CN106436281A - Preparation method of self-cleaning fabric with ultraviolet resistant effect - Google Patents
Preparation method of self-cleaning fabric with ultraviolet resistant effect Download PDFInfo
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- CN106436281A CN106436281A CN201610896251.1A CN201610896251A CN106436281A CN 106436281 A CN106436281 A CN 106436281A CN 201610896251 A CN201610896251 A CN 201610896251A CN 106436281 A CN106436281 A CN 106436281A
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- 239000004744 fabric Substances 0.000 title claims abstract description 216
- 230000000694 effects Effects 0.000 title claims abstract description 44
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 70
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 65
- 239000008367 deionised water Substances 0.000 claims abstract description 57
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 57
- 238000000231 atomic layer deposition Methods 0.000 claims abstract description 41
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 24
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000003960 organic solvent Substances 0.000 claims abstract description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 254
- 238000010926 purge Methods 0.000 claims description 203
- 229910052757 nitrogen Inorganic materials 0.000 claims description 127
- 238000006243 chemical reaction Methods 0.000 claims description 126
- 239000010409 thin film Substances 0.000 claims description 95
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 63
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 52
- 230000008021 deposition Effects 0.000 claims description 44
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims description 43
- 229910003074 TiCl4 Inorganic materials 0.000 claims description 35
- 239000004411 aluminium Substances 0.000 claims description 22
- 239000012467 final product Substances 0.000 claims description 20
- -1 polyethylene Polymers 0.000 claims description 20
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 claims description 20
- 230000015572 biosynthetic process Effects 0.000 claims description 17
- 239000004753 textile Substances 0.000 claims description 15
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 11
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 10
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 10
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 10
- 239000004698 Polyethylene Substances 0.000 claims description 10
- 239000004743 Polypropylene Substances 0.000 claims description 10
- 229920000297 Rayon Polymers 0.000 claims description 10
- 229920002334 Spandex Polymers 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 10
- 239000011425 bamboo Substances 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 10
- 229920000573 polyethylene Polymers 0.000 claims description 10
- 229920001155 polypropylene Polymers 0.000 claims description 10
- 239000004759 spandex Substances 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- 210000002268 wool Anatomy 0.000 claims description 10
- 229920004934 Dacron® Polymers 0.000 claims description 9
- 108010073771 Soybean Proteins Proteins 0.000 claims description 9
- 210000001367 artery Anatomy 0.000 claims description 9
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 9
- 235000019710 soybean protein Nutrition 0.000 claims description 9
- 210000003462 vein Anatomy 0.000 claims description 9
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 8
- 241000292525 Titanio Species 0.000 claims description 5
- 244000082204 Phyllostachys viridis Species 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 235000013336 milk Nutrition 0.000 claims 1
- 239000008267 milk Substances 0.000 claims 1
- 210000004080 milk Anatomy 0.000 claims 1
- 238000004080 punching Methods 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 abstract description 7
- 229910052719 titanium Inorganic materials 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 230000002045 lasting effect Effects 0.000 abstract description 2
- 239000002120 nanofilm Substances 0.000 abstract 4
- 238000009776 industrial production Methods 0.000 abstract 1
- 238000004506 ultrasonic cleaning Methods 0.000 abstract 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 22
- 239000002904 solvent Substances 0.000 description 18
- 241001330002 Bambuseae Species 0.000 description 9
- 102000014171 Milk Proteins Human genes 0.000 description 9
- 108010011756 Milk Proteins Proteins 0.000 description 9
- 235000021239 milk protein Nutrition 0.000 description 9
- 238000002242 deionisation method Methods 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000001727 in vivo Methods 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 150000003608 titanium Chemical class 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 210000000582 semen Anatomy 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 230000009967 tasteless effect Effects 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/46—Oxides or hydroxides of elements of Groups 4 or 14 of the Periodic Table; Titanates; Zirconates; Stannates; Plumbates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Abstract
The invention relates to a preparation method of a self-cleaning fabric with an ultraviolet resistant effect. The method comprises the main steps that 1, a fabric is sequentially placed into an organic solvent and deionized water for ultrasonic cleaning to remove attachments on the surface of the fabric; 2, an atomic layer deposition technology is used for sequentially depositing a nanometer titanium-based function nano-film and an aluminum-based function nano-film on the surface of the cleaned fabric, and the self-cleaning fabric with the ultraviolet resistant effect is obtained. According to the preparation method of the self-cleaning fabric with the ultraviolet resistant effect, the obtained fabric has the lasting and stable ultraviolet resistant effect, and the surface of the fabric has the better self-cleaning characteristic; the deposited function nano-films are bonded on the surface of the fabric through chemical bonds, the films can be effectively prevented from being peeled or disengaged, and due to the deposited titanium-based and aluminum-based function nano-films, the intrinsic and wearing characteristics, such as the softness, smoothness and comfort level of the fabric, of the fabric are not changed to a certain extent. The preparation method is simple, high in production efficiency, low in cost and energy consumption and suitable for industrial production, and does not cause pollution to ecological environment.
Description
Technical field
The present invention relates to a kind of preparation method of the self-cleaning fabrics having uvioresistant effect concurrently, belong to fabric post-treatment neck
Domain.
Background technology
With the continuous improvement of people's daily life, there are more new demands to functional textile.Textile fabric or
Fabric touches aqueous or oil-containing spot and is easy to be contaminated, through the fiber of silicic acid anhydride or fabric with its uniqueness from clear
The performances such as clean, antipollution, can effectively contain that the water-soluble stain of material surface pollutes, oil-dirt pollutes, the conduction of electric current
And fluid viscous the problems such as.At present, by carrying out TiO in textile surface2Coating modifying is produced from clean textile
One of important method.Meanwhile, nano-TiO2Being also a kind of ultraviolet light screener, can effectively shielding extraneous ultraviolet, thus avoiding
Ultraviolet is brought irreversible damage to fiber or textile material, and TiO2Itself possesses nonpoisonous and tasteless, chemical stability
Well, the advantages of safety and environmental protection, shield ranges width, impart fabric multi-functional effect.China Patent Publication No.
