CN106391409B - Coating device and coating method - Google Patents
Coating device and coating method Download PDFInfo
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- CN106391409B CN106391409B CN201610823227.5A CN201610823227A CN106391409B CN 106391409 B CN106391409 B CN 106391409B CN 201610823227 A CN201610823227 A CN 201610823227A CN 106391409 B CN106391409 B CN 106391409B
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- gap
- support chip
- coating
- film releasing
- piece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/04—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to opposite sides of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
Abstract
The application relates to the technical field of battery production, in particular to a coating device and a coating method. The coating device comprises a coating machine head, a back roller, a sheet placing mechanism and a sheet taking mechanism, wherein the back roller comprises a feeding end and a discharging end along a conveying direction, and a pole piece can enter the feeding end along a feeding track and is far away from the discharging end along a discharging track; the coating machine head can coat the pole pieces between the feeding end and the discharging end, the piece placing mechanism can place the supporting pieces in the gaps before the pole pieces enter the feeding end, and the piece taking mechanism can separate the supporting pieces from the gaps after the pole pieces are sent out of the discharging end. Due to the support of the support sheet, the pressure of the coating machine head relative to the pole piece cannot be changed, so that the uniformity of coating weight is guaranteed, the coating quality is guaranteed, and the yield of the manufactured battery cell is improved.
Description
Technical field
This application involves technical field of battery production more particularly to a kind of apparatus for coating and coating method.
Background technology
Coating is exactly equably, to be continuously or discontinuously coated in slurry on base material (copper foil or aluminium foil), is applied wherein squeezing
Cloth has many advantages, such as that production efficiency is high, at low cost, the accuracy of manufacture is easy to control, is widely used in present production.
Extrusion coated is more sensitive to coating clearance, when needing double dislocation intervals to be coated with, the first face of first interval coating, so
Interval is coated with the second face again afterwards, when being coated with the second face, due to the presence of the first face interstitial site, such as gap digit from the first face
Set be applied to coating position when, the gap between coater head and back flow roll from large to small, coating pressure then change from small to big slowly on
It rises, and then is gradually increasing after causing coating weight that can fall before, then can just tend towards stability, cause coating weight uneven, partially
Separating process range causes the battery core being finally made low appearance, analysis lithium equivalent risk easily occur, reduces product qualification rate.
Invention content
The embodiment of the present application provides a kind of apparatus for coating and coating method, coating weight can be made uniform, raising is made
The yield rate of battery core.
The first aspect of the embodiment of the present application provides a kind of apparatus for coating, including coater head, back flow roll, film releasing mechanism and
Qu Pian mechanisms, the coater head can carry out pole piece gap coating, and the back flow roll includes feeding end along direction of transfer and goes out
Expect that end, pole piece can enter the feeding end along pan feeding track, and along discharging track far from the discharge end;The coater head
Pole piece between the feeding end and the discharge end can be coated, the film releasing mechanism can be in the pole
Piece enters the feeding end and support chip is positioned over gap before, and the Qu Pian mechanisms can send out the discharging in the pole piece
The support chip and the gap are detached from after end.
Preferably, the film releasing mechanism includes film releasing manipulator, and the film releasing manipulator can enter institute in the pole piece
The support chip is positioned over the gap before stating feeding end.
Preferably, the film releasing mechanism further includes film releasing sliding rail, and one end of the film releasing sliding rail extends to the feeding end,
The film releasing manipulator is slidably mounted on the film releasing sliding rail.
Preferably, the film releasing sliding rail includes the first tilting section, and it is close that first tilting section is located at the film releasing sliding rail
One end of the feeding end, and be in a non-zero included angle with the pan feeding track, first tilting section is close to the feeding end
One end is compared with the other end close to the pan feeding track.
Preferably, the Qu Pian mechanisms include taking piece manipulator, described to take piece manipulator that be sent out in the pole piece
The support chip and the gap are detached from after the discharge end.
Preferably, the Qu Pian mechanisms further include taking piece sliding rail, and described one end for taking piece sliding rail extends to the discharge end,
It is described to take piece manipulator to be slidably mounted on described to take piece sliding rail.
Preferably, described that piece sliding rail is taken to include the second tilting section, second tilting section takes piece sliding rail close positioned at described
One end of the discharge end, and be in a non-zero included angle with the discharging track, second tilting section is close to the discharge end
One end is compared with the other end close to the discharging track.
