CN106270556A - The method for turning of tungsten titanium target material - Google Patents
The method for turning of tungsten titanium target material Download PDFInfo
- Publication number
- CN106270556A CN106270556A CN201510315997.4A CN201510315997A CN106270556A CN 106270556 A CN106270556 A CN 106270556A CN 201510315997 A CN201510315997 A CN 201510315997A CN 106270556 A CN106270556 A CN 106270556A
- Authority
- CN
- China
- Prior art keywords
- target material
- turning
- titanium target
- cutter
- tungsten titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B1/00—Methods for turning or working essentially requiring the use of turning-machines; Use of auxiliary equipment in connection with such methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/04—Overall shape
- B23B2200/0447—Parallelogram
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/28—Angles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/32—Chip breaking or chip evacuation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
A kind of method for turning of tungsten titanium target material, including: tungsten titanium target material and backboard are provided；Described tungsten titanium target material and backboard are welded together, forms tungsten titanium target material assembly；Using the first cutter that the described tungsten titanium target material in described tungsten titanium target material assembly carries out the first turning, the angle of described first Tool in Cutting sword is 80 °；After described first turning, the described backboard of described tungsten titanium target material assembly is processed；After being processed the described backboard of described tungsten titanium target material assembly, using the second cutter that the blank of described tungsten titanium target material carries out the second turning, the angle of described second Tool in Cutting sword is 35 °～55 °.Described method for turning is to improve the quality of the tungsten titanium target material formed, and slows down the abrasion of cutter.
Description
Technical field
The present invention relates to target technical field, particularly relate to the method for turning of a kind of tungsten titanium target material.
Background technology
Magnetron sputtering is that one utilizes charged particle bombardment target, makes target atom from surface effusion the most uniformly
The substrate coating technique being deposited on substrate.Magnetron sputtering is high with sputtering raste, substrate temperature rise is low, film-base junction
Make a concerted effort, and the metal coating uniformity of excellence and controllability be strong etc., and advantage becomes the most excellent substrate
Coating process, and be widely used in such as integrated circuit, information storage, LCDs, laser and deposit
In the coating process of the electronics such as reservoir, electronic control device and information industry.Along with electronics and information industry
High speed development, in ic manufacturing process, the sizes of substrate of chip improves constantly, and electronic device
Size constantly reduces, and the electronic device integrated level of integrated circuit improves constantly, thus for magnetron sputtering
The uniformitys of plated film etc. require to improve constantly.
Accordingly for the key factor of the coating quality as magnetron sputtering, magnetron sputtering is used
The quality of target also improves constantly.Quality such as the surface of target has important shadow to follow-up magnetron sputtering
Ring.
Making for powder metallurgical technique of tungsten titanium target material.Common tungsten-carbide-titanium carbide-cobalt alloy material can use grinding
Method is processed, it is ensured that its surface quality.But the processing of tungsten titanium target material needs to relate to circular arc or irregular
The processing of shape, and method for grinding is difficult to be machined with the shape of radian or tapering.Therefore, tungsten titanium target material
It is typically only possible by turnery processing.But, on the one hand tungsten is at room temperature in fragility, powdered, and firmly
Spend the highest；On the other hand, titanium alloy intensity is high and hardness is big, when titanium is powdered, easily burns.And
Tungsten titanium target material combines above two characteristic.When above-mentioned reason causes turnery processing tungsten titanium target material, it is desirable to set
Standby power is big, and mould and cutter should have higher intensity and hardness.
During using method for turning processing tungsten titanium target material, if machined parameters selects unreasonable, just
Product corner angle can be caused to occur collapsing the situation at angle, and cutter occurs bursting apart or adding spark etc. occur man-hour
Problem.Further, owing to rapidoprint hardness is high, process tool quick abrasion, in turning process, once
Tool wear, can cause product corner angle to occur collapsing angle in turn, not reach the requirement of finished product target.
