CN106245105A - The Chrome-free surface micro etching method of PA10T engineering plastics - Google Patents

The Chrome-free surface micro etching method of PA10T engineering plastics Download PDF

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CN106245105A
CN106245105A CN201610639882.5A CN201610639882A CN106245105A CN 106245105 A CN106245105 A CN 106245105A CN 201610639882 A CN201610639882 A CN 201610639882A CN 106245105 A CN106245105 A CN 106245105A
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pa10t
engineering plastics
chrome
free surface
etching method
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CN106245105B (en
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田志斌
熊海平
詹益腾
谢丽虹
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Novel Material Science And Technology Co Ltd Is Inspired Confidence In Guangzhou Three
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Novel Material Science And Technology Co Ltd Is Inspired Confidence In Guangzhou Three
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
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  • Electroplating Methods And Accessories (AREA)
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Abstract

The present invention relates to the Chrome-free surface micro etching method of a kind of PA10T engineering plastics.This Chrome-free surface micro etching method comprises the steps: to obtain PA10T engineering plastics, and described PA10T engineering plastics have treats microetch face;Preparing electrolyte with water for solvent, described electrolyte includes that concentration is 5 20g/L divalent manganesetions, and concentration is the hydrion of 10 25g/L;It is electrolysed to prepare strong oxidizer to described electrolyte, obtains the electrolyte containing strong oxidizer;Treating that microetch face is soaked in the described electrolyte containing strong oxidizer by described, the time of described immersion is 20 60min.The Chrome-free surface micro etching method of the PA10T engineering plastics of the present invention, prepare strong oxidizer in real time by electrolysis and the concentration of this strong oxidizer is maintained particular range, thus PA10T engineering plastics carry out microetch, it is ensured that the effect of microetch, it is achieved the effective microetch to PA10T engineering plastics.

Description

The Chrome-free surface micro etching method of PA10T engineering plastics
Technical field
The surface that the present invention relates to plastics processes, and particularly relates to the Chrome-free surface micro etching side of a kind of PA10T engineering plastics Method.
Background technology
Special engineering plastics PA10T, belongs to high heat-resisting semiaromatic polyamide composition material.Chemical composition is the poly-paraphenylene terephthalamide last of the ten Heavenly stems Diamidogen, its main monomer source is in Renewable resource Semen Ricini bean, and therefore, PA10T is bio-based materials.This material has excellence Thermostability, resistance to chemical corrosion, injection molding performance, and there is ultralow water absorption rate, good dimensional stability.? It is used in the fields such as electronics, electrical equipment, automobile, garden instrument, LED, mobile phone, hot-water heating.
Carry out chemical plating at PA10T product surface and electroplate to form coating, PA10T product can be made to have good metal Texture, improves decoration performance, can also strengthen electricity, the performance of the aspect such as hot and corrosion-resistant simultaneously, improve value-added content of product.
And PA10T material surface is smooth, there is hydrophobicity, want to carry out chemical plating and plating at this material surface, make plating Layer has good adhesion, it is necessary to solve material surface microetch problem.The purpose of microetch is to make PA10T material surface obtain one Plant the structure of micro-rough, improve surface roughness, increase surface area, make PA10T material surface be become hydrophilic from hydrophobic, thus Increase the coat of metal and the adhesion of material.
Currently, with respect to PA10T material surface microetch research, there is no relevant report and application.
Summary of the invention
Based on this, it is necessary to provide the Chrome-free surface micro etching method of a kind of PA10T engineering plastics.
