CN106400115A - 具有高灵敏横向光感生电压响应的新型薄膜材料及其制备方法 - Google Patents
具有高灵敏横向光感生电压响应的新型薄膜材料及其制备方法 Download PDFInfo
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- CN106400115A CN106400115A CN201610850095.5A CN201610850095A CN106400115A CN 106400115 A CN106400115 A CN 106400115A CN 201610850095 A CN201610850095 A CN 201610850095A CN 106400115 A CN106400115 A CN 106400115A
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- 239000010409 thin film Substances 0.000 title claims abstract description 129
- 239000000463 material Substances 0.000 title claims abstract description 49
- 230000004044 response Effects 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 61
- 239000013078 crystal Substances 0.000 claims abstract description 21
- 229910002427 LaSrAlO4 Inorganic materials 0.000 claims abstract description 9
- 229910052745 lead Inorganic materials 0.000 claims abstract description 6
- 229910002370 SrTiO3 Inorganic materials 0.000 claims abstract description 5
- 238000010894 electron beam technology Methods 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 17
- 239000001301 oxygen Substances 0.000 claims description 17
- 229910052760 oxygen Inorganic materials 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 8
- 229910001882 dioxygen Inorganic materials 0.000 claims description 8
- 230000008859 change Effects 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 6
- 238000005137 deposition process Methods 0.000 claims description 6
- 229910052779 Neodymium Inorganic materials 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000011065 in-situ storage Methods 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 230000003068 static effect Effects 0.000 claims description 5
- 238000000427 thin-film deposition Methods 0.000 claims description 5
- 230000033228 biological regulation Effects 0.000 claims description 4
- 230000006835 compression Effects 0.000 claims description 2
- 238000007906 compression Methods 0.000 claims description 2
- 239000002023 wood Substances 0.000 claims 1
- 229910002244 LaAlO3 Inorganic materials 0.000 abstract description 8
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 239000013077 target material Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 230000003287 optical effect Effects 0.000 description 14
- 238000005259 measurement Methods 0.000 description 8
- 230000005855 radiation Effects 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 239000000306 component Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000007812 deficiency Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004549 pulsed laser deposition Methods 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 238000011896 sensitive detection Methods 0.000 description 2
- 229910002273 La1–xSrxCoO3 Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 210000001367 artery Anatomy 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/08—Epitaxial-layer growth by condensing ionised vapours
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
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CN201610850095.5A CN106400115B (zh) | 2016-09-26 | 2016-09-26 | 具有高灵敏横向光感生电压响应的薄膜材料及其制备方法 |
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CN201610850095.5A CN106400115B (zh) | 2016-09-26 | 2016-09-26 | 具有高灵敏横向光感生电压响应的薄膜材料及其制备方法 |
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CN106400115A true CN106400115A (zh) | 2017-02-15 |
CN106400115B CN106400115B (zh) | 2020-03-31 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108330446A (zh) * | 2018-03-29 | 2018-07-27 | 昆明理工大学 | 一种liv效应可调的镧钙锰氧薄膜制备设备 |
CN108534945A (zh) * | 2018-03-22 | 2018-09-14 | 昆明理工大学 | 一种调制薄膜激光感生电压的方法 |
CN108801473A (zh) * | 2018-03-26 | 2018-11-13 | 昆明理工大学 | 一种热信号探测器元件 |
CN114002483A (zh) * | 2022-01-04 | 2022-02-01 | 苏州大学 | 一种液态原位反应中瞬态光电压测量系统 |
CN114112087A (zh) * | 2021-11-12 | 2022-03-01 | 中国航空工业集团公司沈阳空气动力研究所 | 一种阵列式原子层热电堆热流传感器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63200506A (ja) * | 1987-02-17 | 1988-08-18 | Sumitomo Electric Ind Ltd | 超電導マグネツト |
JPS63259980A (ja) * | 1987-04-17 | 1988-10-27 | Hitachi Ltd | 酸化物超電導体膜 |
CN1923751A (zh) * | 2005-12-19 | 2007-03-07 | 昆明理工大学 | 一种快响应光热辐射感生电压材料及制备方法和应用 |
CN102544347A (zh) * | 2011-10-08 | 2012-07-04 | 昆明理工大学 | 一种快速响应的光热感生电压薄膜材料及用途 |
-
2016
- 2016-09-26 CN CN201610850095.5A patent/CN106400115B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63200506A (ja) * | 1987-02-17 | 1988-08-18 | Sumitomo Electric Ind Ltd | 超電導マグネツト |
JPS63259980A (ja) * | 1987-04-17 | 1988-10-27 | Hitachi Ltd | 酸化物超電導体膜 |
CN1923751A (zh) * | 2005-12-19 | 2007-03-07 | 昆明理工大学 | 一种快响应光热辐射感生电压材料及制备方法和应用 |
CN102544347A (zh) * | 2011-10-08 | 2012-07-04 | 昆明理工大学 | 一种快速响应的光热感生电压薄膜材料及用途 |
Non-Patent Citations (2)
Title |
---|
J F DING ET AL.: ""Spin structure transition in La1.6-xNd0.4SrxCuO4 superconductors"", 《JOURNAL OF PHYSICS: CONDENSED MATTER》 * |
熊飞: ""钙钛矿型氧化物薄膜的激光感生热电电压效应及光探测器应用"", 《中国博士学位论文全文数据库 工程科技I辑》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108534945A (zh) * | 2018-03-22 | 2018-09-14 | 昆明理工大学 | 一种调制薄膜激光感生电压的方法 |
CN108801473A (zh) * | 2018-03-26 | 2018-11-13 | 昆明理工大学 | 一种热信号探测器元件 |
CN108330446A (zh) * | 2018-03-29 | 2018-07-27 | 昆明理工大学 | 一种liv效应可调的镧钙锰氧薄膜制备设备 |
CN114112087A (zh) * | 2021-11-12 | 2022-03-01 | 中国航空工业集团公司沈阳空气动力研究所 | 一种阵列式原子层热电堆热流传感器 |
CN114002483A (zh) * | 2022-01-04 | 2022-02-01 | 苏州大学 | 一种液态原位反应中瞬态光电压测量系统 |
CN114002483B (zh) * | 2022-01-04 | 2022-03-08 | 苏州大学 | 一种液态原位反应中瞬态光电压测量系统 |
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CN106400115B (zh) | 2020-03-31 |
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Address after: 650500 Chenggong Campus, Yunnan University, Chenggong New District, Kunming City, Yunnan Province Applicant after: Yunnan University Applicant after: Kunming University of Science and Technology Address before: 650500 Kunming University of Technology, 727 Jingming South Road, Chenggong District, Kunming City, Yunnan Province Applicant before: Kunming University of Science and Technology Applicant before: Yunnan University |
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Granted publication date: 20200331 |