CN106378500B - A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device - Google Patents

A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device Download PDF

Info

Publication number
CN106378500B
CN106378500B CN201610877053.0A CN201610877053A CN106378500B CN 106378500 B CN106378500 B CN 106378500B CN 201610877053 A CN201610877053 A CN 201610877053A CN 106378500 B CN106378500 B CN 106378500B
Authority
CN
China
Prior art keywords
workpiece
gap
anode
cathode
angular adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201610877053.0A
Other languages
Chinese (zh)
Other versions
CN106378500A (en
Inventor
王续跃
户亚娜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dalian University of Technology
Original Assignee
Dalian University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dalian University of Technology filed Critical Dalian University of Technology
Priority to CN201610877053.0A priority Critical patent/CN106378500B/en
Publication of CN106378500A publication Critical patent/CN106378500A/en
Application granted granted Critical
Publication of CN106378500B publication Critical patent/CN106378500B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23HWORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H3/00Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
    • B23H3/10Supply or regeneration of working media

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

The invention provides a kind of adjustable wedge gap mask Electrolyzed Processing micro runner device, belong to technical field of electrolysis processing.Device includes locating module, gap adjustment module and angular adjustment module, and locating module is designed for cylindric anode workpiece, positioned workpiece completely using plane and two pitses;Gap adjustment module is used for the gap of integrally-regulated negative and positive interpolar, cathode-anode plate keeping parallelism;Angular adjustment module is used for the cross sectional shape for changing anode and cathode plate flow channel, change the angle between cathode-anode plate, the local flow velocity for changing electrolyte in fluid channel arc section, meet the flow rates demand that fluid channel arc section is processed, Electrolyzed Processing precision, efficiency are improved, reduces workpiece scrappage.Corresponding logical liquid method is mainly in electrochemical machining process, liquid in-out mouth is exchanged, ensure the machining accuracy of fluid channel both ends arc section, make up working depth inhomogeneities caused by Varied clearance Electrolyzed Processing, improve the uniformity of large area fluid channel in the depth direction.