Preferably, the film releasing manipulator and/or it is described to take piece manipulator include vacuum cup, the vacuum cup is used for
Adsorb or discharge the support chip.
Preferably, in perpendicular, the discharge end is located at the top of the feeding end.
Preferably, further include position detecting mechanism, the position detecting mechanism is used to detect the position in the gap.
The second aspect of the embodiment of the present application provides a kind of coating method, and the pole piece that this method is applied includes opposite the
On one side with the second face, the method includes:
S1:Gap coats first face, makes to be formed between each other that there are multiple coating areas in gap on first face;
S2:It is put into support chip in each gap, the gap is filled up;
S3:Coat second face;
S4:The support chip and the gap are detached from.
Preferably, in S2, the method that support chip is put into each gap is specially:By the support
Piece is moved to the top in the gap, and so that the support chip is fallen in the gap by gravity.
Preferably, the top that the support chip is moved to the gap, and the support is made by gravity
Piece is fallen in the gap:
S21:One end of the support chip is put into the gap, and is aligned with the one end in the gap, the support
The other end of piece is maintained at the top in the gap;
S22:The support chip is discharged, the other end of the support chip is made to fall in the gap.
Preferably, the S4 is specially:
The support chip is set to be detached from the gap by gravity.
Preferably, the thickness of the support chip is equal with the thickness of the coating area.
Preferably, it is no more than 200mm along the size in gap described in the direction of transfer.
Technical solution provided by the embodiments of the present application can reach following advantageous effect:
Apparatus for coating provided herein can place support chip in feeding end when being coated with the second face of pole piece
In gap, support chip and gap are detached from discharge end, therefore, when coating is to the second face region opposite with gap, due to
There is the support of support chip, coater head will not change relative to the pressure of pole piece, to ensure the uniformity of coating weight,
Ensure coating quality, improves the yield rate of manufactured battery core.
It should be understood that above general description and following detailed description is merely exemplary, this can not be limited
Application.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of specific embodiment of apparatus for coating provided herein;
Fig. 2 is a kind of partial elevation view of specific embodiment of apparatus for coating provided herein.
Reference numeral:
1- coater heads;
2- back flow rolls;
3- film releasings mechanism;
31- film releasing manipulators;
32- film releasing sliding rails;
4- Qu Pian mechanisms;
41- takes piece manipulator;
42- takes piece sliding rail;
5- material-storing boxs;
6- support chips;
7- position detecting mechanisms;
8- pole pieces;
The first faces 81-;
The second faces 82-.
The drawings herein are incorporated into the specification and forms part of this specification, and shows the implementation for meeting the application
Example, and the principle together with specification for explaining the application.
Specific implementation mode
It is described in further detail below by specific embodiment and in conjunction with attached drawing to the application.It is described in text
"front", "rear", "left", "right", "upper", "lower" are using the placement status in attached drawing as reference.
The embodiment of the present application provides a kind of apparatus for coating, and for coating pole piece 8, the structure of pole piece 8 is as shown in Fig. 2, include
First face 81 and the second face 82.
The structure of coating unit is as shown in Figs. 1-2, including coater head 1, back flow roll 2, film releasing mechanism 3 and Qu Pian mechanisms 4.The back of the body
Roller 2 is usually cylindrical structure, and for transmitting pole piece 8, back flow roll 2 includes feeding end and discharge end along direction of transfer, and pole piece 8 being capable of edge
Pan feeding track enters feeding end, and along discharging track far from discharge end.Wherein, in perpendicular, discharge end can be located at into
Expect the top at end, as shown in Figure 2;In perpendicular, discharge end can also be located at feeding end lower section or feeding end with go out
Material end is respectively positioned on same level.The scheme of the top of feeding end can be located at using discharge end, can prevent support chip 6 from entering
Falling between material end and discharge end.
