CN106461567B - Defect detecting device and defect inspection method - Google Patents
Defect detecting device and defect inspection method Download PDFInfo
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- CN106461567B CN106461567B CN201580017050.3A CN201580017050A CN106461567B CN 106461567 B CN106461567 B CN 106461567B CN 201580017050 A CN201580017050 A CN 201580017050A CN 106461567 B CN106461567 B CN 106461567B
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- D—TEXTILES; PAPER
- D05—SEWING; EMBROIDERING; TUFTING
- D05B—SEWING
- D05B51/00—Applications of needle-thread guards; Thread-break detectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- D—TEXTILES; PAPER
- D05—SEWING; EMBROIDERING; TUFTING
- D05D—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES D05B AND D05C, RELATING TO SEWING, EMBROIDERING AND TUFTING
- D05D2305/00—Operations on the work before or after sewing
- D05D2305/32—Measuring
- D05D2305/36—Quality control
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
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- General Health & Medical Sciences (AREA)
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- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Sewing Machines And Sewing (AREA)
Abstract
Defect detecting device is used as in the sewed product of sewing thread by the first colo(u)r streak and the second colo(u)r streak, detects to defect generated in sewing thread.In defect detecting device, illumination portion (3) irradiate the first illumination light to the check object face of sewed product.Here, the first illumination light has the wavestrip that the high wavestrip of the first colo(u)r streak of luminance factor is roughly the same in the low and spectral reflectance characteristic possessed by the second colo(u)r streak with reflectivity in the spectral reflectance characteristic possessed by the first colo(u)r streak.Then, defect detecting device makes illumination portion (3) irradiate the first illumination light to sewed product makes image pickup part (2) the check object face of sewed product be shot and be obtained the first image data of sewed product in this case.In addition, defect detecting device detects defect based on the first image data or the processing image data generated and applying image procossing to the first image data.
Description
Technical field
The present invention relates to the defect detecting devices detected to defect generated in the sewing thread for sewed product
And defect inspection method.
Background technique
During manufacturing the sewed products such as air bag, sometimes the suture formed by sewing thread generate off-line,
The defects of broken end, wire jumper.Such defect was detected by visual inspection in the past.In recent years, in order to which detection accuracy is into one
Step raising is cheaper with operating cost, and inquiring into automates defects detection.Specifically, sewed product is put in operator
After setting inspection desk, the image data of sewed product is automatically obtained, based on this image data or by applying to this image data
Image procossing and the processing image data generated, to being detected the defects of generated wire jumper (for example, referring to special in sewing thread
Sharp document 1 or 2).
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 7-16376 bulletin
Patent document 2: Japanese Unexamined Patent Publication 10-170231 bulletin
The summary of invention
Problem to be solved by the invention
But in sewed product, in the case where two sutures formed by sewing thread are intersected with each other, by previous
Defect detecting technique, it is difficult to accurately determine that the crossover sites of suture have zero defect.
In addition, in sewed product, in the case where the upper thread and baseline wrapped around one another as sewing thread, even if in upper thread and
The sewing thread of either baseline generates defect, passes through previous defect detecting technique, it is difficult to accurately examine to defect
It surveys.For example, when processing image data, defect, which may be different from, to be generated other sewing threads of sewing thread of this defect and blocks.
Summary of the invention
Therefore, the purpose of the present invention is to provide can be with high precision to defect generated in the sewing thread for sewed product
The defect detecting device and defect inspection method detected.
The solution to the problem
The present invention is saturating using spectral reflectance characteristic possessed by the colo(u)r streak for being used as sewing thread in sewed product or light splitting
It penetrates made of rate characteristic.Specifically, as described below.
First defect detecting device of the invention is by the first colo(u)r streak and the second colo(u)r streak different from the first colo(u)r streak color
In sewed product as sewing thread, to the device that the defect generated in sewing thread is detected, have illumination portion and image pickup part.According to
The first illumination light is irradiated to the check object face of sewed product in bright portion.Here, the first illumination light is that have to be had in the first colo(u)r streak
Reflectivity is low in some spectral reflectance characteristics and the spectral reflectance characteristic possessed by the second colo(u)r streak in luminance factor first
The light of the roughly the same wavestrip of the high wavestrip of colo(u)r streak.Image pickup part shoots the check object face of sewed product.Then, it first lacks
Sunken detection device, which makes illumination portion irradiate the first illumination light to sewed product, makes inspection pair of the image pickup part to sewed product in this case
As face is shot and obtained the first image data of sewed product.In addition, the first defect detecting device is based on obtaining image pickup part
The first image data or by applying image procossing and the processing image data that generates to the first image data, defect is carried out
Detection.
Second defect detecting device of the invention is by the first colo(u)r streak and the second colo(u)r streak different from the first colo(u)r streak color
In sewed product as sewing thread, to the device that the defect generated in sewing thread is detected, have illumination portion and image pickup part.According to
The first illumination light is irradiated from check object face of the behind of sewed product to sewed product in bright portion.Here, the first illumination light be have with
Transmissivity is low in the spectral transmission characteristic possessed by the first colo(u)r streak and the spectral transmission characteristic possessed by the second colo(u)r streak
The light of the roughly the same wavestrip of the middle transmissivity wavestrip higher than the first colo(u)r streak.Image pickup part claps the check object face of sewed product
It takes the photograph.Then, the second defect detecting device, which makes illumination portion irradiate the first illumination light to sewed product, makes image pickup part pair in this case
The check object face of sewed product is shot and is obtained the first image data of sewed product.In addition, the second defect detecting device base
In the first image data for obtaining image pickup part or the processing image generated and applying image procossing to the first image data
Data detect defect.
First defect inspection method of the invention is by the first colo(u)r streak and the second colo(u)r streak different from the first colo(u)r streak color
In sewed product as sewing thread, method that the defect generated in sewing thread is detected.In the first defect inspection method,
The check object face of sewed product is clapped in this case firstly, irradiating the first illumination light to the check object face of sewed product
Take the photograph and obtain the first image data of sewed product, wherein first illumination light has to be divided with possessed by the first colo(u)r streak
Reflectivity is low in reflectivity Characteristics and the spectral reflectance characteristic possessed by the second colo(u)r streak in the first colo(u)r streak of luminance factor it is high
The roughly the same wavestrip of wavestrip.Then, based on the first acquired image data or by applying image to the first image data
The processing image data of processing and generation, detects defect.
Second defect inspection method of the invention is by the first colo(u)r streak and the second colo(u)r streak different from the first colo(u)r streak color
In sewed product as sewing thread, method that the defect generated in sewing thread is detected.In the second defect inspection method,
Firstly, irradiating the first illumination light, in this case, the inspection to sewed product from check object face of the behind of sewed product to sewed product
Look into the first image data that object surface is shot and obtains sewed product, wherein first illumination light have in the first color
Transmissivity is low in spectral transmission characteristic possessed by line and the spectral transmission characteristic possessed by the second colo(u)r streak in transmissivity
The roughly the same wavestrip of the wavestrip higher than the first colo(u)r streak.Then, based on the first acquired image data or by the first figure
The processing image data generated as data apply image procossing, detects defect.
Invention effect
Defect detecting device and defect inspection method according to the present invention, can be with high precision to the seam for sewed product
The defect generated in line of threading is detected.
Detailed description of the invention
Fig. 1 is the rearview of the side airbag of an example as sewed product.
Fig. 2 is the top view of the defect detecting device of embodiments of the present invention.
Fig. 3 is the main view of defect detecting device.
The work holder that Fig. 4 is had by defect detecting device, sectional view along IV-IV line shown in Fig. 2.
Fig. 5 is the block diagram for showing schematically the composition of defect detecting device.
Fig. 6 is the block diagram of the composition for the image processing part for showing schematically that defect detecting device has.
Fig. 7 is the flow chart for indicating the process of control of defect detecting device.
Fig. 8 is the flow chart for indicating the process of image procossing.
Fig. 9 is the top view of conversion image data shown in picture.
Figure 10 is the top view of flipped image data shown in picture.
Figure 11 is the top view of processing image data shown in picture.
Specific embodiment
Firstly, enumerating and illustrating embodiments of the present invention.
