4 is by welded case 4-1 and cold water pot shell
Body 4-2 compositions, the welded case 4-1 and cold water slot shell 4-2 are cylindrical shape, and the cold water slot shell 4-2 is tight
It is close to be sleeved on the outside of welded case 4-1 and the two is welded, it is machined on the inner wall of the cold water slot shell 4-2 multiple coaxial
Circular ring shape cold rinse bank 4-3 is provided with inlet opening 4-4 and apopore 4-5, the inlet opening on the side wall of cold water slot shell 4-2
4-4 is arranged in multiple circular ring shape cold rinse bank 4-3 in the groove bottom of the circular ring shape cold rinse bank 4-3 of bottommost, and described goes out
Water hole 4-5 is arranged in multiple circular ring shape cold rinse bank 4-3 in the groove bottom of the circular ring shape cold rinse bank 4-3 of top, per phase
Processing is vertical on the inner wall of cold water slot shell 4-2 there are one gap two on side wall shared two circular ring shape cold rinse bank 4-3 of neighbour
There are one two 4-6 of sink partition wall for setting, and two 4-6 of sink partition wall passes through all gap two to be arranged, and sink partition wall two
A sink outlet 4-7, two sinks of each adjacent two circular ring shape cold rinse bank 4-3 are formed between 4-6 and each gap two
Water outlet 4-7 is shifted to install.
Multiple circular ring shape cold rinse bank 4-3 are machined on the inner wall of the cold water slot shell 4-2 of shell 4（Present embodiment is
Seven circular ring shape cold rinse bank 4-3）, the gap two there are one processing on the side wall that each adjacent two circular ring shape cold rinse bank 4-3 is shared,
Two 4-6 of sink partition wall there are one being vertically arranged on the inner wall of cold water slot shell 4-2, two 4-6 of sink partition wall pass through all
Gap two be arranged, and between two 4-6 of sink partition wall and each gap two formed a sink outlet 4-7, each adjacent two
Two sink outlet 4-7 of circular ring shape cold rinse bank 4-3 are shifted to install.It can make the cooling in each circular ring shape cold rinse bank 4-3
Water flows at same direction, and makes the flow of cooling water direction in each adjacent two circular ring shape cold rinse bank 4-3 on the contrary, to increase
The flow path of cooling water is added, which is capable of the flowing of efficiently guide cooling water.Cooling water is provided by cooling-water machine.
Specific implementation mode five：As shown in figure 3, one kind described in specific implementation mode one is used for chemical vapor deposition Buddha's warrior attendant
The top and bottom of the compact type vacuum reaction unit of stone film, the shell 4 are respectively arranged with outer 4-8, upper cover 3 and bottom
Connection between seat 6 and shell 4 is respectively adopted the form arrangement uniformly distributed in a circumferential direction of multiple screws and fixes, by 3 He of upper cover
Pedestal 6 connects into a closing entirety with shell 4.
Specific implementation mode six：As shown in figure 3, one kind described in specific implementation mode five is used for chemical vapor deposition Buddha's warrior attendant
The compact type vacuum reaction unit of stone film, under the upper surface and lower end outer 4-8 of the upper end outer 4-8 of the shell 4
Surface is respectively arranged with annular seal groove, and teflin ring 10, shell are both provided in each annular seal groove
Body 4 is sealed by teflin ring 10 respectively with upper cover 3 and pedestal 6（Ensure that reative cell has good air-tightness）.
Specific implementation mode seven：As shown in figure 3, one kind described in specific implementation mode six is used for chemical vapor deposition Buddha's warrior attendant
The compact type vacuum reaction unit of stone film, 4 lower end of shell are provided with two 4-9 of bulge loop, and 6 upper surface of pedestal is set
It is equipped with annular spacing groove two, two 4-9 of bulge loop of the shell 44 is arranged in the annular spacing groove two of pedestal 6（Realize shell 4
It is concentric with pedestal 6）, and the two 4-9 lateral surfaces of bulge loop of shell 44 are provided with the outer side slot of annular spacing groove two with 6 upper surface of pedestal
Face matches（Realize that shell 4 and pedestal 6 are concentric）, the groove width of the annular spacing groove two of pedestal 6 is more than two 4-9 of bulge loop of shell 4
Thickness, the depth of the annular spacing groove two of pedestal 6 is more than the height of two 4-9 of bulge loop of shell 4（Ensure that 4 lower end of shell is close
It is arranged in the annular spacing groove two of pedestal 6）.