Coater head 1 can carry out pole piece gap coating, including feed inlet and extruding lip, squeeze lip and be located at back flow roll
2 radial direction, discharging direction is squeezed out towards back flow roll 2, slurry by extruding lip, to the pole between feeding end and discharge end
Piece 8 is coated, usually first to the first face 81 carry out gap coating, make on the first face 81 formed between each other there are the more of gap
A coating area is coated with the second face 82.In order at second face 82 that the coats region opposite with gap, squeeze lip to pole piece 8
Pressure will not mutate, gap place support chip 6, the thickness of support chip 6 is equal with the thickness of coating area, can not also
Deng in the thickness of support chip 6 and the equal thickness of coating area, the quality of coating can be improved.And in order to further avoid applying
The pressure for covering process is steady, support chip 6 along direction of transfer size with gap along the equal sized of direction of transfer, in addition, support chip 6
Size of the gap along direction of transfer is might be less that along the size of direction of transfer.Simultaneously as in second face 82 that coats and gap
When opposite region, extruding jet nozzle squeezes lug, and support chip 6 can be made to be bonded with back flow roll 2, in order to ensure support chip 6 and back flow roll 2
Compactness, and then coating quality is improved, at this point, gap is not more than 200 millimeters along the size of direction of transfer.Certain gap is along transmission
The size in direction may be 100 millimeters, 50 millimeters or other sizes.
Film releasing mechanism 3 enters feeding end for pole piece 8 and support chip 6 is positioned over gap before, in order to improve support chip 6
Placement precision, and ensure coating quality, apparatus for coating further includes position detecting mechanism 7, and position detecting mechanism 7 can be camera shooting
Head, or optical fiber inductive probe, position detecting mechanism 7 are used for the position of detector gap.Position detecting mechanism 7 can be located at
Pole piece 8 does not enter one end of feeding end, can also be converted by tape running speed located immediately at discharge end, be preferably placed at pole
Piece 8 does not enter one end of feeding end, to simplify program.
Specifically, film releasing mechanism 3 may include film releasing manipulator 31 and film releasing sliding rail 32, can also only include film releasing machinery
Hand 31, film releasing manipulator 31 can place support chip 6 or other manner by rotating manner, such as link mechanism mode is put
Set support chip 6.Wherein, film releasing manipulator 31 can either magnetic suction disc or claw place support chip 6 by vacuum cup,
In, in the scheme that film releasing manipulator 31 includes magnetic suction disc, it is that sheet metal or support chip 6 contain to need the support chip coordinated 6
There is metal material, when film releasing manipulator 31 includes vacuum cup, directly support chip 6 is drawn or discharged, can either be avoided
Damage to support chip 6, and can be conveniently operated.Wherein, film releasing manipulator 31 can will prop up before pole piece 8 enters feeding end
Blade 6 is positioned over gap, both can pole piece 8 close to feeding end position place support chip 6, can also apart from feeding end compared with
Place support chip 6 in remote position.By the way that film releasing manipulator 31 is arranged, the placement of support chip 6 can be facilitated.Certain film releasing mechanism 3
Support chip 6 can also be directly placed by link mechanism etc..
When film releasing mechanism 3 includes film releasing sliding rail 32, one end of film releasing sliding rail 32 extends to feeding end, film releasing manipulator 31
It is slidably mounted on film releasing sliding rail 32.Need place support chip 6 when, film releasing manipulator 31 along film releasing sliding rail 32 slide into close to enter
Expect the one end at end, then support chip 6 is positioned over gap by film releasing manipulator 31, and support chip 6, Neng Gouzeng is placed by sliding type
The accuracy and reliability for adding support chip 6 to place.Specifically, film releasing sliding rail 32 includes the first tilting section, and the first tilting section is located at
Film releasing sliding rail 32 close to one end of feeding end, and with pan feeding track be in a non-zero included angle, the first tilting section close to feeding end one
It holds to feeding end and extends, and compared with the other end close to pan feeding track.By increasing by the first tilting section, enable film releasing manipulator 31 to
Direction close to pan feeding track is slided, and particularly, can be arranged by the first tilting section and the angle of pan feeding track, can be made branch
One end of blade 6 is first put into the one end in gap, then places the other end again, places support chip 6 to facilitate, and can alleviate branch
To impact caused by pole piece 8 when blade 6 is all put into gap simultaneously.Certainly, film releasing sliding rail 32 can also only include the first inclination
Either curved section includes either the first tilting section and curved section simultaneously or includes the first tilting section and broken line simultaneously section.It is excellent
It includes the first tilting section to select film releasing sliding rail 32 only, as shown in Figure 1, it is simple in structure, and film releasing manipulator 31 can be prevented to be moved through
In journey with the interference of other components.Further, it is preferable to which axis of first tilting section perpendicular to back flow roll 2, can improve support chip 6
Placement precision.