The Chrome-free surface micro etching method of a kind of PA10T engineering plastics, comprises the steps:
Obtaining PA10T engineering plastics, described PA10T engineering plastics have treats microetch face;
Preparing electrolyte with water for solvent, described electrolyte includes that concentration is 5-20g/L divalent manganesetion, and concentration is The hydrion of 10-25g/L;
It is electrolysed to prepare strong oxidizer to described electrolyte, makes the concentration of strong oxidizer described in described electrolyte be 15-60g/L, obtains the electrolyte containing strong oxidizer;
Treating that microetch face is soaked in the described electrolyte containing strong oxidizer by described, the time of described immersion is 20- 60min。
The Chrome-free surface micro etching method of the PA10T engineering plastics of the present invention, is raw material by the material containing divalent manganesetion, Under strong acidic environment, electrolytic preparation obtains strong oxidizer, and this strong oxidizer is mainly made up of high oxidation state manganese ionic species, such as six One or both in valency or septivalency manganese ion material.Use electrolysis mode, value Mn ion can be produced, can also suppress simultaneously The reduction reaction of value Mn ion, makes strong oxidizer maintain in specific concentration range, it is achieved to have PA10T engineering plastics The microetch of effect, and it is applicable to industrialized production.Further, conservative control of the present invention is when the immersion in the electrolytic solution of microetch face Between be 20-60min, microetch thus can be avoided not enough, cause coating poor with the adhesion of PA10T engineering plastic surface, or microetch Excessively, make coating out-of-flatness, affect coating apparent.
Additionally, the surface chromium-free micro etching method of above-mentioned PA10T engineering plastics, without chromium in the microetch system of employing, it is to avoid Pollution of chromium.
Wherein in an embodiment, strong oxidizer concentration described in described electrolyte is 25-45g/L.In electrolyte by force The concentration of oxidant more preferably 25-45g/L, can make reaction condition gentle, fall while obtaining good microetch effect The strong oxidizer corrosion to equipment in low electrolyte, reduces cost of equipment maintenance.
Wherein in an embodiment, the time of described immersion is 30-50min.
Soak time more preferably 30-50min, preferable microetch configuration of surface can be obtained, optimize coating with While the adhesion of PA10T engineering plastic surface, it is ensured that the planarization of coating.
Wherein in an embodiment, described electrolyte includes the divalent manganesetion that concentration is 10-15g/L, Yi Jinong Degree is the hydrion of 15-20g/L.
Wherein in an embodiment, described divalent manganesetion is provided by manganese chloride and/or manganese sulfate, and hydrion is by dense sulfur Acid provides.
Wherein in an embodiment, described electrolyte also includes the accelerator that concentration is 50-150g/L;Described acceleration Agent is one or more in potassium hydrogen persulfate, Ammonium persulfate., sodium peroxydisulfate, potassium peroxydisulfate.
Add further specific consumption and the accelerator of kind, can the carrying out of catalytic electrolysis reaction, be conducive to maintaining electrolysis The concentration of strong oxidizer in liquid, it is ensured that the effect of microetch.
Wherein in an embodiment, the concentration of accelerator described in described electrolyte is 80-100g/L;Described accelerator For Ammonium persulfate., sodium peroxydisulfate or potassium peroxydisulfate.
Wherein in an embodiment, the anodic current density in described electrolytic process is 0.5-1.8A/dm2;Described electricity The temperature solving liquid is 60-85 DEG C.
Wherein in an embodiment, the anodic current density in described electrolytic process is 0.8-1.6A/dm2;Described electricity The temperature solving liquid is 65-75 DEG C.
Wherein in an embodiment, the anode material that described electrolysis uses is titanium, DSA coated titanium, lead or terne metal, Cathode material is that (body density is at 1.5g/cm for high-density graphite3Above);The surface area of described anode is 0.08-0.12dm2/ L, institute The surface area ratio stating negative electrode and anode is 8~15:1.
Each Parameter Conditions of conservative control electrolysis further, can make electrolytic process stable, beneficially the carrying out of microetch.
Accompanying drawing explanation
The Chrome-free surface micro etching design sketch of PA10T engineering plastics under the different microetch times that Fig. 1 is embodiment 1;
Fig. 2 is the Chrome-free surface micro etching design sketch of the PA10T engineering plastics of embodiment 2;
Fig. 3 is the Chrome-free surface micro etching design sketch of the PA10T engineering plastics of embodiment 3;
Fig. 4 is the Chrome-free surface micro etching design sketch of the PA10T engineering plastics of embodiment 4;
Fig. 5 is the Chrome-free surface micro etching design sketch of the PA10T engineering plastics of comparative example.
