CN106248692A - A kind of method of micro-imaging field depth extending and microscopic imaging device - Google Patents

A kind of method of micro-imaging field depth extending and microscopic imaging device Download PDF

Info

Publication number
CN106248692A
CN106248692A CN201610633729.1A CN201610633729A CN106248692A CN 106248692 A CN106248692 A CN 106248692A CN 201610633729 A CN201610633729 A CN 201610633729A CN 106248692 A CN106248692 A CN 106248692A
Authority
CN
China
Prior art keywords
wavefront coded
imaging device
coded plate
microscopic imaging
wavefront
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610633729.1A
Other languages
Chinese (zh)
Inventor
武东城
刘江
苗二龙
高松涛
张敏
隋永新
杨怀江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Original Assignee
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun Institute of Optics Fine Mechanics and Physics of CAS filed Critical Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority to CN201610633729.1A priority Critical patent/CN106248692A/en
Publication of CN106248692A publication Critical patent/CN106248692A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9511Optical elements other than lenses, e.g. mirrors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens
    • G01N2021/9583Lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

The present invention provides a kind of method of micro-imaging field depth extending in optical element flaw inspection, and described method includes: add wavefront coded plate in microscopic imaging device;Light angle after adding wavefront coded plate is analyzed by the multiplying power of the object lens according to microscopic imaging device;According to field depth extending and the requirement of adaptation different multiplying microcobjective imaging, wavefront coded plate phase function is improved optimization and analyzes;Determine the optimized design parameter of the wavefront coded plate of design;And wavefront coded plate is configured, by the depth of field of the described wavefront coded plate continuation microscopic imaging device with optimized design parameter according to the design parameter after optimizing.The present invention also provides for a kind of microscopic imaging device.By method and the microscopic imaging device of the present invention, can the depth of field of continuation microscopic imaging device and be applicable to, without multiplying power microcobjective, meet the demand of high-precision optical element flaw inspection significantly.