Support chip 6 and gap can be detached from by Qu Pian mechanisms 4 after pole piece 8 sends out discharge end, specifically, may include
It takes piece manipulator 41 and takes piece sliding rail 42, can also only include taking piece manipulator 41, take piece manipulator 41 can be by rotation side
Formula takes out support chip 6 or other manner, such as link mechanism mode takes out support chip 6.Wherein, take piece manipulator 41 can be with
Including vacuum cup either magnetic suction disc or claw, wherein in the scheme including magnetic suction disc, need the support chip coordinated
6 contain metal material for sheet metal or support chip 6, when it includes vacuum cup to take piece manipulator, directly draw support chip 6
Or release, the damage to support chip 6 can either be avoided, and can be conveniently operated.Wherein, take piece manipulator 41 can be in pole piece
8 send out and are detached from support chip 6 and gap after discharge end, i.e., both can take out support chip close to the position of discharge end in pole piece 8
6, support chip 6 can also taken out apart from discharge end remote position.Piece manipulator 41 is taken by setting, support chip can be facilitated
6 taking-up.Certain Qu Pian mechanisms 4 can also directly take out blade 6 by link mechanism etc..
It when Qu Pian mechanisms 4 include taking piece sliding rail 42, takes piece manipulator 41 to be slidably mounted on and takes piece sliding rail 42, needing to take
When going out support chip 6, takes piece manipulator 41 along taking piece sliding rail 42 to slide into close to one end of discharge end, then take piece manipulator 41 will
Support chip 6 is taken out by gap, and support chip 6 is taken out by sliding type, can increase the accuracy of the taking-up of support chip 6 and reliable
Property.Take piece sliding rail 42 include the second tilting section, the second tilting section be located at takes piece sliding rail 42 close to one end of discharge end, and with discharging
The discharging track at end is in a non-zero included angle, meanwhile, the second tilting section extends close to one end of discharge end to discharge end, and more another
End is close to discharging track.By increasing by the second tilting section, enable that piece manipulator 41 is taken to slide to close to the direction of discharging track,
Particularly, it can be arranged by the second tilting section and the angle of discharging track, can make that piece manipulator 41 is taken more to lean on support chip 6
Closely, and in sliding process discharging track will not be impacted.Certainly, take piece sliding rail 42 can only include the second tilting section or
Person's curved section can also include simultaneously the second tilting section and curved section or broken line, and it includes second preferably to take piece sliding rail 42 only
Tilting section, as shown in Figure 1, simple in structure, and can further prevent taking in 41 motion process of piece manipulator with other components
Interference.Further, it is preferable to which axis of second tilting section perpendicular to back flow roll 2, can conveniently take piece manipulator 41 preferably to take out
Support chip 6.
When apparatus for coating coats pole piece 8, first, gap coats the first face 81, and specifically, pole piece 8 is conveyed by back flow roll 2, applies
Cloth head 1 is coated with the first face 81 positioned at feeding end and discharge end between, makes to be formed that mutual there are gaps on the first face 81
Multiple coating areas.
Then, it is put into support chip 6 in each gap, can be put by film releasing mechanism 3 when gap is sent to feeding end
Support chip 6 is set, support chip 6 can also placed by film releasing mechanism 3 apart from feeding end remote position.Specifically, support chip 6 is put
It is placed in gap, can be realized by gravity, is i.e. support chip 6 is moved to the top in gap by film releasing mechanism 3, and passes through gravity
Effect makes support chip 6 fall to gap;Support chip 6 can also be placed directly in gap, i.e. film releasing mechanism 3 by actuating unit
Directly support chip 6 is transported to gap.It is preferred that support chip 6 is placed by gravity, to prevent film releasing mechanism 3 and pole piece 8
Or back flow roll 2 interferes, and simplify operation.It, can be true by reducing especially when film releasing manipulator 31 includes vacuum cup
The suction of suction disk makes support chip 6 fall to gap.Specifically, first one end of support chip 6 is put into gap, and with gap
One end is aligned, and the other end of support chip 6 is maintained at the top in gap at this time;Then support chip 6 is discharged, the another of support chip 6 is made
It makes a clean sweep of and drops down onto in gap.Wherein support chip 6 is positioned in gap, can fill up gap.
Then, coat the second face 82, i.e., the region opposite with gap in the second face 82 be sent to feeding end and discharge end it
Between when, coater head 1 coats the region.
