CN106383396A - Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image - Google Patents
Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image Download PDFInfo
- Publication number
- CN106383396A CN106383396A CN201610985236.4A CN201610985236A CN106383396A CN 106383396 A CN106383396 A CN 106383396A CN 201610985236 A CN201610985236 A CN 201610985236A CN 106383396 A CN106383396 A CN 106383396A
- Authority
- CN
- China
- Prior art keywords
- mirror
- micrometer
- centering
- beam splitter
- splitter prism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention provides a micrometer-grade photoelectric centering method and a micrometer-grade photoelectric centering device based on a surface reflection image. The micrometer-grade photoelectric centering method comprises the steps of firstly dividing one laser beam into a reflected light beam and a transmitted light beam through a beam splitter prism; realizing collimation and reflection of the reflected light beam, and imaging after returning in an original path, realizing focusing on the curvature center on the surface of a to-be-detected objective lens after collimation of the transmitted light beam, after surface reflection of the to-be-detected objective lens, returning along the original path, and reflecting by the beam splitter prism, thereby realizing imaging; acquiring the mass center of an image-surface light beam by means of a sub-pixel technique, and obtaining eccentricity on the surface of a to-be-detected component according to the coordinate of a mass center point. The micrometer-grade photoelectric centering method and the micrometer-grade photoelectric centering device have advantages of satisfying a high-precision optical centering requirement, and supplying a new concept for development of centering devices in future.
Description
Technical field
The present invention relates to optical centering field is and in particular to a kind of micron order photoelectric Centering based on surface reflection image fills
Put.It is mainly used in the centering work for sphere or quadratic surface optical element for the circular optical elements surface not having centre bore.
Background technology
The production and processing of optical element will be so-called through corase grind, fine grinding, polishing, centering and the such a process of edging
The centering of optical element exactly makes normal and the reference axis of the optical surface apex of circular optical elements by certain method
The process overlapping, reference axis here is just used to mark, the straight line of a determination of inspection and correction center error, Ke Yishi
The gyroaxis of lathe or the optical axis of system.Traditional optical element spotting device can be divided mainly into Mechanical Method, light according to principle
Method and photoelectricity combined techniqueses.
The principle of mechanical centering method is：Using a pair of alignment be very high and centring chuck of cross section perpendicular axis, by
Part to be measured is stepped up by the spring force being applied on chuck.One of chuck can only rotate, and another one can rotate and can edge
Axis to move；In centering process, if part to be measured is in non-centering state, because the thick difference in side leads to be measured see stress not
Equilibrium, chuck can make part to be measured move on axis to the centering power of part to be measured；When part to be measured no longer moves, say
Bright lens axis and chuck axis reach certain weight and precision, thus realizing feeling relieved.The advantage of Mechanical Method centering is operation letter
Single, high in machining efficiency, suitable high-volume is processed and is had medium accuracy, is disadvantageous in that precision is not high, and precision is felt relieved
The impact at angle.
Optical centering method mainly includes surface reflection image centering method, centre of sphere auto-collimation picture centering method and transmission picture centering method.
Surface reflection image centering method principle is：Part to be measured bonds on centering joint, and centering joint can be around machine tool rotary
Axle rotates, and places light source in mirror opposite side to be measured, and observes the position of reflection image in the same side of lamp.In centering process, centering connects
Head rotates around gyroaxis, if observed light source as motionless or adjust beat in tolerance when; it is fixed to complete
The heart.The advantage of surface reflection image centering method is：Equipment is simple, it is direct to observe, be applied to single-piece and small lot batch manufacture；Deficiency
Place is：Need operator to judge centering precision by visual observation, lead to precision not high, and the scope of application is not wide.
Centre of sphere auto-collimation reflection image feel relieved method principle be：Part to be measured is bonded on centering head, and centering head can be around lathe
Gyroaxis rotates, and mirror opposite side to be measured is sequentially placed collective lens, collimation camera lens and graticle.The picture of graticle in centering process
Can still image on graticle after being reflected by part to be measured, when joint of feeling relieved rotates around gyroaxis, if the picture of graticle
Motionless or transfer in tolerance when, then complete centering.The advantage that centre of sphere auto-collimation is reflected towards centering method is：Using
Optical amplification system and graticle make the centering precision of whole system high；It is disadvantageous in that：It is normally only used for diameter little, bent
The little lens of rate radius, due to visual field little so that looking for as difficult, equipment is complex and moving guide rail of for centrescope requires
High.