Description

A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device
Technical field
The invention provides a kind of adjustable wedge gap mask Electrolyzed Processing micro runner device, belongs to electrochemical Machining Technology neck Domain.
Background technology
Medical microfluidic analysis chip is that one kind uses Micrometer-Nanometer Processing Technology, on the substrate of several square centimeters of sizes, system Size is made between 10 μm~500 μm of fluid channel network structure, and integrate other functional units, with realize collection sample preparation, Sample introduction, reaction, separate, be detected on integral quick, efficient, low consumption micro-analysis system, in blood testing, drug screening and exempting from Many aspects such as epidemiology measure have broad application prospects and the very huge market demand, therefore it is high-quality to process high accuracy The micro-channel mold of amount is particularly significant.
The existing conventional processing method for making micro-channel mold mainly has silicon etching technology, LIGA fabrication techniques metal patterns Tool, mechanical microfabrication techniques, electrical discharge machining (EDM), Laser Processing and Electrolyzed Processing (ECM) etc..Wherein machining easily production Raw internal stress and burr;Efficiency high is laser machined, but the side wall after its processing has recast layer and micro-crack;Work in electrical discharge machining It is lossy to have electrode;The above that compares processing method, Electrolyzed Processing then have processing after impulse- free robustness, indeformable, instrument is lossless With surface quality it is good the advantages of, the method for mask Electrolyzed Processing can more control processing cost, ensure crudy, improve processing effect Rate.
Mask Electrolyzed Processing is the combination of photoetching process and electrochemical etching process, and workpiece surface coats one layer typically today Mask with photosensitive property, and it is combined closely with base material, through overexposure, development, specific pattern is prepared on the surface of the workpiece The shielding layer of case, then unprotected workpiece material is removed by Electrolyzed Processing, finally process the pattern of needs.In mask electricity Solve in process, supply electrolyte frequently with side blow formula, cross section of fluid channel is shaped as rectangle, as shown in Fig. 2 from import to outlet For fixed interval (FI), formed by parallel cathode-anode plate.
By taking 500 μm of wide fluid channels of Electrolyzed Processing 200 shown in Fig. 3 μm depth as an example, fluid channel is broadly divided into straightway and circular arc Section, if still using the rectangular section runner model of fixed gap, Fig. 4 is shown in the simulation in flow field, it can be found that in the groove-bottom of 200 μm of depths Portion, the flow velocity of arc section is impacted larger, and flow velocity is very small, essentially 3m/s or so, it is impossible to meets the requirement of Electrolyzed Processing, enters And the stop of Electrolyzed Processing product is caused, influence Electrolyzed Processing precision.
When processing small depth micro-channel mold workpiece, electrolyte is during flowing, the dynamic electricity compared with shallow depression convection current Solution liquid barrier force is smaller, and the kinetic energy rejection of electrolyte is few, and the electrolyte for flowing into recess easily breaks through recessed side walls outflow, takes away Electrolysate;When processing big depth micro-channel mold workpiece, electrolyte is during flowing, because depression is deeper, Its side wall is big to the electrolyte barrier power of flowing, and kinetic energy rejection is big, and speed declines, and the electrolyte for flowing into recess is difficult that breakthrough is recessed Side wall outflow is fallen into, causes workpiece partial electrolysis liquid to stop, it is impossible to is updated, therefore electrolysate is also deposited on this.
So when processing big depth micro-channel mold workpiece, the rectangular section runner model of fixed gap can not meet electrolyte The requirement of flow velocity, the stop of partial electrolysis product, partial electrolysis heat distribution may be caused uneven, or even have phenomena such as shelf depreciation Generation such as turning etc., produce the problem of Electrolyzed Processing precision is low, efficiency is low, workpiece scrappage is high.
The content of the invention
The present invention is devised between a kind of adjustable wedge to meet the field requirements of the big depth fluid channel of mask Electrolyzed Processing Gap mask Electrolyzed Processing micro runner device, big depth fluid channel overall precision, efficiency and stability are processed to improve.
Technical scheme:
A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device, apparatus main body is cuboid, inside there is the type of Founder Chamber is as electrolytic cell, and for ease of installation and removal, device is provided with dismountable device end cap and device pedestal, connected by screw Connect;Device pedestal left and right ends are provided with the screwed hole being connected with water pipe, the inlet and outlet as electrolyte;