Description

A kind of method of micro-imaging field depth extending and microscopic imaging device
Technical field
The invention belongs to optical imaging field, relate to a kind of micro-to different multiplying in optical element flaw inspection The depth of field of mirror imaging carries out method and the microscopic imaging device of continuation.
Background technology
Along with the high-precision trend of optical element surface, when there is defect etc. on high-precision optical element surface, can relatively great Cheng Degree ground affects image quality, causes unnecessary scattering and diffraction, in turn results in energy loss, for large aperture telescope, state Family igniter, lithographic objective etc., especially can cause the biggest energy loss.Therefore, it is necessary to planar optical elements in whole inspection During carry out the detection of its beauty defects, its defect feature assessed by digitized, and then provides for high-precision optical processing and instruct Data.And in high accuracy photoetching projection objective lens, country's igniter, have increasing sphere and aspheric surface to need high-precision The flaw inspection of degree.
Along with the high-precision trend of optical element surface, when there is defect etc. on high-precision optical element surface, for big mouth Footpath telescope, country igniter, lithographic objective etc., can cause the biggest energy loss.And at heavy caliber sphere and aspheric During flaw inspection, owing to there is focusing difficulty, by the existence of work stage movement locus error, add for micron dimension defect Sick measurement needs high power microscope head, and depth of focus is at several microns, it is easy to occur that fuzzy or out of focus the situation of focusing occurs, This limits far away high accuracy sphere and aspherical optical element flaw inspection.Even if depth of field problem can solve, but due to In imaging process, imaging system needs to use the microcobjective of different multiplying, facilitates detection radius of curvature relatively big or plane Optical element surface defect, but, existing detection method, be difficult to a certain extent be applicable to different multiplying microcobjective Imaging system/device.
Summary of the invention
During solving to measure sphere and aspherical optical element beauty defects by micro-imaging technique at present, go out Existing focusing difficulty, out of focus and be difficult to be applicable to the problems such as different multiplying microcobjective, the present invention proposes a kind of micro-imaging Method and the microscopic imaging device of field depth extending solve the problems referred to above.
On the one hand, it is provided that a kind of method of micro-imaging field depth extending in optical element flaw inspection, described method Including: in microscopic imaging device, add wavefront coded plate;Compile adding wavefront according to the multiplying power of object lens in microscopic imaging device Light angle after code plate is analyzed;According to field depth extending and the requirement of adaptation different multiplying microcobjective imaging, right Wavefront coded plate phase function improves optimization and analyzes;Determine the optimized design parameter of the wavefront coded plate of design; And wavefront coded plate is configured, by the described wavefront with optimized design parameter according to the design parameter after optimizing The depth of field of encoding board continuation microscopic imaging device.
Wherein, described step " adds wavefront coded " to include in microscopic imaging device: at the object lens of microscopic imaging device Optical path on add the modified model wavefront coded plate of irintegral number power type.
Wherein, the light after adding wavefront coded plate " is entered by described step according to the multiplying power of the object lens of microscopic imaging device Firing angle degree is analyzed " including: analyze the change between the design parameter in light angle and wavefront coded plate phase function Change relation;And preferably design parameter is determined in wavefront coded plate phase function according to preferably incident angle;Wherein, institute The expression formula of the wavefront coded plate phase function of design is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2x)
X, y are the space coordinates of the imaging pupil plane of object, and α, β are described design parameter.
Wherein, described step " described according to optical system field depth extending and adapt to different multiplying microcobjective imaging want Ask, improve wavefront coded plate phase function to optimize and include with analysis: according to the field depth of required continuation and micro- The multiple of object lens determines out of focus position, utilizes Fourier transformation to calculate the modulation transfer function (MTF) in each out of focus position, and passes through Inhibition function choose wherein meet condition coefficient combination, and then combine majorized function obtain optimum design parameter.
Wherein, the design parameter of described optimum is α=171.31, β=1.52.
Wherein, described method further comprise the steps of: determine wavefront coded plate optimal design parameters after, pass through computer Analog simulation, the imaging results whether microscopic imaging device with different multiplying microcobjective adds wavefront coded plate is carried out Contrast.
Wherein, described step " determine wavefront coded plate optimal design parameters after, by computer simulation emulation, The imaging results whether microscopic imaging device with different multiplying microcobjective adds wavefront coded plate contrasts " bag Include: carry out computer generated image emulation microscopic imaging device, be respectively adopted and there is the first multiplying power microcobjective, the second micro-thing of multiplying power The microscopic imaging device of mirror, corresponding NA (numerical aperture) number is 0.2, and target object is set to have different space frequency and divides The resolution test plate of line, respectively to having the first multiplying power microcobjective, the microscopic imaging device of the second multiplying power microcobjective Add wavefront coded plate and be not added with the imaging results of wavefront coded plate and contrast.
On the other hand, also providing for a kind of microscopic imaging device, described microscopic imaging device includes object lens and wavefront coded Plate, described wavefront coded plate is positioned on the optical path of object lens.
