CN106057713B - A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core - Google Patents
A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core Download PDFInfo
- Publication number
- CN106057713B CN106057713B CN201610659475.0A CN201610659475A CN106057713B CN 106057713 B CN106057713 B CN 106057713B CN 201610659475 A CN201610659475 A CN 201610659475A CN 106057713 B CN106057713 B CN 106057713B
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- inches
- strip
- box core
- rectangular
- level board
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core, belong to monocrystalline silicon buffing sheet production field, the box core that the present invention passes through the setting unique texture in 5 inches of film magazines, box in-core fixes 4 inches of film magazines by special hexagon holder, 4 inch silicon wafers are installed in 5 inches of film magazines to realize, it solves 4 inches, 5 inches, compatibling problem of 6 inches of 3 kinds of size silicon chips on same cleaning machine, cleaning cost is greatly saved；In the specific position setting strip through-hole of box core and round air-permeating hole, to ensure that the smooth outflow of air-flow during drying, it not will produce vortex, ensure that dry effect and cleannes；Meanwhile the cushion block made of the privileged site of box core setting polyvinylidene fluoride material is contacted with 5 inches of film magazines, to reduce the friction of dryer box core and 5 inches of film magazines in rotary course, is avoided metal and particle contaminant, is played good protective effect.
Description
Technical field
The present invention relates to the production field of monocrystalline silicon buffing sheet, specifically a kind of monocrystalline silicon buffing sheet cleaning machine is used
Campatible dries box core.
Background technology
With the development of semicon industry, market is increasing to the demand of monocrystalline silicon buffing sheet, to monocrystalline silicon buffing
The requirement of the specification of piece is also more and more diversified.In order to meet the needs in market, it is desirable to monocrystalline silicon buffing sheet cleaning machine
It is compatible with multiple sizes as far as possible, can thus realize the diversification of silicon polished specification and size as far as possible.Existing market
On polished silicon wafer cleaning machine can only substantially be compatible with two sizes, main cause is limit of the dryer due to washed machine width degree
System, can only dry two sizes simultaneously, and the drying intracavitary of dryer can only place four boxes, in order to when ensureing high speed rotation
Stability, opposite two boxes must be an equal amount of.One group of polished silicon wafer, and this group polishing can only be got rid of when drying every time
Piece must be same size.
Domestic 8 inches of polished silicon wafers below are mainly and are dried in a manner of drying, and the product structure of mainstream is with 4 at present
Based on inch, 5 inches and 6 inches, existing polished silicon wafer cleaning machine is also to be dried in a manner of drying, but due to dryer
Limitation, can only dry the polished silicon wafer of 5 inches and 6 inches, cannot meet 4 inches, 5 inches, 6 inches of 3 kinds of sized products knots simultaneously
The demand of structure so at least needing two cleaning machines that could meet production requirement in production, but if is cleaned using two
Machine cannot give full play to the maximum production capacity of every cleaning machine, will greatly increase cleaning cost.
Invention content
5 inches and 6 inches of silicon chip can only be dried for solution polished silicon wafer cleaning machine in the prior art but cannot be compatible with 4 English
The problem of very little silicon chip, the present invention provides a kind of monocrystalline silicon buffing sheet cleaning machine Campatibles to dry box core, by by the box core
After being placed in 5 inches of drying film magazine, so that it may 5 inches of film magazine to be repacked into the film magazine of 4 inch silicon wafers of drying, to realize
One cleaning agent meets the cleaning demand of 4 inches, 5 inches, 6 inches 3 kinds of size silicon chips simultaneously, moreover it is possible to fully ensure that drying
Aridity and cleanliness factor, substantially increase production efficiency, have saved cost.
