CN106385791A - High electromagnetic shielding light window of graphene mesh and double-layer metal mesh composite laminating structure - Google Patents

High electromagnetic shielding light window of graphene mesh and double-layer metal mesh composite laminating structure Download PDF

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CN106385791A
CN106385791A CN201510449180.6A CN201510449180A CN106385791A CN 106385791 A CN106385791 A CN 106385791A CN 201510449180 A CN201510449180 A CN 201510449180A CN 106385791 A CN106385791 A CN 106385791A
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graphene
transparent
mesh
grid
double
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CN106385791B (en
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陆振刚
谭久彬
王赫岩
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Harbin Institute of Technology
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Harbin Institute of Technology
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Abstract

A electromagnetic shielding light window of a graphene mesh and double-layer metal mesh composite laminating structure belongs to the optical transparent-component electromagnetic shielding technology field. By using the electromagnetic shielding light window, a characteristic that a graphene mesh film expresses different light transmission and microwave shielding characteristics when possessing different mesh unit trepanning area ratios is used to organically combine a low reflection and partial absorbed microwave characteristic of a graphene mesh film and a high electromagnetic reflection characteristic of a high-light-transmission double-layer metal mesh so as to form a multilayer structure. The double-layer metal mesh is taken as a transparent reflecting layer and N graphene mesh films which are separated by a transparent medium are taken as transparent absorption layers. By using the structure, a radio frequency can radiate several times, pass through an absorption layer and is highly absorbed so that high shielding and low reflection characteristics are realized. Visible light penetrates the laminating structure for one time and high light transmittance is possessed. The graphene mesh films have periodical trepanning structures so that light transmittance performance is increased. In an existing transparent electromagnetic shielding method, high light transmission, low electromagnetic reflection and high electromagnetic shielding can not be realized simultaneously. By using the electromagnetic shielding light window, the above problem is solved.

Description

Graphene grid Forceful electric power magnetic shield optical window with double-level-metal grid composite/laminate structure
Technical field
The invention belongs to optical clear part electromagnetic shielding field, particularly to the forceful electric power magnetic shield optical window of a kind of Graphene grid and double-level-metal grid composite/laminate structure.
Background technology
With the development of broadcast, TV, wireless communication technique and microwave technology, radio-frequency apparatus are equipped in a large number in each place of mankind's activity, and the continuous broadening of spectral range, and intensity is multiplied, and this not only interferes to electronic equipment, also health are produced and threaten.This invisible impalpable " electromagnetic pollution " directly acts on machine or human body, is to endanger serious " stealthy killer ", it has also become the fifth-largest pollution after atmospheric pollution, water pollution, noxious waste pollution and sound pollution.Electromagnetic shielding(Including absorption and reflection)It is the major measure of preventing and treating electromagnetic pollution, in recent years, electromangnetic spectrum gets more and more people's extensive concerning.The electromagnetic shielding wherein needing visual observation occasion is transparency electromagnetic wave shield, it is all difficult point and focus, Medical electromagnetic isolation room observation window, communication apparatus transparency electromagnetic wave shield element, Aero-Space equipment optical window, advanced optical instrument optical window, secured facilities anti-electromagnetic exposure optical window, LCDs, mobile phone touch, vehicle-mounted transparent antenna etc. are covered in its application all the time.
At present, realizing the difficult point of transparency electromagnetic wave shield, to essentially consist in traditional absorbing material mostly opaque or transparent very poor, and conditioned each other it is difficult to realize high transparent and forceful electric power magnetic shield simultaneously based on the transparency and conductive shield ability in the reflective transparent shield technology of transparent conductive material or device.Additionally, between ELECTROMAGNETIC RADIATION REFLECTION is made the return trip empty by conducting reflective Transparent shielding technology, causing " secondary pollution " to spatial environmentss, being unfavorable for the thorough preventing and treating of electromagnetic pollution.