Wherein, described wavefront coded plate is the modified model wavefront coded plate of irintegral number power type, the wavefront coded device added Having the optimized parameter corresponding with the multiplying power of object lens, described optimized parameter is the optimal design ginseng of wavefront coded plate phase function Number, the expression formula of described wavefront coded plate phase function is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2x)
Wherein, x, y are the space coordinates of the imaging pupil plane of object, and α, β are design parameter.
Wherein, optimized parameter is to be analyzed, then according to scape by the light angle after adding wavefront coded plate Deep continuation and the requirement of adaptation different multiplying microcobjective imaging, improve optimization and analyze wavefront coded plate phase function Obtain.
The method of the micro-imaging field depth extending of the present invention and microscopic imaging device, achieve the depth of field by simple structure The purpose of continuation, solves that the focusing of sphere and aspherical optical element is difficult, depth of field out of focus little, easy and be difficult in adapt to different times The problem of the micro-eyepiece of rate, meets the purpose of high accuracy sphere and the detection of aspherical optical element beauty defects.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing In having technology to describe, the required accompanying drawing used is briefly described, it should be apparent that, the accompanying drawing in describing below is only this Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to Other obvious mode of texturing is obtained according to these accompanying drawings.
Fig. 1 is the flow chart of the method for the micro-imaging field depth extending in an embodiment of the present invention;
Fig. 2 is the flow chart of the method for the micro-imaging field depth extending in another embodiment of the present invention;
Fig. 3 is the performance comparison figure in an embodiment of the present invention before and after the wavefront coded plate of microscopic imaging device interpolation;
Fig. 4 is the subelement schematic diagram in the microscopic imaging device in an embodiment of the present invention;
Fig. 5 is that the light angle of the microscopic imaging device adding wavefront coded plate in an embodiment of the present invention is shown It is intended to;
The position phasor of the Fig. 6 wavefront coded plate by being added in microscopic imaging device in an embodiment of the present invention.
Specific embodiment
In order to make the purpose of the present invention, technical scheme and advantage clearer, below in conjunction with accompanying drawing and be embodied as Example, is further elaborated to the present invention.Should be appreciated that specific embodiment described herein is only in order to explain this Bright, and be not construed as limiting the invention.
Referring to Fig. 1, for the flow chart of a kind of method of micro-imaging field depth extending, described method is used for optical element defect The field depth extending of the micro-imaging in sick detection, it is especially useful in the depth of field having in the micro-imaging of different multiplying microcobjective is prolonged Opening up, described method step is as follows:
Step S101: add wavefront coded plate in microscopic imaging device.Wherein, described addition in microscopic imaging device Wavefront coded plate is to add described wavefront coded plate on the optical path of the object lens of microscopic imaging device.It is specially at object lens Rear adds described wavefront coded plate.Wherein, the wavefront coded plate of described addition is that modified model irintegral number power type is wavefront coded Plate.
Step S103: according to the multiplying power of the object lens of microscopic imaging device to adding the light angle after wavefront coded plate It is analyzed.Concrete, described it is analyzed including to the light angle after adding wavefront coded plate: analyze light The variation relation between design parameter in angle and wavefront coded plate phase function.Wherein, designed wavefront coded plate position The expression formula of phase function is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2X) formula (1)
In formula (1), x, y are the space coordinates of the imaging pupil plane of object, and α, β are design parameter.Described to adding incoming wave Light angle after front encoding board is analyzed also including: analyze in light angle and wavefront coded plate phase function Design parameter between variation relation after, determine in wavefront coded plate phase function preferably according to preferably incident angle Design parameter.
Step S105: according to field depth extending and the requirement of adaptation different multiplying microcobjective imaging, to wavefront coded plate position Phase function improves optimization and analyzes.Concrete, described according to optical system field depth extending and adapt to the micro-thing of different multiplying The requirement of mirror imaging, improves optimization and includes with analysis: according to the depth of field model of required continuation wavefront coded plate phase function Enclose and the multiple of microcobjective determines out of focus position, utilize Fourier transformation to calculate the modulation transmission letter in each out of focus position Number (Modulation Transfer Function, MTF), and the coefficient sets wherein meeting condition is chosen by inhibition function PF Close, so combine majorized function MF obtain optimum design parameter.
In formula (2), κ is the weight of inhibition function, is used for balancing field depth extending degree and the spatial frequency extent of damage, S.R. (W20, k) be out of focus coefficient be Si Telieer ratio during k.
The effect of inhibition function PF is: owing to imaging system is after adding wavefront coded plate, its optical transfer function OTF's Value drastically can decline along with the raising of spatial frequency, therefore, needs to add inhibition function in optimization, it is to avoid excessively optimize and make Become the loss of spatial frequency, affect the resolution of restored image.
In formula (3), ujAnd viThe normalization space frequency obtained for jth in the horizontal and vertical directions and i position sampling Rate, W20,kFor selected kth out of focus coefficient, Std represents mean square deviation function, and Mean represents function of averaging.
Step S107: determine the optimized design parameter of the wavefront coded plate of design.Concrete, determine the wavefront of design The design parameter of encoding board is α=171.31, β=1.52.