Transmission beam method feel relieved method principle be：It is to be measured that the light that light source produces collimates entrance after converging in cross-graduation plate
Part, is converged to another one graticle through the light of part to be measured by image-forming objective lens, afterwards again will be as being imaged onto sight by imaging eyepiece
In the person's of examining eye.The method is mainly used in lenses centering, in centering, rotates lens to be measured, if cross-graduation on graticle
Motionless or beat in tolerance, through completing centering.The scope of application of transmission-type centering method is only limitted to transmission camera lens, and
And there is a maximum deficiency：When lens rear focus is zero to the bias of reference axis, even if optical axis is with reference axis still
When having the angle of cut, the in esse centering error of lens cannot show.
Photoelectricity combined techniqueses mainly include optical television centering method and laser centering method.
Optical television centering method developed on the basis of centre of sphere auto-collimation centering method.The improvement is that and increased
Tilt the beam-splitting board of 45 ° of placements, be direct imaging at video camera through the picture of the graticle of part to be measured reflection after beam-splitting board,
The picture of graticle is provided by display screen and shows centering error.Have an advantage in that：High precision, detection are directly perceived, efficiency high；No
It is in place of foot：Typically adopt ordinary light source, light source spectral coverage is wider, in order to obtain preferable image quality, to optical system
Requirement uprises so that system is complex, and cost is also higher.
Laser centering method is mainly made up of three parts：The laser instrument of adjustable focus, two-dimensional position sensor, electron process and aobvious
Show part.Its measuring principle is：The light sending from laser instrument passes through centering lens, lens to be measured through the optical system of adjustable focus
With the fixture clamping of a center light-permeable, receive picture with the photoelectric crystal with adjustable micrometer after the lens, and luminous point is shown
Show over the display.The advantage of laser centering method is：Simple to operate, speed is fast, centering precision is high；It is disadvantageous in that：Should
With being limited in scope, it is simply possible to use in lens, and for transmission-type centering method problem encountered nor effectively solving.
Content of the invention
The technical problem to be solved is to propose a kind of micron order photoelectric Centering device based on surface reflection image,
The requirement of high-precision optical centering not only can be met, but also a kind of thinking can be provided for the development of following centring means.
This device has the characteristics that structure is simple, processing ease, applied range, centering precision are high, be mainly used in surface be sphere or
The centering work of person's quadratic surface optical element.
The technical solution of the present invention is to provide a kind of micron order photoelectric Centering method based on surface reflection image, including
Following steps：
1) beam of laser is divided into the reflected beams and transmitted light beam through beam splitter prism；
2) wherein the reflected beams are collimated is reflected again, is imaged after backtracking；Transmitted light beam collimation post-concentration is in treating
Survey the center of curvature of objective lens surface, returned by mirror surface to be measured reflection tailing edge original optical path and be imaged after beam splitter prism reflection；
3) obtain the barycenter of image planes hot spot with Sub-pixel Technique, the coordinate according to center of mass point can draw element under test surface
Offset.
Present invention also offers a kind of micron order photoelectric Centering device based on surface reflection image, it is particular in that：
Including laser instrument, beam splitter prism, it is arranged on the to-be-measured cell of beam splitter prism transmitted light path, is arranged on beam splitter prism reflected light path
Reference unit, CCD/CMOS camera；Above-mentioned beam splitter prism is formed by two pieces of corner cube prism gluings, and cemented surface is coated with semi-transparent semi-reflecting
Film；
Above-mentioned to-be-measured cell includes collimating mirror, convergence object lens and the mirror to be measured setting gradually；
Above-mentioned reference light unit collimating mirror and the reference light unit reflecting mirror including with reference to light unit setting gradually；
Above-mentioned CCD/CMOS camera is used for the imaging of test cell and reference unit.