First defect detecting device of embodiments of the present invention is by the first colo(u)r streak and different from the first colo(u)r streak color
The second colo(u)r streak be used as sewing thread sewed product in, to the device that the defect generated in sewing thread is detected, have illumination portion
And image pickup part.The first illumination light is irradiated to the check object face of sewed product in illumination portion.Here, the first illumination light be have with the
Reflectivity is low in spectral reflectance characteristic possessed by one colo(u)r streak and the spectral reflectance characteristic possessed by the second colo(u)r streak in it is anti-
Penetrate the light of the roughly the same wavestrip of the rate wavestrip higher than the first colo(u)r streak.Image pickup part shoots the check object face of sewed product.
Then, the first defect detecting device makes illumination portion irradiate the first illumination light to sewed product makes image pickup part to sewing in this case
The check object face of product is shot and is obtained the first image data of sewed product.In addition, the first defect detecting device is based on making
The first image data that image pickup part obtains or by first image data real-time image processing and the processing image data that generates,
Defect is detected.
According to above-mentioned first defect detecting device, the first illumination light is reflected in the second colo(u)r streak with high proportion.Therefore, it is stitching
In the case that the substrate of product is the material high relative to the reflectivity of the light of the wavestrip of the first illumination light, acquired first
In image data, the second colo(u)r streak and substrate are mirrored with the color of colour system identical as the first illumination light.As a result, in the first picture number
According to the second colo(u)r streak forms the state for incorporating the substrate as its background.On the other hand, the first illumination light is in the first colo(u)r streak with high ratio
Example is absorbed.The first colo(u)r streak is mirrored in the first image data with the color (including dark color) of black system as a result,.That is, above-mentioned
First defect detecting device can extract the first colo(u)r streak with the second colo(u)r streak in which distinguish.As a result, according to above-mentioned first defects detection
Device can with high precision detect the defect generated in the first colo(u)r streak.
In addition, the case where the substrate of sewed product is the reflectivity low material relative to the light of the wavestrip of the first illumination light
Under, according to above-mentioned first defect detecting device, in the first acquired image data, the first colo(u)r streak and substrate are with black system
Color (including dark color) mirrors, as a result, the first colo(u)r streak forms the state for incorporating the substrate as its background.On the other hand,
Second colo(u)r streak is mirrored in the first image data with the color of colour system identical as the first illumination light.That is, above-mentioned first defects detection dress
The second colo(u)r streak can be extracted with the first colo(u)r streak in which distinguish by setting.It, can be with high-precision as a result, according to above-mentioned first defect detecting device
Degree detects the defect generated in the second colo(u)r streak.
In the preferred specific composition of above-mentioned first defect detecting device, first defect detecting device is also equipped with image
Processing unit, defects detection portion and control unit.In addition, illumination portion can the check object face to sewed product selectively irradiate second
Illumination light and above-mentioned first illumination light, wherein the second illumination light has and the light splitting that is respectively provided in the first and second colo(u)r streak
The low wavestrip of reflectivity in either one or two of reflectivity Characteristics, or the spectral reflectance being respectively provided in the first and second colo(u)r streak
The roughly the same wavestrip of the high wavestrip of reflectivity in either one or two of characteristic.Then, control unit executes control (i)~(iv).?
It controls in (i), control unit makes illumination portion irradiate the first illumination light to sewed product makes image pickup part to sewed product in this case
Check object face is shot and is obtained the first image data of sewed product.In control (ii), control unit makes illumination portion opposite joint
Product irradiates the second illumination light to be shot image pickup part to the check object face of sewed product and obtains sewing in this case
Second image data of product.In control (iii), control unit executes image processing part to the first image data and the second figure
As the image procossing of data, image processing part is made to generate processing image data as a result,.At this point, image processing part by using by
The first image data and the second image data by controlling (ii) acquisition that control (i) obtains, will only be extracted first and the
The image data of colo(u)r streak either in two colo(u)r streaks is generated as processing image data.In control (iv), control unit makes defect
Test section is based on processing image data and detects to defect.Furthermore it is not limited in control (iii) using the first image data
And second the both sides of image data the case where generating processing image data, including place is generated using only the first image data
The case where managing image data also includes the case where generating the two processing image datas.
In the light reflection that the substrate of sewed product is relative to the wavestrip of either one or two of the first illumination light and the second illumination light
In the case where the high material of rate, in the above-described configuration, the second illumination light is preferably in either one or two of first and second colo(u)r streak
All have the light of the wavestrip of antiradar reflectivity.In this case, the second illumination light in either one or two of first and second colo(u)r streak with
It is absorbed at high proportion.Therefore, in the second acquired image data, substrate with the second illumination light with the color of colour system to reflect
Out, on the other hand, the first and second colo(u)r streak is mirrored with the color (including dark color) of black system.On the other hand, first
In image data, as described above, the first colo(u)r streak is mirrored with the color (including dark color) of black system, on the other hand, second
Colo(u)r streak forms the state for incorporating the substrate (color of colour system identical as the first illumination light) as its background.As a result, by using
First image data and the second image data can only extract the second colo(u)r streak in the first and second colo(u)r streak.That is, can be with
One colo(u)r streak extracts the second colo(u)r streak with distinguishing.Thereby, it is possible to detect with high precision to the defect generated in the second colo(u)r streak.
On the other hand, anti-relative to the light of the first illumination light and any wavestrip of the second illumination light in the substrate of sewed product
Penetrate rate it is low in the case where, in the above-described configuration, the second illumination light is preferably based in either one or two of first and second colo(u)r streak
The light of the high wavestrip of reflectivity.In this case, the second illumination light is in either one or two of first and second colo(u)r streak with high ratio
Example is reflected.Therefore, in the second acquired image data, substrate is mirrored with the color (including dark color) of black system,
On the other hand, the first and second colo(u)r streak is mirrored with the color of colour system identical as the second illumination light.On the other hand, in the first image
In data, as described above, the second colo(u)r streak is mirrored with the color of colour system identical as the first illumination light, on the other hand, the first colo(u)r streak
Form the state for incorporating the substrate (color of black system) as its background.As a result, by using the first image data and second
Image data can only extract the first colo(u)r streak in the first and second colo(u)r streak.That is, can be extracted with distinguishing with the second colo(u)r streak
First colo(u)r streak.Thereby, it is possible to detect with high precision to the defect generated in the first colo(u)r streak.
Second defect detecting device of embodiments of the present invention is by the first colo(u)r streak and different from the first colo(u)r streak color
The second colo(u)r streak be used as sewing thread sewed product in, to the device that the defect generated in sewing thread is detected, have illumination portion
And image pickup part.The first illumination light is irradiated from check object face of the behind of sewed product to sewed product in illumination portion.Here, the first illumination
Light is that have the low and light splitting possessed by the second colo(u)r streak with transmissivity in the spectral transmission characteristic possessed by the first colo(u)r streak
The light of the roughly the same wavestrip of the transmissivity wavestrip higher than the first colo(u)r streak in transmission characteristics.Inspection pair of the image pickup part to sewed product
As face is shot.Then, the second defect detecting device makes illumination portion irradiate the first illumination light to sewed product, in this case,
Image pickup part is set the check object face of sewed product to be shot and be obtained the first image data of sewed product.In addition, the second defect
Detection device based on make image pickup part obtain the first image data or by first image data real-time image processing and generate
Processing image data, defect is detected.
According to above-mentioned second defect detecting device, the first illumination light is transmitted with high proportion from the second colo(u)r streak.Therefore, it is sewing
In the case that the substrate of product is the material high relative to the transmissivity of the light of the wavestrip of the first illumination light, in the first acquired figure
As in data, the second colo(u)r streak and substrate are mirrored with the color of colour system identical as the first illumination light.As a result, in the first image data
In, the second colo(u)r streak forms the state for incorporating the substrate as its background.On the other hand, the first illumination light is in the first colo(u)r streak with high ratio
Example is absorbed.The first colo(u)r streak is mirrored in the first image data with the color of black system (including dark color) as a result,.On that is,
The first colo(u)r streak can be extracted with the second colo(u)r streak in which distinguish by stating the second defect detecting device.It is examined as a result, according to above-mentioned second defect
Device is surveyed, the defect generated in the first colo(u)r streak can be detected with high precision.
