CN106064167A - A kind of method of radio frequency plasma situ cleaning the first mirror - Google Patents
A kind of method of radio frequency plasma situ cleaning the first mirror Download PDFInfo
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- CN106064167A CN106064167A CN201610638821.7A CN201610638821A CN106064167A CN 106064167 A CN106064167 A CN 106064167A CN 201610638821 A CN201610638821 A CN 201610638821A CN 106064167 A CN106064167 A CN 106064167A
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- mirror
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- radio frequency
- switch room
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/23—Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Plasma Technology (AREA)
Abstract
The present invention provides a kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that uses coaxial cable to be introduced in the sample switch room being connected with tokamak device vacuum chamber by radio-frequency power supply, and is connected on the first mirror；The first mirror is pushed in tokamak device vacuum chamber by sample switch room sample driven rod；In tokamak device vacuum chamber, it is filled with working gas, and opens radio-frequency power supply to the first mirror applying radio-frequency voltage；Gradually rising radio-frequency power, regulation radio-frequency power supply adapter makes RF-reflective power be zero, produces radio frequency plasma on the first mirror surface；According to the kind of the first mirror surface deposits, regulate the first mirror automatic bias, make plasma sputtering clean the first mirror surface deposits, after cleaning a period of time, close radio-frequency power supply and stop cleaning；Meanwhile, take out first mirror sample by sample switch room and sample driven rod, carry out subsequent characterizations.
Description
Technical field
The present invention relates to a kind of magnetic confinement nuclear fusion technology, be specifically related to a kind of radio frequency plasma situ cleaning the first mirror
Method.
Background technology
In Tokamak type magnetic confinement nuclear fusion device, optical diagnostic system is monitoring plasma running status, guarantor
One of important means of card device safety.Along with plasma parameter and the increase of plant bulk, the first mirror is used to replace tradition
Optical windshield to avoid plasma radiation to cause the damage of optics, it is ensured that the accuracy of diagnostic signal and effectively
Property.First mirror, directly facing plasma, suffers bombardment and the wall processing element deposition of the high energy particle from plasma, spatters
The processes such as the redeposition penetrating wall material, there is impurity deposit layers in surface, and sedimentary, to the absorption of light and interference effect, causes first
Specular reflectivity deteriorates rapidly, affects the service life of associated optical diagnostic system.First mirror cleans can effectively remove the
One mirror surface deposits, recovers the first mirror surface characteristic and optical property, extends for first mirror service life, it is ensured that associated
Optics and the validity and reliability of laser diagnostics signal, be one of effective ways solving following ITER the first mirror problem.Mesh
Front maximally effective mirror surface recovery method is that radio frequency plasma cleans, and the first specular reflectivity can be recovered to initial value by it
More than 90%.But this technology the most not yet realizes tokamak ultrahigh vacuum, strong magnetic field circumstance situ cleaning works.
Summary of the invention
It is an object of the invention to overcome the deficiency of above-mentioned prior art, it is provided that a kind of at tokamak ultrahigh vacuum, strong
The method removing radio frequency plasma situ cleaning first mirror of the first mirror surface deposits under magnetic field environment.
In order to achieve the above object, the technical solution adopted in the present invention is:
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that comprise the following steps:
Step A: being arranged on by first mirror sample to be cleaned in sample switch room on removable frame, on it, connection has shielding end,
Meanwhile, first mirror sample to be cleaned and the shielding end connected on it are positioned at the radio frequency outside sample switch room by coaxial cable connection
Power supply, described radio-frequency power supply is also associated with radio frequency adaptation；
Step B: described sample switch room by valve connect have tokamak device vacuum chamber, be additionally provided with simultaneously molecular pump and
The vacuum pump group of mechanical pump composition and flange；
Step C: use vacuum pump group that the vacuum of sample switch room is evacuated to 5 × 10-5Below Pa, opens valve, by can
First mirror sample to be cleaned is pushed to, in tokamak device vacuum chamber, be filled with in tokamak device vacuum chamber by moving structure
Working gas；
Step D: open radio-frequency power supply, increases RF input power and regulates radio frequency adaptation, making first mirror sample table to be cleaned
Face produces radio frequency plasma, and to keep RF-reflective power be zero, and regulation cleaning parameters also cleans first mirror sample to be cleaned
Surface impurity；
Step E: clean after terminating, closes radio-frequency power supply, and is moved back by cleaned first mirror sample by removable frame and deliver to
In sample switch room, close valve, by flange, taking-up first mirror sample after inflation in sample switch room is carried out postmortem analysis.
