CN106280284A - A kind of modified light-sensitive resin for rapid shaping and preparation method thereof - Google Patents
A kind of modified light-sensitive resin for rapid shaping and preparation method thereof Download PDFInfo
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Abstract
The invention provides a kind of modified light-sensitive resin for rapid shaping and preparation method thereof, it is made up of acrylate 25～45 parts, epoxy resin 25～45 parts, nanometer nitrile rubber 5～30 parts, the steady agent of light 0.1～0.5 part, diluent 5～25 parts, defoamer 0.5～5 parts, levelling agent 0.5～5 parts, antioxidant 0.1～0.5 part, cationic initiators 1～5 parts and free radical type Photoepolymerizationinitiater initiater 1～5 parts.The composite that the acrylonitrile butadiene rubber modified photosensitive resin of present invention nanometer prepares has the features such as the toughness of excellence, good thermostability, higher dimensional stability and quick shaping speed, after composite molding, apparent mass is greatly improved, and reduces the comprehensive manufacturing cost of composite simultaneously.
Description
Technical field
The invention belongs to photosensitive resin modification field, be specifically related to a kind of modified light-sensitive resin for rapid shaping and preparation method thereof.
Background technology
Introduction To Stereolithography is invention the earliest and the most ripe rapid shaping technique, with liquid photosensitive resin as raw material, utilizes ultraviolet light or laser, makes monomer or performed polymer generation curing reaction complete, by the conversion of liquid to solid-state, to complete Light Curing.Then according to the differently contoured of required product and structure, the rapid build of three dimensional articles is realized by the operating of work package.
The raw material that Stereolithography is conventional is liquid photosensitive resin, it is made up of monomer, performed polymer and prepolymer, selectable limitednumber, and liquid photosensitive resin solidification process exists bigger shrinkage factor, cause that the dimensional stability of goods is poor warpage even occurs, fine defects in forming process can cause Mechanical Properties of Products to reduce, and the thermostability of virgin resin material is poor in addition.
Novelty of the present invention with photosensitive resin as matrix material, be material modified with nanometer nitrile rubber, be prepared for a kind of modified light-sensitive resin composite materials for photocureable rapid shaping.Prepared composite has the features such as the toughness of excellence, good thermostability, higher dimensional stability and quick shaping speed.After composite molding the most provided by the present invention, apparent mass is greatly improved, and reduces the comprehensive manufacturing cost of composite simultaneously.Equipment involved in the present invention and technique are simple, can directly promote and accelerate the photosensitive resin application in rapid shaping field.
Summary of the invention
It is an object of the invention to provide a kind of modified light-sensitive resin for rapid shaping and preparation method thereof.
For achieving the above object, the present invention is by the following technical solutions:
A kind of modified light-sensitive resin for rapid shaping, is prepared from by weight by following component:
Acrylate 25～45 parts,
Epoxy resin 25～45 parts,
Nanometer nitrile rubber 5～30 parts,
The steady agent of light 0.1～0.5 part,
Diluent 5～25 parts,
Defoamer 0.5～5 parts,
Levelling agent 0.5～5 parts,
Antioxidant 0.1～0.5 part,
Cationic initiators 1～5 parts,
Free radical type Photoepolymerizationinitiater initiater 1～5 parts.
Described acrylate is epoxy monoacrylate or urethane acrylate；Described epoxy resin is aminoepoxy resin or bisphenol A epoxide resin.
The spherical rubber grain that described nanometer nitrile rubber is a kind of powder, faint yellow, fineness is between 80nm-100nm.
The steady agent of described light is 2,4-benzophenonedicarboxylic acid or Octabenzone.
Described diluent is trimethylolpropane trimethacrylate or Ethylene glycol diglycidyl ether；Described defoamer is dimethyl polysiloxane or ethylene oxide propylene oxide copolyether.
Described levelling agent is preferably organosilicon-epoxide ethane copolymer or organosilicon-epoxide propane copolymer.
Described antioxidant is four (3; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester, three (2; 4-di-t-butyl) phenyl-phosphite or N, N'-be double-(3-(3,5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine in two kinds.
Described cationic initiators is diphenyl iodnium or diaryl sulfonium salt；Described free radical type Photoepolymerizationinitiater initiater is dimethoxybenzoin or chlorinated diphenyl ketone.