Summary of the invention
The problem that the present invention solves is to provide the method for turning of a kind of tungsten titanium target material, the tungsten formed with raising
The quality of titanium target, and slow down the abrasion of cutter.
For solving the problems referred to above, the present invention provides the method for turning of a kind of tungsten titanium target material, including:
The blank of tungsten titanium target material is provided；
Use the first cutter that the blank of described tungsten titanium target material carries out the first turning, described first Tool in Cutting
The angle of sword is 80 °；
After described first turning, use the second cutter that the blank of described tungsten titanium target material is carried out the second turning,
The angle of described second Tool in Cutting sword is 35 °～55 °.
Optionally, the speed of mainshaft that described first turning uses is 30r/min～200r/min, the feeding of employing
Amount is 0.05mm/r～0.20mm/r.
Optionally, the bite that described first turning uses is 0.05mm～0.25mm.
Optionally, the speed of mainshaft that described second turning uses is 30r/min～120r/min, the feeding of employing
Amount is 0.05mm/r～0.15mm/r.
Optionally, the bite that described second turning uses is 0.05mm～0.20mm.
Optionally, the primary clearance of described first cutter is 5 °～11 °.
Optionally, the primary clearance of described second cutter is 5 °～11 °.
Optionally, at least one of described first cutter and the second cutter has chip-breaker.
Optionally, at least one of described first cutter and the second cutter has coating.
Optionally, the material of described coating is TiC, TiN, TiCN, TiAlN or Al2O3。
Compared with prior art, technical scheme has the advantage that
In technical scheme, the first cutter is first used product to be carried out the first turning, then to the back of the body
Plate is processed, then uses the second cutter that product carries out the second turning, and the second Tool in Cutting sword
Angle is less than the angle of the first Tool in Cutting sword, and the angle of two cutters has carried out choosing especially, thus protected
The turning quality of card final products is high.
Meanwhile, in technical scheme, by carrying out twice different turning process, and first
In turning process, use first cutter that angle is 80 ° of cutting edge, owing to being now first turning, right
The requirement of tungsten titanium target material product surface quality relatively can be lower, therefore, with first cutter with 80 ° of angles
Tool, it is ensured that in the first turning process, product is had bigger cutting hardness.In the second turning process,
Use second cutter that angle is 35 °～55 ° of cutting edge, the now surface quality requirements of tungsten titanium target material product
Relatively higher, with angle be 35 °～55 ° to guarantee that product will not collapse angle, it is ensured that the tungsten titanium target material finally given produces
Quality is good, and meanwhile, described method can also effectively slow down the abrasion of cutter, improves the use of cutter
Life-span.
Further, the primary clearance of described first cutter is 5 °～11 °, by the primary clearance control of described first cutter
System, at 5 °～11 °, can make described first cutter possess performance that is sharp and that be less susceptible to abrasion, and first
Cutter is the most easy to wear, can ensure that the quality of tungsten titanium target material product is more stable in turn.
Entering two steps, the primary clearance of described second cutter is 5 °～11 °, by the primary clearance control of described second cutter
System, at 5 °～11 °, can make described second cutter possess performance that is sharp and that be less susceptible to abrasion, and second
Cutter is the most easy to wear, can ensure that the quality of tungsten titanium target material product is more stable in turn.
Accompanying drawing explanation
Fig. 1 is the tungsten titanium target material schematic diagram that the embodiment of the present invention is provided；
Fig. 2 is the backboard schematic diagram that the embodiment of the present invention is provided；
Fig. 3 is the tungsten titanium target material assembly signal being welded into by backboard shown in tungsten titanium target material shown in Fig. 1 and Fig. 2
Figure；
Fig. 4 is the first cutter perspective view that the embodiment of the present invention is provided；
Fig. 5 is the first cutter plan structure schematic diagram shown in Fig. 4；
Fig. 6 is the first cutter cross-sectional view shown in Fig. 4；
Fig. 7 is the second cutter perspective view that the embodiment of the present invention is provided；
Fig. 8 is the second cutter plan structure schematic diagram shown in Fig. 7；
Fig. 9 is the second cutter cross-sectional view shown in Fig. 7.