Used technical solution is the present invention to solve above-mentioned technical problem：A kind of monocrystalline silicon buffing sheet cleaning machine is with simultaneous
Appearance formula dry box core, including a rectangular horizontal plate and be vertically set on rectangular horizontal plate length direction both sides upper surface and with level
The aluminum alloy frame that the isometric riser of plate surrounds, wherein connected for arc transition between level board and riser, and along the company of the two
The place of connecing is provided with strip through-hole, is respectively provided with along its length on every strip through-hole there are two hexagon holder, and two
Four hexagon holders on strip through-hole are symmetrical, to form the deck of 4 inches of film magazines of fixed support；The middle part of the level board
It is provided with and it is divided into two-part rectangular channel along its length, and be vertically arranged in the lower surface at level board length direction both ends
There is rectangle backplate I with by the closed at both ends of rectangular channel, the both ends of two sides and level board width direction of the rectangle backplate I
Concordantly, the rectangular channel is provided with rectangle backplate II vertically downward along its both sides, and the lower edge of rectangle backplate II is protected with rectangle
The lower edge of plate I is concordant, to which rectangular channel is surrounded a rectangular box；The both sides in rectangular box lower length direction are symmetrical
It is provided with horizontal bottom plate, and bottom plate, rectangle backplate II, rectangle backplate I and level board surround two strips to both-side opening
Rectangular space is vertically equipped with the partition board of several connecting bottom boards and level board in strip rectangular space, to which strip rectangle is empty
Between be separated into several chambers；The both sides of rectangular channel drill the length direction of rectangular channel and are symmetrically distributed with several circles on the level board
Shape air-permeating hole, and these round air-permeating holes are connected with strip rectangular space；The lateral surface on two pieces of riser top and two pieces
Cushion block made of polyvinylidene fluoride material is both provided on bottom plate lower surface, when so that box core being put into 5 inches of film magazines, box core is logical
Cushion block is crossed to contact with the inner wall of 5 inches of film magazines.
The upper edge of two pieces of risers is obliquely installed the extension plate that oriented both sides extend out.
The cushion block is strip, is provided through several fault troughs of its width direction along its length.
The lateral surface on two pieces of riser tops is provided with the support plate isometric with it, and is formed between support plate and riser flat
Cavity, the cushion block and support plate being arranged in riser upper outside face is isometric, and is provided through its width along its length
Several fault troughs in direction are provided with connection bolt in each fault trough, cushion block are fixed on support plate.
Each hexagon holder is two identical vertical edges, two identical horizontal sides, two connection vertical edges
Plate-like piece is surrounded with the bevel edge of horizontal sides, wherein a vertical edges and horizontal sides are vertical with riser and level board respectively sets
It sets, and the bevel edge for connecting the vertical edges and horizontal sides is erected on strip through-hole, and equal with the width of strip through-hole.
Advantageous effect：For the present invention by the way that the box core of unique texture is arranged in 5 inches of film magazines, box in-core passes through special six
Side shape holder fixes 4 inches of film magazines, and 4 inch silicon wafers are installed in 5 inches of film magazines to realize, solve 4 inches, 5 inches,
Compatibling problem of 6 inches of 3 kinds of size silicon chips on same cleaning machine, is greatly saved cleaning cost；In the specific position of box core
Strip through-hole and round air-permeating hole are set, to ensure that the smooth outflow of air-flow during drying, not will produce vortex, guarantee
Dry effect and cleannes；Meanwhile cushion block made of polyvinylidene fluoride material and 5 inches are set in the privileged site of box core
Film magazine contacts, and to reduce the friction of dryer box core and 5 inches of film magazines in rotary course, avoids metal and particle is stained with
Dirt plays good protective effect；By the way that four hexagon holders of unique texture are arranged in box core inner, not only act as solid
The effect of fixed 4 inch plaques box positions, and the supporting role to box core is played in the process in drying, there is simple in structure, operation
Convenient advantage, while also can fully ensure that the aridity and cleanliness factor of drying, substantially increases production efficiency, saved at
This.
Description of the drawings
Fig. 1 is the dimensional structure diagram of the present invention；
Fig. 2 is the side view of Fig. 1；
Fig. 3 is the structural schematic diagram of hexagon holder；
Reference numeral：1, riser, 101, extension plate, 102, support plate, 103, flat cavity, 2, level board, 201, rectangle shield
Plate II, 202, round air-permeating hole, 203, rectangular channel, 3, bottom plate, 4, rectangle backplate I, 5, cushion block, 501, fault trough, 6, hexagon branch
Frame, 601, horizontal sides, 602, vertical edges, 603, bevel edge, 7, rectangular space, 8, partition board, 9, strip through-hole.
