CN106011798A - 基于pecvd的石墨烯薄膜镀膜设备及方法 - Google Patents
基于pecvd的石墨烯薄膜镀膜设备及方法 Download PDFInfo
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- CN106011798A CN106011798A CN201610514142.9A CN201610514142A CN106011798A CN 106011798 A CN106011798 A CN 106011798A CN 201610514142 A CN201610514142 A CN 201610514142A CN 106011798 A CN106011798 A CN 106011798A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610514142.9A CN106011798B (zh) | 2016-06-30 | 2016-06-30 | 基于pecvd的石墨烯薄膜镀膜设备及方法 |
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CN201610514142.9A CN106011798B (zh) | 2016-06-30 | 2016-06-30 | 基于pecvd的石墨烯薄膜镀膜设备及方法 |
Publications (2)
Publication Number | Publication Date |
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CN106011798A true CN106011798A (zh) | 2016-10-12 |
CN106011798B CN106011798B (zh) | 2018-10-23 |
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CN201610514142.9A Active CN106011798B (zh) | 2016-06-30 | 2016-06-30 | 基于pecvd的石墨烯薄膜镀膜设备及方法 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107217241A (zh) * | 2017-08-03 | 2017-09-29 | 肇庆市科润真空设备有限公司 | 基于pecvd的增强型石墨烯薄膜镀膜设备及方法 |
CN109980042A (zh) * | 2018-12-19 | 2019-07-05 | 黄剑鸣 | Hit异质结太阳能电池制造设备 |
WO2020015225A1 (zh) * | 2018-07-18 | 2020-01-23 | 清华大学 | 一种高温高性能电容器薄膜连续生产装置及方法 |
CN113005431A (zh) * | 2020-12-23 | 2021-06-22 | 刘南林 | 一种阻抑新冠病毒纳米碳复合材料生产设备 |
CN114015994A (zh) * | 2021-11-03 | 2022-02-08 | 合肥国轩高科动力能源有限公司 | 一种超薄复合集流体的制备方法 |
CN114481098A (zh) * | 2022-01-17 | 2022-05-13 | 成都四威高科技产业园有限公司 | 一种具有防护功能的腔室pecvd设备传动装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03293776A (ja) * | 1990-04-12 | 1991-12-25 | Canon Inc | 半導体薄膜の製造方法 |
KR20100083221A (ko) * | 2009-01-13 | 2010-07-22 | 주식회사 쏠리스 | 중성입자빔생성장치를 이용한 롤투롤 박막증착 시스템 |
CN205856606U (zh) * | 2016-06-30 | 2017-01-04 | 肇庆市科润真空设备有限公司 | 基于pecvd的石墨烯薄膜镀膜设备 |
-
2016
- 2016-06-30 CN CN201610514142.9A patent/CN106011798B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03293776A (ja) * | 1990-04-12 | 1991-12-25 | Canon Inc | 半導体薄膜の製造方法 |
KR20100083221A (ko) * | 2009-01-13 | 2010-07-22 | 주식회사 쏠리스 | 중성입자빔생성장치를 이용한 롤투롤 박막증착 시스템 |
CN205856606U (zh) * | 2016-06-30 | 2017-01-04 | 肇庆市科润真空设备有限公司 | 基于pecvd的石墨烯薄膜镀膜设备 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107217241A (zh) * | 2017-08-03 | 2017-09-29 | 肇庆市科润真空设备有限公司 | 基于pecvd的增强型石墨烯薄膜镀膜设备及方法 |
WO2020015225A1 (zh) * | 2018-07-18 | 2020-01-23 | 清华大学 | 一种高温高性能电容器薄膜连续生产装置及方法 |
CN109980042A (zh) * | 2018-12-19 | 2019-07-05 | 黄剑鸣 | Hit异质结太阳能电池制造设备 |
CN113005431A (zh) * | 2020-12-23 | 2021-06-22 | 刘南林 | 一种阻抑新冠病毒纳米碳复合材料生产设备 |
CN114015994A (zh) * | 2021-11-03 | 2022-02-08 | 合肥国轩高科动力能源有限公司 | 一种超薄复合集流体的制备方法 |
CN114481098A (zh) * | 2022-01-17 | 2022-05-13 | 成都四威高科技产业园有限公司 | 一种具有防护功能的腔室pecvd设备传动装置 |
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CN106011798B (zh) | 2018-10-23 |
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