Detailed description of the invention
Turnery processing poor effect as described in background, in existing method, to tungsten titanium target material product.
Further, tungsten titanium, as the main component of Hardmetal materials, uses widely, in turn in cutter
May certify that, the processing of tungsten titanium target material has bigger difficulty.
To this end, the present invention provides the method for turning of a kind of tungsten titanium target material, first use the first cutter that product is entered
Row the first turning, is then processed backboard, then uses the second cutter that product is carried out the second turning,
And the angle of the second Tool in Cutting sword is less than the angle of the first Tool in Cutting sword, the angle of two cutters enters
Go and chosen especially, thus ensured that the turning quality of final products is high.
Understandable, below in conjunction with the accompanying drawings for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from
The specific embodiment of the present invention is described in detail.
The embodiment of the present invention provides the method for turning of a kind of tungsten titanium target material, incorporated by reference to referring to figs. 1 to Fig. 9.
Incorporated by reference to reference to Fig. 1 and Fig. 2, it is provided that tungsten titanium target material 100 and backboard 200.Tungsten titanium target material 100 wraps
Including first surface 100A, second surface 100B and the 3rd surface 100C, wherein the 3rd surface 100C is
Solder side.Backboard 200 includes first surface 200A, second surface 200B and the 3rd surface 200C, its
A part at least within of middle first surface 200A is solder side.
In the present embodiment, the forming method of tungsten titanium target material 100 can be: is put into very by tungsten-titanium alloy powder
In empty hot pressed sintering mould, select vacuum heating-press sintering mould according to the dimensional requirement of tungsten titanium target material finished product
Size；The tungsten-titanium alloy powder being seated in vacuum heating-press sintering mould is compacted, such as, can use
Stainless-steel sheet is compacted the tungsten-titanium alloy powder being seated in vacuum heating-press sintering mould；Tungsten will be filled with
The vacuum heating-press sintering mould of titanium alloy powder is put in vacuum sintering funace, carries out vacuum heating-press sintering,
Obtain single tungsten-titanium alloy target blank, tungsten-titanium alloy target blank be closely sized to tungsten titanium target material end product rule
Very little；Tungsten titanium target material 100 blank is carried out further machining, to obtain tungsten titanium target material 100.Other
In embodiment, it is possible to form tungsten titanium target material 100 otherwise.
In the present embodiment, backboard 200 can be copper backboard or aluminum backboard.
Refer to Fig. 3, tungsten titanium target material 100 and backboard 200 are welded together, form tungsten titanium target material assembly
300.Specifically by the 3rd surface 100C and the first surface 200A welding of backboard 200 of tungsten titanium target material 100
Together.
In the present embodiment, tungsten titanium target material 100 solder side can be carried out Nickel Plating Treatment, so that tungsten titanium target material
100 solders when welding with backboard 200 can evenly be distributed between the two, and the welding increasing both is firm
Degree.
Incorporated by reference to reference to Fig. 4 and Fig. 6, use the first cutter 400 to the tungsten titanium in tungsten titanium target material assembly 300
Target 100 carries out the first turning.
Fig. 4 shows the stereochemical structure of the first cutter 400, and as can be seen from Figure 4, the first cutter 400 has dress
Distribution 400a.Two of first cutter 400 is cutting edge.First cutter 400 can use hard to close
Gold copper-base alloy makes.
Fig. 5 shows the plan structure of the first cutter 400, as can be seen from Figure 5, the first cutter 400 cutting edge
Included angle be 80 °.
Owing to tungsten titanium target material 100 Product processing is very fast to the abrasion ratio of cutter, mark the most generally can be used
Accurate turning insert, to ensure the dimensionally stable of product, and ensures turning insert replacing convenience after abrasion.