Device pedestal center is provided with circular groove, forms cylindric anode workpiece installing zone, the diameter of circular groove Identical with the diameter of anode workpiece, circular groove depth is identical with anode workpiece thickness;Sun is positioned using " plane and two pitses " mode Pole workpiece, " simultaneously " be circular groove bottom surface, directly contacted with anode workpiece bottom surface, " two pin " be respectively setting circle pin and Positioning screw, the bottom surface of the circular groove on device pedestal are provided with circular hole and center position tapped through hole, and anode workpiece exists Corresponding position is respectively equipped with the circular hole of same depth and screwed hole coordinates positioning;Wherein the positioning screw of " plane and two pitses " is fixed While position, anode workpiece is locked on device pedestal by screw thread, is exposed at the head of screw of device pedestal bottom with power supply just Extremely it is connected, applies potential for anode workpiece;
Device end cap center position is provided with and anode workpiece diameter identical tapped through hole, the interior spiral shell of tapped through hole Line coordinates with gap adjustment stud external screw thread, by adjusting screw thread, moves up and down gap adjustment stud, on gap adjustment stud Provided with two tapped through holes, two tapped through holes are distributed with Central Symmetry, and two angular adjustment studs are matched somebody with somebody with two tapped through holes Close;Cathode-workpiece covers installed in device end, and cathode-workpiece is connected gap adjustment stud by two angular adjustment studs Lower section, pass through the gap for controlling the height of gap regulation stud to control between cathode-workpiece and anode workpiece;Cathode-workpiece be with The equal cylinder of anode workpiece diameter, "T"-shaped groove is provided with cathode-workpiece upper surface, "T"-shaped groove bifurcation is in circle centre position, " T " Shape slot cross-section is circular in 3/4, and the bulb on two angular adjustment studs is placed in "T"-shaped groove, and bulb passes through screw thread and angle Regulation stud connection is spent, and then adjusts two angular adjustment studs and drives bulb to reconcile cathode-workpiece angle of inclination, cathode-workpiece Angle of inclination calculated by the difference in height of two angular adjustment studs, and stretch out the angular adjustment shaft of gap adjustment stud The negative pole of power supply is connected, applies potential for cathode-workpiece, electrical potential difference is formed between cathode-workpiece and anode workpiece.
Beneficial effects of the present invention:(1) by the way that parallel electrolyte channel is changed into Varied clearance runner, electrolyte flow rate edge is made Runner wide arc gap to small―gap suture direction, the increase of fluid channel arc section speed, the side wall of the electrolyte of big flow velocity by big depth After stop, remain to flow out arc section recess, be advantageous to remove electrolysate and heat, improve the essence for being electrolysed big depth fluid channel Degree;(2) electrolyte inlet and outlet are exchanged according to actual conditions, had both ensure that the essence of fluid channel both ends arc section channel section face shape Degree, compensate for the uniformity of the working depth of Varied clearance runner again.
Brief description of the drawings
Fig. 1 is adjustable Varied clearance flow passage device two-dimensional representation.
Fig. 2 is fixed gap flow field schematic diagram.
Fig. 3 is fluid channel pictorial diagram.
Fig. 4 is 200 μm of depth, the fluid channel velocity profile of 500 μm of width.
Fig. 5 is cathode-workpiece ball recess schematic diagram.
Fig. 6 is clearance angle regulation schematic diagram.
Fig. 7 is 200 μm of depth, the fluid channel Varied clearance flow field velocity distribution map of 500 μm of width.
Fig. 8 is electrochemical machining system figure.
Fig. 9 is to change fluid channel Varied clearance flow fieldoptimization velocity profile after logical liquid mode.
In figure:1 device end cap;2 gap adjustment studs;3 angular adjustment studs;
4 angular adjustment stud bulbs;5 cathode-workpieces;6 device pedestals;7 alignment pins;8 positioning screws;
9 anode workpieces;10 electrolyte;11 power supplys;12 No. 1 triple valves;13 overflow valves;14 membrane pumps;
15 water tanks;16 pressure gauges;17 No. 2 triple valves;18 ball valves.
Embodiment
Describe the embodiment of the present invention in detail below in conjunction with technical scheme and accompanying drawing.
Embodiment