In addition, the case where the substrate of sewed product is the transmissivity low material relative to the light of the wavestrip of the first illumination light
Under, according to above-mentioned second defect detecting device, in the first acquired image data, the first colo(u)r streak and substrate are with black system
Color (including dark color) mirror, as a result, the first colo(u)r streak formed incorporate as its background substrate state.Another party
Face, the second colo(u)r streak are mirrored in the first image data with the color of colour system identical as the first illumination light.That is, above-mentioned second defect inspection
The second colo(u)r streak can be extracted with the first colo(u)r streak in which distinguish by surveying device.It, can be with as a result, according to above-mentioned second defect detecting device
High-precision detects the defect generated in the second colo(u)r streak.
In the preferred specific composition of above-mentioned second defect detecting device, the second defect detecting device is also equipped at image
Reason portion, defects detection portion and control unit.In addition, illumination portion from the behind of sewed product to the check object face of sewed product selectively
Irradiate the second irradiation light and above-mentioned first irradiation light, wherein the second irradiation light has and has respectively in the first and second colo(u)r streak
The low wavestrip of transmissivity in either one or two of some spectral transmission characteristics, or the first and second colo(u)r streak respectively possessed by
The roughly the same wavestrip of either one or two of high wavestrip of transmissivity in either one or two of spectral transmission characteristic.Then, control unit is held
Row control (i)~(iv).In control (i), control unit makes illumination portion irradiate the first illumination light to sewed product, in this case,
Image pickup part is set the check object face of sewed product to be shot and be obtained the first image data of sewed product.In control (ii),
Control unit makes illumination portion irradiate the second illumination light to sewed product makes image pickup part to the check object face of sewed product in this case
Shot and obtained the second image data of sewed product.In control (iii), control unit executes image processing part to first
The image procossing of image data and the second image data makes image processing part generate processing image data as a result,.At this point, figure
As processing unit by using by control (i) acquisition the first image data and by control (ii) acquisition the second image data, by
The image data for the colo(u)r streak either being only extracted in the first and second colo(u)r streak is generated as processing image data by this.It is controlling
It makes in (iv), control unit detects defects detection portion to defect based on processing image data.Furthermore it controls in (iii) simultaneously
It is not limited to the case where processing image data is generated using the both sides of the first image data and the second image data, comprising only making
The case where processing image data is generated with the first image data also includes the case where generating the two processing image datas.
In the light transmission that the substrate of sewed product is relative to the wavestrip of either one or two of the first illumination light and the second illumination light
In the case where the high material of rate, in the above-described configuration, the second illumination light is preferably in either one or two of first and second colo(u)r streak
All have the light of the wavestrip of low transmission rate.In this case, the second illumination light in either one or two of first and second colo(u)r streak with
It is absorbed at high proportion.Therefore, in the second acquired image data, substrate is reflected with the color of colour system identical as the second illumination light
Out, on the other hand, the first and second colo(u)r streak is mirrored with the color (including dark color) of black system.On the other hand, first
In image data, as described above, the first colo(u)r streak is mirrored with the color (including dark color) of black system, on the other hand, second
Colo(u)r streak forms the state for incorporating the substrate (color of colour system identical as the first illumination light) as its background.As a result, by using
First image data and the second image data can only extract the second colo(u)r streak in the first and second colo(u)r streak.That is, can be with
One colo(u)r streak extracts the second colo(u)r streak with distinguishing.Thereby, it is possible to detect with high precision to the defect generated in the second colo(u)r streak.
On the other hand, the wavestrip in the substrate of sewed product relative to either one or two of the first illumination light and the second illumination light
In the case that light transmission is low, in the above-described configuration, the second illumination light is preferably in either one or two of first and second colo(u)r streak
All have the light of the wavestrip of high-transmission rate.In this case, the second illumination light in either one or two of first and second colo(u)r streak with
It transmits at high proportion.Therefore, in the second acquired image data, substrate is reflected with the color (including dark color) of black system
Out, on the other hand, the first and second colo(u)r streak is mirrored with the color of colour system identical as the second illumination light.On the other hand, first
In image data, as described above, the second colo(u)r streak is mirrored with the color of colour system identical as the first illumination light, on the other hand, first
Colo(u)r streak forms the state for incorporating the substrate (color of black system) as its background.As a result, by using the first image data and
Second image data can only extract the first colo(u)r streak in the first and second colo(u)r streak.That is, can distinguish ground with the second colo(u)r streak
Extract the first colo(u)r streak.Thereby, it is possible to detect with high precision to the defect generated in the first colo(u)r streak.
Specifically, image processing part executes processing (A) and (B) in control (iii).In processing (A), for
First image data and the second image data, the pixel value that image processing part is included in them are converted to the progressive series of greys, raw
At two conversion image datas.In processing (B), image processing part uses two conversion image datas by handling (A) generation,
The synthesis processing for carrying out these conversion image datas, generates processing image data as a result,.Here, being not limited in synthesis processing
Addition process, also comprising subtraction process such as difference.As a result, processing image data in, only in the first and second colo(u)r streak appoint
The colo(u)r streak of one side is mirrored with the color of black system or white color system.The defect generated in sewing thread is examined with high precision as a result,
It surveys.Furthermore in the case where image pickup part is grayscale camera, it is convenient to omit above-mentioned processing (A).
First defect inspection method of embodiments of the present invention is by the first colo(u)r streak and different from the first colo(u)r streak color
The second colo(u)r streak be used as in the sewed product of sewing thread, method that the defect generated in sewing thread is detected.In the first defect
In detection method, firstly, the first illumination light, in this case, the inspection to sewed product are irradiated in the check object face to sewed product
Object surface is shot and is obtained the first image data of sewed product, and first illumination light is that have to be had in the first colo(u)r streak
Reflectivity is low in some spectral reflectance characteristics and the spectral reflectance characteristic possessed by the second colo(u)r streak in luminance factor first
The roughly the same wavestrip light of the high wavestrip of colo(u)r streak.Then, based on the first acquired image data, or by the first picture number
According to the processing image data for applying image procossing and generating, defect is detected.
Second defect inspection method of embodiments of the present invention is by the first colo(u)r streak and different from the first colo(u)r streak color
The second colo(u)r streak be used as in the sewed product of sewing thread, method that the defect generated in sewing thread is detected.In the second defect
In detection method, firstly, the first illumination light is irradiated from check object face of the behind of sewed product to sewed product, in this case,
The check object face of sewed product is shot and is obtained the first image data of sewed product, first illumination light be have with
Transmissivity is low in the spectral transmission characteristic possessed by the first colo(u)r streak and the spectral transmission characteristic possessed by the second colo(u)r streak
The roughly the same wavestrip of the middle transmissivity wavestrip higher than the first colo(u)r streak.Then, based on the first acquired image data, or pass through
The processing image data for applying image procossing to the first image data and generating, detects defect.
Then, the detailed content of embodiments of the present invention is illustrated.
The defect detecting device and defect inspection method of present embodiment are in the sewing thread for sewed product respectively
The device and method that the defect of generation is detected, the inspection of the sewed product especially suitable for two kinds of colo(u)r streaks to be used as to sewing thread
It looks into.As sewed product, such as air bag can be enumerated etc..
[1] inspection object (sewed product)
Fig. 1 is the rearview of the side airbag B of an example as sewed product.In addition, putting for the region Ia is also shown in Fig. 1
Big figure.Side airbag B is formed by overlappingly two sheet material 100 of suture regulation shape.Furthermore in Fig. 1, the piece on surface layer
The sheet material 100 of 100 inner layer of material blocks.In the present embodiment, the substrate of white color system is used as sheet material 100.
Two sutures of the outer peripheral edge 100a extension along sheet material 100 are formed in the peripheral part of side airbag B
101.Suture 101 respectively by two-wire slit at.Therefore, at the back side of side airbag B, for sewing upper thread 101A with
And baseline 101B is presented in the form of following.That is, in each suture 101, multiple suture 101P for being formed by upper thread 101A
It is spread along suture 101, baseline 101B surrounds these sutures 101P.In present embodiment, the colo(u)r streak of green system is used as face
The colo(u)r streak of line 101A, white color system are used as baseline 101B.
