Sterilize plated film film layer structure and preparation method thereof
Technical field
The present invention relates to translucent element surface coating technical field, specifically, is related to a kind of sterilization plated film film layer structure
And preparation method thereof.
Background technology
For the translucent element in the panel of such as various displays, optical instrument, because it is direct exposure mostly
In external environment, therefore have to anti-microbial property required.On the other hand, due to the reflection on translucent element surface, not only
Its thang-kng energy can be influenceed, but also veiling glare can be formed, and then translucent effect can be impacted.In the prior art, lack
It is a kind of to have sterilization and antireflective effect concurrently such as film layer structure used in translucent element surface.
The content of the invention
The invention provides one kind to sterilize plated film film layer structure, and it can overcome certain or some defects of prior art.
According to the sterilization plated film film layer structure of the present invention, it includes being used for the film layer body located at matrix surface, film layer sheet
Body includes at least one layer of film layer unit, and film layer unit is included in the film layer unit group stacked gradually on the direction away from matrix surface
Part layer A and film layer unit component layer B, film layer unit component layer A material are silica, film layer unit component layer B material
For silver chlorate.
In the sterilization plated film film layer structure of the present invention, film layer unit component layer B material is silver chlorate so that film layer unit
Component layer B can have micro silver ion, and the micro silver ion can destroy the protein of bacterium, thus have very strong sterilization to make
With, and it is smaller relative to other harm of heavy metal silver to human body.
Preferably, the quantity of at least one layer of film layer unit is 3, respectively on the direction away from matrix surface
Stack gradually the first film layer unit, the second film layer unit and third membrane layer unit.
Preferably, the first film layer unit includes the first film layer unit component layer A and the first film layer unit component layer B, the
One film layer unit component layer A thickness is 95.42nm, and the first film layer unit component layer B thickness is 5.46nm;
Second film layer unit includes the second film layer unit component layer A and the second film layer unit component layer B, the second film layer unit
Component layer A thickness is 61.46nm, and the second film layer unit component layer B thickness is 34.88nm;
Third membrane layer unit includes third membrane layer unit block layer A and third membrane layer unit block layer B, third membrane layer unit
Component layer A thickness is 16.40nm, and third membrane layer unit block layer B thickness is 69.91nm.
In the sterilization plated film film layer structure of the present invention, by setting 3 tunic layer units, and cause the 3 tunic layer unit
It is configured to aforesaid way so that the film layer body can possess preferable antireflective effect, and its reflectivity to visible ray exists substantially
0.5% or so.
Present invention also offers it is a kind of sterilize plated film film layer its preparation method, its can overcome prior art certain or
Some defects.
According to its preparation method of the sterilization plated film film layer of the present invention, it comprises the following steps:
(1) material that one layer of first film layer unit component layer A, the first film layer unit component layer A are plated in matrix surface is two
Silica, thickness 95.42nm;
(2) one layer of first film layer unit component layer B, the first film layer unit group are plated on the first film layer unit component layer A surfaces
Part layer B material is silver chlorate, thickness 5.46nm;
(3) one layer of second film layer unit component layer A, the second film layer unit group are plated in the first film layer unit component layer B surface
Part layer A material is silica, thickness 61.46nm;
(4) one layer of second film layer unit component layer B, the second film layer unit group are plated on the second film layer unit component layer A surfaces
Part layer B material is silver chlorate, thickness 34.88nm;
(5) one layer of third membrane layer unit block layer A, third membrane layer unit group are plated in the second film layer unit component layer B surface
Part layer A material is silica, thickness 16.40nm;
(6) one layer of third membrane layer unit block layer B, third membrane layer unit group are plated on third membrane layer unit block layer A surfaces
Part layer B material is silver chlorate, thickness 69.91nm.
Preferably, the film plating process in step (1)~(6) uses evaporation coating method or magnetron sputtering coating method.