Another goal of the invention of the present invention is to provide the preparation method of the above-mentioned modified light-sensitive resin for rapid shaping, comprises the following steps:
(1) equipped with in the glass there-necked flask of agitator and condensing tube, be sequentially added into acrylate 25～45 parts, epoxy resin 25～45 parts, diluent 5～25 parts, defoamer 0.5～5 parts, levelling agent 0.5～5 parts, cationic initiators 1～5 parts and free radical type Photoepolymerizationinitiater initiater 1 by proportioning～5 parts mix；
(2) nanometer nitrile rubber 5～30 parts, the steady agent of light 0.1～0.5 part and antioxidant 0.1～0.5 part of continuation mixing are added；
(3) above-mentioned mixed liquor is warming up to 50 DEG C～80 DEG C, ultrasonic disperse 10min～30min to uniform state, i.e. prepare a kind of modified light-sensitive resin for rapid shaping.
Novelty of the present invention with photosensitive resin as matrix material, it is material modified with nanometer nitrile rubber, it is prepared for a kind of modified light-sensitive resin composite materials for photocureable rapid shaping, there is the features such as the toughness of excellence, good thermostability, higher dimensional stability and quick shaping speed.It has the advantages that
1, nanometer nitrile rubber is the rubber grain of a kind of nucleocapsid structure, after it is as packing material modified light-sensitive resin, resin matrix can be evenly dispersed into, make goods can play cushioning effect when in the face of external impacts, realize toughening effect, thus significantly improve the toughness that composite is overall；
2, nanometer nitrile rubber is the heat oxygen aging resistance material of a kind of excellence, and the thermostability of composite can be greatly improved after modified light-sensitive resin；
3, the introducing of nanometer nitrile rubber significantly improves the solid concentration in composite system, can substantially reduce the shrinkage factor of material after material completes by liquid to the conversion process of solid-state, improves dimensional stability；
4, nanometer nitrile rubber can play the effect of rivet and framework in photosensitive resin solidification process, can be effectively improved curing efficiency with accelerated material solidification process.
Composite prepared by the present invention is after photocureable rapid shaping, and the apparent mass of its product is greatly improved, and reduces the comprehensive manufacturing cost of composite simultaneously.It addition, equipment involved in the present invention and technique are simple, can directly promote and accelerate the photosensitive resin application in rapid shaping field.
Specific implementation method
Below in conjunction with instantiation, present invention is further detailed; but described embodiment is not the simple restriction to true spirit, any all should belong to scope of the present invention based on the simple change done by true spirit or equivalent within.If no special instructions, described in each example, number is weight portion.
The sample of preparation 23 DEG C, under 50% humidity environment after regulation, be respectively adopted ASTM
D6110, ASTM D648 and ASTM D955 detection impact strength of composite, heat distortion temperature and shrinkage factor, the shaping speed of recording materials simultaneously.
The specific embodiment of the present invention is as follows:
Example
1
(1) following material is prepared:
Epoxy monoacrylate 25 parts,
Aminoepoxy resin 45 parts,
Diluent trimethylolpropane trimethacrylate 5 parts,
Defoamer dimethyl polysiloxane 0.5 part,
Levelling agent organosilicon-epoxide ethane copolymer 0.5～5 parts,
Cationic initiators diphenyl iodnium 1～5 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 1～5 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 5 parts, the steady agent of light 2 are added, 4-benzophenonedicarboxylic acid 0.1 part, antioxidant four (3,5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.04 part and antioxidant three (2,4-di-t-butyl) phenyl-phosphite 0.06 part, above-mentioned mixed liquor is warming up to 50 DEG C, ultrasonic disperse 10min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
2
(1) following material is prepared:
Epoxy monoacrylate 30 parts,
Aminoepoxy resin 40 parts,
Diluent trimethylolpropane trimethacrylate 10 parts,
Defoamer dimethyl polysiloxane 1.5 parts,
Levelling agent organosilicon-epoxide ethane copolymer 1 .5 part,