Detailed description of the invention
Below in conjunction with specific embodiment, the Chrome-free surface micro etching method of the PA10T engineering plastics of the present invention is made the most in detail Thin explanation.
Embodiment 1
The Chrome-free surface micro etching method of the present embodiment a kind of PA10T engineering plastics, comprises the steps:
(1) obtaining 8 blocks of PA10T engineering plastics with batch, described PA10T engineering plastics have treats microetch face.
(2) microetch:
Preparing electrolyte with pure water for solvent, described electrolyte includes the divalent manganesetion that concentration is 10g/L, and concentration is The hydrion of 20g/L, concentration is the accelerator of 80g/L.
Described accelerator is sodium peroxydisulfate;Divalent manganesetion is provided by manganese sulfate;Hydrion is provided by 96% concentrated sulphuric acid.
With DSA coated titanium as anode, high-density graphite plate is negative electrode;Annode area is 0.1dm2(L is the body of electrolyte to/L Long-pending), the area ratio of negative electrode and anode is 10:1.It is 1.2A/dm in anodic current density2, temperature is 75 DEG C, high-speed circulating bar Be electrolysed under part, with preparation and maintain the concentration of strong oxidizer as 30g/L about.
Treat that microetch face is soaked in described electrolyte by described, carry out microetch.Take 8 blocks of PA10T engineering plastics with batch Time of immersion be respectively set to 0min, 10min, 20min, 30min, 40min, 50min, 60min, 80min, prepare 8 pieces PA10T engineering plastics to be plated, microetch face to be plated and microetch effect are as shown in table 1.
Microetch face to be plated is carried out electroless copper, coating with treat shown in microetch face adhesion test 1.
Treat the microetch effect in microetch face under the conditions of the different soak time of table 1 embodiment 1 and test knot with the adhesion of coating Really
Embodiment 2
The Chrome-free surface micro etching method of the present embodiment a kind of PA10T engineering plastics, comprises the steps:
(1) obtaining PA10T engineering plastics, described PA10T engineering plastics have treats microetch face.
(2) microetch:
Preparing electrolyte with pure water for solvent, described electrolyte includes the divalent manganesetion that concentration is 12g/L, and concentration is The hydrion of 18g/L, concentration is the accelerator of 100g/L.
Described accelerator is sodium peroxydisulfate;Divalent manganesetion is provided by manganese sulfate;Hydrion is provided by 96% concentrated sulphuric acid.
With lead as anode, high-density graphite plate is negative electrode;Annode area is 0.1dm2/ L (L is the volume of electrolyte) is cloudy The area ratio of pole and anode is 10:1.It is 1.0A/dm in anodic current density2, temperature is 70 DEG C, enters under the conditions of high-speed circulating Row electrolysis, with preparation and maintain the concentration of strong oxidizer as 35g/L about.
The set of time soaked is 40min, prepares PA10T engineering plastics to be plated, treats microetch effect such as table 3 institute in microetch face Show.
Use conventional chemical copper method above-mentioned PA10T engineering plastics to be plated are carried out chemical plating, the coating prepared with Treat the adhesion test in microetch face as shown in table 2.
Table 2 embodiment 2 Chrome-free surface micro etching effect and binding force of cladding material test result
The microetch time (min) 40
Microetch amount (mg/cm2) 2.62
After microetch apparent (200 times) Even surface roughness (Fig. 2)
Chemical copper binding force of cladding material Without coming off
Embodiment 3
The Chrome-free surface micro etching method of the present embodiment a kind of PA10T engineering plastics, comprises the steps:
(1) obtaining PA10T engineering plastics, described PA10T engineering plastics have treats microetch face.
(2) microetch:
Preparing electrolyte with pure water for solvent, described electrolyte includes the divalent manganesetion that concentration is 5g/L, and concentration is The hydrion of 10g/L, concentration is the accelerator of 50g/L.
Described accelerator is Ammonium persulfate.;Divalent manganesetion is provided by manganese sulfate;Hydrion is provided by 96% concentrated sulphuric acid.