Transparent metal oxide film based on tin indium oxide, visible transparent applications extensively, but its transmission region narrower although micro-wave screening wave band is wider, but screening ability is not strong.Nano-silver conductive network thin-film can realize 90% about light transmittance, but has inevitable contact resistance between nano-silver thread, and especially in high printing opacity, nano-silver thread carefully makes its sheet resistance higher with sparse very, and then reduces shield effectiveness.Bandpass-type frequency-selective surfaces adopt periodicity resonant element structure, can interference microwave beyond high reflection working band, but its light transmission is poor and is difficult to realize wide euphotic zone.Accordingly, above-mentioned each technical scheme all can not meet the requirement to high printing opacity and strong micro-wave screening ability for the electromagnetic shielding optical window simultaneously.
Comparatively speaking, there is millimeter to the metallic mesh in submillimeter cycle, because its period ratio interference electromagnetic wavelength is much smaller, and be much larger than optical wavelength, can be it is ensured that the light transmittance of higher visible ray and infrared band while realizing low frequency broadband electromagnetic shielding.Therefore, millimeter, the metallic mesh in submillimeter cycle, with its good electrically conducting transparent performance, are widely used in optical window electromangnetic spectrum field:
1. patent 200810063988.0 " a kind of electromagnetic shielding optical window with double-layer pane metallic mesh structure " describe a kind of the electromagnetic shielding optical window that optical window or transparent substrates both sides are constituted is placed in parallel in by structural parameters identical grid metallic mesh or metal gauze, electromagnetic shielding efficiency is greatly improved.
2. patent 200810063987.6 " a kind of electromagnetic shielding optical window with double-layer circular ring metallic mesh structure " describe a kind of the electromagnetic shielding optical window that optical window both sides are constituted is loaded on by two-layer annulus metallic mesh, solve the problems, such as that high transmission rate and forceful electric power magnetic shield efficiency can not be taken into account simultaneously.
3. patent 201410051497.X " having the multicycle principal and subordinate nesting circle ring array electromagnetic shielding optical window of donut " describes a kind of nested metallic mesh structure of multicycle donut for realizing optical window electro-magnetic screen function, this structure makes the veiling glare that Advanced Diffraction causes obtain certain homogenizing, reduces the impact to optical window image quality for the grid.
4. patent 201410051496. 5 " the electromagnetic shielding optical window of double-layer staggered multicycle metal ring nested array " describes a kind of electromagnetic shielding optical window being made up of the staggered metallic mesh of two-layer, significantly reduce the inhomogeneities of grid diffraction intensity distribution, reduce the impact to imaging.
Patent 200810063988.0 and patent 200810063987.6 are all placed in parallel in optical window transparent substrate using double-level-metal grid or the both sides of substrate are constituted, double layer of metal grid has identical unit profile and structural parameters, by optimizing the spacing of two-layer grid, improve electromagnetic shielding efficiency.Patent 201410051497.X proposes a kind of grid structure with multicycle donut principal and subordinate nesting circle ring array it is achieved that depth homogenizing to senior diffraction, reduces the impact to image quality.Patent 201410051496. 5 selections passing through double-deck grid alternate angle, make veiling glare be more evenly distributed, and image quality are affected less.Above-mentioned each patent, using metallic mesh(Or metal gauze)Core devices as micro-wave screening, preferable effectiveness and light transmission can be realized, but as a kind of reflective electromagnetic shielding material, the radiofrequency signal of reflection can cause " secondary pollution " metal to spatial environmentss, is unfavorable for the thorough preventing and treating of electromagnetic pollution.