Cationic initiators diphenyl iodnium 2 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 2 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 15 parts, the steady agent of light 2 are added, 4-benzophenonedicarboxylic acid 0.2 part, antioxidant four (3,5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.08 part and antioxidant three (2,4-di-t-butyl) phenyl-phosphite 0.12 part, above-mentioned mixed liquor is warming up to 55 DEG C, ultrasonic disperse 15min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
3
(1) following material is prepared:
Epoxy monoacrylate 35 parts,
Aminoepoxy resin 35 parts,
Diluent trimethylolpropane trimethacrylate 15 parts,
Defoamer dimethyl polysiloxane 2.5 parts,
Levelling agent organosilicon-epoxide ethane copolymer 2.5 parts,
Cationic initiators diphenyl iodnium 3 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 3 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 20 parts, the steady agent of light 2 are added, 4-benzophenonedicarboxylic acid 0.3 part, antioxidant four (3,5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.12 part and antioxidant three (2,4-di-t-butyl) phenyl-phosphite 0.18 part, above-mentioned mixed liquor is warming up to 60 DEG C, ultrasonic disperse 20min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
4
(1) following material is prepared:
Epoxy monoacrylate 40 parts,
Aminoepoxy resin 30 parts,
Diluent trimethylolpropane trimethacrylate 20 parts,
Defoamer dimethyl polysiloxane 3.5 parts,
Levelling agent organosilicon-epoxide ethane copolymer 3.5 parts,
Cationic initiators diphenyl iodnium 4 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 4 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 25 parts, the steady agent of light 2 are added, 4-benzophenonedicarboxylic acid 0.4 part, antioxidant four (3,5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.16 part and antioxidant three (2,4-di-t-butyl) phenyl-phosphite 0.24 part, above-mentioned mixed liquor is warming up to 70 DEG C, ultrasonic disperse 25min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
5
(1) following material is prepared:
Epoxy monoacrylate 45 parts,
Aminoepoxy resin 25 parts,
Diluent trimethylolpropane trimethacrylate 25 parts,
Defoamer dimethyl polysiloxane 5 parts,
Levelling agent organosilicon-epoxide ethane copolymer 5 parts,
Cationic initiators diphenyl iodnium 5 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 5 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 30 parts, the steady agent of light 2 are added, 4-benzophenonedicarboxylic acid 0.5 part, antioxidant four (3,5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.2 part and antioxidant three (2,4-di-t-butyl) phenyl-phosphite 0.3 part, above-mentioned mixed liquor is warming up to 80 DEG C, ultrasonic disperse 30min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
6
(1) following material is prepared:
Urethane acrylate 25 parts,
Bisphenol A epoxide resin 45 parts,
Diluent Ethylene glycol diglycidyl ether 5 parts,
Defoamer ethylene oxide propylene oxide copolyether 0.5 part,
Levelling agent organosilicon-epoxide propane copolymer 0.5 part,
Cationic initiators diaryl sulfonium salt 1 part,
Free radical type Photoepolymerizationinitiater initiater chlorinated diphenyl ketone 1 part,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 5 parts, light steady agent Octabenzone 0.1 part, antioxidant four (3 are added; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.04 part and antioxidant N; N'-pair-(3-(3; 5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine 0.06 part; above-mentioned mixed liquor is warming up to 50 DEG C; ultrasonic disperse 10min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
7
(1) following material is prepared:
Urethane acrylate 30 parts,
Bisphenol A epoxide resin 40 parts,
Diluent Ethylene glycol diglycidyl ether 10 parts,
Defoamer ethylene oxide propylene oxide copolyether 1.5 parts,
Levelling agent organosilicon-epoxide propane copolymer 1 .5 part,
Cationic initiators diaryl sulfonium salt 2 parts,
Free radical type Photoepolymerizationinitiater initiater chlorinated diphenyl ketone 2 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 15 parts, light steady agent Octabenzone 0.2 part, antioxidant four (3 are added; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.08 part and antioxidant N; N'-pair-(3-(3; 5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine 0.12 part; above-mentioned mixed liquor is warming up to 55 DEG C; ultrasonic disperse 15min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
8