CN101654863A, publication date is on 2 24th, 2010, and entitled " preparation has the side of the fabric of self-cleaning performance
Method ", the method is hydrolyzed in acid condition using titanium salt and the TiO with nanostructured is obtained2Mixed liquor, fabric soaks
Gel can get self-cleaning effect after processing, but gel process time is long, and the impact that the flexibility of fabric is existed.
China Patent Publication No. CN102277724A, publication date is on December 14th, 2011, and invention entitled " a kind of nano anti-ultraviolet resists
The method for sorting of bacterium self-cleaning fabrics ", is proposed a kind of hydrolysis using titanium salt and constructs the TiO with nanostructured2Dressing liquid, then
Fabric is repeatedly padded respectively in dressing liquid and water repellent agent solution, bakees and produce uvioresistant and automatically cleaning work(after being dried
Can, though the method is obtained in that preferable uvioresistant and self-cleaning effect, complex process, repeatedly pad, relatively complicated,
Less efficient, and fabric durability and take poor performance.China Patent Publication No. CN103572584A, publication date is 2014
2 months 12 days, invention entitled " had the preparation side of the modified nano-titanium dioxide finishing agent of uvioresistant and automatically cleaning double effectses
Method ", using organo silane coupling agent to nano-TiO2Carry out surface modification and form finishing agent, fabric processes transformation in finishing agent
Afterwards, the method is simple, it is strong to operate with, but nano-TiO2Adhesion effect is poor, low yield, so that uvioresistant and from clear
The persistency of clean effect is poor, and fabric harsh, and feel is poor.
Content of the invention
For the problems referred to above, it is an object of the invention to provide a kind of preparation of the self-cleaning fabrics having uvioresistant effect concurrently
Method.
To achieve these goals, the technical solution of the present invention is, a kind of automatically cleaning having uvioresistant effect concurrently is knitted
The preparation method of thing, described method is carried out according to the following steps：
A fabric clean process, by fabric press bath raio be 1:50-100 is cleaned by ultrasonic 30-60min in organic solvent,
Then 2-4h is dried at 45-80 DEG C, then fabric is pressed bath raio for 1:50-100 is cleaned by ultrasonic 30-60min in deionized water, so
6-10h is dried at 80-100 DEG C afterwards, the fabric after being processed, organic solvent used be ethanol or propanol or ether or acetone or
One of chloroform.
Fabric after processing of step A is put into the reaction cavity of the atomic layer deposition apparatus that temperature is 120-200 DEG C by B
Interior, the nitrogen purging 3-10min being 99.999% with purity, then adopt the TiCl that purity is more than 97%4Or titanium tetraisopropylate
For the first presoma, by TiCl4Or titanium tetraisopropylate is heated to 60-80 DEG C of formation TiCl4Or titanium tetraisopropylate steam, and with arteries and veins
Form of rushing is by TiCl4Or titanium tetraisopropylate steam feeding reaction cavity, the burst length is 0.05-0.2s, and open-assembly time is 8-
15s, then the nitrogen purging being 99.999% with purity, purge time is 15-30s, and deionized water is the second presoma, with pulse
Form sends into reaction cavity, and the burst length is 0.01-0.1s, and open-assembly time is 8-15s, then the nitrogen being 99.999% with purity
Purging, purge time is 15-30s, completes primary depositing circulation, defines a layer thickness in fabric face and be about 0.8-1nm
Function nano TiO2Thin film, repeats this deposition cycle 10-10000 time, fabric used is bafta, bamboo fabric, linen,
Silk fabric, wool fabric, down cloth, soybean protein fabric, milk protein fabric, polyester textile, polyethylene fabric, glass are knitted
One of thing, polypropylene fabric, viscose fabric, acrylic fabric, dacron, polyvinyl fabric, spandex fabric and its blend fabric.
Surface after processing through step B is deposited functional nano-TiO by C2The fabric of thin film is put into temperature and is 80-150 DEG C
The reaction cavity of atomic layer deposition apparatus in, with purity be 99.999% nitrogen purging 25-30min, then by deionization
Water pumps in reaction cavity with impulse form, and the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then with purity is
99.999% nitrogen purging, purge time is 15-30s, then by the trimethyl aluminium/n-heptane solution of 1.0M-5.0M with pulse form
Formula pumps in reaction cavity, and the burst length is 0.005-0.02s, and open-assembly time is 5-12s, is then 99.999% with purity
Nitrogen purges, and purge time is 10-35s, that is, depositing functional nano-TiO2One layer of aluminum be deposited on the fabric face of thin film
Base function nano thin film, repeats this deposition cycle 1-100 time, obtains final product the self-cleaning fabrics having uvioresistant effect concurrently, the aluminum of deposition
Each single cycle growth thickness of base function nano thin film is 0.82-1.2nm.
Beneficial due to a kind of self-cleaning fabrics having uvioresistant effect concurrently that using above technical scheme, the present invention provides
Effect is:
(1) present invention is modified to fabric face using titanio and aluminium base function nano thin film successively, can effectively play
Titanio and the synergism of aluminum-base nano particle, make the fabric after arrangement both have TiO2Uvioresistant function, there is aluminum again
The heat stability of base nanoparticle and mechanical stability, thus significantly improve uvioresistant and the self-cleaning performance of fabric.
(2) suitable fabrics species of the present invention is more, and deposition titanio and aluminium base function nano thin film are to a certain extent not
Change originally seeking peace of fabric and wear characteristic, such as the flexibility of fabric, smooth and comfortableness.