With lead as anode, high-density graphite plate is negative electrode;Annode area is 0.08dm2/ L (L is the volume of electrolyte) is cloudy The area ratio of pole and anode is 8:1.It is 0.5A/dm in anodic current density2, temperature is 60 DEG C, enters under the conditions of high-speed circulating Row electrolysis, with preparation and maintain the concentration of strong oxidizer as 15g/L about.
The set of time soaked is 60min, prepares PA10T engineering plastics to be plated, treats microetch effect such as table 3 institute in microetch face Show.
Use conventional chemical copper method above-mentioned PA10T engineering plastics to be plated are carried out chemical plating, the coating prepared with Treat the adhesion test in microetch face as shown in table 3.
Table 3 embodiment 3 Chrome-free surface micro etching effect and binding force of cladding material test result
The microetch time (min) 60
Microetch amount (mg/cm2) 2.17
After microetch apparent (200 times) Even surface roughness (Fig. 3)
Chemical copper binding force of cladding material Seldom come off
Embodiment 4
The Chrome-free surface micro etching method of the present embodiment a kind of PA10T engineering plastics, comprises the steps:
(1) obtaining PA10T engineering plastics, described PA10T engineering plastics have treats microetch face.
(2) microetch:
Preparing electrolyte with pure water for solvent, described electrolyte includes the divalent manganesetion that concentration is 20g/L, and concentration is The hydrion of 25g/L, concentration is the accelerator of 150g/L.
Described accelerator is potassium peroxydisulfate;Divalent manganesetion is provided by manganese chloride;Hydrion is provided by 96% concentrated sulphuric acid.
With titanium as anode, high-density graphite plate is negative electrode;Annode area is 0.12dm2/ L (L is the volume of electrolyte) is cloudy The area ratio of pole and anode is 15:1.It is 1.8A/dm in anodic current density2, temperature is 85 DEG C, enters under the conditions of high-speed circulating Row electrolysis, with preparation and maintain the concentration of strong oxidizer as 60g/L about.
The set of time soaked is 20min, prepares PA10T engineering plastics to be plated, treats microetch effect such as table 4 institute in microetch face Show.
Use conventional chemical copper method above-mentioned PA10T engineering plastics to be plated are carried out chemical plating, the coating prepared with Treat the adhesion test in microetch face as shown in table 4.
Table 4 embodiment 4 Chrome-free surface micro etching effect and binding force of cladding material test result
Comparative example
The Chrome-free surface micro etching method of this comparative example a kind of PA10T engineering plastics, its step is with embodiment 2, and difference is: In step (4) microetch: the concentration maintaining strong oxidizer is 10g/L.Gained treats that the microetch effect in microetch face is as shown in table 5.
Carry out chemical plating to prepare overlay coating according to the method that embodiment 2 is identical, the coating prepared with treat microetch The adhesion test in face is as shown in table 5.