Moreover, being formed with two sutures 102 linearly extended in side airbag B.Suture 102 is respectively by flat
Slit at.Therefore, at the back side of side airbag B, upper thread 102A and baseline 102B for sewing are in the form of following
It is existing.That is, being spread by multiple suture 102P that upper thread 102A is formed along suture 102, baseline in each suture 102
102B extends between two suture 102P adjacent to each other along suture 102.In present embodiment, the colo(u)r streak of blue series is used
Make upper thread 102A, the colo(u)r streak of red colour system is used as baseline 102B.
That is, showing that the substrate of the spectral reflectance characteristic of high reflectance is used as while there is the entire wavestrip for spreading visible light
Sheet material 100.On the other hand, the colo(u)r streak with the high wavestrip of reflectivity spectral reflectance characteristic different from each other is used separately as upper thread
101A, upper thread 102A and baseline 102B.In the same manner as sheet material 100, there is the entire wavestrip for spreading visible light height is shown
The colo(u)r streak of the spectral reflectance characteristic of reflectivity is used as baseline 101B.
As an example, for the substrate of white color system used in present embodiment, the colo(u)r streak of white color system, blue series color
Line, the colo(u)r streak of green system, red colour system colo(u)r streak, the measuring device manufactured using X-Rite company (Color i5) measures them
Spectral reflectance characteristic.The results are shown in tables 1.As shown in table 1, the substrate and colo(u)r streak of white color system, throughout the whole of visible light
A wavestrip reflectivity it is high.The colo(u)r streak of blue series, it is high in wavestrip (435~480nm) reflectivity of blue, on the other hand, at it
His wavestrip, reflectivity are significant lower.The colo(u)r streak of green system, it is high in wavestrip (500~560nm) reflectivity of green, on the other hand,
In other wavestrips, reflectivity is significant lower.The colo(u)r streak of red colour system, it is high in red wavestrip (610~750nm) reflectivity, it is another
Aspect, in other wavestrips, reflectivity is significant lower.
[table 1]
Reflectivity (%)
| Wavelength | 460nm (blue) | 530nm (green) | 630nm (red) |
| The substrate of white color system | 73.9 | 77.9 | 78.2 |
| The colo(u)r streak of white color system | 72.4 | 75.7 | 76.2 |
| The colo(u)r streak of blue series | 47.2 | 11.9 | 3.9 |
| The colo(u)r streak of green system | 10.7 | 33.3 | 14.7 |
| The colo(u)r streak of red colour system | 5.2 | 3.2 | 51.4 |
Then, in sewed product shown in Fig. 1, suture 101 and suture 102 are intersected with each other.Specifically, suturing
The crossover sites of line 101 and suture 102, suture 101 are formed in the upside of suture 102.
Hereinafter, to using side airbag B shown in FIG. 1 as the defect detecting device of main inspection object and defect
The detailed content of detection method is illustrated.Furthermore in present embodiment, mainly to suture 101P generate wire jumper the defects of
It is detected.Of course it is also possible to using the defect detecting technique of present embodiment, to other positions for being not limited to suture 101P
The defects of damage of generation, spot, is detected.
[2] composition of defect detecting device
Fig. 2 and Fig. 3 is respectively the top view and main view of the defect detecting device of embodiments of the present invention.Defect
Detection device has: work holder 1, image pickup part 2 and illumination portion 3.Work holder 1, which has, keeps inspection object
Function.
It is equipped with camera shooting space S 1 and working space S2 in defect detecting device, work holder 1 can be in camera shooting space
It is moved back and forth between S1 and working space S2.Here, camera shooting space S 1 is to carry out the space of inspection object camera shooting.In addition, work
Make space S 2 and carries out the work such as the setting of inspection object, the replacement of inspection object to work holder 1 for operator
Space.Furthermore in Fig. 2, a part that the roof 81 of camera shooting space S 1 is constituted in defect detecting device is destroyed to be indicated.
In addition, a part for constituting the front surface wall 82 of camera shooting space S 1 in defect detecting device is destroyed in Fig. 3 to be indicated.
Specifically, it is specified that the guide rail 1A of the movement routine of work holder 1 and the drive for keeping work holder 1 mobile
Dynamic portion is (not shown) to be set to defect detecting device.In addition, workpiece has been set separately in camera shooting space S 1 and working space S2
The stop position P1 and P2 of clamping device 1.Then, aftermentioned control unit 7 controls driving portion (referring to Fig. 5), as a result,
Work holder 1 along guide rail 1A camera shooting space S 1 in stop position P1 and working space S2 in stop position P2 it
Between move.
Fig. 4 is work holder 1, sectional view along IV-IV line shown in Fig. 2.Work holder 1 is by examining
It looks into platform 11 and pressing plate 13 is constituted.Inspection desk 11 is the platform with the mounting surface 11a placed for inspection object.Furthermore in Fig. 4
The side airbag B for being shown as inspection object is placed on the state of the specified position Pt on mounting surface 11a.
Pressing plate 13 is used to press the inspection object for the specified position Pt being placed on mounting surface 11a towards inspection desk 11.
Specifically, pressing plate 13 is opened and closed pivot suspension freely relative to the mounting surface 11a of inspection desk 11.In addition, pressing plate 13 is not with
The mode for interfering the shooting (acquirement of image data) of the inspection object carried out by aftermentioned image pickup part 2, passes through transparent material
It is formed.As an example, the opening and closing of pressing plate 13 is executed by operator.Certainly, the opening and closing of pressing plate 13 can also automate.
As shown in FIG. 2 and 3, image pickup part 2 is set to the roof 81 for constituting camera shooting space S 1.Specifically, image pickup part 2
It is configured at the position opposed with specified position Pt when imaging the stop position P1 in space S 1 and stopping of work holder 1 facing downward
It sets.Furthermore image pickup part 2 is not limited to configuration in roof 81, can also image the stopping in space S 1 with work holder 1
Mode position P1 opposed with specified position Pt when stopping, being configured at the top for being provided with the room of defect detecting device facing downward
Canopy.
Image pickup part 2 has CCD (Charge Coupled Device) imaging sensor, CMOS (Complementary
MOS) imaging sensor etc. is arranged with the imaging sensor of multiple light receiving elements of light of the sensing from inspection object.Then,
Image pickup part 2 is based on carrying out the check object for being held in work holder 1 from the instruction of aftermentioned control unit 7 (referring to Fig. 5)
The shooting (specifically, the check object face to the sewed product as inspection object is shot) of object, obtains inspection as a result,
The image data of object.
In the shooting of the inspection object carried out by image pickup part 2, illumination portion 3 is to inspection object irradiation light.Illumination portion 3
In include indirect illumination portion 31 and transillumination portion (not shown).Indirect illumination portion 31 carries out inspection object from oblique upper
The irradiation etc. of light makes imaging sensor possessed by image pickup part 2 sense the reflected light at inspection object as a result,.At this point, if
To inspection object direct irradiation light, then bright or gloss is generated on the surface of inspection object, in acquired image data
In, the mapping of sewing thread etc. is easy to be deteriorated.It is therefore preferable that the light from indirect illumination portion 31 indirectly carries out inspection object
Irradiation.As an example, it is contemplated that make the light from indirect illumination portion 31 for the time being in the wall surface reflection for constituting camera shooting space S 1.Thoroughly
Penetrate illumination portion makes the sensing of imaging sensor possessed by image pickup part 2 logical inspection object irradiation light as a result, from behind (lower section)
Cross the transmitted light of inspection object.Then, indirect illumination portion 31 and transillumination portion are based on from aftermentioned 7 (ginseng of control unit
According to Fig. 5) instruction, selectively lighted when shooting inspection object.