(1) following material is prepared:
Urethane acrylate 35 parts,
Bisphenol A epoxide resin 35 parts,
Diluent Ethylene glycol diglycidyl ether 15 parts,
Defoamer ethylene oxide propylene oxide copolyether 2.5 parts,
Levelling agent organosilicon-epoxide propane copolymer 2.5 parts,
Cationic initiators diaryl sulfonium salt 3 parts,
Free radical type Photoepolymerizationinitiater initiater chlorinated diphenyl ketone 3 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 20 parts, light steady agent Octabenzone 0.3 part, antioxidant four (3 are added; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.12 part and antioxidant N; N'-pair-(3-(3; 5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine 0.18 part; above-mentioned mixed liquor is warming up to 60 DEG C; ultrasonic disperse 20min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
9
(1) following material is prepared:
Urethane acrylate 40 parts,
Bisphenol A epoxide resin 30 parts,
Diluent Ethylene glycol diglycidyl ether 20 parts,
Defoamer ethylene oxide propylene oxide copolyether 3.5 parts,
Levelling agent organosilicon-epoxide propane copolymer 3.5 parts,
Cationic initiators diaryl sulfonium salt 4 parts,
Free radical type Photoepolymerizationinitiater initiater chlorinated diphenyl ketone 4 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 25 parts, light steady agent Octabenzone 0.4 part, antioxidant four (3 are added; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.16 part and antioxidant N; N'-pair-(3-(3; 5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine 0.24 part; above-mentioned mixed liquor is warming up to 70 DEG C; ultrasonic disperse 25min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Example
10
(1) following material is prepared:
Urethane acrylate 45 parts,
Bisphenol A epoxide resin 25 parts,
Diluent Ethylene glycol diglycidyl ether 25 parts,
Defoamer ethylene oxide propylene oxide copolyether 5 parts,
Levelling agent organosilicon-epoxide propane copolymer 5 parts,
Cationic initiators diaryl sulfonium salt 5 parts,
Free radical type Photoepolymerizationinitiater initiater chlorinated diphenyl ketone 5 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube；
(2) in aforesaid liquid, nanometer nitrile rubber 30 parts, light steady agent Octabenzone 0.5 part, antioxidant four (3 are added; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester 0.2 part and antioxidant N; N'-pair-(3-(3; 5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine 0.3 part; above-mentioned mixed liquor is warming up to 80 DEG C; ultrasonic disperse 30min, to uniform state, i.e. prepares a kind of modified light-sensitive resin for rapid shaping；
(3) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared nanometer acrylonitrile butadiene rubber modified photosensitive resin composite property is shown in Table one.
Case of comparative examples
1
(1) following material is prepared:
Epoxy monoacrylate 25 parts,
Aminoepoxy resin 45 parts,
Diluent trimethylolpropane trimethacrylate 5 parts,
Defoamer dimethyl polysiloxane 0.5 part,
Levelling agent organosilicon-epoxide ethane copolymer 0.5～5 parts,
Cationic initiators diphenyl iodnium 1～5 parts,
Free radical type Photoepolymerizationinitiater initiater dimethoxybenzoin 1～5 parts,
Above material is sequentially added into equipped with in the glass there-necked flask of agitator and condensing tube, above-mentioned mixed liquor is warming up to 50 DEG C, ultrasonic disperse 10min to uniform state, i.e. prepare a kind of modified light-sensitive resin for rapid shaping；
(2) prepared resin is prepared as required product by light-curing rapid forming equipment, and detects correlated performance.
Prepared common photosensitive resin material performance is shown in Table one.
Table one:
| Performance | Impact strength (J/m) | Shrinkage factor (%) | Heat distortion temperature (DEG C) | Shaping speed (cm3/h) |
| Example 1 | 38 | 1.7 | 64 | 24 |
| Example 2 | 40 | 1.6 | 66 | 25 |
| Example 3 | 41 | 1.6 | 68 | 27 |
| Example 4 | 43 | 1.5 | 70 | 29 |
| Example 5 | 39 | 1.6 | 69 | 28 |
| Example 6 | 40 | 1.5 | 67 | 25 |
| Example 7 | 42 | 1.4 | 69 | 27 |
| Example 8 | 44 | 1.3 | 71 | 31 |
| Example 9 | 43 | 1.5 | 70 | 28 |
| Example 10 | 41 | 1.6 | 68 | 26 |
| Case of comparative examples 1 | 26 | 1.9 | 48 | 20 |
Nanometer acrylonitrile butadiene rubber modified photosensitive resin composite prepared by the present invention has the features such as the toughness of excellence, good thermostability, higher dimensional stability and quick shaping speed.