Table 5 comparative example Chrome-free surface micro etching effect and binding force of cladding material test result
The microetch time (min) 40
Microetch amount (mg/cm2) 1.45
After microetch apparent (200 times) Surface micro-coarse (Fig. 5)
Chemical copper binding force of cladding material Cladding portion comes off
Each technical characteristic of embodiment described above can combine arbitrarily, for making description succinct, not to above-mentioned reality The all possible combination of each technical characteristic executed in example is all described, but, as long as the combination of these technical characteristics is not deposited In contradiction, all it is considered to be the scope that this specification is recorded.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed, but also Can not therefore be construed as limiting the scope of the patent.It should be pointed out that, come for those of ordinary skill in the art Saying, without departing from the inventive concept of the premise, it is also possible to make some deformation and improvement, these broadly fall into the protection of the present invention Scope.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. the Chrome-free surface micro etching method of PA10T engineering plastics, it is characterised in that comprise the steps:
Obtaining PA10T engineering plastics, described PA10T engineering plastics have treats microetch face;
Preparing electrolyte with water for solvent, described electrolyte includes that concentration is 5-20g/L divalent manganesetion, and concentration is 10- The hydrion of 25g/L;
Being electrolysed to prepare strong oxidizer to described electrolyte, making the concentration of strong oxidizer described in described electrolyte is 15- 60g/L, obtains the electrolyte containing strong oxidizer;
Treating that microetch face is soaked in the described electrolyte containing strong oxidizer by described, the time of described immersion is 20-60min.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 1, it is characterised in that described electrolysis Strong oxidizer concentration described in liquid is 25-45g/L.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 1, it is characterised in that described immersion Time be 30-50min.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 1, it is characterised in that described electrolysis Liquid includes the divalent manganesetion that concentration is 10-15g/L, and concentration is the hydrion of 15-20g/L.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 1, it is characterised in that described bivalence Manganese ion is provided by manganese chloride and/or manganese sulfate, and hydrion is provided by concentrated sulphuric acid.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 1, it is characterised in that described electrolysis Liquid also includes the accelerator that concentration is 50-150g/L;Described accelerator is potassium hydrogen persulfate, Ammonium persulfate., sodium peroxydisulfate, mistake One or more in potassium sulfate.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 6, it is characterised in that described electrolysis The concentration of accelerator described in liquid is 80-100g/L;Described accelerator is Ammonium persulfate., sodium peroxydisulfate or potassium peroxydisulfate.
8. according to the Chrome-free surface micro etching method of the PA10T engineering plastics described in any one of claim 1-7, it is characterised in that Anodic current density during described electrolysis is 0.5-1.8A/dm2;The temperature of described electrolyte is 60-85 DEG C.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 8, it is characterised in that described electrolysis During anodic current density be 0.8-1.6A/dm2;The temperature of described electrolyte is 65-75 DEG C.
The Chrome-free surface micro etching method of PA10T engineering plastics the most according to claim 8, it is characterised in that described electrolysis The anode material used is titanium, DSA coated titanium, lead or terne metal, and cathode material is high-density graphite;The surface of described anode Amass as 0.08-0.12dm2/ L, described negative electrode is 8-15:1 with the surface area ratio of anode.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57149463A (en) * 1981-03-10 1982-09-16 Okuno Seiyaku Kogyo Kk Metal-plating method of polyamide resin
US4445988A (en) * 1980-09-29 1984-05-01 The United States Of America As Represented By The Department Of Energy Micrographic detection of plastic deformation in nickel base alloys
US5346597A (en) * 1993-09-27 1994-09-13 Industrial Technology Institute Process for etching organic polymeric materials
CN1715444A (en) * 2004-05-27 2006-01-04 恩通公司 Method for metallizing plastic surfaces
CN101283120A (en) * 2005-10-11 2008-10-08 荏原优莱特科技股份有限公司 Pd/Sn colloid catalyst adsorption enhancer
CN104487617A (en) * 2012-01-23 2015-04-01 麦克德米德尖端有限公司 Etching of plastic using acidic solutions containing trivalent manganese
CN104975276A (en) * 2014-04-11 2015-10-14 深圳市泛友科技有限公司 Method of forming selective metal circuit on plastic surface and plastic part

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445988A (en) * 1980-09-29 1984-05-01 The United States Of America As Represented By The Department Of Energy Micrographic detection of plastic deformation in nickel base alloys
JPS57149463A (en) * 1981-03-10 1982-09-16 Okuno Seiyaku Kogyo Kk Metal-plating method of polyamide resin
US5346597A (en) * 1993-09-27 1994-09-13 Industrial Technology Institute Process for etching organic polymeric materials
CN1715444A (en) * 2004-05-27 2006-01-04 恩通公司 Method for metallizing plastic surfaces
CN101283120A (en) * 2005-10-11 2008-10-08 荏原优莱特科技股份有限公司 Pd/Sn colloid catalyst adsorption enhancer
CN104487617A (en) * 2012-01-23 2015-04-01 麦克德米德尖端有限公司 Etching of plastic using acidic solutions containing trivalent manganese
CN104975276A (en) * 2014-04-11 2015-10-14 深圳市泛友科技有限公司 Method of forming selective metal circuit on plastic surface and plastic part

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