Step S109: be configured wavefront coded plate according to the design parameter after optimizing, has optimization by described The wavefront coded plate of design parameter and the depth of field of continuation microscopic imaging device.
Refer to Fig. 2, for the flow chart of the method for the micro-imaging field depth extending in another embodiment.Side in Fig. 2 Method is with the difference of Fig. 1, after step S105 and before step S107, further comprises the steps of:
S208: determine wavefront coded plate optimal design parameters after, by computer simulation emulation, to having difference Whether the microscopic imaging device of multiplying power microcobjective adds the imaging results of wavefront coded plate contrasts.
Concrete, described by computer simulation emulation, to the microscopic imaging device with different multiplying microcobjective be The contrast of the wavefront coded plate of no interpolation includes: carries out computer generated image emulation microscopic imaging device, is respectively adopted and has first times Rate microcobjective, the microscopic imaging device of the second multiplying power microcobjective, corresponding NA (numerical aperture) number is 0.2, object Body is set to the resolution test plate with different space frequency division line, respectively to have the first multiplying power microcobjective, second The microscopic imaging device of multiplying power microcobjective add wavefront coded plate and be not added with the imaging results of wavefront coded plate carry out right Ratio.
See also Fig. 3, as it is shown on figure 3, carry out as a example by (5 times) and the second multiplying power are as 20X as 5X with the first multiplying power Explanation.For having the microscopic imaging device of 5X microcobjective, after using the wavefront coded plate with corresponding optimized parameter, phase For being provided without the microscopic imaging device of wavefront coded plate, it is possible to ensure blur-free imaging in the range of out of focus 150 microns.Right In having the microscopic imaging device of 20X (again) microcobjective, after using the wavefront coded plate with corresponding optimized parameter, relatively For the microscopic imaging device being provided without wavefront coded plate, it is possible to ensure blur-free imaging in the range of out of focus 40 microns.
Thus, demonstrate after adding the modified model non-integer wavefront coded plate of power type designed, it is ensured that micro- Imaging device out of focus in a big way in still can which solves sphere and aspherical optical element surface defect with blur-free imaging Focus when different multiplying is changed in sick detection the problems such as difficult, easy out of focus.
Refer to Fig. 4, for the part-structure schematic diagram of the microscopic imaging device 100 in an embodiment of the present invention.Micro- Imaging device 100 at least include object lens 10 and be arranged at object lens 10 optical path on wavefront coded plate 20.Described wavefront The encoding board 20 concretely wavefront coded plate of modified model non-integer power type 20.Described wavefront coded plate 20 is specifically arranged at described The rear of object lens 10.
See also Fig. 5, illustrate for adding the light angle of the microscopic imaging device 100 of wavefront coded plate 20 Figure.Described object lens 10 are between wavefront coded device 20 and the object plane 30 of imaging, and incident ray is by after wavefront coded device 20 To object lens 10, then in object plane 30 imaging.By adjusting angle of light degree and the wavefront coded plate position phase letter of wavefront coded device 20 The design parameter of number, can carry out continuation to the depth of field of the object lens 10 of different multiplying.
See also Fig. 6, the position phasor of the wavefront coded device 20 by being added.Wherein, the wavefront coded device added 20 have the optimized parameter corresponding with the multiplying power of object lens 10.Wherein, described optimized parameter is wavefront coded plate phase function Optimum, design parameter.Concrete, the expression formula of described wavefront coded plate phase function is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2x)
Wherein, x, y are the space coordinates of the imaging pupil plane of object, and α, β are design parameter.Described optimized parameter is, logical Crossing the light angle after adding wavefront coded plate to be analyzed, one-level is according to field depth extending and adapts to the micro-thing of different multiplying The requirement of mirror imaging, improves optimization and obtains with analysis wavefront coded plate phase function.Described optimal design parameters is concrete For: α=171.31, β=1.52.
As shown in Fig. 3 above, under computer generated image emulates, for having the micro-imaging of specific factor microcobjective Device 100, after using the wavefront coded plate with corresponding optimized parameter, relative to the micro-one-tenth being provided without wavefront coded plate 20 As for device, it is possible to ensure blur-free imaging in out of focus certain limit.The imaging performance of microscopic imaging device 100 has obtained the biggest Improving, which solves during sphere detects with aspherical optical element beauty defects focuses is difficult to and micro-to having different multiplying The microscopic imaging device 100 of object lens is difficult to problems such as being suitable for.
The microscopic imaging device 100 of the application and method, in optical element flaw inspection, the depth of field of micro-imaging is prolonged Open up, use the mode adding the modified model non-integer wavefront coded plate of power type 20 at the object lens rear of microscopic imaging device 100, knot Structure is simple, is easily achieved in actual applications, is successfully realized the depth of field of different multiplying microcobjective by the simulation of computer The purpose of continuation, solves sphere and aspherical optical element focusing is difficult, the depth of field is little, the problem of easy out of focus, meets applicable Different multiplying microcobjective carries out the purpose of high accuracy sphere and the detection of aspherical optical element beauty defects.
The detailed description of the invention of present invention described above, is not intended that limiting the scope of the present invention.Any basis Various other done by the technology design of the present invention change and deformation accordingly, should be included in the guarantor of the claims in the present invention In the range of protecting.

