CN106200704B - A kind of RB process main vapour pressure setting value operation method and system - Google Patents
A kind of RB process main vapour pressure setting value operation method and system Download PDFInfo
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- CN106200704B CN106200704B CN201610794080.1A CN201610794080A CN106200704B CN 106200704 B CN106200704 B CN 106200704B CN 201610794080 A CN201610794080 A CN 201610794080A CN 106200704 B CN106200704 B CN 106200704B
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
- G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
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Abstract
The embodiment of the invention discloses a kind of RB process main vapour pressure setting value operation method and systems, main vapour pressure target value by calculating different RB type or RB target load finally determines suitable main vapour pressure setting value, solves RB process in the prior art and uses the technical issues of being unfavorable for unit safety, stable operation caused by identical main vapour pressure setting value operational loop with unit normal operation.
Description
Technical field
The present invention relates to fired power generating unit automation field more particularly to a kind of RB process main vapour pressure setting value operation sides
Method and system.
Background technique
To reduce the risk that fossil power plant auxiliary engine fault trip is safely operated fired power generating unit, fired power generating unit is equipped at present
Auxiliary machinery fault automatic load-reducing function, i.e. RUN BACK function, abbreviation RB.When blower, feed pump etc. are arranged side by side using 2 or more
In the subsidiary engine of operation one or more tripping when, except need to carry out control mode switching, quickly reduce unit target load, unit
The working medium flows such as fuel, water supply, air quantity also need rationally to control unit main steam pressure, so that boiler feedwater, main steam
The unit parameters transition such as temperature is as stable as possible.
Currently, most of fired power generating unit RB process carries out the constant DP control side that rationally control uses to unit main steam pressure
Method operates normally identical main vapour pressure setting value operational loop using with unit.
However existing technology has certain defect, and because main vapour pressure fall is big during unit RB, main vapour pressure
Power, unit load fall time are too long, and main steam temperature and reheat steam temperature decline are excessive, if normally transported using with unit
The identical main vapour pressure setting value operational loop of row, is unfavorable for unit safety, stable operation.
Summary of the invention
The embodiment of the invention provides a kind of RB process main vapour pressure setting value operation method and systems, different by calculating
RB type or the main vapour pressure target value of RB target load finally determine suitable main vapour pressure setting value, solve existing
RB process, which uses to operate normally with unit, in technology is unfavorable for unit peace caused by identical main vapour pressure setting value operational loop
Entirely, the technical issues of stable operation.
The embodiment of the invention provides a kind of RB process main vapour pressure setting value operation methods characterized by comprising
RB pressure target value is calculated according to the RB type obtained in advance or the RB target load；
Real-time monitoring main vapour pressure value；
According to the main vapour pressure initial set value of the RB action signal and the former control system that detect in advance, calculate
The RB pressure target value, monitoring the main vapour pressure value judged, if the RB pressure target value be lower than the master
When vapour pressure force value, main vapour pressure setting value tracks the main vapour pressure value, if the RB pressure target value is higher than the main vapour pressure
In the presence of force value and the RB action signal, the main vapour pressure setting value remains the RB pressure target value, if the RB
In the absence of action signal, the main vapour pressure setting value is switched to the main vapour pressure initial set value of former control system.
Optionally,
It is also wrapped before calculating RB pressure target value according to the RB type detected in advance or the RB target load
It includes:
It obtains RB type or RB target load and detects RB action signal, the main vapour pressure of former control system is initially set
Value.
Optionally,
RB pressure target value is calculated according to the RB type detected in advance or the RB target load to specifically include:
According to the RB type detected in advance, RB pressure target value is obtained by switching mode；
According to the RB target load detected in advance, carries out functional operation and obtain RB pressure target value.
Optionally,
It is also wrapped before calculating RB pressure target value according to the RB type detected in advance or the RB target load
It includes:
Detect unit load.
Optionally,
In main vapour pressure initial set value, the meter according to the RB action signal and the former control system that detect in advance
The main vapour pressure value of the RB pressure target value, monitoring calculated is judged, if the RB pressure target value is lower than described
When main vapour pressure value, main vapour pressure setting value tracks the main vapour pressure value, if the RB pressure target value is higher than the main vapour
In the presence of pressure value and the RB action signal, the main vapour pressure setting value remains the RB pressure target value, if described
In the absence of RB action signal, the main vapour pressure setting value is switched to the main vapour pressure initial set value of former control system
Later further include:
According to the unit load of detection, the RB target load of acquisition, in advance the RB action signal that detects
Judged, if issuing steam turbine master in the presence of the unit load is lower than the RB target load and the RB action signal
Control subtracts block signal.