In a lot of fields of modern technologies, material with carbon element all plays very important role, and in numerous allotropes of carbon, Graphene is the very typical material of one kind, and Graphene is with sp by carbon atom2Hybrid orbital forms the flat film that hexangle type is in honeycomb lattice, it is the two-dimensional material of only one of which carbon atom thickness, there is many-sided excellent property, one of prominent property is that have excellent transparent conductivity, also there is certain microwave absorbing property, this makes Graphene have very high using value in transparency electromagnetic wave shield field:
5. United States Patent (USP) US20130068521 " Electromagnetic shielding method using graphene and Electromagnetic shiedling material " is loaded on metallic plate, is realized electromagnetic shielding on polymer substrate using Graphene prepared by chemical vapour deposition technique (CVD); compared with the metallic plate not loading Graphene, polymer substrate; after loading Graphene, integrally-built electromagnetic shielding efficiency increases.
6. patent 201310232829. X " for shielding the structures and methods based on Graphene of electromagnetic radiation " describes a kind of electromagnetic armouring structure being more than 1 megahertz of electromagnetic radiation for screening frequencies, this structure is made up of one or more layers Graphene, and at least one of which Graphene is doped with dopant.
7. patent 201420099425.8 " a kind of transparency electromagnetic wave shield film based on graphene film " describes a kind of transparency electromagnetic wave shield film of nano-silver thread of arranging between transparent substrates and graphene film, nano-silver thread plays electric charge bridge beam action, increase the electric conductivity of whole electromagnetic shielding film, improve shield effectiveness.
8. the James of Rice Univ USA (Rice University) M. the metallic mesh that Tour et al. is 5 μm with photoetching process prepares line bar width, and single-layer graphene is shifted on its surface, it is made for Graphene metallic mesh mixed conductor membranes(James M. Tour etc., " Rational Design of Hybrid Graphene Films for High-Performance Transparent Electrodes”. ACS Nano, 2011,5 (8):6472~6479), this mixed conductor membranes can achieve 90% light transmittance and the sheet resistance of 20 Ω/sq.
9. the Seul Ki of Korea Advanced Institute of Science and Technology (KAIST) The shield effectiveness that Hong et al. reports single-layer graphene is 2.27dB(Hong S K etc., " Electromagnetic interference shielding effectiveness of monolayer graphene”. Nanotechnology, 2012, 23(45):455704), wherein absorption loss and reflection loss respectively -4.38dB and -13.66dB.
10. the Kim S of Korea S Cheng Jun shop university (Sungkyunkwan University) and Samsung Motor Corporation of Korea S (Samsung Electro-Mechanics Myeong-Gi Kim) et al. adopts Graphene (PEI/RGO) stepped construction of Polyetherimide/oxidation-reduction method preparation to realize electromagnetic shielding(Kim S etc., " Electromagnetic Interference (EMI) Transparent Shielding of Reduced Graphene Oxide (RGO) Interleaved Structure Fabricated by Electrophoretic Deposition”. ACS applied materials & interfaces, 2014, 6(20):17647-17653), the electromagnetic shielding efficiency of double-deck PEI/ RGO and monolayer PEI/ RGO stepped construction is respectively 6.37 and 3.09dB, and absorption loss accounts for the ratio respectively 96% and 92% of total electromagnetic shielding efficiency.
Han Jiecai of 11. Harbin Institute of Technology et al. makees sacrifice layer with copper mesh grid, is prepared for graphite alkene grid (Han J etc., " Infrared-transparent with chemical vapor deposition (CVD) films based on conductive graphene network fabrics for electromagnetic shielding”. Carbon, 2015, 87:206-214) reach the shield effectiveness of 12.86dB respectively in the infrared light transmission rate realizing 70.85% simultaneously, and realize while 87.85% infrared light transmission rate, reaching the shield effectiveness of 4dB.And this Graphene grid electromagnetic shielding is also to be absorbed as dominating.