Specific implementation mode eight：As shown in Figure 1, one kind described in specific implementation mode one is used for chemical vapor deposition Buddha's warrior attendant
The compact type vacuum reaction unit of stone film, the shell 4 are made of 304 stainless steels（It is easy to weld）.
The present invention operation principle be：Carbon-source gas is passed through in vacuum reaction chamber（Methane）With the mixed gas of hydrogen,
Control reaction indoor temperature makes mixed gas is heated successively to generate atom state hydrogen and excitation state methyl between 700 DEG C ~ 900 DEG C,
Then diamond sp3 hydridization, C-C keys are formed, the depositing diamond film on micro- cutter or micro structures.
The course of work is：Each component is after installation is complete, it is ensured that each section air-tightness is good.Start water cooling unit to cold rinse bank
It supplies water in the circular ring shape cold rinse bank 4-3 of shell 4-2, indoor air extraction will be reacted by opening vacuum pump 14, be read on vacuum meter 1
The atmospheric pressure value of detection, maintains near 1Pa.It is passed through the gaseous mixture of hydrogen and methane into reative cell by gas-guide tube 11 later
Body adjusts air guide valve 12 and controls reaction rate.In the chemical vapor deposition processes of diamond thin, pay attention to observing at three
The real time status in reative cell is observed outside window 5, is used in combination infrared radiation thermometer 8, monitoring to react indoor reaction temperature, is controlled 700
DEG C ~ 900 DEG C between, entire chemical reaction process lasts about greatly 6 hours.
The compact type vacuum reaction unit for chemical vapor deposition diamond film of the present invention is compact-sized, reative cell
Outer profile diameter and height are within the scope of 300 ~ 400 mm；The air-tightness of device is good；Reative cell is by shell, pedestal
And the cylindric flat-top closed container of upper cover composition, this structure have handling ease, intensity high, material saving and few excellent of weld seam
Point, and 304 stainless steels for being easy welding and rolling are selected in selection, further promote air-tightness.In addition, in design process
In, annular spacing groove one and the one matched structure of bulge loop used between upper cover and shell ensure that each section in reative cell
Proper alignment, it is easy to disassemble.
Claims (7)
1. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film, it is characterised in that：It forms packet
Include vacuum meter（1）, needle-valve（2）, upper cover（3）, shell（4）, pedestal（6）, solenoid valve（7）, infrared radiation thermometer（8）, gas-guide tube
（11）, air guide valve（12）, objective table（9）And three observation windows（5）；Three observation windows（5）It is observation window one respectively
（5-1）And two observation windows two（5-2）；
The shell（4）Top and bottom respectively with upper cover（3）And pedestal（6）Removable seal connects, by shell（4）, on
Lid（3）And pedestal（6）Combination constitutes reative cell, the vacuum meter（1）It is fixed on upper cover（3）Upper surface, the vacuum meter
（1）Test side closely penetrate upper cover（3）On through-hole be arranged in shell（4）Interior, described upper cover（3）On be fixed with and shell
（4）The pipeline that inner cavity communicates, the needle-valve（2）It is fixed on upper cover（3）Pipeline on, needle-valve（2）It is communicated with pipeline, upper cover
（3）On be provided with peep hole one, be provided with observation window one at the peep hole one（5-1）, the observation window one（5-1）Gu
It is scheduled on upper cover（3）Upper surface, upper cover（3）It is equipped with multiple cold water annular grooves（3-3）, upper cover（3）It is equipped with gas port one；
The shell（4）By welded case（4-1）With cold water slot shell（4-2）Composition, the welded case（4-1）With it is cold
Sink shell（4-2）It is cylindrical shape, the cold water slot shell（4-2）Closely it is sleeved on welded case（4-1）Outside and
The two is welded, the cold water slot shell（4-2）Inner wall on be machined with multiple coaxial circular ring shape cold rinse banks（4-3）, cold water
Slot shell（4-2）Side wall on be provided with inlet opening（4-4）And apopore（4-5）, the inlet opening（4-4）It is arranged multiple