Before Electrolyzed Processing, the installation for carrying out each part first coordinates, and cathode-workpiece 5 and anode workpiece 9 are used into sand paper successively Polishing surface oxide layer, it is cleaned by ultrasonic surface and oil contaminant with absolute ethyl alcohol, the absolute ethyl alcohol of residual, warp is cleaned by ultrasonic with deionized water After crossing gluing-front baking-photoetching-development-rear baking, the photoresist mask of fluid channel pattern is obtained in anode workpiece 9, thickness is about 5 μm, mask and workpiece compactness are better, and machining accuracy is higher, and the anode workpiece for being painted with glue is placed on into the center of device pedestal 6 At circular groove, the dowel hole and screwed hole that make anode workpiece are directed at placement with alignment pin 7 and positioning screw 8, and screw and determine Position screw, anode workpiece 9 is fixed on device pedestal 6, device end cap 1 is placed on directly over device pedestal 6, to its four Screwed hole at angle, and screwing four screws is brought into close contact device end cap 1 and device pedestal 6, by two angular adjustment studs 3 Two screwed holes of precession gap adjustment stud 2, are allowed to be fitted close in precession, and two angular adjustment stud bulbs 4 are disposed In spherical " T " the word groove of cathode-workpiece 5, a small amount of lubricating oil is added dropwise, ensures bulb easy slide in groove, by bulb 4 Screwed with the 3 corresponding threaded connection of angular adjustment stud, finally screwed hole corresponding to the screwing-in device end cap of gap adjustment stud 2 In.
Adjust gap adjustment stud 2, select appropriate processing gap, processing gap can according to a series of length computations, See that Fig. 1 marks length, then gap L should be:
L=L2-L1- (L5-L4-L3)
Two angular adjustment studs 3 are adjusted, select appropriate processing clearance angle, the specific calculated value of angle can be according to figure Mark length shown in 6 is obtained, then angle a should be:
A=arctan (L7/L6)
Then 20% NaNO is passed through from the left port of device3Solution, inlet pressure 0.9MPa, the port of export are air Pressure 0.1MPa, it is parallel with fluid channel straightway that anode workpiece 9 prevents that direction from flow to electrolyte, and import splaying is 1mm, is inclined Rake angle is 1 °, switches on power and carries out Electrolyzed Processing.
The representative straightway and the arc section of both ends 1/4 simulated using FLUENT.As a result cloud atlas is shown in Fig. 7, with Fig. 4 Comparative result understands that the arc section speed of the port of export has obtained very big lifting, is all higher than 5m/s, is advantageous to the row of electrolysate Go out.
Logical liquid embodiment of the method
(1) No. 1 triple valve 12 is adjusted, enters device from figure left end along " one " path, electrolyte 10 in fig. 8;
(2) No. 2 triple valves 17 are adjusted, in fig. 8 i.e. along " one " path, electrolyte 10 is from figure right-hand member bleeder;
(3) ball valve 18 is screwed, the path closed where ball valve, avoids electrolyte 10 from being flowed out from the path;
(4) anode and cathode workpiece installs, and gap and angular adjustment are appropriate, correctly connect power supply;
(5) membrane pump 14 is opened, after water is full of device, turns on the power 11;
(6) after being electrolysed 30s, power supply 11 and membrane pump 14 are closed;
(7) device gap and angle are readjusted, it is in opposite direction with a upper process skew;
(8) No. 1 triple valve 12 is adjusted, enters device from figure right-hand member along " ┘ " path, electrolyte 10 in fig. 8;
(9) No. 2 triple valves 17 are adjusted, in fig. 8 i.e. along " ┘ " path, electrolyte 10 is from figure left end bleeder;
(10) ball valve 18 is opened, electrolyte 10 is flowed out to water tank 15 from the path;
(11) membrane pump 14 is opened, after water is full of device, turns on the power 11;
(12) after being electrolysed 30s, power supply 11 and membrane pump 14 are closed, electrochemical machining process terminates.
Found by Fig. 3, circular arc is distributed with straightway both ends in fluid channel figure, can locally be improved using Varied clearance flow field Electrolyte flow rate, flow velocity is mainly set to meet the small side circular arc in gap, according to this pictorial pattern, this logical liquid method is by changing electricity The incline direction of liquid inlet and outlet direction and Varied clearance runner is solved, disclosure satisfy that the flow velocity and form accuracy of opposite side Machining Arc, It is capable of the inhomogeneities in Varied clearance flow field straightway flow velocity shown in balance chart 7 simultaneously, velocity flow profile is shown in Fig. 9, both sides circle after optimization Arc end flow velocity can reach more than 5m/s, electroless liquid " dead angle area ", and overall flow field velocity is evenly distributed unanimously, is meeting miniflow While road shape precision, ensure the homogenization on depth direction, meet the technology of preparing requirement of big depth fluid channel.
The adjustable wedge gap mask Electrolyzed Processing micro runner device that the present invention designs, should not be limited to fluid channel figure mould The processing of tool, it can be also used for the workpiece higher to local corner's required precision such as big depth die cavity, complex script figure Processing.