Graphene is used for electromagnetic shielding by above-mentioned each scheme, it is possible to achieve certain effectiveness.United States Patent (USP) US20130068521 adopts Graphene as the core devices of electromagnetic screen, and large-area for full wafer Graphene is transferred to by the substrate such as metal, polymer by the Graphene transfer method of roll-to-roll, achieve excellent effectiveness, but this electromagnetic shielding device does not have the transparency.Patent 201310232829. X " for shielding the structures and methods based on Graphene of electromagnetic radiation " is using graphene film as the main body of electromagnetic armouring structure, and wherein at least one layer graphene thin film is doped to improve electromagnetic shielding efficiency, but doping can affect integrally-built light transmittance.Patent 201420099425.8 " a kind of transparency electromagnetic wave shield film based on graphene film " utilizes nano-silver thread to improve the electrical conductivity of graphene film, increase the raising that reflection loss realizes electromagnetic shielding efficiency, but the main contributions of electromagnetic shielding are produced by reflection.In above-mentioned document 8, graphene film is loaded on formation Graphene and grid on metallic mesh and fit tightly structure, this arrangement enhances the electric conductivity of metallic mesh, light transmittance reaches 91%, but the electromagnetic shielding of this structure is based on reflecting simultaneously.In above-mentioned document 9, result of study shows, although the shield effectiveness of Graphene increases with the number of plies and is significantly increased, absorption loss increases seldom, and often increases by a layer graphene, transmission loss 2.3% is so that this structure is difficult to realize high printing opacity, low reflection and forceful electric power magnetic shield simultaneously.The graphene film (RGO) adopting oxidation-reduction method preparation in above-mentioned document 10 realizes electromagnetic shielding with Polyetherimide (PEI) stepped construction, and shield based on absorption loss, but the shield effectiveness of double-deck PEI/RGO structure is only 6.37dB, and light transmittance is only 62% it is difficult to realize forceful electric power magnetic shield and high printing opacity simultaneously., only with Graphene grid structure, shield effectiveness is low for above-mentioned document 11, and strong shield effectiveness and high transmission rate can not get both.
In a word, in existing electromangnetic spectrum, the method based on reflection-type electromagnetic shielding easily causes secondary electromagnetic pollution;And there is the electromagnetic shielding method of absorption loss, or it is not high to there is light transmittance, or electromagnetic shielding efficiency strong it is difficult to realize high transparent and forceful electric power magnetic shield simultaneously.
Content of the invention
It is an object of the invention to overcoming the shortcomings of above-mentioned existing transparency electromagnetic wave shield technology, mutually restrict especially for the transparency and conductive shield ability in existing reflective transparent shield technology, it is difficult to take into account high transmission rate and strong micro-wave screening efficiency, and reflected electromagnetic signal causes the problem of electromagnetic exposure and secondary pollution, research and develop the forceful electric power magnetic shield optical window of a kind of Graphene grid and double-level-metal grid composite/laminate structure, reach the purpose being provided simultaneously with forceful electric power magnetic shield, high printing opacity and low ELECTROMAGNETIC REFLECTION performance.
The object of the present invention is achieved like this:The forceful electric power magnetic shield optical window of Graphene grid and double-level-metal grid composite/laminate structure, described electromagnetic shielding optical window is made up of the transparent absorbent layer of overlap and configured in parallel successively, transparent medium A, metallic mesh A, transparent medium B and metallic mesh B assembling;The Graphene grid thin film that described transparent absorbent layer is separated by transparent medium by N shell is constituted, and the metallic mesh A and metallic mesh B of the configuration that is parallel to each other constitute transparent reflecting layer.
The good result that the present invention produces focuses primarily upon realization and is provided simultaneously with forceful electric power magnetic shield, high printing opacity and low ELECTROMAGNETIC REFLECTION performance, specific as follows:
First, using Graphene grid thin film, there are the different printing opacities showing during different mesh cells perforated area ratios and micro-wave screening characteristic, realize the electromagnetic shielding based on high printing opacity and absorption;When the mesh cells perforated area of Graphene grid thin film is than t value between 0.05 and 0.7, good printing opacity and shielding propertiess can be realized by the number of plies adjusting Graphene grid thin film.When the mesh cells perforated area of Graphene grid thin film meets 0.3≤t≤0.7 than t, realize improve shielding propertiess with the light transmittance of single-layer graphene film analogy using multi-layer graphene grid thin film simultaneously;When the mesh cells perforated area of Graphene grid thin film meets 0.05≤t than t<When 0.3, realize improve light transmittance with the micro-wave screening performance of single-layer graphene film analogy using single-layer graphene grid thin film simultaneously;Meanwhile, the micro-wave screening performance of Graphene grid thin film is mainly based on microwave absorption.