The embodiment of the invention also provides a kind of system based on RB process main vapour pressure setting value operation method, features
It is, comprising:
RB pressure target value computing unit, based on according to the RB type or the RB target load obtained in advance
Calculate RB pressure target value；
Monitoring unit is used for real-time monitoring main vapour pressure value；
Main vapour pressure setting value determination unit, for according to the RB action signal and the former control system detected in advance
The main vapour pressure initial set value of system, the RB pressure target value of calculating, monitoring the main vapour pressure value judged, if
When the RB pressure target value is lower than the main vapour pressure value, main vapour pressure setting value tracks the main vapour pressure value, if described
RB pressure target value is higher than in the presence of the main vapour pressure value and the RB action signal, and the main vapour pressure setting value remains
The RB pressure target value, if in the absence of the RB action signal, the main vapour pressure setting value is switched to former control system
The main vapour pressure initial set value.
Optionally,
The system based on RB process main vapour pressure setting value operation method further include:
Detection unit is obtained, for obtaining RB type or RB target load and detecting RB action signal, former control system
Main vapour pressure initial set value.
Optionally,
The RB pressure target value computing unit includes RB type pressure target value computing unit and RB target load target
It is worth computing unit；
RB type pressure target value computing unit, for being obtained by switching mode according to the RB type detected in advance
Obtain RB pressure target value；
RB target load target value computing unit, for carrying out function fortune according to the RB target load detected in advance
Calculation obtains RB pressure target value.
Optionally,
The acquisition detection unit, is also used to detect unit load.
Optionally,
The system based on RB process main vapour pressure setting value operation method further include:
Safety detection unit, for the unit load according to detection, the RB target load of acquisition, in advance detection
The RB action signal judged, if the unit load is lower than the RB target load and the RB action signal exists
When, then it issues turbine main control and subtracts block signal.
As can be seen from the above technical solutions, the embodiment of the present invention has the advantage that
Main vapour pressure target value by calculating different RB type or RB target load finally determines suitable main vapour
Pressure set points solve RB process in the prior art and the identical main vapour pressure setting value operation with unit normal operation are used to return
The technical issues of being unfavorable for unit safety, stable operation caused by road；Meanwhile if unit load is set in advance lower than RB target load
It in the presence of fixed value and RB action signal, then issues turbine main control and subtracts block signal, can prevent steam turbine pitch from closing too small, make
At the function of the additional disturbance of unit load, water supply system and vapor (steam) temperature.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention without any creative labor, may be used also for those of ordinary skill in the art
To obtain other attached drawings according to these attached drawings.
Fig. 1 is a kind of one embodiment of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Flow chart；
Fig. 2 is a kind of another embodiment of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Flow chart；
Fig. 3 is the one of a kind of system based on RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
The structural schematic diagram of a embodiment；
Fig. 4 is a kind of the another of system based on RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
The structural schematic diagram of one embodiment；
Fig. 5 is the one of a kind of system based on RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
The structure principle chart of a embodiment；
Fig. 6 is a kind of one embodiment of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Structure principle chart；
Fig. 7 is a kind of another embodiment of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Structure principle chart.
Specific embodiment
The embodiment of the invention provides a kind of RB process main vapour pressure setting value operation method and systems, different by calculating
RB type or the main vapour pressure target value of RB target load finally determine suitable main vapour pressure setting value, solve existing
RB process, which uses to operate normally with unit, in technology is unfavorable for unit peace caused by identical main vapour pressure setting value operational loop
Entirely, the technical issues of stable operation.
In order to make the invention's purpose, features and advantages of the invention more obvious and easy to understand, below in conjunction with the present invention
Attached drawing in embodiment, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that disclosed below
Embodiment be only a part of the embodiment of the present invention, and not all embodiment.Based on the embodiments of the present invention, this field
Those of ordinary skill's all other embodiment obtained without making creative work, belongs to protection of the present invention
Range.