Specific implementation mode
As shown, a kind of monocrystalline silicon buffing sheet cleaning machine Campatible dries box core, including a rectangular horizontal plate 2 and hang down
It is straight that the aluminum alloy frame surrounded in 2 length direction both sides upper surface of rectangular horizontal plate and the riser 1 isometric with level board 2 is set,
Wherein, it is connected for arc transition between level board 2 and riser 1, and the junction of the two is provided with strip through-hole 9, at every
Hexagon holder 6 there are two being respectively provided with along its length on strip through-hole 9, and four hexagons on two strip through-holes 9
Holder 6 is symmetrical, to form the deck of 4 inches of film magazines of fixed support；The middle part of the level board 2 is provided with it along its length
It is divided into two-part rectangular channel 203, and rectangle backplate I 4 is vertically installed with to incite somebody to action in the lower surface at 2 length direction both ends of level board
Rectangular channel 203 it is closed at both ends, two sides of the rectangle backplate I 4 are concordant with the both ends of 2 width direction of level board, described
Rectangular channel 203 is provided with rectangle backplate II 201 vertically downward along its both sides, and the lower edge of rectangle backplate II 201 is protected with rectangle
The lower edge of plate I 4 is concordant, to which rectangular channel 203 is surrounded a rectangular box；The both sides in rectangular box lower length direction
It is symmetrically arranged with horizontal bottom plate 3, and bottom plate 3, rectangle backplate II 201, rectangle backplate I 4 and level board 2 are surrounded to both-side opening
Two strip rectangular spaces 7, in strip rectangular space 7 vertically be equipped with several connecting bottom boards 3 and level board 2 partition board 8, from
And strip rectangular space 7 is separated into several chambers；The length of rectangular channel 203 is drilled in the both sides of rectangular channel 203 on the level board 2
Degree direction is symmetrically distributed with several round air-permeating holes 202, and these round air-permeating holes 202 are connected with strip rectangular space 7；Institute
It states and is both provided with cushion block 5 made of polyvinylidene fluoride material on the lateral surface and two pieces of 3 lower surfaces of bottom plate on two pieces of 1 top of riser,
When so that box core being put into 5 inches of film magazines, box core is contacted by cushion block 5 with the inner wall of 5 inches of film magazines.
It is the basic embodiment of the present invention above, can be further optimized, limits and improve on the basis of above：
Such as, the upper edge of two pieces of risers 1 is obliquely installed the extension plate 101 that oriented both sides extend out；
For another example, the cushion block 5 is strip, is provided through several fault troughs 501 of its width direction along its length；
For another example, the lateral surface on two pieces of risers, 1 top is provided with the support plate 102 isometric with it, and support plate 102 and riser
Flat cavity 103 is formed between 1, the cushion block 5 and support plate 102 being arranged in 1 upper outside face of riser is isometric, and along its length
Direction is provided through several fault troughs 501 of its width direction, is provided with connection bolt in each fault trough 501, cushion block 5 is consolidated
It is scheduled on support plate 102；
Finally, each hexagon holder 6 is two identical vertical edges, 602, two identical horizontal sides 601, two
Item connects vertical edges 602 and the bevel edge 603 of horizontal sides 601 surrounds plate-like piece, wherein a vertical edges 602 and a horizontal sides
601 are vertically arranged with riser 1 and level board 2 respectively, and the bevel edge 603 for connecting the vertical edges 602 and horizontal sides 601 is erected at item
On shape through-hole 9, and it is equal with the width of strip through-hole 9.
Claims (5)
1. a kind of monocrystalline silicon buffing sheet cleaning machine Campatible dries box core, which is arranged in 5 inches of film magazines, and feature exists
In：Including a rectangular horizontal plate（2）Be vertically set on rectangular horizontal plate（2）Length direction both sides upper surface and and level board
（2）Isometric riser（1）The aluminum alloy frame surrounded, wherein level board（2）And riser（1）Between for arc transition connect, and
The junction of the two is provided with strip through-hole（9）, in every strip through-hole（9）On be respectively provided with along its length there are two six
Side shape holder（6）, and two strip through-holes（9）On four hexagon holders（6）Symmetrically, to form 4 inch plaques of fixed support
The deck of box；The level board（2）Middle part be provided with it be divided into two-part rectangular channel along its length（203）, and
Level board（2）The lower surface at length direction both ends is vertically installed with rectangle backplate I（4）With by rectangular channel（203）It is closed at both ends,
The rectangle backplate I（4）Two sides and level board（2）The both ends of width direction are concordant, the rectangular channel（203）Along its two
Side is provided with rectangle backplate II vertically downward（201）, and rectangle backplate II（201）Lower edge and rectangle backplate I（4）It is following
Edge is concordant, thus by rectangular channel（203）Surround a rectangular box；The both sides in rectangular box lower length direction are symmetrical arranged
There is horizontal bottom plate（3）, and bottom plate（3）, rectangle backplate II（201）, rectangle backplate I（4）And level board（2）It surrounds and is opened to both sides
Two strip rectangular spaces of mouth（7）, in strip rectangular space（7）Inside vertically it is equipped with several connecting bottom boards（3）And level board（2）
Partition board（8）, thus by strip rectangular space（7）It is separated into several chambers；The level board（2）Upper rectangular channel（203）'s
Drill rectangular channel in both sides（203）Length direction be symmetrically distributed with several round air-permeating holes（202）, and these round air-permeating holes
（202）With strip rectangular space（7）It is connected；Two pieces of risers（1）The lateral surface on top and two pieces of bottom plates（3）On lower surface
It is both provided with cushion block made of polyvinylidene fluoride material（5）, when so that box core being put into 5 inches of film magazines, box core passes through cushion block（5）
It is contacted with the inner wall of 5 inches of film magazines.