Secondly, using the Microwave Absorption Properties of Graphene grid thin film and the Microwave reflection characteristics of transparent conductive film, the two is organically combined, using double-level-metal grid as transparent reflecting layer, compared with single-layer metal grid, on the premise of light transmission keeps constant, micro-wave screening efficiency and reflectance significantly improve, and can preferably realize the forceful electric power magnetic shield to radio-frequency radiation and reflection;The Graphene grid membrane structure being separated by transparent medium with N shell, as transparent absorbent layer, can make radio-frequency radiation partially absorb and be passed through in the form of low reflection;After transparent reflection is placed on transparent absorbent layer, both ensure to realize forceful electric power magnetic shield, make to return absorbed layer through the microwave strong reflection of transparent absorbent layer again, so that radio-frequency radiation is partially absorbed and passed through in the form of low reflection, finally realize the forceful electric power magnetic shield of low reflection;The stepped construction of the present invention, on the one hand due to the presence of absorbed layer, solve the problems, such as that the shielding based on reflection during only transparent conductive film easily causes secondary pollution, on the other hand after due to the presence in reflecting layer and being placed in absorbed layer, make shield microwaves through reflection and multiple absorption, when solving the problems, such as to only exist Graphene grid film absorption layer, shield effectiveness is not high;Meanwhile, for light wave, only transmit transparent absorbent layer and transparent reflecting layer once, its occur loss less, and when Graphene grid thin film mesh cells perforated area than t value between 0.05 and 0.7, because Graphene grid thin film has periodic open-celled structure, improve its light transmission, can achieve high light transmission features, and when the grid structure that double-level-metal grid is evenly distributed using diffraction veiling glare, the impact to image quality for the whole stepped construction is very low.
To sum up, the present invention can realize being provided simultaneously with the most prominent effect that forceful electric power magnetic shield, high printing opacity and low ELECTROMAGNETIC REFLECTION performance are the present invention.
Brief description
Fig. 1 is the generalized section of the forceful electric power magnetic shield optical window of Graphene grid and double-level-metal grid composite/laminate structure.
Fig. 2 is the grid unit arrangement mode structural representation of circular hole Graphene grid.
Fig. 3 is the grid unit arrangement mode structural representation of grid metallic mesh.
Fig. 4 is the grid unit arrangement mode structural representation of grid metallic mesh.
Fig. 5 is the grid unit arrangement mode structural representation of annulus metallic mesh.
Fig. 6 is the grid unit arrangement mode structural representation of multicycle micro-loop metallic mesh.
Fig. 7 is the generalized section of the forceful electric power magnetic shield optical window of Graphene grid described in embodiment and double-level-metal grid composite/laminate structure.
Fig. 8 is the structural representation of the forceful electric power magnetic shield optical window of Graphene grid described in embodiment and double-level-metal grid composite/laminate structure.
In figure piece number explanation:1. protective layer A 2. anti-reflection film A 3. transparent absorbent layer 4. transparent medium A 5. metallic mesh A 6. transparent medium B 7. metallic mesh B 8 anti-reflection film B 9. protective layer B 10. square hole Graphene grid thin film A 11. transparent medium C 12. square hole Graphene grid thin film B.
