CN106119790A - A kind of tungsten nickel target processing method - Google Patents
A kind of tungsten nickel target processing method Download PDFInfo
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- CN106119790A CN106119790A CN201610656587.0A CN201610656587A CN106119790A CN 106119790 A CN106119790 A CN 106119790A CN 201610656587 A CN201610656587 A CN 201610656587A CN 106119790 A CN106119790 A CN 106119790A
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- tungsten
- protective layer
- nickel
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/02—Compacting only
- B22F3/04—Compacting only by applying fluid pressure, e.g. by cold isostatic pressing [CIP]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/24—After-treatment of workpieces or articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
- B22F7/08—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/04—Alloys based on tungsten or molybdenum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/24—After-treatment of workpieces or articles
- B22F2003/247—Removing material: carving, cleaning, grinding, hobbing, honing, lapping, polishing, milling, shaving, skiving, turning the surface
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- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Composite Materials (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
Abstract
The invention discloses a kind of tungsten nickel target processing method, first use isostatic cool pressing technique that tungsten, nickel mixed-powder and rustless steel hollow pipe are carried out densification first and preforming, form half fine and close tungsten, nickel mixed-powder and rustless steel initial blank, make follow-up heat and other static pressuring processes that tungsten, nickel mixed-powder and rustless steel initial blank can be carried out more preferable densification, preferably the part surface of target is carried out blasting treatment, do not interfere with other of target simultaneously and need not the part of sandblasting.
Description
Technical field
The present invention relates to alloy material and manufacture field, be specifically related to a kind of tungsten nickel target processing method.
Background technology
In recent years, growing along with sputtering target material and sputtering technology, sputtering target material serves more in sputtering technology
Carrying out the most important effect, the quality of sputtering target material has directly influenced the quality of forming film after sputtering.Sputtering target material is broadly divided into flat
Face target and pipe target, described pipe target is generally made up of sputtering target material and penstock, compared with flat target, the utilization rate of pipe target higher and
After sputtering, quality of forming film is more preferable, has huge development potentiality in target market.
W-Ni hard alloy has high intensity, high rigidity, excellent wearability, thermostability and good corrosion resistance etc.
Feature, is therefore widely used in the working environments such as high pressure, high rotating speed, high temperature, Korrosionsmedium.Owing to Ni belongs to face-centered cubic
(F.c.c) crystallographic system, plasticity is fine, is susceptible to plastic deformation during wet grinding, forms the Ni powder ball of lamellar.
Tungsten nickel target is a kind of more typical alloy target material of ratio, and tungsten nickel has low-resistance coefficient, and good is thermally-stabilised
Property and non-oxidizability；Meanwhile, good processability, the feature that toughness is high, therefore former using tungsten, nickel mixed-powder as sputtering target material
Material, one of tungsten nickel pipe target pipe target having become semiconductor applications large usage quantity being made up of both raw materials.For now, use
In the tungsten nickel pipe target of semiconductor manufacturing not only to compactness, hardness with the highest requirement can be had, simultaneously to material by processing type
Interior tissue uniformity also has the highest requirement.
Owing to, in sputter procedure, the edge of target can leave the particulate matter that sputtering produces, these particulate matters are gradually
Accumulation becomes deposit.Deposit gathers on target and peeling phenomenon (peeling) can occur the most afterwards, sinking of peeling
Long-pending thing not only can affect sputtering environment, is also easy to drop on product surface, causes that product is defective even to be scrapped.To this end, it is existing
There is technology the part non-sputtered region of target can be carried out blasting treatment, the so part surface through sandblasting and become coarse, enter
And become easily to adsorb deposit, reduce peeling phenomenon odds.
Summary of the invention
The present invention provides a kind of tungsten nickel target processing method, first uses isostatic cool pressing technique to tungsten, nickel mixed-powder
Carry out densification first and preforming with rustless steel hollow pipe, form half fine and close tungsten, nickel mixed-powder and the initial base of rustless steel
Material, makes follow-up heat and other static pressuring processes tungsten, nickel mixed-powder and rustless steel initial blank can be carried out more preferable densification, with relatively
The good part surface to target carries out blasting treatment, does not interferes with other of target simultaneously and need not the part of sandblasting.