In present embodiment, inspection pair that indirect illumination portion 31 can selectively to the sewed product as inspection object
As the first illumination light and the second illumination light are irradiated in face.In addition, transillumination portion is from behind to the sewed product as inspection object
Irradiate transillumination light.Then, illumination portion 3 is based on the instruction from aftermentioned control unit 7 (referring to Fig. 5), in shooting as inspection
When looking into the sewed product of object, the first illumination light, the second illumination light and transillumination light selectively are irradiated to sewed product.Again
Person, indirect illumination portion 31 also can have the composition that can selectively irradiate three kinds or more different of light of wavestrip.The situation
Under, two kinds of light in three kinds or more of light are suitably used as the first illumination light and the second illumination light respectively.In addition, transmission is shone
Bright portion, which also can have, can irradiate the different two or more light of wavestrip selectively as the structure of transillumination light.It is right
In the defect detecting technique using transillumination light, it is illustrated by aftermentioned third variation.
In present embodiment, the first illumination light is by the spectral reflectance possessed by upper thread 102A (colo(u)r streaks of blue series)
Reflectivity is low in characteristic and the spectral reflectance characteristic possessed by upper thread 101A the colo(u)r streak of system (green) in luminance factor upper thread
102A (colo(u)r streaks of blue series) high wavestrip Wr1 is as object, the light with the wavestrip roughly the same with this wavestrip Wr1.That is, packet
The light of the green system of wavestrip contained in 500~560nm is used as the first illumination light.
In addition, the second illumination light is by upper thread 101A (colo(u)r streak of green system) and upper thread 102A (colo(u)r streaks of blue series) points
The low wavestrip Wr2 of reflectivity has big with this wavestrip Wr2 as object in either one or two of not possessed spectral reflectance characteristic
Cause the light of identical wavestrip.In present embodiment, in spectral reflectance characteristic possessed by baseline 102B (colo(u)r streak of red colour system)
The high wavestrip Wr3 of reflectivity is Chong Die with wavestrip Wr2, and the second illumination light is set to its band packet contained in wavestrip Wr2 and wavestrip Wr3
The region of overlapping.That is, the light for being contained in the red colour system of the wavestrip of 610~750nm is used as the second illumination light.
Fig. 5 is the block diagram for conceptually indicating the composition of defect detecting device.As shown in figure 5, defect detecting device also has
Standby image processing part 4, defects detection portion 5, storage unit 6 and control unit 7.
Fig. 6 is the block diagram for conceptually indicating the composition of image processing part 4.As shown in fig. 6, image processing part 4 includes to turn
Processing unit 41, pretreatment portion 42 and arithmetic processing section 43 are changed, image procossing is executed based on the instruction from control unit 7.Specifically
For, image processing part 4 generates emphasize as a result, to image data acquired by image pickup part 2 (Da1, Da2) real-time image processing
Suture 101P etc. is set as the processing image data (Dp) of the part of the object of defects detection.
The pixel value separately included in the pixel for constituting image data (Da1, Da2) is converted to grey by conversion process 41
Scale generates conversion image data (Db1, Db2) as a result,.In order to reduce the unevenness of light and shade or the distortion of image etc. or emphasize side
Edge, pretreatment portion 42 use gimmicks or DoG (Difference of Gaussian) filter etc. such as coloring treatment (shading)
Means carry out smoothing techniques to conversion image data and emphasize either one handled.Arithmetic processing section 43 as a result,
Generate two processing image datas (Db1 ', Db2 ') respectively according to two conversion image datas (Db1, Db2).
Two processing image datas of the use of arithmetic processing section 43 (Db1 ', Db2 '), by carrying out these synthesis processing next life
At processing image data (Dp).As an example, arithmetic processing section 43 includes overturning processing unit 431 and addition process portion 432.Overturning
The processing image data of a side in 431 pairs of processing unit processing image datas (Db1 ', Db2 ') is implemented to make turning over for its gray scale overturning
Turn processing, generates flipped image data (Dc1).Addition process portion 432 is by flipped image data and remaining processing image data
It is added, generates the new processing image data for highlighting the part for the object that suture 101P etc. is set as defects detection as a result,
(Dp).It, can be further to overturning before executing addition process by addition process portion 432 furthermore in arithmetic processing section 43
Image data implements binary conversion treatment etc. and emphasizes processing or Fuzzy Processing etc..In addition, the overturning processing etc. executed before addition process
It can also be executed by pretreatment portion 42.
As other examples, arithmetic processing section 43 can be used two processing image datas (Db1 ', Db2 ') and carry out at subtraction
Reason generates highlight by the new processing image data (Dp) of the part of the object as defects detection as a result,.In this case,
Arithmetic processing section 43 replaces overturning processing unit 431 and addition process portion 432, has subtraction process portion.
Defects detection portion 5 executes defects detection processing based on the instruction from control unit 7.Specifically, defects detection
Portion 5 is based on the processing image data generated of image processing part 4, examines to the defects of wire jumper for being present in inspection object
It surveys.As an example, the gimmicks such as Blob analytic approach or edge detection method are used for defects detection processing.Furthermore it can be not limited to
The various gimmicks of these gimmicks are for defects detection processing.
Control unit 7 is, for example, the CPU (Central Processing Unit) for being built in computer.It is stored in storage unit 6
There is image to obtain program, control unit 7 reads from storage unit 6 and executes this program, as a result, to work holder 1, image pickup part 2
And illumination portion 3 is controlled.Moreover, storing image processing program and defects detection program, control unit 7 in storage unit 6
It is read from storage unit 6 and executes these programs, image processing part 4 and defects detection portion 5 are controlled respectively as a result,.Again
Person, image, which obtains program, image processing program and defects detection program, can be used as a program for being embedded in these programs
It constructs, can also be used as single program to construct.
[3] control of defect detecting device
Then, according to flow chart shown in Fig. 7, the specific control that the control unit 7 of defect detecting device carries out is subject to
Explanation.
< image obtains >
Firstly, control unit 7 is read from storage unit 6 when the sewed product as inspection object is arranged at work holder 1
Take and execute image obtain program, based on this image obtain program, to work holder 1, image pickup part 2 and illumination portion 3 into
Row control.
Specifically, in step S11, control unit 7 make work holder 1 from the stop position P2 in working space S2 to
The stop position P1 imaged in space S 1 is mobile.Then, in step S12, control unit 7 makes illumination portion 3 to sewed product irradiation first
Illumination light makes image pickup part 2 the check object face of sewed product be shot and be obtained the first image of sewed product in this case
Data Da1.
In present embodiment, the first illumination light is the light of green system.Therefore, the first illumination light white color system sheet material 100,
The upper thread 101A of colo(u)r streak and the baseline 101B of the colo(u)r streak as white color system as green system are reflected with high proportion.Another party
Face, in the upper thread 102A of the colo(u)r streak as the blue series and baseline 102B of the colo(u)r streak as red colour system, the first illumination light is with height
Ratio is absorbed.As a result, in the first image data Da1, sheet material 100, upper thread 101A and baseline 101B are with the face of green system
Color mirrors, as a result, upper thread 101A and baseline 101B forms the state for incorporating the sheet material 100 of the background as them.Another party
Face, upper thread 102A and baseline 102B are mirrored in the first image data Da1 with the color of black system (including dark color).
Thereafter, control unit 7 stops at work holder 1 in the state of stop position P1, executes step S13.In step
Rapid S13, control unit 7, which makes illumination portion 3 irradiate the second illumination light to sewed product, makes inspection of the image pickup part 2 to sewed product in this case
Look into the second image data Da2 that object surface is shot and obtains sewed product.Furthermore step S12 and S13 can be with such as Fig. 7
Shown in sequentially execute, can also be to be executed with this opposite sequence of sequence.
In present embodiment, the second illumination light is the light of red colour system.Therefore, the second illumination light white color system sheet material 100,
The baseline 102B of the baseline 101B of colo(u)r streak as white color system and the colo(u)r streak as red colour system is reflected with high proportion.Another party
Face, in the upper thread 101A of the colo(u)r streak as the green system and upper thread 102A of the colo(u)r streak as blue series, the second illumination light is with height
Ratio is absorbed.As a result, in the second image data Da2, sheet material 100, baseline 101B and baseline 102B are with the face of red colour system
Color mirrors, as a result, baseline 101B and baseline 102B forms the state for incorporating the sheet material 100 of the background as them.Another party
Face, upper thread 101A and upper thread 102A are mirrored in the second image data Da2 with the color of black system (including dark color).
