CN106186714A - A kind of etching solution suppressing the thinning rear concave point of TFT LCDs - Google Patents
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs Download PDFInfo
- Publication number
- CN106186714A CN106186714A CN201610565817.2A CN201610565817A CN106186714A CN 106186714 A CN106186714 A CN 106186714A CN 201610565817 A CN201610565817 A CN 201610565817A CN 106186714 A CN106186714 A CN 106186714A
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- China
- Prior art keywords
- etching solution
- concave point
- tft lcds
- rear concave
- etching
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention provides a kind of etching solution suppressing the thinning rear concave point of TFT LCDs, the formation of concave point during this etching solution chemically based means suppression reduction processing, compared with grinding and polishing method, the operating time is shorter, workload is less and effectively prevent the bad problem of the quality produced because of grinding and polishing.Under this technical thought, the present invention devises brand-new etching solution formula by laboratory facilities, the strong oxidizer such as potassium dichromate, potassium permanganate is with the addition of on the basis of reducing fluoride consumption, the etching speed making this etching solution is relatively slow, and the etching both having met pretreatment requires to turn avoid the too fast problem affecting base material surface structure of etching speed.On this basis, the present invention promotes multiple solute component dissolubility in mixed system by chelating agen, lays a good foundation for multiple solute component synergism.
Description
Technical field
The present invention relates to LCDs technical field, be specifically related to a kind of suppression thinning rear concave point of TFT LCDs
Etching solution.
Background technology
TFT LCDs is towards lightening direction development, but asking due to TFT LCDs primary substrate
Topic, can form some concave points, greatly reduce the qualification rate of product after carrying out reduction processing by chemical method.Although by grinding
The method of grinding and polishing light can remove part concave point, but TFT product may be caused to produce Zara for polishing process and pressing is bad
Problem.Therefore, need the concave point suppressing method of a kind of chemically based means badly, on the basis of ensureing properties of product, reduce TFT liquid
The incidence rate of concave point during crystal display screen substrate attenuation.Prior art there is researcher carried out many trials, but the most still
Do not obtain preferable effect.
Summary of the invention
The invention provides a kind of etching solution suppressing the thinning rear concave point of TFT LCDs, to solve in prior art
TFT LCDs thinning process is easily generated concave point and affects the technical problem of display screen quality.
Another that the invention solves the problems that technical problem is that in prior art and easily affect screen for alleviating the technological means of concave point
Curtain pressing performance.
The invention solves the problems that further technical problem is that in prior art for alleviating the chemical method poor effect of concave point.
For realizing above technical purpose, the present invention by the following technical solutions:
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution includes following mass percent
Composition: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%.
As preferably, this etching solution also includes the oxolane of 1% (w/w).
As preferably, this etching solution also includes the ethyl acetate of 3% (w/w).
As preferably, this etching solution also includes the cobaltous chloride of 2% (w/w).
As preferably, this etching solution also includes the nitric acid of 1% (w/w).
As preferably, this etching solution is grouped into by the one-tenth of following mass percent: Fluohydric acid. 10%, ammonium acid fluoride 8%, sulfur
Acid ammonium 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate 5%, disodiumedetate 2%, potassium molybdate
3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, oxolane 1%, ethyl acetate 3%, cobaltous chloride
2%, nitric acid 1%, water 30%.
The invention provides a kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is chemically based
The formation of concave point during means suppression reduction processing, compared with grinding and polishing method, the operating time is shorter, workload is less and has
Effect avoids the bad problem of the quality produced because of grinding and polishing.Under this technical thought, the present invention is designed by laboratory facilities
Brand-new etching solution formula, with the addition of the strong oxidizer such as potassium dichromate, potassium permanganate on the basis of reducing fluoride consumption,
The etching speed making this etching solution is relatively slow, and the etching both having met pretreatment requires to turn avoid the too fast shadow of etching speed
The problem ringing base material surface structure.On this basis, the present invention promotes multiple solute component at mixed system by chelating agen
In dissolubility, lay a good foundation for multiple solute component synergism.
