CN106325007B - 一种多扫描驱动轴可移动多棱镜光路直写设备 - Google Patents
一种多扫描驱动轴可移动多棱镜光路直写设备 Download PDFInfo
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- CN106325007B CN106325007B CN201611025122.1A CN201611025122A CN106325007B CN 106325007 B CN106325007 B CN 106325007B CN 201611025122 A CN201611025122 A CN 201611025122A CN 106325007 B CN106325007 B CN 106325007B
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- light path
- polygon prism
- prism light
- turntable driving
- direct write
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
- G03F7/70366—Rotary scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201611025122.1A CN106325007B (zh) | 2016-11-22 | 2016-11-22 | 一种多扫描驱动轴可移动多棱镜光路直写设备 |
Applications Claiming Priority (1)
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CN201611025122.1A CN106325007B (zh) | 2016-11-22 | 2016-11-22 | 一种多扫描驱动轴可移动多棱镜光路直写设备 |
Publications (2)
Publication Number | Publication Date |
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CN106325007A CN106325007A (zh) | 2017-01-11 |
CN106325007B true CN106325007B (zh) | 2017-11-17 |
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CN201611025122.1A Active CN106325007B (zh) | 2016-11-22 | 2016-11-22 | 一种多扫描驱动轴可移动多棱镜光路直写设备 |
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CN (1) | CN106325007B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110370395B (zh) * | 2019-06-19 | 2022-04-12 | 广州纬纶信息科技有限公司 | 一种应用于家具板材套裁的吸附方法 |
CN113031400A (zh) * | 2021-01-28 | 2021-06-25 | 苏州天准科技股份有限公司 | 激光直写式成像设备 |
CN114353676B (zh) * | 2021-12-07 | 2024-03-19 | 江苏华创微系统有限公司 | 一种贴装芯片高度自动测量装置及其测试方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
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US20060032037A1 (en) * | 2004-08-13 | 2006-02-16 | Dar-Wen Lo | [assembling method and device thereof] |
TWI527747B (zh) * | 2012-02-28 | 2016-04-01 | 炭研軸封精工股份有限公司 | 非接觸吸著盤 |
CN103545174B (zh) * | 2012-07-16 | 2016-08-24 | 无锡华润上华科技有限公司 | 光刻对焦参数测试方法及系统 |
CN103869627B (zh) * | 2012-12-11 | 2016-03-09 | 上海微电子装备有限公司 | 用于投影光刻机的调焦调平方法 |
KR20140127438A (ko) * | 2013-04-24 | 2014-11-04 | 삼성디스플레이 주식회사 | 기판 흡착 장치 |
CN105182699B (zh) * | 2015-09-30 | 2017-06-30 | 合肥芯碁微电子装备有限公司 | 一种双台面激光直写曝光机及其控制方法 |
CN206331236U (zh) * | 2016-11-22 | 2017-07-14 | 江苏影速光电技术有限公司 | 一种多扫描驱动轴可移动多棱镜光路直写设备 |
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2016
- 2016-11-22 CN CN201611025122.1A patent/CN106325007B/zh active Active
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CN106325007A (zh) | 2017-01-11 |
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PB01 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
CB03 | Change of inventor or designer information |
Inventor after: Li Xianjie Inventor before: Shen Xiaohong Inventor before: Zhao Hua |
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COR | Change of bibliographic data | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20170122 Address after: 221300 Huashan Road, Pizhou Economic Development Zone, Jiangsu, China, Xuzhou Applicant after: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY CO., LTD. Address before: 214135 Jiangsu province Wuxi City Linghu New District Road No. 200 Wu China Sensor Network International Innovation Park building F3 Applicant before: Wuxi speed semiconductor technology Co., Ltd. |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221300 Huashan Road, Pizhou Economic Development Zone, Jiangsu, China, Xuzhou Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |