CN106477900A - 一种深空探测用超疏自清洁太阳电池玻璃盖片的制备方法 - Google Patents
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Abstract
本发明公开了一种对玻璃盖片表面进行超疏改性的方法，所述方法是首先对经表面清洁处理后的玻璃盖片表面直接进行激光刻蚀后再进行羟基化处理，然后在玻璃盖片表面形成纳米涂层，最后采用浸泡法或者化学气相沉积法在处理后的玻璃盖片表面进行低表面能材料修饰。本发明具有工艺简单、无需特殊设备、易于推广实施、重复性好等优点；尤其是，经本发明方法改性后的玻璃盖片表面在经受多次擦拭、高温或长时间紫外辐照后仍然可以保持超疏自清洁的特性，可适用于尘埃环境恶劣的深空探测航天器中。
Description
技术领域
本发明涉及空间电源组件材料领域，更具体而言，涉及一种深空探测用超疏自清洁太阳电池玻璃盖片的制备方法。
背景技术
随着航天科技的迅速发展，尘埃问题在地外星球表面探测任务中，特别是火星探测中的问题愈发凸显。地外星球表面的尘埃会在太阳光、宇宙射线、气流、重力等因素单一或协同作用下通过自然沉降、静电吸附累积在太阳电池玻璃盖片表面从而影响其透光性导致太阳电池输出性能下降。目前常用的探测器尘埃清理方式有机械除尘，以我国的玉兔号月球车为例，玉兔号使用了多余的储存气体对表面进行吹喷清除尘埃；这种有源的除尘方法既需会产生宝贵的能源损耗又无法对整个太阳翼电池表面进行除尘，因此开发工艺简单、易于推广操作的超疏自清洁太阳电池盖片的制备方法非常重要。
理论和实例均表明，低的表面能及微纳尺度的表面结构是实现材料表面自清洁的两个决定性因素。各种具备微纳结构的低表面能材料在生物、汽车、建筑等领域有着越来越广泛的应用。目前制备超疏自清洁材料的方法主要包括：溶胶凝胶法、气相沉积法、自组装法、模板法等，这些方法可在玻璃表面构筑具有一定粗糙度的微纳结构，再在此基础上修饰一层低表面能材料从而得到自清洁玻璃。但是这些方法均为通过外引入材料而非直接在玻璃表面构筑具有自清洁功能的表面，因此很容易在使用过程中由于擦拭从而丧失自清洁功能；其次，上述现有方法也存在有无法保证产品重复批量生产的缺陷。因此，发明一种简单又可规模化生产的可直接在玻璃表面构筑自清洁表面的技术是十分必要的。
发明内容
本发明的目的在于提供一种工艺简单、易于产业化生产的超疏自清洁太阳电池玻璃盖片的制备方法。
为实现上述发明目的，本发明采用的技术方案如下：一种深空探测用超疏自清洁玻璃盖片的制备方法，包括下述步骤：
步骤1、在玻璃盖片表面刻蚀出微米或亚微米结构；
步骤2、在具有微米或亚微米结构的玻璃盖片表面进行羟基化处理并形成纳米涂层；
步骤3、在所述纳米涂层上制备一层低表面能材料，得到所述超疏自清洁材料；所述刻蚀区包括间隔均匀分布的凹槽，所述凹槽宽度为0-40µm，深度为0-15µm，间距为5-40µm。
所述太阳电池玻璃盖片为长宽4cm*6cm厚0.1 mm的SiO2玻璃,本领域技术人员不难得知，将本发明方法用于其他尺寸或组份玻璃时也会有类似结果，只是作用强度有所不同而已。
所述羟基化处理为将玻璃盖片投入内置浓氨水（含量25～28%）的聚四氟乙烯反应釜中，于120℃～160 ℃的烘箱内反应2～5小时。
所述的纳米涂层为SiO2纳米涂层，通过浸渍法或旋涂法将SiO2纳米溶胶涂覆在玻璃盖片表面。优选所述SiO2纳米溶胶为粒径7-40 nm的疏水型气相SiO2纳米颗粒或300 nm的单分散SiO2微球，溶胶溶液为按一定质量比（1:6～10:1）配置的正硅酸乙酯：酒精：水混合溶液加入0.1～1 g上述SiO2纳米颗粒。
所述低表面能物质为含氟材料，具体为氟硅烷或氟硅酯材料，优选为全氟辛基乙基三乙基硅烷或甲基丙烯酸六氟丁酯。
所述低表面能材料通过化学气相沉积或浸泡法修饰在玻璃盖片表面。
本发明提供的超疏自清洁太阳电池玻璃盖片的制备方法采用飞秒激光器直接对玻璃盖片表面进行刻蚀再涂覆SiO2纳米涂层最后修饰低表面能材料；所述方法制作工艺简单，无需复杂实验设备，所得的产品接触角大于等于150°，具有非常优异的自清洁效果。
附图说明
图1是依据实施例1 在太阳电池玻璃盖片表面通过飞秒激光器进行刻蚀后的示意图及剖视图。
图2是依据实施例1经激光刻蚀后太阳电池玻璃盖片的3D激光显微镜图。
图3是依据实施例1制得的超疏自清洁太阳电池玻璃盖片的分别在不同分辨率下表面形貌图。