(3) present invention adopt technique for atomic layer deposition, preparation process is simple, easy to operate, production efficiency is high, cost and
Energy consumption is low, and the titanio of preparation and aluminium base function nano thin film are in fabric face by chemical bonding, and be evenly distributed, thin film
Thickness is controlled, shape-retaining ability and good endurance, can be prevented effectively from function nano thin film and occur peeling off or coming off.
Specific embodiment
With reference to specific embodiment, the invention will be further described.
A kind of preparation method of the self-cleaning fabrics having uvioresistant effect concurrently, methods described is carried out according to the following steps:
A fabric clean process, by fabric press bath raio be 1:50-100 is cleaned by ultrasonic 30-60min in organic solvent,
2-4h is dried under the conditions of 45-80 DEG C；Again fabric being pressed bath raio is 1:50-100 is cleaned by ultrasonic 30-60min in deionized water,
Then 6-10h, fabric processed after are dried under the conditions of 80-100 DEG C.Organic solvent used is ethanol or propanol or ether
Or one of acetone or chloroform.
Fabric after processing of step A is put into the reaction cavity of the atomic layer deposition apparatus that temperature is 120-200 DEG C by B
Interior, the nitrogen purging 3-10min being 99.999% with purity, then adopt the TiCl that purity is more than 97%4Or titanium tetraisopropylate
For the first presoma, by TiCl4Or titanium tetraisopropylate is heated to 60-80 DEG C of formation TiCl4Or titanium tetraisopropylate steam, and with arteries and veins
Form of rushing is by TiCl4Or titanium tetraisopropylate steam feeding reaction cavity, the burst length is 0.05-0.2s, and open-assembly time is 8-
The nitrogen purging that 15s is 99.999% with purity, purge time is 15-30s；Deionized water is the second presoma, with pulse form
Formula sends into reaction cavity, and the burst length is 0.01-0.1s, and open-assembly time is 8-15s, then is blown with the nitrogen that purity is 99.999%
Sweep 25min, wherein, nitrogen flow rate is 50sccm, and purge time is 15-30s, completes primary depositing circulation, that is, in fabric face
Deposited one layer of TiO2Thin film, after repeating above deposition cycle 10-10000 time, defines a layer function in fabric face and receives
Rice TiO2Thin film；Fabric used includes bafta, bamboo fabric, linen, silk fabric, wool fabric, down cloth, Semen sojae atricolor
Protein fabric, milk protein fabric, polyester textile, polyethylene fabric, Woven glass cloth, polypropylene fabric, viscose fabric, acrylic fabric,
Dacron, polyvinyl fabric, spandex fabric and its blend fabric.
Surface after processing through step B is deposited functional nano-TiO by C2The fabric of thin film is put into temperature and is 80-150 DEG C
The reaction cavity of atomic layer deposition apparatus in, with purity be 99.999% nitrogen purging 25-30min, then by deionization
Water pumps in reaction cavity with impulse form, and the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then with purity is
99.999% nitrogen purging, purge time is 15-30s, then by the trimethyl aluminium/n-heptane solution of 1.0M-5.0M with pulse form
Formula pumps in reaction cavity, and the burst length is 0.005-0.02s, and open-assembly time is 5-12s, is then 99.999% with purity
Nitrogen purges, and purge time is 10-35s, that is, depositing functional nano-TiO2One layer of aluminum be deposited on the fabric face of thin film
Base function nano thin film, repeats this deposition cycle 1-100 time, obtains final product the self-cleaning fabrics having uvioresistant effect concurrently.
Using the self-cleaning fabrics having uvioresistant effect concurrently of the method preparation, can preferably keep the intrinsic spy of fabric
Property, and function nano TiO2Thin film is in fabric face by chemical bonding, effectively prevents thin film from occurring peeling off or coming off, sinks
Long-pending TiO2The fabric of thin film not only obtains the uvioresistant film coating of lasting stability, and surface has preferable automatically cleaning effect
Really.The present invention has that process equipment is simple, operating process is few, reaction condition is gentle, production efficiency is high, cost and energy consumption are low, is
Ald provides a new approach in loomage surface modification method.
Certainly, described embodiment be only the present invention a part of embodiment, rather than whole embodiments.Based on this
Inventive embodiment, other examples that those skilled in the art are obtained under the premise of not making creative work, belong to
The scope of the present invention.
Embodiment 1
It is 1 that bafta is pressed bath raio:50 are cleaned by ultrasonic 30min in alcohol solvent, 2h are dried under the conditions of 45 DEG C；Again will
Bath raio pressed by bafta is 1:50 are cleaned by ultrasonic 30min in deionized water, 6h is then dried under the conditions of 80 DEG C, next will locate
Bafta after reason is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 120 DEG C, the nitrogen being 99.999% with purity
3min is swept in air-blowing, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to 60 DEG C of formation TiCl4
Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is 8s, uses purity
Nitrogen purging for 99.999%, purge time is 15s；Deionized water is the second presoma, sends into reaction chamber with impulse form
Body, the burst length is 0.01s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is 15s, that is,
Define a layer function nano-TiO in surface of cotton fabric2Thin film, repeats this deposition cycle 100 times.
Surface is deposited functional nano-TiO2The atomic layer deposition apparatus that temperature is 80 DEG C put into by the bafta of thin film
In reaction cavity, the nitrogen purging 25min being 99.999% with purity, then deionized water is pumped into reaction chamber with impulse form
In vivo, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is 15s,
Again trimethyl aluminium/the n-heptane solution of 1.0M is pumped in reaction cavity with impulse form, the burst length is 0.005s, open-assembly time
For 5s, the nitrogen purging being then 99.999% with purity, purge time is 10s, that is, depositing functional nano-TiO2Thin film
Surface of cotton fabric on deposited one layer of aluminium base function nano thin film, repeat this deposition cycle 10 times, obtain final product have concurrently uvioresistant effect
The automatically cleaning bafta answered.