In order to be applied to different curvature range, above-mentioned convergence object lens are multigroup.
Above-mentioned beam splitter prism, collimating mirror and the material assembling object lens are optical glass material K9, greatly simplify optics
System.
The operation principle of the present invention is as follows：
The light being sent by laser instrument 1 is divided into two bundles after beam splitter prism 2 transmission, wherein a branch of is reflected into reference light
Unit collimating mirror 6 is collimated into directional light, is reflected after inciding reference light unit reflecting mirror 7, and backtracking enters beam splitting rib
Mirror 2, images in CCD/CMOS camera 8 through after beam splitter prism 2；In addition light beam is transmitted into collimating mirror 3 and collimates as directional light,
After being transferred to convergence object lens 4, parallel light focusing, in the center of curvature on mirror 5 surface to be measured, travels to during mirror 5 to be measured by mirror 5 table to be measured
Face reflection returns along original optical path, images in CCD/CMOS camera 8 after beam splitter prism 2, and camera is by after the picture obtaining collection
Obtain the barycenter of image planes hot spot using Sub-pixel Technique, the coordinate according to center of mass point can draw the offset on original paper surface.
The invention has the beneficial effects as follows：
(1) this apparatus structure is very simple, very easy to use it is easy to integrated, not only can be conveniently used for optical element
Centering task, also may be mounted on lathe be used for edging feel relieved；
(2) the reference light unit being made up of reference light unit collimating mirror and reference light unit reflecting mirror in this device is centering
Device reference point, still can quickly provide mirror bias situation to be measured under conditions of being independent of rotating lathe；
(3) the centering scope of this device is very wide, can detect the table of any curvature by changing specific convergence object lens
Face；
(4) because as light source, light source spectral coverage is very narrow using laser instrument (wavelength is 632.8nm), aberration affects this device
Less, lens used by system and beam dividing lens, all using same conventional optical glass material K9, greatly simplify optics
System；
(5) the sub-pixed mapping algorithm that high speed readout circuit combines in image procossing can be inclined with the acquisition surface of real-time high-precision
Mood condition.
Brief description
Fig. 1 is overall structure diagram one of the present invention；
Fig. 2 is overall structure diagram two of the present invention；
Fig. 3 is the present invention with reference to light unit design drawing；
Fig. 4 is the present invention in mirror ideal situation optical system diagram to be measured；
Fig. 5 be the present invention mirror to be measured X-direction bias 2mm situation optical system diagram；
Fig. 6 is the present invention in mirror to be measured eccentric 2mm situation optical system diagram in the Y direction；
Fig. 7 is that the present invention tilts 2mm situation optical system diagram in mirror to be measured in X-direction；
Fig. 8 tilts -2mm situation optical system diagram for the present invention in the Y direction in mirror to be measured；
Fig. 9 is overall optical system figure of the present invention.
Figure 10 be the present invention ideal situation, X-direction tilt 2mm, Y-direction tilt -2mm, X/Y bias 2mm when image planes more
Speckle synthesis schematic diagram；
In figure reference is：1- laser instrument, 2- beam splitter prism, 3- collimating mirror, 4- assembles object lens, 5- mirror to be measured, and 6- joins
Examine unit collimating mirror, 7- reference unit reflecting mirror, 8-CCD/CMOS camera.
Specific embodiment
Below in conjunction with accompanying drawing, the present invention will be further described.
As shown in figure 1, being a kind of structural representation of optical system of the present invention, being sequentially placed laser instrument 1, having divided along axis
Beam prism 2, collimating mirror 3, convergence object lens 4 and mirror to be measured 5, have been sequentially placed reference unit accurate on the transmitted light path of beam splitter prism
Straight mirror 6 and reference unit reflecting mirror 7, the light of CCD/CMOS camera 8 axis, reference path collimating mirror 6 and reference path reflecting mirror 7
, all in the center overlapping of axles of beam splitter prism, this central shaft is vertical with above-mentioned axis for axle, and the light of mirror reflection to be measured is through optical system
The image planes that system is assembled are overlapped with the image planes of the light collection reflecting through reference path reflecting mirror；Position residing for CCD/CMOS camera 8
The light being set to mirror reflection to be measured is near the image planes that optical system is assembled；The convergence object lens of optical system of the present invention can divide
For multigroup, to be applied to the measured piece of different curvature, as shown in Fig. 2 being applied to another for optical system of the present invention
The schematic diagram of the measured piece of different curvature.