And conventional standard cutter cutting edge has 90 °, 80 °, 55 ° and 35 ° of several angles.In the present embodiment, examine
Considering in the first turning process, requiring tungsten titanium target material 100 product surface quality relatively can be lower, and
Intensity and chip removal for ensureing blade are easier to, and select the most rational 80 ° of cutting edges as the first cutter 400 to press from both sides
Angle φ.
Fig. 6 shows the cross-section structure of the first cutter 400, as can be seen from Figure 6, after the master of the first cutter 400
Angle θ is 5 °～11 °, and (angle between cutter rake face and basal plane is referred to as anterior angle, knife face and cutting plane after master
Between angle be referred to as primary clearance, as shown in Figure 6).First cutter 400 needs to possess sharp and is difficult to mill
The feature damaged, therefore, using primary clearance θ is 5 °～the cutter of 11 °, concrete primary clearance θ can be 5 °, 7 °,
9 ° or 11 °.Primary clearance θ cutter in this range can make the more difficult abrasion of cutter, thus ensures tungsten
The quality of titanium target 100 product is more more stable.
Knowable to Fig. 4 and Fig. 6 combines, the first cutter 400 upper surface has chip-breaker 401.Chip-breaker
401 are conducive in working angles, and chip breaking is easier to and discharges more in time, thus does not affect follow-up turning
Process.
In the present embodiment, the first cutter 400 can have coating.During the first cutter 400 coating,
Its anti-wear performance more preferably so that the first cutter 400 is the most easy to wear, can be further ensured that tungsten titanium target
The quality of material 100 product is more stable.
In the present embodiment, the material of described coating can be TiC, TiN, TiCN, TiAlN or Al2O3。
In the present embodiment, described first turning use the speed of mainshaft be 30r/min～200r/min (rev/min
Clock).In described first turning process, when the speed of mainshaft is more than 200r/min, the first cutter 400
Abrasion ratio is very fast, and in turning process, it may appear that the situation of Mars.Therefore, the present embodiment will be main
Axle rotating speed controls at below 200r/min, thus prevents the appearance of Mars.Additionally, by speed of mainshaft control
At more than 30r/min, to ensure turning efficiency.
In the present embodiment, described first turning use the amount of feeding be 0.05mm/r～0.20mm/r (millimeter/
Turn).The amount of feeding when 0.05mm/r～0.20mm/r, the abrasion of the first cutter 400 and feelings of Mars occur
Condition is all controlled in more satisfactory scope, when the amount of feeding is more than 0.20mm/r, then and the first cutter 400
There will be Mars, and abrasion condition be serious, and immediately following be that product corner angle occur collapsing angle.And
When the amount of feeding is less than 0.05mm/r, the turning cycle is longer.Therefore, the present embodiment, the amount of feeding is controlled
0.05mm/r～0.20mm/r.
In the present embodiment, the bite that described first turning uses is 0.05mm～0.25mm (millimeter).Eat
Cutter amount is when more than 0.2mm, and tool wear is fast, and Mars easily occurs in the course of processing, and corner angle are easier
Collapsing the situation at angle, and bite is when 0.05mm～0.25mm, product does not haves and collapses angle situation.
The present embodiment provided first be machined in backboard 200 processing before carry out, and use anti-wear performance
Good and that turning intensity is high the first cutter 400, choosing through above-mentioned technological parameter simultaneously, thus by product
Surface Machining smooth.
Though figure does not shows, but the backboard 200 after described first turning, to tungsten titanium target material assembly 300
It is processed.
In the present embodiment, it is processed being included in backboard 200 to the backboard 200 of tungsten titanium target material assembly 300
At least one of upper fabrication and installation hole, screw hole and air discharge duct.Installing hole is for follow-up by tungsten titanium target
Material assembly 300 is arranged on board, such as on magnetron sputtering apparatus.Screw hole is used for locking screw rod, institute
State screw rod for the extraction of whole tungsten titanium target material assembly 300 and movement, thus avoid direct contact with backboard 200
Or tungsten titanium target material 100, thus ensure the performance of tungsten titanium target material assembly 300.Air discharge duct is produced on backboard
The part of the 200 unwelded tungsten titanium target materials of first surface 100, has coordinated evacuation for follow-up with sealing ring
Process.