< image procossing >
When obtaining the first image data Da1 and the second image data Da2, in step S14, control unit 7 is read from storage unit 6
Image processing program is taken and executed, this image processing program is based on, image processing part 4 is controlled.Specifically, control unit
7 make image processing part 4 execute the image procossing for the first image data Da1 and the second image data Da2, generate as a result,
Handle image data Dp.Furthermore the reading of image processing program can also be carried out when reading image and obtaining program.
Fig. 8 is the flow chart for indicating the process of image procossing.When image procossing starts, in step S21, conversion process 41
Conversion process is executed to the first image data Da1 and the second image data Da2.By the conversion process, in each first image
In data Da1 and the second image data Da2, pixel value is converted into the progressive series of greys.As a result, according to the first image data Da1
Conversion image data Db1 is generated, conversion image data Db2 is generated according to the second image data Da2.
Fig. 9 (a) is the top view of the conversion image data Db1 shown in picture.In the first image data Da1, sheet material
100, upper thread 101A and baseline 101B is mirrored with the color of green system.Therefore, in conversion image data Db1, sheet material 100,
Upper thread 101A and baseline 101B is mirrored with the color (including white) of bright grey colour system, as a result, upper thread 101A and baseline 101B
Form the state for incorporating the sheet material 100 of the background as them.On the other hand, upper thread 102A and baseline 102B is in conversion image
It is mirrored in data Db1 with the color of black system.
Fig. 9 (b) is the top view of the conversion image data Db2 shown in picture.In the second image data Da2, sheet material
100, baseline 101B and baseline 102B are mirrored with the color of red colour system.Therefore, in conversion image data Db2, sheet material 100,
Baseline 101B and baseline 102B is mirrored with the color (including white) of bright grey colour system, as a result, baseline 101B and baseline 102B
Form the state for incorporating the sheet material 100 of the background as them.On the other hand, upper thread 101A and upper thread 102A is in conversion image
It is mirrored in data Db2 with the color of black system.
Then, in step S22, pretreatment portion 42 is to conversion image data Db1 and Db2 execution smoothing techniques and by force
Mediate either one of reason.By the pretreatment, the unevenness of the light and shade generated in conversion image data Db1 and Db2 is reduced
Or distortion of image etc., as a result, generating processing image data Db1 ' and Db2 ' respectively.
Later, in step S23, arithmetic processing section 43 carries out these conjunctions using processing image data Db1 ' and Db2 '
At processing, processing image data Dp is thus generated.Specifically, overturning 431 pairs of processing picture numbers of processing unit in step S231
Implement the overturning for overturning its gray scale processing according to Db1 '.Flipped image data Dc1 shown in Fig. 10 is generated as a result,.That is, overturning
In image data Dc1, sheet material 100, upper thread 101A and baseline 101B are mirrored with the color of black system.On the other hand, upper thread
102A and baseline 102B is mirrored in flipped image data Dc1 with the color of white color system or bright grey colour system.Furthermore in step
In S231, binary conversion treatment etc. further can also be implemented to flipped image data Dc1 and emphasize processing or Fuzzy Processing etc..This
Outside, step S231 can also be executed by pretreatment portion 42.
In step S23, then, in step S232, addition process portion 432 is by flipped image data Dc1 and handles image
Data Db2 ' is added, and generates new processing image data Dp as a result,.Specifically, the picture that processing image data Db2 ' will be constituted
The pixel value of element is added with the pixel value for the pixel for constituting flipped image data Dc1 with the relationship that location of pixels corresponds to each other.By
This, handles the upper thread 102A (referring to Fig. 9 (b)) mirrored in image data Db2 ' with the color of black system and flipped image data
It is offseted in Dc1 with the upper thread 102A that the color of white color system or bright grey colour system mirrors.That is, with black in processing image data Db2 '
The upper thread 102A that the color of system mirrors is converted into the color of white color system or bright grey colour system.
Furthermore in step S23, arithmetic processing section 43 also can replace the execution of step S231 and S232, and carry out
The subtraction process for handling image data Db1 ' and Db2 ', generates new processing image data Dp as a result,.Specifically, by structure
The pixel value of the pixel of image data Db2 ' is handled in pixel position at the pixel value and composition of the pixel of processing image data Db1 '
It sets and carries out subtraction between the pixel to correspond to each other.
Figure 11 is the top view of the processing image data Dp shown in picture.According to above-mentioned image procossing, as shown in figure 11,
In processing image data Dp, upper thread 102A and baseline 101B and baseline 102B are formed together and incorporate the background as them
The state of sheet material 100.As a result, in processing image data Dp, only upper thread 101A is with the color (including dark color) of black system
It mirrors, as a result, the part (the suture 101P in present embodiment) for being set as the object of defects detection is emphasised.
< defects detection >
When generating processing image data Dp, control unit 7 reads and executes scarce from storage unit 6 in step S15 (referring to Fig. 7)
Detection program is fallen into, this defects detection program is based on, defects detection portion 5 is controlled.Furthermore the reading of defects detection program
It can be carried out when reading image and obtaining program or when reading image processing program.
When starting defects detection processing, defects detection portion 5 is based on processing image data Dp and detects to defect.It is specific and
Speech, defects detection portion 5 is using gimmicks such as Blob analytic approach or edge detection methods, defect (this implementation to generating in upper thread 101A
In mode, wire jumper present in mainly suture 101P) it is detected.Furthermore the various of these gimmicks can be not limited to
Gimmick is for defects detection processing.
Defect detecting device according to the present embodiment is dexterously had using the colo(u)r streak for being used as sewing thread in sewed product
Some spectral reflectance characteristics, as a result, realizing in image procossing to the part for the object for being set as defects detection
It extracts.Even if the defect detecting device of present embodiment also can in the crossover sites of suture 101 and suture 102 as a result,
The defect generated in upper thread 101A is detected with high precision.
In present embodiment, it is important that: in the first image data Da1, make upper thread 101A (colo(u)r streak of green system)
The sheet material 100 as its background is incorporated, in the second image data Da2, upper thread 101A is not made to incorporate the sheet material as its background
100, but mirrored with the color of black system (including dark color).Obtaining such first image data Da1 and second
When image data Da2, spectral reflectance characteristic possessed by colo(u)r streak is considered, it is important that be selected as the light of wavestrip appropriate
First illumination light and the second illumination light, in addition to this, it is important that the color of white color system is selecting as to the sheet material of background
100 color.
[4] variation
[4-1] first variation
By applying drawbacks described above detection device, two kinds of colors for being used as sewing thread in sewed product can be fetched separately
Line, and defect is detected to each colo(u)r streak.As an example, for the colo(u)r streak in upper thread 102A for black system, and baseline 102B is red
In the sewed product of the colo(u)r streak of system, upper thread 102A and baseline 102B is fetched separately, and be subject to the case where each colo(u)r streak detection defect
Explanation.
The light that the defect detecting device of this variation is included in the red colour system of the wavestrip of 610~750nm is used as first and shines
Mingguang City, the light for being included in the green system of the wavestrip of 500~560nm are used as the second illumination light.
First illumination light is anti-with high proportion in the baseline 102B of the sheet material 100 of white color system and the colo(u)r streak as red colour system
It penetrates.On the other hand, in the upper thread 102A of the colo(u)r streak as black system, the first illumination light to be absorbed at high proportion.Therefore, passing through
In the first image data Da1 that step S12 is obtained, sheet material 100 and baseline 102B are mirrored with the color of red colour system, as a result, bottom
Line 102B forms the state for incorporating the sheet material 100 as its background.On the other hand, upper thread 102A is in the first image data Da1
It is mirrored with the color (including dark color) of black system.
In addition, according in the first image data Da1 conversion image data Db1 generated, sheet material 100 and baseline
102B is mirrored with the color (including white) of bright grey colour system, as a result, baseline 102B, which is formed, incorporates the sheet material 100 as its background
State.On the other hand, upper thread 102A is mirrored in conversion image data Db1 with the color of black system.Therefore, in conversion picture number
According in Db1, only the upper thread 102A in upper thread 102A and baseline 102B is mirrored with the color of black system.That is, upper thread 102A is mentioned
It takes.Defects detection processing is executed by using conversion image data Db1 as a result, detects generated in upper thread 102A with high precision
Defect.