Referring to Fig. 1, an a kind of reality of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Applying example includes:
101, RB pressure target value is calculated according to the RB type or RB target load obtained in advance；
102, real-time monitoring main vapour pressure value；
103, according to the main vapour pressure initial set value of the RB action signal detected in advance and former control system, the RB of calculating
Pressure target value, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour pressure value, main vapour pressure is set
Definite value tracks main vapour pressure value, if RB pressure target value is higher than in the presence of main vapour pressure value and RB action signal, main vapour pressure is set
Definite value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value is switched to former control system
Main vapour pressure initial set value.
In the present embodiment, RB pressure target value is first calculated according to the RB type or RB target load that obtain in advance, then
Real-time monitoring main vapour pressure value, the last main vapour pressure according to the RB action signal detected in advance and former control system are initially set
Value, calculate RB pressure target value, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour pressure value
When, main vapour pressure setting value tracks main vapour pressure value, if RB pressure target value is higher than main vapour pressure value and RB action signal exists
When, main vapour pressure setting value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value is switched to
The main vapour pressure initial set value of former control system.
Please refer to Fig. 2, Fig. 6 and Fig. 7, a kind of RB process main vapour pressure setting value operation method provided in an embodiment of the present invention
Another embodiment include:
201, it obtains RB type or RB target load and detects RB action signal, the main vapour pressure of former control system is initially set
Definite value and unit load；
202, according to the RB type detected in advance, RB pressure target value is obtained by switching mode；
203, according to the RB target load detected in advance, carries out functional operation and obtain RB pressure target value；
204, real-time monitoring main vapour pressure value；
205, according to the main vapour pressure initial set value of the RB action signal detected in advance and former control system, the RB of calculating
Pressure target value, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour pressure value, main vapour pressure is set
Definite value tracks main vapour pressure value, if RB pressure target value is higher than in the presence of main vapour pressure value and RB action signal, main vapour pressure is set
Definite value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value is switched to former control system
Main vapour pressure initial set value；
206, according to the unit load of detection, the RB target load of acquisition, the RB action signal that detects is judged in advance,
If issuing turbine main control in the presence of unit load is lower than RB target load and RB action signal and subtracting block signal.
In the present embodiment, RB type or RB target load are first obtained and detects the master of RB action signal, former control system
Steam pressure initial set value and unit load obtain RB pressure by switching mode according to the RB type detected in advance
Target value such as following table one,
| Serial number | RB type | Main vapour pressure target value (MPa) |
| 1 | Coal pulverizer RB | 18 |
| 2 | Send air-introduced machine RB | 19.6 |
| 3 | Primary air fan RB | 16 |
| 4 | Feed pump RB | 16 |
Table one
Or it according to the RB target load detected in advance, carries out functional operation and obtains RB pressure target value such as following table
Two,
Table two
Then real-time monitoring main vapour pressure value, according to the main vapour pressure of the RB action signal detected in advance and former control system
Initial set value, the RB pressure target value of calculating, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour
When pressure value, main vapour pressure setting value tracks main vapour pressure value, if RB pressure target value is higher than main vapour pressure value and RB movement letter
In the presence of number, main vapour pressure setting value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value
It is switched to the main vapour pressure initial set value of former control system, finally according to the unit load of detection, the RB of acquisition
Target load, the RB action signal detected in advance are judged, if the unit load is lower than RB target load and RB is moved
In the presence of making signal, then issues turbine main control and subtract block signal.
Fig. 3 and Fig. 5 are please referred to, it is provided in an embodiment of the present invention a kind of based on RB process main vapour pressure setting value operation method
One embodiment of system include:
RB pressure target value computing unit, for calculating RB pressure according to the RB type or RB target load that obtain in advance
Target value；
Monitoring unit is used for real-time monitoring main vapour pressure value；
Main vapour pressure setting value determination unit, for the main vapour according to the RB action signal detected in advance and former control system
Pressure set points, the RB pressure target value of calculating, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour
When pressure value, main vapour pressure setting value tracks main vapour pressure value, if RB pressure target value is higher than main vapour pressure value and RB movement letter
In the presence of number, main vapour pressure setting value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value
For the main vapour pressure setting value of former control system.