图4是依据实例1制得的超疏自清洁太阳电池玻璃盖片表面上水滴（1µL）形态光学显微图片。
具体实施方式
下面结合具体实施例对本发明进一步进行说明。应理解，此处所描述的具体实施例仅仅用于解释本发明，并不用于限定本发明。
实施例1
一、先将太阳电池玻璃盖片洗净吹干，然后用飞秒激光器对玻璃盖片表面进行特定形状的刻蚀（如图1所示），使用功率为1w波长为355 nm的飞秒激光器对玻璃盖片表面刻蚀，所示凹槽为纵横交错的沟道，凹槽宽度为10 µm，深度为7µm，间距为20µm；刻蚀完成后得到如图2（a）、（b）所示微米结构形貌，包含均匀的凹槽沟道，表面水滴成平铺状，呈现超亲水状态。
二、将刻蚀好的玻璃盖片放入内置浓氨水（含量25～28%）的聚四氟乙烯反应釜中，于120℃的烘箱内反应5小时，反应完成后取出用去离子水洗涤，投入含0.1g粒径为300 nmSiO2纳米微球的1:8:1（质量比）的正硅酸乙酯：酒精：水混合溶液中，反应30min后取出，150℃烘干。
三、将烘干的玻璃盖片放入含2 mL全氟辛基乙基三乙基硅烷的聚四氟乙烯反应釜中，140℃反应2h，然后取出在150℃烘箱内烘干，得到如图3（a）、（b）所示样品；表面水滴形态的光学显微镜图片如图4所示，其水接触角为151.7°，呈现超疏水状态。
实施例2
一、先将太阳电池玻璃盖片洗净吹干，然后用飞秒激光器对玻璃盖片表面进行刻蚀，使用功率为1w波长为355 nm的飞秒激光器对玻璃盖片表面刻蚀，所示凹槽为纵横交错的沟道，凹槽宽度为20 µm，深度为15 µm，间距为20µm；包含均匀的凹槽沟道，表面水滴成平铺状，呈现超亲水状态；
二、将刻蚀好的玻璃盖片放入内置浓氨水（含量25～28%）的聚四氟乙烯反应釜中，于160℃的烘箱内反应2小时，反应完成后取出用去离子水洗涤，配置含0.4g粒径为7-40 nmSiO2纳米颗粒的质量比为1:6:1的正硅酸乙酯：酒精：水混合溶液，取上述溶液对玻璃片进行旋涂，旋涂完成后150℃烘干。
三、将烘干的玻璃盖片浸放入2%的甲基丙烯酸六氟丁酯酒精溶液中，40℃反应1h，取出玻璃盖片80℃干燥后重复上述动作三次，于150℃烘干；测得其水接触角为150.1°，呈现超疏水状态。
最后有必要说明的是：以上实施例只用于对本发明的技术方案做进一步的详细说明，不能理解为对本发明保护范围的限制，本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。
Claims (7)
1.一种深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，包括下述步骤：
步骤1、在玻璃盖片表面刻蚀出微米或亚微米结构；
步骤2、在具有微米或亚微米结构的玻璃盖片表面进行羟基化处理并形成纳米涂层；
步骤3、在所述纳米涂层上制备一层低表面能材料，得到所述超疏自清洁材料；所述刻蚀区包括间隔均匀分布的凹槽，所述凹槽宽度为0-40µm，深度为0-15µm，间距为5-40µm。
2.根据权利要求1所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，所述步骤1中采用飞秒激光器直接进行刻蚀。
3.根据权利要求1所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，所述步骤2中羟基化处理为将具有微米或亚微米结构的玻璃盖片浸泡于浓氨水，含量25～28%，于120℃～160 ℃的聚四氟乙烯反应釜中反应2～5小时。
4.根据权利要求3所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，所述步骤2中通过浸渍法或旋涂法将SiO2纳米溶胶涂覆在具有微米结构的玻璃盖片表面。
5.根据权利要求4所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，所述SiO2纳米溶胶中SiO2纳米颗粒粒径为7-300 nm。
6.根据权利要求1所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，在步骤3中所述低表面能物质为含氟材料。
7.根据权利要求6所述深空探测用超疏自清洁玻璃盖片的制备方法，其特征在于，所述低表面能材料为氟硅烷或氟硅酯。
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