Claims (10)

1. a method for micro-imaging field depth extending, the field depth extending of the micro-imaging in optical element flaw inspection, It is characterized in that, described method includes:
Wavefront coded plate is added in microscopic imaging device;
According to the multiplying power of object lens in microscopic imaging device, the light angle after adding wavefront coded plate is analyzed;
According to field depth extending and the requirement of adaptation different multiplying microcobjective imaging, wavefront coded plate phase function is improved Optimize and analyze;
Determine the optimized design parameter of the wavefront coded plate of design;And
Wavefront coded plate is configured, by the described wavefront with optimized design parameter according to the design parameter after optimizing The depth of field of encoding board continuation microscopic imaging device.
2. the method for claim 1, it is characterised in that described step " adds wavefront coded " in microscopic imaging device Including:
The optical path of the object lens of microscopic imaging device adds the modified model wavefront coded plate of irintegral number power type.
3. method as claimed in claim 2, it is characterised in that the described step " multiplying power according to the object lens of microscopic imaging device Light angle after adding wavefront coded plate is analyzed " including:
Analyze the variation relation between the design parameter in light angle and wavefront coded plate phase function;And
Preferably design parameter is determined in wavefront coded plate phase function according to preferably incident angle;
Wherein, the expression formula of designed wavefront coded plate phase function is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2x)
X, y are the space coordinates of the imaging pupil plane of object, and α, β are described design parameter.
4. method as claimed in claim 3, it is characterised in that described step is " described according to optical system field depth extending and suitable Answer the requirement of different multiplying microcobjective imaging, wavefront coded plate phase function improved optimization and includes with analysis:
Field depth and the multiple of microcobjective according to required continuation determine out of focus position, utilize Fourier transformation to calculate The modulation transfer function (MTF) of each out of focus position, and the coefficient combination wherein meeting condition is chosen by inhibition function, and then combine Majorized function obtains the design parameter of optimum.
5. method as claimed in claim 4, it is characterised in that the design parameter of described optimum is α=171.31, β=1.52.
6. method as claimed in claim 2, it is characterised in that described method further comprises the steps of:
Determine wavefront coded plate optimal design parameters after, by computer simulation emulation, micro-to having different multiplying Whether the microscopic imaging device of object lens adds the imaging results of wavefront coded plate contrasts.
7. method as claimed in claim 6, it is characterised in that described step " determine wavefront coded plate optimal design After parameter, by computer simulation emulation, whether the microscopic imaging device with different multiplying microcobjective is added wavefront and compiles The imaging results of code plate contrasts " including:
Carry out computer generated image emulation microscopic imaging device, be respectively adopted that to have the first multiplying power microcobjective, the second multiplying power micro- The microscopic imaging device of object lens, corresponding NA (numerical aperture) number is 0.2, and target object is set to have different space frequency The resolution test plate of division line, respectively to the micro-imaging dress with the first multiplying power microcobjective, the second multiplying power microcobjective Put to add wavefront coded plate and be not added with the imaging results of wavefront coded plate and contrast.
8. a microscopic imaging device, including object lens, it is characterised in that described microscopic imaging device also includes wavefront coded plate, Described wavefront coded plate is positioned on the optical path of object lens.
9. microscopic imaging device as claimed in claim 8, it is characterised in that described wavefront coded plate is modified model non-integer The wavefront coded plate of power type, the wavefront coded utensil added has the optimized parameter corresponding with the multiplying power of object lens, described optimum ginseng Number is the optimal design parameters of wavefront coded plate phase function, and the expression formula of described wavefront coded plate phase function is:
Ψ (x, y)=α (x3+y3)+β(x2y+y2x)
Wherein, x, y are the space coordinates of the imaging pupil plane of object, and α, β are design parameter.
10. microscopic imaging device as claimed in claim 9, it is characterised in that optimized parameter is by adding wavefront coded plate After light angle be analyzed, then according to field depth extending and adapt to different multiplying microcobjective imaging requirement, right Wavefront coded plate phase function improves to optimize and obtains with analyzing.
CN201610633729.1A 2016-08-04 2016-08-04 A kind of method of micro-imaging field depth extending and microscopic imaging device Pending CN106248692A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610633729.1A CN106248692A (en) 2016-08-04 2016-08-04 A kind of method of micro-imaging field depth extending and microscopic imaging device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610633729.1A CN106248692A (en) 2016-08-04 2016-08-04 A kind of method of micro-imaging field depth extending and microscopic imaging device