Fig. 4 and Fig. 5 are please referred to, it is provided in an embodiment of the present invention a kind of based on RB process main vapour pressure setting value operation method
Another embodiment of system include:
RB pressure target value computing unit, for calculating RB pressure according to the RB type or RB target load that obtain in advance
Target value；
Monitoring unit is used for real-time monitoring main vapour pressure value；
Main vapour pressure setting value determination unit, for the main vapour according to the RB action signal detected in advance and former control system
Pressure set points, the RB pressure target value of calculating, monitoring main vapour pressure value judged, if RB pressure target value be lower than main vapour
When pressure value, main vapour pressure setting value tracks main vapour pressure value, if RB pressure target value is higher than main vapour pressure value and RB movement letter
In the presence of number, main vapour pressure setting value remains RB pressure target value, if in the absence of RB action signal, main vapour pressure setting value
For the main vapour pressure setting value of former control system.
System based on RB process main vapour pressure setting value operation method further include:
Detection unit is obtained, for obtaining RB type or RB target load and detecting RB action signal, former control system
Main vapour pressure initial set value.
RB pressure target value computing unit includes RB type pressure target value computing unit and RB target load target value meter
Calculate unit；
RB type pressure target value computing unit, for obtaining RB by switching mode according to the RB type detected in advance
Pressure target value；
RB target load target value computing unit, for carrying out functional operation and obtaining according to the RB target load detected in advance
To RB pressure target value.
Detection unit is obtained, is also used to detect unit load.
System based on RB process main vapour pressure setting value operation method further include:
Safety detection unit, the RB for detecting according to the RB target load of the unit load of detection, acquisition, in advance are acted
Signal is judged, if issuing turbine main control in the presence of unit load is lower than RB target load and RB action signal and subtracting locking
Signal.
It is apparent to those skilled in the art that for convenience and simplicity of description, the system of foregoing description,
The specific work process of device and unit, can refer to corresponding processes in the foregoing method embodiment, and details are not described herein.
In several embodiments provided herein, it should be understood that disclosed system, device and method can be with
It realizes by another way.For example, the apparatus embodiments described above are merely exemplary, for example, the unit
It divides, only a kind of logical function partition, there may be another division manner in actual implementation, such as multiple units or components
It can be combined or can be integrated into another system, or some features can be ignored or not executed.Another point, it is shown or
The mutual coupling, direct-coupling or communication connection discussed can be through some interfaces, the indirect coupling of device or unit
It closes or communicates to connect, can be electrical property, mechanical or other forms.
The unit as illustrated by the separation member may or may not be physically separated, aobvious as unit
The component shown may or may not be physical unit, it can and it is in one place, or may be distributed over multiple
In network unit.It can select some or all of unit therein according to the actual needs to realize the mesh of this embodiment scheme
's.
It, can also be in addition, the functional units in various embodiments of the present invention may be integrated into one processing unit
It is that each unit physically exists alone, can also be integrated in one unit with two or more units.Above-mentioned integrated list
Member both can take the form of hardware realization, can also realize in the form of software functional units.
If the integrated unit is realized in the form of SFU software functional unit and sells or use as independent product
When, it can store in a computer readable storage medium.Based on this understanding, technical solution of the present invention is substantially
The all or part of the part that contributes to existing technology or the technical solution can be in the form of software products in other words
It embodies, which is stored in a storage medium, including some instructions are used so that a computer
Equipment (can be personal computer, server or the network equipment etc.) executes the complete of each embodiment the method for the present invention
Portion or part steps.And storage medium above-mentioned includes: USB flash disk, mobile hard disk, read-only memory (ROM, Read-Only
Memory), random access memory (RAM, Random Access Memory), magnetic or disk etc. are various can store journey
The medium of sequence code.
The above, the above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations；Although referring to before
Stating embodiment, invention is explained in detail, those skilled in the art should understand that: it still can be to preceding
Technical solution documented by each embodiment is stated to modify or equivalent replacement of some of the technical features；And these
It modifies or replaces, the spirit and scope for technical solution of various embodiments of the present invention that it does not separate the essence of the corresponding technical solution.