Embodiment 2
It is 1 that bamboo fabric is pressed bath raio:70 are cleaned by ultrasonic 30min in propanol solvent, 3h are dried under the conditions of 60 DEG C；Again will
It is 1 that bamboo fabric presses bath raio:50 are cleaned by ultrasonic 45min in deionized water, then 6h are dried under the conditions of 100 DEG C, next will
Bamboo fabric after process is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, is 99.999% with purity
Nitrogen purges 5min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, titanium tetraisopropylate is heated to
80 DEG C of formation titanium tetraisopropylate steams, and titanium tetraisopropylate steam is sent into by reaction cavity with impulse form, the burst length is
0.1s, open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 18s；Deionized water is second
Presoma, sends into reaction cavity with impulse form, and the burst length is 0.02s, and open-assembly time is 10s, then with purity is
99.999% nitrogen purging, purge time is 20s, defines a layer function nano-TiO in bamboo fabric face2Thin film, weight
This deposition cycle 1000 times again.
Surface is deposited functional nano-TiO2The bamboo fabric of thin film puts into the atomic layer deposition apparatus that temperature is 100 DEG C
In reaction cavity, the nitrogen purging 25min being 99.999% with purity, then deionized water is pumped into reaction chamber with impulse form
In vivo, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 20s,
Again trimethyl aluminium/the n-heptane solution of 2.0M is pumped in reaction cavity with impulse form, the burst length is 0.01s, open-assembly time
For 8s, the nitrogen purging being then 99.999% with purity, purge time is 15s, that is, depositing functional nano-TiO2Thin film
Bamboo fabric face on deposited one layer of aluminium base function nano thin film, repeat this deposition cycle 20 times, obtain final product have concurrently uvioresistant effect
The automatically cleaning bamboo fabric answered.
Embodiment 3
It is 1 that linen is pressed bath raio:50 are cleaned by ultrasonic 30min in acetone solvent, 4h are dried under the conditions of 60 DEG C, then will
Bath raio pressed by linen is 1:70 are cleaned by ultrasonic 30min in deionized water, then 8h are dried under the conditions of 100 DEG C, next will
Linen after process is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, is 99.999% with purity
Nitrogen purges 5min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, titanium tetraisopropylate is heated to
80 DEG C of formation titanium tetraisopropylate steams, and titanium tetraisopropylate steam is sent into by reaction cavity with impulse form, the burst length is
0.05s, open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is 20s；Deionized water is second
Presoma, sends into reaction cavity with impulse form, and the burst length is 0.05s, and open-assembly time is 10s, then with purity is
99.999% nitrogen purging, purge time is 15s, defines a layer function nano-TiO on linen surface2Thin film, weight
This deposition cycle 1000 times again.
Surface is deposited functional nano-TiO2The atomic layer deposition apparatus that temperature is 100 DEG C put into by the linen of thin film
In reaction cavity, the nitrogen purging 30min being 99.999% with purity, then deionized water is pumped into reaction chamber with impulse form
In vivo, the burst length is 0.1s, and open-assembly time is 10s, then is purged with nitrogen, and purge time is 20s, then the trimethyl by 1.0M
Aluminum/n-heptane solution pumps in reaction cavity with impulse form, and the burst length is 0.01s, and open-assembly time is 5s, with purity is so
99.999% nitrogen purging, purge time is 10s, that is, depositing functional nano-TiO2Deposit on the linen surface of thin film
One layer of aluminium base function nano thin film, repeats this deposition cycle 20 times, obtains final product the automatically cleaning linen having uvioresistant effect concurrently.
Embodiment 4
It is 1 that silk fabric is pressed bath raio:80 are cleaned by ultrasonic 30min in alcohol solvent, 4h are dried under the conditions of 60 DEG C, then
It is 1 that silk fabric is pressed bath raio:70 are cleaned by ultrasonic 30min in deionized water, then 6h are dried under the conditions of 100 DEG C, connect down
Silk fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 10min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to
60 DEG C of formation TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, open-assembly time
For 8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with pulse form
Formula sends into reaction cavity, and the burst length is 0.01s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, purging
Time is 15s, defines a layer function nano-TiO on silk fabric surface2Thin film, repeats this deposition cycle 2000 times.
Surface is deposited functional nano-TiO2The silk fabric of thin film puts into the atomic layer deposition apparatus that temperature is 150 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.2s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, and purge time is
30s, then the trimethyl aluminium/n-heptane solution of 3.0M is pumped in reaction cavity with impulse form, the burst length is 0.015s, exposes
Time is 10s, the nitrogen purging being so 99.999% with purity, and purge time is 10s, that is, depositing functional nano-TiO2Thin
One layer of aluminium base function nano thin film be deposited on the silk fabric surface of film, repeat this deposition cycle 50 times, obtain final product and have anti-purple concurrently
The automatically cleaning silk fabric of external effect.
Embodiment 5
It is 1 that wool fabric is pressed bath raio:70 are cleaned by ultrasonic 30min in propanol solvent, 3h are dried under the conditions of 60 DEG C；Again
It is 1 that wool fabric is pressed bath raio:50 are cleaned by ultrasonic 40min in deionized water, then 6h are dried under the conditions of 80 DEG C, next
Wool fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 120 DEG C, with purity is
99.999% nitrogen purging 8min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, by four isopropyls
Alcohol titanium is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction cavity, arteries and veins
Time of rushing is 0.1s, and open-assembly time is 12s, then the nitrogen purging being 99.999% with purity, and purge time is 18s；Deionization
Water is the second presoma, sends into reaction cavity with impulse form, and the burst length is 0.05s, and open-assembly time is 10s, then uses purity
Nitrogen purging for 99.999%, purge time is 20s, defines a layer function nano-TiO on wool fabric surface2Thin
Film, repeats this deposition cycle 3000 times.
