CN106178776B - 一种用于环保领域的烟气脱硫除尘装置 - Google Patents
一种用于环保领域的烟气脱硫除尘装置 Download PDFInfo
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- CN106178776B CN106178776B CN201610546079.7A CN201610546079A CN106178776B CN 106178776 B CN106178776 B CN 106178776B CN 201610546079 A CN201610546079 A CN 201610546079A CN 106178776 B CN106178776 B CN 106178776B
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- dust
- flue gas
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- silicon
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- 239000000428 dust Substances 0.000 title claims abstract description 65
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- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 title claims abstract description 39
- 238000000605 extraction Methods 0.000 claims abstract description 57
- 210000003850 cellular structure Anatomy 0.000 claims abstract description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 174
- 229910021418 black silicon Inorganic materials 0.000 claims description 86
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- 239000010703 silicon Substances 0.000 description 125
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 61
- 239000000243 solution Substances 0.000 description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 44
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 235000011114 ammonium hydroxide Nutrition 0.000 description 10
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- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 10
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 10
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- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 8
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- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
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- 230000008569 process Effects 0.000 description 6
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- 239000012901 Milli-Q water Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
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- 239000005864 Sulphur Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000006701 autoxidation reaction Methods 0.000 description 5
- 238000000975 co-precipitation Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
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- 238000005516 engineering process Methods 0.000 description 5
- 230000003628 erosive effect Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000001307 helium Substances 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- 238000005984 hydrogenation reaction Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 150000002505 iron Chemical class 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 5
- 238000003760 magnetic stirring Methods 0.000 description 5
- 239000002086 nanomaterial Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
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- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 5
- 238000013102 re-test Methods 0.000 description 5
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 5
- 230000009466 transformation Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
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- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
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- 238000003915 air pollution Methods 0.000 description 1
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- 229910052793 cadmium Inorganic materials 0.000 description 1
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- 239000000969 carrier Substances 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
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- 238000010248 power generation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
- B01D50/40—Combinations of devices covered by groups B01D45/00 and B01D47/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/30—Sulfur compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0283—Flue gases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610546079.7A CN106178776B (zh) | 2016-07-08 | 2016-07-08 | 一种用于环保领域的烟气脱硫除尘装置 |
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CN201610546079.7A CN106178776B (zh) | 2016-07-08 | 2016-07-08 | 一种用于环保领域的烟气脱硫除尘装置 |
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CN106178776A CN106178776A (zh) | 2016-12-07 |
CN106178776B true CN106178776B (zh) | 2018-05-04 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN203183889U (zh) * | 2013-02-15 | 2013-09-11 | 张敬敏 | 空气净化消毒装置 |
EP2778139A1 (en) * | 2011-11-11 | 2014-09-17 | Nitto Denko Corporation | Distillation apparatus and distillation method |
CN203916335U (zh) * | 2014-07-08 | 2014-11-05 | 刘金怀 | 一种利用风能和太阳能的空气净化机 |
CN204051344U (zh) * | 2014-08-14 | 2014-12-31 | 浙江润洁环境科技有限公司 | 一种除尘脱硫一体机 |
CN204134449U (zh) * | 2014-03-17 | 2015-02-04 | 大丰市佳诣电力燃料有限公司 | 一种除雾霾净尾气处理装置及其系统 |
CN104587771A (zh) * | 2015-01-12 | 2015-05-06 | 山西中科天罡科技开发有限公司 | 户外水洗式空气净化器 |
-
2016
- 2016-07-08 CN CN201610546079.7A patent/CN106178776B/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2778139A1 (en) * | 2011-11-11 | 2014-09-17 | Nitto Denko Corporation | Distillation apparatus and distillation method |
CN203183889U (zh) * | 2013-02-15 | 2013-09-11 | 张敬敏 | 空气净化消毒装置 |
CN204134449U (zh) * | 2014-03-17 | 2015-02-04 | 大丰市佳诣电力燃料有限公司 | 一种除雾霾净尾气处理装置及其系统 |
CN203916335U (zh) * | 2014-07-08 | 2014-11-05 | 刘金怀 | 一种利用风能和太阳能的空气净化机 |
CN204051344U (zh) * | 2014-08-14 | 2014-12-31 | 浙江润洁环境科技有限公司 | 一种除尘脱硫一体机 |
CN104587771A (zh) * | 2015-01-12 | 2015-05-06 | 山西中科天罡科技开发有限公司 | 户外水洗式空气净化器 |
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