2. a kind of monocrystalline silicon buffing sheet cleaning machine according to claim 1 dries box core with Campatible, it is characterised in that：Institute
State two pieces of risers（1）Upper edge be obliquely installed the extension plate that oriented both sides extend out（101）.
3. a kind of monocrystalline silicon buffing sheet cleaning machine according to claim 1 dries box core with Campatible, it is characterised in that：Institute
State cushion block（5）For strip, it is provided through several fault troughs of its width direction along its length（501）.
4. a kind of monocrystalline silicon buffing sheet cleaning machine according to claim 1 dries box core with Campatible, it is characterised in that：Institute
State two pieces of risers（1）The lateral surface on top is provided with the support plate isometric with it（102）, and support plate（102）With riser（1）Between shape
At flat cavity（103）, described to be arranged in riser（1）The cushion block in upper outside face（5）With support plate（102）It is isometric, and along its length
Degree direction is provided through several fault troughs of its width direction（501）, each fault trough（501）It is inside provided with connection bolt, it will
Cushion block（5）It is fixed on support plate（102）On.
5. a kind of monocrystalline silicon buffing sheet cleaning machine according to claim 1 dries box core with Campatible, it is characterised in that：Institute
State each hexagon holder（6）For two identical vertical edges（602）, two identical horizontal sides（601）, two connections it is vertical
Side（602）With horizontal sides（601）Bevel edge（603）Surround plate-like piece, wherein a vertical edges（602）With a horizontal sides
（601）Respectively with riser（1）And level board（2）It is vertically arranged, and connects the vertical edges（602）And horizontal sides（601）Bevel edge
（603）It is erected at strip through-hole（9）On, and and strip through-hole（9）Width it is equal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610659475.0A CN106057713B (en) | 2016-08-12 | 2016-08-12 | A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610659475.0A CN106057713B (en) | 2016-08-12 | 2016-08-12 | A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106057713A CN106057713A (en) | 2016-10-26 |
| CN106057713B true CN106057713B (en) | 2018-08-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610659475.0A Active CN106057713B (en) | 2016-08-12 | 2016-08-12 | A kind of monocrystalline silicon buffing sheet cleaning machine Campatible drying box core |
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| CN (1) | CN106057713B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109244003B (en) * | 2018-08-24 | 2024-07-16 | 上海晶福机电科技有限公司 | Post-processing system for wafer production |
| CN108917298B (en) * | 2018-08-29 | 2023-10-31 | 泉芯半导体科技(无锡)有限公司 | Self-resetting mechanism for shutdown rotating shaft of silicon wafer spin dryer |
| CN115218627A (en) * | 2022-06-22 | 2022-10-21 | 江苏亚电科技有限公司 | Wafer drying equipment swing mechanism |
| CN116974141B (en) * | 2023-09-22 | 2023-12-15 | 贵州华龙电子设备有限公司 | Multi-specification wafer spin-drying device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4658240B2 (en) * | 2001-01-10 | 2011-03-23 | レンゴー株式会社 | Cardboard partition material |
| JP2005193911A (en) * | 2003-12-26 | 2005-07-21 | Kyokuhei Glass Kako Kk | Box for transferring glass substrate |
| CN204596762U (en) * | 2015-04-23 | 2015-08-26 | 麦斯克电子材料有限公司 | A kind of composite type for Wafer Cleaning loads film magazine |
| CN205984913U (en) * | 2016-08-12 | 2017-02-22 | 麦斯克电子材料有限公司 | Monocrystalline silicon polishing piece cleaning machine is with compatible formula box core that spin -dries |
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Address after: 471000 No. 99 Binhe North Road, Luoyang hi tech Industrial Development Zone, Henan Patentee after: Mesk Electronic Materials Co., Ltd Address before: 471000 No. 99 Binhe North Road, Luoyang hi tech Industrial Development Zone, Henan, Luoyang Patentee before: MCL ELECTRONIC MATERIALS Ltd. |