In the present embodiment, the parameter of optical system is as follows：Laser instrument adopts the He-Ne laser instrument that wavelength is 632.8nm；Point
Beam prism is formed by two pieces of K9 corner cube prism gluings, and cemented surface is coated with semi-transparent semi-reflecting film；Collimating mirror participant polymers mirror is identical, all adopts
Use K9 glass, focal length is 100mm, rear cut-off distance is 100mm, can be used to when actually used measure the surface that curvature is less than 100mm
The degree of eccentricity.The bigger nonreentrant surface of measurement radius of curvature if necessary, then can be designed that focal length is bigger and rear cut-off distance is longer
Assemble object lens, change existing convergence object lens afterwards.
Claims (4)
1. the micron order photoelectric Centering method based on surface reflection image it is characterised in that：Comprise the following steps：
1) beam of laser is divided into the reflected beams and transmitted light beam through beam splitter prism；
2) wherein the reflected beams are collimated is reflected again, is imaged after backtracking；Transmitted light beam collimation post-concentration is in determinand
The center of curvature on mirror surface, is returned by mirror surface to be measured reflection tailing edge original optical path and is imaged after beam splitter prism reflection；
3) obtain the barycenter of image planes hot spot with Sub-pixel Technique, the coordinate according to center of mass point can draw the inclined of element under test surface
Heart amount.
2. a kind of micron order photoelectric Centering device based on surface reflection image it is characterised in that：Including laser instrument, beam splitter prism,
The to-be-measured cell being arranged on beam splitter prism transmitted light path, the reference unit being arranged on beam splitter prism reflected light path, CCD/CMOS
Camera；Described beam splitter prism is formed by two pieces of corner cube prism gluings, and cemented surface is coated with semi-transparent semi-reflecting film；
Described to-be-measured cell includes collimating mirror, convergence object lens and the mirror to be measured setting gradually；
Described reference light unit collimating mirror and the reference light unit reflecting mirror including with reference to light unit setting gradually；
Described CCD/CMOS camera is used for the imaging of test cell and reference unit.
3. the micron order photoelectric Centering device based on surface reflection image according to claim 2 it is characterised in that：Described meeting
Polymers mirror is multigroup.
4. the micron order photoelectric Centering device based on surface reflection image according to claim 2 it is characterised in that：Described point
Beam prism, collimating mirror and the material assembling object lens are optical glass material K9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610985236.4A CN106383396A (en) | 2016-10-31 | 2016-10-31 | Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610985236.4A CN106383396A (en) | 2016-10-31 | 2016-10-31 | Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106383396A true CN106383396A (en) | 2017-02-08 |
Family
ID=57956942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610985236.4A Pending CN106383396A (en) | 2016-10-31 | 2016-10-31 | Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106383396A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111708133A (en) * | 2019-08-30 | 2020-09-25 | 珠海长园达明智能科技有限公司 | Device and method for coupling single-mode optical fiber by laser with large divergence angle |
| CN113946027A (en) * | 2021-09-16 | 2022-01-18 | 茂莱（南京）仪器有限公司 | Combined lens base suitable for assembling concave lens |
| CN114153046A (en) * | 2022-02-09 | 2022-03-08 | 茂莱（南京）仪器有限公司 | Centering adjustment tool for meniscus lens |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180941A (en) * | 1985-02-06 | 1986-08-13 | Matsushita Electric Ind Co Ltd | Optical reproducer |
| CN85101621A (en) * | 1985-04-01 | 1986-08-20 | 中国科学院长春光学精密机械研究所 | Photo-electric centering and measurement mechanism |