Incorporated by reference to reference to Fig. 7 to Fig. 9, after the backboard 200 of tungsten titanium target material assembly 300 is processed,
Use the second cutter 500 that the blank of tungsten titanium target material 100 is carried out the second turning.Second cutter 500 is permissible
Employing Hardmetal materials makes.
Fig. 7 shows the stereochemical structure of the second cutter 500, and as can be seen from Figure 7, the second cutter 500 has dress
Distribution 500a.Two of second cutter 500 is cutting edge.
Fig. 8 shows the plan structure of the second cutter 500, as it can be observed in the picture that the second cutter 500 cutting edge
Angle α be 35 °～55 °.
Second turning requires to make the surface quality of tungsten titanium target material 100 product reach higher requirement, and arranges
Bits need better, use the cutter of 35 °～55 ° cutting edge angles, thus on the one hand increase chip removal ability,
On the other hand, make cutter sharper.Concrete, the angle α of the second cutter 500 cutting edge can be
35 °, 45 ° or 55 ° etc..
Fig. 9 shows the cross-section structure of the second cutter 500, as can be seen from Figure 6, after the master of the second cutter 500
Angle beta is 5 °～11 °.
Second cutter 500 needs also exist for possessing sharp and nonabradable feature, therefore, uses primary clearance β
Being 5 °～the cutter of 11 °, concrete primary clearance β can be 5 °, 7 °, 9 ° or 11 °.Primary clearance β is in this scope
Interior cutter can make the more difficult abrasion of cutter, thus ensures that the quality of tungsten titanium target material 100 product is more steady
Fixed.
Knowable to Fig. 7 and Fig. 9 combines, the second cutter 500 upper surface has chip-breaker 501.Chip-breaker
501 are conducive in working angles, and chip breaking is easier to and discharges more in time, thus does not affect follow-up turning
Journey.
In the present embodiment, the second cutter 500 can have coating.During the second cutter 500 coating,
Its anti-wear performance more preferably so that the second cutter 500 is the most easy to wear, can be further ensured that tungsten titanium target
The quality of material 100 product is more stable.
In the present embodiment, the material of described coating can be TiC, TiN, TiCN, TiAlN or Al2O3。
In the present embodiment, the speed of mainshaft that described second turning uses is 30r/min～120r/min, at main shaft
When rotating speed is more than 120r/min, the second cutter 500 abrasion ratio is very fast, and in turning process, it may appear that fire
The situation of star.Therefore, the speed of mainshaft is controlled at below 120r/min.Meanwhile, in order in view of turning
Efficiency, generally controls the speed of mainshaft that the second turning uses at more than 30r/min.
In the present embodiment, the amount of feeding that described second turning uses is 0.05mm/r～0.15mm/r.In feeding
When amount is for 0.05mm/r～0.15mm/r, the second cutter 500 weares and teares and occurs that the situation of Mars obtains comparing reason
The control thought, and the amount of feeding is once more than 0.15mm/r, the second cutter 500 there will be Mars, follows
Be that product corner angle there will be and collapse angle.
In the present embodiment, the bite that described second turning uses is 0.05mm～0.20mm.Bite surpasses
When crossing 0.2mm, the second cutter 500 quick abrasion, need to change quickly cutter, and the corner angle of product
It is easier to collapse the situation at angle, and when bite is less than 0.05mm, the course of processing is the slowest.
In the second turning process that the present embodiment is carried out, the second cutter 500 to the first cutter 400 is more
Sharp, and chip removal effect is more preferable, and therefore, after the second turning is carried out, the quality of product surface can be very well.
It should be strongly noted that existing method is generally after processing backboard 200, then carry out turning,
Now, corresponding turning process can affect installing hole, screw hole or the air discharge duct etc. that the course of processing is formed.