Described coaxial cable one end connects with radio-frequency power supply and radio frequency adaptation outside sample switch room, simultaneously another
Hold and be connected with the first mirror sample to be cleaned in sample switch room and shielding end by through flange, wherein, coaxial cable tail
End braid and copper core are connected with shielding end and first mirror sample to be cleaned respectively.
Insulating between described first mirror sample to be cleaned with shielding end and be connected, and leave space, void size is 2-5
mm。
Described removable frame includes that the sample driven rod being positioned at sample switch room, described sample driven rod connect
Telescopic bellows, described telescopic bellows is used for being tightly connected sample switch room and sample driven rod, by controlling sample
Driven rod realizes the first mirror location portability to be cleaned.
Described coaxial cable is high-temperature coaxial cable or mineral insulation coaxial cable.
The impedance sum of described coaxial cable, through flange, the first mirror and shielding end need to meet impedance matching principle；
Described sample switch room can realize different vacuum state, valve and magnetic confinement device sealing by vacuum pump group
Well, during valve closing, in sample switch room, vacuum condition does not affect the vacuum environment of tokamak device vacuum chamber.
In described step B, during the work of tokamak device vacuum chamber, longitudinal field coil energising produces vertical field 0 ~ 3.5 T,
And vacuum is higher than 10-5Pa。
In described step C, being filled with working gas is noble gas, such as He, Ne, Ar etc., and according to first mirror sample material
And first mirror sedimentary become component selections working gas kind.
In described step C, after insufflation gas, the air pressure of tokamak vacuum installation is 0.01-2 Pa.
In described step D, after radio frequency plasma produces, first mirror sample surface will produce back bias voltage, back bias voltage scope
It is 0 ~-250 V.
In described step E, in sample switch room, inflate the vacuum environment that purpose is protection sample switch room.
Beneficial effects of the present invention is as follows:
The method step science of a kind of radio frequency plasma situ cleaning the first mirror disclosed by the invention, rationally, and by existing skill
Art is applied in magnetic confinement device so that it is realize the first mirror sedimentary situ cleaning under fine vacuum strong magnetic field circumstance.
Accompanying drawing explanation
Fig. 1 is radio frequency plasma situ cleaning the first mirror structural representation；
Fig. 2 is the radio frequency plasma in the first mirror cleaning-in-place process;
Wherein: 1, tokamak device vacuum chamber；2, valve；3, shielding end；4, the first mirror；5, sample switch room；6, flange；7、
Vacuum pump group；8, corrugated tube；9, through flange；10, coaxial cable；11, radio frequency adaptation；12, radio-frequency power supply；13, sample passes
Send bar.
Detailed description of the invention
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that comprise the following steps:
Step A: being arranged on by first mirror sample to be cleaned in sample switch room on removable frame, on it, connection has shielding end,
Meanwhile, first mirror sample to be cleaned and the shielding end connected on it are positioned at the radio frequency outside sample switch room by coaxial cable connection
Power supply, described radio-frequency power supply is also associated with radio frequency adaptation；
Step B: described sample switch room connects tokamak device vacuum chamber by valve, is additionally provided with by molecule on it simultaneously
Pump and mechanical pump composition independent vacuum pump group and flange；
Step C: use vacuum pump group that the vacuum of sample switch room is evacuated to 5 × 10-5Below Pa, opens valve, by can
First mirror sample to be cleaned is pushed to, in tokamak device vacuum chamber, be filled with in tokamak device vacuum chamber by moving structure
Working gas；
Step D: open radio-frequency power supply, increases RF input power and regulates radio frequency adaptation, making first mirror sample table to be cleaned
Face produces radio frequency plasma, and to keep RF-reflective power be zero, and regulation cleaning parameters also cleans first mirror sample to be cleaned
Surface impurity；
Step E: clean after terminating, closes radio-frequency power supply, and is moved back by cleaned first mirror sample by removable frame and deliver to
In sample switch room, close valve, take out first mirror sample after being inflated in sample switch room by flange and carry out postmortem analysis.