In optimal technical scheme, although unexpected composition the recognizing in prior art such as ethyl acetate, cobaltous chloride of the present invention
Knowledge does not have clear and definite etch effect, but on the basis of main technical schemes of the present invention, adds oxolane, second further
The composition such as acetoacetic ester, cobaltous chloride helps lend some impetus to concave point inhibition.Etching solution of the present invention is at TFT liquid crystal display substrate
Carry out acid etching thinning before be etched pretreatment, this etching solution to concave point inhibition highlight, be obviously improved conforming product rate,
Cost is relatively low, easily prepared simultaneously, therefore has good scale application prospect.
Detailed description of the invention
The detailed description of the invention of the present invention will be described in detail below.In order to avoid the most unnecessary details,
To belonging to known structure or function will not be described in detail in following example.
Approximating language used in following example can be used for quantitative expression, shows in the feelings not changing basic function
Quantity can be allowed under condition to have certain variation.In addition to being defined, technology used in following example and scientific terminology have with
The identical meanings that those skilled in the art of the invention are commonly understood by.
Embodiment 1
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is by the one-tenth of following mass percent
It is grouped into: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, four
Hydrogen furan 1%, ethyl acetate 3%, cobaltous chloride 2%, nitric acid 1%, water 30%.
This etching solution outward appearance is colourless or light yellow transparent liquid, PH < 3 (25 degrees Celsius), viscosity: 10～13pa.s (25
Degree Celsius)
This etching solution is a product being applied to the micro-process in surface before TFT glass thinning, owing to pretreatment fluid has
The toughness more higher than common acid solution and surface tension, fill up glass surface microcrack with this, greatly reduces fluorion with micro-
The contact probability of crack location, and then play the effect of surface reconditioning, can effectively suppress glass surface concave point, scratch at after etching
Middle amplification, is greatly lowered polishing rate and polishing time.Not only save cost but also improve production efficiency and product is qualified
Rate, for enterprise with bigger benefit.
Embodiment 2
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is by the one-tenth of following mass percent
It is grouped into: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%, ethyl acetate 3%, ammonium oxalate 4%.
Embodiment 3
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is by the one-tenth of following mass percent
It is grouped into: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%, oxolane 1%, nitric acid 1%, magnesium chloride 5%.
Embodiment 4
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is by the one-tenth of following mass percent
It is grouped into: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%, cobaltous chloride 2%, sodium chloride 5%.
Embodiment 5
A kind of etching solution suppressing the thinning rear concave point of TFT LCDs, this etching solution is by the one-tenth of following mass percent
It is grouped into: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%, ethanol 7%.
Above embodiments of the invention are described in detail, but described content have been only presently preferred embodiments of the present invention,
Not in order to limit the present invention.All any amendment, equivalent and improvement etc. made in the application range of the present invention, all should
Within being included in protection scope of the present invention.
Claims (6)
1. the etching solution suppressing the thinning rear concave point of TFT LCDs, it is characterised in that include following mass percent
Composition: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, vinegar ammonium fluoride 5%, boric acid 6%, sodium perchlorate
5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%, potassium dichromate 2%, chloroform 2%, water
30%.
The etching solution of the suppression thinning rear concave point of TFT LCDs the most according to claim 1, it is characterised in that also include
The oxolane of 1% (w/w).
The etching solution of the suppression thinning rear concave point of TFT LCDs the most according to claim 1, it is characterised in that also include
The ethyl acetate of 3% (w/w).
The etching solution of the suppression thinning rear concave point of TFT LCDs the most according to claim 1, it is characterised in that also include
The cobaltous chloride of 2% (w/w).
The etching solution of the suppression thinning rear concave point of TFT LCDs the most according to claim 1, it is characterised in that also include
The nitric acid of 1% (w/w).