Another kind of existing method is after turning process, then processes backboard 200, and this mode can affect car
Cut the product surface quality after processing, cause turning effect to decline to a great extent.And the tungsten that the present embodiment is provided
In the method for turning of titanium target, the first cutter 400 is first used product to be carried out the first turning, then to the back of the body
Plate 200 is processed, then uses the second cutter 500 that product carries out the second turning, and the second cutter
The angle of 500 cutting edges is less than the angle of the first cutter 400 cutting edge, and the angle of two cutters has carried out spy
Do not choose, thus ensure that the turning quality of final products is high.
In the method for turning of the tungsten titanium target material that the present embodiment is provided, by carrying out twice different turning
In journey, and the first turning process, use first cutter 400 that angle is 80 ° of cutting edge, due to this
Time be first turning, the requirement to tungsten titanium target material 100 product surface quality relatively can be lower, therefore, use
There is the first cutter 400 of 80 ° of angles, it is ensured that the first turning process has bigger cutting to product strong
Degree.In the second turning process, use second cutter 500 that angle is 35 °～55 ° of cutting edge, now
The surface quality requirements of tungsten titanium target material 100 product is higher, with angle be 35 °～55 ° to guarantee that product will not
Collapse angle, it is ensured that tungsten titanium target material 100 product quality finally given is good, and meanwhile, described method can also
Effectively slow down the abrasion of cutter, improve cutting-tool's used life.
When the method for turning of the tungsten titanium target material not using this enforcement to be provided, per car one cutter all can occur
Mars, when the second cutter turning, corner angle there will be the situation collapsing angle in most cases, and product has no idea to add
Work.And after using this programme, corresponding cutter situation is at diameter 300mm and the cylinder of thickness 10mm
On, offside facing processing about 5mm, product corner angle do not have the situation collapsing angle, and end face is processed 1mm
Left and right, product corner angle do not have the situation collapsing angle yet.
Although present disclosure is as above, but the present invention is not limited to this.Any those skilled in the art,
Without departing from the spirit and scope of the present invention, all can make various changes or modifications, therefore the guarantor of the present invention
The scope of protecting should be as the criterion with claim limited range.
Claims (10)
1. the method for turning of a tungsten titanium target material, it is characterised in that including:
Tungsten titanium target material and backboard are provided；
Described tungsten titanium target material and backboard are welded together, forms tungsten titanium target material assembly；
Use the first cutter that the described tungsten titanium target material in described tungsten titanium target material assembly is carried out the first turning, institute
The angle stating the first Tool in Cutting sword is 80 °；
After described first turning, the described backboard of described tungsten titanium target material assembly is processed；
After the described backboard of described tungsten titanium target material assembly is processed, use the second cutter to described tungsten
The blank of titanium target carries out the second turning, and the angle of described second Tool in Cutting sword is 35 °～55 °.
2. the method for turning of tungsten titanium target material as claimed in claim 1, it is characterised in that described first turning is adopted
The speed of mainshaft be 30r/min～200r/min, the amount of feeding of employing is 0.05mm/r～0.20mm/r.
3. the method for turning of tungsten titanium target material as claimed in claim 1 or 2, it is characterised in that described first car
The bite cutting employing is 0.05mm～0.25mm.
4. the method for turning of tungsten titanium target material as claimed in claim 1, it is characterised in that described second turning is adopted
The speed of mainshaft be 30r/min～120r/min, the amount of feeding of employing is 0.05mm/r～0.15mm/r.
5. the method for turning of the tungsten titanium target material as described in claim 1 or 4, it is characterised in that described second car
The bite cutting employing is 0.05mm～0.20mm.
6. the method for turning of tungsten titanium target material as claimed in claim 1, it is characterised in that described first cutter
Primary clearance is 5 °～11 °, and the primary clearance of described second cutter is 5 °～11 °.