Described coaxial cable one end connects at sample switch room and radio-frequency power supply and radio frequency adaptation, the other end simultaneously
It is connected with the first mirror sample to be cleaned in sample switch room and shielding end by through flange, wherein, coaxial cable tail end
Braid and copper core are connected with shielding end and first mirror sample to be cleaned respectively.
Insulating between described first mirror sample to be cleaned with shielding end and be connected, and leave space, void size is 2-5
mm。
Described removable frame includes that the sample driven rod being positioned at sample switch room, described sample driven rod connect
Telescopic bellows, described telescopic bellows is used for being tightly connected sample switch room and sample driven rod, by controlling sample
Driven rod realizes the first mirror location portability to be cleaned.
Described coaxial cable is high-temperature coaxial cable or mineral insulation coaxial cable.
The impedance sum of described coaxial cable, through flange, the first mirror and shielding end need to meet impedance matching principle；
Described sample switch room can realize different vacuum state, valve and magnetic confinement device sealing by vacuum pump group
Well, during valve closing, in sample switch room, vacuum condition does not affect the vacuum environment of tokamak device vacuum chamber.
In described step B, during the work of tokamak device vacuum chamber, longitudinal field coil energising produces vertical field 0-3.5 T,
And vacuum is higher than 10-5 Pa。
In described step C, being filled with working gas is noble gas, such as He, Ne, Ar etc., and according to first mirror sample material
And first mirror sedimentary become component selections working gas kind.
In described step C, after insufflation gas, the air pressure of tokamak vacuum installation is 0.01-2 Pa.
In described step D, after radio frequency plasma produces, first mirror sample surface will produce back bias voltage, back bias voltage scope
It is 0 ~-250 V.
In described step E, in sample switch room, inflate the vacuum environment that purpose is protection sample switch room.
Being illustrated in figure 1 the apparatus structure schematic diagram implementing the inventive method, the first mirror 4 is connected with shielding end 3 insulation, and
Being fixed on the sample driven rod 13 in sample switch room 5, sample driven rod 13 connects to be had for vacuum-packed scalable
Corrugated tube 8, can make the first mirror 4 move forward and backward by sample driven rod 13, it is achieved the first mirror location portability to be cleaned.Meanwhile,
Use vacuum compatibility coaxial cable 10, by through flange 9, first mirror 4 and shielding end 3 are connected to radio frequency adaptation 11 and radio frequency
On power supply 12.The independent vacuum pump group 7 and flange 6 being made up of molecular pump and mechanical pump is set in sample switch room 5, by solely
Vertical vacuum pump group 7 can carry out evacuation to sample switch room 5, can be inflated sample switch room 5 by flange 6；Described
Sample switch room 5 connects also by valve 2 tokamak device vacuum chamber 1.This device, implementing the present invention when, first sets
Having put device, then opened vacuum pump group 7, sample switch room 5 is carried out evacuation, when vacuum, to reach tokamak device true
When empty room 1 requires, open the valve 2 connected between sample switch room 5 and vacuum installation 1, control sample driven rod 13 and make the
One mirror 4 pushes to position to be cleaned in tokamak device vacuum chamber 1, is filled with work gas in tokamak device vacuum chamber 1
Body, and maintain the required vacuum of electric discharge, increase tokamak magnet current, make tokamak device vacuum chamber 1 produces magnetic field,
Subsequently, open radio-frequency power supply 12, increase RF input power and also regulate radio frequency adaptation 11, make the first mirror 4 surface generation etc. from
Daughter to keep RF-reflective power be 0；Radio frequency plasma situ cleaning the first mirror 4；After cleaning required time, complete to clean
Process, reduces radio-frequency power, closes radio-frequency power supply 12.Control sample driven rod 13, make the first mirror 4 push to sample switch room 5
In, and close valve 2, after being inflated in sample switch room 5 by flange 6, open sample switch room 5, take out the first mirror 4 and carry out
Subsequent analysis.
Describe in detail as a example by radio frequency neon plasma situ cleaning the first mirror deposition film below
The first mirror selected by the present embodiment is molybdenum the first mirror that polishing stainless steel surface 500 nm is thick, and the first mirror surface has 10
Nm thickness Al2O3Deposition film, uses method of the present invention to this first mirror table in EAST east surpasses ring nuclear fusion experimental device
Face deposition film carries out situ cleaning.