Claims (3)

1. a kind of adjustable wedge gap mask Electrolyzed Processing micro runner device, including device end cap, gap adjustment stud, angle are adjusted Save stud, angular adjustment stud bulb, device pedestal, alignment pin and positioning screw, it is characterised in that apparatus main body is rectangular Body, inside there is the die cavity of Founder as electrolytic cell, for ease of installation and removal, device is provided with dismountable device end cap and device bottom Seat, is connected by screw;Device pedestal left and right ends are provided with the screwed hole being connected with water pipe, the inlet and outlet as electrolyte;
Device pedestal center is provided with circular groove, forms cylindric anode workpiece installing zone, diameter and the sun of circular groove The diameter of pole workpiece is identical, and circular groove depth is identical with anode workpiece thickness;Using " plane and two pitses " mode positioning anode work Part, " simultaneously " be circular groove bottom surface, directly contacted with anode workpiece bottom surface, " two pin " are setting circle pin and positioning respectively Screw, the bottom surface of the circular groove on device pedestal are provided with circular hole and center position tapped through hole, and anode workpiece is corresponding Position be respectively equipped with same depth circular hole and screwed hole coordinate positioning;Wherein the positioning screw of " plane and two pitses " is in positioning Meanwhile anode workpiece is locked on device pedestal by screw thread, it is exposed at the head of screw and positive source phase of device pedestal bottom Even, potential is applied for anode workpiece;
Device end cap center position be provided with anode workpiece diameter identical tapped through hole, the internal thread of tapped through hole with Gap adjustment stud external screw thread coordinates, and by adjusting screw thread, moves up and down gap adjustment stud, gap adjustment stud is provided with Two tapped through holes, two tapped through holes are distributed with Central Symmetry, and two angular adjustment studs and two tapped through holes coordinate;It is cloudy Pole workpiece is covered installed in device end, and cathode-workpiece is connected below gap adjustment stud by two angular adjustment studs, By the gap for controlling the height of gap regulation stud to control between cathode-workpiece and anode workpiece, gap adjustable extent is 0- 5mm;Cathode-workpiece is the cylinder equal with anode workpiece diameter, and "T"-shaped groove, "T"-shaped groove point are provided with cathode-workpiece upper surface Crunode is in circle centre position, and "T"-shaped slot cross-section is in 3/4 circular, and the bulb on two angular adjustment studs is placed in "T"-shaped groove, Bulb adjusts two angular adjustment studs and drives bulb conciliation cathode-workpiece to incline by screw thread and angular adjustment Stud connection Rake angle, the angle of inclination of cathode-workpiece are calculated by the difference in height of two angular adjustment studs, and angle of regulation range is 0-10 °, And the negative pole of the angular adjustment shaft connection power supply of gap adjustment stud is stretched out, apply potential for cathode-workpiece, in negative electrode Electrical potential difference is formed between workpiece and anode workpiece.
2. adjustable wedge gap mask Electrolyzed Processing micro runner device according to claim 1, it is characterised in that described Gap adjustment stud selects transparent insulation material.
3. adjustable wedge gap mask Electrolyzed Processing micro runner device according to claim 1 or 2, it is characterised in that angle It is metal conductive materials to spend regulation stud and angular adjustment stud bulb.
CN201610877053.0A 2016-10-08 2016-10-08 A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device Expired - Fee Related CN106378500B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610877053.0A CN106378500B (en) 2016-10-08 2016-10-08 A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610877053.0A CN106378500B (en) 2016-10-08 2016-10-08 A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device

Publications (2)

Publication Number Publication Date
CN106378500A CN106378500A (en) 2017-02-08
CN106378500B true CN106378500B (en) 2018-01-16

Family

ID=57936196

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610877053.0A Expired - Fee Related CN106378500B (en) 2016-10-08 2016-10-08 A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device

Country Status (1)

Country Link
CN (1) CN106378500B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111347110B (en) * 2020-03-18 2021-05-25 常州工学院 Relief (sculpture) shape mould electrolytic machining device
CN112222548B (en) * 2020-10-30 2024-04-16 西安工业大学 Electrolyte rectifying and clearance fine-tuning device for electrolytic machining of profile
CN112894038B (en) * 2021-02-26 2022-05-20 河海大学常州校区 Curved surface electrolytic machining device
CN113084279B (en) * 2021-03-12 2022-07-12 河南航天液压气动技术有限公司 High-precision micro electrochemical machining device and method for surface of floating shaft sleeve

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1216705A (en) * 1967-01-31 1970-12-23 Bosch Gmbh Robert Improvements in or relating to devices for use in the electrolytic processing of metal workpieces
US5567304A (en) * 1995-01-03 1996-10-22 Ibm Corporation Elimination of island formation and contact resistance problems during electroetching of blanket or patterned thin metallic layers on insulating substrate
CN101791726A (en) * 2010-04-22 2010-08-04 西安交通大学 Processing method of cylindrical component with mask micro-structure on outer curved surface
CN102814562A (en) * 2012-08-27 2012-12-12 大连工业大学 Electrochemical machining apparatus of dispersed suspended cathode
CN103182573A (en) * 2012-10-23 2013-07-03 南通大学 Method for processing micro-channels on surface of metal bipolar plate by adopting plate electrode in electrolytic transfer, as well as plate electrode thereof
CN104001997A (en) * 2014-05-27 2014-08-27 南京航空航天大学 Contact type array tiny pit electrochemical machining method
CN105081486A (en) * 2015-08-24 2015-11-25 浙江工业大学 Method and device for machining surface texture through wedge-shaped surface tool cathode suspension electrolysis