To achieve these goals, the invention provides a kind of tungsten nickel target processing method, the method includes as follows
Step:
(1) target is prepared
Thering is provided tungsten and nickel mixed-powder, the mass ratio of described tungsten powder and nikel powder is 9.95:1 to 10.05:1；
Described tungsten and nickel mixed-powder are carried out isostatic cool pressing technique, forms tungsten and nickel mixed-powder initial blank；
Described tungsten and nickel mixed-powder initial blank are loaded vacuum canning and to described vacuum canning evacuation after, to described tungsten
Carry out heat and other static pressuring processes with nickel mixing initial blank, form tungsten nickel；
Remove described vacuum canning, it is thus achieved that with described tungsten nickel target；
Wherein, the technological temperature of described isostatic cool pressing technique is 50 DEG C to 150 DEG C, and environmental stress is 170MPa to 190MPa,
Process time under described technological temperature and environmental stress is 15 minutes to 25 minutes；
Wherein, described heat and other static pressuring processes includes heating technique and HIP sintering technique；
The technological temperature of described heating technique is 300 DEG C to 400 DEG C, at said temperatures insulation 5 hours to 7 hours；
The technological temperature of described HIP sintering technique is 1150 DEG C to 1250 DEG C, and environmental stress is 160MPa to 200MPa,
Process time under described technological temperature and environmental stress is 5 hours to 7 hours；
(2) blasting treatment
Thering is provided described tungsten nickel target, described target includes treating sand blasted area and need not the reservation region of sandblasting；
At least close part treating sand blasted area in described reservation region, and part treats that protective layer is pasted in sand blasted area；
Remove and be positioned at the protective layer treating sand blasted area, treat sand blasted area be completely exposed target；
Target is treated, and sand blasted area carries out blasting treatment；
After the step of blasting treatment, remove remaining protective layer on target.
Preferably, in described step (2), it is provided that the step of described tungsten nickel target includes: remove to be positioned at and treat sandblasting
The step of the protective layer in region includes: use the mode of milling remove described in treat the protective layer of sand blasted area；
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target material surface being pasted with protective layer
Between arrange be not more than protective layer thickness gap, make described gap in the range of 0.02mm～0.04mm；
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target is processed
Method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target；
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: use lid
The part that protective layer is not pasted in reservation region by plate is blocked.
It is an advantage of the current invention that and first use isostatic cool pressing technique that tungsten, nickel mixed-powder and rustless steel hollow pipe are carried out first
Densification and preforming, form half fine and close tungsten, nickel mixed-powder and rustless steel initial blank, make follow-up heat and other static pressuring processes
Tungsten, nickel mixed-powder and rustless steel initial blank can be carried out more preferable densification, preferably the part surface of target to be entered
Row blasting treatment, does not interferes with other of target simultaneously and need not the part of sandblasting.
Detailed description of the invention
Embodiment one
Prepare target
Thering is provided tungsten and nickel mixed-powder, the mass ratio of described tungsten powder and nikel powder is 9.95:1；
Described tungsten and nickel mixed-powder are carried out isostatic cool pressing technique, forms tungsten and nickel mixed-powder initial blank；
Described tungsten and nickel mixed-powder initial blank are loaded vacuum canning and to described vacuum canning evacuation after, to described tungsten
Carry out heat and other static pressuring processes with nickel mixing initial blank, form tungsten nickel；
Remove described vacuum canning, it is thus achieved that with described tungsten nickel target.
Wherein, the technological temperature of described isostatic cool pressing technique is 50 DEG C, and environmental stress is 170MPa, at described technological temperature
It it is 15 minutes with the process time under environmental stress.
Wherein, described heat and other static pressuring processes includes heating technique and HIP sintering technique；
The technological temperature of described heating technique is 300 DEG C, at said temperatures insulation 5 hours；
The technological temperature of described HIP sintering technique is 1150 DEG C, and environmental stress is 160MPa, at described technological temperature and
Process time under environmental stress is 5 hours.