According to EAST vacuum requirement, the vacuum of sample switch room 5 is 5 × 10-5 During Pa, valve 2 can be opened, carry out
Vacuum environment is docked；In cleaning process, needing EAST to indulge field current is 10 KA, and the first mirror is in tokamak device vacuum chamber 1
2440 mm positions, the first carried magnetic field intensity of mirror is about 1.7 T herein；In cleaning process first mirror bias need to regulate to-
80 V, Discharge Cleaning half an hour.Specific as follows:
First mirror is placed in sample switch room 5, uses circuit tester to measure resistance between the first mirror 4 and shielding end 3, be shown as
1.02 M Ω, show between the first mirror 4 and shielding end 3 in open-circuit condition, insulation connects normal；Close sample switch room 5, open
Vacuum pump group 7 carries out evacuation, and vacuum is shown as 5 × 10-5Pa, meets EAST requirement, opens valve 2, controls sample transmission
Bar 13 pushes 2440 mm positions of the first mirror 4 to tokamak device vacuum chamber 1, fills in tokamak device vacuum chamber 1
Entering working gas neon to vacuum is 0.5 Pa, and it is 10 KA that superconducting magnet is energized to electric current；Open radio-frequency power supply 12, and increase
Adding radio-frequency power, regulation radio frequency adaptation 11 to reflection power shown by it is zero, increase RF input power to bias for-
80V, plasma discharge situ cleaning the first mirror, cleaning process use camera shooting obtain plasma as shown in Figure 2.Clearly
After washing half an hour, completing cleaning-in-place process, regulation radio-frequency power to zero, is closed radio-frequency power supply 12, is reduced superconducting magnet electric current
And stop neon and be filled with；Control sample driven rod 13 and return in the first mirror 4 to sample switch room 5, close valve 2, by flange 6
After being filled with helium in sample switch room 5, open sample switch room 5, take out afterwards dividing after the first mirror 4 carries out situ cleaning
Analysis.
Claims (10)
1. the method for radio frequency plasma situ cleaning first mirror, it is characterised in that comprise the following steps:
Step A: being arranged on by first mirror sample to be cleaned in sample switch room on removable frame, on it, connection has shielding end,
Meanwhile, first mirror sample to be cleaned and the shielding end connected on it are positioned at the radio frequency outside sample switch room by coaxial cable connection
Power supply, described radio-frequency power supply is also associated with radio frequency adaptation；
Step B: described sample switch room connects tokamak device vacuum chamber by valve, simultaneously described in sample switch room
On be additionally provided with the independent vacuum pump group and flange being made up of mechanical pump and molecular pump；
Step C: use vacuum pump group that the vacuum of sample switch room is evacuated to 5 × 10-5Below Pa, opens valve, by moving
First mirror sample to be cleaned is pushed to, in tokamak device vacuum chamber, be filled with work in tokamak device vacuum chamber by dynamic structure
Make gas；
Step D: open radio-frequency power supply, increases RF input power and regulates radio frequency adaptation, making first mirror sample table to be cleaned
Face produces radio frequency plasma, and to keep RF-reflective power be zero, regulation cleaning parameters to clean first mirror sample surface miscellaneous
Matter；
Step E: clean after terminating, closes radio-frequency power supply, and is moved back by cleaned first mirror sample by removable frame and deliver to
In sample switch room, close valve, by flange, taking-up first mirror sample after inflation in sample switch room is carried out postmortem analysis.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
Coaxial cable one end connects with radio-frequency power supply and radio frequency adaptation outside sample switch room, and the other end passes through through flange simultaneously
It is connected with the first mirror sample to be cleaned in sample switch room and shielding end, wherein, coaxial cable tail end braid and copper core
It is connected with shielding end and first mirror sample to be cleaned respectively.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
First mirror sample to be cleaned and shielding end between insulate and be connected, and leave space, void size is 2-5 mm.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
Removable frame includes that the sample driven rod being positioned at sample switch room, described sample driven rod connect telescopic bellows,
Described telescopic bellows is used for being tightly connected sample switch room and sample driven rod, realizes treating clearly by controlling sample driven rod
Wash the first mirror location portability.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
The impedance sum of coaxial cable, through flange, the first mirror and shielding end need to meet impedance matching principle.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
Sample switch room can realize different vacuum state by vacuum pump group, and valve is good with magnetic confinement device sealing, valve
During closedown, in sample switch room, vacuum condition does not affect the vacuum environment of tokamak device vacuum chamber.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described step
In rapid B, during the work of tokamak device vacuum chamber, longitudinal field coil energising produces vertical field 0-3.5T, and vacuum is higher than 10-5Pa。
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described step
In rapid C, being filled with working gas is noble gas, and becomes component selections work gas according to first mirror sample material and the first mirror sedimentary
Body kind.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
In step C, after insufflation gas, the air pressure of tokamak vacuum installation is 0.01-2 Pa.