7. the method for turning of tungsten titanium target material as claimed in claim 1, it is characterised in that described first cutter and
At least one of second cutter has chip-breaker.
8. the method for turning of tungsten titanium target material as claimed in claim 1, it is characterised in that described first cutter and
At least one of second cutter has coating.
9. the method for turning of tungsten titanium target material as claimed in claim 8, it is characterised in that the material of described coating
For TiC, TiN, TiCN, TiAlN or Al2O3。
10. the method for turning of tungsten titanium target material as claimed in claim 9, it is characterised in that described backboard is carried out
Processing is included on described backboard fabrication and installation hole, screw hole and air discharge duct at least one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510315997.4A CN106270556A (en) | 2015-06-10 | 2015-06-10 | The method for turning of tungsten titanium target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510315997.4A CN106270556A (en) | 2015-06-10 | 2015-06-10 | The method for turning of tungsten titanium target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106270556A true CN106270556A (en) | 2017-01-04 |
Family
ID=57659290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510315997.4A Pending CN106270556A (en) | 2015-06-10 | 2015-06-10 | The method for turning of tungsten titanium target material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106270556A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108620816A (en) * | 2017-03-24 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The processing method of target blankss |
| CN108620815A (en) * | 2017-03-24 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The processing method of target blankss |
| CN108620812A (en) * | 2017-03-17 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The manufacturing method of target material assembly |
| CN108660423A (en) * | 2017-03-28 | 2018-10-16 | 宁波江丰电子材料股份有限公司 | The method for turning of target material assembly |
| CN108687488A (en) * | 2017-04-06 | 2018-10-23 | 宁波江丰电子材料股份有限公司 | Target blankss and its processing method |
| CN108687361A (en) * | 2017-04-12 | 2018-10-23 | 宁波江丰电子材料股份有限公司 | Fixed ring method for turning for chemical mechanical grinding |
| CN113042974A (en) * | 2021-02-18 | 2021-06-29 | 宁波江丰电子材料股份有限公司 | Titanium target processing method, processed titanium target and application |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5397050A (en) * | 1993-10-27 | 1995-03-14 | Tosoh Smd, Inc. | Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby |
| CN101613851A (en) * | 2009-07-27 | 2009-12-30 | 宁波江丰电子材料有限公司 | The working method of titanium target |
| JP2011208265A (en) * | 2010-03-30 | 2011-10-20 | Sanyo Special Steel Co Ltd | Method for producing sputtering target material |
| CN102366833A (en) * | 2011-11-21 | 2012-03-07 | 宁波江丰电子材料有限公司 | Production method of tungsten-titanium target blank |
| CN102400004A (en) * | 2011-11-25 | 2012-04-04 | 宁波江丰电子材料有限公司 | Manufacturing methods of tungsten-titanium alloy target billet and target material |
| CN104513952A (en) * | 2013-09-30 | 2015-04-15 | 宁波江丰电子材料股份有限公司 | Manufacturing method of target material assembly and the target material assembly |
| CN104668883A (en) * | 2013-12-03 | 2015-06-03 | 宁波江丰电子材料股份有限公司 | Processing method of target module sputtering surface |
-
2015
- 2015-06-10 CN CN201510315997.4A patent/CN106270556A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5397050A (en) * | 1993-10-27 | 1995-03-14 | Tosoh Smd, Inc. | Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby |
| CN101613851A (en) * | 2009-07-27 | 2009-12-30 | 宁波江丰电子材料有限公司 | The working method of titanium target |
| JP2011208265A (en) * | 2010-03-30 | 2011-10-20 | Sanyo Special Steel Co Ltd | Method for producing sputtering target material |
| CN102366833A (en) * | 2011-11-21 | 2012-03-07 | 宁波江丰电子材料有限公司 | Production method of tungsten-titanium target blank |