Surface is deposited functional nano-TiO2The wool fabric of thin film puts into the atomic layer deposition apparatus that temperature is 100 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is
20s, then the trimethyl aluminium/n-heptane solution of 2.0M is pumped in reaction cavity with impulse form, the burst length is 0.01s, exposes
Time is 8s, the nitrogen purging being then 99.999% with purity, and purge time is 15s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the wool fabric surface of thin film, repeats this deposition cycle 60 times, obtain final product have concurrently anti-
The automatically cleaning wool fabric of ultraviolet effect.
Embodiment 6
It is 1 that down cloth is pressed bath raio:80 are cleaned by ultrasonic 30min in acetone solvent, 4h are dried under the conditions of 60 DEG C；Again
It is 1 that down cloth is pressed bath raio:50 are cleaned by ultrasonic 30min in deionized water, then 6h are dried under the conditions of 80 DEG C, next
Down cloth after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 120 DEG C, with purity is
99.999% nitrogen purging 3min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to 60
DEG C formed TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is
8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with impulse form
Send into reaction cavity, the burst length is 0.01s, open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, during purging
Between be 15s, define a layer function nano-TiO on down cloth surface2Thin film, repeats this deposition cycle 3500 times.
Surface is deposited functional nano-TiO2The down cloth of thin film puts into the atomic layer deposition apparatus that temperature is 80 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is
15s, then the trimethyl aluminium/n-heptane solution of 2.0M is pumped in reaction cavity with impulse form, the burst length is 0.01s, exposes
Time is 10s, the nitrogen purging being then 99.999% with purity, and purge time is 25s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the down cloth surface of thin film, repeats this deposition cycle 80 times, obtain final product have concurrently anti-
The automatically cleaning down cloth of ultraviolet effect.
Embodiment 7
It is 1 that soybean protein fabric is pressed bath raio:70 are cleaned by ultrasonic 30min in propanol solvent, are dried under the conditions of 60 DEG C
3h；Again soybean protein fabric being pressed bath raio is 1:60 are cleaned by ultrasonic 45min in deionized water, are then dried under the conditions of 80 DEG C
6h, next puts into the soybean protein fabric after processing in the reaction cavity of the atomic layer deposition apparatus that temperature is 180 DEG C, uses
Purity is 99.999% nitrogen purging 8min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, will
Titanium tetraisopropylate is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction chamber
Body, the burst length is 0.2s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 20s；Go
Ionized water is the second presoma, sends into reaction cavity with impulse form, and the burst length is 0.05s, and open-assembly time is 10s, then uses
Purity is 99.999% nitrogen purging, and purge time is 25s, defines a layer function nanometer on soybean protein fabric surface
TiO2Thin film, repeats this deposition cycle 4000 times.
Surface is deposited functional nano-TiO2The soybean protein fabric of thin film puts into the ald that temperature is 120 DEG C
In the reaction cavity of equipment, the nitrogen purging 25min being 99.999% with purity, then deionized water is pumped into impulse form
In reaction cavity, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, purge time
For 20s, then the trimethyl aluminium/n-heptane solution of 1.0M is pumped in reaction cavity with impulse form, the burst length is 0.015s, cruelly
The dew time is 10s, the nitrogen purging being then 99.999% with purity, and purge time is 20s, that is, depositing functional nanometer
TiO2One layer of aluminium base function nano thin film be deposited on the soybean protein fabric surface of thin film, repeat this deposition cycle 60 times, that is,
The automatically cleaning soybean protein fabric of uvioresistant effect must be had concurrently.
Embodiment 8
It is 1 that milk protein fabric is pressed bath raio:60 are cleaned by ultrasonic 30min in ether solvent, are dried under the conditions of 45 DEG C
2h；Again milk protein fabric being pressed bath raio is 1:75 are cleaned by ultrasonic 30min in deionized water, are then dried under the conditions of 80 DEG C
8h, next puts into the milk protein fabric after processing in the reaction cavity of the atomic layer deposition apparatus that temperature is 180 DEG C, uses
Purity is 99.999% nitrogen purging 3min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4Plus
Heat forms TiCl to 80 DEG C4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, exposes
Time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is 15s；Deionized water is the second presoma, with arteries and veins
Form of rushing sends into reaction cavity, and the burst length is 0.08s, and open-assembly time is 10s, then is blown with the nitrogen that purity is 99.999%
Sweep, purge time is 30s, defines a layer function nano-TiO in milk protein fabric face2Thin film, repeats this deposition and follows
Ring 4500 times.
Surface is deposited functional nano-TiO2The milk protein fabric of thin film puts into the ald that temperature is 120 DEG C
In the reaction cavity of equipment, the nitrogen purging 25min being 99.999% with purity, then deionized water is pumped into impulse form
In reaction cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, purge time
For 15s, then the trimethyl aluminium/n-heptane solution of 5.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, cruelly
The dew time is 5s, the nitrogen purging being so 99.999% with purity, and purge time is 10s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the milk protein fabric face of thin film, repeat this deposition cycle 80 times, obtain final product simultaneous
The automatically cleaning milk protein fabric of tool uvioresistant effect.
Embodiment 9
It is 1 that polyester textile is pressed bath raio:50 are cleaned by ultrasonic 30min in propanol solvent, 3h are dried under the conditions of 80 DEG C；Again
It is 1 that polyester textile is pressed bath raio:80 are cleaned by ultrasonic 45min in deionized water, then 6h are dried under the conditions of 100 DEG C, connect down
Polyester textile after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 5min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, by four isopropyls
Alcohol titanium is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction cavity, arteries and veins
Time of rushing is 0.1s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, and purge time is 30s；Deionization
Water is the second presoma, sends into reaction cavity with impulse form, and the burst length is 0.1s, and open-assembly time is 10s, then with purity is
99.999% nitrogen purging, purge time is 25s, defines a layer function nano-TiO on polyester textile surface2Thin film,
Repeat this deposition cycle 5000 times.