Blasting treatment
Thering is provided described tungsten nickel target, described target includes treating sand blasted area and need not the reservation region of sandblasting；At least
The close part treating sand blasted area in described reservation region, and partly treat that protective layer is pasted in sand blasted area；Removal is positioned to be painted
The protective layer in sand region, treats sand blasted area be completely exposed target；Target is treated, and sand blasted area carries out blasting treatment；In spray
After the step that sand processes, remove remaining protective layer on target.
Preferably, it is provided that the step of described tungsten nickel target includes: remove the step being positioned at the protective layer treating sand blasted area
Suddenly include: use the mode of milling remove described in treat the protective layer of sand blasted area.
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target being pasted with protective layer
The gap being not more than protective layer thickness is set between surface, makes described gap in the range of 0.02mm～0.04mm.
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target
Processing method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target.
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: adopt
Part reservation region not being pasted protective layer with cover plate is blocked.
Embodiment two
Prepare target
Thering is provided tungsten and nickel mixed-powder, the mass ratio of described tungsten powder and nikel powder is 10.05:1；
Described tungsten and nickel mixed-powder are carried out isostatic cool pressing technique, forms tungsten and nickel mixed-powder initial blank；
Described tungsten and nickel mixed-powder initial blank are loaded vacuum canning and to described vacuum canning evacuation after, to described tungsten
Carry out heat and other static pressuring processes with nickel mixing initial blank, form tungsten nickel；
Remove described vacuum canning, it is thus achieved that with described tungsten nickel target.
Wherein, the technological temperature of described isostatic cool pressing technique is 150 DEG C, and environmental stress is 190MPa, at described process warm
Process time under degree and environmental stress is 25 minutes.
Wherein, described heat and other static pressuring processes includes heating technique and HIP sintering technique；
The technological temperature of described heating technique is 400 DEG C, at said temperatures insulation 7 hours；
The technological temperature of described HIP sintering technique is 1250 DEG C, and environmental stress is 200MPa, at described technological temperature and
Process time under environmental stress is 7 hours.
Blasting treatment
Thering is provided described tungsten nickel target, described target includes treating sand blasted area and need not the reservation region of sandblasting；At least
The close part treating sand blasted area in described reservation region, and partly treat that protective layer is pasted in sand blasted area；Removal is positioned to be painted
The protective layer in sand region, treats sand blasted area be completely exposed target；Target is treated, and sand blasted area carries out blasting treatment；In spray
After the step that sand processes, remove remaining protective layer on target.
Preferably, it is provided that the step of described tungsten nickel target includes: remove the step being positioned at the protective layer treating sand blasted area
Suddenly include: use the mode of milling remove described in treat the protective layer of sand blasted area.
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target being pasted with protective layer
The gap being not more than protective layer thickness is set between surface, makes described gap in the range of 0.02mm～0.04mm.
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target
Processing method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target.
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: adopt
Part reservation region not being pasted protective layer with cover plate is blocked.
Claims (2)
1. a tungsten nickel target processing method, the method comprises the steps:
(1) target is prepared
Thering is provided tungsten and nickel mixed-powder, the mass ratio of described tungsten powder and nikel powder is 9.95:1 to 10.05:1；
Described tungsten and nickel mixed-powder are carried out isostatic cool pressing technique, forms tungsten and nickel mixed-powder initial blank；
Described tungsten and nickel mixed-powder initial blank are loaded vacuum canning and to described vacuum canning evacuation after, to described tungsten
Carry out heat and other static pressuring processes with nickel mixing initial blank, form tungsten nickel；
Remove described vacuum canning, it is thus achieved that with described tungsten nickel target；
Wherein, the technological temperature of described isostatic cool pressing technique is 50 DEG C to 150 DEG C, and environmental stress is 170MPa to 190MPa,
Process time under described technological temperature and environmental stress is 15 minutes to 25 minutes；
Wherein, described heat and other static pressuring processes includes heating technique and HIP sintering technique；
The technological temperature of described heating technique is 300 DEG C to 400 DEG C, at said temperatures insulation 5 hours to 7 hours；
The technological temperature of described HIP sintering technique is 1150 DEG C to 1250 DEG C, and environmental stress is 160MPa to 200MPa,
Process time under described technological temperature and environmental stress is 5 hours to 7 hours；
(2) blasting treatment
Thering is provided described tungsten nickel target, described target includes treating sand blasted area and need not the reservation region of sandblasting；
At least close part treating sand blasted area in described reservation region, and part treats that protective layer is pasted in sand blasted area；
Remove and be positioned at the protective layer treating sand blasted area, treat sand blasted area be completely exposed target；
Target is treated, and sand blasted area carries out blasting treatment；
After the step of blasting treatment, remove remaining protective layer on target.