Publications (1)

Publication Number Publication Date
CN106248692A true CN106248692A (en) 2016-12-21

Family

ID=58079267

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610633729.1A Pending CN106248692A (en) 2016-08-04 2016-08-04 A kind of method of micro-imaging field depth extending and microscopic imaging device

Country Status (1)

Country Link
CN (1) CN106248692A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108152299A (en) * 2017-12-12 2018-06-12 长光卫星技术有限公司 The beauty defects detection device and detection method of high-precision optical element
CN110018564A (en) * 2019-03-12 2019-07-16 北京威睛光学技术有限公司 A kind of optical imaging system of the big field depth extending in wavefront coded space

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101046547A (en) * 2007-01-26 2007-10-03 浙江金成科技发展有限公司 Digital telescope system with great field depth
CN102007440A (en) * 2008-02-15 2011-04-06 全视Cdm光学有限公司 Circularly symmetric aspheric optics providing non-monotonic wavefront phase profile and extended depth of field
CN102798971A (en) * 2012-04-09 2012-11-28 宁波工程学院 10X-100X large-depth-of-field digital microscopic imaging system group
CN102879895A (en) * 2012-09-14 2013-01-16 浙江理工大学 Digital microscope system with large DOF (depth of field)
CN103197411A (en) * 2013-03-20 2013-07-10 中国科学院苏州生物医学工程技术研究所 Phase plate assembly and microscope system with field depth changeable
CN204964858U (en) * 2015-09-21 2016-01-13 浙江水晶光电科技股份有限公司 Exempt from to focus projection objective and projecting apparatus based on wavefront code