| CN102400004A (en) * | 2011-11-25 | 2012-04-04 | 宁波江丰电子材料有限公司 | Manufacturing methods of tungsten-titanium alloy target billet and target material |
| CN104513952A (en) * | 2013-09-30 | 2015-04-15 | 宁波江丰电子材料股份有限公司 | Manufacturing method of target material assembly and the target material assembly |
| CN104668883A (en) * | 2013-12-03 | 2015-06-03 | 宁波江丰电子材料股份有限公司 | Processing method of target module sputtering surface |
Non-Patent Citations (1)
| Title |
|---|
| 钟丽珠: "《数控加工编程与操作》", 31 August 2009, 北京理工大学出版社 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108620812A (en) * | 2017-03-17 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The manufacturing method of target material assembly |
| CN108620812B (en) * | 2017-03-17 | 2019-10-22 | 宁波江丰电子材料股份有限公司 | The manufacturing method of target material assembly |
| CN108620816A (en) * | 2017-03-24 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The processing method of target blankss |
| CN108620815A (en) * | 2017-03-24 | 2018-10-09 | 宁波江丰电子材料股份有限公司 | The processing method of target blankss |
| CN108620815B (en) * | 2017-03-24 | 2019-09-06 | 宁波江丰电子材料股份有限公司 | The processing method of target blankss |
| CN108620816B (en) * | 2017-03-24 | 2020-04-21 | 宁波江丰电子材料股份有限公司 | Method for processing target blank |
| CN108660423A (en) * | 2017-03-28 | 2018-10-16 | 宁波江丰电子材料股份有限公司 | The method for turning of target material assembly |
| CN108687488A (en) * | 2017-04-06 | 2018-10-23 | 宁波江丰电子材料股份有限公司 | Target blankss and its processing method |
| CN108687361A (en) * | 2017-04-12 | 2018-10-23 | 宁波江丰电子材料股份有限公司 | Fixed ring method for turning for chemical mechanical grinding |
| CN113042974A (en) * | 2021-02-18 | 2021-06-29 | 宁波江丰电子材料股份有限公司 | Titanium target processing method, processed titanium target and application |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106270556A (en) | The method for turning of tungsten titanium target material | |
| CN104416325B (en) | The preparation method of tungsten target material | |
| CN100402232C (en) | Carbide alloy metal saw production process | |
| EP1016479A2 (en) | Cutting tool | |
| CN104668883A (en) | Processing method of target module sputtering surface | |
| JPWO2016031921A1 (en) | Cutting insert, cutting tool, and method of manufacturing cut workpiece | |
| CN112404461A (en) | Turning method of titanium target assembly | |
| CN108620812B (en) | The manufacturing method of target material assembly | |
| CN108655416A (en) | The method for turning of gold target material | |
| CN113996819B (en) | Sputtering arc surface machining method of circular molybdenum target assembly | |
| CN105755435A (en) | A sputtering surface machining method for a titanium target material | |
| JPH05301104A (en) | Throw away tip and its manufacture, and cutting tool | |
| WO2021197215A1 (en) | Blank body, and cutting tool having front cutter face made of helical superhard material | |
| JP7112584B2 (en) | Diamond cutting tools for hard brittle and difficult-to-cut materials | |
| CN113547390A (en) | Tungsten target assembly and surface processing method thereof | |
| CN101733412B (en) | Method for cutting and processing high-purity chromium target | |
| CN209532130U (en) | A kind of circular cut blade | |
| CN110769600A (en) | Processing method of V-shaped groove of super-thick metal substrate printed board | |
| CN107470650A (en) | The processing method of silver-colored target | |
| JPH0725619B2 (en) | Surface coated cubic boron nitride based ultra high pressure sintering material for cutting tools | |
| CN103707003A (en) | Method for machining tungsten and titanium alloy plates | |
| CN101905489A (en) | Machining method of precise and fine graphite electrodes by using diamond coated cutting tool | |
| CN104708294A (en) | Method for machining hard alloy cutter | |
| CN209811254U (en) | Curved surface groove type high-light cutter | |
| CN107662008A (en) | The processing method that titanium prevents plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170104 |