Pass through its preparation method of the sterilization plated film film layer of the present invention, enabling preferable matrix surface forms a tunic
Layer body, and the film layer body can have preferable sterilizing ability and preferable antireflective effect concurrently simultaneously.
Brief description of the drawings
Fig. 1 is a kind of schematic diagram of sterilization plated film film layer structure in embodiment 1;
Fig. 2 is reflectance relationship figure of the film layer body in embodiment 1 to different wave length light.
In Fig. 2, transverse axis is wavelength (nm), and the longitudinal axis is reflectivity (%).
Embodiment
To further appreciate that present disclosure, the present invention is described in detail in conjunction with the accompanying drawings and embodiments.It should be understood that
, embodiment be only the present invention is explained and and it is non-limiting.
Embodiment 1
As shown in figure 1, present embodiments provide a kind of sterilization plated film film layer structure, it is characterised in that:Including for located at
The film layer body 120 on the surface of matrix 110, film layer body 120 include at least one layer of film layer unit, and film layer unit is included in away from base
The film layer unit component layer A and film layer unit component layer B stacked gradually on the direction on the surface of body 110, film layer unit component layer A's
Material is silica, and film layer unit component layer B material is silver chlorate.
In the present embodiment, the quantity of film layer unit is 3, the layer successively respectively on the direction away from the surface of matrix 110
Folded first film layer unit, the second film layer unit and third membrane layer unit.
First film layer unit includes the first film layer unit component layer A121 and the first film layer unit component layer B122, the first film
Layer unit component layer A121 thickness is 95.42nm, and the first film layer unit component layer B122 thickness is 5.46nm.
Second film layer unit includes the second film layer unit component layer A123 and the second film layer unit component layer B124, the second film
Layer unit component layer A123 thickness is 61.46nm, and the second film layer unit component layer B124 thickness is 34.88nm.
Third membrane layer unit includes third membrane layer unit block layer A125 and third membrane layer unit block layer B126, tertiary membrane
Layer unit component layer A125 thickness is 16.40nm, and third membrane layer unit block layer B126 thickness is 69.91nm.
As shown in Fig. 2 the film layer body 120 in the present embodiment is provided with relatively low reflectivity in the range of visible ray,
Especially in the scope of common light, reflectivity can be maintained at 0.5% or so.
Embodiment 2
A kind of its preparation method for sterilizing plated film film layer is present embodiments provided, it comprises the following steps:
1st, one layer of first film layer unit component layer A121, the first film layer unit component layer A121 material are plated in matrix surface
For silica, thickness 95.42nm;
2nd, one layer of first film layer unit component layer B122, the first film layer list are plated on the first film layer unit component layer A121 surfaces
First component layer B122 material is silver chlorate, thickness 5.46nm;
3rd, one layer of second film layer unit component layer A123, the second film layer list are plated on the first film layer unit component layer B122 surfaces
First component layer A123 material is silica, thickness 61.46nm;
4th, one layer of second film layer unit component layer B124, the second film layer list are plated on the second film layer unit component layer A123 surfaces
First component layer B124 material is silver chlorate, thickness 34.88nm;
5th, one layer of third membrane layer unit block layer A125, third membrane layer list are plated on the second film layer unit component layer B124 surfaces
First component layer A125 material is silica, thickness 16.40nm;
6th, one layer of third membrane layer unit block layer B126, third membrane layer list are plated on third membrane layer unit block layer A125 surfaces
First component layer B126 material is silver chlorate, thickness 69.91nm.
In the present embodiment, the film plating process in step 1~6 can use evaporation coating method or magnetron sputtering plating side
Method.
Schematically the present invention and embodiments thereof are described above, this describes no restricted, institute in accompanying drawing
What is shown is also one of embodiments of the present invention, and actual structure is not limited thereto.So if common skill of this area
Art personnel are enlightened by it, without departing from the spirit of the invention, without designing and the technical scheme for creativeness
Similar frame mode and embodiment, protection scope of the present invention all should be belonged to.