Specific embodiment
Below in conjunction with the accompanying drawings embodiment of the present invention is described in detail:
Described electromagnetic shielding optical window is made up of the transparent absorbent layer (3) of overlap and configured in parallel successively, transparent medium A (4), metallic mesh A (5), transparent medium B (6) and metallic mesh B (7) assembling;The Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, and the metallic mesh A (5) and metallic mesh B (7) of the configuration that is parallel to each other constitute transparent reflecting layer;The Graphene grid thin film of described composition transparent absorbent layer (3) is made up of the graphene film with mesh array structure;Described mesh array structure refers to the two-dimensional array structure of mesh cells periodic arrangement;Described mesh cells have square hole or circular hole profile;To millimeter magnitude, mesh cells array period is micron to millimeter magnitude to mesh cells a size of submicron;Mesh cells perforated area value between 0.05 and 0.7 than t;Described mesh cells perforated area ratio refers in an array period, the ratio of mesh cells perforated area and array period cellar area.
The protective layer A (1) of the anti-reflection film A (2) of configured in parallel single or multiple lift and single or multiple lift successively on transparent absorbent layer (3) lateral part;The protective layer B (9) of the anti-reflection film B (8) of configured in parallel single or multiple lift and single or multiple lift successively on metallic mesh B (7) lateral part.
When the mesh cells perforated area of Graphene grid thin film meets 0.3≤t≤0.7 than t, the Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, wherein N≤6 × { [1/ (1-t)]+1 }, [1/ (1-t)] represents the maximum positive integer less than 1/ (1-t).
When the mesh cells perforated area of Graphene grid thin film meets 0.05≤t than t<When 0.3, the Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, wherein N≤6.
The two-dimension plane structure that described metallic mesh A, B (5,7) presses periodic arrangement by grid unit is constituted, the cycle of grid unit is submillimeter to millimeter magnitude, metal wire width is submicron to micron dimension, the connection metal being overlapped by metal wire between adjacent grid unit or connecting two metal line bars in the setting of overlapping place.
Spacing between described metallic mesh A (5) and metallic mesh B (7) is millimeter magnitude, described be smaller than shielding minimum wavelength 0.25 times.
The number of plies constituting the Graphene grid thin film of transparent absorbent layer (3) is monolayer, double-deck or three layers, and the Graphene grid thin layer number that each layer is separated by transparent medium can be identical or different.
Metallic mesh A, B (5,7) are made by the good alloy material of electric conductivity, and alloy thickness is more than 100nm.
The transparent reflecting layer light transmittance being made up of metallic mesh A, B (5,7) is more than 90%.
The transparent medium making material of described transparent medium A, B (4,6) and separation transparent absorbent layer (3) Graphene grid thin film includes simple glass, quartz glass, infra-red material and transparent resin material.
The forceful electric power magnetic shield optical window of the Graphene grid of the present invention and double-level-metal grid composite/laminate structure, the spacing of double-level-metal grid A5 and B7 is in millimeter magnitude, with respect to single-layer metal grid structure it is ensured that in the case that light transmittance is constant, significantly improving the micro-wave screening effect of electromagnetic shielding optical window.
Embodiment
Electromagnetic shielding optical window is made up of the transparent absorbent layer 3 of overlap and configured in parallel successively, transparent medium A4, metallic mesh A5, transparent medium B6 and metallic mesh B7 assembling;Described transparent absorbent layer 3 is made up of Graphene grid thin film A10, the transparent medium C11 of monolayer of configured in parallel successively and the Graphene grid thin film B12 of monolayer, and the metallic mesh A5 and metallic mesh B7 of the configuration that is parallel to each other constitute transparent reflecting layer.
The solution have the advantages that:When the shield effectiveness of double-level-metal grid is 29.8dB, the electromagnetic shielding efficiency of the present invention is 34.12dB, and absorption loss accounts for the 58.5% of total shielding energy it is achieved that forceful electric power magnetic shield based on absorbing, and light transmittance is 90.4%, still has high light transmission features.Using single-layer metal grid as transparent reflecting layer, electromagnetic shielding efficiency is 24dB, and absorption loss accounts for the 56% of total shielding energy, and light transmittance is 90.4%.The simulation result using single-layer metal grid as transparent reflecting layer for the contrast, in the case that light transmittance keeps constant, micro-wave screening performance significantly improves the forceful electric power magnetic shield optical window of the Graphene grid of the present invention and double-level-metal grid composite/laminate structure.