Second illumination light is reflected in the sheet material 100 of white color system with high proportion.On the other hand, in the color as black system
In the baseline 102B of the upper thread 102A of line and the colo(u)r streak as red colour system, the second illumination light to be absorbed at high proportion.Exist as a result,
In the second image data Da2 obtained by step S13, sheet material 100 is mirrored with the color of green system, on the other hand, upper thread 102A
And baseline 102B is mirrored with the color (including dark color) of black system.
It is identical with above embodiment by implementing to the first image data Da1 and the second image data Da2 as a result,
Image procossing (referring to Fig. 8), in processing image data Dp generated, the only baseline in upper thread 102A and baseline 102B
102B is mirrored with the color of black system.That is, baseline 102B is fetched separately relative to upper thread 102A.As a result, by using processing
Image data Dp is handled to execute defects detection, is detected with high precision to the defect generated in baseline 102B.
Two kinds of colo(u)r streaks are fetched separately in defect detecting device according to this modification, detect defect to each colo(u)r streak.As a result,
In the case where being detected to defect, the colo(u)r streak for generating this defect is determined.
As other examples, in the case that the colo(u)r streak of yellow class and the colo(u)r streak of green system are used as sewing thread in sewed product,
The light for being included in the red colour system of the wavestrip of 610~750nm is used as the first illumination light, is included in the wavestrip of 435~480nm
The light of blue series is used as the second illumination light, and thereby, it is possible to two kinds of colo(u)r streaks are fetched separately.
As other another examples, the case where colo(u)r streak of blue series and the colo(u)r streak of green system are used as sewing thread in sewed product
Under, the light for being included in the blue series of the wavestrip of 435~480nm is used as the first illumination light, is included in the wave of 610~750nm
The light of the red colour system of band is used as the second illumination light, and thereby, it is possible to two kinds of colo(u)r streaks are fetched separately.
[4-2] second variation
By applying drawbacks described above detection device, in the case that the substrate as sewed product uses the substrate of black system,
The defect generated in two kinds of sewing threads (the first and second colo(u)r streak) that can be different to color detects.In this case, will
The high wavestrip conduct pair of reflectivity in either one or two of spectral reflectance characteristic possessed by distinguishing in the first and second colo(u)r streak
As the light with the wavestrip roughly the same with this wavestrip is used as the second illumination light.Furthermore above embodiment is similarly, the
One illumination light is that reflectivity in the spectral reflectance characteristic possessed by the first colo(u)r streak is low and possessed by the second colo(u)r streak point
The high wavestrip of the first colo(u)r streak of luminance factor has the wavestrip roughly the same with this wavestrip as object in light reflectivity properties
Light.
In this variation, point below is important.That is, making the first colo(u)r streak incorporate conduct in the first image data Da1
The substrate (color of black system) of its background, mirrors the second colo(u)r streak with the color homochromy with the first illumination light.In addition, second
In image data Da2, the first colo(u)r streak is not made to incorporate the substrate (color of black system) as its background, but to be illuminated with second
The color that light is homochromy mirrors, and at the same time, the second colo(u)r streak is also mirrored with the color homochromy with the second illumination light.By using in this way
The first image data Da1 and the second image data Da2, even if the substrate of sewed product be black system, also can individually mention
The first and second colo(u)r streak is taken, defect is detected to each colo(u)r streak.
[4-3] third variation
In drawbacks described above detection device, however it is not limited to be used as the spy of spectral reflectance possessed by the colo(u)r streak of sewing thread
Property, spectral transmission characteristic possessed by these colo(u)r streaks can also be utilized the detection of the defect generated in sewing thread.The feelings
Under condition, in above embodiment and variation, " reflectivity " is replaced work " transmissivity ".In addition, the transmission of illumination portion 3 is shone
The first illumination light is selectively irradiated to the check object face of the sewed product as inspection object from the behind of sewed product in bright portion
With the second illumination light.According to this modification, same as the case where spectral reflectance characteristic is utilized, first can be fetched separately
And second colo(u)r streak, defect is detected to each colo(u)r streak.
Furthermore each section composition of the invention is not limited to the above embodiment, in detail in the claims the technology
Various modifications are able to carry out in range.For example, drawbacks described above detection device properly selects the first illumination light and the second illumination
Light, the inspection for being used as the sewed product of sewing thread thereby, it is possible to be suitable for various colo(u)r streaks.
In addition, illumination portion 3 also can have can selectively irradiate the wavestrip for being contained in 435~480nm to sewed product
Blue series light, be contained in 500~560nm wavestrip green system light and be contained in 610~750nm wavestrip it is red
The structure of the light of colour system.In this case, two kinds of light in three kinds of light are suitably used as the first illumination light and the second photograph respectively
Mingguang City.Furthermore, however it is not limited to which the light of various wavestrips can also be used as the first illumination light or the second illumination light by these three light.Example
Such as, the ultraviolet light for being contained in the wavestrip smaller than 380nm also can be used or be contained in the infrared ray of the wavestrip bigger than 780nm.
Industrial availability
Defect detecting device of the invention is not limited to the inspection of air bag, additionally it is possible to be suitable for colo(u)r streak being used as sewing
The inspection of the various sewed products of line.
Symbol description
1 work holder
1A guide rail
11 inspection desks
11a mounting surface
13 pressing plates
2 image pickup parts
3 illumination portions
4 image processing parts
41 conversion process
42 pretreatment portions
43 arithmetic processing sections
431 overturning processing units
432 addition process portions
5 defects detection portions
6 storage units
7 control units
81 roofs
82 front surface walls
100 sheet materials
The outer peripheral edge 100a
101,102 suture
101A, 102A upper thread
101B, 102B baseline
101P, 102P suture
B side airbag
S1 images space
The operating space S2
The specified position Pt
P1, P2 stop position
The first image data of Da1
The second image data of Da2
Db1, Db2 conversion image data
Db1 ', Db2 ' handle image data
Dc1 flipped image data
Dp handles image data
Wr1, Wr2, Wr3 wavestrip
S11, S12, S13, S14, S15 step
S21, S22, S23, S231, S232 step
Claims (7)
1. the first colo(u)r streak and second colo(u)r streak different from the first colo(u)r streak color are being used as sewing by a kind of defect detecting device
In the sewed product of line, the defect generated in the sewing thread is detected, is had:
The first illumination light is irradiated to the check object face of the sewed product in illumination portion, first illumination light have with described the
The reflectivity of second colo(u)r streak described in the luminance factor of first colo(u)r streak described in spectral reflectance characteristic possessed by one colo(u)r streak it is low and
First colo(u)r streak described in the luminance factor of second colo(u)r streak described in the spectral reflectance characteristic possessed by second colo(u)r streak it is anti-
Penetrate the roughly the same wavestrip of the high wavestrip of rate；And
Image pickup part shoots the check object face of the sewed product,
So that the illumination portion is irradiated first illumination light to the sewed product makes the image pickup part to described in this case
The check object face of sewed product is shot and is obtained the first image data of the sewed product,
Based on the first image data for obtaining the image pickup part or by applying at image to the first image data
The processing image data managed and generated, detects the defect.
2. defect detecting device according to claim 1, is also equipped with:
Image processing part, defects detection portion and control unit,
The illumination portion selectively the test object face to the sewed product can irradiate the second illumination light and described the
One illumination light, second illumination light have and the dichroic reflection that is respectively provided in first colo(u)r streak and second colo(u)r streak
The low wavestrip of reflectivity or point being respectively provided in first colo(u)r streak and second colo(u)r streak in either one or two of rate characteristic
The roughly the same wavestrip of either one or two of high wavestrip of reflectivity in either one or two of light reflectivity properties,
The control unit carries out:
(i) so that the illumination portion is irradiated first illumination light to the sewed product makes the image pickup part to institute in this case
The check object face for stating sewed product is shot and the control of the first image data for obtaining the sewed product；
(ii) so that the illumination portion is irradiated second illumination light to the sewed product makes the image pickup part pair in this case
The check object face of the sewed product is shot and the control of the second image data for obtaining the sewed product；
(iii) described image processing unit is executed to the image of the first image data and second image data
Reason thus generates the control of processing image data；And
(iv) control for detecting the defects detection portion to the defect based on the processing image data,
In the control (iii), described image processing unit uses the first image data acquired by the control (i)
With second image data acquired by the control (ii), generates only extract first colo(u)r streak and described as a result,
The image data obtained after colo(u)r streak either in second colo(u)r streak is as the processing image data.