Surface is deposited functional nano-TiO2The polyester textile of thin film puts into the atomic layer deposition apparatus that temperature is 100 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is
20s, then the trimethyl aluminium/n-heptane solution of 4.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, exposes
Time is 12s, the nitrogen purging being then 99.999% with purity, and purge time is 20s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the polyester textile surface of thin film, repeats this deposition cycle 100 times, obtain final product have concurrently anti-
The automatically cleaning polyester textile of ultraviolet effect.
Embodiment 10
It is 1 that polyethylene fabric is pressed bath raio:75 are cleaned by ultrasonic 30min in chloroform solvent, 4h are dried under the conditions of 60 DEG C；Again
It is 1 that polyethylene fabric is pressed bath raio:75 are cleaned by ultrasonic 30min in deionized water, then 8h are dried under the conditions of 100 DEG C, connect down
Polyethylene fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 10min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to
80 DEG C of formation TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, open-assembly time
For 8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with pulse form
Formula sends into reaction cavity, and the burst length is 0.01s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, blows
Flyback time is 30s, defines a layer function nano-TiO in polyethylene fabric face2Thin film, repeats this deposition cycle 6000 times.
Surface is deposited functional nano-TiO2The polyethylene fabric of thin film puts into the atomic layer deposition apparatus that temperature is 80 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is
15s, then the trimethyl aluminium/n-heptane solution of 2.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, exposes
Time is 5s, the nitrogen purging being then 99.999% with purity, and purge time is 10s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the polyethylene fabric face of thin film, repeats this deposition cycle 80 times, obtain final product have concurrently anti-
The automatically cleaning polyethylene fabric of ultraviolet effect.
Embodiment 11
It is 1 that Woven glass cloth is pressed bath raio:80 are cleaned by ultrasonic 30min in chloroform solvent, 4h are dried under the conditions of 50 DEG C；Again
It is 1 that Woven glass cloth is pressed bath raio:80 are cleaned by ultrasonic 30min in deionized water, then 8h are dried under the conditions of 100 DEG C, connect down
Woven glass cloth after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 120 DEG C, with purity is
99.999% nitrogen purging 10min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to
80 DEG C of formation TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, open-assembly time
For 8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with pulse form
Formula sends into reaction cavity, and the burst length is 0.01s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, blows
Flyback time is 30s, defines a layer function nano-TiO on Woven glass cloth surface2Thin film, repeats this deposition cycle 6500 times.
Surface is deposited functional nano-TiO2The Woven glass cloth of thin film puts into the atomic layer deposition apparatus that temperature is 80 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is
30s, then the trimethyl aluminium/n-heptane solution of 3.0M is pumped in reaction cavity with impulse form, the burst length is 0.01s, exposes
Time is 8s, the nitrogen purging being then 99.999% with purity, and purge time is 25s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the Woven glass cloth surface of thin film, repeats this deposition cycle 50 times, obtain final product have concurrently anti-
The automatically cleaning Woven glass cloth of ultraviolet effect.
Embodiment 12
It is 1 that polypropylene fabric is pressed bath raio:50 are cleaned by ultrasonic 30min in ether solvent, 3h are dried under the conditions of 80 DEG C；Again
It is 1 that polypropylene fabric is pressed bath raio:80 are cleaned by ultrasonic 45min in deionized water, then 6h are dried under the conditions of 100 DEG C, connect down
Polypropylene fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 5min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, by four isopropyls
Alcohol titanium is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction cavity, arteries and veins
Time of rushing is 0.1s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is 20s；Deionized water
For the second presoma, reaction cavity is sent into impulse form, the burst length is 0.01s, and open-assembly time is 15s, then with purity is
99.999% nitrogen purging, purge time is 20s, defines a layer function nano-TiO on polypropylene fabric surface2Thin film,
Repeat this deposition cycle 7000 times.
Surface is deposited functional nano-TiO2The polypropylene fabric of thin film puts into the atomic layer deposition apparatus that temperature is 100 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is
20s, then the trimethyl aluminium/n-heptane solution of 3.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, exposes
Time is 12s, the nitrogen purging being then 99.999% with purity, and purge time is 20s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the polypropylene fabric surface of thin film, repeats this deposition cycle 100 times, obtain final product have concurrently anti-
The automatically cleaning polypropylene fabric of ultraviolet effect.
Embodiment 13
It is 1 that viscose fabric is pressed bath raio:50 are cleaned by ultrasonic 30min in chloroform solvent, 2h are dried under the conditions of 60 DEG C；Again
It is 1 that viscose fabric is pressed bath raio:50 are cleaned by ultrasonic 30min in deionized water, then 6h are dried under the conditions of 80 DEG C, next
Viscose fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 3min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to 60
DEG C formed TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is
8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with impulse form
Send into reaction cavity, the burst length is 0.01s, open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, during purging
Between be 15s, define a layer function nano-TiO on viscose fabric surface2Thin film, repeats this deposition cycle 7500 times.
Surface is deposited functional nano-TiO2The viscose fabric of thin film puts into the atomic layer deposition apparatus that temperature is 80 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is
15s, then the trimethyl aluminium/n-heptane solution of 1.0M is pumped in reaction cavity with impulse form, the burst length is 0.005s, exposes
Time is 5s, the nitrogen purging being then 99.999% with purity, and purge time is 10s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the viscose fabric surface of thin film, repeats this deposition cycle 40 times, obtain final product have concurrently anti-
The automatically cleaning viscose fabric of ultraviolet effect.
Embodiment 14
It is 1 that acrylic fabric is pressed bath raio:70 are cleaned by ultrasonic 30min in propanol solvent, 3h are dried under the conditions of 60 DEG C；Again
It is 1 that acrylic fabric is pressed bath raio:50 are cleaned by ultrasonic 45min in deionized water, then 10h are dried under the conditions of 80 DEG C, connect down
Acrylic fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity is
99.999% nitrogen purging 5min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, by four isopropyls
Alcohol titanium is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction cavity, arteries and veins
Time of rushing is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 18s；Deionization
Water is the second presoma, sends into reaction cavity with impulse form, and the burst length is 0.02s, and open-assembly time is 10s, then uses purity
Nitrogen purging for 99.999%, purge time is 20s, defines a layer function nano-TiO on acrylic fabric surface2Thin
Film, repeats this deposition cycle 8000 times.