By data in table one, the impact strength for the modified light-sensitive resin of Stereolithography prepared by the present invention is 44J/m to the maximum, and case of comparative examples 1 improves 69.2% more before modified；Shrinkage factor minimum 1.3%, reduces 31.6% more before modified；Heat distortion temperature is 71 DEG C to the maximum, improves 47.9% more before modified；Shaping speed is 31cm the soonest3/ h, improves 55% more before modified.After composite molding the most provided by the present invention, apparent mass is greatly improved, and reduces the comprehensive manufacturing cost of composite simultaneously.Equipment involved in the present invention and technique are simple, can directly promote and accelerate the photosensitive resin application in rapid shaping field.
The above-mentioned description to embodiment is to be understood that for ease of those skilled in the art and apply the present invention.These embodiments obviously easily can be made various amendment by person skilled in the art, and General Principle described herein is applied in other embodiments without through performing creative labour.Therefore, the invention is not restricted to embodiment here, those skilled in the art should be within protection scope of the present invention according to the announcement of the present invention, the improvement made without departing from scope and amendment.
Claims (9)
1. the modified light-sensitive resin for rapid shaping, it is characterised in that: it is prepared from by weight by following component:
Acrylate 25～45 parts,
Epoxy resin 25～45 parts,
Nanometer nitrile rubber 5～30 parts,
The steady agent of light 0.1～0.5 part,
Diluent 5～25 parts,
Defoamer 0.5～5 parts,
Levelling agent 0.5～5 parts,
Antioxidant 0.1～0.5 part,
Cationic initiators 1～5 parts,
Free radical type Photoepolymerizationinitiater initiater 1～5 parts.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that: described acrylate is epoxy monoacrylate or urethane acrylate；Described epoxy resin is aminoepoxy resin or bisphenol A epoxide resin.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that:
The spherical rubber grain that described nanometer nitrile rubber is a kind of powder, faint yellow, fineness is between 80nm-100nm.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that: the steady agent of described light is 2,4-benzophenonedicarboxylic acid or Octabenzone.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that: described diluent is trimethylolpropane trimethacrylate or Ethylene glycol diglycidyl ether；Described defoamer is dimethyl polysiloxane or ethylene oxide propylene oxide copolyether.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that: described levelling agent is preferably organosilicon-epoxide ethane copolymer or organosilicon-epoxide propane copolymer.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1; it is characterized in that: described antioxidant is four (3; 5-di-t-butyl-4-hydroxyl) benzenpropanoic acid pentaerythritol ester, three (2; 4-di-t-butyl) phenyl-phosphite or N; in N'-pair-(3-(3,5-di-tert-butyl-hydroxy phenyl) propiono) hexamethylene diamine two kinds.
A kind of modified light-sensitive resin for rapid shaping the most according to claim 1, it is characterised in that: described cationic initiators is diphenyl iodnium or diaryl sulfonium salt；Described free radical type Photoepolymerizationinitiater initiater is dimethoxybenzoin or chlorinated diphenyl ketone.
9. the preparation method of a kind of modified light-sensitive resin for rapid shaping as described in any one of claim 1-8, it is characterised in that: comprise the following steps:
(1) equipped with in the glass there-necked flask of agitator and condensing tube, be sequentially added into acrylate 25～45 parts, epoxy resin 25～45 parts, diluent 5～25 parts, defoamer 0.5～5 parts, levelling agent 0.5～5 parts, cationic initiators 1～5 parts and free radical type Photoepolymerizationinitiater initiater 1 by proportioning～5 parts mix；
(2) nanometer nitrile rubber 5～30 parts, the steady agent of light 0.1～0.5 part and antioxidant 0.1～0.5 part of continuation mixing are added；
(3) above-mentioned mixed liquor is warming up to 50 DEG C～80 DEG C, ultrasonic disperse 10min～30min to uniform state, i.e. prepare a kind of modified light-sensitive resin for rapid shaping.
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| CN107505813A (en) * | 2017-07-11 | 2017-12-22 | 浙江福斯特新材料研究院有限公司 | A kind of low modulus photosensitive polyimide resin composition |
| CN108546393A (en) * | 2018-07-19 | 2018-09-18 | 东莞蚂蚁三维科技有限公司 | A kind of resistance to ultralow temperature 3D printing photosensitive nanocomposite and its preparation |
| CN109135152A (en) * | 2017-06-16 | 2019-01-04 | 合肥杰事杰新材料股份有限公司 | A kind of carbon fiber ball modified light-sensitive resin composite materials and preparation method thereof |
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Application publication date: 20170104 |