3. the first colo(u)r streak and second colo(u)r streak different from the first colo(u)r streak color are being used as sewing by a kind of defect detecting device
In the sewed product of line, the defect generated in the sewing thread is detected, is had:
The first illumination light is irradiated to the check object face of the sewed product from the behind of the sewed product in illumination portion, first photograph
Mingguang City has with the transmissivity of the first colo(u)r streak described in the spectral transmission characteristic that has in first colo(u)r streak than described second
The transmissivity of colo(u)r streak is low and the spectral transmission characteristic that has in second colo(u)r streak described in the transmissivity of the second colo(u)r streak compare institute
State the high roughly the same wavestrip of wavestrip of the transmissivity of the first colo(u)r streak；And
Image pickup part shoots the check object face of the sewed product,
So that the illumination portion is irradiated first illumination light to the sewed product makes the image pickup part to described in this case
The check object face of sewed product is shot and is obtained the first image data of the sewed product,
Based on the first image data for obtaining the image pickup part or by applying at image to the first image data
The processing image data managed and generated, detects the defect.
4. defect detecting device according to claim 3, is also equipped with:
Image processing part, defects detection portion and control unit,
The illumination portion can selectively be irradiated from the check object face of the behind of the sewed product to the sewed product
Second illumination light and first illumination light, second illumination light have in first colo(u)r streak and second colo(u)r streak
The low wavestrip of transmissivity or in first colo(u)r streak and described in either one or two of spectral transmission characteristic being respectively provided with
The roughly the same wave of either one or two of high wavestrip of transmissivity in either one or two of spectral transmission characteristic that two colo(u)r streaks are respectively provided with
Band,
The control unit carries out:
(i) so that the illumination portion is irradiated first illumination light to the sewed product makes the image pickup part to institute in this case
The check object face for stating sewed product is shot and the control of the first image data for obtaining the sewed product；
(ii) so that the illumination portion is irradiated second illumination light to the sewed product makes the image pickup part pair in this case
The check object face of the sewed product is shot and the control of the second image data for obtaining the sewed product；
(iii) described image processing unit is executed to the image of the first image data and second image data
Reason thus generates the control of processing image data；And
(iv) control for detecting the defects detection portion to the defect based on the processing image data,
In the control (iii), described image processing unit uses the first image data acquired by the control (i)
With second image data acquired by the control (ii), generates only extract first colo(u)r streak and described as a result,
The image data obtained after colo(u)r streak either in second colo(u)r streak is as the processing image data.
5. defect detecting device according to claim 2 or 4, wherein
In the control (iii), described image processing unit is carried out:
(A) it for the first image data and second image data, is converted by being included in pixel value therein
The processing of two conversion image datas is generated for gray scale；And
(B) these synthesis processing are carried out using by the processing (A) described two conversion image datas generated, as a result,
Generate the processing of the processing image data.
6. the first colo(u)r streak and second colo(u)r streak different from the first colo(u)r streak color are being used as sewing by a kind of defect inspection method
In the sewed product of line, the defect generated in the sewing thread is detected, is had follow steps:
First irradiation light, in this case, the inspection to the sewed product are irradiated to the test object face of the sewed product
The step of object surface is shot and obtains the first image data of the sewed product, wherein first illumination light have with
Second colo(u)r streak described in the luminance factor of first colo(u)r streak described in the spectral reflectance characteristic possessed by first colo(u)r streak it is anti-
Penetrate that rate is low and the spectral reflectance characteristic possessed by second colo(u)r streak described in the second colo(u)r streak luminance factor described in first
The roughly the same wavestrip of the high wavestrip of the reflectivity of colo(u)r streak；And
It is generated based on acquired the first image data or and applying image procossing to the first image data
Image data is handled, the step of detection to the defect.
7. the first colo(u)r streak and second colo(u)r streak different from the first colo(u)r streak color are being used as sewing by a kind of defect inspection method
In the sewed product of line, generated defect in the sewing thread is detected, is had follow steps:
The first illumination light is irradiated from check object face of the behind of the sewed product to the sewed product, in this case, to institute
State the step of test object face of sewed product is shot and obtains the first image data of the sewed product, wherein institute
The first illumination light is stated with the transmissivity with the first colo(u)r streak described in the spectral transmission characteristic possessed by first colo(u)r streak
Second colo(u)r streak described in and the spectral transmission characteristic possessed by second colo(u)r streak lower than the transmissivity of second colo(u)r streak
The transmissivity wavestrip roughly the same wavestrip higher than the transmissivity of first colo(u)r streak；And
It is generated based on acquired the first image data or and applying image procossing to the first image data
Image data is handled, the step of detection to the defect.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014069358A JP6220714B2 (en) | 2014-03-28 | 2014-03-28 | Defect detection apparatus and defect detection method |
| JP2014-069358 | 2014-03-28 | ||
| PCT/JP2015/001457 WO2015146063A1 (en) | 2014-03-28 | 2015-03-17 | Defect detecting apparatus and defect detecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106461567A CN106461567A (en) | 2017-02-22 |
| CN106461567B true CN106461567B (en) | 2019-07-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580017050.3A Active CN106461567B (en) | 2014-03-28 | 2015-03-17 | Defect detecting device and defect inspection method |
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| Country | Link |
|---|---|
| JP (1) | JP6220714B2 (en) |
| CN (1) | CN106461567B (en) |
| WO (1) | WO2015146063A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101968252B1 (en) * | 2016-12-12 | 2019-08-13 | 주식회사 세파테크놀로지 | A needle error detection appratus for weaving loom |
| KR101968250B1 (en) * | 2016-12-12 | 2019-04-11 | 주식회사 세파테크놀로지 | A computer-readable recording medium with needle error detection program for weaving loom |
| CN111157538A (en) * | 2020-02-25 | 2020-05-15 | 常州昌瑞汽车部品制造有限公司 | Visual inspection machine for automobile main driving airbag |
| WO2021250736A1 (en) * | 2020-06-08 | 2021-12-16 | 日本電気株式会社 | Air bag inspection device, air bag inspection system, air bag inspection method, and recording medium |
| US20240005624A1 (en) * | 2020-12-23 | 2024-01-04 | Mayekawa Mfg. Co., Ltd. | Target detection device, machine learning implementation device, target detection program, and machine learning implementation program |
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| JPH0292391A (en) * | 1988-09-29 | 1990-04-03 | Aisin Seiki Co Ltd | Cloth end detector of sewing machine |
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| US5497235A (en) * | 1995-01-12 | 1996-03-05 | Monarch Knitting Machinery Corporation | Inspecting and grading apparatus for hosiery and method of inspecting same |
| JPH1190077A (en) * | 1997-09-16 | 1999-04-06 | Toyota Central Res & Dev Lab Inc | Stitch checking device |
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| JP5664167B2 (en) * | 2010-11-22 | 2015-02-04 | セイコーエプソン株式会社 | Inspection device |
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- 2015-03-17 CN CN201580017050.3A patent/CN106461567B/en active Active
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| US5027730A (en) * | 1987-03-07 | 1991-07-02 | Pfaff Industriemaschinen Gmbh | Sewing machine with a thread monitor for the thread of the bobbin |
| CN1341783A (en) * | 2000-09-06 | 2002-03-27 | 飞马缝纫机制造株式会社 | Detection device for stitching defect |
| CN102061580A (en) * | 2009-11-13 | 2011-05-18 | 木下精密工业株式会社 | Automated skip checker device for sewing machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106461567A (en) | 2017-02-22 |
| WO2015146063A1 (en) | 2015-10-01 |
| JP2015190898A (en) | 2015-11-02 |
| JP6220714B2 (en) | 2017-10-25 |
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