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1216705A (en) * 1967-01-31 1970-12-23 Bosch Gmbh Robert Improvements in or relating to devices for use in the electrolytic processing of metal workpieces
US5567304A (en) * 1995-01-03 1996-10-22 Ibm Corporation Elimination of island formation and contact resistance problems during electroetching of blanket or patterned thin metallic layers on insulating substrate
CN101791726A (en) * 2010-04-22 2010-08-04 西安交通大学 Processing method of cylindrical component with mask micro-structure on outer curved surface
CN102814562A (en) * 2012-08-27 2012-12-12 大连工业大学 Electrochemical machining apparatus of dispersed suspended cathode
CN103182573A (en) * 2012-10-23 2013-07-03 南通大学 Method for processing micro-channels on surface of metal bipolar plate by adopting plate electrode in electrolytic transfer, as well as plate electrode thereof
CN104001997A (en) * 2014-05-27 2014-08-27 南京航空航天大学 Contact type array tiny pit electrochemical machining method
CN105081486A (en) * 2015-08-24 2015-11-25 浙江工业大学 Method and device for machining surface texture through wedge-shaped surface tool cathode suspension electrolysis

Also Published As

Publication number Publication date
CN106378500A (en) 2017-02-08

Similar Documents

Publication Publication Date Title
CN106378500B (en) A kind of adjustable wedge gap mask Electrolyzed Processing micro runner device
CN204397104U (en) Orifice electrode scan-type mask electrolytic machining device
CN103521861B (en) Based on blisk profile electrolytic machining device and the method for three-dimensional complex wake
CN100544874C (en) Electrochemical corrosion processing method with micro fine cylindrical group electrode
Wu et al. Fabrication of surface microstructures by mask electrolyte jet machining
CN106881507B (en) A kind of device and electrochemical machining method for Electrolyzed Processing plane complications group's groove
CN104057163B (en) A kind of air film shielding electrochemical micromachining method and special purpose device thereof
CN106513883B (en) A kind of blade profile precision ECM shaped electrode and processing method
Chen et al. Investigation on the electrochemical machining of micro groove using masked porous cathode
CN110000434A (en) Sandwich-type cathode assembly, cathode group hole Electrolyzed Processing frock clamp and process
CN105803493A (en) Small-amplitude motion hollow-out anode electroforming system and method for manufacturing complex thin wall profile
CN109482991A (en) A kind of compound jet micro-nano processing method and processing unit (plant)
Benneker et al. Enhanced ion transport using geometrically structured charge selective interfaces
Liu et al. The tool design and experiments on pulse electrochemical machining of micro channel arrays on metallic bipolar plate using multifunctional cathode
CN103831497B (en) Serpentine flow path collapsible form group hole electrolytic machining device and processing method
CN104511669B (en) Electrochemical machining method of disc array group electrodes with large length-to-diameter ratio
CN105817725B (en) For the guiding device of serpentine flow path template Electrolyzed Processing
CN113333882A (en) Accurate regulation and control equipment of closed structure blade electrolytic machining flow field
Wang et al. Investigation on pulse-vibration electrochemical machining of parallel micro-grooves
CN105127526A (en) Disc type scanning electrode mask film microelectrolysis electrical discharge machining system and machining method
CN111390310A (en) Cathode structure for fuel injection body of diesel engine and electrolytic machining method
CN114407507B (en) Solar cell fine grid preparation method and device
Jia et al. Gas–liquid two-phase flow field analysis of two processing teeth spiral incremental cathode for the deep special-shaped hole in ECM
CN110695471B (en) Electrolytic machining method for mass micro pit template with multiple serpentine runners
CN113070537A (en) Hollow circulation auxiliary electrode structure for 3D printing

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20180116

Termination date: 20201008