Circular ring shape cold rinse bank（4-3）In be located at bottommost circular ring shape cold rinse bank（4-3）Groove bottom on, the apopore（4-5）
It is arranged in multiple circular ring shape cold rinse banks（4-3）In be located at top circular ring shape cold rinse bank（4-3）Groove bottom on, per adjacent two
A circular ring shape cold rinse bank（4-3）There are one gap two, cold water slot shells for processing on shared side wall（4-2）Inner wall on it is vertical
There are one sink partition walls two for setting（4-6）, the sink partition wall two（4-6）Be arranged across all gap two, and sink every
Wall two（4-6）A sink outlet is formed between each gap two（4-7）, each adjacent two circular ring shape cold rinse bank（4-3）
Two sink outlets（4-7）It shifts to install；
Shell（4）Side wall on setting there are two peep hole two, be respectively provided with that there are one observation windows at each peep hole two
Two（5-2）, two observation windows two（5-2）It is fixed on shell（4）Lateral wall on, the infrared radiation thermometer（8）Tightly
Adjacent one of observation window two（5-2）Setting, pedestal（6）It is equipped with gas port two, the solenoid valve（7）It is fixed on pedestal
（6）Gas port two at, solenoid valve（7）One end passes through pedestal（6）On gas port two communicated with reative cell, solenoid valve（7）Separately
One end and vacuum pump（14）It is connected；
The gas-guide tube（11）One end is connected to inlet box, gas-guide tube（11）The other end closely penetrates upper cover（3）It is equipped with
Gas port leads into reative cell, gas-guide tube（11）On air guide valve is installed（12）, the air guide valve（12）Setting is being reacted
The outside of room, the objective table（9）It is arranged in reative cell and is fixed on pedestal（6）On.
2. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 1,
It is characterized in that：The upper cover（3）By welding upper cover（3-1）With cold water groove upper cap（3-2）Composition, the welding upper cover
（3-1）With cold water groove upper cap（3-2）It is disc-shape, welds upper cover（3-1）Outer diameter be less than cold water groove upper cap（3-2）It is outer
Diameter, the cold water groove upper cap（3-2）Upper surface be machined with it is multiple with cold water groove upper cap（3-2）The concentric cold water ring
Slot（3-3）, each cold water annular groove（3-3）Inboard wall on be both provided with gap one, each adjacent two cold water annular groove（3-3）Slit
Mouth one is separated by 180 ° of settings, cold water groove upper cap（3-2）Upper surface be provided with sink partition wall one（3-5）, the sink partition wall
One（3-5）Along cold water groove upper cap（3-2）Radial setting and by each cold water annular groove（3-3）It is divided into two, and sink partition wall one
（3-5）Across multiple cold water annular grooves（3-3）The middle part of gap one and each gap one is separated into two intake-outlet 3-6.
3. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 2,
It is characterized in that：The cold water groove upper cap（3-2）Upper surface is provided with annular spacing groove one close to outer edge（3-7）, institute
The welding upper cover stated（3-1）Bulge loop one is provided at the neighboring of lower surface（3-4）, weld upper cover（3-1）Bulge loop one（3-
4）It is arranged in cold water groove upper cap（3-2）Annular spacing groove one（3-7）It is interior, and weld upper cover（3-1）Bulge loop one（3-4）Inside
Face and cold water groove upper cap（3-2）Annular spacing groove one（3-7）Inside groove face matches, cold water groove upper cap（3-2）Annular limit
Position slot one（3-7）Groove width be more than welding upper cover（3-1）Bulge loop one（3-4）Thickness, cold water groove upper cap（3-2）Annular limit
Position slot one（3-7）Depth be more than welding upper cover（3-1）Bulge loop one（3-4）Height, cold water groove upper cap（3-2）With in welding
Lid（3-1）Welding；Weld upper cover（3-1）With cold water groove upper cap（3-2）On offer the coaxial peep hole one, it is described
Observation window one（5-1）Setting is in welding upper cover（3-1）Upper surface is simultaneously located at peep hole one, observation window one（5-1）It is fixed on weldering
Connect lid（3-1）Upper surface；Weld upper cover（3-1）With cold water groove upper cap（3-2）It is upper to offer the coaxial through-hole respectively
With the gas port one.
4. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 1,
It is characterized in that：The shell（4）Top and bottom be respectively arranged with outer（4-8）, upper cover（3）And pedestal（6）With shell
Body（4）Between connection be respectively adopted multiple screws it is uniformly distributed in a circumferential direction form arrangement fix, by upper cover（3）And pedestal
（6）With shell（4）It is whole to connect into a closing.
5. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 4,
It is characterized in that：The shell（4）Upper end outer（4-8）Upper surface and lower end outer（4-8）Lower surface set respectively
It is equipped with annular seal groove, teflin ring is both provided in each annular seal groove（10）, shell（4）With it is upper
Lid（3）And pedestal（6）Pass through teflin ring respectively（10）Sealing.
6. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 5,
It is characterized in that：The shell（4）Lower end is provided with bulge loop two（4-9）, the pedestal（6）Upper surface is provided with annular limit
Position slot two, the shell（44）Bulge loop two（4-9）It is arranged in pedestal（6）Annular spacing groove two in, and shell（44）'s
Bulge loop two（4-9）Lateral surface and pedestal（6）The outside groove face that upper surface is provided with annular spacing groove two matches, pedestal（6）'s
The groove width of annular spacing groove two is more than shell（4）Bulge loop two（4-9）Thickness, pedestal（6）Annular spacing groove two depth
More than shell（4）Bulge loop two（4-9）Height.
7. a kind of compact type vacuum reaction unit for chemical vapor deposition diamond film according to claim 1,
It is characterized in that：The shell（4）It is made of 304 stainless steels.
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| CN201610920789.1A CN106498367B (en) | 2016-10-21 | 2016-10-21 | A kind of compact type vacuum reaction unit for chemical vapor deposition diamond film |
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| CN107058972B (en) * | 2017-04-17 | 2019-01-18 | 哈尔滨工业大学 | The micro- cutter coat three-dimensional precise displacement work table applied under hot vacuum environment |
| CN112210767B (en) * | 2020-08-31 | 2023-02-21 | 广东鼎泰机器人科技有限公司 | Coating machine |
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| CN101008082A (en) * | 2007-02-01 | 2007-08-01 | 南京航空航天大学 | CVD diamond film continuous preparation system |
| CN201517131U (en) * | 2009-09-16 | 2010-06-30 | 湖北师范学院 | Apparatus for preparing diamond-like film |
| CN102220565A (en) * | 2011-06-13 | 2011-10-19 | 南开大学 | Chemical vapor deposition equipment used for studying light trapping structure of silicon thin-film cell |
| CN202116642U (en) * | 2010-07-23 | 2012-01-18 | 上海蓝宝光电材料有限公司 | Water-cooling top cap of metal organic chemical vapor deposition equipment |
| CN104205309A (en) * | 2012-05-11 | 2014-12-10 | 东京毅力科创株式会社 | Gas supply device and substrate processing device |
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|---|---|---|---|---|
| CN101008082A (en) * | 2007-02-01 | 2007-08-01 | 南京航空航天大学 | CVD diamond film continuous preparation system |
| CN201517131U (en) * | 2009-09-16 | 2010-06-30 | 湖北师范学院 | Apparatus for preparing diamond-like film |
| CN202116642U (en) * | 2010-07-23 | 2012-01-18 | 上海蓝宝光电材料有限公司 | Water-cooling top cap of metal organic chemical vapor deposition equipment |
| CN102220565A (en) * | 2011-06-13 | 2011-10-19 | 南开大学 | Chemical vapor deposition equipment used for studying light trapping structure of silicon thin-film cell |
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