A kind of method of radio frequency plasma situ cleaning the first mirror, it is characterised in that: described
In step D, after radio frequency plasma produces, first mirror sample surface will produce back bias voltage, and back bias voltage scope is 0 ~-250V.
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| CN201610638821.7A CN106064167A (en) | 2016-08-05 | 2016-08-05 | A kind of method of radio frequency plasma situ cleaning the first mirror |
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| CN201610638821.7A CN106064167A (en) | 2016-08-05 | 2016-08-05 | A kind of method of radio frequency plasma situ cleaning the first mirror |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106782678A (en) * | 2016-12-09 | 2017-05-31 | 中国科学院合肥物质科学研究院 | A kind of method for alleviating the first mirror surface deposition |
| CN111957675A (en) * | 2020-06-28 | 2020-11-20 | 中国科学院上海光学精密机械研究所 | Method for removing deposited pollutant on surface of optical element in vacuum system |
| CN113661558A (en) * | 2019-04-03 | 2021-11-16 | 应用材料公司 | Sputter deposition source, sputter deposition apparatus and method of powering a sputter deposition source |
| CN114200778A (en) * | 2021-06-25 | 2022-03-18 | 四川大学 | Plasma in-situ cleaning structure of LPP light source collecting mirror of extreme ultraviolet lithography machine |
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| CN102218415A (en) * | 2011-03-10 | 2011-10-19 | 大连理工大学 | Method and device for cleaning tokamak first mirror by vacuum ultraviolet laser |
| CN104772305A (en) * | 2015-04-20 | 2015-07-15 | 大连理工大学 | Device for cleaning first mirror for tokamak device by direct-current cascade arc plasma torch |
| CN105327900A (en) * | 2015-10-29 | 2016-02-17 | 中国科学院等离子体物理研究所 | Method for recovering first mirror reflectivity through magnetic enhanced radio frequency plasma |
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Patent Citations (4)
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| CN200957197Y (en) * | 2005-12-14 | 2007-10-10 | 中国科学院光电研究院 | Multi-capacitor coupled RF plasma surface treating apparatus |
| CN102218415A (en) * | 2011-03-10 | 2011-10-19 | 大连理工大学 | Method and device for cleaning tokamak first mirror by vacuum ultraviolet laser |
| CN104772305A (en) * | 2015-04-20 | 2015-07-15 | 大连理工大学 | Device for cleaning first mirror for tokamak device by direct-current cascade arc plasma torch |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106782678A (en) * | 2016-12-09 | 2017-05-31 | 中国科学院合肥物质科学研究院 | A kind of method for alleviating the first mirror surface deposition |
| CN113661558A (en) * | 2019-04-03 | 2021-11-16 | 应用材料公司 | Sputter deposition source, sputter deposition apparatus and method of powering a sputter deposition source |
| CN113661558B (en) * | 2019-04-03 | 2024-02-06 | 应用材料公司 | Sputter deposition source, sputter deposition apparatus and method for powering sputter deposition source |
| CN111957675A (en) * | 2020-06-28 | 2020-11-20 | 中国科学院上海光学精密机械研究所 | Method for removing deposited pollutant on surface of optical element in vacuum system |
| CN114200778A (en) * | 2021-06-25 | 2022-03-18 | 四川大学 | Plasma in-situ cleaning structure of LPP light source collecting mirror of extreme ultraviolet lithography machine |
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Application publication date: 20161102 |