The etching solution of the suppression thinning rear concave point of TFT LCDs the most according to claim 1, it is characterised in that this etching
Liquid is grouped into by the one-tenth of following mass percent: Fluohydric acid. 10%, ammonium acid fluoride 8%, ammonium sulfate 8%, glycerol 6%, and vinegar is fluorinated
Ammonia 5%, boric acid 6%, sodium perchlorate 5%, disodiumedetate 2%, potassium molybdate 3%, chrysanthemum ester 2%, potassium permanganate 4%,
Potassium dichromate 2%, chloroform 2%, oxolane 1%, ethyl acetate 3%, cobaltous chloride 2%, nitric acid 1%, water 30%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610565817.2A CN106186714A (en) | 2016-07-15 | 2016-07-15 | A kind of etching solution suppressing the thinning rear concave point of TFT LCDs |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610565817.2A CN106186714A (en) | 2016-07-15 | 2016-07-15 | A kind of etching solution suppressing the thinning rear concave point of TFT LCDs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106186714A true CN106186714A (en) | 2016-12-07 |
Family
ID=57493042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610565817.2A Pending CN106186714A (en) | 2016-07-15 | 2016-07-15 | A kind of etching solution suppressing the thinning rear concave point of TFT LCDs |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106186714A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107119278A (en) * | 2017-05-19 | 2017-09-01 | 合肥市惠科精密模具有限公司 | The ITO Ag ITO etching solutions of concave point after a kind of suppression TFT LCDs is thinned |
| CN107814491A (en) * | 2017-12-14 | 2018-03-20 | 天津美泰真空技术有限公司 | A kind of flat glass substrate etching solution |
| CN107954608A (en) * | 2017-12-14 | 2018-04-24 | 天津美泰真空技术有限公司 | A kind of glass substrate etching solution |
| CN113105123A (en) * | 2021-04-08 | 2021-07-13 | 惠州市清洋实业有限公司 | Polishing treatment method for Micro LED display screen |
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| CN103508676A (en) * | 2013-07-24 | 2014-01-15 | 芜湖长信科技股份有限公司 | Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method |
| US20150048053A1 (en) * | 2012-03-12 | 2015-02-19 | Jcu Corporation | Selective etching method |
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| CN104445974A (en) * | 2014-11-28 | 2015-03-25 | 张家港市德力特新材料有限公司 | Preparation method for mobile phone screen glass |
| CN104611702A (en) * | 2015-02-11 | 2015-05-13 | 江阴江化微电子材料股份有限公司 | Liquid crystal panel copper-molybdenum membrane etching liquid |
| CN105293934A (en) * | 2014-07-11 | 2016-02-03 | 东京应化工业株式会社 | Glass working method, glass etching liquid and glass substrate |
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| CN101015043A (en) * | 2004-09-09 | 2007-08-08 | Sez股份公司 | Method for selective etching |
| CN1896822A (en) * | 2005-07-13 | 2007-01-17 | 三星电子株式会社 | Etching agent and method for manufacturing liquid crystal display using same |
| CN1912187A (en) * | 2005-08-08 | 2007-02-14 | Lg.菲利浦Lcd株式会社 | Etchant composition, methods of patterning conductive layer and manufacturing flat panel display device using the same |
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| CN104445978A (en) * | 2014-11-28 | 2015-03-25 | 张家港市德力特新材料有限公司 | Preparation method for glass used on mobile phone screen |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107119278A (en) * | 2017-05-19 | 2017-09-01 | 合肥市惠科精密模具有限公司 | The ITO Ag ITO etching solutions of concave point after a kind of suppression TFT LCDs is thinned |
| CN107814491A (en) * | 2017-12-14 | 2018-03-20 | 天津美泰真空技术有限公司 | A kind of flat glass substrate etching solution |
| CN107954608A (en) * | 2017-12-14 | 2018-04-24 | 天津美泰真空技术有限公司 | A kind of glass substrate etching solution |
| CN113105123A (en) * | 2021-04-08 | 2021-07-13 | 惠州市清洋实业有限公司 | Polishing treatment method for Micro LED display screen |
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| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20161207 |
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| WD01 | Invention patent application deemed withdrawn after publication |