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101046547A (en) * 2007-01-26 2007-10-03 浙江金成科技发展有限公司 Digital telescope system with great field depth
CN102007440A (en) * 2008-02-15 2011-04-06 全视Cdm光学有限公司 Circularly symmetric aspheric optics providing non-monotonic wavefront phase profile and extended depth of field
CN102798971A (en) * 2012-04-09 2012-11-28 宁波工程学院 10X-100X large-depth-of-field digital microscopic imaging system group
CN102879895A (en) * 2012-09-14 2013-01-16 浙江理工大学 Digital microscope system with large DOF (depth of field)
CN103197411A (en) * 2013-03-20 2013-07-10 中国科学院苏州生物医学工程技术研究所 Phase plate assembly and microscope system with field depth changeable
CN204964858U (en) * 2015-09-21 2016-01-13 浙江水晶光电科技股份有限公司 Exempt from to focus projection objective and projecting apparatus based on wavefront code

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JIANG LIU ET AL.: "Optimization of Wavefront Coding Phase Mask Applied to 5X-40X Micro-Objectives Simultaneously", 《JOURNAL OF THE OPTICAL SOCIETY OF KOREA》 *
JIANG LIU ET AL.: "Optimizednon-integerorderphasemasktoextendthedepthof field of an imaging system", 《OPTICS COMMUNICATIONS》 *
刘江 等: "疵病检测中适用于不同倍率物镜的波前编码板优化设计", 《光电子•激光》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108152299A (en) * 2017-12-12 2018-06-12 长光卫星技术有限公司 The beauty defects detection device and detection method of high-precision optical element
CN110018564A (en) * 2019-03-12 2019-07-16 北京威睛光学技术有限公司 A kind of optical imaging system of the big field depth extending in wavefront coded space
CN110018564B (en) * 2019-03-12 2020-06-02 北京威睛光学技术有限公司 Optical imaging system for large depth of field continuation of wavefront coding space

Similar Documents

Publication Publication Date Title
CN108873289B (en) Microscope objective optical system and optical device
CN103809290B (en) A kind of mutual compensation optimizing method of optical system face shape error
CN110470245A (en) A kind of phase restoration detection device and phase recovery method based on the fusion of Fresnel zone plate diffraction information
JP2002139666A (en) Method and device for optimizing optical system, and recording medium recording program for optimizing optical system
CN109739019B (en) Optimization design method of coaxial free-form surface optical system based on vector aberration theory
CN103234480A (en) Rapid surface shape detection method for circular convex aspheric surfaces
CN106248692A (en) A kind of method of micro-imaging field depth extending and microscopic imaging device
CN113946041B (en) Catadioptric Cassegrain telescope system and polarization aberration correction method thereof
CN111221118B (en) Microscopic imaging method based on phase coding single lens
CN102269926B (en) Method for optimizing optical proximity correction (OPC) of nonideal photoetching system based on Abbe vector imaging model
CN203811868U (en) Photoelectric centering instrument using PSD
CN111189620B (en) Wavefront aberration estimation method based on shape characteristics of star spot
CN115523839A (en) Splicing sub-mirror edge error high-precision real-time detection method based on observation target
Tao et al. The three‐dimensional point spread functions of a microscope objective in image and object space
Chen et al. Transition imaging phase measuring deflectometry for high-precision measurement of optical surfaces
CN104048596B (en) Compensator and the compensator control method coaxial with interferometer
CN117031684A (en) Digital holographic imaging automatic focusing method and device
EP2255240B1 (en) Circularly symmetric aspheric optics providing non-monotonic wavefront phase profile and extended depth of field
CN102590800A (en) 2 mu m coherent wind detection lidar beam pre-expansion system
Burge et al. Imaging issues for interferometry with CGH null correctors
CN106338523A (en) Microscopic imaging depth-of-field extension method and microscopic imaging device
JP2006504114A (en) "Blind deconvolution" method and software with microscopic images
CN103792660B (en) The automatic optimization method that a kind of small field of view optical system face shape error compensates mutually
CN110703564B (en) Optical system film analysis method, device and storage medium
CN111076675A (en) Method and device for quickly adjusting plane wavefront zero compensation detection optical path of concave oblate sphere

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20161221

WD01 Invention patent application deemed withdrawn after publication