Surface is deposited functional nano-TiO2The acrylic fabric of thin film puts into the atomic layer deposition apparatus that temperature is 100 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.1s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is
20s, then the trimethyl aluminium/n-heptane solution of 5.0M is pumped in reaction cavity with impulse form, the burst length is 0.005s, exposes
Time is 8s, the nitrogen purging being then 99.999% with purity, and purge time is 15s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the acrylic fabric surface of thin film, repeats this deposition cycle 80 times, obtain final product have concurrently anti-
The automatically cleaning acrylic fabric of ultraviolet effect.
Embodiment 15
It is 1 that dacron is pressed bath raio:100 are cleaned by ultrasonic 30min in acetone solvent, 3h are dried at 60 DEG C；To wash again
It is 1 that synthetic fibre fabric presses bath raio:80 are cleaned by ultrasonic 45min in deionized water, then 10h are dried under the conditions of 100 DEG C, next will
Dacron after process is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, is 99.999% with purity
Nitrogen purging 5min, then adopt purity be more than 97% titanium tetraisopropylate be the first presoma, titanium tetraisopropylate is heated
To 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form by titanium tetraisopropylate steam feeding reaction cavity, the burst length is
0.1s, open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 18s；Deionized water is second
Presoma, sends into reaction cavity with impulse form, and the burst length is 0.05s, and open-assembly time is 12s, then with purity is
99.999% nitrogen purging, purge time is 30s, defines a layer function nano-TiO on dacron surface2Thin film,
Repeat this deposition cycle 8500 times.
Surface is deposited functional nano-TiO2The atomic layer deposition apparatus that temperature is 100 DEG C put into by the dacron of thin film
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.2s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, and purge time is
30s, then the trimethyl aluminium/n-heptane solution of 3.0M is pumped in reaction cavity with impulse form, the burst length is 0.005s, exposes
Time is 8s, the nitrogen purging being then 99.999% with purity, and purge time is 15s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the dacron surface of thin film, repeats this deposition cycle 80 times, obtain final product have concurrently anti-
The automatically cleaning dacron of ultraviolet effect.
Embodiment 16
It is 1 that polyvinyl fabric is pressed bath raio:80 are cleaned by ultrasonic 30min in ether solvent, 4h are dried under the conditions of 60 DEG C；Again
By polyvinyl fabric with bath raio for 1:50 are cleaned by ultrasonic 30min in deionized water, then 6h are dried under the conditions of 80 DEG C, next
Polyvinyl fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 200 DEG C, with purity is
99.999% nitrogen purging 3min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to 70
DEG C formed TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is
8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with impulse form
Send into reaction cavity, the burst length is 0.01s, open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, during purging
Between be 25s, define a layer function nano-TiO in polyvinyl fabric face2Thin film, repeats this deposition cycle 9000 times.
Surface is deposited functional nano-TiO2The polyvinyl fabric of thin film puts into the atomic layer deposition apparatus that temperature is 80 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 25min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.05s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, and purge time is
15s, then the trimethyl aluminium/n-heptane solution of 2.0M is pumped in reaction cavity with impulse form, the burst length is 0.01s, exposes
Time is 10s, the nitrogen purging being then 99.999% with purity, and purge time is 35s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the polyvinyl fabric face of thin film, repeats this deposition cycle 40 times, obtain final product have concurrently anti-
The automatically cleaning polyvinyl fabric of ultraviolet effect.
Embodiment 17
It is 1 that spandex fabric is pressed bath raio:80 are cleaned by ultrasonic 30min in ether solvent, 3h are dried under the conditions of 70 DEG C；Again
By spandex fabric with bath raio for 1:50 are cleaned by ultrasonic 30min in deionized water, then 10h are dried under the conditions of 100 DEG C, connect down
Spandex fabric after processing is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 180 DEG C, with purity is
99.999% nitrogen purging 10min, then adopts the TiCl that purity is more than 97%4For the first presoma, by TiCl4It is heated to
70 DEG C of formation TiCl4Steam, and with impulse form by TiCl4Steam sends into reaction cavity, and the burst length is 0.05s, open-assembly time
For 8s, then the nitrogen purging being 99.999% with purity, purge time is 15s；Deionized water is the second presoma, with pulse form
Formula sends into reaction cavity, and the burst length is 0.2s, and open-assembly time is 8s, then the nitrogen purging being 99.999% with purity, purging
Time is 30s, defines a layer function nano-TiO on spandex fabric surface2Thin film, repeats this deposition cycle 9500 times.
Surface is deposited functional nano-TiO2The spandex fabric of thin film puts into the atomic layer deposition apparatus that temperature is 150 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 30min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.2s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is
15s, then the trimethyl aluminium/n-heptane solution of 3.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, exposes
Time is 12s, the nitrogen purging being then 99.999% with purity, and purge time is 20s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the spandex fabric surface of thin film, repeats this deposition cycle 60 times, obtain final product have concurrently anti-
The automatically cleaning spandex fabric of ultraviolet effect.