Claims (10)
1. a kind of RB process main vapour pressure setting value operation method characterized by comprising
RB pressure target value is calculated according to the RB type or RB target load obtained in advance；
Real-time monitoring main vapour pressure value；
According to main vapour pressure initial set value, the RB pressure of calculating of the RB action signal detected in advance and former control system
Target value, the main vapour pressure value of monitoring are judged, main if the RB pressure target value is lower than the main vapour pressure value
Steam pressure setting value tracks the main vapour pressure value, if the RB pressure target value is higher than the main vapour pressure value and the RB is dynamic
In the presence of making signal, the main vapour pressure setting value remains the RB pressure target value, if the RB action signal is not present
When, the main vapour pressure setting value is switched to the main vapour pressure initial set value of former control system.
2. RB process main vapour pressure setting value operation method according to claim 1, which is characterized in that according to inspection in advance
The RB type surveyed or the RB target load calculate before RB pressure target value further include:
It obtains RB type or RB target load and detects the main vapour pressure initial set value of RB action signal, former control system.
3. RB process main vapour pressure setting value operation method according to claim 1, which is characterized in that according to preparatory detection
The RB type or the RB target load calculate RB pressure target value specifically include:
According to the RB type detected in advance, RB pressure target value is obtained by switching mode；
According to the RB target load detected in advance, carries out functional operation and obtain RB pressure target value.
4. RB process main vapour pressure setting value operation method according to claim 1, which is characterized in that according to inspection in advance
The RB type surveyed or the RB target load calculate before RB pressure target value further include:
Detect unit load.
5. RB process main vapour pressure setting value operation method according to claim 4, which is characterized in that according to inspection in advance
Main vapour pressure initial set value, the RB pressure target of calculating of the RB action signal and the former control system surveyed
Value, the main vapour pressure value of monitoring are judged, if the RB pressure target value is lower than the main vapour pressure value, main vapour pressure
Power setting value tracks the main vapour pressure value, if the RB pressure target value is higher than the main vapour pressure value and RB movement letter
In the presence of number, the main vapour pressure setting value remains the RB pressure target value, if in the absence of the RB action signal, institute
Main vapour pressure setting value is stated to be switched to after the main vapour pressure initial set value of former control system further include:
According to the unit load of detection, the RB target load of acquisition, the RB action signal that detects carries out in advance
Judgement, if issuing turbine main control in the presence of the unit load is lower than the RB target load and the RB action signal and subtracting
Block signal.
6. a kind of system based on RB process main vapour pressure setting value operation method characterized by comprising
RB pressure target value computing unit, for calculating RB pressure target according to the RB type or RB target load that obtain in advance
Value；
Monitoring unit is used for real-time monitoring main vapour pressure value；
Main vapour pressure setting value determination unit, for the main vapour pressure according to the RB action signal detected in advance and former control system
Initial set value, the RB pressure target value of calculating, monitoring the main vapour pressure value judged, if the RB pressure mesh
When scale value is lower than the main vapour pressure value, main vapour pressure setting value tracks the main vapour pressure value, if the RB pressure target value
In the presence of the main vapour pressure value and the RB action signal, the main vapour pressure setting value remains the RB pressure mesh
Scale value, if in the absence of the RB action signal, the main vapour pressure setting value is switched to the main vapour pressure of former control system
Power initial set value.
7. the system according to claim 6 based on RB process main vapour pressure setting value operation method, which is characterized in that also
Include:
Detection unit is obtained, for obtaining RB type or RB target load and detecting the main vapour of RB action signal, former control system
Pressure initial set value.
8. the system according to claim 6 based on RB process main vapour pressure setting value operation method, which is characterized in that institute
Stating RB pressure target value computing unit includes RB type pressure target value computing unit and RB target load target value computing unit；
RB type pressure target value computing unit, for obtaining RB by switching mode according to the RB type detected in advance
Pressure target value；
RB target load target value computing unit, for carrying out functional operation and obtaining according to the RB target load detected in advance
To RB pressure target value.
9. the system according to claim 7 based on RB process main vapour pressure setting value operation method, which is characterized in that
The acquisition detection unit, is also used to detect unit load.
10. the system according to claim 6 based on RB process main vapour pressure setting value operation method, which is characterized in that
Further include:
Safety detection unit, the RB for detecting according to the RB target load of the unit load of detection, acquisition, in advance
Action signal is judged, if sending out in the presence of the unit load is lower than the RB target load and the RB action signal
Turbine main control subtracts block signal out.
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