2. the method for claim 1, it is characterised in that in described step (2), it is provided that described tungsten nickel target
Step includes: removes and is positioned at the step of the protective layer treating sand blasted area and includes: use the mode of milling remove described in treat sandblasting district
The protective layer in territory；
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target material surface being pasted with protective layer
Between arrange be not more than protective layer thickness gap, make described gap in the range of 0.02mm～0.04mm；
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target is processed
Method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target；
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: use lid
The part that protective layer is not pasted in reservation region by plate is blocked.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610656587.0A CN106119790A (en) | 2016-08-12 | 2016-08-12 | A kind of tungsten nickel target processing method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610656587.0A CN106119790A (en) | 2016-08-12 | 2016-08-12 | A kind of tungsten nickel target processing method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107604334A (en) * | 2017-09-21 | 2018-01-19 | 中国建筑材料科学研究总院 | Nickel-tungsten oxide film and preparation method thereof |
| CN110885963A (en) * | 2019-10-09 | 2020-03-17 | 安泰天龙钨钼科技有限公司 | Tungsten-nickel alloy target material and preparation method thereof |
| CN112008083A (en) * | 2020-08-27 | 2020-12-01 | 山东旭拓新材料科技有限公司 | Austenitic stainless steel and hard alloy composite material as well as preparation method and application thereof |
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| CN102343437A (en) * | 2011-11-11 | 2012-02-08 | 宁波江丰电子材料有限公司 | Method for manufacturing tungsten target material |
| CN104480446A (en) * | 2014-12-30 | 2015-04-01 | 山东昊轩电子陶瓷材料有限公司 | Molybdenum-titanium alloy target material and production method thereof |
| CN105695943A (en) * | 2014-11-28 | 2016-06-22 | 宁波江丰电子材料股份有限公司 | Target processing method |
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2016
- 2016-08-12 CN CN201610656587.0A patent/CN106119790A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102343437A (en) * | 2011-11-11 | 2012-02-08 | 宁波江丰电子材料有限公司 | Method for manufacturing tungsten target material |
| CN105695943A (en) * | 2014-11-28 | 2016-06-22 | 宁波江丰电子材料股份有限公司 | Target processing method |
| CN104480446A (en) * | 2014-12-30 | 2015-04-01 | 山东昊轩电子陶瓷材料有限公司 | Molybdenum-titanium alloy target material and production method thereof |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107604334A (en) * | 2017-09-21 | 2018-01-19 | 中国建筑材料科学研究总院 | Nickel-tungsten oxide film and preparation method thereof |
| CN110885963A (en) * | 2019-10-09 | 2020-03-17 | 安泰天龙钨钼科技有限公司 | Tungsten-nickel alloy target material and preparation method thereof |
| CN110885963B (en) * | 2019-10-09 | 2022-03-04 | 安泰天龙钨钼科技有限公司 | Tungsten-nickel alloy target material and preparation method thereof |
| CN112008083A (en) * | 2020-08-27 | 2020-12-01 | 山东旭拓新材料科技有限公司 | Austenitic stainless steel and hard alloy composite material as well as preparation method and application thereof |
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Application publication date: 20161116 |