Finally, after the completion of the region coating that the second face 82 is opposite with gap, after sending out discharge end, by support chip 6 with
Gap is detached from, and support chip 6 can be detached from when being just conveyed out discharge end with gap, can also be conveyed out apart from discharge end
It is detached from gap when remote position.Wherein, support chip 6 can be directly detached from gap by gravity, i.e., defeated in pole piece 8
Downward, support chip 6 is detached from, so since gravity is directly fallen with gap in the gap in the first face 81 when sending out discharge end
Support chip 6 is taken away by Qu Pian mechanisms 4 afterwards, especially in the scheme for taking piece manipulator 41 to include vacuum cup, is fallen in support chip 6
During falling, due to suction, directly it is adsorbed in and takes piece manipulator 41;Support chip 6 can also pass through other engines
Itself and gap are detached from by structure, support chip 6 is clamped or adsorbs as Qu Pian mechanisms 4 are directly moved near gaps.Wherein, lead to
It crosses gravity and takes out support chip 6, can prevent Qu Pian mechanisms 4 from being interfered with pole piece 8 or back flow roll 2, and simplify operation.
This mode is due to when coating is to the second face 82 region opposite with gap, there is the support of support chip 6, coating machine
First 1 will not change relative to the pressure of pole piece 8, to ensure the uniformity of coating weight, ensure coating quality, improve system
At battery core yield rate.
Meanwhile in order to ensure that support chip 6 picks and places the convenience of piece, apparatus for coating can also include storing structure 5, such as storing
Box or storing stand, there are one storing structure 5 can be set, including film releasing manipulator 31 and in taking the scheme of piece manipulator 41,
Film releasing manipulator 31 takes out support chip 6 by storing structure 5, is then placed into gap;It takes piece manipulator 41 to be taken out by gap to support
Storing structure 5 is positioned over after piece 6, in the scheme including taking piece sliding rail 42 and film releasing sliding rail 32, storing structure 5 is located at simultaneously to be taken
Piece sliding rail 42 and the track of film releasing sliding rail 32 take piece sliding rail 42 one end and film releasing sliding rail 32 far from discharge end far from feeding end
One end, to facilitate by taking out or being put into support chip 6 in storing structure 5.It can also be there are two storing structure 5 sets, such as Fig. 1 institutes
Show, one be located at take in the scope of activities of piece manipulator 41, another is located in the scope of activities of film releasing manipulator 31, including
Take piece sliding rail 42 with the scheme of film releasing sliding rail 32, one can take piece machine positioned at the one end of piece sliding rail 42 far from discharge end is taken
The support chip 6 that tool hand 41 takes out is positioned over the storing structure 5;Another can be located at one of film releasing sliding rail 32 far from feeding end
End, film releasing manipulator 31 are positioned over gap by taking out support chip 6 in the storing structure 5.
The foregoing is merely the preferred embodiments of the application, are not intended to limit this application, for the skill of this field
For art personnel, the application can have various modifications and variations.Within the spirit and principles of this application, any made by repair
Change, equivalent replacement, improvement etc., should be included within the protection domain of the application.
Claims (11)
1. a kind of apparatus for coating, including coater head, back flow roll, which is characterized in that further include film releasing mechanism and Qu Pian mechanisms, it is described
Coater head can carry out gap coating to pole piece, and the back flow roll includes feeding end and discharge end along direction of transfer, and pole piece can
Enter the feeding end along pan feeding track, and along discharging track far from the discharge end;The coater head can be to being in
The pole piece stated between feeding end and the discharge end is coated, and the film releasing mechanism can enter described in pole piece entrance
Support chip is positioned over gap before material end, the Qu Pian mechanisms can send out the discharge end in the pole piece later will be described
Support chip is detached from the gap.
2. apparatus for coating according to claim 1, which is characterized in that the film releasing mechanism includes film releasing manipulator, described
The support chip can be positioned over the gap by film releasing manipulator before the pole piece enters the feeding end.
3. apparatus for coating according to claim 2, which is characterized in that the film releasing mechanism further includes film releasing sliding rail, described
One end of film releasing sliding rail extends to the feeding end, and the film releasing manipulator is slidably mounted on the film releasing sliding rail.
4. apparatus for coating according to claim 3, which is characterized in that the film releasing sliding rail includes the first tilting section, described
First tilting section is located at the film releasing sliding rail close to one end of the feeding end, and is in a non-zero included angle with the pan feeding track,
First tilting section is close to one end of the feeding end compared with the other end close to the pan feeding track.