The also corresponding in addition several embodiments of the present invention, change the shape of grid unit of double-level-metal grid and structural parameters in Fig. 7, and the arrangement mode of grid unit, and keep original each layer arrangement mode constant, finally also can obtain similar effects;On the basis of the transparent absorbent layer that the single-layer graphene grid thin film being separated by two-layer in the figure 7 forms, increase or decrease the quantity of the monolayer grid thin film being separated by transparent medium, the increase of absorption loss or the raising of light transmittance will be led to, can adjust accordingly according to actual needs.

Claims (10)

1. Graphene grid and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:Described electromagnetic shielding optical window is made up of the transparent absorbent layer (3) of overlap and configured in parallel successively, transparent medium A (4), metallic mesh A (5), transparent medium B (6) and metallic mesh B (7) assembling;The Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, and the metallic mesh A (5) and metallic mesh B (7) of the configuration that is parallel to each other constitute transparent reflecting layer;The Graphene grid thin film of described composition transparent absorbent layer (3) is made up of the graphene film with mesh array structure;Described mesh array structure refers to the two-dimensional array structure of mesh cells periodic arrangement;Described mesh cells have square hole or circular hole profile;To millimeter magnitude, mesh cells array period is micron to millimeter magnitude to mesh cells a size of submicron;Mesh cells perforated area value between 0.05 and 0.7 than t; Described mesh cells perforated area ratio refers in an array period, the ratio of mesh cells perforated area and array period cellar area.
2. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:The protective layer A (1) of the anti-reflection film A (2) of configured in parallel single or multiple lift and single or multiple lift successively on transparent absorbent layer (3) lateral part;The protective layer B (9) of the anti-reflection film B (8) of configured in parallel single or multiple lift and single or multiple lift successively on metallic mesh B (7) lateral part.
3. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:When the mesh cells perforated area of Graphene grid thin film meets 0.3≤t≤0.7 than t, the Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, wherein N≤6 × { [1/ (1-t)]+1 }, [1/ (1-t)] represents the maximum positive integer less than 1/ (1-t).
4. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:When the mesh cells perforated area of Graphene grid thin film meets 0.05≤t than t<When 0.3, the Graphene grid thin film that described transparent absorbent layer (3) is separated by transparent medium by N shell is constituted, wherein N≤6.
5. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:The two-dimension plane structure that described metallic mesh A, B (5,7) presses periodic arrangement by grid unit is constituted, the cycle of grid unit is submillimeter to millimeter magnitude, metal wire width is submicron to micron dimension, the connection metal being overlapped by metal wire between adjacent grid unit or connecting two metal line bars in the setting of overlapping place.
6. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:Spacing between described metallic mesh A (5) and metallic mesh B (7) is millimeter magnitude, described be smaller than shielding minimum wavelength 0.25 times.
7. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:The number of plies constituting the Graphene grid thin film of transparent absorbent layer (3) is monolayer, double-deck or three layers, and the Graphene grid thin layer number that each layer is separated by transparent medium can be identical or different.
8. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:Metallic mesh A, B (5,7) are made by the good alloy material of electric conductivity, and alloy thickness is more than 100nm.
9. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:The transparent reflecting layer light transmittance being made up of metallic mesh A, B (5,7) is more than 90%.
10. Graphene grid according to claim 1 and double-level-metal grid composite/laminate structure forceful electric power magnetic shield optical window it is characterised in that:The transparent medium making material of described transparent medium A, B (4,6) and separation transparent absorbent layer (3) Graphene grid thin film includes simple glass, quartz glass, infra-red material and transparent resin material.
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CN118400986A (en) * 2024-07-01 2024-07-26 武汉理工大学三亚科教创新园 Graphene assembled film metamaterial, and preparation method and application thereof

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