Embodiment 18
It is 1 that blend fabric is pressed bath raio:100 are cleaned by ultrasonic 30min in chloroform solvent, 3h are dried under the conditions of 80 DEG C；
Again blend fabric being pressed bath raio is 1:80 are cleaned by ultrasonic 45min in deionized water, then 10h are dried under the conditions of 100 DEG C, connect
Get off and put into the blend fabric after processing in the reaction cavity of the atomic layer deposition apparatus that temperature is 150 DEG C, with purity be
99.999% nitrogen purging 10min, then adopts the titanium tetraisopropylate that purity is more than 97% to be the first presoma, by four isopropyls
Alcohol titanium is heated to 80 DEG C of formation titanium tetraisopropylate steams, and with impulse form, titanium tetraisopropylate steam is sent into reaction cavity, arteries and veins
Time of rushing is 0.2s, and open-assembly time is 10s, then the nitrogen purging being 99.999% with purity, and purge time is 20s；Deionization
Water is the second presoma, sends into reaction cavity with impulse form, and the burst length is 0.1s, and open-assembly time is 10s, then with purity is
99.999% nitrogen purging, purge time is 25s, defines a layer function nano-TiO on blend fabric surface2Thin film,
Repeat this deposition cycle 10000 times.
Surface is deposited functional nano-TiO2The blend fabric of thin film puts into the atomic layer deposition apparatus that temperature is 150 DEG C
Reaction cavity in, with purity be 99.999% nitrogen purging 30min, then deionized water is pumped into reaction with impulse form
In cavity, the burst length is 0.2s, and open-assembly time is 15s, then the nitrogen purging being 99.999% with purity, and purge time is
30s, then the trimethyl aluminium/n-heptane solution of 5.0M is pumped in reaction cavity with impulse form, the burst length is 0.02s, exposes
Time is 10s, the nitrogen purging being then 99.999% with purity, and purge time is 30s, that is, depositing functional nano-TiO2
One layer of aluminium base function nano thin film be deposited on the blend fabric surface of thin film, repeats this deposition cycle 100 times, obtain final product have concurrently anti-
The automatically cleaning blend fabric of ultraviolet effect.
Claims (3)
1. a kind of preparation method of the self-cleaning fabrics having uvioresistant effect concurrently it is characterised in that：Described preparation method is pressed following
Step is carried out：
Step A fabric clean process
It is 1 that fabric is pressed bath raio:50-100 is cleaned by ultrasonic 30-60min in organic solvent, then dry under the conditions of 45-80 DEG C
Dry 2-4h；Again dried fabric being pressed bath raio is 1:50-100 is cleaned by ultrasonic 30-60min in deionized water, then in 80-
6-10h is dried under the conditions of 100 DEG C；
Step B fabric face deposits function nano TiO2Thin film
Fabric after processing of step A is put in the reaction cavity of the atomic layer deposition apparatus that temperature is 120-200 DEG C, with pure
Spend the nitrogen purging 3-10min for 99.999%, then adopt the TiCl that purity is more than 97%4Or before titanium tetraisopropylate is first
Drive body, by TiCl4Or titanium tetraisopropylate is heated to 60-80 DEG C of formation TiCl4Or titanium tetraisopropylate steam, and will with impulse form
TiCl4Or titanium tetraisopropylate steam sends into reaction cavity, the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then with pure
Spend the nitrogen purging for 99.999%, purge time is 15-30s；Deionized water is the second presoma, is sent into anti-with impulse form
Answer cavity, the burst length is 0.01-0.1s, open-assembly time is 8-15s, then the nitrogen purging being 99.999% with purity, purging
Time is 15-30s, completes primary depositing circulation, and deposited a layer thickness in fabric face is 0.8-1nmTiO2Thin film, weight
This deposition cycle 10-10000 time again；
Step C titanio fabric face deposits function nano Al2O3Thin film
Surface after processing through step B is deposited functional nano-TiO2The fabric of thin film puts into the atom that temperature is 80-150 DEG C
In the reaction cavity of layer depositing device, the nitrogen purging 25-30min being 99.999% with purity, then by deionized water with arteries and veins
The form of punching pumps in reaction cavity, and the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then is 99.999% with purity
Nitrogen purges, and purge time is 15-30s, next pumps into the trimethyl aluminium/n-heptane solution of 1.0M-5.0M with impulse form
In reaction cavity, the burst length is 0.005-0.02s, and open-assembly time is 5-12s, is then blown with the nitrogen that purity is 99.999%
Sweep, purge time is 10-35s, that is, depositing functional nano-TiO2Deposited a layer thickness on the fabric face of thin film is
0.82-1.2nm aluminium base function nano thin film, after repeating above deposition cycle 1-100 time, obtain final product have concurrently uvioresistant effect from clear
Clean fabric.
2. as claimed in claim 1 a kind of preparation method of the self-cleaning fabrics having uvioresistant effect concurrently it is characterised in that：Institute
It is ethanol or propanol or ether or one of acetone or chloroform with organic solvent.
3. as claimed in claim 1 a kind of preparation method of the self-cleaning fabrics having uvioresistant effect concurrently it is characterised in that：Institute
The fabric stated is bafta, bamboo fabric, linen, silk fabric, wool fabric, down cloth, soybean protein fabric, milk egg
Incandescence thing, polyester textile, polyethylene fabric, Woven glass cloth, polypropylene fabric, viscose fabric, acrylic fabric, dacron, polyvinyl are knitted
Thing, spandex fabric and its blend fabric.
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| CN110055516A (en) * | 2019-01-25 | 2019-07-26 | 南通纺织丝绸产业技术研究院 | The preparation method of schemochrome based on atomic layer deposition and product with schemochrome |
| CN110747449A (en) * | 2019-11-19 | 2020-02-04 | 哈尔滨工业大学 | Preparation method of self-cleaning hydrophobic film layer for electronic screen |
| CN110801807A (en) * | 2019-11-19 | 2020-02-18 | 哈尔滨工业大学 | TiO with self-cleaning property2Preparation method of molecular pollution adsorption material with film-coated zeolite molecular sieve and adsorption device |
| CN111041812A (en) * | 2019-12-27 | 2020-04-21 | 上海纳米技术及应用国家工程研究中心有限公司 | Preparation method of self-cleaning fiber |
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| CN113089310A (en) * | 2021-04-06 | 2021-07-09 | 郭碧叶 | Light anti-ultraviolet fabric and preparation method thereof |
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Application publication date: 20170222 |