| EP0713216A1 (en) * | 1994-11-15 | 1996-05-22 | Nec Corporation | Optical head device utilizing super-resolution technique |
| CN102736259A (en) * | 2012-07-13 | 2012-10-17 | 茂莱（南京）仪器有限公司 | Centering method and device for lens assembly |
| CN206193312U (en) * | 2016-10-31 | 2017-05-24 | 中国科学院西安光学精密机械研究所 | Micron order photoelectricity centring means based on surface reflection like |
-
2016
- 2016-10-31 CN CN201610985236.4A patent/CN106383396A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180941A (en) * | 1985-02-06 | 1986-08-13 | Matsushita Electric Ind Co Ltd | Optical reproducer |
| CN85101621A (en) * | 1985-04-01 | 1986-08-20 | 中国科学院长春光学精密机械研究所 | Photo-electric centering and measurement mechanism |
| EP0713216A1 (en) * | 1994-11-15 | 1996-05-22 | Nec Corporation | Optical head device utilizing super-resolution technique |
| CN102736259A (en) * | 2012-07-13 | 2012-10-17 | 茂莱（南京）仪器有限公司 | Centering method and device for lens assembly |
| CN206193312U (en) * | 2016-10-31 | 2017-05-24 | 中国科学院西安光学精密机械研究所 | Micron order photoelectricity centring means based on surface reflection like |
Non-Patent Citations (1)
| Title |
|---|
| 闫思思: ""透镜中心偏测量技术研究"", 《中国优秀硕士学位论文全文数据库 工程科技Ⅱ辑》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111708133A (en) * | 2019-08-30 | 2020-09-25 | 珠海长园达明智能科技有限公司 | Device and method for coupling single-mode optical fiber by laser with large divergence angle |
| CN113946027A (en) * | 2021-09-16 | 2022-01-18 | 茂莱（南京）仪器有限公司 | Combined lens base suitable for assembling concave lens |
| CN114153046A (en) * | 2022-02-09 | 2022-03-08 | 茂莱（南京）仪器有限公司 | Centering adjustment tool for meniscus lens |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10935366B2 (en) | Method and device for measuring features on workpieces | |
| US10245683B2 (en) | Apparatus and method for beam diagnosis on laser processing optics | |
| US10967452B2 (en) | Device for measuring the depth of a weld seam in real time | |
| CN102589428B (en) | Asymmetric-incidence-based sample axial position tracking and correcting method and device | |
| WO2016116036A1 (en) | Dual-optical-path optical centering instrument for eliminating stray light | |
| CN106383396A (en) | Micrometer-grade photoelectric centering method and micrometer-grade photoelectric centering device based on surface reflection image | |
| CN205942120U (en) | Autocollimatic optic system with polarization beam splitting element | |
| CN211876977U (en) | Line focusing differential color confocal three-dimensional surface topography measuring system | |
| CN114577125B (en) | Non-contact optical lens center thickness measuring method and measuring device | |
| CN206193312U (en) | Micron order photoelectricity centring means based on surface reflection like | |
| JPH0812127B2 (en) | Curvature radius measuring device and method | |
| WO2024094230A1 (en) | Measurement device and measurement method for transmittance and numerical aperture of optical fiber | |
| JP2000241128A (en) | Plane-to-plane space measuring apparatus | |
| CN109596064B (en) | Binocular confocal stereoscopic vision scanning galvanometer position error correction device and method | |
| US6924897B2 (en) | Point source module and methods of aligning and using the same | |
| WO2023098349A1 (en) | Optical lens parameter measurement device and method | |
| CN105783745B (en) | The measuring device and measuring method of spherical lens | |
| CN112197714B (en) | Free-form surface measuring device and detection method based on differential color confocal technology | |
| JP2735104B2 (en) | Aspherical lens eccentricity measuring apparatus and measuring method | |
| CN109186955B (en) | Progressive multi-focus lens distance area double-channel focal power measuring equipment and method | |
| US3832063A (en) | Lens axis detection using an interferometer | |
| JPH06174430A (en) | Center thickness measuring method and device used for it | |
| CN218297072U (en) | Dual-purpose detection interference device for visual observation and CCD display | |
| TW201905414A (en) | Line width measuring system and line width measuring device | |
| RU2705177C1 (en) | Autocollimation device for centering optical elements |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170208 |