5. according to claim 2-4 any one of them apparatus for coating, which is characterized in that the Qu Pian mechanisms include taking piece mechanical
Hand, it is described to take piece manipulator that be detached from the support chip and the gap after the pole piece sends out the discharge end.
6. apparatus for coating according to claim 5, which is characterized in that the Qu Pian mechanisms further include taking piece sliding rail, described
One end of piece sliding rail is taken to extend to the discharge end, it is described to take piece manipulator to be slidably mounted on described to take piece sliding rail.
7. apparatus for coating according to claim 6, which is characterized in that it is described that piece sliding rail is taken to include the second tilting section, it is described
Second tilting section takes piece sliding rail close to one end of the discharge end described in being located at, and is in a non-zero included angle with the discharging track,
Second tilting section is close to one end of the discharge end compared with the other end close to the discharging track.
8. apparatus for coating according to claim 5, which is characterized in that the film releasing manipulator and/or described take piece mechanical
Hand includes vacuum cup, and the vacuum cup is for adsorbing or discharging the support chip.
9. a kind of coating method, the pole piece that this method is applied includes opposite the first face and the second face, which is characterized in that described
Method includes:
S1:Gap coats first face, makes to be formed between each other that there are multiple coating areas in gap on first face;
S2:It is put into support chip in each gap, the gap is filled up;
S3:Coat second face;
S4:The support chip and the gap are detached from.
10. coating method according to claim 9, which is characterized in that described to be put in each gap in S2
The method for entering support chip is specially:The support chip is moved to the top in the gap, and the branch is made by gravity
Blade is fallen in the gap.
11. coating method according to claim 10, which is characterized in that described that the support chip is moved to the gap
Top, and so that the support chip is fallen in the gap by gravity and include:
S21:One end of the support chip is put into the gap, and is aligned with the one end in the gap, the support chip
The other end is maintained at the top in the gap;
S22:The support chip is discharged, the other end of the support chip is made to fall in the gap.
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CN201610823227.5A CN106391409B (en) | 2016-09-14 | 2016-09-14 | Coating device and coating method |
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CN201610823227.5A CN106391409B (en) | 2016-09-14 | 2016-09-14 | Coating device and coating method |
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CN106391409B true CN106391409B (en) | 2018-08-21 |
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KR100763090B1 (en) * | 2004-02-20 | 2007-10-04 | 마쯔시다덴기산교 가부시키가이샤 | Method for producing lithium ion secondary battery |
CN200974057Y (en) * | 2006-11-29 | 2007-11-14 | 比亚迪股份有限公司 | Coating machine head structure of lithium ion storage battery pole piece |
CN101623684A (en) * | 2008-07-07 | 2010-01-13 | 中信国安盟固利新能源科技有限公司 | Method for coating film for lithium ion battery pole piece and film coating equipment |
CN101985118A (en) * | 2010-08-23 | 2011-03-16 | 八叶(厦门)新能源科技有限公司 | Method for intermittently coating battery pole piece |
CN201855780U (en) * | 2010-10-28 | 2011-06-08 | 深圳市赢合科技有限公司 | Pole piece coating device and pole piece coating system |
CN102039255A (en) * | 2011-01-28 | 2011-05-04 | 福建南平南孚电池有限公司 | Coating device and method for forming pole piece of lithium battery |
CN203108719U (en) * | 2012-12-26 | 2013-08-07 | 宁德新能源科技有限公司 | Transfer coating device for lithium ion battery |
CN203620875U (en) * | 2013-12-08 | 2014-06-04 | 四川一美能源科技有限公司 | Bipolar-slice extrusion coating device |
CN205436215U (en) * | 2016-03-22 | 2016-08-10 | 南京国轩电池有限公司 | Unusual automatic device of retreating of die head of response battery level piece coating |
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Effective date of registration: 20181123 Address after: Room 416, Building C, 218 Hongkou Road, Kunlun Street, Liyang City, Changzhou City, Jiangsu Province (in Zhongguancun Science and Technology Industrial Park, Jiangsu Province) Patentee after: CONTEMPORARY AMPEREX TECHNOLOGY Ltd. (JIANGSU) Address before: 352100 Xingang Road, Zhangwan Town, Jiaocheng District, Ningde, Fujian 1 Patentee before: Contemporary Amperex Technology Co.,Ltd. |